CN114672778A - Nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and preparation method thereof - Google Patents

Nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and preparation method thereof Download PDF

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CN114672778A
CN114672778A CN202210337478.8A CN202210337478A CN114672778A CN 114672778 A CN114672778 A CN 114672778A CN 202210337478 A CN202210337478 A CN 202210337478A CN 114672778 A CN114672778 A CN 114672778A
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entropy alloy
alloy coating
nbmotawti
refractory high
refractory
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王亚强
孙军
李彤
龙斌
刘刚
张金钰
鲁盛会
秦博
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Xian Jiaotong University
China Institute of Atomic of Energy
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China Institute of Atomic of Energy
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering

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Abstract

The invention discloses a nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and a preparation method thereof, wherein the atomic percent of Ti is 2.6-20.7 at.%, and the rest is NbMoTaW with equal atomic ratio. Preparing a NbMoTaWTi refractory high-entropy alloy coating on a single-side polished monocrystalline silicon substrate by adopting a magnetron sputtering co-sputtering method, wherein a direct-current power supply is adopted for an NbMoTaW alloy target, and a radio-frequency power supply is adopted for a Ti target; the change of the Ti content is realized by regulating the deposition power of the Ti target, the agglomeration and reverse sputtering phenomena of target material elements are not easy to cause, and the even microstructure of the coating is ensured. And after the deposition is finished, the sample is fully cooled to room temperature in a high vacuum deposition chamber and then taken out, and the obtained coating sample has uniform components and compact tissue. The addition of the alloying Ti element effectively improves the liquid lead bismuth alloy solution corrosion resistance of the NbMoTaW refractory high-entropy alloy coating on the premise of keeping good mechanical property.

Description

Nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and preparation method thereof
Technical Field
The invention belongs to the field of metal surface modification, and particularly relates to a nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and a preparation method thereof.
Background
The high-entropy alloy coating is a novel multi-principal-element alloy coating material developed on the basis of high-entropy alloy, and due to the influence of a thermodynamic high-entropy effect, the microstructure of the high-entropy alloy coating is mainly a single-phase solid solution structure; meanwhile, due to the dynamic delayed diffusion effect and the crystallographic distortion effect, the nucleation and growth of the grain structure become relatively difficult, which is beneficial to the formation of nano-crystalline and amorphous phases, and the phase structure also has high thermal stability. In addition, the high-entropy alloy coating has huge application potential in the aspects of corrosion-resistant coatings, high-hardness coatings, diffusion barrier layers and the like.
The NbMoTaW refractory high-entropy alloy has a single-phase BCC solid solution structure, all components are high-melting-point heavy metal elements, high strength can be kept at 1600 ℃, and excellent high-temperature mechanical properties and structural stability are achieved; the atomic radii of the elements of each component are close, the lattice mismatch is small, and no obvious lattice relaxation effect exists; the diffusion coefficient of the component elements is low, and the component elements can show good expansion resistance and creep deformation resistance at high temperature.
However, the Mo and W elements in the NbMoTaW refractory high-entropy alloy coating are brittle pure metals in nature, so that the brittleness of the material is high. Reducing the average valence electron concentration increases the ductility of the molybdenum-tungsten containing alloy. At present, research on the corrosion resistance of a refractory high-entropy alloy coating to a high-temperature lead bismuth solution is very limited, so that a novel high-performance refractory high-entropy alloy coating and a preparation process thereof are required to be provided, and the mechanical property is improved while the corrosion resistance to a high-temperature liquid metal is improved.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and a preparation method thereof.
The invention is realized by the following technical scheme:
a nanocrystalline NbMoTaWTi refractory high-entropy alloy coating comprises the following elements in percentage by weight: ti2.6-20.7 at.%, and the balance of NbMoTaW with equal atomic ratio, wherein the crystal grain morphology of the high-entropy alloy coating is columnar nanocrystalline.
Preferably, the thickness of the high-entropy alloy coating is 2.0-3.0 μm.
Preferably, the nano-indentation hardness of the NbMoTaWTi high-entropy alloy coating is 9.0-11.0 GPa.
A preparation method of an NbMoTaWTi refractory high-entropy alloy coating comprises the following steps:
step 1: carrying out ultrasonic cleaning and drying on the surface of the matrix;
step 2: preparing an NbMoTaWTi refractory high-entropy alloy coating on a substrate by adopting a magnetron sputtering co-sputtering method in a vacuum environment;
the NbMoTaW alloy target is sputtered by a direct-current power supply with the power of 200W, and the Ti target is sputtered by a radio-frequency power supply with the power of 14-135W.
And 3, step 3: and (3) carrying out furnace vacuum cooling on the NbMoTaWTi refractory high-entropy alloy coating obtained in the step (2) to room temperature to obtain the NbMoTaWTi refractory high-entropy alloy coating.
Preferably, the method for cleaning and drying the substrate in step 1 specifically comprises the following steps:
and ultrasonically cleaning the polished substrate in acetone and alcohol for 10 minutes in sequence, and then drying.
Preferably, the vacuum degree of the vacuum environment in the step 2 is 4.0 × 10-4Pa or less.
Preferably, the deposition temperature of the magnetron sputtering co-sputtering is 150 ℃.
Preferably, the deposition pressure of the magnetron sputtering co-sputtering is 0.3Pa, the rotating speed of the base plate is 15r/min in the deposition process, and the deposition time is 10000 s.
Preferably, the NbMoTaW alloy target is 99.9 wt.% pure; the purity of the Ti target was 99.94 wt.%.
Compared with the prior art, the invention has the following beneficial technical effects:
the crystal grain of the NbMoTaWTi refractory high-entropy alloy coating provided by the invention is columnar nanocrystalline, the alloy element Ti is uniformly distributed in the coating, the structure is compact, the enthalpy of mixing the Ti element with Nb, Mo, Ta and W elements is small, the valence electron concentration is lowest compared with other elements, the ductility can be improved by introducing Ti into the NbMoTaW refractory high-entropy alloy coating, the higher strength is kept, and the proper addition of the Ti element can effectively improve the liquid lead-bismuth alloy corrosion resistance of the NbMoTaW while keeping good mechanical property.
The preparation method of the NbMoTaWTi refractory high-entropy alloy coating provided by the invention comprises the steps of firstly carrying out ultrasonic cleaning and drying on the surface of a substrate to improve film-substrate combination, wherein the content change of Ti in the NbMoTaWAl refractory high-entropy alloy coating is realized by adjusting deposition power, so that the agglomeration and reverse sputtering phenomena of target elements are not easily caused, and the microstructure is uniform. The number of the sputtering particles is increased along with the increase of the deposition power, and the energy of the particles is also increased, thereby realizing the increase of the deposition rate of the Ti element. In addition, the magnetron sputtering co-sputtering method is adopted, so that the ionization rate is improved, and the deposition rate is accelerated. Ar (Ar)+The scattering effect of ions on sputtered atoms is weak, and the influence on deposition efficiency and film-based bonding is small. After sputtering is finished, the sample is fully cooled to room temperature in a vacuum coating chamber and then taken out, so that the cracking or falling of the coating caused by the difference of the thermal expansion coefficients of the coating and the base material is prevented, and the high-temperature sample is prevented from being oxidized when being contacted with air. In addition, the atomic radius of Ti is similar to that of Nb, Mo, Ta and W, and the deposited coating is uniform and compact, has few defects and is attached withThe force is strong.
Drawings
FIG. 1 is STEM photograph and EDS scan distribution diagram of Ti element of NbMoTaWTi refractory high-entropy alloy coating of the present invention.
FIG. 2 is a SEM cross-sectional photograph of the NbMoTaWTi refractory high-entropy alloy coating of the invention.
FIG. 3 is a diagram showing the nano-indentation hardness results of the NbMoTaWTi refractory high-entropy alloy coating.
FIG. 4 is an SEM cross-sectional photograph of a high-entropy refractory NbMoTaWTi alloy coating after lead and bismuth corrosion.
Detailed Description
The present invention will now be described in further detail with reference to the attached drawings, which are illustrative, but not limiting, of the present invention.
A preparation method of an NbMoTaWTi refractory high-entropy alloy coating comprises the following atomic percent: ti2.6-20.7 at.%, and the balance NbMoTaW with equal atomic ratio; the alloy is prepared by adopting a magnetron sputtering co-sputtering method, the crystal grain is columnar nanocrystalline, and the nano indentation hardness of the NbMoTaWTi high-entropy alloy coating is 9.0-11.0 GPa.
The invention also provides a preparation method of the NbMoTaWTi refractory high-entropy alloy coating, which comprises the following steps:
step 1: carrying out ultrasonic cleaning and drying on the surface of the matrix;
and ultrasonically cleaning the polished substrate in acetone and absolute ethyl alcohol for 10 minutes in sequence, and drying to ensure that the surface of the substrate is clean and has no stains and dust adhesion, thereby being beneficial to improving the binding force of the coating and the substrate.
Step 2: and (3) etching the substrate in the step (1) in a vacuum environment.
Fixing the substrate after ultrasonic cleaning on a base plate, conveying into a magnetron sputtering coating chamber with an automatic machine, and vacuumizing until the vacuum degree of the back bottom is 4.0 multiplied by 10-4And (4) etching under the Ar atmosphere for 5min under Pa, wherein the etching power is 200W.
And step 3: preparing the NbMoTaWTi refractory high-entropy alloy coating on a substrate by adopting a magnetron sputtering co-sputtering method, wherein the atomic percent of Ti is respectively 2.6-20.7 at.%.
Wherein, the purity of the NbMoTaW alloy target with equal atomic ratio is 99.9 wt.%, and the direct-current power supply with the power of 200W is adopted; the purity of the Ti target is 99.94 wt.%, and a radio frequency power supply is adopted, and the power is 14-135W; the deposition temperature is 150 ℃; the working air pressure is 0.3 Pa; the rotating speed of the basal disc is 15r/min in the deposition process; the deposition time is 10000 s; when the vacuum degree reaches 4.0 multiplied by 10-4And co-sputtering is started when the pressure is less than Pa, and the thickness of the prepared NbMoTaWTi refractory high-entropy alloy coating is 2.0-3.0 mu m.
And 4, taking out the sample after the sample is fully cooled to room temperature in the high vacuum coating chamber to prevent the coating from cracking or falling off due to the difference of the thermal expansion coefficients of the coating and the base material and prevent the high-temperature sample from being oxidized due to the contact with air.
The invention adopts a magnetron sputtering co-sputtering method to deposit an NbMoTaWTi refractory high-entropy alloy coating on the surface of a substrate, and the principle is as follows: ar ionized by Ar gas+Bombarding the surface of the cathode target under the action of an electric field to sputter the target, depositing sputtered target atoms on the substrate, and binding sputtered secondary electrons in a plasma region close to the surface of the target under the action of the electric field and the magnetic field to increase the collision probability with Ar so as to ionize more Ar+A higher deposition rate is achieved. After deposition is finished, the substrate is taken out after being fully cooled in the high vacuum coating chamber, so that debonding and cracking caused by the difference of the thermal expansion coefficients of the substrate and the coating material are prevented, and a high-temperature sample can be prevented from being oxidized due to contact with air. And finally preparing the NbMoTaWTi refractory high-entropy alloy coating with different Ti contents.
Example 1
Step 1: and ultrasonically cleaning the polished monocrystalline silicon substrate in acetone and ethanol for 10min in sequence, and drying by using a blower.
Step 2: fixing the substrate on a base plate, conveying into a vacuum coating chamber with an automatic machine, and vacuumizing to 4.0 × 10- 4And Pa below, and etching for 5min at an etching power of 200W.
And step 3: and preparing the NbMoTaWTi refractory high-entropy alloy coating by magnetron sputtering co-sputtering.
Wherein, NbMoTaW compound with equal atomic ratioThe purity of the gold target is 99.9 wt.%, and a direct-current power supply is adopted, and the power is 200W; the purity of the Ti target is 99.94 wt.%, and a radio frequency power supply with the power of 14W is adopted; the deposition temperature is 150 ℃; the working air pressure is 0.3 Pa; the rotating speed of the basal disc is 15r/min in the deposition process; the deposition time is 10000 s; when the vacuum degree reaches 4.0 multiplied by 10-4Co-sputtering is started when Pa or less.
And 4, step 4: and after the deposition is finished, naturally cooling the sample in a high vacuum deposition chamber for 8 hours, and taking out the sample to obtain the NbMoTaWTi refractory high-entropy alloy coating with the thickness of 2.3 mu m.
Microstructure characterization and mechanical property test are carried out on the prepared NbMoTaWTi refractory high-entropy alloy coating, Ti elements are uniformly distributed, the atomic percent is 2.6 at.%, the crystal grain appearance is columnar nanocrystalline, and the nanoindentation hardness is 10.8 +/-0.3 GPa.
Example 2
Step 1: and ultrasonically cleaning the polished monocrystalline silicon substrate in acetone and ethanol for 10min in sequence, and drying by using a blower.
Step 2: fixing the substrate on a base plate, conveying into a vacuum coating chamber with an automatic machine, and vacuumizing to 4.0 × 10- 4And Pa below, and etching for 5min at an etching power of 200W.
And step 3: preparing the NbMoTaWTi refractory high-entropy alloy coating by magnetron sputtering co-sputtering.
Wherein, the purity of the NbMoTaW alloy target with equal atomic ratio is 99.9 wt.%, and the direct-current power supply with the power of 200W is adopted; the purity of the Ti target is 99.949 wt.%, and a radio frequency power supply is adopted, and the power is 50W; the deposition temperature is 150 ℃; the working air pressure is 0.3 Pa; the rotating speed of the basal disc is 15r/min in the deposition process; the deposition time is 10000 s; when the vacuum degree reaches 4.0 multiplied by 10-4Co-sputtering is started when Pa or less.
And 4, step 4: after deposition, the sample is naturally cooled for 8h in a high vacuum deposition chamber and taken out to obtain the NbMoTaWTi refractory high-entropy alloy coating with the thickness of 2.8 mu m.
Microstructure characterization and mechanical property test are carried out on the prepared NbMoTaWTi refractory high-entropy alloy coating, Ti elements are uniformly distributed, the atomic percent is 8.0 at.%, the crystal grain appearance is columnar nanocrystalline, and the nanoindentation hardness is 9.3 +/-0.4 GPa.
Example 3
Step 1: and ultrasonically cleaning the polished monocrystalline silicon substrate in acetone and ethanol for 10min in sequence, and drying by using a blower.
Step 2: fixing the substrate on a base plate, conveying into a vacuum coating chamber with an automatic machine, and vacuumizing to 4.0 × 10- 4And Pa below, and etching for 5min at an etching power of 200W.
And step 3: and preparing the NbMoTaWTi refractory high-entropy alloy coating by magnetron sputtering co-sputtering.
Wherein, the purity of the NbMoTaW alloy target with equal atomic ratio is 99.9 wt.%, and the direct-current power supply with the power of 200W is adopted; the purity of the Ti target is 99.94 wt.%, and a radio frequency power supply with power of 96W is adopted; the deposition temperature is 150 ℃; the working air pressure is 0.3 Pa; the rotating speed of the basal disc is 15r/min in the deposition process; the deposition time was 10000 s; when the vacuum degree reaches 4.0 multiplied by 10-4Co-sputtering is started when Pa or less.
And 4, step 4: after deposition, the sample is naturally cooled for 8h in a high vacuum deposition chamber and taken out to obtain the NbMoTaWTi refractory high-entropy alloy coating with the thickness of 2.9 μm.
Microstructure characterization and mechanical property test are carried out on the prepared NbMoTaWTi refractory high-entropy alloy coating, the Ti element is uniformly distributed, the atomic percent is 15.0 at.%, the crystal grain appearance is columnar nanocrystalline, and the nanoindentation hardness is 9.7 +/-0.4 GPa.
Example 4
Step 1: and ultrasonically cleaning the polished monocrystalline silicon substrate in acetone and ethanol for 10min in sequence, and drying by using a blower.
Step 2: fixing the substrate on a base plate, conveying into a vacuum coating chamber with an automatic machine, and vacuumizing to 4.0 × 10- 4And Pa below, and etching for 5min at an etching power of 200W.
And step 3: and preparing the NbMoTaWTi refractory high-entropy alloy coating by magnetron sputtering co-sputtering.
Wherein, the purity of the NbMoTaW alloy target with equal atomic ratio is 99.9 wt.%, and the direct-current power supply with the power of 200W is adopted; the purity of the Ti target is 99.94 wt.%, and a radio frequency power supply with the power of 135W is adopted; deposition temperatureAt 150 ℃; the working air pressure is 0.3 Pa; the rotating speed of the basal disc is 15r/min in the deposition process; the deposition time was 10000 s; when the vacuum degree reaches 4.0 multiplied by 10-4Co-sputtering is started when Pa or less.
And 4, step 4: after deposition, the sample is naturally cooled for 8h in a high vacuum deposition chamber and taken out to obtain the NbMoTaWTi refractory high-entropy alloy coating with the thickness of 3.0 μm.
Microstructure characterization and mechanical property test are carried out on the prepared NbMoTaWTi refractory high-entropy alloy coating, the Ti element is uniformly distributed, the atomic percent is 20.0 at.%, the crystal grain appearance is columnar nanocrystalline, and the nanoindentation hardness is 9.2 +/-0.3 GPa.
The invention discloses a high-entropy refractory NbMoTaWTi alloy coating and a preparation method thereof, wherein the atomic percent of Ti is 2.6-20.7 at.%, and the balance is NbMoTaW with equal atomic ratio. Preparing a NbMoTaWTi refractory high-entropy alloy coating on a single-side polished monocrystalline silicon substrate by adopting a magnetron sputtering co-sputtering method, wherein a direct-current power supply is adopted for an NbMoTaW alloy target, and a radio-frequency power supply is adopted for a Ti target; the change of the Ti content is realized by regulating the deposition power of the Ti target, the agglomeration and the reverse sputtering of target material elements are not easy to cause, and the microstructure is uniform. After deposition, the sample is fully cooled to room temperature in a high vacuum deposition chamber and then taken out, and the obtained coating sample has uniform components and compact tissue. The liquid lead-bismuth alloy corrosion resistance of the NbMoTaW high-entropy alloy coating is effectively improved while good mechanical properties are kept by adding Ti.
Fig. 1 shows STEM photographs and EDS scanning Ti element distribution diagrams of the nbmotatawti refractory high-entropy alloy coating of the present invention, and fig. 2 shows SEM cross-sectional photographs of the nbmotatawti refractory high-entropy alloy coating of the present invention.
Fig. 3 shows a chart of nanoindentation hardness results for nbmotatti refractory high-entropy alloy coatings prepared in examples 1-4.
FIG. 4 shows SEM cross-sectional photographs of the NbMoTaW refractory high-entropy alloy coating and the NbMoTaWTi refractory high-entropy alloy coating after lead and bismuth corrosion. According to the NbMoTaWTi refractory high-entropy alloy coating, the internal Ti element is uniformly distributed, the crystal grain appearance is columnar nanocrystalline, the nanoindentation hardness is reduced along with the addition of the Ti element, the coating basically keeps complete after the NbMoTaWTi refractory high-entropy alloy coating is corroded for 1000 hours at the temperature of 600 ℃, and no obvious oxide layer exists, so that the addition of the Ti element is illustrated, and the liquid lead-bismuth alloy corrosion resistance is obviously improved while most of the mechanical property of the NbMoTaWTi refractory high-entropy alloy coating is kept.
The above contents are only for illustrating the technical idea of the present invention, and the protection scope of the present invention should not be limited thereby, and any modification made on the basis of the technical idea proposed by the present invention falls within the protection scope of the claims of the present invention.

Claims (9)

1. A nanocrystalline NbMoTaWTi refractory high-entropy alloy coating is characterized in that the high-entropy alloy coating comprises the following atoms in percentage: ti2.6-20.7 at.%, and the balance of NbMoTaW with equal atomic ratio, wherein the crystal grain morphology of the high-entropy alloy coating is columnar nanocrystalline.
2. The NbMoTaWTi refractory high-entropy alloy coating of claim 1, wherein the thickness of the high-entropy alloy coating is 2.0-3.0 μm.
3. The NbMoTaWTi refractory high-entropy alloy coating of claim 1 or 2, wherein the nano-indentation hardness of the NbMoTaWTi high-entropy alloy coating is 9.0-11.0 GPa.
4. A method for producing a nbmotatawti refractory high-entropy alloy coating according to any one of claims 1 to 3, comprising the steps of:
step 1: carrying out ultrasonic cleaning and drying on the surface of the matrix;
step 2: preparing an NbMoTaWTi refractory high-entropy alloy coating on a substrate by adopting a magnetron sputtering co-sputtering method in a vacuum environment;
the NbMoTaW alloy target is sputtered by a direct-current power supply with the power of 200W, and the Ti target is sputtered by a radio-frequency power supply with the power of 14-135W.
And step 3: and (3) carrying out furnace vacuum cooling on the NbMoTaWTi refractory high-entropy alloy coating obtained in the step (2) to room temperature to obtain the NbMoTaWTi refractory high-entropy alloy coating.
5. The method for preparing the NbMoTaWTi refractory high-entropy alloy coating according to claim 4, wherein the method for cleaning and drying the substrate in the step 1 is as follows:
and ultrasonically cleaning the polished substrate in acetone and alcohol for 10 minutes in sequence, and then drying.
6. The method for preparing the NbMoTaWTi refractory high-entropy alloy coating according to claim 4, wherein the vacuum degree of the vacuum environment in the step 2 is 4.0 x 10-4Pa or less.
7. The method for preparing the NbMoTaWTi refractory high-entropy alloy coating according to claim 4, wherein the deposition temperature of the magnetron sputtering co-sputtering is 150 ℃.
8. The method for preparing the NbMoTaWTi refractory high-entropy alloy coating according to claim 4, wherein the deposition pressure of the magnetron sputtering co-sputtering is 0.3Pa, the rotating speed of the substrate disc in the deposition process is 15r/min, and the deposition time is 10000 s.
9. The method of producing the NbMoTaWTi refractory high entropy alloy coating of claim 4, wherein the NbMoTaW alloy target has a purity of 99.9 wt.%; the Ti target purity was 99.94 wt.%.
CN202210337478.8A 2022-03-31 2022-03-31 Nanocrystalline NbMoTaWTi refractory high-entropy alloy coating and preparation method thereof Pending CN114672778A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115142018A (en) * 2022-07-01 2022-10-04 四川大学 High-entropy alloy coating resistant to high-temperature liquid lead/lead bismuth alloy corrosion and preparation method thereof

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CN113151795A (en) * 2021-03-30 2021-07-23 西安交通大学 NbMoTaWAl refractory high-entropy alloy film and preparation method thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115142018A (en) * 2022-07-01 2022-10-04 四川大学 High-entropy alloy coating resistant to high-temperature liquid lead/lead bismuth alloy corrosion and preparation method thereof
CN115142018B (en) * 2022-07-01 2023-08-08 四川大学 High-entropy alloy coating resistant to high-temperature liquid lead/lead bismuth alloy corrosion and preparation method thereof

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