CN114601358A

CN114601358A - Micro-bubble generating device

Info

Publication number: CN114601358A
Application number: CN202111093014.9A
Authority: CN
Inventors: 中岛悠二郎; 古川真也
Original assignee: Rinnai Corp
Current assignee: Rinnai Corp
Priority date: 2020-12-03
Filing date: 2021-09-17
Publication date: 2022-06-10
Also published as: KR20220079443A

Abstract

The invention provides a micro-bubble generating device, which comprises a storage tank, a storage tank supply path, a pressurizing pump, a storage tank discharge path, a micro-bubble generating nozzle arranged on the storage tank discharge path, a storage tank circulating pump, a gas introducing mechanism arranged on the storage tank circulating path and a control device. The gas introduction mechanism has a decompression section for decompressing and passing the liquid and a gas introduction port for introducing the gas by the negative pressure of the liquid in the decompression section. The control device can perform operation control for generating fine bubbles by driving the pressurizing pump to pressurize and supply the liquid from the tank supply path to the tank and to supply the liquid in which the gas is dissolved under pressure from the tank to the liquid tank through the tank discharge path. The liquid in the storage tank is circulated in the storage tank circulation path by driving the storage tank circulation pump during the execution of the control for the operation of generating the fine bubbles, and the gas introduced by the gas introduction mechanism is supplied to the storage tank. Therefore, the liquid in the liquid tank can continuously and stably generate micro bubbles.

Description

Micro-bubble generating device

Technical Field

The technology disclosed in the present specification relates to a fine bubble generating device (fine bubble generating apparatus).

Background

Patent document 1 discloses a microbubble generator including: a tank for dissolving the gas in the liquid under pressure; a tank supply path that supplies the liquid to the tank; a pressurizing pump provided in the tank supply path; a tank discharge path for discharging the liquid in which the gas is dissolved under pressure from the tank to a liquid tank; a fine bubble generation nozzle that is provided in the tank discharge path and generates fine bubbles by reducing a pressure of the liquid in which the gas is dissolved under pressure; a gas introduction mechanism provided in the tank; and a control device. The gas introduction mechanism includes: a gas inlet port for introducing the gas; and a gas introduction valve for opening and closing the gas introduction port. The control means alternately performs a gas introduction operation control of introducing the gas into the reservoir by supplying the liquid from the reservoir to the liquid tank with the gas introduction valve opened and a fine bubble generation operation control of introducing the gas into the reservoir; the microbubble generation operation control is a control in which the pressurizing pump is driven to pressurize the liquid and supply the liquid from the tank supply path to the tank, and the liquid in which the gas is dissolved is supplied from the tank to the liquid tank via the tank discharge path, in a state in which the gas introduction valve is closed.

[ Prior art documents ]

Patent document

Patent document 1: japanese patent laid-open publication No. 2009-18118

Disclosure of Invention

[ problem to be solved by the invention]

In the microbubble generator of patent document 1, since the gas is supplied to the tank during the gas introduction operation control and the gas is consumed from the tank during the microbubble generation operation control, the gas introduction operation control and the microbubble generation operation control must be alternately performed. However, since the liquid supplied from the tank to the liquid tank cannot be caused to generate fine bubbles during the gas introduction operation control, the fine bubbles generated in the liquid tank during the gas introduction operation control disappear during the gas introduction operation control, and it is difficult to generate the fine bubbles stably in the liquid tank. In the present specification, a technique capable of generating fine bubbles in a liquid tank continuously and stably is provided.

[ means for solving the problems ]

The microbubble generator disclosed in the present specification includes a storage tank for dissolving a gas in a liquid under pressure, a storage tank supply path, a pressure pump, a storage tank discharge path, a microbubble generation nozzle, a storage tank circulation path, a storage tank circulation pump, a gas introduction mechanism, and a control device; the tank supply path is used for supplying the liquid to the tank; the pressure pump is provided in the tank supply path; the tank discharge path is configured to discharge the liquid in which the gas is dissolved under pressure from the tank to a liquid tank; the fine bubble generation nozzle is provided in the tank discharge path, and generates fine bubbles by depressurizing the liquid in which the gas is dissolved under pressure; the tank circulation path is provided separately from the tank discharge path, and conveys the liquid from an outlet port connected to the tank to an inlet port connected to the tank; the tank circulation pump is provided in the tank circulation path; the gas introduction mechanism is provided in the tank circulation path. The gas introduction mechanism has a decompression section for decompressing the liquid and passing the liquid therethrough, and a gas introduction port; the gas introduction port introduces the gas by a negative pressure of the liquid in the decompression portion. The control device is capable of performing a fine bubble generation operation control of: the liquid is supplied under pressure from the tank supply path to the tank by driving the pressurizing pump, and the liquid in which the gas is dissolved under pressure is supplied from the tank to the liquid tank via the tank discharge path. In the fine bubble generation device, the control device drives the tank circulation pump to circulate the liquid in the tank through the tank circulation path during the fine bubble generation operation control, thereby supplying the gas introduced by the gas introduction mechanism to the tank.

In the above-described microbubble generator, even during the control of the microbubble generating operation, the gas introduced by the gas introduction mechanism can be supplied to the accumulator by driving the accumulator circulation pump. Therefore, the fine-bubble generation operation control can be continuously performed without interrupting the fine-bubble generation operation control for supplying the gas to the receiver. By adopting such a configuration, the liquid in the liquid tank can be constantly and stably generated into fine bubbles.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: the gas introduction mechanism is disposed upstream of the tank circulation pump in the tank circulation path.

According to the above configuration, the pressure of the liquid in the decompression section can be further reduced as compared with a case where the gas introduction mechanism is disposed on the downstream side of the tank circulation pump in the tank circulation path. By adopting such a structure, the amount of gas introduced by the gas introduction mechanism can be further increased. In addition, according to the above configuration, when the gas introduced by the gas introduction mechanism and the liquid flowing through the tank circulation path pass through the tank circulation pump, the gas and the liquid are stirred by the impeller of the tank circulation pump, and thus the dissolution of the gas in the liquid can be further promoted.

The fine bubble generating apparatus may further include a gas introduction valve for opening and closing the gas introduction port, a 1 st liquid level electrode, and a 2 nd liquid level electrode; the 1 st liquid level electrode can detect whether the liquid level of the storage tank is above the 1 st liquid level or not; the 2 nd liquid level electrode is capable of detecting whether the liquid level of the storage tank is above a 2 nd liquid level higher than the 1 st liquid level. The liquid level at a portion of the tank connected to the outflow port of the tank circulation path may be lower than the 1 st liquid level. The controller may be configured to close the gas introduction valve when the level of the liquid in the tank is detected by the 1 st liquid level electrode to be lower than the 1 st liquid level in a state where the gas introduction valve is open, and to open the gas introduction valve when the level of the liquid in the tank is detected by the 2 nd liquid level electrode to be higher than the 2 nd liquid level in a state where the gas introduction valve is closed, in the fine bubble generation operation control.

In the process of performing the fine bubble generation operation control, the liquid level of the tank gradually decreases when the amount of the gas consumed by the tank is smaller than the amount of the gas introduced by the gas introduction mechanism, and gradually increases when the amount of the gas consumed by the tank is larger than the amount of the gas introduced by the gas introduction mechanism. On the other hand, when the tank circulation pump is driven, if the gas introduction valve is opened, gas is introduced by the gas introduction mechanism, and when the gas introduction valve is closed, gas is not introduced by the gas introduction mechanism. According to the above configuration, the controller switches the opening and closing of the gas introduction valve in accordance with the liquid level of the tank, thereby making it possible to balance the amount of gas consumed by the tank and the amount of gas introduced by the gas introduction mechanism.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: in the fine bubble generation operation control, the control means also continues to drive the tank circulation pump during the period in which the gas introduction valve is in the closed state.

When the tank circulation pump is driven to circulate the liquid in the tank through the tank circulation path, the flow of the liquid in the tank becomes rapid. In the pressurized dissolution type tank, the more rapid the flow of the liquid in the tank, the more the pressurized dissolution of the gas in the liquid in the tank is promoted. According to the above configuration, since the tank circulation pump is continuously driven even while the gas introduction valve is in the closed state in the fine bubble generation operation control, the liquid in the tank can be made to flow rapidly, and thus the pressurized dissolution of the gas in the liquid in the tank can be further promoted.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: the control device is configured to determine an elapsed time as an intake time in the fine bubble generation operation control, the elapsed time being: an elapsed time from when the 2 nd level electrode detects that the liquid level of the tank is higher than the 2 nd level and the gas introduction valve is opened to when the 1 st level electrode detects that the liquid level of the tank is lower than the 1 st level and the gas introduction valve is closed is adjusted in accordance with the suction time, and thereafter, a rotation speed of the tank circulation pump when the tank circulation pump is driven in a state where the gas introduction valve is opened is adjusted.

In the fine bubble generation operation control, in the case where the amount of gas introduced by the gas introduction mechanism is much larger than the amount of gas consumed by the reservoir in the state where the gas introduction valve is opened, the suction time is a very short time. In contrast, in the microbubble generation operation control, in the case where the amount of gas introduced by the gas introduction mechanism is slightly larger than the amount of gas consumed by the accumulator in the state where the gas introduction valve is opened, the suction time is a very long time. The amount of gas introduced by the gas introduction mechanism varies according to the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve open. According to the above configuration, the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve opened thereafter is adjusted in accordance with the actual suction time during the control of the microbubble generation operation, whereby the amount of gas consumed by the accumulator and the amount of gas introduced by the gas introduction mechanism are kept in an appropriate equilibrium state, whereby the microbubbles can be continuously and stably generated in the liquid tank.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: the control device is configured to: the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve opened thereafter is increased in a case where the suction time exceeds a 1 st suction time, and the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve opened thereafter is decreased in a case where the suction time is shorter than a 2 nd suction time shorter than the 1 st suction time.

In the state where the gas introduction valve is opened, the amount of gas introduced by the gas introduction mechanism increases as the rotation speed of the reservoir circulation pump increases, and the amount of gas introduced by the gas introduction mechanism decreases as the rotation speed of the reservoir circulation pump decreases. According to the above configuration, when the intake time is longer than the 1 st intake time, that is, when the amount of gas introduced by the gas introduction mechanism is smaller than expected, the rotation speed of the accumulator circulation pump is increased, whereby the amount of gas introduced by the gas introduction mechanism can be increased. Further, according to the above configuration, when the intake time is shorter than the 2 nd intake time, that is, when the amount of gas introduced by the gas introduction mechanism is larger than expected, the amount of gas introduced by the gas introduction mechanism can be reduced by reducing the rotation speed of the accumulator circulation pump.

Or, the micro-bubble generating device can also be provided with a 1 st liquid level electrode and a 2 nd liquid level electrode, wherein the 1 st liquid level electrode can detect whether the liquid level of the storage tank is above the 1 st liquid level; the 2 nd level electrode is capable of detecting whether a level of the tank is above a 2 nd level higher than the 1 st level. The liquid level at a portion of the tank connected to the outflow port of the tank circulation path may be lower than the 1 st liquid level. The controller may be configured to decrease the rotation speed of the tank circulation pump when the 1 st liquid level electrode detects that the liquid level of the tank is lower than the 1 st liquid level, and to increase the rotation speed of the tank circulation pump when the 2 nd liquid level electrode detects that the liquid level of the tank is higher than the 2 nd liquid level.

In the course of performing the fine bubble generation operation control, the liquid level of the tank gradually decreases when the amount of gas consumed by the tank is smaller than the amount of gas introduced by the gas introduction mechanism, and the liquid level of the tank gradually increases when the amount of gas consumed by the tank is larger than the amount of gas introduced by the gas introduction mechanism. On the other hand, when the tank circulation pump is driven, if the rotational speed of the tank circulation pump is increased, the amount of gas introduced by the gas introduction mechanism becomes larger, and when the rotational speed of the tank circulation pump is decreased, the amount of gas introduced by the gas introduction mechanism becomes smaller. According to the above configuration, the controller adjusts the rotation speed of the tank circulation pump in accordance with the liquid level of the tank, thereby making it possible to balance the amount of gas consumed by the tank and the amount of gas introduced by the gas introduction mechanism.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: the control device is configured to: an environmental parameter corresponding to an environment in which the microbubble generator is installed is determined, and the rotational speed of the pressurizing pump in the microbubble generation operation control is adjusted in accordance with the environmental parameter.

The state of the fine bubbles generated in the liquid tank during the fine bubble generation operation control varies according to the pressure in the tank during the fine bubble generation operation control. Even if the pressure pump is driven in the same manner, the pressure in the storage tank when the microbubble generation operation control is performed may vary depending on the environment in which the microbubble generator is installed. According to the above configuration, when the pressure in the tank during the execution of the microbubble generation operation control is affected by the environment in which the microbubble generator is installed, the pressure in the tank during the execution of the microbubble generation operation control can be stabilized by adjusting the rotation speed of the pressure pump so as to cancel the effect.

In the fine bubble generating apparatus, the fine bubble generating apparatus may be: the environmental parameter includes an installation position of the liquid tank with respect to the fine-bubble generating device, a pipe diameter of at least a part of the tank discharge path, a pipe length of at least a part of the tank discharge path, a pipe diameter of at least a part of the tank supply path, and/or a pipe length of at least a part of the tank supply path.

For example, when the liquid tank is disposed at a position higher than the fine bubble generating device, the pressure in the tank when the fine bubble generating operation control is performed becomes high, and when the liquid tank is disposed at a position lower than the fine bubble generating device, the pressure in the tank when the fine bubble generating operation control is performed becomes low. Further, in the case where the pressure loss in the tank discharge path is large (for example, in the case where the pipe diameter of at least a part of the tank discharge path is small or the pipe length is long), it is difficult to send the liquid from the tank to the tank discharge path, and therefore, the pressure in the tank at the time of performing the fine bubble generation operation control becomes high, and in the case where the pressure loss in the tank discharge path is small (for example, in the case where the pipe diameter of at least a part of the tank discharge path is large or the pipe length is short), it becomes easy to send the liquid from the tank to the tank discharge path, and therefore, the pressure in the tank at the time of performing the fine bubble generation operation control becomes low. Further, when the pressure loss in the tank supply path is small (for example, when the pipe diameter of at least a part of the tank supply path is large or the pipe length is short), the liquid is easily fed from the tank supply path to the tank, and therefore, the pressure in the tank when the microbubble generation operation control is performed becomes high, and when the pressure loss in the tank supply path is large (for example, when the pipe diameter of at least a part of the tank supply path is small or the pipe length is long), the liquid is not easily fed from the tank supply path to the tank, and therefore, the pressure in the tank when the microbubble generation operation control is performed becomes low. According to the above configuration, the rotation speed of the pressure pump in the microbubble generation operation control is adjusted according to the environmental parameter that affects the pressure in the tank when the microbubble generation operation control is performed, and therefore, the pressure in the tank when the microbubble generation operation control is performed can be stabilized.

Alternatively, the microbubble generator may further include a tank pressure sensor that is provided in the tank and detects a pressure in the tank as a tank pressure. The control device may be configured to adjust the rotation speed of the pressurization pump in accordance with the tank pressure detected by the tank pressure sensor during the microbubble generation operation control.

According to the above configuration, even when the pressure in the tank at the time of performing the operation control for generating the fine bubbles is affected by the environment in which the fine bubble generating device is installed or other factors, the pressure in the tank at the time of performing the operation control for generating the fine bubbles can be stabilized by adjusting the rotation speed of the pressurizing pump in accordance with the actual tank pressure detected by the tank pressure sensor.

In the microbubble generation device, the controller may be configured to decrease the rotation speed of the pressurization pump when the tank pressure detected by the tank pressure sensor exceeds a 1 st tank pressure and increase the rotation speed of the pressurization pump when the tank pressure is lower than a 2 nd tank pressure lower than the 1 st tank pressure in the microbubble generation operation control.

According to the above configuration, the pressure in the tank when the microbubble generating operation control is performed can be maintained between the 1 st tank pressure and the 2 nd tank pressure.

In the microbubble generator, the liquid may be water, and the liquid tank may be a bathtub for bathing by a user.

According to the above configuration, the micro bubbles can be generated stably and continuously in the water in the bathtub for bathing of the user.

Drawings

Fig. 1 is a diagram schematically showing the structure of a water heating apparatus 2 according to embodiment 1.

Fig. 2 is a view schematically showing a cross section of the bathtub adapter 132 of the hot water apparatus 2 according to embodiment 1.

Fig. 3 is a flowchart of processing performed by the control device 150 in the hot water injection operation control of the hot water apparatus 2 of embodiment 1.

Fig. 4 is a diagram schematically showing an example of the flow of water in the water heating apparatus 2 according to embodiment 1.

Fig. 5 is a diagram schematically showing another example of the flow of water in the hot water apparatus 2 according to embodiment 1.

Fig. 6 is a flowchart of the processing performed by the control device 150 in the control of the fine-bubble generation operation of the hot water apparatus 2 of embodiment 1.

Fig. 7 is a diagram schematically showing still another example of the flow of water in the water heating apparatus 2 according to embodiment 1.

Fig. 8 is a diagram schematically showing still another example of the flow of water in the water heating apparatus 2 according to embodiment 1.

Fig. 9 is a flowchart of processing performed by the control device 150 in the control of the microbubble generation operation of the water heating apparatus 2 of embodiment 2.

Fig. 10 is a flowchart of the processing performed by the control device 150 in the control of the microbubble generation operation of the hot water apparatus 2 of example 3.

Fig. 11 is a diagram showing an example of the rotational speed correction of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 in the hot water apparatus 2 of embodiment 4.

Fig. 12 is a diagram showing another example of the rotational speed correction of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 in the water heating apparatus 2 of embodiment 4.

Fig. 13 is a diagram showing still another example of the rotational speed correction of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 in the hot water apparatus 2 of embodiment 4.

Fig. 14 is a diagram schematically showing the structure of a water heating apparatus 2 according to embodiment 5.

Fig. 15 is a flowchart of a process performed by the control device 150 in parallel with the process shown in fig. 6 in the control of the microbubble generation operation of the hot water apparatus 2 according to example 5.

Fig. 16 is a diagram schematically showing an example of the flow of water in the hot water apparatus 2 according to another modification.

Description of the reference numerals

2: a hot water device; 10: a heat source unit; 12: 1 st heat source machine; 14: a 2 nd heat source machine; 16: a water supply path; 18: a hot water path; 18 a: a hot water temperature thermistor; 20: a bypass path; 22: bypassing the servo mechanism; 24: a hot water injection path; 26: a hot water injection valve; 28: a water quantity sensor; 30: circularly going to the road; 30 a: circulating the outgoing thermistor; 32: a circulation loop; 32 a: a circulating loop thermistor; 34: a bathtub circulating pump; 36: a water flow switch; 50: an air pressurization dissolving unit; 52: a storage tank; 52 a: a low water level electrode; 52 b: a high water level electrode; 52 c: a ground electrode; 54: a tank pressure sensor; 60: a heat source circuit; 62: a No. 1 bathtub waterway; 64: the storage tank goes to the road; 66: a communication path; 68: a heat source goes to the road; 70: a 2 nd bathtub waterway; 74: a tank circuit; 74 a: a water supply port; 80: a 1 st three-way valve; 82: a 2 nd three-way valve; 84: a one-way valve; 86: a storage tank water supply valve; 88: 1 st pressure pump; 90: a 2 nd pressurizing pump; 92: a storage tank circulation path; 92 a: an outflow port; 92 b: an inflow port; 94: a storage tank circulation pump; 96: a gas introduction mechanism; 98: a water inlet pipe; 100: a water outlet pipe; 102: a venturi; 104: a gas introduction path; 104 a: a gas inlet; 106: a gas introduction valve; 130: a bathtub; 130 a: a wall portion; 132: a bathtub adapter; 132 a: a front surface; 132 b: a lower surface; 134 a: 1 st discharge port; 134 b: a 1 st suction inlet; 134 c: a 2 nd suction inlet; 134 d: a 2 nd discharge port; 136: a 1 st waterway; 136 a: a 1 st discharge path; 136 b: 1 st inhalation path; 138: a 2 nd waterway; 138 a: a 2 nd discharge path; 138 b: a 2 nd suction path; 140 a: a non-return portion; 140 b: a non-return portion; 140 c: a non-return portion; 140 d: a non-return portion; 142: a micro-bubble generating nozzle; 150: a control device; 152: a memory; 154: remote control; 200: a water supply source; 250: a faucet.

Detailed Description

(example 1)

As shown in fig. 1, the hot water device 2 of the present embodiment has a heat source unit 10, an air pressurizing and dissolving unit 50, a bathtub adapter 132, and a control device 150. The hot water supply device 2 can heat water supplied from a water supply source 200 such as tap water and supply the water heated to a desired temperature to a faucet 250 installed in a kitchen or the like and a bathtub 130 installed in a bathroom. The water heating apparatus 2 can generate fine bubbles in water in the bathtub 130 for bathing of the user.

(Structure of Heat Source Unit 10)

The heat source unit 10 has a 1 st heat source machine 12, a 2 nd heat source machine 14, a water feed path 16, a hot water path 18, a bypass path 20, a bypass servo 22, a hot water injection path 24, a hot water injection valve 26, a water amount sensor 28, a circulation going path 30, a circulation circuit 32, a bathtub circulation pump 34, and a water flow switch 36.

The upstream end of the water feed path 16 is connected to the water supply source 200, and the downstream end of the water feed path 16 is connected to the 1 st heat source unit 12. The upstream end of the hot water path 18 is connected to the 1 st heat source unit 12, and the downstream end of the hot water path 18 is connected to the faucet 250. The 1 st heat source device 12 is a combustion heat source device that heats water by combustion of gas, for example. The 1 st heat source unit 12 heats water flowing in from the water supply path 16, and sends the heated water to the hot water path 18.

An upstream end of the bypass passage 20 is connected to the feed water passage 16, and a downstream end of the bypass passage 20 is connected to the hot water passage 18. The bypass servo 22 is provided at a portion where the bypass passage 20 is connected to the water supply passage 16. The bypass servo 22 can adjust the ratio of the flow rate of water flowing from the water supply path 16 to the hot water path 18 via the 1 st heat source unit 12 to the flow rate of water flowing from the water supply path 16 to the hot water path 18 via the bypass path 20 by adjusting the opening degree of the valve element incorporated therein. By adjusting the opening degree of the bypass servo 22, the high-temperature water flowing in from the 1 st heat source unit 12 and the low-temperature water flowing in from the bypass passage 20 are mixed in a desired ratio and supplied to the hot water passage 18 on the downstream side of the portion connected to the bypass passage 20, and the water adjusted to a desired temperature is supplied. A hot water temperature thermistor 18a is provided in the hot water path 18 on the downstream side of the portion where the bypass path 20 is connected, and the hot water temperature thermistor 18a detects the temperature of water in the hot water path 18.

The hot water injection path 24 has an upstream end connected to the hot water path 18 on the downstream side of the portion connected to the bypass path 20, and a downstream end connected to the circulation circuit 32 in the hot water injection path 24. The hot water injection valve 26 is provided in the hot water injection path 24 and opens and closes the hot water injection path 24. The hot water injection valve 26 is normally in a closed state. The water amount sensor 28 is provided in the hot water supply path 24, and detects the amount of water flowing through the hot water supply path 24.

An upstream end of the circulation circuit 32 is connected to a heat source circuit 60 (details will be described later) of the air pressurization dissolution unit 50, and a downstream end of the circulation circuit 32 is connected to the 2 nd heat source unit 14. The upstream end of the circulation outward path 30 is connected to the 2 nd heat source unit 14, and the downstream end of the circulation outward path 30 is connected to a heat source outward path 68 (details will be described later) of the air pressurization dissolution unit 50. The 2 nd heat source unit 14 is a combustion heat source unit that heats water by combustion of gas, for example. The 2 nd heat source unit 14 heats water flowing in from the circulation circuit 32, and sends the heated water to the circulation circuit 30. A circulation circuit thermistor 32a that detects the temperature of water in the circulation circuit 32 is provided near the upstream end of the circulation circuit 32. A circulation outgoing path thermistor 30a for detecting the temperature of the water in the circulation outgoing path 30 is provided in the vicinity of the downstream end of the circulation outgoing path 30.

The bathtub circulation pump 34 is provided in the circulation circuit 32 on the downstream side of the connection point of the hot water supply path 24, and sends the water in the circulation circuit 32 to the 2 nd heat source unit 14. The water flow switch 36 is provided between the bathtub circulating pump 34 and the 2 nd heat source unit 14 in the circulation circuit 32, and detects whether or not water flows through the circulation circuit 32.

(Structure of air pressurizing dissolving Unit 50)

The air pressurizing and dissolving unit 50 includes a storage tank 52, a heat source circuit 60, a heat source outward passage 68, a storage tank circuit 74, a storage tank outward passage 64, a communication passage 66, a 1 st three-way valve 80, a 2 nd three-way valve 82, a check valve 84, a storage tank water feed valve 86, a 1 st pressurizing pump 88, a 2 nd pressurizing pump 90, a storage tank circulation passage 92, a storage tank circulation pump 94, and a gas introduction mechanism 96.

The tank 52 is capable of storing water therein. A low water level electrode 52a, a high water level electrode 52b, and a ground electrode 52c for detecting the water level in the tank 52 are provided inside the tank 52. The water level detected by the low water level electrode 52a (hereinafter also referred to as a lower limit water level) is lower than the water level detected by the high water level electrode 52b (hereinafter also referred to as an upper limit water level). When the low water level electrode 52a and the high water level electrode 52b contact the water surface of the water stored in the tank 52, a current flows between the low water level electrode 52a, the high water level electrode 52b, and the ground electrode 52c, and therefore, an ON signal is output to the control device 150. The tank 52 is used to dissolve air into water under pressure to generate air-dissolved water.

One end of the heat source circuit 60 is connected to the communication path 66, and the other end of the heat source circuit 60 is connected to the circulation circuit 32 of the heat source unit 10. The communication path 66 connects the 1 st three-way valve 80 and the 2 nd three-way valve 82. The 1 st three-way valve 80 is connected to the communication passage 66, the 1 st bathtub water passage 62, and the tank outward passage 64. The 1 st three-way valve 80 can switch between a 1 st communication state (see fig. 7 and 8) in which the tank outward passage 64 and the 1 st bath water passage 62 communicate with each other, a 2 nd communication state (see fig. 1) in which the tank outward passage 64 and the communication passage 66 communicate with each other, and a 3 rd communication state (see fig. 4 and 5) in which the 1 st bath water passage 62, the tank outward passage 64, and the communication passage 66 communicate with each other. An upstream end of the tank outward passage 64 is connected to a lower portion of the tank 52, and a downstream end of the tank outward passage 64 is connected to the 1 st three-way valve 80. A check valve 84 is provided in the tank outward path 64, and the check valve 84 allows the water to flow from the tank 52 to the 1 st three-way valve 80 and prohibits the water from flowing from the 1 st three-way valve 80 to the tank 52. One end of the 1 st bath water path 62 is connected to the 1 st three-way valve 80, and the other end of the 1 st bath water path 62 is connected to the bath adapter 132.

One end of the heat source outward path 68 is connected to the circulation outward path 30 of the heat source unit 10, and the other end of the heat source outward path 68 is connected to the 2 nd three-way valve 82. The 2 nd three-way valve 82 is connected to the communication passage 66, the heat source outward passage 68, and the 2 nd bathtub water passage 70. The 2 nd three-way valve 82 can switch between a 4 th communication state (see fig. 7 and 8) in which the 2 nd bathtub water passage 70 and the communication passage 66 communicate with each other, and a 5 th communication state (see fig. 1, 4, and 5) in which the heat source outward passage 68 and the 2 nd bathtub water passage 70 communicate with each other. One end of the 2 nd bathtub water circuit 70 is connected to the 2 nd three-way valve 82, and the other end of the 2 nd bathtub water circuit 70 is connected to the bathtub adapter 132.

An upstream end of the tank circuit 74 is connected to the heat source outgoing line 68, and a downstream end of the tank circuit 74 is connected to the tank 52 through a water feed port 74 a. The tank water feed valve 86 is provided in the tank circuit 74, and opens and closes the tank circuit 74. The tank feed valve 86 is normally closed. A 1 st pressurizing pump 88 and a 2 nd pressurizing pump 90 are provided between the tank water feed valve 86 and the tank 52 in the tank circuit 74. The 1 st and 2 nd pressurizing pumps 88 and 90 pressurize the water of the tank circuit 74 and send it to the tank 52. In the tank circuit 74, the 1 st pressurizing pump 88 is disposed upstream of the 2 nd pressurizing pump 90.

An upstream end (hereinafter, also referred to as an outlet 92a) of the tank circulation path 92 is connected to the bottom of the tank 52, and a downstream end (hereinafter, also referred to as an inlet 92b) of the tank circulation path 92 is connected to the top of the tank 52. The water level at the portion of the tank circulation path 92 where the outlet 92a is connected to the tank 52 is lower than the lower limit water level detected by the low water level electrode 52a, and the water level at the portion of the tank circulation path 92 where the inlet 92b is connected to the tank 52 is higher than the upper limit water level detected by the high water level electrode 52 b. A tank circulation pump 94 is provided in the tank circulation path 92. The tank circulation pump 94 sucks the water in the tank 52 into the tank circulation path 92 through the outflow port 92a, and discharges the water in the tank circulation path 92 into the tank 52 through the inflow port 92 b.

The gas introduction mechanism 96 is provided in the accumulator circulation path 92 on the upstream side of the accumulator circulation pump 94. The gas introduction mechanism 96 has a water inlet pipe 98, a water outlet pipe 100, a venturi 102, a gas introduction path 104, and a gas introduction valve 106. Water flows into the water inlet pipe 98 from the upstream side of the tank circulation path 92. The water outlet pipe 100 allows water to flow out to the downstream side of the tank circulation path 92. The venturi 102 communicates the inlet 98 and outlet 100 pipes. The venturi 102 has a smaller diameter than the inlet 98 and outlet 100 tubes. The water flowing through the gas introduction mechanism 96 is depressurized to a pressure lower than the atmospheric pressure when flowing from the water inlet pipe 98 to the venturi 102, and is increased to the original pressure when flowing from the venturi 102 to the water outlet pipe 100. The gas introduction path 104 has an upstream end (hereinafter, also referred to as a gas introduction port 104a) opened to the atmosphere and a downstream end connected to the venturi 102. The gas introduction valve 106 is provided in the gas introduction path 104, and opens and closes the gas introduction path 104. When water flows through the gas introduction mechanism 96, air is sucked into the gas introduction path 104 from the gas introduction port 104a with the gas introduction valve 106 in an open state, and the air is mixed with the water flowing through the venturi 102. The air introduced through the gas introduction path 104 flows into the reservoir 52 together with the water flowing through the reservoir circulation path 92. The gas introduction valve 106 is normally in a closed state.

If the gas introduction mechanism 96 as described above is provided in the tank circuit 74, air can be introduced by the gas introduction mechanism 96 when water is supplied from the tank circuit 74 to the tank 52. However, in the case of such a configuration, the pressure loss of the tank circuit 74 becomes large, and the pressure of the water to be supplied to the tank 52 by the 1 st and 2 nd pressurizing pumps 88 and 90 decreases. In the case of such a configuration, when the amount of air introduced into the gas introduction mechanism 96 is increased, the pressure of water supplied to the reservoir 52 is decreased, and when the pressure of water supplied to the reservoir 52 is increased, the amount of air introduced into the gas introduction mechanism 96 is decreased. In contrast, in the present embodiment, since the gas introduction mechanism 96 is provided in the tank circulation path 92 provided separately from the tank circuit 74, the pressure loss of the tank circuit 74 can be reduced. Further, while water is sent from the tank circuit 74 to the tank 52 at high pressure, a large amount of air can be introduced by the gas introduction mechanism 96.

(Structure of bathtub adapter 132)

Next, referring to (a) and (b) in fig. 2, the bathtub adapter 132 provided in the wall portion 130a of the bathtub 130 will be described. Fig. 2 (a) shows the flow of water in the bathtub adapter 132 in a state where water flows from the 1 st bathtub water circuit 62 to the bathtub 130 and water flows from the bathtub 130 to the 2 nd bathtub water circuit 70 (for example, the state of fig. 7). Fig. 2 (b) shows the flow of water in the bathtub adapter 132 in a state where water flows from the bathtub 130 to the 1 st bathtub water circuit 62 and water flows from the 2 nd bathtub water circuit 70 to the bathtub 130 (for example, the state of fig. 5).

The bathtub adapter 132 has a 1 st waterway 136 and a 2 nd waterway 138. A1 st water path 136 communicates with the 1 st bath water path 62 and a 2 nd water path 138 communicates with the 2 nd bath water path 70. The 1 st water path 136 branches into a 1 st discharge path 136a and a 1 st suction path 136 b. The 1 st drain path 136a communicates with the 1 st drain port 134a provided in the front surface 132a of the bathtub adapter 132. The water discharged from the 1 st water outlet 134a into the bathtub 130 is discharged to the front of the wall portion 130a of the bathtub 130, that is, in the direction perpendicular to the wall portion 130a of the bathtub 130. The 1 st discharge path 136a is provided with: a check part 140a that prevents water from flowing from the bathtub 130 to the 1 st bathtub water path 62; and a fine bubble generating nozzle 142 disposed upstream (on the 1 st bath water channel 62 side) of the check portion 140 a. The fine bubble generating nozzle 142 decompresses water passing through the fine bubble generating nozzle 142. The 1 st suction path 136b communicates with the 1 st suction port 134b provided in the front surface 132a of the bathtub adapter 132. The 1 st suction path 136b is provided with a check portion 140b, and the check portion 140b prevents water from flowing from the 1 st bathtub water path 62 to the bathtub 130.

The 2 nd water path 138 is branched into a 2 nd discharge path 138a and a 2 nd suction path 138 b. The 2 nd suction path 138b communicates with the 2 nd suction port 134c provided in the front surface 132a of the bathtub adapter 132. The 2 nd suction path 138b is provided with a check portion 140c, and the check portion 140c prevents water from flowing from the 2 nd bathtub water path 70 to the bathtub 130. The 2 nd discharge path 138a communicates with the 2 nd discharge port 134d provided in the lower surface 132b of the bathtub adapter 132. The water discharged from the 2 nd discharge port 134d is discharged downward, i.e., in a direction parallel to the wall portion 130a of the bathtub 130. A check portion 140d is provided in the 2 nd discharge path 138a, and the check portion 140d prevents water from flowing from the bathtub 130 to the 2 nd bathtub water path 70.

(construction of the control device 150)

The controller 150 shown in fig. 1 controls the operations of the respective components of the heat source unit 10 and the air pressure dissolving unit 50. The control device 150 is configured to be able to communicate with a remote controller 154 that can be operated and controlled by a user. The control device 150 includes a memory 152, and can store various settings such as a set temperature or a set water amount in hot water injection operation control and a set temperature in reheating operation control, which are input by a user. The user can instruct the start or end of hot water injection operation control, fine bubble generation operation control, and reheating operation control, which will be described later, through the remote controller 154.

(Hot Water injection operation control)

The hot water injection operation control is started in a case where the user instructs to start the hot water injection operation control through the remote controller 154. Alternatively, the hot water injection operation control may be started when the user sets the start timing of the hot water injection operation control in advance by the remote controller 154 and the control device 150 determines that the start timing of the hot water injection operation control has come. When the hot water injection operation control is started, the controller 150 brings the 1 st three-way valve 80 and the 2 nd three-way valve 82 into the 3 rd communication state and the 5 th communication state, respectively (see fig. 4 and 5). In this state, the control device 150 performs the processing shown in fig. 3.

In S2, control device 150 performs an exhaust gas treatment. Specifically, the control device 150 opens the hot water injection valve 26, and starts heating the water by the 1 st heat source unit 12. Accordingly, as shown in fig. 4, the water adjusted to the set temperature flows from the hot water path 18 into the circulation circuit 32 via the hot water injection path 24. The water flowing into the circulation circuit 32 is split into the upstream side (i.e., the heat source circuit 60) and the downstream side (i.e., the 2 nd heat source unit 14). The water flowing from the circulation circuit 32 to the heat source circuit 60 flows into the bathtub 130 via the communication passage 66, the 1 st three-way valve 80, the 1 st bathtub water passage 62, and the bathtub adapter 132. The water flowing from the circulation circuit 32 to the 2 nd heat source unit 14 flows into the bathtub 130 via the outward circulation path 30, the heat source outward passage 68, the 2 nd three-way valve 82, the 2 nd bathtub water passage 70, and the bathtub adapter 132. Accordingly, the 1 st and 2 nd

bathtub water paths

62 and 70 are filled with water, and the air remaining in the 1 st and 2 nd

bathtub water paths

62 and 70 is discharged into the bathtub 130. When the accumulated water amount detected by the water amount sensor 28 reaches a predetermined value (for example, 6L), the control device 150 closes the hot water injection valve 26, ends the heating of the 1 st heat source unit 12, and ends the exhaust gas treatment.

In S4, controller 150 performs a remaining water detection process for bathtub 130. Specifically, as shown in fig. 5, the controller 150 drives the bathtub circulating pump 34, and determines whether or not there is any remaining water in the bathtub 130 based on whether or not the water flow switch 36 detects water flow. In the case where there is no remaining water in the bathtub 130 and the bathtub adapter 132 is not immersed in water, the water flow switch 36 does not detect the water flow even if the bathtub circulating pump 34 is driven. In contrast, in the case where the bathtub adapter 132 is immersed in water with water remaining in the bathtub 130, the water flow switch 36 detects the water flow when the bathtub circulation pump 34 is driven. If there is water remaining in the bathtub 130 in S4 (yes), the process proceeds to S6. In the case where there is no remaining water in the bathtub 130 in S4 (in the case of no), the process proceeds to S10.

In S6, controller 150 performs a process of determining the remaining water amount in bath 130. Specifically, the controller 150 drives the bathtub circulating pump 34, and stores the temperature detected by the circulation circuit thermistor 32a as the pre-heating temperature. After that, the control device 150 starts heating of the water by the 2 nd heat source unit 14. Accordingly, as shown in fig. 5, the remaining water in the bathtub 130 is sent to the 2 nd heat source unit 14 via the bathtub adapter 132, the 1 st bathtub water passage 62, the 1 st three-way valve 80, the communication passage 66, the heat source circuit 60, and the circulation circuit 32. The surplus water heated by the 2 nd heat source unit 14 is returned to the bathtub 130 via the circulation outward passage 30, the heat source outward passage 68, the 2 nd three-way valve 82, the 2 nd bathtub water passage 70, and the bathtub adapter 132. When the temperature detected by the circulation circuit thermistor 32a reaches the set temperature or higher, the control device 150 stores the temperature detected by the circulation circuit thermistor 32a as the post-heating temperature, then stops the bathtub circulating pump 34, and ends the heating of the water by the 2 nd heat source unit 14. Then, the control device 150 calculates the remaining water amount of the bathtub 130 based on the temperature increase width of the pre-heating temperature subtracted from the post-heating temperature and the accumulated heating amount in the 2 nd heat source machine 14 in S6.

In S8, the controller 150 updates the set water amount in the hot water injection operation control by subtracting the remaining water amount of the bathtub 130 determined in S6 from the set water amount in the hot water injection operation control.

In S10, the controller 150 opens the hot water injection valve 26 to start heating by the 1 st heat source unit 12. Accordingly, as shown in fig. 4, the water adjusted to the set temperature flows from the hot water path 18 into the circulation circuit 32 via the hot water injection path 24. The water flowing into the circulation circuit 32 is split into the upstream side (i.e., the heat source circuit 60) and the downstream side (i.e., the 2 nd heat source unit 14). The water flowing from the circulation circuit 32 to the heat source circuit 60 flows into the bathtub 130 via the communication passage 66, the 1 st three-way valve 80, the 1 st bathtub water passage 62, and the bathtub adapter 132. The water flowing from the circulation circuit 32 to the 2 nd heat source unit 14 flows into the bathtub 130 via the circulation outward passage 30, the heat source outward passage 68, the 2 nd three-way valve 82, the 2 nd bathtub water passage 70, and the bathtub adapter 132.

In S12, the control device 150 stands by until the accumulated water amount detected by the water amount sensor 28 reaches the set water amount in the hot water injection operation control. The cumulative water amount here means a water amount obtained by summing the cumulative water amount detected by the water amount sensor 28 in the exhaust processing at S2 and the cumulative water amount after the start of the injection of hot water into the bathtub 130 at S10. When the accumulated water amount reaches the set water amount (when yes), the process proceeds to S14.

In S14, the controller 150 closes the hot water injection valve 26 to end the heating of the water by the 1 st heat source unit 12.

In S16, the control device 150 drives the bathtub circulating pump 34, and acquires the temperature detected by the circulating loop thermistor 32a as the bathtub water temperature. Then, the controller 150 determines whether or not the temperature of the bathtub water is equal to or higher than a set temperature. If the temperature of the bathtub water has not reached the set temperature (no), the process proceeds to S18. If the temperature of the bathtub water is equal to or higher than the set temperature (yes), the process proceeds to S20.

In S18, controller 150 performs a reheating process of the water in tub 130. Specifically, the control device 150 drives the bathtub circulating pump 34, and starts heating of water by the 2 nd heat source machine 14. Accordingly, as shown in fig. 5, the water in the bathtub 130 is sent to the 2 nd heat source unit 14 via the bathtub adapter 132, the 1 st bathtub water passage 62, the 1 st three-way valve 80, the communication passage 66, the heat source circuit 60, and the circulation circuit 32. The water heated by the 2 nd heat source unit 14 is returned to the bathtub 130 via the circulation outgoing path 30, the heat source outgoing path 68, the 2 nd three-way valve 82, the 2 nd bathtub water path 70, and the bathtub adapter 132. When the temperature detected by the circulation circuit thermistor 32a becomes equal to or higher than the set temperature, the control device 150 stops the bathtub circulation pump 34 and ends the heating of the water by the 2 nd heat source unit 14.

In S20, the control device 150 informs the user that the hot water injection operation control has ended through the remote controller 154. After S20, the process of fig. 3 ends.

(operation control for generating minute bubble)

The microbubble generation operation control starts when the user instructs to start the microbubble generation operation control using the remote controller 154. In the hot water supply system 2 of the present embodiment, the fine bubble generation operation control is also automatically started after the hot water injection operation control is completed. That is, the fine bubble generation operation control is performed in conjunction with the hot water injection operation control. When the microbubble generating operation control is started, the controller 150 brings the 1 st three-way valve 80 and the 2 nd three-way valve 82 into the 3 rd communication state and the 5 th communication state, respectively (see fig. 4 and 5). In this state, the control device 150 performs the processing shown in fig. 6.

In S32, the control device 150 performs a cold water mitigation process. Specifically, when the temperatures detected by the outgoing circulation thermistor 30a and the return circulation thermistor 32a are equal to or lower than a predetermined temperature, the controller 150 drives the bathtub circulation pump 34 and starts heating the water by the 2 nd heat source unit 14. When low-temperature water remains in the external circulation path 30 and the external circulation path 32, the cold water relief process causes the low-temperature water to flow into the bathtub adapter 132 via the heat source external circulation path 68, the 2 nd three-way valve 82, and the 2 nd bathtub water passage 70, and to be discharged into the bathtub 130 from the 2 nd discharge port 134d of the lower surface 132b of the bathtub adapter 132, as shown in fig. 5. Therefore, even if the user takes a bath in the bathtub 130, it is possible to suppress the low-temperature water from being directly discharged to the body of the user. When a predetermined time has elapsed from the start of the cold water alleviation treatment, the controller 150 stops the bathtub circulation pump 34, ends the heating of the water by the 2 nd heat source unit 14, and ends the cold water alleviation treatment.

In S34, the control device 150 drives the tank circulation pump 94. Accordingly, water circulates between the storage tank 52 and the storage tank circulation path 92.

In S36, control device 150 opens gas introduction valve 106. Accordingly, air is introduced into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92.

In S38, control device 150 starts supplying air-dissolved water from tank 52 to bath 130. Specifically, as shown in fig. 7, the controller 150 brings the 1 st three-way valve 80 into the 1 st communication state and the 2 nd three-way valve 82 into the 4 th communication state, and drives the bathtub circulating pump 34, the 1 st pressurizing pump 88, and the 2 nd pressurizing pump 90. Accordingly, the water in the bathtub 130 is supplied to the reservoir 52 via the bathtub adapter 132, the 2 nd bathtub water passage 70, the 2 nd three-way valve 82, the communication passage 66, the heat source circuit 60, the circulation circuit 32, the 2 nd heat source unit 14, the circulation outward passage 30, the heat source outward passage 68, and the reservoir circuit 74. At this time, the water pressurized by the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 is supplied from the tank circuit 74 to the tank 52. Accordingly, the air is dissolved in the water under pressure inside the storage tank 52. Then, the water in which the air is dissolved under pressure is supplied from the reservoir 52 to the bathtub 130 via the reservoir outward passage 64, the 1 st three-way valve 80, the 1 st bathtub water passage 62, and the bathtub adapter 132. At this time, the water containing the pressurized dissolved air is depressurized to atmospheric pressure or less when passing through the fine bubble generating nozzle 142 of the 1 st discharge path 136a of the bathtub adapter 132, and is pressurized to atmospheric pressure when being discharged into the bathtub 130, so that fine bubbles are generated in the water in the bathtub 130.

In S40, the controller 150 determines whether the water level of the reservoir 52 is lower than the lower limit water level based on the detection signal from the low water level electrode 52 a. In the present embodiment, in the gas introduction mechanism 96, the amount of air introduced when the gas introduction valve 106 is opened is larger than the amount of air of fine bubbles generated in the water in the bathtub 130. Therefore, in the state where the gas introduction valve 106 is opened, the amount of air in the reservoir 52 increases, and the water level of the reservoir 52 decreases. In the case where the water level of the reservoir 52 is lower than the lower limit water level (in the case of yes), the process proceeds to S42. If the water level in the reservoir 52 is not lower than the lower limit water level (no), the process proceeds to S44.

In S42, when gas introduction valve 106 is in the open state, control device 150 closes gas introduction valve 106. Accordingly, the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is stopped. Further, in the present embodiment, the tank circulation pump 94 is still continuously driven during the time when the gas introduction valve 106 is closed. Accordingly, the flow of water within the tank 52 is facilitated, thereby facilitating pressurized dissolution of air in the water in the tank 52.

In S44, the controller 150 determines whether the water level of the reservoir 52 is equal to or higher than the upper limit water level based on the detection signal from the high water level electrode 52 b. In a state where the gas introduction valve 106 is closed, air is not supplied to the reservoir 52, and therefore the amount of air in the reservoir 52 decreases, and the water level of the reservoir 52 rises. If the water level of the reservoir 52 is not lower than the upper limit water level (yes), the process proceeds to S46. In the case where the water level of the reservoir 52 is lower than the upper limit water level (in the case of no), the process proceeds to S48.

In S46, control device 150 opens gas introduction valve 106 with gas introduction valve 106 in the closed state. Accordingly, the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is restarted.

In S48, the control device 150 determines whether or not the operation control time of the microbubble generation operation control reaches a set time. Here, the operation control time of the minute-bubble generating operation control is an elapsed time from the start of the minute-bubble generating operation control. In the hot water apparatus 2 of the present embodiment, when the fine bubble generation operation control is performed alone without being linked to the hot water injection operation control, the set time is set to, for example, 10 minutes. On the other hand, when the fine bubble generation operation control is performed in conjunction with the hot water injection operation control, the set time is set to, for example, 30 minutes. If the operation control time has not reached the set time (no), the process returns to S40. When the operation control time reaches the set time (yes), the process proceeds to S50.

In S50, the controller 150 stops the bathtub circulating pump 34, the 1 st pressurizing pump 88, and the 2 nd pressurizing pump 90, and ends the supply of the air-dissolved water from the reservoir 52 to the bathtub 130.

In S52, the control device 150 closes the gas introduction valve 106 when the gas introduction valve 106 is in the open state. This completes the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92.

In S54, the controller 150 performs a tank cleaning process. Specifically, the control device 150 opens the hot water injection valve 26, and starts heating the water by the 1 st heat source unit 12. Accordingly, as shown in fig. 8, the water adjusted to the set temperature flows from the hot water path 18 into the circulation circuit 32 via the hot water injection path 24. The water flowing into the circulation circuit 32 is split into the upstream side (i.e., the heat source circuit 60) and the downstream side (i.e., the 2 nd heat source unit 14). The water flowing from the circulation circuit 32 to the heat source circuit 60 flows into the bathtub 130 via the communication passage 66, the 2 nd three-way valve 82, the 2 nd bathtub water passage 70, and the bathtub adapter 132. The water flowing from the circulation circuit 32 to the 2 nd heat source unit 14 flows into the bathtub 130 via the outward circulation circuit 30, the outward heat source circuit 68, the reservoir circuit 74, the reservoir 52, the outward reservoir circuit 64, the 1 st three-way valve 80, the 1 st bathtub water circuit 62, and the bathtub adapter 132. Accordingly, the inside of the accumulator 52 and the accumulator circulation path 92 are cleaned.

In S56, the control device 150 stops the tank circulation pump 94. Accordingly, the circulation of water between the reservoir 52 and the reservoir circulation path 92 is ended. After S56, the process of fig. 6 ends.

(reheating operation control)

The reheating operation control is started when the user instructs to start the reheating operation control through the remote controller 154. When the reheating operation control is started, the controller 150 brings the 1 st three-way valve 80 into the 3 rd communication state and brings the 2 nd three-way valve 82 into the 5 th communication state (see fig. 4 and 5). In this state, the control device 150 drives the bathtub circulating pump 34, and starts heating of water by the 2 nd heat source machine 14. Accordingly, as shown in fig. 5, the water in the bathtub 130 is sent to the 2 nd heat source unit 14 via the bathtub adapter 132, the 1 st bathtub water passage 62, the 1 st three-way valve 80, the communication passage 66, the heat source circuit 60, and the circulation circuit 32. The water heated by the 2 nd heat source unit 14 is returned to the bathtub 130 via the circulation outgoing path 30, the heat source outgoing path 68, the 2 nd three-way valve 82, the 2 nd bathtub water path 70, and the bathtub adapter 132. When the temperature detected by the circulation circuit thermistor 32a becomes equal to or higher than the set temperature, the control device 150 stops the bathtub circulation pump 34 and ends the heating of the water by the 2 nd heat source unit 14. After that, the control device 150 informs the user of the completion of the reheating operation control through the remote controller 154, and ends the reheating operation control.

(example 2)

The hot water apparatus 2 of the present embodiment has substantially the same configuration as the hot water apparatus 2 of embodiment 1. In the water heating apparatus 2 of the present embodiment, when the microbubble generation operation control is performed, the control device 150 performs the processing shown in fig. 9 instead of performing the processing shown in fig. 6. Next, the difference between the processing shown in fig. 9 and the processing shown in fig. 6 will be described.

In the processing shown in fig. 9, in S40, in the case where the water level of the reservoir 52 is lower than the lower limit water level (in the case of yes), the processing proceeds to S58. In S58, the control device 150 decreases the rotation speed of the tank circulation pump 94. Accordingly, the amount of air introduced into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is reduced. After S58, the process advances to S44.

In the processing shown in fig. 9, if the water level of the reservoir 52 is not lower than the upper limit water level (yes) in S44, the processing proceeds to S60. In S60, the control device 150 increases the rotation speed of the tank circulation pump 94. Accordingly, the amount of air introduced into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 increases. After S58, the process advances to S48.

(example 3)

The hot water apparatus 2 of the present embodiment has substantially the same configuration as the hot water apparatus 2 of embodiment 1. In the water heating apparatus 2 of the present embodiment, when the microbubble generation operation control is performed, the control device 150 performs the processing shown in fig. 10 instead of performing the processing shown in fig. 6. Next, the processing shown in fig. 10 is different from the processing shown in fig. 6.

In the process shown in fig. 10, after the supply of the air-dissolved water from the reservoir 52 to the bathtub 130 is started in S38, the process proceeds to S62. In S62, the controller 150 determines whether the water level of the reservoir 52 is lower than the lower limit water level based on the detection signal from the low water level electrode 52 a. If the water level of the reservoir 52 is not lower than the lower limit water level (no), the process repeats S62. In the case where the water level of the reservoir 52 is lower than the lower limit water level (in the case of yes), the process proceeds to S64.

In S64, control device 150 closes gas introduction valve 106. Accordingly, the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is stopped. In the present embodiment, the tank circulation pump 94 is also continuously driven while the gas introduction valve 106 is closed. Accordingly, the flow of water within the tank 52 is facilitated, thereby facilitating pressurized dissolution of air in the water in the tank 52.

In S66, the controller 150 determines whether the water level of the reservoir 52 is equal to or higher than the upper limit water level based on the detection signal from the high water level electrode 52 b. If the water level of the reservoir 52 is not lower than the upper limit water level (yes), the process proceeds to S68. In the case where the water level of the reservoir 52 is lower than the upper limit water level (in the case of no), the process proceeds to S72.

In S68, control device 150 opens gas introduction valve 106. Accordingly, the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is restarted.

In S70, the control device 150 starts the measurement of the intake time using a built-in timer (not shown).

In S72, the controller 150 determines whether the water level of the reservoir 52 is lower than the lower limit water level based on the detection signal from the low water level electrode 52 a. If the water level in the reservoir 52 is not lower than the lower limit water level (no), the process proceeds to S86. In the case where the water level of the reservoir 52 is lower than the lower limit water level (in the case of yes), the process proceeds to S74.

In S74, control device 150 closes gas introduction valve 106. Accordingly, the introduction of air into the water flowing through the gas introduction mechanism 96 of the accumulator circulation path 92 is stopped.

In S76, the control device 150 ends the measurement of the intake air time by a built-in timer (not shown).

In S78, the controller 150 determines whether or not the intake time counted in S70 and S76 is shorter than a predetermined lower limit time (for example, 10 seconds). If the intake time is shorter than the lower limit time (yes), the process proceeds to S80. If the intake time is equal to or longer than the lower limit time (no), the process proceeds to S82.

In S80, the controller 150 decreases the rotation speed of the tank circulation pump 94 by a predetermined value (e.g., 10 Hz). Accordingly, when the accumulator circulation pump 94 is driven with the gas introduction valve 106 opened thereafter, the amount of air introduced by the gas introduction mechanism 96 is reduced. After S80, the process advances to S82.

In S82, the controller 150 determines whether or not the intake time exceeds a predetermined upper limit time (for example, 20 seconds). If the intake time exceeds the upper limit time (yes), the process proceeds to S84. If the intake time is equal to or less than the upper limit time (no), the process proceeds to S86.

In S84, the controller 150 increases the rotation speed of the tank circulation pump 94 by a predetermined value (e.g., 10 Hz). Accordingly, when the accumulator circulation pump 94 is driven with the gas introduction valve 106 opened thereafter, the amount of air introduced by the gas introduction mechanism 96 increases. After S84, the process advances to S86.

In S86, the control device 150 determines whether or not the operation control time of the microbubble generation operation control reaches a set time. If the operation control time has not reached the set time (no), the process returns to S66. When the operation control time reaches the set time (yes), the process proceeds to S50.

In S80 of the process shown in fig. 10, the control device 150 may be configured to reduce the rotation speed of the tank circulation pump 94 when the tank circulation pump 94 is driven with the gas introduction valve 106 opened thereafter, but not to reduce the rotation speed of the tank circulation pump 94 when the tank circulation pump 94 is driven with the gas introduction valve 106 closed thereafter. Similarly, in S84 of the process shown in fig. 10, the controller 150 may be configured to increase the rotation speed of the tank circulation pump 94 when the tank circulation pump 94 is driven with the gas introduction valve 106 opened thereafter, but not to increase the rotation speed of the tank circulation pump 94 when the tank circulation pump 94 is driven with the gas introduction valve 106 closed thereafter.

(example 4)

The hot water apparatus 2 of the present embodiment has substantially the same configuration as the hot water apparatus 2 of embodiment 1. In the water heating apparatus 2 of the present embodiment, the control device 150 corrects the rotation speed of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 when the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are driven in the microbubble generating operation control (see fig. 6) in accordance with the installation position of the bathtub 130, the pipe diameter and pipe length of the 1 st bathtub water passage 62, and the pipe diameter and pipe length of the 2 nd bathtub water passage 70. The installation position of the bathtub 130, the pipe diameter and pipe length of the 1 st bathtub water passage 62, and the pipe diameter and pipe length of the 2 nd bathtub water passage 70 are inputted to the control device 150 through a dip switch (not shown) provided in the control device 150, for example, when the construction worker installs the water heating apparatus 2 in a house.

For example, as shown in fig. 11, the control device 150 determines the correction amount for the rotation speed of the 1 st pressure pump 88 and the 2 nd pressure pump 90 in accordance with the set position of the bathtub 130. In the example shown in fig. 11, when the installation position of bathtub 130 (for example, the installation position of bathtub adapter 132 installed in bathtub 130) is at the same height as the installation position of air pressurizing and dissolving unit 50 (for example, the connection position of 1 st

bathtub water circuit

62 and 2 nd bathtub water circuit 70 in air pressurizing and dissolving unit 50) (referred to as "level" in fig. 11), control device 150 sets the correction amount to ± 0 Hz. On the other hand, if the installation position of the bathtub 130 is 1.5m below the installation position of the air pressurization dissolution unit 50 (in fig. 11, the correction amount is referred to as "1.5 m below"), the control device 150 sets the correction amount to +5 Hz. If the installation position of the bath tube 130 is 3m above the installation position of the air pressurizing and dissolving unit 50 (referred to as "upper 3 m" in fig. 11), the control device 150 sets the correction amount to-5 Hz, and if the installation position of the bath tube 130 is 5m above the installation position of the air pressurizing and dissolving unit 50 (referred to as "upper 5 m" in fig. 11), the control device 150 sets the correction amount to-10 Hz.

When the installation position of the bathtub 130 is located at a position higher than the installation position of the air pressurizing and dissolving unit 50, the pressure in the storage tank 52 when the fine bubble generation operation control is performed becomes high accordingly. In contrast, when the installation position of the bathtub 130 is lower than the installation position of the air pressurization dissolving unit 50, the pressure in the reservoir 52 when the fine bubble generation operation control is performed is reduced accordingly. Therefore, as shown in fig. 11, by performing correction such that the rotational speeds of the 1 st and 2 nd pressurizing pumps 88, 90 are increased when the installation position of the bathtub 130 is high, and the rotational speeds of the 1 st and 2 nd pressurizing pumps 88, 90 are decreased when the installation position of the bathtub 130 is low, it is possible to suppress the influence of the difference in the installation position of the bathtub 130 on the pressure in the reservoir 52.

And/or, as shown in fig. 12, the controller 150 determines the amount of correction of the rotational speed of the 1 st pressure pump 88 and the 2 nd pressure pump 90 in accordance with the pipe diameter and pipe length of the 1 st bathtub water passage 62 (referred to as "discharge-side pipe" in fig. 12). In the example shown in fig. 12, when the pipe diameter of the 1 st bathtub water passage 62 is 10mm, the controller 150 sets the correction amount to +5Hz if the pipe length of the 1 st bathtub water passage 62 is less than 5m, sets the correction amount to ± 0Hz if the pipe length of the 1 st bathtub water passage 62 is 5m or more and less than 10m, and sets the correction amount to-5 Hz if the pipe length of the 1 st bathtub water passage 62 is 10m or more and less than 15 m. In addition, when the pipe diameter of the 1 st bathtub water passage 62 is 13mm, the controller 150 sets the correction amount to +10Hz if the pipe length of the 1 st bathtub water passage 62 is less than 5m, the controller 150 sets the correction amount to +5Hz if the pipe length of the 1 st bathtub water passage 62 is 5m or more and less than 10m, and the controller 150 sets the correction amount to ± 0Hz if the pipe length of the 1 st bathtub water passage 62 is 10m or more and less than 15 m.

When the pressure loss of the 1 st bathtub water channel 62 is large, the air-dissolved water is less likely to flow out from the reservoir 52 to the bathtub 130, and therefore the pressure in the reservoir 52 when the microbubble generation operation control is performed becomes high. In contrast, when the pressure loss of the 1 st bath water path 62 is small, the air-dissolved water is likely to flow out from the reservoir 52 to the bath 130, and therefore the pressure in the reservoir 52 when the microbubble generation operation control is performed is reduced accordingly. When the pipe diameter of the 1 st bathtub water passage 62 is small or the pipe length of the 1 st bathtub water passage 62 is long, the pressure loss of the 1 st bathtub water passage 62 becomes large, and when the pipe diameter of the 1 st bathtub water passage 62 is large or the pipe length of the 1 st bathtub water passage 62 is short, the pressure loss of the 1 st bathtub water passage 62 becomes small. Therefore, as shown in fig. 12, when the pipe diameter of the 1 st bathtub water passage 62 is large or the pipe length of the 1 st bathtub water passage 62 is short (that is, when the pressure loss of the 1 st bathtub water passage 62 is small), the rotational speeds of the 1 st pressure pump 88 and the 2 nd pressure pump 90 are increased, and when the pipe diameter of the 1 st bathtub water passage 62 is small or the pipe length of the 1 st bathtub water passage 62 is long (that is, when the pressure loss of the 1 st bathtub water passage 62 is large), the rotational speeds of the 1 st pressure pump 88 and the 2 nd pressure pump 90 are decreased, whereby it is possible to suppress the difference in pipe diameter and pipe length of the 1 st bathtub water passage 62 from affecting the pressure in the storage tank 52.

And/or, as shown in fig. 13, the controller 150 determines the amount of correction for the rotational speed of the 1 st and 2 nd pressurizing pumps 88, 90 in accordance with the pipe diameter and pipe length of the 2 nd bathtub water passage 70 (referred to as "suction-side pipe" in fig. 13). In the example shown in fig. 13, when the pipe diameter of 2 nd bathtub water passage 70 is 10mm, if the pipe length of 2 nd bathtub water passage 70 is less than 5m, control device 150 sets the correction amount to-10 Hz, if the pipe length of 2 nd bathtub water passage 70 is 5m or more and less than 10m, control device 150 sets the correction amount to ± 0Hz, and if the pipe length of 2 nd bathtub water passage 70 is 10m or more and less than 15m, control device 150 sets the correction amount to +10 Hz. In addition, when the pipe diameter of 2 nd bathtub water circuit 70 is 13mm, control device 150 sets the correction amount to-20 Hz if the pipe length of 2 nd bathtub water circuit 70 is less than 5m, control device 150 sets the correction amount to-10 Hz if the pipe length of 2 nd bathtub water circuit 70 is 5m or more and less than 10m, and control device 150 sets the correction amount to ± 0Hz if the pipe length of 2 nd bathtub water circuit 70 is 10m or more and less than 15 m.

When the pressure loss of the 2 nd bathtub water circuit 70 is small, water easily flows from the bathtub 130 into the reservoir 52, and therefore the pressure in the reservoir 52 when the microbubble generating operation control is performed becomes high accordingly. On the contrary, when the pressure loss of the 2 nd bathtub water circuit 70 is large, water is less likely to flow from the bathtub 130 into the reservoir 52, and therefore the pressure in the reservoir 52 when the microbubble generating operation control is performed is reduced accordingly. When the pipe diameter of the 2 nd bathtub water passage 70 is small or the pipe length of the 2 nd bathtub water passage 70 is long, the pressure loss of the 2 nd bathtub water passage 70 becomes large, and when the pipe diameter of the 2 nd bathtub water passage 70 is large or the pipe length of the 2 nd bathtub water passage 70 is short, the pressure loss of the 2 nd bathtub water passage 70 becomes small. Therefore, as shown in fig. 13, when the pipe diameter of the 2 nd bathtub water passage 70 is small or the pipe length of the 2 nd bathtub water passage 70 is long (that is, when the pressure loss of the 2 nd bathtub water passage 70 is large), the rotational speeds of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are increased, and when the pipe diameter of the 2 nd bathtub water passage 70 is large or the pipe length of the 2 nd bathtub water passage 70 is short (that is, when the pressure loss of the 2 nd bathtub water passage 70 is small), the rotational speeds of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are decreased, whereby the influence of the difference in pipe diameter or pipe length of the 2 nd bathtub water passage 70 on the pressure in the storage tank 52 can be suppressed.

The rotational speeds shown in fig. 11, 12, and 13 may be corrected for both the 1 st pressure pump 88 and the 2 nd pressure pump 90, or the rotational speeds shown in fig. 11, 12, and 13 may be corrected for only one of the 1 st pressure pump 88 and the 2 nd pressure pump 90.

(example 5)

The hot water apparatus 2 of the present embodiment has substantially the same configuration as the hot water apparatus 2 of embodiment 1. As shown in fig. 14, in the present embodiment, the air pressurizing and dissolving unit 50 has a tank pressure sensor 54. The tank pressure sensor 54 is provided at a position lower than the lower limit water level of the tank 52, and detects the internal pressure of the tank 52 as a tank pressure. In the water heating apparatus 2 of the present embodiment, the control device 150 performs feedback control of the rotation speed at the time of driving the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 in the microbubble generating operation control (see fig. 6) using the tank pressure detected by the tank pressure sensor 54.

Specifically, when the supply of the air-dissolved water from the reservoir 52 to the bathtub 130 is started in S38 of the microbubble generation operation control shown in fig. 6, the control device 150 performs the processing shown in fig. 15 in parallel with the processing shown in fig. 6.

In S92, the control device 150 determines whether or not the tank pressure detected by the tank pressure sensor 54 is lower than a predetermined lower limit tank pressure. In the case where the tank pressure is lower than the lower limit tank pressure (in the case of yes), the process proceeds to S94. If the tank pressure is equal to or higher than the lower limit tank pressure (no), the process proceeds to S96.

In S94, the control device 150 increases the rotation speed of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 by a predetermined rotation speed width (for example, 1 Hz). Accordingly, the tank pressure of the tank 52 increases. After S94, the process advances to S96.

At S96, the control device 150 determines whether or not the tank pressure detected by the tank pressure sensor 54 is equal to or higher than a predetermined upper limit tank pressure that is higher than the lower limit tank pressure. If the tank pressure is equal to or higher than the upper limit tank pressure (yes), the process proceeds to S98. If the tank pressure is lower than the upper limit tank pressure (no), the process proceeds to S100.

In S98, the controller 150 decreases the rotation speed of the 1 st and 2 nd pressurizing pumps 88, 90 by a predetermined rotation speed width (for example, 1 Hz). Accordingly, the tank pressure of the tank 52 is reduced. After S98, the process proceeds to S100.

In S100, the control device 150 determines whether or not the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are stopped. When the supply of the air-dissolved water from the reservoir 52 to the bathtub 130 is ended in S50 of the minute-bubble generating operation control shown in fig. 6, the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are stopped. If the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are not stopped (no), the process returns to S92. When the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are stopped (yes), the process of fig. 15 is ended.

According to the processing shown in fig. 15, the rotation speeds of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 are adjusted so that the tank pressure detected by the tank pressure sensor 54 is equal to or higher than the lower limit tank pressure and lower than the upper limit tank pressure. With this configuration, even when the pressure in the accumulator 52 at the time of performing the microbubble generating operation control is affected by the installation position of the bathtub 130, the pipe diameter and pipe length of the 1 st bathtub water path 62, the pipe diameter and pipe length of the 2 nd bathtub water path 70, and the like, or by other factors, the pressure in the accumulator 52 can be kept within a desired range.

The rotation speed increases in S94 and S98 in fig. 15 may be performed for both the 1 st pressure pump 88 and the 2 nd pressure pump 90, or the rotation speed increases and decreases in S94 and S98 in fig. 15 may be performed for only one of the 1 st pressure pump 88 and the 2 nd pressure pump 90.

In the water heating apparatus 2 of the present embodiment, the control device 150 may be configured to calculate a difference between a preset target tank pressure and an actual tank pressure detected by the tank pressure sensor 54, and add a correction amount obtained by multiplying the calculated difference in tank pressure by a negative coefficient to the rotation speed of the 1 st pressurizing pump 88 and/or the 2 nd pressurizing pump 90, instead of S92 to S98, in the processing of fig. 15, thereby adjusting the rotation speed of the 1 st pressurizing pump 88 and/or the 2 nd pressurizing pump 90. By adopting this configuration, the rotation speed of the 1 st pressurizing pump 88 and/or the 2 nd pressurizing pump 90 is adjusted so that the actual tank pressure detected by the tank pressure sensor 54 approaches the target tank pressure. With this configuration, even when the pressure in the tank 52 at the time of performing the microbubble generating operation control is affected by the installation position of the bathtub 130, the pipe diameter and pipe length of the 1 st bathtub water path 62, the pipe diameter and pipe length of the 2 nd bathtub water path 70, and the like, or by other factors, the pressure in the tank 52 can be maintained at the desired target tank pressure.

(other modification example)

In the above-described hot water heating apparatus 2, the cold water alleviation process of S32 in fig. 6, 9, and 10 may be omitted in the fine bubble generation operation control performed in conjunction with the hot water injection operation control.

In the water heating apparatus 2 described above, the tank cleaning process at S54 in fig. 6, 9, and 10 may be omitted.

In the above-described hot water apparatus 2, in the operation control time determination process at S48 in fig. 6 or 9, even when the operation control time reaches the set time, the process may return to S40 without going to S50, and the microbubble generation operation control may be continued until the user instructs the remote controller 154 to end the microbubble generation operation control. Similarly, in the above-described hot water apparatus 2, in the operation control time determination process at S86 in fig. 10, even when the operation control time reaches the set time, the process may return to S66 without going to S50, and the microbubble generation operation control may be continued until the user instructs the remote controller 154 to end the microbubble generation operation control.

In the above-described hot water heating apparatus 2, when the hot water injection operation control is performed and the fine-bubble generation operation control is performed, the hot water injection end notification at S20 of fig. 3 may be performed during the execution of the fine-bubble generation operation control, instead of performing the hot water injection end notification at S20 of fig. 3 when the hot water injection operation control is completed. More specifically, the hot water injection completion notification may be performed after the operation control time of the microbubble generation operation control reaches a predetermined notification time (for example, 2 minutes) in which sufficient microbubbles can be generated in the water in the bathtub 130. By adopting such a structure, the time when the user enters the bathroom can be delayed, whereby the user can be suppressed from entering the bathroom before the water in the bathtub 130 sufficiently generates the fine bubbles.

In the above-described water heating apparatus 2, the user may be configured to switch whether or not to perform the microbubble generation operation control in conjunction with the hot water injection operation control by the remote controller 154.

In the above-described water heating apparatus 2, air may be introduced into the tank 52, or instead of air, a gas such as a carbonic acid gas, a hydrogen gas, or an oxygen gas may be introduced into the tank 52. In this case, a gas filling tank (not shown) filled with gas may be connected to the gas introduction port 104a of the gas introduction path 104.

In the above-described hot water apparatus 2, in the hot water injection operation control, a set amount of water is stored in the bathtub 130 based on the accumulated amount of water detected by the water amount sensor 28. In contrast, the water heating apparatus 2 may be configured to be provided with a water level sensor capable of detecting the water level of the bathtub 130, for example, and to store water at a set water level in the bathtub 130 in accordance with the water level of the bathtub 130 detected by the water level sensor during the hot water injection operation control.

In the above-described hot water apparatus 2, the heat source unit 10 is connected to the faucet 250, and the air pressurizing and dissolving unit 50 is connected to the bathtub 130. Alternatively, the heat source unit 10 may be connected to another heat utilization part, and the air pressure dissolving unit 50 may be connected to another liquid tank.

In the above-described water heating apparatus 2, the gas introduction mechanism 96 is disposed in the accumulator circulation path 92 on the upstream side of the accumulator circulation pump 94. In contrast, in the accumulator circulation path 92, the gas introduction mechanism 96 may be disposed downstream of the accumulator circulation pump 94.

In the above-described water heating apparatus 2, the tank circulation path 92 and the tank circuit 74 are provided separately. In contrast, as shown in fig. 16, the tank circulation path 92 on the downstream side of the tank circulation pump 94 may be configured to merge with the tank circuit 74 on the downstream side of the 2 nd pressurizing pump 90. In this case, the water supply port 74a at the downstream end of the tank circuit 74 also serves as the inflow port 92b at the downstream end of the tank circulation path 92. In the case of the configuration shown in fig. 16, since the gas introduction mechanism 96 is provided in the tank circulation path 92 on the upstream side of the point where the tank circulation path 92 and the tank circuit 74 merge, the pressure loss in the tank circuit 74 can be reduced. In the case of the configuration of fig. 16, the number of vortices in the tank 52 is 1, thereby promoting dissolution of air in the water in the tank 52.

The control device 150 of the water heating apparatus 2 according to embodiment 2 or embodiment 3 may be configured to adjust the rotation speed of the 1 st pressure pump 88 and/or the 2 nd pressure pump 90, which is performed by the control device 150 in the water heating apparatus 2 according to embodiment 4 or embodiment 5.

As described above, in the 1 or more embodiments, the hot water apparatus 2 (an example of the fine bubble generating apparatus) includes: a tank 52 for dissolving air (an example of gas) in water (an example of liquid) under pressure; a tank circuit 74 (an example of a tank supply path) for supplying water to the tank 52; a 1 st pressurizing pump 88 and a 2 nd pressurizing pump 90 (examples of pressurizing pumps) which are provided in the tank circuit 74; a tank outward passage 64, a 1 st bathtub water passage 62, and a bathtub adapter 132 (an example of a tank discharge passage) for discharging water in which air is dissolved under pressure from the tank 52 to the bathtub 130 (an example of a liquid tank); a fine bubble generation nozzle 142 provided in the bathtub adapter 132, for generating fine bubbles by depressurizing the water in which air is pressurized and dissolved; a tank circulation path 92 provided separately from the tank outward path 64, the 1 st bathtub water path 62, and the bathtub adapter 132, for supplying water from an outflow port 92a connected to the tank 52 to an inflow port 92b connected to the tank 52; a tank circulation pump 94 provided in the tank circulation path 92; a gas introduction mechanism 96 provided in the tank circulation path 92; and a control device 150. The gas introduction mechanism 96 includes: a venturi 102 (an example of a decompression section) through which water is decompressed; and a gas introduction port 104a for introducing air by the negative pressure of water in the venturi 102. The controller 150 can perform the microbubble generation operation control of supplying water under pressure from the tank circuit 74 to the tank 52 by driving the 1 st and 2 nd pressurizing pumps 88 and 90 and supplying water with air dissolved under pressure from the tank 52 to the bathtub 130 via the tank outward passage 64, the 1 st bathtub water passage 62, and the bathtub adapter 132. In the water heating apparatus 2, during the execution of the microbubble generating operation control, the control device 150 drives the tank circulation pump 94 to circulate the water in the tank 52 through the tank circulation path 92, thereby supplying the air introduced by the gas introduction mechanism 96 to the tank 52.

In the above-described water heating apparatus 2, even while the microbubble generating operation control is being performed, the air introduced by the gas introduction mechanism 96 can be supplied to the accumulator 52 by driving the accumulator circulation pump 94. Therefore, the microbubble generation operation control can be continuously performed without interrupting the microbubble generation operation control in order to supply the air to the accumulator 52. With this configuration, the water in the bathtub 130 can be constantly and stably supplied with the fine bubbles.

In the 1 or more embodiments, in the water heating apparatus 2, the gas introduction mechanism 96 is disposed on the upstream side of the tank circulation pump 94 in the tank circulation path 92.

According to the above configuration, the pressure of the water in the venturi 102 can be further reduced as compared with the case where the gas introduction mechanism 96 is disposed on the downstream side of the receiver circulation pump 94 in the receiver circulation path 92. With this configuration, the amount of air introduced by the gas introduction mechanism 96 can be further increased. Further, according to the above configuration, when the air introduced by the gas introduction mechanism 96 and the water flowing through the tank circulation path 92 pass through the tank circulation pump 94, they are agitated by the impeller of the tank circulation pump 94, and therefore, the dissolution of the air in the water can be further promoted.

In the 1 or more embodiments, the water heating apparatus 2 further includes: a gas inlet valve 106 for opening and closing the gas inlet 104 a; a low level electrode 52a (an example of a 1 st level electrode) capable of detecting whether or not the water level (an example of the liquid level) of the tank 52 is equal to or higher than a lower limit water level (an example of a 1 st level); and a high water level electrode 52b (example of the 2 nd liquid level electrode) capable of detecting whether or not the water level of the tank 52 is equal to or higher than an upper limit water level (example of the 2 nd liquid level) higher than a lower limit water level. The water level at the portion where the outlet 92a leading to the tank circulation path 92 is connected to the tank 52 is lower than the lower limit water level. The controller 150 is configured to close the gas introduction valve 106 when the low level electrode 52a detects that the water level of the reservoir 52 is lower than the lower limit water level in a state where the gas introduction valve 106 is open, and to open the gas introduction valve 106 when the high level electrode 52b detects that the water level of the reservoir 52 is higher than the upper limit water level in a state where the gas introduction valve 106 is closed, in the microbubble generation operation control.

In the process of performing the microbubble generating operation control, the water level of the accumulator 52 is lowered when the amount of air consumed by the accumulator 52 is smaller than the amount of air introduced by the gas introducing mechanism 96, and the water level of the accumulator 52 is raised when the amount of air consumed by the accumulator 52 is larger than the amount of air introduced by the gas introducing mechanism 96. On the other hand, when the reservoir circulation pump 94 is driven, air is introduced from the gas introduction mechanism 96 when the gas introduction valve 106 is opened, and air is not introduced from the gas introduction mechanism 96 when the gas introduction valve 106 is closed. According to the above configuration, the controller 150 can balance the amount of air consumed by the accumulator 52 and the amount of air introduced by the gas introduction mechanism 96 by switching the opening and closing of the gas introduction valve 106 according to the water level of the accumulator 52.

In the 1 or more embodiments, in the water heating apparatus 2, the control device 150 also continues to drive the tank circulation pump 94 while the gas introduction valve 106 is in the closed state in the fine bubble generation operation control.

When the tank circulation pump 94 is driven to circulate the water in the tank 52 through the tank circulation path 92, the flow of the water in the tank 52 becomes rapid. In the pressurized dissolving tank 52, the more rapid the flow of water in the tank 52, the more the pressurized dissolution of air in the water in the tank 52 is promoted. According to the above configuration, since the tank circulation pump 94 is continuously driven even while the gas introduction valve 106 is in the closed state in the fine bubble generation operation control, the water in the tank 52 can be made to flow rapidly, and the pressurized dissolution of the air in the water in the tank 52 can be further promoted.

In the embodiment 1 or more, the controller 150 is configured to determine, as the air suction time, an elapsed time from when the high level electrode 52b detects that the water level of the reservoir 52 is higher than the upper limit water level and the gas introduction valve 106 is opened to when the low level electrode 52a detects that the water level of the reservoir 52 is lower than the lower limit water level and the gas introduction valve 106 is closed, and to adjust the rotation speed of the reservoir circulation pump 94 when the reservoir circulation pump 94 is driven with the gas introduction valve 106 opened thereafter, in accordance with the air suction time, in the fine bubble generation operation control.

In the fine bubble generation operation control, in the case where the amount of air introduced by the gas introduction mechanism 96 is much larger than the amount of air consumed by the accumulator 52 in the state where the gas introduction valve 106 is opened, the air intake time is a very short time. In contrast, in the fine bubble generation operation control, when the amount of air introduced by the gas introduction mechanism 96 is slightly larger than the amount of air consumed by the accumulator 52 in a state where the gas introduction valve 106 is opened, the air intake time is a very long time. The amount of air introduced by the gas introduction mechanism 96 varies according to the rotation speed of the tank circulation pump 94 when the tank circulation pump 94 is driven with the gas introduction valve 106 open. According to the above configuration, the rotation speed of the reservoir circulation pump 94 when the reservoir circulation pump 94 is driven with the gas introduction valve 106 opened thereafter is adjusted in accordance with the actual suction time during the control of the microbubble generation operation, whereby the amount of air consumed by the reservoir 52 and the amount of air introduced by the gas introduction mechanism 96 are appropriately balanced, and thus, the microbubbles can be continuously and stably generated in the water in the bathtub 130.

In the embodiment 1 or more, the controller 150 is configured to increase the rotation speed of the accumulator circulation pump 94 when the accumulator circulation pump 94 is driven with the gas introduction valve 106 opened thereafter when the intake time exceeds the upper limit time (example of the 1 st intake time), and to decrease the rotation speed of the accumulator circulation pump 94 when the accumulator circulation pump 94 is driven with the gas introduction valve 106 opened thereafter when the intake time is less than the lower limit time (example of the 2 nd intake time) shorter than the upper limit time.

In the state where the gas introduction valve 106 is open, the amount of air introduced by the gas introduction mechanism 96 increases as the rotation speed of the accumulator circulation pump 94 increases, and the amount of air introduced by the gas introduction mechanism 96 decreases as the rotation speed of the accumulator circulation pump 94 decreases. According to the above configuration, when the intake time is longer than the upper limit time, that is, when the amount of air introduced by the gas introduction mechanism 96 is less than expected, the rotation speed of the accumulator circulation pump 94 is increased, whereby the amount of air introduced by the gas introduction mechanism 96 can be increased. Further, according to the above configuration, when the intake time is shorter than the lower limit time, that is, when the amount of air introduced by the gas introduction mechanism 96 is larger than expected, the rotation speed of the accumulator circulation pump 94 is reduced, whereby the amount of air introduced by the gas introduction mechanism 96 can be reduced.

Alternatively, in the 1 or more embodiments, the water heater 2 further includes: a low level electrode 52a (an example of a 1 st level electrode) capable of detecting whether or not the water level (an example of the liquid level) of the tank 52 is equal to or higher than a lower limit water level (an example of a 1 st level); and a high water level electrode 52b (example of the 2 nd liquid level electrode) capable of detecting whether or not the water level of the tank 52 is equal to or higher than an upper limit water level (example of the 2 nd liquid level) higher than a lower limit water level. The water level at the portion where the outlet 92a leading to the tank circulation path 92 is connected to the tank 52 is lower than the lower limit water level. The controller 150 is configured to reduce the rotation speed of the tank circulation pump 94 when the low level electrode 52a detects that the water level of the tank 52 is lower than the lower limit water level, and to increase the rotation speed of the tank circulation pump 94 when the high level electrode 52b detects that the water level of the tank 52 is higher than the upper limit water level.

In the execution of the microbubble generating operation control, the water level of the accumulator 52 gradually decreases when the amount of air consumed by the accumulator 52 is smaller than the amount of air introduced by the gas introducing mechanism 96, and the water level of the accumulator 52 gradually increases when the amount of air consumed by the accumulator 52 is larger than the amount of air introduced by the gas introducing mechanism 96. On the other hand, when the tank circulation pump 94 is driven, if the rotation speed of the tank circulation pump 94 is increased, the amount of air introduced by the gas introduction mechanism 96 becomes larger, and if the rotation speed of the tank circulation pump 94 is decreased, the amount of air introduced by the gas introduction mechanism 96 becomes smaller. According to the above configuration, the controller 150 can balance the amount of air consumed by the accumulator 52 and the amount of air introduced by the gas introduction mechanism 96 by adjusting the rotation speed of the accumulator circulation pump 94 in accordance with the water level of the accumulator 52.

In the 1 or more embodiments, the controller 150 is configured to determine an environmental parameter corresponding to the environment in which the water heater 2 is installed, and adjust the rotation speeds of the 1 st and 2 nd pressurizing pumps 88 and 90 in the control of the microbubble generation operation in accordance with the environmental parameter.

The state of the fine bubbles generated in the water in the bath 130 during the fine bubble generation operation control changes according to the pressure in the accumulator 52 when the fine bubble generation operation control is performed. Even if the 1 st and 2 nd pressurizing pumps 88, 90 are driven in the same manner, the pressure in the accumulator 52 at the time of performing the microbubble generation operation control sometimes differs depending on the environment in which the hot water apparatus 2 is installed. According to the above configuration, when the pressure in the accumulator 52 when the microbubble generation operation control is performed is affected by the environment in which the hot water apparatus 2 is installed, the pressure in the accumulator 52 when the microbubble generation operation control is performed can be stabilized by adjusting the rotation speeds of the 1 st and 2 nd pressurizing pumps 88 and 90 so as to cancel out the influence.

In the 1 or more embodiments, the environmental parameter includes the installation position of the bathtub 130 with respect to the hot water unit 2, the pipe diameter of the 1 st bathtub water passage 62, the pipe length of the 1 st bathtub water passage 62, the pipe diameter of the 2 nd bathtub water passage 70, and/or the pipe length of the 2 nd bathtub water passage 70.

According to the above configuration, the 1 st and 2 nd pressurizing pumps 88 and 90 in the microbubble generation operation control are adjusted according to the environmental parameter that affects the pressure in the accumulator 52 when the microbubble generation operation control is performed, and therefore the pressure in the accumulator 52 when the microbubble generation operation control is performed can be stabilized.

Alternatively, in the 1 or more embodiments, the water heating apparatus 2 further includes the tank pressure sensor 54, and the tank pressure sensor 54 is provided in the tank 52, and detects the pressure in the tank 52 as the tank pressure. The controller 150 is configured to adjust the rotation speeds of the 1 st and 2 nd pressurizing pumps 88 and 90 in accordance with the tank pressure detected by the tank pressure sensor 54 during the microbubble generating operation control.

According to the above configuration, even when the pressure in the accumulator 52 when the microbubble generation operation control is performed is affected by the environment in which the hot water apparatus 2 is installed or other factors, the pressure in the accumulator 52 when the microbubble generation operation control is performed can be stabilized by adjusting the rotation speeds of the 1 st pressurizing pump 88 and the 2 nd pressurizing pump 90 in accordance with the actual accumulator pressure detected by the accumulator pressure sensor 54.

In the embodiment 1 or more, the controller 150 is configured to decrease the rotation speed of the 1 st and 2 nd pressurizing pumps 88 and 90 when the tank pressure detected by the tank pressure sensor 54 exceeds the upper limit tank pressure (an example of the 1 st tank pressure) and increase the rotation speed of the 1 st and 2 nd pressurizing pumps 88 and 90 when the tank pressure is lower than the lower limit tank pressure (an example of the 2 nd tank pressure) lower than the upper limit tank pressure during the microbubble generating operation control.

According to the above configuration, the pressure in the accumulator 52 can be maintained between the upper limit accumulator pressure and the lower limit accumulator pressure when the microbubble generating operation control is performed.

The embodiments have been described in detail, but these embodiments are merely examples and do not limit the scope of the claims. The technology described in the claims includes various modifications and changes to the specific examples described above. The technical elements described in the present specification or drawings exhibit technical usefulness alone or in various combinations, and are not limited to the combinations described in the claims at the time of filing. In addition, the technology exemplified in the present specification or the drawings can achieve a plurality of objects at the same time, and achieving one of the objects has technical usefulness itself.

Claims

1. A micro-bubble generating device is characterized in that,

comprises a storage tank, a storage tank supply path, a pressurizing pump, a storage tank discharge path, a fine bubble generating nozzle, a storage tank circulation path, a storage tank circulation pump, a gas introduction mechanism, and a control device,

the storage tank is used for dissolving gas in liquid under pressure;

a tank supply path for supplying the liquid to the tank;

the pressure pump is provided in the tank supply path;

the tank discharge path is configured to discharge the liquid in which the gas is dissolved under pressure from the tank to a liquid tank;

the fine bubble generation nozzle is provided in the tank discharge path, and generates fine bubbles by depressurizing the liquid in which the gas is dissolved under pressure;

the tank circulation path is provided separately from the tank discharge path, and conveys the liquid from an outlet port connected to the tank to an inlet port connected to the tank;

the tank circulation pump is provided in the tank circulation path;

the gas introduction mechanism is provided in the tank circulation path,

the gas introducing mechanism has a pressure reducing part and a gas introducing port, wherein,

the decompression part decompresses and passes through the liquid;

the gas introduction port introduces the gas by a negative pressure of the liquid in the decompression portion,

the control device is capable of performing a fine bubble generation operation control of: driving the pressurizing pump to pressure-feed the liquid from the tank feed path to the tank, and to feed the liquid in which the gas is dissolved under pressure from the tank to the liquid tank via the tank discharge path,

in carrying out the fine bubble generation operation control, the control device drives the tank circulation pump to circulate the liquid of the tank in the tank circulation path, thereby supplying the gas introduced by the gas introduction mechanism to the tank.

2. The micro-bubble generating apparatus according to claim 1,

the gas introduction mechanism is disposed upstream of the tank circulation pump in the tank circulation path.

3. The microbubble generator according to claim 1 or 2,

and a gas introduction valve, a 1 st liquid level electrode and a 2 nd liquid level electrode, wherein,

the gas introducing valve is used for opening and closing the gas introducing port;

the 1 st liquid level electrode can detect whether the liquid level of the storage tank is above the 1 st liquid level;

the 2 nd level electrode is capable of detecting whether the level of the tank is above a 2 nd level higher than the 1 st level,

a liquid level at a portion of the tank connected to the outflow port of the circulation path to the tank is lower than the 1 st liquid level,

the control device is configured to:

in the fine-bubble generating operation control, the gas introduction valve is closed in a case where the level of the reserve tank is lower than the 1 st level detected by the 1 st level electrode in a state where the gas introduction valve is opened;

in the fine bubble generation operation control, the gas introduction valve is opened when the level of the tank is detected to be higher than the 2 nd level by the 2 nd level electrode in a state where the gas introduction valve is closed.

4. A micro-bubble generating apparatus according to claim 3,

in the fine bubble generation operation control, the control means also continues to drive the tank circulation pump during the period in which the gas introduction valve is in the closed state.

5. The apparatus for generating fine bubbles according to claim 3 or 4,

the control device is configured to:

in the fine bubble generating operation control, an elapsed time is determined as an intake time, the elapsed time being: a time from when the gas introduction valve is opened by the 2 nd level electrode detecting that the liquid level of the tank is higher than the 2 nd level until the gas introduction valve is closed by the 1 st level electrode detecting that the liquid level of the tank is lower than the 1 st level,

the rotational speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve open thereafter is adjusted in accordance with the suction time.

6. A micro-bubble generating apparatus according to claim 5,

the control device is configured to:

increasing the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve open thereafter in a case where the air suction time exceeds a 1 st air suction time,

in the case where the suction time is shorter than a 2 nd suction time shorter than the 1 st suction time, the rotation speed of the accumulator circulation pump when the accumulator circulation pump is driven with the gas introduction valve open thereafter is reduced.

7. The microbubble generator according to claim 1 or 2,

and a 1 st level electrode and a 2 nd level electrode, wherein,

the control device is configured to:

in the fine bubble generation operation control, the rotation speed of the tank circulation pump is reduced in the case where the level of the tank detected by the 1 st level electrode is lower than the 1 st level,

in the fine bubble generation operation control, the rotation speed of the tank circulation pump is increased in a case where the level of the tank detected by the 2 nd level electrode is higher than the 2 nd level.

8. The microbubble generation apparatus according to any one of claims 1 to 7,

the control device is configured to:

determining an environmental parameter corresponding to an environment in which the micro-bubble generating device is disposed,

the rotation speed of the pressurizing pump in the control of the microbubble generation operation is adjusted in accordance with the environmental parameter.

9. A micro-bubble generating apparatus according to claim 8,

the environmental parameter includes an installation position of the liquid tank with respect to the fine bubble generating device, a pipe diameter of at least a part of the tank discharge path, a pipe length of at least a part of the tank discharge path, a pipe diameter of at least a part of the tank supply path, and/or a pipe length of at least a part of the tank supply path.

10. The microbubble generation apparatus according to any one of claims 1 to 7,

further having a tank pressure sensor provided to the tank for detecting a pressure in the tank as a tank pressure,

the control device is configured to: the rotation speed of the pressurizing pump is adjusted in the microbubble generation operation control in accordance with the tank pressure detected by the tank pressure sensor.

11. The apparatus for generating fine bubbles according to claim 10,

the control device is configured to: in the fine bubble generation operation control, the rotation speed of the pressurization pump is decreased in a case where the tank pressure detected by the tank pressure sensor exceeds a 1 st tank pressure, and the rotation speed of the pressurization pump is increased in a case where the tank pressure is lower than a 2 nd tank pressure lower than the 1 st tank pressure.

12. The microbubble generation apparatus according to any one of claims 1 to 11,

the liquid is water, and the liquid is water,

the fluid bath is a bathtub for bathing of a user.