CN114574802A - Novel chromium carbide coating and preparation method thereof - Google Patents
Novel chromium carbide coating and preparation method thereof Download PDFInfo
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- CN114574802A CN114574802A CN202210254139.3A CN202210254139A CN114574802A CN 114574802 A CN114574802 A CN 114574802A CN 202210254139 A CN202210254139 A CN 202210254139A CN 114574802 A CN114574802 A CN 114574802A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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Abstract
The invention belongs to the technical field of new materials, and discloses a novel chromium carbide coating, wherein the atomic percent of Cr element in the chromium carbide coating is 60-90%, the atomic percent of C element is 40-10%, the thickness of the chromium carbide coating is 0.2-30 mu m, and the surface microhardness is 6-24 GPa. The invention adopts a chromium carbide target material and a chromium metal target for co-sputtering, and adjusts the element proportion in the coating by respectively regulating the quantity and the sputtering power of the two targets to obtain the Cr-C binary hard coating with proper element content, and can prepare the Cr-C binary hard coating with the chromium/carbon atomic ratio of 1.5: 1 to 9: 1, the coating has accurate components and compact tissue; the gradient structure from the bottom layer to the chromium carbide has high bonding strength; the coating does not contain simple substance carbon phase, and has good high-temperature oxidation resistance; the coating does not contain hydrogen elements, so that adverse effects caused by hydrogen embrittlement can be avoided; the protective agent is suitable for protecting nonferrous metals such as steel, high-temperature alloy, titanium alloy, zirconium alloy and the like and ceramic substrates such as aluminum nitride, aluminum oxide and the like, and has good application prospect.
Description
Technical Field
The invention belongs to the technical field of new materials, and particularly relates to a novel chromium carbide coating and a preparation method thereof.
Background
Carbide coatings such as chromium carbide, silicon carbide, niobium carbide, titanium carbide, zirconium carbide, tungsten carbide and the like generally have high hardness, good wear resistance, corrosion resistance and high-temperature oxidation resistance, and are often used as protective coatings on the surfaces of metal materials. The chromium carbide coating has the advantages of wide hardness control range, high wear resistance and corrosion resistance, similar expansion coefficient with steel materials and high bonding strength, thereby having wide application prospect in the fields of aviation, aerospace, nuclear power, tools and dies and the like. The stable crystal structure of the chromium-carbon system is mainly Cr3C2，Cr7C3And Cr23C6Different crystal structures also show different properties and characteristics, and the hardness, the tribological performance and the high-temperature oxidation resistance are changed along with the atomic ratio of chromium to carbon. The method for preparing the chromium carbide coating mainly comprises physical vapor deposition, spraying, laser cladding, thermal diffusion reaction, chemical vapor deposition and the like. The coating of the spraying method is loose and porous, and has low bonding strength; the laser cladding preparation temperature is high, the surface roughness is large, and uneven component distribution is easy to generate; the defects that the thermal diffusion reaction and the chemical vapor deposition for preparing the chromium carbide need to be carried out at high temperature and are not suitable for the base material sensitive to temperature and the parts easy to deform limit the carbon prepared by the methodsThe chromium coating is applied to the field with high precision requirement. The coating prepared by magnetron sputtering ion plating in the vapor deposition technology has high compactness and good bonding strength, belongs to the green manufacturing technology, and is an ideal method for preparing chromium carbide.
The physical vapor deposition process for preparing chromium carbide generally adopts sputtering metal chromium target and introducing hydrocarbon compound gas as carbon source to react with the metal chromium target. For example, in CN108330442B, the chromium carbide layer is prepared by reactive sputtering of a metallic chromium target and acetylene, which improves the surface hardness of the metal substrate and improves the wear resistance. The method has simple process, but the coating contains certain hydrogen, which is extremely unfavorable for the metal materials such as titanium, zirconium alloy and the like applied to aerospace and nuclear processes. In CN112376017A, a honeycomb-shaped chromium carbide coating is prepared by co-sputtering a graphite target and a chromium target, and the buffer layer is introduced to improve the combination of the coating and a substrate, but the method can cause a large amount of elemental carbon in the coating and reduce the high-temperature oxidation resistance of the coating. The development of a new deposition process of a high-performance compact chromium carbide coating is one of the difficulties of the chromium carbide surface protection technology.
The preparation of chromium carbide coatings by sputtering chromium carbide ceramic targets is feasible, but the physical properties of chromium carbide coatings and metal substrates differ greatly. When the chromium carbide coating is prepared by the sputtering deposition process, the bonding strength between the coating and the base material is difficult to ensure, and the structure and the gradient components of the metal priming layer need to be reasonably designed. If a single chromium carbide target is adopted, due to the fact that the element components of the target material are fixed, stress release is difficult to provide for a sudden change type heterogeneous material interface in the sputtering deposition process, and the matching between the modulus, the expansion coefficient and the like of the coating and the base material is difficult to regulate and control. The invention combines the multi-target codeposition of the chromium carbide ceramic target and the metal chromium, optimizes the priming and transition layers and can effectively improve the bonding strength of the coating and the base material. At present, no report is found on the research of preparing the chromium carbide coating by adopting a magnetron sputtering co-sputtering chromium carbide target and a metal chromium target.
Disclosure of Invention
The invention aims to provide a novel chromium carbide coating and a preparation method thereof, which aim to solve the problems in the background technology, realize a wide range of coating hardness control interval, have high film-substrate bonding strength, improve the wear resistance, corrosion resistance and oxidation resistance of materials and prolong the service life of the materials.
In order to achieve the above purpose, the invention provides the following technical scheme: a novel chromium carbide coating comprises 60-90 atomic percent of Cr element, 40-10 atomic percent of C element, 0.2-30 mu m thick of chromium carbide coating and 6-24 GPa of surface microhardness.
The application also provides a preparation method of the novel chromium carbide coating, which comprises the following specific operation steps:
s1, respectively placing a metal Cr target and a chromium carbide ceramic target on target positions in a magnetron sputtering vacuum chamber, and placing a substrate on a workpiece rotating stand of a coating vacuum chamber;
s2, introducing argon into the vacuum chamber and carrying out glow sputtering cleaning on the surface of the base material;
s3, introducing argon into the vacuum chamber, sputtering a Cr target, and preparing a Cr priming coat;
and S4, introducing argon into the vacuum chamber, and sputtering a Cr target and a chromium carbide target simultaneously to obtain the chromium carbide coating.
Preferably, the total content of the two elements Cr and C in the chromium carbide target is more than or equal to 98%.
Preferably, the base material in the step S1 includes, but is not limited to, steel, nickel-base superalloy, titanium alloy or zirconium alloy-based metallic material, and silicon carbide, aluminum nitride or aluminum oxide-based ceramic material.
Preferably, the vacuum chamber of the magnetron sputtering device in the step S2 is pumped to the air pressure lower than 5X 10-3And introducing argon after Pa, controlling the air pressure to be 0.4-2.0 Pa, applying a bias voltage of-200-900V to the base material, and cleaning the base material by glow sputtering for not less than 5 min.
Preferably, in the step S3, argon gas is introduced into the vacuum chamber, the pressure is controlled to be 0.2-1.6 Pa, the substrate is biased at-30V-300V, and a Cr primer layer is deposited.
Preferably, in the step S4, argon gas is introduced into the vacuum chamber, the air pressure is controlled to be 0.3-5.0Pa, a bias voltage of-30V to-150V is applied to the base material, the chromium target and the chromium carbide target are co-sputtered according to the total power ratio of 0-3, and the chromium carbide coating is prepared for 20-600 min.
Preferably, in the step S4, the sputtering deposition target material is a chromium carbide target and a pure metal chromium target, the number and power ratio of the sputtering metal chromium target and the chromium carbide target can be selected according to the process requirements, and the total sputtering power of the chromium target ranges from 500W to 3000W.
The invention has the following beneficial effects:
the invention adopts the chromium carbide target material and the chromium metal target for co-sputtering, and can prepare the chromium/carbon atomic ratio of 1.5: 1 to 9: 1, the coating has accurate components and compact tissue; the bottom layer and the chromium carbide are in a gradient structure, so that the bonding strength is high; the coating does not contain simple substance carbon phase, and has good high-temperature oxidation resistance; the coating does not contain hydrogen elements, so that the adverse effect of hydrogen embrittlement on the base material can be avoided; the protective agent is suitable for protecting nonferrous metals such as steel, high-temperature alloy, titanium alloy, zirconium alloy and the like and ceramic substrates such as aluminum nitride, aluminum oxide and the like, and has good application prospect.
Drawings
FIG. 1 is a scanning electron microscope image of the surface of a chromium carbide coating according to the present invention;
FIG. 2 is a depth profile of the composition of a stainless steel surface prepared with a chromium carbide coating measured by GDOES of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
The first embodiment is as follows:
3 pieces of chromium carbide ceramic targets (the atomic ratio of Cr to C is 60: 40) and 1 piece of metal chromium target are respectively placed on the target position in the magnetron sputtering vacuum chamber, and the TC4 titanium alloy base material is cleaned, dried and then installed on a workpiece rotating stand of the magnetron sputtering vacuum chamber.
The vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 0.4Pa, applying a bias voltage of-900V to the substrate, and cleaning the substrate by glow sputtering for 10 min.
And introducing argon into the vacuum chamber, starting 1 chromium target, controlling the working pressure to be 0.2Pa, and applying-300V bias voltage to the substrate to prepare the Cr priming coat.
Introducing argon into a vacuum chamber, controlling the working pressure to be 0.3Pa, applying a bias voltage of-150V to the base material, starting 3 chromium carbide targets, regulating the total power to be 2400W, simultaneously starting 1 chromium target, regulating the power to be 800W, and setting the deposition time to be 240 min. And after the film coating is finished, stopping ventilating, keeping the vacuum state until the substrate temperature is less than or equal to 60 ℃, and finally preparing the novel chromium carbide coating.
The atomic percent of chromium element in the prepared chromium carbide coating is 70.7 percent, the atomic percent of carbon element is 29.3 percent, the thickness of the coating is 6.4 mu m, and the surface hardness is 17.8 GPa.
The second embodiment:
3 chromium carbide ceramic targets (the atomic ratio of Cr to C is 60: 40) and 1 chromium metal target are respectively placed on the target positions in the magnetron sputtering vacuum chamber, and the zirconium alloy substrate is cleaned, dried and then installed on a workpiece rotating stand of the magnetron sputtering vacuum chamber.
The vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 0.5Pa, applying a bias voltage of-800V to the substrate, and cleaning the substrate by glow sputtering for 10 min.
And introducing argon into the vacuum chamber, starting 1 chromium target, controlling the working pressure to be 0.6Pa, and applying-150V bias voltage to the substrate to prepare the Cr priming coat.
Introducing argon into the vacuum chamber, controlling the working pressure to be 0.8Pa, applying-120V bias voltage to the base material, only starting 3 chromium carbide targets, regulating and controlling the total power to be 3000W, and controlling the deposition time to be 180 min. And after the film coating is finished, stopping ventilating, keeping the vacuum state until the substrate temperature is less than or equal to 60 ℃, and finally preparing the novel chromium carbide coating.
The atomic percent of chromium element in the prepared chromium carbide coating is 59.6 percent, the atomic percent of carbon element is 40.4 percent, the thickness of the coating is 4.4 mu m, and the surface hardness is 24.1 GPa.
Example three:
1 piece of chromium carbide ceramic target (the atomic ratio of Cr to C is 70: 30) and 3 pieces of metal chromium targets are respectively placed on the target positions in the magnetron sputtering vacuum chamber, and the nickel-based high-temperature alloy substrate is cleaned, dried and then installed on a workpiece rotating stand of the magnetron sputtering vacuum chamber.
The vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 1Pa, applying a bias voltage of-600V to the substrate, and cleaning the substrate by glow sputtering for 10 min.
And introducing argon into the vacuum chamber, starting 1 chromium target, controlling the working pressure to be 0.8Pa, and applying-90V bias voltage to the substrate to prepare the Cr priming coat.
Introducing argon into a vacuum chamber, controlling the working pressure to be 1Pa, applying-30V bias voltage to the base material, starting 1 chromium carbide target, regulating and controlling the power to be 1000W, simultaneously starting 3 chromium targets, regulating and controlling the total power to be 3000W, and controlling the deposition time to be 600 min. And after the film coating is finished, stopping ventilating, keeping the vacuum state until the substrate temperature is less than or equal to 60 ℃, and finally preparing the novel chromium carbide coating.
The atomic percent of chromium element in the prepared chromium carbide coating is 89.1 percent, the atomic percent of carbon element is 10.9 percent, the thickness of the coating is 29.8 mu m, and the surface hardness is 6.1 GPa.
Example four:
1 piece of chromium carbide ceramic target (the atomic ratio of Cr to C is 70: 30) and 1 piece of metal chromium target are respectively placed on a target position in a magnetron sputtering vacuum chamber, and an alumina substrate is cleaned, dried and then installed on a workpiece rotating stand of the magnetron sputtering vacuum chamber.
The vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 2Pa, applying a bias voltage of-200V to the substrate, and cleaning the substrate by glow sputtering for 10 min.
And introducing argon into the vacuum chamber, starting 1 chromium target, controlling the working pressure to be 1.2Pa, and applying-120V bias voltage to the substrate to prepare the Cr priming coat.
Introducing argon into the vacuum chamber, controlling the working pressure to be 1.5Pa, applying-100V bias voltage to the substrate, starting 1 chromium carbide target, regulating and controlling the power to be 500W, simultaneously starting 1 chromium target, regulating and controlling the power to be 500W, and depositing for 20 min. And after the film plating is finished, stopping ventilating, keeping the vacuum state until the substrate temperature is less than or equal to 60 ℃, and finally preparing the novel chromium carbide coating.
The atomic percent of chromium element in the prepared chromium carbide coating is 79.4 percent, the atomic percent of carbon element is 20.6 percent, the thickness of the coating is 0.2 mu m, and the surface hardness is 8.8 GPa.
Example five:
1 piece of chromium carbide ceramic target (the atomic ratio of Cr to C is 80: 20) and 2 pieces of metal chromium target are respectively placed on the target position in the magnetron sputtering vacuum chamber, and the H13 steel substrate is cleaned, dried and installed on the workpiece rotating stand of the magnetron sputtering vacuum chamber.
The vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 1.5Pa, applying a bias voltage of-400V to the substrate, and cleaning the substrate by glow sputtering for 10 min.
And introducing argon into the vacuum chamber, starting 1 chromium target, controlling the working pressure to be 1.6Pa, and applying-30V bias voltage to the substrate to prepare the Cr bottoming layer.
Introducing argon into a vacuum chamber, controlling the working pressure to be 5Pa, applying-50V bias voltage to the base material, starting 1 chromium carbide target, regulating and controlling the power to be 1000W, simultaneously starting 2 chromium targets, regulating and controlling the total power to be 1500W, and controlling the deposition time to be 60 min. And after the film coating is finished, stopping ventilating, keeping the vacuum state until the substrate temperature is less than or equal to 60 ℃, and finally preparing the novel chromium carbide coating.
The atomic percent of chromium element in the prepared chromium carbide coating is 84.1 percent, the atomic percent of carbon element is 15.9 percent, the thickness of the coating is 2 mu m, and the surface hardness is 11.2 GPa.
It should be noted that, in this document, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (8)
1. A novel chromium carbide coating is characterized in that: the atomic percent of Cr element in the chromium carbide coating is 60-90%, the atomic percent of C element is 40-10%, the thickness of the chromium carbide coating is 0.2-30 mu m, and the surface microhardness is 6-24 GPa.
2. A preparation method of a novel chromium carbide coating is characterized by comprising the following steps: the specific operation steps are as follows:
s1, respectively placing a metal Cr target and a chromium carbide ceramic target on target positions in a magnetron sputtering vacuum chamber, and placing a substrate on a workpiece rotating stand of a coating vacuum chamber;
s2, introducing argon into the vacuum chamber and carrying out glow sputtering cleaning on the surface of the base material;
s3, introducing argon into the vacuum chamber, sputtering a Cr target, and preparing a Cr priming coat;
and S4, introducing argon into the vacuum chamber, and sputtering a Cr target and a chromium carbide target simultaneously to obtain the chromium carbide coating.
3. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: the total content of Cr and C in the chromium carbide target is more than or equal to 98 percent.
4. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: the base material in the step S1 includes, but is not limited to, steel, nickel-base superalloy, titanium alloy or zirconium alloy-based metallic material, and silicon carbide, aluminum nitride or aluminum oxide-based ceramic material.
5. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: in the step S2, the vacuum chamber of the magnetron sputtering equipment is pumped to the air pressure lower than 5 multiplied by 10-3And introducing argon after Pa, controlling the air pressure to be 0.4-2.0 Pa, applying a bias voltage of-200-900V to the base material, and cleaning the base material by glow sputtering for not less than 5 min.
6. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: and in the step S3, argon is introduced into the vacuum chamber, the air pressure is controlled to be 0.2-1.6 Pa, the substrate is applied with a bias voltage of-30V-300V, and a Cr bottoming layer is deposited.
7. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: in the step S4, argon is introduced into the vacuum chamber, the air pressure is controlled to be 0.3-5.0Pa, the base material is applied with a bias voltage of-30V to-150V, the chromium target and the chromium carbide target are co-sputtered according to the total power ratio of 0-3, and the chromium carbide coating is prepared, wherein the duration time is 20-600 min.
8. The method for preparing a novel chromium carbide coating according to claim 2, characterized in that: in the step S4, the sputtering deposition target material is a chromium carbide target and a pure metal chromium target, the number and power ratio of the sputtering metal chromium target and the chromium carbide target can be selected according to the process requirements, and the total sputtering power of the chromium target ranges from 500W to 3000W.
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080075625A1 (en) * | 2004-07-09 | 2008-03-27 | Oc Oerlikon Balzers Ag | Conductive Material Comprising an Me-Dlc Hard Material Coating |
| CN103820761A (en) * | 2014-02-12 | 2014-05-28 | 西安金唐材料应用科技有限公司 | Preparation method for metal carbide coating |
| CN104726822A (en) * | 2015-02-09 | 2015-06-24 | 洛阳理工学院 | High-speed precise ball bearing based on CrC coating and producing method of ball bearing |
| CN108350595A (en) * | 2015-11-19 | 2018-07-31 | 赛峰直升机发动机 | Aircraft engine component including erosion shield and the method for manufacturing the component |
| CN111778477A (en) * | 2020-06-17 | 2020-10-16 | 深圳市裕展精密科技有限公司 | Coated part, electronic equipment and manufacturing method of coated part |
| CN112376017A (en) * | 2020-11-13 | 2021-02-19 | 西安工业大学 | Textile ring with wear-resistant coating and preparation method thereof |
| CN112410728A (en) * | 2020-12-14 | 2021-02-26 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | High Cr content CrB2Preparation process of-Cr coating |
-
2022
- 2022-03-15 CN CN202210254139.3A patent/CN114574802A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080075625A1 (en) * | 2004-07-09 | 2008-03-27 | Oc Oerlikon Balzers Ag | Conductive Material Comprising an Me-Dlc Hard Material Coating |
| CN103820761A (en) * | 2014-02-12 | 2014-05-28 | 西安金唐材料应用科技有限公司 | Preparation method for metal carbide coating |
| CN104726822A (en) * | 2015-02-09 | 2015-06-24 | 洛阳理工学院 | High-speed precise ball bearing based on CrC coating and producing method of ball bearing |
| CN108350595A (en) * | 2015-11-19 | 2018-07-31 | 赛峰直升机发动机 | Aircraft engine component including erosion shield and the method for manufacturing the component |
| CN111778477A (en) * | 2020-06-17 | 2020-10-16 | 深圳市裕展精密科技有限公司 | Coated part, electronic equipment and manufacturing method of coated part |
| CN112376017A (en) * | 2020-11-13 | 2021-02-19 | 西安工业大学 | Textile ring with wear-resistant coating and preparation method thereof |
| CN112410728A (en) * | 2020-12-14 | 2021-02-26 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | High Cr content CrB2Preparation process of-Cr coating |
Non-Patent Citations (1)
| Title |
|---|
| 黄珂等: "射频辅助磁控溅射制备梯度Cr/CrC膜的性能", 《表面技术》 * |
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