CN114551330A - 基板支撑组件及基板处理装置 - Google Patents

基板支撑组件及基板处理装置 Download PDF

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CN114551330A
CN114551330A CN202111312361.6A CN202111312361A CN114551330A CN 114551330 A CN114551330 A CN 114551330A CN 202111312361 A CN202111312361 A CN 202111312361A CN 114551330 A CN114551330 A CN 114551330A
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gas
substrate
support assembly
substrate support
rotation
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李炫宗
丁青焕
南镐振
李忠显
权渔真
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Wonik IPS Co Ltd
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Wonik IPS Co Ltd
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Abstract

本发明的一实施例的基板支撑组件，包括：基座板，包括放置基板的至少一个基板放置部，并且形成有多条气体流动线路，所述多条气体流动线路用于向所述基板放置部供应漂浮气体、旋转气体及减速气体；至少一个环绕件，配置在所述至少一个基板放置部，并且上面放置所述基板，在背面形成旋转图案部，以用于从所述旋转气体及所述减速气体接收旋转力及制动力；其中，所述至少一个环绕件通过从所述至少一个基板放置部供应的漂浮气体在所述至少一个基板放置部漂浮，通过以正向旋转方向供应的所述旋转气体对于所述基座板进行相对旋转，以使所述基板自转，并且通过以逆向旋转方向供应的所述减速气体制动。

Description

基板支撑组件及基板处理装置
技术领域
本发明涉及用于处理基板的半导体装置，更详细地说，涉及基板支撑组件及基板处理装置。
背景技术
通常，为了制造半导体元件、显示元件或者太阳能电池，在包括真空环境的工艺腔室的基板处理装置中执行各种工艺。例如，可进行在工艺腔室内装载基板、在基板上沉积薄膜或者蚀刻薄膜等的工艺。基板被设置在工艺腔室内的基板支撑组件支撑，通过与基板支撑组件相向设置的喷气部可向基板喷射工艺气体。
在这种基板处理装置中，为了均匀地处理基板，需要在旋转基板的同时处理基板。在基板暴露在工艺气体中的期间使基板自转，进而可谋求均匀的基板处理。为了使基板自转，基板支撑组件正在适用在利用环绕件(Satellite)漂浮基板的状态下旋转的技术。
发明内容
要解决的问题
在这种基板支撑组件的情况下，即使中断旋转气体，直到基板停止旋转需要相当长的时间。据此，迅速减速环绕件的自转的必要性正在受到关注。
本发明是为了解决包括如上所述的问题的各种问题的，目的在于提供一种可控制基板的旋转及停止速度的基板支撑组件及基板处理装置。然而，该课题仅是示例的，不得由此限定本发明的范围。
解决问题的手段
本发明的一实施例的基板支撑组件包括：基座板，包括放置基板的至少一个基板放置部，并且形成有多条气体流动线路，所述多条气体流动线路用于向所述基板放置部供应漂浮气体、旋转气体及减速气体；至少一个环绕件，配置在所述至少一个基板放置部，并且上面放置所述基板，在背面形成旋转图案部，以用于从所述旋转气体及所述减速气体接收旋转力及制动力。其中，所述至少一个环绕件通过从所述至少一个基板放置部供应的漂浮气体在所述至少一个基板放置部漂浮，通过以正向旋转方向供应的所述旋转气体对于所述基座板进行相对旋转，以使所述基板自转，并且通过以逆向旋转方向供应的所述减速气体制动。
根据所述基板支撑组件，在所述至少一个基板放置部上结合至少一个气体分配板，所述至少一个气体分配板分配从所述至少一个基板放置部供应的所述漂浮气体、所述旋转气体及所述减速气体来供应至所述至少一个环绕件。所述至少一个气体分配板可包括：漂浮气体孔，用于供应所述漂浮气体；至少一个旋转气体孔，以所述正向旋转方向倾斜形成，以供应所述旋转气体；及至少一个减速气体孔，以所述逆向旋转方向倾斜形成，以供应所述减速气体。
根据所述基板支撑组件，所述至少一个基板放置部包括多个基板放置部，所述多个基板放置部沿着所述基座板的圆周方向配置。所述多条气体流动线路可包括：多条漂浮气体流动线路，分别连接到所述多个基板放置部；多条旋转气体流动线路，分别连接到所述多个基板放置部；及多条减速气体流动线路，分别连接到所述多个基板放置部。
根据所述基板支撑组件，可包括可旋转的轴，所述轴结合于所述基座板，以使所述基板公转；在所述轴形成多条供气线路，以移动所述漂浮气体、所述旋转气体及所述减速气体。
根据所述基板支撑组件，所述多条供气线路可包括：第一供气线路，与所述多条漂浮气体流动线路共同连接；第二供气线路，与所述多条减速气体流动线路共同连接；多条第三供气线路，分别连接于所述多条旋转气体流动线路。
根据所述基板支撑组件，所述至少一个环绕件背面可包括动力传递图案，所述动力传递图案沿着旋转线路形成，以从所述旋转气体及所述减速气体接收旋转力及制动力。
根据所述基板支撑组件，所述动力传递图案可包括多个槽，所述多个槽形成在所述至少一个环绕件的背面的边缘部分。
根据所述基板支撑组件，在所述基座板中，在所述至少一个基板放置部的中心部形成固定位置凸起；在所述至少一个环绕件中，可在下面形成凸起槽部，以插入所述固定位置凸起的至少一部分。
本发明另一观点的基板处理装置包括：工艺腔室；设置在所述工艺腔室的上述的基板支撑组件；及喷气部，设置在所述工艺腔室，与所述基板支撑组件相向，并朝向所述基板支撑组件喷射处理气体。
发明的效果
根据如上述构成的本发明的一实施例的基板支撑组件及基板处理装置，提高基板的旋转制动力，进而可提高生产力。
当然，本发明的范围不限于该效果。
附图说明
图1是概略示出本发明的一实施例的基板支撑组件的立体图。
图2是概略示出本发明的另一实施例的基板支撑组件的立体图。
图3是示出图2的基板支撑组件的一个基板放置部的部分平面图。
图4是示出在图3的基板放置部中供应旋转气体的部分剖面图。
图5是示出在图3的基板放置部中供应减速气体的部分剖面图。
图6是示出本发明的实施例的基板支撑组件的环绕件的后视图。
图7是概略示出本发明的实施例的基板支撑组件的轴的立体图。
图8是示出本发明的实施例的基板支撑组件的动作特性的曲线图。
图9是示出本发明的一实施例的基板处理装置的剖面图。
(附图标记说明)
100、100a：基板支撑组件
110：基座板
120：基板放置部
130：环绕件
140：气体分配板
160：轴
200：基板处理装置
210：工艺腔室
220：喷气部
具体实施方式
以下，参照附图详细说明本发明的优选的各种实施例。
本发明的实施例是为了将本发明更加完整地说明给在该技术领域具有普通知识的人而提供的，以下实施例可变形成各种形态，本发明的范围不限于以下的实施例。反之，这些实施例为了使本发明的公开更加彻底和完整，以及将本发明的思想完整地传递给所属领域的技术人员而提供的。另外，为了说明便利性及明确性，在附图中夸张示出各层的厚度或者大小。
以下，参照概略示出本发明的理想实施例的附图说明本发明的实施例。例如，在附图中，根据制造技术及/或者公差可预测形状的变形。从而，对于本发明思想的实施例，不得限于在本说明书所示区域的特定形状来解释，而是应该包括诸如在制造上出现的形状变化。
图1是概略示出本发明的一实施例的基板支撑组件100的立体图。
参照图1，基板支撑组件100可包括基座板110及环绕件130。
基座板110可包括放置基板S的至少一个基板放置部120。例如，基板放置部120能够以口袋槽形状提供于基座板110。为了一次性处理多个基板S，可提供多个基板放置部120。例如，多个基板放置部120可沿着圆周方向间隔预定间距地形成在基座板110上面。更加具体地说，基板放置部120以基座板110的旋转轴为中心等角配置成放射状。
在基座板110可形成连接到基板放置部120的多条气体流动线路112、114、116。例如，通过气体流动线路112、114、116可向基板放置部120供应预定的气体，例如，用于漂浮基板S的漂浮气体、用于旋转基板S的旋转气体及/或者用于减速或者停止旋转基板S的减速气体。漂浮气体、旋转气体及减速气体通过气体流动线路112、114、116相互分开，并且通过基板放置部120供应至环绕件130。
例如，气体流动线路112、114、116可包括：多条漂浮气体流动线路112、多条旋转气体流动线路114及多条减速气体流动线路116。漂浮气体流动线路112向基板放置部120供应漂浮气体，旋转气体流动线路114向基板放置部120供应旋转气体，减速气体流动线路116可向基板放置部120供应减速气体。
更具体地说，漂浮气体流动线路112分别连接到基板放置部120，旋转气体流动线路114分别连接到基板放置部120，减速气体流动线路116可分别连接到基板放置部120。
在各个基板放置部120可形成连接于漂浮气体流动线路112的第一喷射孔122、连接于旋转气体流动线路114的第二喷射孔124、连接于减速气体流动线路116的第三喷射孔126。例如，第一喷射孔122可形成为至少喷射部分A对于基板放置部120以垂直方向伸长，以向垂直上方供应漂浮气体。进一步地，第二喷射孔124倾斜形成，以正向旋转方向供应旋转气体；第三喷射孔126倾斜形成，以逆向旋转方向供应减速气体。
至少一个环绕件130可配置在基板放置部120。在环绕件130的上面上可放置基板S。例如，多个环绕件130可分别配置在多个基板放置部120，在该情况下，环绕件130的个数可与基板放置部120的个数相同。
环绕件130从基板放置部120接收漂浮气体，可在基板放置部120中漂浮。进一步地，环绕件130通过从基板放置部120以正向旋转方向供应的旋转气体对于基座板110进行相对旋转，进而可使基板S对于基座板110进行相对旋转。由于该旋转是对该基座板110的相对旋转，因此可称为自转。更进一步地，环绕件130可被从基板放置部120以逆向旋转方向供应的减速气体制动。
例如，正向旋转方向称为环绕件130旋转的方向；逆向旋转方向可称为正向旋转方向的反方向，以使旋转的环绕件130减速。更具体地说，正向旋转方向和逆向旋转方向根据环绕件130的位置可以是根据圆周切线的彼此相反的方向。
在一部分实施例中，如图6所示，环绕件130在下面可包括动力传递图案134，以容易从供应的旋转气体及减速气体接收旋转力及制动力。例如，动力传递图案134可用多个槽形成，所述多个槽沿着圆周形成在环绕件130的背面的边缘部分。更具体地说，动力传递图案134可形成为具有对称形状的槽图案，以在从在相互不同的方向供应的旋转气体及减速气体接收旋转力及制动力，例如，可形成为圆形曲线图案。
进一步地，在基座板110中，在基板放置部120的中心部形成固定位置凸起121；在环绕件130中，在下面可形成凸起槽部(未示出)，以插入固定位置凸起121的至少一部分。据此，环绕件130的位置可被固定位置凸起121引导，并且环绕件130可进行稳定的旋转运动。
附加地，轴160可结合于基座板110。轴160可使基板S公转地进行旋转。例如，在轴160可结合驱动装置(未示出)，通过该驱动装置可旋转或者上下移动轴160。通过轴160旋转或者上下移动，基座板110也可随之旋转或者上下移动。
以下，对于轴160的结构进行更加详细地说明。
图7是概略示出本发明的实施例的基板支撑组件的轴160的立体图。
参照图1及图7，在轴160可形成移动漂浮气体、旋转气体及减速气体的多条供气线路162、164、166。例如，供气线路162、164、166可包括：与漂浮气体流动线路112共同连接的第一供气线路162、与减速气体流动线路116共同连接的第二供气线路166、与旋转气体流动线路114共同连接的多条第三供气线路164。
更具体地说，第一供气线路162从轴160的下面贯通至上面，与漂浮气体流动线路112共同连接；第二供气线路166从轴160的下面贯通至上面，与减速气体流动线路116来共同连接于；第三供气线路164从轴160的侧壁贯通至轴160的上面可分别连接于旋转气体流动线路114。
例如，用于供应漂浮气体的第一供气线路162及用于供应减速气体的第二供气线路166分别通过一条线路共同连接于多个基板放置部120，从而沿着轴160的轴能够以一条线路移动。
用于供应旋转气体的第三供气线路164可分别连接于基板放置部120，据此第三供气线路164的个数可与基板放置部120的个数相同。据此，第三供气线路164可形成为从轴160的侧壁中的相互不同的位置伸长至轴160的上面。
更具体地说，在轴160的侧壁可形成多个环形槽部163，第三供气线路164可从环形槽部163伸长至轴160的上面。旋转气体向该环形槽部163供应，通过第三供气线路164可供应于旋转气体流动线路114。环形槽部163可通过磁性流体密封，从而即使轴160旋转，也可保持密封的同时向第三供气线路164供应旋转气体。
另一方面，在该实施例的变形的示例中，也可如下变形：可形成有多个用于供应漂浮气体的第一供气线路162或者用于供应减速气体的第二供气线路166来分别连接于基板放置部120。
另一方面，在该实施例的另一变形的示例中，也可变形为第三供气线路164从轴160的下面贯通上面。
图2是概略示出本发明的另一实施例的基板支撑组件100a的立体图；图3是示出图2的基板支撑组件100a的一个基板放置部120的部分平面图；图4是示出在图3的基板放置部120中供应旋转气体的部分剖面图；图5是示出在图3的基板放置部120中供应减速气体的部分剖面图。该实施例的基板支撑组件100a是在图1的基板支撑组件100附加或者变形一部分结构的，可相互参照，并且在实施例省略重复的说明。
参照图2至图5，基板支撑组件100a可包括至少一个气体分配板140。气体分配板140可分配漂浮气体、旋转气体及减速气体来供应到环绕件130。例如，气体分配板140可结合在基板放置部120上，利用诸如螺丝等的固定装置可紧固在基板放置部120上。更具体地说，多个气体分配板140可分别结合于基板放置部120。
进一步地，气体分配板140可配置在基板放置部120及环绕件130之间。例如，气体分配板140固定在基板放置部120上，环绕件130可安装在气体分配板140上。
在气体分配板140可包括：用于供应漂浮气体的至少一个漂浮气体孔142；至少一个旋转气体孔144，以正向旋转方向倾斜形成，以供应旋转气体；及至少一个减速气体孔146，以逆向旋转方向倾斜形成，以供应减速气体。多个漂浮气体孔142可沿着环绕件130的圆周方向配置，以平衡地漂浮环绕件130。旋转气体孔144及减速气体孔146可形成有一个或者多个。
旋转气体以加速环绕件130的方向供应，减速气体以减速环绕件130的方向供应。旋转气体碰撞于环绕件130背面的动力传递图案134的一侧，可以向一侧的方向旋转环绕件130；减速气体碰撞于环绕件130背面的动力传递图案134的相反侧的另一侧，可减速环绕件130。在图4中，箭头(AG)是指喷射旋转气体的方向，在图5中箭头(DG)可以是指喷射减速气体的方向。
在气体分配板140的背面可形成分配流道，用于分配漂浮气体、旋转气体及减速气体。该分配流道的一端连接于基板放置部120的气体流动线路112、114、116，接收漂浮气体、旋转气体及减速气体的供应，而另一端分别连接于漂浮气体孔142、旋转气体孔144及减速气体孔146，能够以环绕件130方向喷射漂浮气体、旋转气体及减速气体。
根据基板支撑组件100a，在气体分配板140形成漂浮气体孔142、旋转气体孔144及减速气体孔146的同时形成方向，因此可将基座板110内的气体流动线路112、114、116的结构简单化。
图8是示出本发明的实施例的基板支撑组件100、100a的动作特性的曲线图。
参照图8，可以知道：若在供应漂浮气体(lifting gas on)之后供应旋转气体(acceleration gas on)，则加速环绕件130，饱和该旋转速度(saturation)，若在工艺结束之后停止供应旋转气体(acceleration gas off)并供应减速气体(deceleration gason)，则可在短时间内减速进而停止。通常，在没有减速气体的情况下，为了制动环绕件130，需要200秒以上，但是在如上述供应减速气体的情况下，可在100秒以内实现制动。
从而，本发明的实施例的基板支撑组件100、100a的情况下，可实现快速制动，进而可缩短工艺时间，因此可提高基板处理的生产力。进一步地，减速气体在环绕件130及基板S的自转速度非常快的情况下，能够以降低至正常速度的用途使用。
进一步地，在基板支撑组件100、100a的情况下，利用单独的减速气体减速环绕件130，由此只以漂浮环绕件130的用途使用提升气体，因此相比于将提升气体用于减速的情况，在工艺中可稳定地保持环绕件130及基板S的漂浮步骤，因此可减少摇晃现象等。
图9是示出本发明的一实施例的基板处理装置200的剖面图。
参照图9，基板处理装置200可包括：工艺腔室210、基板支撑组件100a及喷气部220。
工艺腔室210可将用于处理基板S的处理空间限制在内部。例如，工艺腔室210是为了保持气密而构成的，可通过至少一个排气口212连接于真空泵(未示出)，以排放处理空间内的工艺气体以及调节处理空间内真空度。
工艺腔室210能够以各种形状提供，例如，可包括限定处理空间的侧壁部和位于侧壁部上端的盖部。进一步地，工艺腔室210在侧壁部可包括可开关的闸门(未示出)，以移动基板S。
基板支撑组件100a可升降及/或者旋转地设置在工艺腔室210。例如，基板支撑组件100a可利用波纹管结构(未示出)结合于工艺腔室210，以在轴160升降及/或者旋转时可保持工艺腔室210的气密性。
喷气部220可设置在工艺腔室210，以将从工艺腔室210外部供应的处理气体供应至工艺腔室210内的处理空间。例如，喷气部220设置在工艺腔室210，以与基板支撑组件100a相向，进而可向基板支撑组件100a喷射处理气体。更具体地说，喷气部220可与基座板110相向地设置在工艺腔室210上部，以将处理气体喷射于放置于基板支撑组件100a上的基板S。
喷气部220可包括：至少一个进入孔，形成在上侧或者侧部，以从外部接收工艺气体；多个喷射孔，向朝向基板S的下方形成，以将工艺气体喷射于基板S上。例如，喷气部220可以是各种类型的，诸如花洒头(shower head)类型、喷嘴(nozzle)类型等。
在该实施例的变形的示例中，在基板处理装置200中基板支撑组件100a可被图1的基板支撑组件100代替。
基板处理装置200可用作在基板S上形成薄膜的薄膜沉积装置。例如，基板处理装置200可利用于利用化学气相沉积(chemical vapor deposition,CVD)或者原子层沉积(atomic layer deposition,ALD)的薄膜沉积装置。
参照在附图示出的实施例说明了本发明，但是这不仅是示例性的，只要是在该技术领域具有普通知识的人应该理解为由此可实现各种变形及同等的另一实施例。从而，本发明的真正的技术保护范围应该由权利要求书的范围内的技术思想定义。

Claims (9)

1.一种基板支撑组件，包括：
基座板，包括放置基板的至少一个基板放置部，并且形成有多条气体流动线路，所述多条气体流动线路用于向所述基板放置部供应漂浮气体、旋转气体及减速气体；
至少一个环绕件，配置在所述至少一个基板放置部，并且上面放置所述基板，在背面形成旋转图案部，以用于从所述旋转气体及所述减速气体接收旋转力及制动力；
其中，所述至少一个环绕件通过从所述至少一个基板放置部供应的漂浮气体在所述至少一个基板放置部漂浮，通过以正向旋转方向供应的所述旋转气体对于所述基座板进行相对旋转，以使所述基板自转，并且通过以逆向旋转方向供应的所述减速气体制动。
2.根据权利要求1所述的基板支撑组件，其特征在于，
在所述至少一个基板放置部上结合至少一个气体分配板，所述至少一个气体分配板分配从所述至少一个基板放置部供应的所述漂浮气体、所述旋转气体及所述减速气体来供应至所述至少一个环绕件；
所述至少一个气体分配板包括：漂浮气体孔，用于供应所述漂浮气体；至少一个旋转气体孔，以所述正向旋转方向倾斜形成，以供应所述旋转气体；及至少一个减速气体孔，以所述逆向旋转方向倾斜形成，以供应所述减速气体。
3.根据权利要求1所述的基板支撑组件，其特征在于，
所述至少一个基板放置部包括多个基板放置部，所述多个基板放置部沿着所述基座板的圆周方向配置；
所述多条气体流动线路包括：多条漂浮气体流动线路，分别连接到所述多个基板放置部；多条旋转气体流动线路，分别连接到所述多个基板放置部；及多条减速气体流动线路，分别连接到所述多个基板放置部。
4.根据权利要求3所述的基板支撑组件，其特征在于，
所述基板支撑组件包括可旋转的轴，所述轴结合于所述基座板，以使所述基板公转；
在所述轴形成多条供气线路，以移动所述漂浮气体、所述旋转气体及所述减速气体。
5.根据权利要求4所述的基板支撑组件，其特征在于，
所述多条供气线路包括：第一供气线路，与所述多条漂浮气体流动线路共同连接；第二供气线路，与所述多条减速气体流动线路共同连接；多条第三供气线路，分别连接于所述多条旋转气体流动线路。
6.根据权利要求1所述的基板支撑组件，其特征在于，
所述至少一个环绕件背面包括动力传递图案，所述动力传递图案沿着旋转线路形成，以从所述旋转气体及所述减速气体接收旋转力及制动力。
7.根据权利要求6所述的基板支撑组件，其特征在于，
所述动力传递图案包括多个槽，所述多个槽形成在所述至少一个环绕件的背面的边缘部分。
8.根据权利要求1所述的基板支撑组件，其特征在于，
在所述基座板中，在所述至少一个基板放置部的中心部形成固定位置凸起；
在所述至少一个环绕件中，在下面形成凸起槽部，以插入所述固定位置凸起的至少一部分。
9.一种基板处理装置，包括：
工艺腔室；
设置在所述工艺腔室的权利要求1至8中的任意一项的基板支撑组件；及
喷气部，设置在所述工艺腔室，与所述基板支撑组件相向，并朝向所述基板支撑组件喷射处理气体。
CN202111312361.6A 2020-11-18 2021-11-08 基板支撑组件及基板处理装置 Pending CN114551330A (zh)

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