CN114545744B - Exposure field calibration method and device of exposure system and electronic equipment - Google Patents

Exposure field calibration method and device of exposure system and electronic equipment Download PDF

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Publication number
CN114545744B
CN114545744B CN202210281410.2A CN202210281410A CN114545744B CN 114545744 B CN114545744 B CN 114545744B CN 202210281410 A CN202210281410 A CN 202210281410A CN 114545744 B CN114545744 B CN 114545744B
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field
exposure field
exposure
value
size
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CN114545744A (en
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张欣悦
王兵锋
宁金娜
宫晨
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Beijing Semiconductor Equipment Institute
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Beijing Semiconductor Equipment Institute
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

The application provides an exposure field calibration method and device of an exposure system and electronic equipment, comprising the following steps: according to the light intensity values collected by the energy sensor at all field edge test points of the first exposure field, determining the central offset of the optical axis of the objective lens and the first actual size of the first exposure field; determining a second actual size of the second exposure field according to the light intensity values acquired by the energy sensor at each field edge test point of the second exposure field; determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size; and calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field. According to the method, the exposure view fields with two different sizes are adopted, and the view field calibration process is simplified while the view field center and the view field size are calibrated.

Description

Exposure field calibration method and device of exposure system and electronic equipment
Technical Field
The present disclosure relates to the field of exposure technologies, and in particular, to a method and an apparatus for calibrating an exposure field of an exposure system, and an electronic device.
Background
Along with the continuous shrinking of the chip feature size of the integrated circuit industry, the performance requirement on an exposure system is continuously improved, the positioning of the exposure field comprises the positioning of the center position and the size of the exposure field, and the positioning accuracy directly influences the quality of an exposure pattern, so that the calibration of the exposure field is very important.
The prior art (CN 103163741A) provides a method for measuring the optimal position of the variable slit, which discloses that an exposure field is formed by the variable slit through a projection objective, and the optimal position of the variable slit in the Z direction is obtained by using a photodetector on the exposure field, in the prior art, the position of the field is calibrated by only using one field, the calibration process is complex, and the calibration of the size of the field cannot be completed.
Disclosure of Invention
In view of this, the present application aims at providing at least a method, a device and an electronic device for calibrating an exposure field of an exposure system, which can simplify a field calibration process while realizing field center and field size calibration by adopting two exposure fields with different sizes.
The application mainly comprises the following aspects:
in a first aspect, an embodiment of the present application provides an exposure field calibration method of an exposure system, where the exposure system includes a light source, a variable slit, an objective lens, a movable workbench, and an energy sensor, where the energy sensor is disposed on the movable workbench; the exposure field calibration method comprises the following steps: (A) Receiving a luminous light source starting instruction, and controlling the luminous light source to be started; (B) The slit width of the variable slit is regulated to a first setting value, so that light emitted by the light-emitting light source forms a first exposure view field on the movable workbench through the variable slit with the slit width of the first setting value and the objective lens, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move to a plurality of view field edge test points of the first exposure view field from the center of the optical axis of the current objective lens to collect light intensity, and the offset of the optical axis of the objective lens and the first actual size of the first exposure view field are determined according to the light intensity value collected by the energy sensor at each view field edge test point of the first exposure view field; (C) The slit width of the variable slit is regulated to a second set value, so that light emitted by the light-emitting light source forms a second exposure view field on the movable workbench through the variable slit with the slit width of the second set value and the objective lens, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move from the center of the optical axis of the objective lens to a plurality of view field edge test points of the second exposure view field respectively for light intensity collection, and the second actual size of the second exposure view field is determined according to the light intensity values collected by the energy sensor at each view field edge test point of the second exposure view field; (D) Determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size; (E) And calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
In one possible embodiment, the step of determining the offset of the optical axis center of the objective lens and the first actual size of the first exposure field of view according to the light intensity values collected by the energy sensor at each field edge test point of the first exposure field of view comprises: determining a target position corresponding to each field edge of the first exposure field according to the light intensity value acquired by the energy sensor at each field edge test point of the first exposure field, wherein the target position is the position where the +value is located, and the target light intensity value is determined according to the reference light intensity value at the center of the optical axis of the objective lens; and determining the optical axis center offset of the objective lens and the first actual size of the first exposure field according to the target positions corresponding to the edges of the first exposure field.
In one possible implementation, the target position for each field edge of the first exposure field of view is determined by: (B1) Controlling the movable workbench to move a preset distance so that the energy sensor moves to a field edge test point corresponding to the field edge; (B2) Acquiring a light intensity value of the field edge test point acquired by an energy sensor, and judging whether the light intensity value of the field edge test point meets a preset condition; (B3) If the light intensity value of the field edge test point meets a preset condition, determining the position of the field edge test point as a target position; (B4) If the light intensity value of the view field edge test point does not meet the preset condition, determining the current light intensity acquisition range of the energy sensor in the direction perpendicular to the view field edge according to the position of the view field edge test point and the preset width; (B5) Controlling the movable workbench to move so that the energy sensor moves to the position where the middle value of the current light intensity acquisition range is located; (B6) Acquiring a light intensity value acquired by an energy sensor at a position where the middle value of the current acquisition range is; (B7) Judging whether the light intensity value of the position where the middle value of the current acquisition range is located meets the preset condition or not; (B8) If the light intensity value of the position of the middle value of the current acquisition range meets the preset condition, determining the position of the middle value of the current acquisition range as a target position; (B9) And if the maximum light intensity value in the current acquisition range does not meet the preset condition, determining the position of the middle value of the current acquisition range as a view field edge test point, adjusting the preset width, determining a new light intensity acquisition range, updating the current light intensity acquisition range by using the new light intensity acquisition range, and returning to the execution step (B5).
In one possible embodiment, the objective optical axis center offset includes an X-axis center offset and a Y-axis center offset; the step of determining the offset of the optical axis center of the objective lens according to the target positions corresponding to the edges of each field of view of the first exposure field comprises the following steps: calculating a first difference value between the central abscissa of the field center of the first exposure field and the abscissa of the optical axis center of the objective lens, and determining the first difference value as an X-axis central offset; and calculating a second difference value between the center ordinate of the field center of the first exposure field and the ordinate of the optical axis center of the objective lens, and determining the second difference value as the Y-axis position offset.
In one possible embodiment, the central abscissa of the field center of the first exposure field of view is determined by: acquiring target abscissas of two target positions corresponding to two view field edges parallel to a horizontal Y axis in a first exposure view field, and determining a midpoint between the two target abscissas as a central abscissas of a view field center of the first exposure view field; the center ordinate of the field center of the first exposure field is determined by: and acquiring the target ordinate of two target positions corresponding to two field edges parallel to the horizontal X axis in the first exposure field, and determining the midpoint between the two target ordinate as the central ordinate of the field center of the first exposure field.
In one possible embodiment, the step of determining the first actual size of the first exposure field of view according to the target position corresponding to each field edge of the first exposure field of view comprises: determining a first length measurement value of a first exposure field according to two target ordinate in the first exposure field and a first field edge width value, wherein the first field edge width value is a field edge width value parallel to a horizontal X axis in the first exposure field; determining a second length measurement value of the first exposure field according to two target abscissas in the first exposure field and a second field edge width value, wherein the second field edge width value is a field edge width value parallel to a horizontal Y axis in the first exposure field; a first actual size of the first exposure field is determined based on the first length measurement and the second length measurement.
In one possible embodiment, the step of determining the first length measurement of the first exposure field of view from the two target ordinate in the first exposure field of view and the first field of view edge width value comprises: acquiring a first absolute value of a third difference value between the ordinate of the two targets, and determining a fourth difference value between the first absolute value and the edge width value of the first field of view as a first length measurement value of the first exposure field of view; the step of determining a second length measurement of the first exposure field from the two target abscissas in the first exposure field and the second field edge width value comprises: and acquiring a second absolute value of a fifth difference value between the two target abscissas, and determining a sixth difference value between the second absolute value and a second field edge width value as a second length measurement value of the first exposure field.
In one possible embodiment, step (D) comprises: acquiring a first theoretical size of the first exposure field when the slit width of the variable slit is a first set value, and acquiring a second theoretical size of the second exposure field when the slit width of the variable slit is a second set value; determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size, the second actual size, the first theoretical size and the second theoretical size by the following formulas:
width 1 ＝Gain×width 2 +offset′
wherein width is 1 Indicating the theoretical size of the exposure field of view, width 2 The actual size of the exposure field, gain, and offset' represent the size offset of the exposure field.
In one possible embodiment, step (E) comprises: (E1) Respectively judging whether the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field reach corresponding preset test precision; (E2) If the offset of the optical axis center of the objective lens, the gain of the size of the exposure field and the offset of the size of the exposure field reach the corresponding preset test precision, determining the current optical axis center of the objective lens as the field center of the exposure field and the size of the exposure field, and completing the calibration of the exposure field; (E3) If the offset of the optical axis center of the objective lens does not reach the corresponding preset precision, determining a new optical axis center of the objective lens according to the offset of the optical axis center of the objective lens and the optical axis center of the objective lens, updating the optical axis center of the objective lens by using the new optical axis center of the objective lens, and returning to the execution step (B); (E3) And (C) if the offset of the optical axis center of the objective lens reaches the corresponding preset precision, returning to the step (B) if at least one of the size gain of the exposure field and the size offset of the exposure field does not reach the corresponding preset test precision.
In a second aspect, an embodiment of the present application further provides an exposure field calibration device of an exposure system, where the exposure system includes a light source, a variable slit, an objective lens, a movable workbench, and an energy sensor, where the energy sensor is disposed on the movable workbench; the exposure field calibration device comprises: the control module is used for receiving the luminous source starting instruction and controlling the luminous source to be started; the first determining module is used for adjusting the slit width of the variable slit to a first set value so that the light emitted by the luminous light source irradiates on the movable workbench through the variable slit with the slit width being the first set value and the objective lens to form a first exposure view field, controlling the movable workbench to move so that the energy sensor moves to the center of the optical axis of the objective lens, controlling the energy sensor to move from the center of the optical axis of the objective lens to a plurality of view field edge test points of the first exposure view field respectively for light intensity acquisition, and determining the offset of the optical axis of the objective lens and the first actual size of the first exposure view field according to the light intensity value acquired by the energy sensor at each view field edge test point; the second determining module is used for adjusting the slit width of the variable slit to a second set value so that the light emitted by the luminous light source forms a second exposure view field on the movable workbench through the variable slit with the variable slit width of the second set value and the objective lens, controlling the movable workbench to move so that the energy sensor moves to the center of the optical axis of the objective lens, controlling the energy sensor to move from the center of the optical axis of the objective lens to a plurality of view field edge test points of the second exposure view field respectively for light intensity acquisition, and determining the second actual size of the second exposure view field according to the light intensity value acquired by the energy sensor at each view field edge test point; the third determining module is used for determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size; and the calibration module is used for calibrating the exposure field according to the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
The embodiment of the application provides an exposure field calibration method, an exposure field calibration device and electronic equipment of an exposure system, wherein the exposure system comprises a luminous light source, a variable slit, an objective lens, a movable workbench and an energy sensor, and the energy sensor is arranged on the movable workbench; the exposure field calibration method comprises the following steps: (A) Receiving a luminous light source starting instruction, and controlling the luminous light source to be started; (B) The slit width of the variable slit is regulated to a first setting value, so that light emitted by the light-emitting light source forms a first exposure view field on the movable workbench through the variable slit with the slit width of the first setting value and the objective lens, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move to a plurality of view field edge test points of the first exposure view field from the center of the optical axis of the current objective lens to collect light intensity, and the offset of the optical axis of the objective lens and the first actual size of the first exposure view field are determined according to the light intensity value collected by the energy sensor at each view field edge test point of the first exposure view field; (C) The slit width of the variable slit is regulated to a second set value, so that light emitted by the light-emitting light source forms a second exposure view field on the movable workbench through the variable slit with the slit width of the second set value and the objective lens, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move from the center of the optical axis of the objective lens to a plurality of view field edge test points of the second exposure view field respectively for light intensity collection, and the second actual size of the second exposure view field is determined according to the light intensity values collected by the energy sensor at each view field edge test point of the second exposure view field; (D) Determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size; (E) And calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field. According to the method, the exposure view fields with two different sizes are adopted, so that the view field center and the view field size are calibrated, and meanwhile, the view field calibration process is simplified.
In order to make the above objects, features and advantages of the present application more comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered limiting the scope, and that other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of an exposure system according to an embodiment of the present disclosure;
FIG. 2 is a flowchart showing steps of an exposure field calibration method of an exposure system according to an embodiment of the present application;
FIG. 3 is a flowchart illustrating a step of determining a target position corresponding to each field edge of a first exposure field of view according to an embodiment of the present disclosure;
FIG. 4 illustrates a view center calibration schematic of an exposure view provided by an embodiment of the present application;
FIG. 5 is a flowchart II showing steps of an exposure field calibration method of an exposure system according to an embodiment of the present disclosure;
Fig. 6 shows a schematic structural diagram of an exposure field calibration device of an exposure system according to an embodiment of the present application;
fig. 7 shows a schematic structural diagram of an electronic device according to an embodiment of the present application.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present application more clear, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application, and it should be understood that the accompanying drawings in the present application are only for the purpose of illustration and description, and are not intended to limit the protection scope of the present application. In addition, it should be understood that the schematic drawings are not drawn to scale. A flowchart, as used in this application, illustrates operations implemented according to some embodiments of the present application. It should be appreciated that the operations of the flow diagrams may be implemented out of order and that steps without logical context may be performed in reverse order or concurrently. Moreover, one or more other operations may be added to the flow diagrams and one or more operations may be removed from the flow diagrams as directed by those skilled in the art.
In addition, the described embodiments are only some, but not all, of the embodiments of the present application. The components of the embodiments of the present application, which are generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, as provided in the accompanying drawings, is not intended to limit the scope of the application, as claimed, but is merely representative of selected embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present application without making any inventive effort, are intended to be within the scope of the present application.
Based on this, the embodiment of the application provides an exposure view field calibration method, an exposure view field calibration device and electronic equipment of an exposure system, by adopting two exposure view fields with different sizes, the view field calibration process is simplified and the calibration efficiency is improved while the view field center and the view field size are calibrated, and the method specifically comprises the following steps:
referring to fig. 1, fig. 1 shows a schematic structural diagram of an exposure system according to an embodiment of the present application, and as shown in fig. 1, the exposure system according to an embodiment of the present application includes a light source 10, a variable slit 20, an objective lens 30, a movable stage 40, and an energy sensor 50, where the energy sensor 50 is disposed on the movable stage 40.
Referring to fig. 2, fig. 2 shows a flowchart 1 of steps of an exposure field calibration method of an exposure system according to an embodiment of the present application, and as shown in fig. 2, the exposure field calibration method includes:
(A) Receiving a luminous light source starting instruction and controlling the luminous light source to be started.
Specifically, the light-emitting source may be a mercury lamp, and the light-emitting source is controlled to be turned on by receiving an on command of the light-emitting source, after the light-emitting source is turned on, light emitted by the light-emitting source passes through the variable slit and the objective lens, and then an exposure field corresponding to the variable slit is formed on the movable workbench, wherein the size of the exposure field depends on the multiplying power of the objective lens.
In one embodiment, the light emitted by the light source forms exposure fields of different sizes on the stage through the variable slit and the objective lens with different slit widths, the variable slit is generally composed of four movable blades with different numbers, the positions of the four movable blades are changed, and the slit width of the variable slit is correspondingly changed.
In a preferred embodiment, before executing the step B, a position of an optical axis center of the objective lens may be predetermined, specifically, a slit width of the variable slit may be adjusted to an arbitrary set value, after light emitted by the light emitting source is obtained through the variable slit with the slit width being the arbitrary set value and the objective lens, a corresponding exposure field is formed on the movable table, in the exposure field, the movable table is controlled to move so that the energy sensor collects a light intensity value in the exposure field, a position of a movable table with a maximum light intensity value collected by the energy sensor in the exposure field is determined as the optical axis center of the objective lens, and the obtained maximum light intensity value is determined as the reference light intensity value.
(B) And determining the central offset of the optical axis of the objective lens and the first actual size of the first exposure field according to the light intensity values acquired by the energy sensor at each field edge test point of the first exposure field.
Specifically, the slit width of the variable slit is adjusted to a first set value, so that light emitted by the light-emitting light source forms a first exposure field on the movable workbench through the variable slit with the slit width being the first set value and the objective lens, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the first exposure field to collect light intensity, and the offset of the optical axis of the objective lens and the first actual size of the first exposure field are determined according to the light intensity value collected by the energy sensor at each field edge test point of the first exposure field.
In this embodiment of the present application, the slit width of the variable slit is adjusted to a first set value, and after passing through the variable slit and the objective lens, the light emitted by the light emitting source can form a corresponding first exposure field on the movable workbench.
Here, it is necessary to acquire the magnitude gain of the initial exposure field between the theoretical magnitude and the actual magnitude as the magnitude offset from the initial exposure field, and determine the first theoretical magnitude of the first exposure field from the magnitude gain of the initial exposure field as the magnitude offset from the initial exposure field.
In a preferred embodiment, the step of determining the offset of the optical axis center of the objective lens and the first actual size of the first exposure field of view based on the light intensity values collected by the energy sensor at each field edge test point of the first exposure field of view comprises:
and determining a target position corresponding to each field edge of the first exposure field according to the light intensity value acquired by the energy sensor at each field edge test point of the first exposure field, wherein the target position is the position of the target light intensity value, and the target light intensity value is determined according to the light intensity value at the center of the optical axis of the objective lens.
Specifically, the target light intensity value may be the product of a preset percentage and a reference light intensity value, for example, a 50% reference light intensity value, a specific value of the preset percentage may be set according to practical situations, and in the process that the light emitted by the light emitting light source forms the first exposure field of view on the movable workbench through the variable slit and the objective lens, at the position of each edge of the first exposure field of view, a bright-dark transition region with a certain width exists, and the target position corresponding to each field of view edge is the position point of the 50% reference light intensity value on the bright-dark transition region corresponding to the field of view edge.
Referring to fig. 3, fig. 3 is a flowchart illustrating a step of determining a target position corresponding to each field edge of the first exposure field according to an embodiment of the present application, as shown in fig. 3, in a specific embodiment, the target position corresponding to each field edge of the first exposure field is determined by:
(B1) And controlling the movable workbench to move a preset distance so that the energy sensor moves to a field edge test point corresponding to the field edge.
Preferably, in the process of acquiring the first exposure field of view, a first theoretical size of the first exposure field of view when the slit width of the variable slit is a first set value may be determined at the same time, the first theoretical size may be represented by a first length theoretical value parallel to the horizontal Y axis and a second length theoretical value parallel to the horizontal X axis, and the preset distance may be determined according to the first theoretical size and a positional relationship between the edge of the field of view and the horizontal coordinate axis.
Referring to fig. 4, fig. 4 shows a view center calibration diagram of an exposure view according to an embodiment of the present application, where, as shown in fig. 4, the coordinates of the center a of the optical axis of the objective lens in the first exposure view 1001 are (X SS ,Y SS ) Controlling the movable worktable to move so that the center position of the energy sensor moves to the center a of the optical axis of the objective lens, if the field of view edge is parallel to the horizontal X axis, the preset distance is one half of the theoretical value of the second length, if the field of view edge is parallel to the horizontal Y axis, the preset distance is one half of the theoretical value of the first length, taking the field of view edge test point b corresponding to the field of view edge 11 of the first exposure field of view 1001 in fig. 4 as an example, controlling the energy sensor to move from the center a of the optical axis of the objective lens The second length theoretical value reaches the field of view edge test point b.
Returning to fig. 3, (B2) acquiring the light intensity value of the field edge test point acquired by the energy sensor, and judging whether the light intensity value of the field edge test point meets a preset condition.
In one embodiment, the preset condition is whether a difference between the light intensity value acquired by the energy sensor and the target light intensity value is within a preset range.
(B3) And if the light intensity value of the field edge test point meets the preset condition, determining the position of the field edge test point as a target position.
In one embodiment, if the difference between the light intensity value of the field edge test point and the target light intensity value is within a preset range, determining the position of the field edge test point as the target position.
(B4) If the light intensity value of the field edge test point does not meet the preset condition, determining the current light intensity acquisition range of the energy sensor in the direction perpendicular to the field edge according to the position of the field edge test point and the preset width.
In a specific embodiment, if the difference between the light intensity value of the field edge test point and the target light intensity value is not in the preset range, the current light intensity acquisition range of the energy sensor in the direction perpendicular to the field edge may be determined according to the position and the preset width of the field edge test point, specifically, the current light intensity acquisition range may be determined by a dichotomy, for example, the field edge test point may be used as a starting point for determining the current light intensity acquisition range, and a random position in the direction perpendicular to the field edge and the preset width of the field edge test point may be determined as an end position of the current light intensity acquisition range, so as to determine the current light intensity acquisition range, preferably, the general current light intensity acquisition range is a transition area from light to dark.
(B5) And controlling the movable workbench to move so that the energy sensor moves to the position where the middle value of the current light intensity acquisition range is located.
In a preferred embodiment, if the field edge test point is used as the middle value of the current light intensity acquisition range, the movable workbench is not required to be controlled to move, and if the field edge test point is not the middle value of the current light intensity acquisition range, the movable workbench is required to be controlled to move so that the energy sensor moves to the position where the middle value of the current light intensity acquisition range is located.
(B6) And acquiring the light intensity value acquired by the energy sensor at the position of the middle value of the current acquisition range.
(B7) Judging whether the light intensity value of the position where the middle value of the current acquisition range is located meets the preset condition or not.
(B8) If the light intensity value of the position of the middle value of the current acquisition range meets the preset condition, determining the position of the middle value of the current acquisition range as the target position.
Preferably, if the difference between the light intensity value acquired at the position where the middle value of the current acquisition range is located and the target light intensity value is within the preset range, determining the position where the middle value of the current acquisition range is located as the target position.
(B9) If the light intensity value of the position of the middle value of the current acquisition range does not meet the preset condition, determining the position of the middle value of the current acquisition range as a field edge test point, adjusting the preset width, determining a new light intensity acquisition range, updating the current light intensity acquisition range by the new light intensity acquisition range, and returning to the execution step (B5).
In a preferred embodiment, the new light intensity acquisition range may be determined by narrowing the preset width, updating the current light intensity acquisition range with the new light intensity acquisition range, and returning to step (B5) until the target position is determined.
In a preferred embodiment, as shown in fig. 4, when the energy value at the field edge test point b does not satisfy the preset condition, the field edge test point b is taken as the starting position of the light intensity acquisition range, the current light intensity acquisition range Sb is determined according to the preset width, when the light intensity value at the position S where the lower limit value of the current acquisition range Sb is located is minimum, and when the light intensity value at the field edge test point b is maximum, the movable workbench needs to be moved so that the energy sensor moves to the position F where the intermediate value of the current light intensity acquisition range Sb is located, whether the light intensity value at the position F where the intermediate value of the current light intensity acquisition range Sb is located satisfies the preset condition is determined, if the light intensity value at the position F where the intermediate value of the current light intensity acquisition range Sb is located satisfies the preset condition,determining the position F of the middle value of the current light intensity acquisition range Sb as a target position, further judging whether the difference value between the light intensity value of the middle value of the current light intensity acquisition range Sb and the target light intensity value is larger than zero or not if the light intensity value of the middle value of the current light intensity acquisition range Sb at the position F does not meet the preset condition, determining the position F of the middle value of the current acquisition range as a new view field edge test point if the difference value between the light intensity value of the middle value of the current light intensity acquisition range Sb at the position F and the target light intensity value is larger than zero, and changing the preset width to be Presetting a width, determining a new acquisition range SF, updating a current light intensity acquisition range Sb by using the new light intensity acquisition range SF, returning to the step (B5), further determining a light intensity value of a position where the middle value of the current acquisition range SF is located, and the like until a target position corresponding to the edge of the field of view is acquired; if the difference between the light intensity value at the position F of the middle value of the current light intensity acquisition range Sb and the target light intensity value is smaller than zero, determining the position F of the middle value of the current acquisition range as a new view field edge test point, and changing the preset width to +.>The width is preset, a new acquisition range bF is determined, then the current light intensity acquisition range Sb is updated by the new light intensity acquisition range bF, the step (B5) is returned, the light intensity value of the position where the middle value of the current acquisition range bF is located is further determined, and the like until the target position corresponding to the edge of the field of view is obtained.
And determining the optical axis center offset of the objective lens and the first actual size of the first exposure field according to the target positions corresponding to the edges of the first exposure field.
In a preferred embodiment, the objective optical axis center offset includes an X-axis center offset and a Y-axis center offset, and the step of determining the objective optical axis center offset based on the target positions corresponding to the respective field edges of the first exposure field includes:
A first difference between the center abscissa of the field center of the first exposure field and the abscissa of the optical axis center of the objective lens is calculated, and the first difference is determined as an X-axis center offset.
In one embodiment, as shown in FIG. 4, the field center E (X C ，Y C ) The X-axis center offset is determined by the following formula x :
offset x ＝X C -X SS (1)
In the formula (1), offset x X represents the X-axis center offset of the first exposure field C X represents the abscissa of the field center E of the first exposure field SS The abscissa at the optical axis center a of the objective lens is indicated.
And calculating a second difference value between the center ordinate of the field center of the first exposure field and the ordinate of the optical axis center of the objective lens, and determining the second difference value as the Y-axis position offset.
In one embodiment, as shown in FIG. 4, the field center E (X C ，Y C ) The Y-axis center offset is determined by the following formula y :
offset y ＝Y C -Y SS (2)
In the formula (2), offset y Represents the Y-axis center offset of the first exposure field of view, Y C Representing the ordinate, Y, of the field center E of the first exposure field SS Indicating the ordinate at the optical axis center a of the objective lens.
In a preferred embodiment, the central abscissa of the field center of the first exposure field is determined by:
And acquiring target abscissas of two target positions corresponding to two field edges parallel to the horizontal Y axis in the first exposure field, and determining a midpoint between the two target abscissas as a central abscissas of the field center of the first exposure field.
As shown in fig. 4, two target positions (X 1 ，Y SS ) And (X) 2 ，Y SS ) The center abscissa X of the field center of the first exposure field can be determined by the following formula (3) C ：
X C ＝(X 1 +X 2 )/2 (3)
The center ordinate of the field center of the first exposure field is determined by:
and acquiring the target ordinate of two target positions corresponding to two field edges parallel to the horizontal X axis in the first exposure field, and determining the midpoint between the two target ordinate as the central ordinate of the field center of the first exposure field.
As shown in fig. 4, two target positions (X SS ，Y 1 ) And (X) SS ，Y 2 ) The center abscissa Y of the field center of the first exposure field can be determined by the following equation (4) C ：
Y C ＝(Y 1 +Y 2 )/2 (4)
In a specific embodiment, the step of determining the first actual size of the first exposure field according to the target position corresponding to each field edge of the first exposure field includes:
And determining a first length measurement value of the first exposure field according to the ordinate of the two targets in the first exposure field and the first field edge width value, wherein the first field edge width value is the width value of the field edge parallel to the horizontal X axis in the first exposure field.
Specifically, a first field-of-view edge width value and a second field-of-view edge width value are known.
In a preferred embodiment, the step of determining a first length measurement of the first exposure field of view based on the two target ordinate axes in the first exposure field of view and the first field of view edge width value comprises:
and acquiring a first absolute value of a third difference value between the ordinate of the two targets, and determining a fourth difference value between the first absolute value and the first field-of-view edge width value as a first length measurement value of the first exposure field.
In one embodimentIn the target position (X) shown in fig. 4 SS ，Y 1 ) And (X) SS ，Y 2 ) A first length measurement of the first exposure field is determined by the following equation (5):
Y real ＝|Y 1 -Y 2 |-Y chromium-width (5)
in the formula (5), Y 1 And Y 2 Respectively correspond to the ordinate and Y of two targets real Represents a first length value, Y chromium-width Representing the width value of the edge of the field of view parallel to the horizontal X-axis.
And determining a second length measurement value of the first exposure field according to two target abscissas in the first exposure field and a second field edge width value, wherein the second field edge width value is a field edge width value parallel to a horizontal Y axis in the first exposure field.
In a preferred embodiment, the step of determining the second length measurement of the first exposure field of view based on the two target abscissas in the first exposure field of view and the second field of view edge width value comprises:
and acquiring a second absolute value of a fifth difference value between the two target abscissas, and determining a sixth difference value between the second absolute value and a second field edge width value as a second length measurement value of the first exposure field.
In one embodiment, the target position (X 1 ，Y SS ) And (X) 2 ，Y SS ) A second length measurement of the first exposure field is determined by the following equation (6):
X real ＝|X 1 -X 2 |-X chromium-width (6)
in the formula (6), X 1 And X 2 Respectively correspond to the ordinate and X of two targets real Representing a second length value, X chromium-width Representing the width value of the edge of the field of view parallel to the horizontal Y axis.
A first actual size of the first exposure field is determined based on the first length measurement and the second length measurement.
Returning to fig. 2, (C) determining a second actual size of the second exposure field based on the light intensity values collected by the energy sensor at each field edge test point of the second exposure field.
Specifically, step (C) includes: and adjusting the slit width of the variable slit to a second set value so that the light emitted by the light-emitting light source forms a second exposure field on the movable workbench through the variable slit with the slit width of the second set value and the objective lens, controlling the movable workbench to move so that the energy sensor moves to the center of the optical axis of the objective lens, controlling the energy sensor to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the second exposure field respectively for light intensity collection, and determining the second actual size of the second exposure field according to the light intensity value collected by the energy sensor at each field edge test point of the second exposure field.
Since the principle of determining the second actual size of the second exposure field in the embodiment of the present application is similar to the principle of determining the first actual size of the first exposure field in the above embodiment of the present application, the repetition is not repeated.
(D) And determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size.
In a preferred embodiment, step (D) comprises:
the method comprises the steps of obtaining a first theoretical size of a first exposure field when the slit width of the variable slit is a first set value, and obtaining a second theoretical size of a second exposure field when the slit width of the variable slit is a second set value.
Preferably, the first theoretical size includes a first theoretical length value parallel to the horizontal Y axis and a second theoretical length value parallel to the horizontal X axis, and similarly, the second theoretical size includes a third theoretical length value parallel to the horizontal Y axis and a fourth theoretical length value parallel to the horizontal X axis.
Determining a size gain of the exposure field and a size offset of the exposure field according to the first actual size, the second actual size, the first theoretical size and the second theoretical size by the following formula (7):
width 1 ＝Gain×width 2 +offset′ (7)
wherein width is 1 Indicating the theoretical size of the exposure field of view, width 2 The actual size of the exposure field, gain, and offset' represent the size offset of the exposure field.
In a specific embodiment, the first length theoretical value, the first length measurement value, the third length theoretical value and the third length measurement value are respectively substituted into the formula (7) to obtain the size gain of the exposure field and the size offset of the exposure field in the Y direction, wherein the third length measurement value is the length value of the field edge parallel to the horizontal Y axis in the second exposure field obtained in the step (B).
And (3) substituting the second length theoretical value, the second length measured value, the fourth length theoretical value and the fourth length measured value into the formula (7) respectively to obtain the size gain of the exposure field in the X direction and the size offset of the exposure field, wherein the fourth length measured value is the length value of the field edge parallel to the horizontal X axis in the second exposure field obtained in the step (B).
(E) And calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
Fig. 5 shows a second flowchart of steps of an exposure field calibration method of an exposure system according to an embodiment of the present application, as shown in fig. 5, step (E) includes:
(E1) And respectively judging whether the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field reach corresponding preset test precision.
In a preferred embodiment, the preset test precision is preset in the center offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field, and after the center offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field are obtained, it is required to determine whether the center offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field meet the preset test precision requirement.
(E2) If the offset of the optical axis center of the objective lens, the gain of the size of the exposure field and the offset of the size of the exposure field reach the corresponding preset test precision, determining the current optical axis center of the objective lens as the field center of the exposure field and the size of the exposure field, and completing the calibration of the exposure field.
(E3) If the offset of the optical axis of the objective, the gain of the exposure field and the offset of the exposure field do not reach the corresponding preset precision, determining a new optical axis center of the objective according to the offset of the optical axis of the objective and the optical axis center of the objective, updating the optical axis center of the objective by using the new optical axis center of the objective, and returning to the step (B).
In a specific embodiment, if the offset of the optical axis center of the objective lens does not reach the corresponding preset precision, the obtained offset of the optical axis center of the objective lens needs to be compensated to the optical axis center of the objective lens to determine a new optical axis center of the objective lens, the optical axis center of the objective lens is updated by using the new optical axis center of the objective lens, and meanwhile, the obtained gain of the size of the exposure field and the obtained offset of the size of the exposure field need to be updated to the gain of the size of the initial exposure field and the offset of the size of the initial exposure field, respectively, and the step (B) is returned.
Based on the same application conception, the embodiment of the application also provides an exposure field calibration device of the exposure system, which corresponds to the exposure field calibration method of the exposure system provided by the embodiment, and because the principle of solving the problem by the device in the embodiment of the application is similar to that of the exposure field calibration method of the exposure system of the embodiment of the application, the implementation of the device can refer to the implementation of the method, and the repetition is omitted.
Referring to fig. 6, fig. 6 shows a schematic structural diagram of an exposure field calibration device of an exposure system according to an embodiment of the present application, and as shown in fig. 6, the exposure field calibration device includes:
the control module 200 is used for receiving a luminous source starting instruction and controlling the luminous source to be started;
The first determining module 210 is configured to adjust a slit width of the variable slit to a first setting value, so that light emitted by the light emitting source irradiates the movable workbench via the variable slit with the slit width being the first setting value and the objective lens to form a first exposure field of view, control the movable workbench to move, so that the energy sensor moves to the center of the optical axis of the objective lens, control the energy sensor to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the first exposure field of view respectively for light intensity collection, and determine a central offset of the optical axis of the objective lens and a first actual size of the first exposure field of view according to the light intensity value collected by the energy sensor at each field edge test point;
the second determining module 220 is configured to adjust a slit width of the variable slit to a second setting value, so that the light emitted by the light emitting source forms a second exposure field on the movable workbench via the variable slit with the variable slit width being the second setting value and the objective lens, control the movable workbench to move, so that the energy sensor moves to the center of the optical axis of the objective lens, control the energy sensor to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the second exposure field respectively for light intensity collection, and determine a central offset of the optical axis of the objective lens and a second actual size of the second exposure field according to the light intensity value collected by the energy sensor at each field edge test point;
A third determining module 230, configured to determine a size gain of the exposure field and a size offset of the exposure field according to the first actual size and the second actual size;
and the calibration module 240 is used for calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
Optionally, the first determining module 210 is configured to: the step of determining the offset of the optical axis center of the objective lens and the first actual size of the first exposure field according to the light intensity values collected by the energy sensor at each field edge test point of the first exposure field comprises the following steps: determining a target position corresponding to each field edge of the first exposure field according to the light intensity value acquired by the energy sensor at each field edge test point of the first exposure field, wherein the target position is the position of the target light intensity value, and the target light intensity value is determined according to the light intensity value at the center of the optical axis of the objective lens; and determining the optical axis center offset of the objective lens and the first actual size of the first exposure field according to the target positions corresponding to the edges of the first exposure field.
Optionally, the first determining module 210 is configured to: the target position for each field edge of the first exposure field is determined by: (B1) Controlling the movable workbench to move a preset distance so that the energy sensor moves to a field edge test point corresponding to the field edge; (B2) Acquiring a light intensity value of the field edge test point acquired by an energy sensor, and judging whether the light intensity value of the field edge test point meets a preset condition; (B3) If the light intensity value of the field edge test point meets a preset condition, determining the position of the field edge test point as a target position; (B4) If the light intensity value of the view field edge test point does not meet the preset condition, determining the current light intensity acquisition range of the energy sensor in the direction perpendicular to the view field edge according to the position of the view field edge test point and the preset width; (B5) Controlling the movable workbench to move so that the energy sensor moves to the position where the middle value of the current light intensity acquisition range is located; (B6) Acquiring a light intensity value acquired by an energy sensor at a position where the middle value of the current acquisition range is; (B7) Judging whether the light intensity value of the position where the middle value of the current acquisition range is located meets a preset condition or not; (B8) If the light intensity value of the position of the middle value of the current acquisition range meets a preset condition, determining the position of the middle value of the current acquisition range as a target position; (B9) If the maximum light intensity value in the current acquisition range does not meet the preset condition, determining the position of the middle value of the current acquisition range as a field edge test point, adjusting the preset width, determining a new light intensity acquisition range, updating the current light intensity acquisition range by using the new light intensity acquisition range, and returning to the execution step (B5).
Optionally, the first determining module 210 is configured to: the optical axis center offset of the objective lens comprises an X-axis center offset and a Y-axis center offset; the step of determining the offset of the optical axis center of the objective lens according to the target positions corresponding to the edges of each field of view of the first exposure field comprises the following steps: calculating a first difference value between the central abscissa of the field center of the first exposure field and the abscissa of the optical axis center of the objective lens, and determining the first difference value as an X-axis central offset; and calculating a second difference value between the center ordinate of the field center of the first exposure field and the ordinate of the optical axis center of the objective lens, and determining the second difference value as the Y-axis position offset.
Optionally, the first determining module 210 is configured to: the center abscissa of the field center of the first exposure field is determined by: acquiring target abscissas of two target positions corresponding to two view field edges parallel to a horizontal Y axis in a first exposure view field, and determining a midpoint between the two target abscissas as a central abscissas of a view field center of the first exposure view field; the center ordinate of the field center of the first exposure field is determined by: and acquiring the target ordinate of two target positions corresponding to two field edges parallel to the horizontal X axis in the first exposure field, and determining the midpoint between the two target ordinate as the central ordinate of the field center of the first exposure field.
Optionally, the first determining module 210 is configured to: the step of determining a first actual size of the first exposure field according to the target position corresponding to each field edge of the first exposure field comprises: determining a first length measurement value of a first exposure field according to two target ordinate in the first exposure field and a first field edge width value, wherein the first field edge width value is a field edge width value parallel to a horizontal X axis in the first exposure field; determining a second length measurement value of the first exposure field according to two target abscissas in the first exposure field and a second field edge width value, wherein the second field edge width value is a field edge width value parallel to a horizontal Y axis in the first exposure field; a first actual size of the first exposure field is determined based on the first length measurement and the second length measurement.
Optionally, the first determining module 210 is configured to: the step of determining a first length measurement of the first exposure field from the two target ordinate axes in the first exposure field and the first field edge width value comprises: acquiring a first absolute value of a third difference value between the ordinate of the two targets, and determining a fourth difference value between the first absolute value and the edge width value of the first field of view as a first length measurement value of the first exposure field of view; the step of determining a second length measurement of the first exposure field from the two target abscissas in the first exposure field and the second field edge width value comprises: and acquiring a second absolute value of a fifth difference value between the two target abscissas, and determining a sixth difference value between the second absolute value and a second field edge width value as a second length measurement value of the first exposure field.
Optionally, the third determining module 230 is configured to: acquiring a first theoretical size of the first exposure field when the slit width of the variable slit is a first set value, and acquiring a second theoretical size of the second exposure field when the slit width of the variable slit is a second set value; determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size, the second actual size, the first theoretical size and the second theoretical size by the following formulas:
width 1 ＝Gain×width 2 +offset′
wherein width is 1 Indicating the theoretical size of the exposure field of view, width 2 The actual size of the exposure field, gain, and offset' represent the size offset of the exposure field.
Optionally, the calibration module 240 is configured to: (E1) Respectively judging whether the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field reach corresponding preset test precision; (E2) If the offset of the optical axis center of the objective lens, the gain of the size of the exposure field and the offset of the size of the exposure field reach the corresponding preset test precision, determining the current optical axis center of the objective lens as the field center of the exposure field and the size of the exposure field, and completing the calibration of the exposure field; (E3) If the offset of the optical axis center of the objective lens does not reach the corresponding preset precision, determining a new optical axis center of the objective lens according to the offset of the optical axis center of the objective lens and the optical axis center of the objective lens, updating the optical axis center of the objective lens by using the new optical axis center of the objective lens, and returning to the execution step (B); (E3) And (C) if the offset of the optical axis center of the objective lens reaches the corresponding preset precision, returning to the step (B) if at least one of the size gain of the exposure field and the size offset of the exposure field does not reach the corresponding preset test precision.
Referring to fig. 7, fig. 7 shows a schematic structural diagram of an electronic device according to an embodiment of the present application, and as shown in fig. 7, an electronic device 600 includes: a processor 610, a memory 620 and a bus 630, said memory 620 storing machine readable instructions executable by said processor 610, said processor 610 and said memory 620 communicating via said bus 630 when said electronic device 600 is running, said machine readable instructions being executed by said processor 610 to perform the steps of an exposure field calibration method of an exposure system according to any of the embodiments described above.
Based on the same application concept, the embodiment of the application further provides a computer readable storage medium, and the computer readable storage medium stores a computer program, and the computer program is executed by a processor to execute the steps of the exposure field calibration method of the exposure system provided by the embodiment.
Specifically, the storage medium can be a general-purpose storage medium, such as a mobile magnetic disk, a hard disk, or the like, and when the computer program on the storage medium is executed, the yaw measurement method of the spindle mechanism described above can be executed.
It will be clear to those skilled in the art that, for convenience and brevity of description, specific working procedures of the above-described system and apparatus may refer to corresponding procedures in the foregoing method embodiments, which are not described herein again. In the several embodiments provided in this application, it should be understood that the disclosed systems, devices, and methods may be implemented in other manners. The above-described apparatus embodiments are merely illustrative, for example, the division of the units is merely a logical function division, and there may be other manners of division in actual implementation, and for example, multiple units or components may be combined or integrated into another system, or some features may be omitted, or not performed. Alternatively, the coupling or direct coupling or communication connection shown or discussed with each other may be through some communication interface, device or unit indirect coupling or communication connection, which may be in electrical, mechanical or other form.
The units described as separate units may or may not be physically separate, and units shown as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
In addition, each functional unit in each embodiment of the present application may be integrated in one processing unit, or each unit may exist alone physically, or two or more units may be integrated in one unit.
The functions, if implemented in the form of software functional units and sold or used as a stand-alone product, may be stored in a non-volatile computer readable storage medium executable by a processor. Based on such understanding, the technical solutions of the present application may be embodied in essence or a part contributing to the prior art or a part of the technical solutions, or in the form of a software product, which is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, a server, or a network device, etc.) to perform all or part of the steps of the methods described in the embodiments of the present application. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a random access Memory (Random Access Memory, RAM), a magnetic disk, or an optical disk, or other various media capable of storing program codes.
The foregoing is merely a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, and any person skilled in the art can easily think about changes or substitutions within the technical scope of the present application, and the changes or substitutions are covered in the protection scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

Claims (10)

1. The exposure field calibration method of the exposure system is characterized in that the exposure system comprises a luminous light source, a variable slit, an objective lens, a movable workbench and an energy sensor, wherein the energy sensor is arranged on the movable workbench, and the variable slit consists of four movable blades;
the exposure field calibration method comprises the following steps:
(A) Receiving a luminous light source starting instruction, and controlling the luminous light source to be started;
(B) The slit width of the variable slit is regulated to a first set value, so that the light emitted by the luminous light source forms a first exposure view field on the movable workbench through the variable slit with the slit width of the first set value, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective, the energy sensor is controlled to move to a plurality of view field edge test points of the first exposure view field from the center of the optical axis of the current objective respectively to perform light intensity collection, and the central offset of the optical axis of the objective and the first actual size of the first exposure view field are determined according to the light intensity value collected by the energy sensor at each view field edge test point of the first exposure view field;
(C) Adjusting the slit width of the variable slit to a second set value, so that the light emitted by the luminous light source forms a second exposure field on the movable workbench through the variable slit with the slit width of the second set value, the objective lens, controlling the movable workbench to move, enabling the energy sensor to move to the center of the optical axis of the objective lens, controlling the energy sensor to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the second exposure field respectively for light intensity acquisition, and determining the second actual size of the second exposure field according to the light intensity value acquired by the energy sensor at each field edge test point of the second exposure field;
(D) Determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size;
(E) And calibrating the exposure field according to the offset of the optical axis center of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
2. The method according to claim 1, wherein the step of determining the offset of the optical axis center of the objective lens and the first actual size of the first exposure field according to the light intensity values collected by the energy sensor at each field edge test point of the first exposure field comprises:
Determining a target position corresponding to each field edge of the first exposure field according to the light intensity value acquired by the energy sensor at each field edge test point of the first exposure field, wherein the target position is the position of the target light intensity value, and the target light intensity value is determined according to the light intensity value at the center of the optical axis of the objective lens;
and determining the optical axis center offset of the objective lens and the first actual size of the first exposure field according to the target positions corresponding to the edges of the first exposure field.
3. The exposure field calibration method according to claim 2, wherein the target position corresponding to each field edge of the first exposure field is determined by:
(B1) Controlling the movable workbench to move so that the energy sensor moves to a field edge test point corresponding to the field edge;
(B2) Acquiring a light intensity value of the field edge test point acquired by an energy sensor, and judging whether the light intensity value of the field edge test point meets a preset condition;
(B3) If the light intensity value of the field edge test point meets the preset condition, determining the position of the field edge test point as a target position;
(B4) If the light intensity value of the view field edge test point does not meet the preset condition, determining the current light intensity acquisition range of the energy sensor in the direction perpendicular to the view field edge according to the position of the view field edge test point and the preset width;
(B5) Controlling the movable workbench to move so that the energy sensor moves to the position where the middle value of the current light intensity acquisition range is located;
(B6) Acquiring a light intensity value acquired by an energy sensor at a position where the middle value of the current acquisition range is;
(B7) Judging whether the light intensity value of the position where the middle value of the current acquisition range is located meets the preset condition or not;
(B8) If the light intensity value of the position of the middle value of the current acquisition range meets the preset condition, determining the position of the middle value of the current acquisition range as a target position;
(B9) And if the maximum light intensity value in the current acquisition range does not meet the preset condition, determining the position of the middle value of the current acquisition range as a view field edge test point, adjusting the preset width, determining a new light intensity acquisition range, updating the current light intensity acquisition range by using the new light intensity acquisition range, and returning to the execution step (B5).
4. The exposure field calibration method according to claim 2, wherein the objective lens optical axis center offset includes an X-axis center offset and a Y-axis center offset;
the step of determining the offset of the optical axis center of the objective lens according to the target positions corresponding to the edges of each field of view of the first exposure field comprises the following steps:
Calculating a first difference value between the central abscissa of the field center of the first exposure field and the abscissa of the optical axis center of the objective lens, and determining the first difference value as the X-axis central offset;
and calculating a second difference value between the center ordinate of the field center of the first exposure field and the ordinate of the optical axis center of the objective lens, and determining the second difference value as the Y-axis position offset.
5. The exposure field calibration method according to claim 4, wherein a center abscissa of a field center of the first exposure field is determined by:
acquiring target abscissas of two target positions corresponding to two view field edges parallel to a horizontal Y axis in a first exposure view field, and determining a midpoint between the two target abscissas as a central abscissas of a view field center of the first exposure view field;
the center ordinate of the field center of the first exposure field is determined by:
and acquiring target ordinate of two target positions corresponding to two field edges parallel to the horizontal X axis in the first exposure field, and determining the midpoint between the two target ordinate as the central ordinate of the field center of the first exposure field.
6. The method of calibrating an exposure field according to claim 5, wherein the step of determining a first actual size of the first exposure field according to the target position corresponding to each field edge of the first exposure field comprises:
determining a first length measurement value of a first exposure field according to the two target ordinate and a first field edge width value in the first exposure field, wherein the first field edge width value is a field edge width value parallel to a horizontal X axis in the first exposure field;
determining a second length measurement value of the first exposure field according to two target abscissa values in the first exposure field and a second field edge width value, wherein the second field edge width value is a field edge width value parallel to a horizontal Y axis in the first exposure field;
a first actual size of the first exposure field is determined based on the first length measurement and the second length measurement.
7. The exposure field calibration method according to claim 6, wherein the step of determining a first length measurement value of the first exposure field from the two target ordinate and a first field edge width value in the first exposure field comprises:
Acquiring a first absolute value of a third difference value between the two target ordinate coordinates, and determining a fourth difference value between the first absolute value and the first view field edge width value as a first length measurement value of the first exposure view field;
the step of determining a second length measurement of the first exposure field from the two target abscissas and a second field edge width value in the first exposure field comprises:
and acquiring a second absolute value of a fifth difference value between the two target abscissas, and determining a sixth difference value between the second absolute value and the second field-of-view edge width value as a second length measurement value of the first exposure field.
8. The exposure field calibration method according to claim 7, wherein step (D) includes:
acquiring a first theoretical size of the first exposure field when the slit width of the variable slit is a first set value, and acquiring a second theoretical size of the second exposure field when the slit width of the variable slit is a second set value;
determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size, the second actual size, the first theoretical size and the second theoretical size by the following formulas:
width 1 ＝Gain×width 2 +offset′
Wherein width is 1 Indicating the theoretical size of the exposure field of view, width 2 Representing the actual size of the exposure field, gain representing the size Gain of the exposure field, offset representing the size offset of the exposure field;
the first length theoretical value, the first length measured value, the third length theoretical value and the third length measured value are respectively substituted into the formulas to obtain the size gain of the exposure field and the size offset of the exposure field in the Y direction;
and substituting the second length theoretical value, the second length measured value, the fourth length theoretical value and the fourth length measured value into the formulas respectively to obtain the size gain of the exposure field and the size offset of the exposure field in the X direction.
9. The exposure field calibration method according to claim 1, wherein step (E) comprises:
(E1) Respectively judging whether the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field reach corresponding preset test precision;
(E2) If the offset of the optical axis center of the objective lens, the gain of the size of the exposure field and the offset of the size of the exposure field reach the corresponding preset test precision, determining the current optical axis center of the objective lens as the field center of the exposure field and the size of the exposure field, and completing the calibration of the exposure field;
(E3) And (C) if at least one of the magnitude gain of the exposure field and the magnitude offset of the exposure field of the offset of the optical axis center of the objective lens does not reach the corresponding preset test precision, determining a new optical axis center of the objective lens according to the offset of the optical axis center of the objective lens and the optical axis center of the objective lens, updating the optical axis center of the objective lens by using the new optical axis center of the objective lens, and returning to the step (B).
10. The exposure field calibration device of the exposure system is characterized by comprising a luminous light source, a variable slit, an objective lens, a movable workbench and an energy sensor, wherein the energy sensor is arranged on the movable workbench, and the variable slit consists of four movable blades;
the exposure field calibration device comprises:
the control module is used for receiving a luminous light source starting instruction and controlling the luminous light source to be started;
the first determining module is used for adjusting the slit width of the variable slit to a first set value, so that the light emitted by the luminous light source irradiates the movable workbench through the variable slit with the slit width of the first set value to form a first exposure field of view, the movable workbench is controlled to move, the energy sensor is controlled to move to the center of the optical axis of the objective, the energy sensor is controlled to move from the center of the optical axis of the objective to a plurality of field edge test points of the first exposure field of view respectively to collect light intensity, and the offset of the optical axis of the objective and the first actual size of the first exposure field of view are determined according to the light intensity value collected by the energy sensor at each field edge test point;
The second determining module is used for adjusting the slit width of the variable slit to a second set value so that the light emitted by the luminous light source forms a second exposure field on the movable workbench through the variable slit with the second set value, the objective lens is controlled to move, the movable workbench is controlled to move so that the energy sensor moves to the center of the optical axis of the objective lens, the energy sensor is controlled to move from the center of the optical axis of the objective lens to a plurality of field edge test points of the second exposure field respectively for light intensity collection, and the second actual size of the second exposure field is determined according to the light intensity value collected by the energy sensor at each field edge test point;
the third determining module is used for determining the size gain of the exposure field and the size offset of the exposure field according to the first actual size and the second actual size;
and the calibration module is used for calibrating the exposure field according to the central offset of the optical axis of the objective lens, the size gain of the exposure field and the size offset of the exposure field.
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