CN114516725A - Low-expansion glass and preparation method thereof - Google Patents
Low-expansion glass and preparation method thereof Download PDFInfo
- Publication number
- CN114516725A CN114516725A CN202011300554.5A CN202011300554A CN114516725A CN 114516725 A CN114516725 A CN 114516725A CN 202011300554 A CN202011300554 A CN 202011300554A CN 114516725 A CN114516725 A CN 114516725A
- Authority
- CN
- China
- Prior art keywords
- parts
- tio
- low
- glass
- expansion glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title claims abstract description 48
- 238000002360 preparation method Methods 0.000 title claims description 7
- 238000002425 crystallisation Methods 0.000 claims abstract description 24
- 230000008025 crystallization Effects 0.000 claims abstract description 24
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 12
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000010899 nucleation Methods 0.000 claims description 18
- 230000006911 nucleation Effects 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 17
- 230000008018 melting Effects 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 13
- 238000000137 annealing Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 239000000156 glass melt Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 238000005352 clarification Methods 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 239000005347 annealed glass Substances 0.000 claims description 3
- 238000000498 ball milling Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 7
- 239000005388 borosilicate glass Substances 0.000 abstract description 3
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 3
- 238000010309 melting process Methods 0.000 abstract description 3
- 231100000956 nontoxicity Toxicity 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 239000002241 glass-ceramic Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
- C03C10/0045—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
Abstract
The invention discloses low-expansion glass which comprises the following components in parts by weight: SiO 2250-60 parts of TiO24-7 parts of MgO, 4-6 parts of ZnO, 4-7 parts of Al2O310-18 parts, B2O33-8 parts of Na24-8 parts of O, 2-5 parts of CaO and K20 to 1 portion of O, TiO21-3 parts. The low-expansion glass prepared by the invention has simple process and lower cost, can realize large-scale production, and the produced expansion glassLow coefficient and high light transmittance. The low-expansion borosilicate glass has the advantages of low expansion coefficient, stable physical and chemical properties, good transmittance, small difference between the hardness and the density and other conventional glasses, no toxicity and harm in the melting process and difficult crystallization.
Description
Technical Field
The invention relates to the technical field of glass, in particular to low-expansion glass and a preparation method thereof.
Background
The glass industry has been developed rapidly in recent years, the field of application of glass from manual to industrial production to small-scale production to large-scale batch production is increasingly wide for centuries, and the glass is gradually developed to the high-tech field from living utensils, materialized utensils, simple household wall glass and the like.
In a new era, a high-tech and high-demand environment, the low-expansion glass ceramics are widely applied, but the low-expansion glass ceramics have the problems of easy crystallization at high temperature, unstable special environment and the like, and the glass is easy to have low transmittance, serious light dispersion, unclear image transmission and the like.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides low-expansion glass and a preparation method thereof.
In order to solve the technical problems, the invention provides the following technical scheme:
the low-expansion glass comprises the following components in parts by weight: SiO 2250-60 parts of TiO24-7 parts of MgO, 4-6 parts of ZnO, 4-7 parts of Al2O310-18 parts of, B2O33-8 parts of Na24-8 parts of O, 2-5 parts of CaO and K20 to 1 portion of O, TiO21-3 parts.
As a preferred technical scheme of the invention, the composition comprises the following components in parts by weight: SiO 2250 parts of TiO24 parts of MgO, 4 parts of ZnO, and Al2O310 parts of, B2O33 parts of Na2O4, CaO 2, K20 part of O, TiO21 part.
As a preferred technical scheme of the invention, the composition comprises the following components in parts by mass: SiO 2258 parts of TiO26 parts of MgO 5 parts, ZnO 5 parts and Al2O315 parts of, B2O36 parts of Na2O6, CaO 4, K20.8 part of O, TiO2And 2 parts.
As a preferred technical scheme of the invention, the composition comprises the following components in parts by weight: SiO 2260 parts of TiO27 parts of MgO 6 parts, 7 parts of ZnO, Al2O318 parts of, B2O38 parts of Na2O8, CaO 5, K2O1 part, TiO2And 3 parts.
A preparation method of low-expansion glass comprises the following steps:
A. calculating the actual dosage of the raw materials corresponding to each oxide according to the proportion, uniformly mixing, putting into a ball mill, ball-milling for 2-4 hours, and drying to obtain a mixture;
B. adding the mixture into a melting furnace in three times under the conditions of 1250-; heating the melting furnace to 1400-1450 ℃ for high-temperature melting for 0.5-1h, then heating the melting furnace to 1500-1580 ℃ for clarification for 0.5-4h to obtain a glass melt;
C. pouring the glass melt into a mold preheated to above 500-600 ℃ for molding;
D. placing the formed glass into an annealing furnace for annealing at 560 ℃ and 600 ℃ for 1-2h, and cooling to room temperature along with the furnace;
E. d, immediately carrying out nucleation treatment on the annealed glass obtained in the step D, wherein the nucleation treatment temperature is 700-725 ℃, and the nucleation treatment time is 0.5-2 h;
F. f, immediately carrying out crystallization treatment on the glass obtained in the step F, wherein the crystallization treatment temperature is 860-890 ℃, and the time is 0.5-2 h; and cooling to room temperature after the crystallization treatment is finished, thus obtaining the low-expansion glass.
In a preferred embodiment of the present invention, the amount of the mixture added to the melting furnace in each step (B) is 1/3.
As a preferred technical scheme of the invention, oxygen is introduced in the nucleation and crystallization processes, and the oxygen concentration in the nucleation and crystallization processes is more than or equal to 95%.
The invention has the beneficial effects that:
the low-expansion glass prepared by the invention has the advantages of simple process, low cost, low expansion coefficient and good light transmittance, and can realize large-scale production. The low-expansion borosilicate glass has the advantages of low expansion coefficient, stable physical and chemical properties, good transmittance, small difference between the hardness and the density and other conventional glasses, no toxicity and harm in the melting process and difficult crystallization. In the production process, glass is subjected to high-temperature melting, clarification, molding and annealing and then subjected to nucleation and crystallization through a certain heat treatment system to obtain the microcrystalline glass product with fine grains, high content and uniform structure. The microcrystalline glass is a polycrystalline material obtained by controlled crystallization, and is subjected to nucleation and crystallization at the temperature defined by the invention to obtain the microcrystalline glass with fine and uniformly distributed crystal grains.
Drawings
Detailed Description
The present invention will now be described in connection with the preferred embodiments, it being understood that the preferred embodiments described herein are only for purposes of illustration and explanation and are not intended to be limiting of the invention.
Example one
The low-expansion glass comprises the following components in parts by weight: SiO 2250 parts of TiO24 portions of MgO, 4 portions of ZnO, 4 portions of Al2O310 parts of, B2O33 parts of Na2O4, CaO 2, K20 part of O, TiO21 part.
Example two
The low-expansion glass comprises the following components in parts by weight: SiO 2258 parts of TiO26 parts of MgO 5 parts, ZnO 5 parts and Al2O315 parts of, B2O36 parts of Na2O6, CaO 4, K20.8 part of O, TiO2And 2 parts of the raw materials.
EXAMPLE III
The low-expansion glass comprises the following components in parts by weight: SiO 2260 parts of TiO27 parts of MgO 6 parts, 7 parts of ZnO, Al2O318 parts of, B2O38 parts of Na2O8, CaO 5, K2O1 part, TiO2And 3 parts.
A preparation method of low-expansion glass comprises the following steps:
A. calculating the actual dosage of the raw materials corresponding to each oxide according to the proportion, uniformly mixing, putting into a ball mill for ball milling for 2-4 hours, and drying to obtain a mixture;
B. adding the mixture into a melting furnace in three times under the conditions of 1250-; heating the melting furnace to 1400-1450 ℃ for high-temperature melting for 0.5-1h, then heating the melting furnace to 1500-1580 ℃ for clarification for 0.5-4h to obtain a glass melt;
C. pouring the glass melt into a mold preheated to the temperature of more than 500 ℃ and 600 ℃ for molding;
D. placing the formed glass into an annealing furnace for annealing at 560 ℃ and 600 ℃ for 1-2h, and cooling to room temperature along with the furnace;
E. d, immediately carrying out nucleation treatment on the annealed glass obtained in the step D, wherein the nucleation treatment temperature is 700-725 ℃, and the nucleation treatment time is 0.5-2 h;
F. f, immediately carrying out crystallization treatment on the glass obtained in the step F, wherein the crystallization treatment temperature is 860-890 ℃, and the time is 0.5-2 h; and cooling to room temperature after the crystallization treatment is finished, thus obtaining the low-expansion glass.
In a preferred embodiment of the present invention, in the step (B), the mixture added to the melting furnace in each time is 1/3 of the total amount, and the mixture is added in three times to ensure that the glass reacts sufficiently and uniformly.
As a preferred technical scheme of the invention, oxygen is introduced in the nucleation and crystallization processes, and the oxygen concentration in the nucleation and crystallization processes is more than or equal to 95%.
The low-expansion glass prepared by the invention has the advantages of simple process, low cost, low expansion coefficient and good light transmittance, and can realize large-scale production. The low-expansion borosilicate glass has the advantages of low expansion coefficient, stable physical and chemical properties, good transmittance, small difference between the hardness and the density and other conventional glasses, no toxicity and harm in the melting process and difficult crystallization. In the production process, glass is subjected to high-temperature melting, clarification, molding and annealing and then subjected to nucleation and crystallization through a certain heat treatment system to obtain the microcrystalline glass product with fine grains, high content and uniform structure. The microcrystalline glass is a polycrystalline material obtained by controlled crystallization, and is nucleated and crystallized at the temperature defined by the invention to obtain the microcrystalline glass with fine and uniformly distributed crystal grains, thereby ensuring the performance of the glass.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention.
Claims (7)
1. The low-expansion glass is characterized by comprising the following components in parts by mass：SiO250-60 parts of TiO24-7 parts of MgO, 4-6 parts of ZnO, 4-7 parts of Al2O310-18 parts of, B2O33-8 parts of Na24-8 parts of O, 2-5 parts of CaO and K20 to 1 portion of O, TiO21-3 parts.
2. The low expansion glass according to claim 1, comprising the following components in parts by mass: SiO 2250 parts of TiO24 parts of MgO, 4 parts of ZnO, and Al2O310 parts of, B2O33 parts of Na2O4, CaO 2, K20 part of O, TiO21 part.
3. The low expansion glass according to claim 1, comprising the following components in parts by mass: SiO 2258 parts of TiO26 parts of MgO 5 parts, ZnO 5 parts and Al2O315 parts of, B2O36 parts of Na2O6, CaO 4, K20.8 part of O, TiO2And 2 parts of the raw materials.
4. The low expansion glass according to claim 1, comprising the following components in parts by mass: SiO 2260 parts of TiO27 parts of MgO 6 parts, 7 parts of ZnO, Al2O318 parts of, B2O38 parts of Na2O8, CaO 5, K2O1 part, TiO2And 3 parts.
5. A preparation method of low-expansion glass is characterized by comprising the following steps:
A. calculating the actual dosage of the raw materials corresponding to each oxide according to the proportion, uniformly mixing, putting into a ball mill for ball milling for 2-4 hours, and drying to obtain a mixture;
B. adding the mixture into a melting furnace in three times under the conditions of 1250-; heating the melting furnace to 1400-1450 ℃ for high-temperature melting for 0.5-1h, then heating the melting furnace to 1500-1580 ℃ for clarification for 0.5-4h to obtain a glass melt;
C. pouring the glass melt into a mold preheated to the temperature of more than 500 ℃ and 600 ℃ for molding;
D. placing the formed glass into an annealing furnace for annealing at 560 ℃ and 600 ℃ for 1-2h, and cooling to room temperature along with the furnace;
E. d, immediately carrying out nucleation treatment on the annealed glass obtained in the step D, wherein the nucleation treatment temperature is 700-725 ℃, and the nucleation treatment time is 0.5-2 h;
F. f, immediately carrying out crystallization treatment on the glass obtained in the step F, wherein the crystallization treatment temperature is 860-890 ℃, and the time is 0.5-2 h; and cooling to room temperature after the crystallization treatment is finished, thus obtaining the low-expansion glass.
6. The method according to claim 2, wherein the amount of the mixture added to the melting furnace in each step (B) is 1/3.
7. The method for preparing low expansion glass according to claim 2, wherein oxygen is introduced during both the nucleation and crystallization processes, and the oxygen concentration during the nucleation and crystallization processes is not less than 95%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011300554.5A CN114516725A (en) | 2020-11-19 | 2020-11-19 | Low-expansion glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011300554.5A CN114516725A (en) | 2020-11-19 | 2020-11-19 | Low-expansion glass and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114516725A true CN114516725A (en) | 2022-05-20 |
Family
ID=81594815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011300554.5A Withdrawn CN114516725A (en) | 2020-11-19 | 2020-11-19 | Low-expansion glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114516725A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101357822A (en) * | 2008-09-03 | 2009-02-04 | 河南安飞电子玻璃有限公司 | Aluminium-boron-titan silicate glass with high straining point and high elastic modulus |
| CN101428966A (en) * | 2008-12-05 | 2009-05-13 | 北京工业大学 | Borosilicate glass suitable for electric light source |
| CN103723926A (en) * | 2013-12-19 | 2014-04-16 | 海南中航特玻材料有限公司 | Low-expansion lithium aluminum silicon transparent glass ceramic |
| CN105948516A (en) * | 2016-06-03 | 2016-09-21 | 秦皇岛星箭特种玻璃有限公司 | Anti-radiation lithium-aluminum-silicate system low-expansion window glass and machining process thereof |
| WO2019105068A1 (en) * | 2017-11-30 | 2019-06-06 | 深圳南玻应用技术有限公司 | Organosilicon antimicrobial solution, organosilicon antimicrobial agent, antimicrobial glass, preparation method therefor and use thereof |
-
2020
- 2020-11-19 CN CN202011300554.5A patent/CN114516725A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101357822A (en) * | 2008-09-03 | 2009-02-04 | 河南安飞电子玻璃有限公司 | Aluminium-boron-titan silicate glass with high straining point and high elastic modulus |
| CN101428966A (en) * | 2008-12-05 | 2009-05-13 | 北京工业大学 | Borosilicate glass suitable for electric light source |
| CN103723926A (en) * | 2013-12-19 | 2014-04-16 | 海南中航特玻材料有限公司 | Low-expansion lithium aluminum silicon transparent glass ceramic |
| CN105948516A (en) * | 2016-06-03 | 2016-09-21 | 秦皇岛星箭特种玻璃有限公司 | Anti-radiation lithium-aluminum-silicate system low-expansion window glass and machining process thereof |
| WO2019105068A1 (en) * | 2017-11-30 | 2019-06-06 | 深圳南玻应用技术有限公司 | Organosilicon antimicrobial solution, organosilicon antimicrobial agent, antimicrobial glass, preparation method therefor and use thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4042362A (en) | Production of glass-ceramic articles | |
| US3282770A (en) | Transparent divitrified strengthened glass article and method of making it | |
| CN108821598B (en) | Microcrystalline glass and preparation method thereof | |
| KR900003447B1 (en) | Strengthened glass articles and method for making | |
| US3275493A (en) | Glass body having surface crystalline layer thereon and method of making it | |
| US3445252A (en) | Alpha- and beta-cristobalite glassceramic articles and methods | |
| CN110577365A (en) | Nanocrystalline glass ceramic and preparation method thereof | |
| CN115286251A (en) | Tempered glass, microcrystalline glass and preparation method and application thereof | |
| CN114349336B (en) | Low-expansion borosilicate transparent colored glaze and preparation method and application thereof | |
| CN105948514A (en) | Method for manufacturing colorful transparent colored glass ceramics with high degree of crystallinity by adopting fusing-cooling method for crystallization | |
| JPS6159257B2 (en) | ||
| CN112047634A (en) | Transparent lithium-aluminum silicate glass ceramic and preparation method thereof | |
| US3279931A (en) | Glass-ceramic body and method of making it | |
| US3201266A (en) | Glass ceramic bodies and method of making them | |
| US3467534A (en) | Barium silicate glass-ceramic body and method of making it | |
| US3313609A (en) | Method of making high strength nepheline crystalline glass | |
| US3241935A (en) | Bone china and method of making it | |
| CN108083641B (en) | Preparation method of microcrystalline glass with high mechanical property | |
| US3761235A (en) | Marble like glass material and method of producing the same | |
| CN105314852A (en) | Rare earth doped CaO-Al2O3-SiO2 transparent glass ceramic and preparation method thereof | |
| US3720526A (en) | Glass-ceramic body | |
| US3268315A (en) | Method of forming a devitrified glass seal with tungsten or molybdenum | |
| CN114516725A (en) | Low-expansion glass and preparation method thereof | |
| CN101549947A (en) | Method for integrally producing micro-crystalline ceramic composite plate | |
| CN114516723A (en) | Low-expansion glass ceramic and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20220520 |
|
| WW01 | Invention patent application withdrawn after publication |