CN114505084A - Pretreatment method of cuprous chloride catalyst - Google Patents

Pretreatment method of cuprous chloride catalyst Download PDF

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CN114505084A
CN114505084A CN202210053170.0A CN202210053170A CN114505084A CN 114505084 A CN114505084 A CN 114505084A CN 202210053170 A CN202210053170 A CN 202210053170A CN 114505084 A CN114505084 A CN 114505084A
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cuprous chloride
silicon
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CN114505084B (en
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张建树
籍煜雯
张金利
郭瑞丽
张海洋
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Shihezi University
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
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    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/08Heat treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
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    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/1071Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon

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Abstract

The invention relates to the technical field of polycrystalline silicon production processes, in particular to a pretreatment method of a cuprous chloride catalyst. Cuprous chloride and Si silicon powder are filled in a tube elastic reactor, the partial pressure of the cuprous chloride is increased through a vacuum environment, the cuprous chloride is converted from a solid phase to a gas phase, the diffusion rate of the cuprous chloride is accelerated, and a uniformly dispersed copper silicon active center is formed; thereby accelerating the adsorption, deposition and reaction of cuprous chloride on the surface of silicon particles and reducing the deactivation caused by Cu sintering. The embodiment proves that the cold hydrogenation reaction of the silicon tetrachloride after the cuprous chloride and the Si silicon powder are pretreated can shorten the induction period, improve the catalytic efficiency of the silicon tetrachloride, improve the reaction efficiency of the cold hydrogenation and reduce the amount of copper impurities in a rear system. The method provided by the invention has the advantages of low requirement on equipment, simple preparation process, low energy consumption and obvious promotion on cold hydrogenation reaction effect.

Description

一种氯化亚铜催化剂的预处理方法A kind of pretreatment method of cuprous chloride catalyst

技术领域technical field

本发明涉及多晶硅生产工艺技术领域,具体涉及一种氯化亚铜催化剂的预处理方法。The invention relates to the technical field of polysilicon production technology, in particular to a pretreatment method of a cuprous chloride catalyst.

背景技术Background technique

改良西门子法是生产多晶硅的主流工艺,其主要缺点是尾气回收单元中四氯化硅氢化效率低,每生产1t多晶硅,副产超过15t四氯化硅,四氯化硅属于剧毒物质,严重污染环境,我国规定多晶硅生产还原尾气中四氯化硅回收利用率不得低于98.5%。最有效的措施为在多晶硅生产过程中将四氯化硅氢化转化为三氯氢硅,对四氯化硅进行循环利用。目前国内多晶硅氢化方法大多采用冷氢化技术:SiCl4+3Si+2H2→4SiHCl3,即硅粉、氢气和四氯化硅在催化剂的作用下在流化床/固定床中发生“气-固-固”反应。反应温度400-600℃,压力1-4MPa,氢气与四氯化硅的摩尔进料比为1-10,使用的催化剂多为铜基催化剂。The modified Siemens method is the mainstream process for producing polysilicon. Its main disadvantage is that the hydrogenation efficiency of silicon tetrachloride in the exhaust gas recovery unit is low. For every 1t of polysilicon produced, the by-product exceeds 15t of silicon tetrachloride. Silicon tetrachloride is a highly toxic substance. To pollute the environment, my country stipulates that the recovery rate of silicon tetrachloride in the reduction exhaust gas of polysilicon production shall not be lower than 98.5%. The most effective measure is to convert silicon tetrachloride into trichlorosilane by hydrogenation in the polysilicon production process, and to recycle the silicon tetrachloride. At present, most domestic polysilicon hydrogenation methods use cold hydrogenation technology: SiCl 4 +3Si+2H 2 →4SiHCl 3 , that is, under the action of catalyst, silicon powder, hydrogen and silicon tetrachloride will produce gas-solid “gas-solid” in the fluidized bed/fixed bed. -Solid" reaction. The reaction temperature is 400-600°C, the pressure is 1-4MPa, the molar feed ratio of hydrogen to silicon tetrachloride is 1-10, and the catalysts used are mostly copper-based catalysts.

有研究认为冷氢化过程中催化剂的活性相为铜硅化合物。在流化床内CuCl催化剂与硅颗粒相互接触被还原,反应生成SiCl4以及活性自由Cu,Cu在Si粒子主体的不规则扩散使得粒子表面离散地形成了“Cu-Si”化合物。当通入H2和SiCl4后,“Cu-Si”化合物催化了SiCl4的加氢反应生成HCl与SiHCl3,铜则不断在催化剂表面进行刻蚀,直至硅反应完全。因此加快“Cu-Si”化合物的形成,成为提高冷氢化反应速率的重点。目前的工业生产中,由于氯化亚铜熔点低且易挥发损失,铜催化剂不断损失,使用时需将氯化亚铜不断补充加入流化床反应器中,这就造成了生产成本的增加。目前还未有较好的催化剂预处理方法报道。Some studies believe that the active phase of the catalyst in the cold hydrogenation process is a copper-silicon compound. In the fluidized bed, the CuCl catalyst and the silicon particles are contacted and reduced, and the reaction generates SiCl 4 and active free Cu. The irregular diffusion of Cu in the main body of the Si particles makes the "Cu-Si" compound discretely formed on the surface of the particles. When H 2 and SiCl 4 are introduced, the "Cu-Si" compound catalyzes the hydrogenation reaction of SiCl 4 to generate HCl and SiHCl 3 , and copper is continuously etched on the catalyst surface until the silicon reaction is complete. Therefore, accelerating the formation of "Cu-Si" compounds has become the focus of improving the reaction rate of cold hydrogenation. In the current industrial production, due to the low melting point of cuprous chloride and its easy volatilization loss, the copper catalyst is continuously lost. When using, cuprous chloride needs to be continuously added to the fluidized bed reactor, which causes an increase in production costs. So far, there is no good report on catalyst pretreatment method.

发明内容SUMMARY OF THE INVENTION

针对上述技术问题,本申请提供了一种氯化亚铜催化剂预处理方法。本发明有效缩短四氯化硅冷氢化过程中催化剂存在的诱导期,加快固相催化剂与固相硅粉之间的反应,提高氯化亚铜的催化效率。In view of the above technical problems, the present application provides a method for pretreatment of cuprous chloride catalyst. The invention effectively shortens the induction period of the catalyst in the cold hydrogenation process of silicon tetrachloride, accelerates the reaction between the solid-phase catalyst and the solid-phase silicon powder, and improves the catalytic efficiency of cuprous chloride.

本发明具体技术方案如下:The specific technical scheme of the present invention is as follows:

本发明提供了一种四氯化硅冷氢化过程中催化剂的预处理方法,所述的预处理方法包括有:将CuCl和硅粉放入密闭反应器中,惰性气体置换出密闭反应器中空气,升温加热反应一段时间,冷却至室温完成预处理过程。The invention provides a catalyst pretreatment method in the cold hydrogenation process of silicon tetrachloride. The pretreatment method comprises the following steps: putting CuCl and silicon powder into a closed reactor, and replacing the air in the closed reactor with an inert gas , heating and reacting for a period of time, and cooling to room temperature to complete the pretreatment process.

进一步地,所述的CuCl和硅粉的质量比为10:1~2。Further, the mass ratio of the CuCl to the silicon powder is 10:1-2.

优选的,所述的加热反应的反应温度为400~550℃,反应时间为1~10小时。Preferably, the reaction temperature of the heating reaction is 400-550° C., and the reaction time is 1-10 hours.

所述的硅粉为酸洗后的硅粉。The silicon powder is acid-washed silicon powder.

优选的,所述的密闭反应器为管弹反应器,进一步的,所述的管弹反应器出口接有气袋或真空气泵。Preferably, the closed reactor is a tube bomb reactor, and further, an air bag or a vacuum air pump is connected to the outlet of the tube bomb reactor.

优选的,所述的惰性气体为氮气或氩气。Preferably, the inert gas is nitrogen or argon.

进一步的,所述的预处理过程为真空状态,真空度为-0.09Mpa。Further, the pretreatment process is in a vacuum state, and the degree of vacuum is -0.09Mpa.

与现有技术相比,本发明的有益效果是:Compared with the prior art, the beneficial effects of the present invention are:

本发明在管弹反应器中装入混匀的氯化亚铜和Si硅粉,在升温过程中使用真空泵抽真空,真空环境下增加了氯化亚铜的分压,使其由固相转变为气相,加快氯化亚铜的扩散速率,形成均匀分散的铜硅活性中心。从而加快氯化亚铜在硅粒子表面吸附、沉积和反应并减少由Cu烧结引起的失活。同时,反应生成的气体等产物也可以及时排出,促进反应的正向进行,即铜硅活性相的生成。预处理完成后直接将含有铜硅化合物的反应产物放到固定床进行四氯化硅冷氢化反应。通过实施例证实,对氯化亚铜和Si硅粉进行预处理后不仅可以缩短诱导期,提高四氯化硅催化效率,进而提高冷氢化的反应效率,还可以减少后系统中铜杂质的量。本发明所提供的方法对设备要求低,制备过程简单,耗能低,对冷氢化反应效果促进明显。In the invention, the mixed cuprous chloride and Si silicon powder are loaded into the tube bomb reactor, and the vacuum pump is used to evacuate during the heating process. In the gas phase, the diffusion rate of cuprous chloride is accelerated, and a uniformly dispersed copper-silicon active center is formed. Thus, the adsorption, deposition and reaction of cuprous chloride on the surface of silicon particles are accelerated and the deactivation caused by Cu sintering is reduced. At the same time, the products such as gas generated by the reaction can also be discharged in time to promote the forward progress of the reaction, that is, the formation of the copper-silicon active phase. After the pretreatment is completed, the reaction product containing the copper-silicon compound is directly put into the fixed bed to carry out the cold hydrogenation reaction of silicon tetrachloride. It is confirmed by the examples that the pretreatment of cuprous chloride and Si silicon powder can not only shorten the induction period, improve the catalytic efficiency of silicon tetrachloride, and then improve the reaction efficiency of cold hydrogenation, but also can reduce the amount of copper impurities in the post-system. . The method provided by the invention has low requirements on equipment, simple preparation process, low energy consumption, and obviously promotes the effect of cold hydrogenation reaction.

附图说明Description of drawings

图1是管弹反应器示意图;图中,(1)内衬石英玻璃,(2)石墨垫片,(3)法兰,(4)压力表,(5)针阀,(6)三通阀,(7)第一出口,(8)第二出口。Figure 1 is a schematic diagram of a tube bomb reactor; in the figure, (1) lined with quartz glass, (2) graphite gasket, (3) flange, (4) pressure gauge, (5) needle valve, (6) tee Valve, (7) first outlet, (8) second outlet.

图2是无预处理及实施例2~4对催化剂预处理后的转化率对比图。Figure 2 is a comparison diagram of the conversion ratios without pretreatment and after catalyst pretreatment in Examples 2-4.

具体实施方式Detailed ways

下面结合实施例,进一步阐述本发明:本领域技术人员可以借鉴本文内容,适当改进工艺参数实现。特别需要指出的是,所有类似的替换和改动对本领域技术人员来说是显而易见的,它们都被视为包括在本发明。本发明的方法及应用已经通过较佳实施例进行了描述,相关人员明显能在不脱离本发明内容、精神和范围内对本文所述的方法和应用进行改动或适当变更与组合,来实现和应用本发明技术。实施例中未注明具体条件的实验方法,均按照常规条件;所用试剂和生物材料,如无特殊说明,均可从商业途径获得。The present invention will be further described below in conjunction with the embodiments: those skilled in the art can learn from the contents of this paper and appropriately improve the process parameters to achieve. It should be particularly pointed out that all similar substitutions and modifications are obvious to those skilled in the art, and they are deemed to be included in the present invention. The method and application of the present invention have been described through the preferred embodiments, and it is obvious that relevant persons can make changes or appropriate changes and combinations of the methods and applications described herein without departing from the content, spirit and scope of the present invention to achieve and Apply the technology of the present invention. The experimental methods with no specific conditions indicated in the examples are all in accordance with conventional conditions; the reagents and biological materials used can be obtained from commercial sources unless otherwise specified.

对比例1:Comparative Example 1:

称取8g酸洗后的硅粉和1.6g氯化亚铜(CuCl),充分混合后填充到固定床反应器中进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅的摩尔比为4:1。经测定,反应完成后四氯化硅的转化率为14.61%。8 g of the acid-washed silicon powder and 1.6 g of cuprous chloride (CuCl) were weighed, fully mixed, and then filled into a fixed-bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4 :1. It was determined that the conversion rate of silicon tetrachloride after the reaction was completed was 14.61%.

实施例1:Example 1:

将2gCuCl和10g酸洗后的Si粉充分混合,置于密闭反应器中,并用氮气多次置换,确保内部无空气。后以10℃/min的升温速率升温至450℃,恒温3h,整个反应过程中反应系统密闭,反应完成后压力逐渐升高升至4atm(标准大气压)。待降至室温后,称取9.6g处理后的硅粉填充到固定床反应器中进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅的摩尔比为4:1。经测定,反应完成后四氯化硅转化率为14.17%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a closed reactor, and replace it with nitrogen several times to ensure that there is no air inside. Then, the temperature was raised to 450°C at a heating rate of 10°C/min, and the temperature was kept constant for 3 hours. The reaction system was closed during the whole reaction process. After the reaction was completed, the pressure was gradually increased to 4 atm (standard atmospheric pressure). After cooling to room temperature, 9.6 g of the treated silicon powder was weighed and filled into a fixed-bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4 :1. It was determined that the conversion rate of silicon tetrachloride after the reaction was completed was 14.17%.

实施例2:Example 2:

将2gCuCl和10g酸洗后的Si粉充分混合,置于管弹反应器中,通入氮气,多次置换确保内部无空气,管弹反应器出口接体积为10L的气袋使得反应系统压力始终为常压。以10℃/min的升温速率升温至450℃,恒温3h。待降至室温后,称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为15.48%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, put it in the tube bomb reactor, pass nitrogen gas, and replace it several times to ensure that there is no air inside. is normal pressure. The temperature was raised to 450°C at a heating rate of 10°C/min, and the temperature was kept constant for 3h. After cooling to room temperature, 9.6 g of the treated silicon powder was weighed and filled into a fixed-bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 15.48%.

图1是管弹反应器的示意图;如图1所示,管弹反应器包括(1)内衬石英玻璃,(2)石墨垫片,(3)法兰,(4)压力表,(5)针阀,(6)三通阀;所述三通阀(6)包括连接钢瓶用于置换管弹反应器中气体的第一出口(7),和连接气袋或真空泵的第二出口(8)。Figure 1 is a schematic diagram of a tube bomb reactor; as shown in Figure 1, the tube bomb reactor includes (1) lined with quartz glass, (2) graphite gasket, (3) flange, (4) pressure gauge, (5) ) needle valve, (6) three-way valve; the three-way valve (6) includes a first outlet (7) connected to a steel cylinder for replacing the gas in the tube bomb reactor, and a second outlet (7) connected to an air bag or a vacuum pump 8).

实施例3:Example 3:

将2gCuCl和10g酸洗后的Si粉充分混合,置于管弹反应器中,通入氮气,多次置换确保内部无空气,管弹反应器出口接真空泵抽真空,整个过程中保持真空度为-0.09MPa。以10℃/min的升温速率升温至450℃,恒温3h后冷却至室温。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为21.15%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, put it in the tube bomb reactor, pass nitrogen, and replace it several times to ensure that there is no air inside. The outlet of the tube bomb reactor is connected to a vacuum pump for vacuuming. -0.09MPa. The temperature was raised to 450°C at a heating rate of 10°C/min, kept at a constant temperature for 3 hours, and then cooled to room temperature. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 21.15%.

实施例4:Example 4:

将1gCuCl和10g酸洗后的Si粉充分混合,置于管弹反应器中,通入氮气,多次置换确保内部无空气,管弹反应器出口接真空泵抽真空,整个过程中保持真空度为-0.09MPa。以10℃/min的升温速率升温至450℃,恒温3h后冷却至室温。称取8.8g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为19.14%。Mix 1g of CuCl and 10g of acid-washed Si powder thoroughly, put it in the tube bomb reactor, pass nitrogen, and replace it several times to ensure that there is no air inside. The outlet of the tube bomb reactor is connected to a vacuum pump for vacuuming. -0.09MPa. The temperature was raised to 450°C at a heating rate of 10°C/min, kept at a constant temperature for 3 hours, and then cooled to room temperature. 8.8 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 19.14%.

图2是无预处理及实施例2~4对催化剂预处理后的转化率对比图;由图2可见,对催化剂进行预处理后其四氯化硅转化率具有明显的上升,真空状态下进行预处理后的转化率提升至20%左右。Figure 2 is a comparison chart of the conversion ratios without pretreatment and after catalyst pretreatment in Examples 2 to 4; it can be seen from Figure 2 that the conversion ratio of silicon tetrachloride increases significantly after the catalyst is pretreated, and the catalyst is carried out in a vacuum state. The conversion rate after pretreatment increased to about 20%.

实施例5:Example 5:

将2gCuCl和10g酸洗后的Si粉充分混合,置于管弹反应器中,并用氮气多次置换,确保内部无空气。以10℃/min的升温速率升温至400℃,恒温3h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为20.61%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a tube bomb reactor, and replace it with nitrogen several times to ensure that there is no air inside. The temperature was raised to 400°C at a heating rate of 10°C/min, and the temperature was kept constant for 3 hours. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 20.61%.

实施例6:Example 6:

将2gCuCl和10g酸洗后的Si粉充分混合,置于管弹反应器中,并用氮气多次置换,确保内部无空气。以10℃/min的升温速率升温至500℃,恒温3h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为19.66%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a tube bomb reactor, and replace it with nitrogen several times to ensure that there is no air inside. The temperature was raised to 500°C at a heating rate of 10°C/min, and the temperature was kept constant for 3 hours. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 19.66%.

实施例7:Example 7:

将2gCuCl和10g酸洗后的Si粉充分混合,置于密闭反应器中,并用氮气多次置换,确保内部无空气。以10℃/min的升温速率升温至550℃,恒温3h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为22.70%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a closed reactor, and replace it with nitrogen several times to ensure that there is no air inside. The temperature was raised to 550°C at a heating rate of 10°C/min, and the temperature was kept constant for 3 hours. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 22.70%.

实施例8:Example 8:

将2gCuCl和10g酸洗后的Si粉充分混合,置于密闭反应器中,并用氩气多次置换,确保内部无空气。以10℃/min的升温速率升温至550℃,恒温1h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为19.88%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a closed reactor, and replace it with argon several times to ensure that there is no air inside. The temperature was raised to 550°C at a heating rate of 10°C/min, and the temperature was kept constant for 1 h. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, in a nitrogen atmosphere, the temperature is raised to 500°C at a heating rate of 10°C/min, the reaction pressure is normal pressure, the flow rate of hydrogen is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 19.88%.

实施例9:Example 9:

将2gCuCl和10g酸洗后的Si粉充分混合,置于密闭反应器中,并用氩气多次置换,确保内部无空气。以10℃/min的升温速率升温至550℃,恒温5h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为21.07%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a closed reactor, and replace it with argon several times to ensure that there is no air inside. The temperature was raised to 550°C at a heating rate of 10°C/min, and the temperature was kept constant for 5h. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 21.07%.

实施例10:Example 10:

将2gCuCl和10g酸洗后的Si粉充分混合,置于密闭反应器中,并用氩气多次置换,确保内部无空气。以10℃/min的升温速率升温至550℃,恒温10h,整个过程使用真空泵抽真空,真空度为-0.09MPa。称取9.6g处理后的硅粉填充到固定床反应器进行冷氢化反应。反应条件为:氮气吹扫后,在氮气氛围中以10℃/min的升温速率升温至500℃,反应压力为常压,氢气流速为200mL/min,氢气与四氯化硅摩尔比为4:1,四氯化硅转化率为21.35%。Mix 2g of CuCl and 10g of acid-washed Si powder thoroughly, place it in a closed reactor, and replace it with argon several times to ensure that there is no air inside. The temperature was raised to 550°C at a heating rate of 10°C/min, and the temperature was kept constant for 10h. The whole process was evacuated by a vacuum pump, and the vacuum degree was -0.09MPa. 9.6 g of the treated silicon powder was weighed and filled into a fixed bed reactor for cold hydrogenation reaction. The reaction conditions are: after nitrogen purging, the temperature is raised to 500°C at a heating rate of 10°C/min in a nitrogen atmosphere, the reaction pressure is normal pressure, the hydrogen flow rate is 200mL/min, and the molar ratio of hydrogen to silicon tetrachloride is 4: 1. The conversion rate of silicon tetrachloride is 21.35%.

表1.预处理方式对冷氢化反应影响的对比Table 1. Comparison of the effects of pretreatment methods on cold hydrogenation

Figure BDA0003475121190000061
Figure BDA0003475121190000061

由表1可见,通过对硅粉和氯化亚铜进行预处理后进行四氯化硅冷氢化反应可以提高四氯化硅催化效率,进而提升冷氢化的反应效率。这是由于预处理反应增加了氯化亚铜的分压,使其由固相转变为气相,加快氯化亚铜的扩散速率,形成均匀分散的铜硅活性中心。而且预处理反应加快氯化亚铜在硅粒子表面吸附、沉积和反应,并减少由Cu烧结引起的失活。同时,反应生成的气体等产物也可以及时排出,促进反应的正向进行。It can be seen from Table 1 that the catalytic efficiency of silicon tetrachloride can be improved by pre-processing silicon powder and cuprous chloride and then performing cold hydrogenation reaction of silicon tetrachloride, thereby improving the reaction efficiency of cold hydrogenation. This is because the pretreatment reaction increases the partial pressure of cuprous chloride, which transforms it from solid phase to gas phase, accelerates the diffusion rate of cuprous chloride, and forms uniformly dispersed copper-silicon active centers. Moreover, the pretreatment reaction accelerates the adsorption, deposition and reaction of cuprous chloride on the surface of silicon particles, and reduces the deactivation caused by Cu sintering. At the same time, products such as gas generated by the reaction can also be discharged in time to promote the forward progress of the reaction.

上文所列出的一系列的详细说明仅仅是针对本发明的可行性实施例的具体说明,它们并非用以限制本发明的保护范围,凡未脱离本发明技艺精神所作的等效实施例或变更均应包含在本发明的保护范围之内。The series of detailed descriptions listed above are only specific descriptions for the feasible embodiments of the present invention, and they are not intended to limit the protection scope of the present invention. Changes should all be included within the protection scope of the present invention.

Claims (8)

1.一种四氯化硅冷氢化过程中催化剂的预处理方法,其特征在于,所述的预处理方法包括有:将CuCl和硅粉放入密闭反应器中,惰性气体置换出密闭反应器中空气,升温加热反应一段时间,冷却至室温完成预处理过程。1. the pretreatment method of catalyst in a silicon tetrachloride cold hydrogenation process, is characterized in that, described pretreatment method comprises: CuCl and silicon powder are put into closed reactor, and inert gas replaces closed reactor In the air, the temperature is raised and heated for a period of time, and then cooled to room temperature to complete the pretreatment process. 2.根据权利要求1所述的预处理方法,其特征在于,所述CuCl和硅粉的质量比为10:1~2。2 . The pretreatment method according to claim 1 , wherein the mass ratio of the CuCl to the silicon powder is 10:1-2. 3 . 3.根据权利要求1所述的预处理方法,其特征在于,所述加热反应的反应温度为400~550℃,反应时间为1~10小时。3 . The pretreatment method according to claim 1 , wherein the reaction temperature of the heating reaction is 400-550° C., and the reaction time is 1-10 hours. 4 . 4.根据权利要求1所述的预处理方法,其特征在于,所述的硅粉为酸洗后的硅粉。4 . The pretreatment method according to claim 1 , wherein the silicon powder is acid-washed silicon powder. 5 . 5.根据权利要求1所述的预处理方法,其特征在于,所述的密闭反应器为管弹反应器。5. The pretreatment method according to claim 1, wherein the closed reactor is a tube bomb reactor. 6.根据权利要求5所述的预处理方法,其特征在于,所述的管弹反应器出口接有气袋或真空气泵。6 . The pretreatment method according to claim 5 , wherein an air bag or a vacuum air pump is connected to the outlet of the tube bomb reactor. 7 . 7.根据权利要求1所述的预处理方法,其特征在于,所述的惰性气体为氮气或氩气。7. The pretreatment method according to claim 1, wherein the inert gas is nitrogen or argon. 8.根据权利要求1所述的预处理方法,其特征在于,所述的预处理过程为真空状态,真空度为-0.09Mpa。8. The pretreatment method according to claim 1, wherein the pretreatment process is in a vacuum state, and the degree of vacuum is -0.09Mpa.
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Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211702A (en) * 1988-06-29 1990-01-16 Kawasaki Steel Corp Method for refining copper ultra fine powder
CN101723373A (en) * 2008-10-23 2010-06-09 北京有色金属研究总院 Control pipeline of trichlorosilane or silicon tetrachloride process system with nitrogen protection
CN101816946A (en) * 2009-02-27 2010-09-01 比亚迪股份有限公司 Preparation method and application of catalyst used in hydrogenation of silicon tetrachloride
KR100984942B1 (en) * 2010-07-27 2010-10-01 전북대학교산학협력단 Catalysts for using in the production of trichlorosilane by the hydrodechlorination of silicon tetrachloride and process for preparing the same
CN103241742A (en) * 2013-05-13 2013-08-14 杨恺 High-purity SiCl4 purification method
CN105399101A (en) * 2015-12-14 2016-03-16 辽宁石油化工大学 Method for preparing trichlorosilane through cold hydrogenation
CN105435788A (en) * 2014-06-16 2016-03-30 新特能源股份有限公司 Silicon tetrachloride reduction method of dechlorination hydrogenation technology and preparation method of copper-silicon alloy catalyst containing Cu-Si metallic bond
CN106243145A (en) * 2016-08-03 2016-12-21 江苏大学 A kind of method of fixed bed reaction synthesizing trimethoxy silane
CN107377009A (en) * 2017-07-18 2017-11-24 亚洲硅业(青海)有限公司 A kind of renovation process of copper salt catalyst and its application
CN110655442A (en) * 2018-06-28 2020-01-07 江苏丰华化学工业有限公司 Novel chlorination process of o-chlorotrifluoromethylene
CN113387362A (en) * 2021-05-08 2021-09-14 内蒙古新特硅材料有限公司 Improved method and device for synthesizing trichlorosilane by cold hydrogenation

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211702A (en) * 1988-06-29 1990-01-16 Kawasaki Steel Corp Method for refining copper ultra fine powder
CN101723373A (en) * 2008-10-23 2010-06-09 北京有色金属研究总院 Control pipeline of trichlorosilane or silicon tetrachloride process system with nitrogen protection
CN101816946A (en) * 2009-02-27 2010-09-01 比亚迪股份有限公司 Preparation method and application of catalyst used in hydrogenation of silicon tetrachloride
KR100984942B1 (en) * 2010-07-27 2010-10-01 전북대학교산학협력단 Catalysts for using in the production of trichlorosilane by the hydrodechlorination of silicon tetrachloride and process for preparing the same
CN103241742A (en) * 2013-05-13 2013-08-14 杨恺 High-purity SiCl4 purification method
CN105435788A (en) * 2014-06-16 2016-03-30 新特能源股份有限公司 Silicon tetrachloride reduction method of dechlorination hydrogenation technology and preparation method of copper-silicon alloy catalyst containing Cu-Si metallic bond
CN105399101A (en) * 2015-12-14 2016-03-16 辽宁石油化工大学 Method for preparing trichlorosilane through cold hydrogenation
CN106243145A (en) * 2016-08-03 2016-12-21 江苏大学 A kind of method of fixed bed reaction synthesizing trimethoxy silane
CN107377009A (en) * 2017-07-18 2017-11-24 亚洲硅业(青海)有限公司 A kind of renovation process of copper salt catalyst and its application
CN110655442A (en) * 2018-06-28 2020-01-07 江苏丰华化学工业有限公司 Novel chlorination process of o-chlorotrifluoromethylene
CN113387362A (en) * 2021-05-08 2021-09-14 内蒙古新特硅材料有限公司 Improved method and device for synthesizing trichlorosilane by cold hydrogenation

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LI QING-YUAN等: "Experimental Study on Hydrogenation of SiCl4 to SiHCl3 in a Stirred Bed Reactor", 《THE CHINESE JOURNAL OF PROCESS ENGINEERING》, vol. 16, no. 5 *

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