CN114488366A - Reflective polarization double-focusing plasma super lens and preparation method thereof - Google Patents

Reflective polarization double-focusing plasma super lens and preparation method thereof Download PDF

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CN114488366A
CN114488366A CN202210166929.6A CN202210166929A CN114488366A CN 114488366 A CN114488366 A CN 114488366A CN 202210166929 A CN202210166929 A CN 202210166929A CN 114488366 A CN114488366 A CN 114488366A
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dpfpm
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王瑞
王钦华
孙倜
杨惠荣
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Suzhou University
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    • G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
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    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract

The invention discloses a reflection type polarization double-focusing plasma super lens and a preparation method thereof, wherein the device can focus 0-degree and 90-degree Linear Polarization (LP) incident light at different spatial positions simultaneously, the provided reflection type polarization double-focusing plasma super lens (DPFPM) consists of a series of anisotropic polymethyl methacrylate (PMMA) nano columns, and different from the traditional two-dimensional super surface, the nano columns not only have the transverse size of gradient change, but also have the height of gradient change; the DPFPM is manufactured by a 3D laser direct writing technology with a simpler process, and then thermal evaporation coating is carried out, so that the etching process is avoided; the gradient distribution of nanopillar heights provides a new degree of freedom for light manipulation, the optical resolution of the manufactured DPFPM approaches the diffraction limit, and the average linear polarization Extinction Ratio (ER) approaches 10:1 in the optical communication band from 1300nm to 1650 nm.

Description

Reflective polarization double-focusing plasma super lens and preparation method thereof
Technical Field
The invention relates to the field of optical superlenses, in particular to a reflective polarized double-focusing plasma superlens and a preparation method thereof.
Background
Polarization, light intensity and wavelength are all important characteristics of light, a traditional imaging and detecting device can only obtain light intensity and wavelength information, and the extraction of the polarization information of the light has important application in the fields of underwater or turbid medium imaging, VR (virtual reality), AR (augmented reality) technology, polarization multiplexing optical communication and the like. The conventional method of extracting linear and circular polarizations is by linear and circular polarizers, which are usually composed of a grating of nanowires and birefringent material. Although the polarization extinction ratio of these polarizers is very high, the function is always unique. Now, many researches propose and experimental verification that optical super-surfaces capable of manipulating various characteristics of light, such as achromatic imaging super-lenses, optical holographic super-surfaces, and amplitude, phase and polarization control super-surfaces, and polarization-dependent optical manipulation devices based on super-surfaces are also receiving wide attention due to the characteristics of multifunction, light weight and easy integration, and researchers propose pixel-type polarization beam splitters based on dielectric super-surfaces and perform experimental verification at near-infrared wavelengths, and the devices are composed of four groups of silicon nano-ridges with different azimuth angles, so that light in Linear Polarization (LP) states of 0 °, 45 °, 90 ° and 135 ° is separated in different directions, but has no focusing and imaging capabilities.
In 2016, M.Khorasaninejad et al proposed and experimentally verified a visible multispectral chiral imaging super lens, and designed two groups of TiO for right-handed circularly polarized light and left-handed circularly polarized light respectively2The nanopillar array achieves separate focusing of RCP and LCP by Pancharatnam-Berry phase (P-B phase). Similarly, the respective focusing of the RCP and the LCP can also be achieved by a multifocal superlens consisting of two sets of anisotropic sub-wavelength Ag grating arrays. But neither of these types of structures theoretically have a focusing efficiency in excess of 50 percent.
There are also superlenses that use a set of nanostructures to simultaneously focus light of different polarization states, such as silicon nanocolumn structures operating at 980nm, and TiO working at 532nm2A nano-pillar structure. The focusing efficiency of this type of superlens can theoretically be broken by 50%.
In 2020, s.zhou et al showed a Si nanopillar array superlens integrated with a liquid crystal layer, which can achieve adjustable focusing in a terahertz band, and the structure focuses linearly polarized light of 0 ° and 90 ° at different positions through the silicon superlens, and achieves an adjustment function by applying a voltage to liquid crystal.
The manufacturing process of the multifocal polarization dependent superlens is complex, and generally comprises Electron Beam Lithography (EBL), thermal evaporation coating and dry etching, and only the lateral dimension and the azimuth angle of the nano-structure units of the multifocal polarization dependent superlens change along with phase distribution, but the height of the nano-structure units is fixed.
Disclosure of Invention
The invention overcomes the defects of the prior art and provides a reflective polarized double-focusing plasma superlens and a preparation method thereof.
In order to achieve the purpose, the invention adopts the technical scheme that: a reflective polarized double-focusing plasma super lens and a preparation method thereof comprise the following steps: a plurality of polymethyl methacrylate nanometer posts and base plates, which is characterized in that: the nano-pillars are anisotropic in a fixed period, Au layers cover the tops and the bottoms of the nano-pillars, the plurality of nano-pillars simultaneously have gradient-change transverse sizes and gradient-change heights on the substrate, and the nano-pillars have independent phase modulation on 0-degree and 90-degree linear polarization incident light.
In a preferred embodiment of the present invention, the nano-pillars are arranged in a square periodic pattern throughout the super-lens.
In a preferred embodiment of the invention, 0 ° and 90 ° Linearly Polarized (LP) incident light is reflected by the superlens and focused at different spatial locations.
In a preferred embodiment of the present invention, the thickness of the Au layer at the top and bottom of the nano-pillars is uniform.
The invention also provides a preparation method of the reflective polarized double-focusing plasma superlens, which is characterized by comprising the following steps of: s1: in SiO2Generating a polymethyl methacrylate nano-pillar array with different transverse sizes and heights on the substrate; s2: and the gold layer is integrally plated on the nano-pillar array structure through thermal evaporation.
In a preferred embodiment of the invention, 3D laser direct write lithography is used to form a pattern on SiO2The nanopillars are produced on a substrate.
The invention solves the defects in the background technology, and has the following beneficial effects:
(1) the invention provides a reflective polarization double-focusing plasma super lens (DPFPM) based on a group of nano-pillar arrays, which can focus 0-degree and 90-degree Linear Polarization (LP) incident lights at different design positions simultaneously, the optical resolution of the DPFPM is close to the diffraction limit, and the average linear polarization Extinction Ratio (ER) reaches 10:1 in the optical communication waveband of 1300nm to 1650 nm.
(2) DPFPM consists of a series of anisotropic Polymethylmethacrylate (PMMA) nanopillars, which, unlike conventional two-dimensional super-surfaces, have not only graded lateral dimensions but also graded heights.
(3) In the preparation process, the DPFPM is manufactured by a 3D laser direct writing technology with a simpler process, and then thermal evaporation coating is carried out, so that the etching process is avoided, and the gradient distribution of the height of the nano-column provides a new degree of freedom for the manipulation of light.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts;
fig. 1(a) is a 3D schematic of a DPFPM nano-column unit cell of a preferred embodiment of the present invention;
FIG. 1(b) is a 3D schematic of the entire DPFPM of the preferred embodiment of the present invention;
FIG. 1(c) is a schematic diagram of polarization dependent dual focusing of DPFPM according to a preferred embodiment of the present invention;
FIG. 2(a) is a phase distribution of DPFPM of a preferred embodiment of the present invention with respect to 0 ° linearly polarized incident light;
FIG. 2(b) is a phase distribution of DPFPM of a preferred embodiment of the present invention with respect to 90 ° linearly polarized incident light;
FIG. 2(c) is a schematic diagram of the relationship between incident light and reflected light modulated by the nanopillars according to the preferred embodiment of the present invention;
FIG. 2(d) is a graph of normalized intensity of an electric field in nano-pillar cells of different lengths, widths and heights for 0 ° linearly polarized incident light according to a preferred embodiment of the present invention;
FIG. 2(e) is a graph of normalized intensity of an electric field in nano-pillar cells of different lengths, widths and heights for 90 linearly polarized incident light according to a preferred embodiment of the present invention;
fig. 3(a) is a front view of a DPFPM according to a preferred embodiment of the present invention;
fig. 3(b) is a front view of DPFPM according to a preferred embodiment of the present invention;
FIG. 3(c) is an SEM image at a viewing angle of 45 deg. of a preferred embodiment of the present invention
FIG. 4 is a schematic view of an experimental measurement device of a preferred embodiment of the present invention;
fig. 5 is a schematic view of an imaging experiment apparatus according to a preferred embodiment of the present invention.
Detailed Description
Reference throughout this specification to "one embodiment," "an embodiment," or "other embodiments" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least some embodiments, but not necessarily all embodiments, of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The principle of the reflective polarized double-focusing plasma super lens (DPFPM) provided by the invention is as follows: a geometric schematic diagram of each nano-column unit cell of DPFPM is shown in fig. 1(a), which is made of anisotropic material with different length (L), width (W), height (H) but fixed period (P ═ 800nm)PMMA nano-column. Both the top and bottom of the PMMA nanopillar are covered with an Au layer with a thickness h ═ 100 nm. The nanopillars covered by the Au layer are arranged in a square period throughout the DPFPM as shown in fig. 1 (b). The 0 ° and 90 ° Linearly Polarized (LP) incident lights are reflected by the DPFPM and focused at different design positions, i.e., (x)im,0,yim,0,fz)，(xim,90,yim,90,fz) As shown in fig. 1 (c).
To demonstrate the focusing effect of DPFPM, a 280 μm diameter superlens was designed to focus 0 °, 90 ° linearly polarized light simultaneously at 1550nm, with the focal positions of x, y linearly polarized light being (5mm,0,10mm) (-5mm,0,10mm) (position relative to the center of the superlens), respectively. Proposed off-axis phase distribution of DPFPM with respect to 0 DEG and 90 DEG LP incidence
Figure BDA0003516627110000051
Is composed of
Figure BDA0003516627110000052
Fig. 2(a) and 2(b) show the off-axis phase distributions of the proposed DPFPM calculated from equation (1) for 0 ° and 90 ° linearly polarized incident light. The proposed phase profile of DPFPM can be realized by a PMMA nanopillar array covered with an Au layer. The nano-column is on SiO2The substrate has a gradient distribution in both the lateral direction and the height, as shown in fig. 2 (c). The optical response of each nanopillar unit was calculated by finite difference time domain (FDTD Solutions, statistical, Canada). High reflectivity of 0 and 90 linearly polarized incident light can be maintained while covering phase modulation of 0-2 pi by nano-pillars of different sizes and heights, which provides an adequate database for the design of nano-pillars. The phase responses of the individual nanopillar units for 0 ° and 90 ° linearly polarized incident light are different and independent, meaning that the two off-axis phase distributions required for 0 ° and 90 ° linearly polarized incident light
Figure BDA0003516627110000053
Only one set of nanostructures is needed to satisfyThereby achieving their simultaneous focusing. The phase and amplitude modulation of the structural units results from surface plasmons (SPPs) excited by the Au layer covering the PMMA nanopillars. Fig. 2(d) and 2(e) show the normalized intensity distribution of the electric field in the x-y plane in the middle of the height of the top Au layer for unit cells with nano-pillars of different size and height, fig. 2(d) and 2(e) corresponding to 0 ° and 90 ° linearly polarized incident light, respectively. The white dashed line represents the boundary of the nanopillar, and the electric field distribution shows strong anisotropy in the x-y plane, so that the nanopillar unit has independent phase modulation for 0 ° and 90 ° linearly polarized incident light.
Example one
DPFPM with a diameter of 280 μm was produced. By 3D laser direct write lithography (Nanocripbe GmbH, Photonic Professional) on SiO2PMMA nano-pillar arrays with different transverse sizes and heights and according with DPFPM phase distribution are manufactured on a substrate, and then a 100nm gold layer is integrally plated on the structure through thermal evaporation, so that the etching process is avoided. Fig. 3(a) and 3(b) are front views of manufactured DPFPM Scanning Electron Microscopes (SEM), and fig. 3(c) is a 45 ° viewing angle of the manufactured DPFPM Scanning Electron Microscopes (SEM), it can be clearly seen that the prepared nanopillar units of DPFPM have different lengths, widths and heights, which enables different and independent modulation for 0 ° and 90 ° linearly polarized incident light.
In order to verify the polarization dual focusing capability of the manufactured DPFPM, its point spread function (PSFs, i.e., intensity distribution of the focal point) was measured and compared with its theoretical distribution, and the experimental measurement apparatus is shown in fig. 4, where the symbols in fig. 4 are as follows: and (2) SCL: a supercontinuum laser; f: an optical long pass filter; p: a linear polarizer; WP: 1/4 a wave plate; l: an achromatic doublet; o: an objective lens. Light from the supercontinuum laser (Fianium, SC450) was passed through an optical long pass filter (Thorlabs, FELH1300), a linear polarizer (Thorlabs, WP25M-UB), a 1/4 waveplate (Thorlabs, AHWP05M-1600), a linear polarizer (Thorlabs, WP25M-UB) and was then incident on the DPFPM produced. DPFPM focuses incident light having different linear polarization states at different focal positions. The focus passing through a set of achromaticsThe differential doublet cemented lens (Thorlabs, AC508-075-C-ML) was imaged on a near infrared charge coupled device (NIR-CCD, XENICS, XEVA-1.7-320). The light emitted by the supercontinuum laser sequentially passes through the linear polaroid and the 1/4 wave plate to form circularly polarized light, and then passes through the second linear polaroid, so that the intensity of emergent linearly polarized light can be kept unchanged when the second polaroid is rotated to change the polarization direction of the light. The PSFs of different wavelengths are obtained by adjusting the distance between DPFPM and the achromatic doublet. A diaphragm was also used in the experiment to filter out stray light. The PSFs of the fabricated DPFPM are close to theoretical expectations, which means that the optical resolution of the fabricated DPFPM is very close to the diffraction limit (λ/2/NA,3.3 μm @1550 nm). Under incident light with different wavelengths of 1300nm, 1550nm and 1650nm, the experimental measurement shows that the PSFs of the DPFPM on incident light with different linear polarization angles are obtained. When the polarization angle is changed from 0 degrees to 90 degrees, one PSFs (namely, PSFs corresponding to 0 degrees of linear polarization) of the DPFPM is gradually weakened, and the other PSFs (namely, PSFs corresponding to 90 degrees of linear polarization) is gradually strengthened. The average polarization Extinction Ratio (ER), defined as the ratio of the intensities of two orthogonal polarization states PSFs at a given location, is up to about 10: 1: ER0/90＝I0/90/I90/0Where the subscript represents incident 0/90 linearly polarized light.
As shown in fig. 5, the united states air force test resolution version (USAF) was placed at a distance from the DPFPM. The USAF image formed by DPFPM is then imaged twice by an achromatic double cemented lens onto a NIR-CCD camera. The symbols in fig. 5 are as follows: and (2) SCL: a supercontinuum laser; f: an optical long pass filter; p: a linear polarizer; WP: 1/4 a wave plate; c: a chopper; l: an achromatic doublet lens. The normalized intensity of the images at the different wavelengths of 1300nm, 1550nm and 1600nm varies with the variation of the polarization angle of the incident polarized light, which is consistent with theoretical expectations.
In summary, the present invention provides a reflective polarized double focusing plasma super lens (DPFPM) based on a set of nanopillar arrays. The proposed DPFPM can focus 0 ° and 90 ° linearly polarized incident light at different designed spatial positions simultaneously. The proposed DPFPM consists of an anisotropic Polymethylmethacrylate (PMMA) nanopillar array covered with an Au layer, the lateral dimensions and the gradient distribution of heights of the nanopillar array being such that a set of nanostructures can simultaneously and independently manipulate linearly polarized light of 0 ° and 90 °. Unlike the conventional two-dimensional super-surface, the proposed DPFPM has not only the gradient lateral dimension but also the gradient height. DPFPM is manufactured by a 3D laser direct writing technology with a simpler process, and then thermal evaporation coating is carried out, so that the etching process is avoided. The gradient distribution of the nanopillar height provides a new degree of freedom for the manipulation of light. The manufactured DPFPM has optical resolution close to diffraction limit, and the average linear polarization Extinction Ratio (ER) reaches close to 10:1 in optical communication bands of 1300nm to 1650 nm.
In light of the foregoing description of the preferred embodiment of the present invention, it is to be understood that various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.

Claims (6)

1. A reflective polarized dual focus plasmonic superlens, comprising: a plurality of polymethyl methacrylate nanometer posts and base plates, which is characterized in that:
the nano-pillars are anisotropic in a fixed period, Au layers cover the tops and the bottoms of the nano-pillars, the plurality of nano-pillars simultaneously have gradient-change transverse sizes and gradient-change heights on the substrate, and the nano-pillars have independent phase modulation on 0-degree and 90-degree linear polarization incident light.
2. A reflective polarizing dual focusing plasmonic superlens, according to claim 1, wherein: the nano-pillars are arranged in a square periodic manner in the whole super-lens.
3. A reflective polarizing dual focusing plasmonic superlens, according to claim 1, wherein: the 0 ° and 90 ° Linearly Polarized (LP) incident lights are reflected by the superlens and focused at different spatial locations.
4. A reflective polarizing dual focusing plasmonic superlens, according to claim 1, wherein: and the thickness of the Au layer at the top and the bottom of the nano-pillar is consistent.
5. The method for preparing a reflective polarized dual focusing plasmonic superlens of claim 1, comprising the steps of:
s1: in SiO2Generating a polymethyl methacrylate nano-pillar array with different transverse sizes and heights on the substrate;
s2: and plating the gold layer on the nano-pillar array structure by thermal evaporation.
6. The method for preparing a reflective polarized double-focusing plasma superlens according to claim 5, wherein: photoetching on SiO by 3D laser direct writing2The nanopillars are produced on a substrate.
CN202210166929.6A 2022-02-23 2022-02-23 Reflective polarization double-focusing plasma super lens and preparation method thereof Withdrawn CN114488366A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453670A (en) * 2022-09-29 2022-12-09 苏州大学 Reflection type orthogonal circular polarization double-focusing super lens and preparation method thereof
CN116203660A (en) * 2023-01-18 2023-06-02 苏州大学 Three-dimensional plasmon superlens and chiral and achiral imaging method based on same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115453670A (en) * 2022-09-29 2022-12-09 苏州大学 Reflection type orthogonal circular polarization double-focusing super lens and preparation method thereof
CN115453670B (en) * 2022-09-29 2023-08-15 苏州大学 Reflective orthogonal circular polarization double-focusing superlens and preparation method thereof
CN116203660A (en) * 2023-01-18 2023-06-02 苏州大学 Three-dimensional plasmon superlens and chiral and achiral imaging method based on same

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