CN114470920A - Temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process - Google Patents
Temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process Download PDFInfo
- Publication number
- CN114470920A CN114470920A CN202011143556.8A CN202011143556A CN114470920A CN 114470920 A CN114470920 A CN 114470920A CN 202011143556 A CN202011143556 A CN 202011143556A CN 114470920 A CN114470920 A CN 114470920A
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- Prior art keywords
- wall
- tank
- waste treatment
- treatment liquid
- filter
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- 239000007788 liquid Substances 0.000 title claims abstract description 64
- 239000002699 waste material Substances 0.000 title claims abstract description 54
- 238000003860 storage Methods 0.000 title claims abstract description 32
- 239000004065 semiconductor Substances 0.000 title claims abstract description 11
- 238000007599 discharging Methods 0.000 title claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000012535 impurity Substances 0.000 claims abstract description 41
- 238000001914 filtration Methods 0.000 claims abstract description 19
- 238000012545 processing Methods 0.000 claims abstract description 10
- 238000004140 cleaning Methods 0.000 claims abstract description 9
- 238000007789 sealing Methods 0.000 claims abstract 3
- 230000003287 optical effect Effects 0.000 claims description 20
- 239000012530 fluid Substances 0.000 claims description 9
- 239000000243 solution Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/60—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration
- B01D29/601—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration by clearness or turbidity measuring
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process comprises a liquid storage container and a filtering module. The liquid storage container is provided with a bottom wall, a top wall opposite to the bottom wall, a surrounding wall for connecting the bottom wall and the top wall, and a sealing cover. The top wall is provided with a waste treatment liquid inlet and an impurity cleaning port. The closing cap is located the roof and can open and seal impurity clearance mouth. The filtering module comprises a filtering tank and a sensor. The filter tank is positioned in the liquid storage container, is positioned below the waste treatment liquid inlet and the impurity cleaning port, and is provided with a reticular bottom tank wall, a reticular side tank wall and a diffusing and discharging port close to the top wall, the bottom tank wall and the side tank wall jointly define a filter space and are used for filtering impurities in the waste treatment liquid, and the bottom tank wall and the bottom wall are spaced. The sensor is arranged corresponding to the filter tank to detect whether the impurities accumulated in the filter tank need to be cleaned. Impurities in the waste treatment liquid are filtered through the filtering module, and the waste treatment liquid in the liquid storage container does not need to be emptied when the impurities in the filtering tank are cleaned, so that the processing machine does not need to be stopped, and the capacity is not affected.
Description
Technical Field
The present invention relates to a liquid storage device, and more particularly to a temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process.
Background
In semiconductor processes, a photolithography process, an etching process, etc. are performed on a substrate, and an acidic or alkaline treatment solution is generally used, and some processes use a high-temperature treatment solution, and the treatment solution reacts with the substrate during the process to peel off impurities on the substrate, but the impurities cannot be decomposed by the treatment solution, so the impurities are mixed with the used treatment solution and discharged.
The discharge system used in the semiconductor factory can make the high-temperature waste treatment liquid discharged in the manufacturing process flow into a temporary storage tank first, and then convey the waste treatment liquid to the factory service end for treatment after the waste treatment liquid is cooled. Because the waste treatment liquid is usually strong acid or strong alkali, the temporary storage tank is a closed container to avoid the influence of the waste treatment liquid on the environmental safety. However, impurities mixed in the waste treatment solution are deposited on the bottom of the buffer tank, the buffer tank needs to be drained to clean the deposited impurities every time, and the process tool generating the waste treatment solution must be stopped during the cleaning of the impurities, resulting in an influence on productivity.
Disclosure of Invention
An object of the present invention is to provide a temporary discharge storage device for waste treatment liquid in semiconductor manufacturing process, which can solve the above problems.
In some embodiments, the apparatus for discharging and temporarily storing the waste processing liquid in the semiconductor manufacturing process includes a liquid storage container and a filtering module. This stock solution container has the diapire, for the roof of this diapire, connect the leg and the closing cap of this diapire and this roof, and this roof is equipped with useless treatment fluid inlet port and impurity clearance mouth, and this closing cap is located this roof and openly seals this impurity clearance mouth. The filtering module is arranged in the liquid storage container and comprises a filtering tank and a sensor. The filter tank is positioned in the liquid storage container, is positioned below the waste treatment liquid inlet and the impurity cleaning port, and is provided with a reticular bottom tank wall, a reticular side tank wall connected with the peripheral side of the bottom tank wall, and a discharge port close to the top wall, wherein the bottom tank wall and the side tank wall jointly define a filter space and are used for filtering impurities in the waste treatment liquid. The bottom slot wall is spaced from the bottom wall. The sensor is arranged corresponding to the filter tank to detect whether the impurities accumulated in the filter tank need to be cleaned.
In some embodiments, the circulation module is connected to the reservoir, and includes a pump and a circulation pipeline for flowing the waste treatment fluid stored in the reservoir after being filtered by the filter tank.
In some embodiments, the sensor includes a first optical element and a second optical element disposed opposite to each other on the wall, and the filter is disposed between the first optical element and the second optical element such that light emitted from the first optical element is received by the second optical element after passing through the filter.
In some embodiments, the top end of the side wall abuts against the top wall, and the venting port is disposed on the side wall.
The invention has the following effects: impurities in the waste treatment liquid are filtered through the filtering module, and the waste treatment liquid in the liquid storage container does not need to be emptied when the impurities in the filtering tank are cleaned, so that a processing machine does not need to be stopped, and the capacity is not influenced.
Drawings
Other features and effects of the present invention will be apparent from the embodiments with reference to the accompanying drawings, in which:
FIG. 1 is a schematic view of an embodiment of a temporary discharge storage apparatus for waste processing liquid in semiconductor manufacturing process according to the present invention.
Detailed Description
Referring to fig. 1, an embodiment of a temporary discharge storage apparatus 100 for waste processing solution in semiconductor manufacturing process according to the present invention includes a storage container 1, a filtering module 2 and a recycling module 3.
The liquid container 1 has a bottom wall 11, a top wall 12 opposite to the bottom wall 11, a surrounding wall 13 connecting the bottom wall 11 and the top wall 12, and a cover 14. The top wall 12 is provided with a waste treatment liquid inlet 121 and a foreign substance removal port 122. The cover 14 is disposed on the top wall 12 and openably closes the impurity cleaning opening 122. The waste treatment liquid inlet 121 is used to connect to a machine exhaust pipe 4 for flowing in the waste treatment liquid discharged from the processing machine (not shown). In this embodiment, the surrounding wall 13 is provided with a waste treatment liquid outlet 131, but in a modified embodiment, the waste treatment liquid outlet 131 may be provided on the bottom wall 11.
The filter module 2 is disposed in the liquid storage container 1, and includes a filter tank 21 and a sensor 22. The filtering tank 21 is disposed in the liquid storage container 1 and below the waste treatment liquid inlet 121 and the impurity removing opening 122, and has a net-shaped bottom tank wall 211 and a net-shaped side tank wall 212 connected to the periphery of the bottom tank wall 211, wherein the bottom tank wall 211 and the side tank wall 212 together define a filtering space 213 for filtering impurities in the waste treatment liquid. The bottom cavity wall 211 is spaced apart from the bottom wall 11. When the waste treatment fluid flows into the liquid storage container 1 from the waste treatment fluid inlet 121, the waste treatment fluid first enters the filtering tank 21, passes through the bottom tank wall 211 or the side tank wall 212 to filter impurities in the waste treatment fluid, then flows to a space below the filtering tank 21 for temporary storage, and is conveyed to a waste fluid treatment tank at the rear end after the waste treatment fluid is cooled. The bottom tank wall 211 is spaced apart from the bottom wall 11 by a distance such that the bottom tank wall 211 is positioned above the level of the waste treatment liquid below, and the waste treatment liquid in the filter tank 21 can naturally flow downward by gravity. The bottom wall 211 and the side wall 212 are used as filter screens, and the mesh sizes of the bottom wall 211 and the side wall 212 can be determined according to the size of the impurities to be filtered. When a certain amount of impurities are accumulated in the filter tank 21, a maintenance worker may open the cover 14 to remove the impurities in the filter tank 21 through the impurity removal port 122. The waste treatment liquid in the liquid storage container 1 does not need to be emptied when impurities are cleaned, so that the process machine does not need to be stopped, and the production capacity is not influenced. Moreover, the depth of the filter tank 21 is smaller than the depth of the entire reservoir 1, and cleaning is relatively easy.
The sensor 22 is disposed corresponding to the filter tank 21 to detect whether the impurities accumulated in the filter tank 21 need to be cleaned. In this embodiment, the sensor 22 includes a first optical element (e.g., a light emitting element) 221 and a second optical element (e.g., a light receiving element) 222 disposed opposite to each other on the surrounding wall 13, and the filter 21 is disposed between the first optical element 221 and the second optical element 222, such that the light emitted from the first optical element 221 is received by the second optical element 222 after passing through the filter 21. The sensor 22 detects whether the impurities are accumulated to a predetermined height in the filter tank 21, when the impurities are accumulated to the predetermined height, the light emitted from the first optical element 221 is blocked by the impurities, so that the second optical element 222 cannot receive the light signal, and a control terminal (not shown) connected to the sensor 22 generates a signal to notify a maintenance person to clean the filter tank 21. By this, can avoid this filter-tank 21 to be blockked up, and then avoid this board delivery pipe 4 to explode the pipe, also can save the manpower and the time that whether the maintainer needs often to patrol this filter-tank 21 and need clear up simultaneously.
In order to prevent the filter tank 21 from being blocked to cause the explosion of the machine exhaust pipe 4 when the sensor 22 fails, the filter tank 21 further has a venting opening 212a near the top wall 12 for the waste treatment liquid to flow out of the filter tank 21 without being filtered, thereby preventing the waste treatment liquid from flowing out of the filter tank 21. In the embodiment, the top end of the side groove wall 212 is abutted against the top wall 12, and the vent 212a is disposed on the side groove wall 212 and is higher than the sensor 22, so that when the sensor 22 is in normal operation, the impurities in the filter tank 21 can be removed before the bottom groove wall 211 and the side groove wall 212 are seriously blocked, and therefore, the waste treatment liquid in the filter tank 21 can not be accumulated to the height of the vent 212a, and can not flow out from the vent 212a in an unfiltered state. Only when the excessive impurities accumulated on the bottom tank wall 211 and the side tank wall 212 are not removed, the waste processing liquid in the filter tank 21 is accumulated to the height of the vent 212a, and when the waste processing liquid is accumulated to the height of the vent 212a, the volume in the filter tank 21 is reduced due to the impurities contained therein, so that the waste processing liquid entering the filter tank 21 needs to flow out through the vent 212a as soon as possible, thereby preventing the machine station discharge pipe 4 from bursting. In other variations, the side slot wall 212 may be configured without being connected to the top wall 12 to form a vent.
The circulation module 3 is connected to the liquid storage container 1, and includes a pump 31 and a circulation pipeline 32, so that the waste treatment liquid stored in the liquid storage container 1 after being filtered by the filter tank 21 flows in the circulation pipeline 32, thereby accelerating the temperature reduction of the waste treatment liquid in the liquid storage container 1.
The above description is only an example of the present invention, and the scope of the present invention should not be limited thereby, and the invention is still within the scope of the present invention by simple equivalent changes and modifications made according to the claims and the contents of the specification.
Claims (4)
1. A temporary storage device for discharging waste treatment liquid in semiconductor processing is characterized in that: comprises the following steps:
a liquid storage container having a bottom wall, a top wall opposite to the bottom wall, a surrounding wall connecting the bottom wall and the top wall, and a sealing cover, wherein the top wall is provided with a waste treatment liquid inlet and an impurity cleaning port, and the sealing cover is arranged on the top wall and openably seals the impurity cleaning port; and
the filter module is arranged in the liquid storage container and comprises a filter tank and a sensor, the filter tank is positioned in the liquid storage container and positioned below the waste treatment liquid inlet and the impurity cleaning port, the filter tank is provided with a reticular bottom tank wall, a reticular side tank wall connected with the periphery of the bottom tank wall, and a discharge port close to the top wall, the bottom tank wall and the side tank wall jointly define a filter space and are used for filtering impurities in the waste treatment liquid, the bottom tank wall and the bottom wall are spaced, and the sensor is arranged corresponding to the filter tank to detect whether the impurities accumulated in the filter tank need to be cleaned.
2. The apparatus of claim 1, further comprising: the circulating module comprises a pump and a circulating pipeline, and is used for enabling the waste treatment fluid which is filtered by the filter tank and then stored in the liquid storage container to flow in the circulating pipeline.
3. The apparatus as claimed in claim 1, wherein the apparatus further comprises: the sensor comprises a first optical component and a second optical component which are arranged on the surrounding wall in an opposite mode, and the filter tank is located between the first optical component and the second optical component, so that light emitted by the first optical component passes through the filter tank and then is received by the second optical component.
4. The apparatus as claimed in claim 1, wherein the apparatus further comprises: the top end of the side groove wall is abutted against the top wall, and the vent is arranged on the side groove wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011143556.8A CN114470920A (en) | 2020-10-23 | 2020-10-23 | Temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011143556.8A CN114470920A (en) | 2020-10-23 | 2020-10-23 | Temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114470920A true CN114470920A (en) | 2022-05-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011143556.8A Pending CN114470920A (en) | 2020-10-23 | 2020-10-23 | Temporary storage device for discharging waste treatment liquid in semiconductor manufacturing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114470920A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4525274A (en) * | 1984-04-06 | 1985-06-25 | Dorr-Oliver Incorporated | Filtrate discharge system for pressure filter |
| US20070209988A1 (en) * | 2006-03-07 | 2007-09-13 | Denise Lemay | Integrated Apparatus and System for the Treatment of Waste Fluids and Drain Networks |
| CN104123971A (en) * | 2013-04-23 | 2014-10-29 | 苏州热工研究院有限公司 | Nuclear power plant radioactive effluent disposal system |
| US20170203138A1 (en) * | 2016-01-20 | 2017-07-20 | Vail Scientific, Llc | Apparatus and Method for the Disposal of Waste Pharmaceuticals |
| CN110482748A (en) * | 2019-05-28 | 2019-11-22 | 中国航发北京航空材料研究院 | A kind of laboratory waste liquid processing unit |
-
2020
- 2020-10-23 CN CN202011143556.8A patent/CN114470920A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4525274A (en) * | 1984-04-06 | 1985-06-25 | Dorr-Oliver Incorporated | Filtrate discharge system for pressure filter |
| US20070209988A1 (en) * | 2006-03-07 | 2007-09-13 | Denise Lemay | Integrated Apparatus and System for the Treatment of Waste Fluids and Drain Networks |
| CN104123971A (en) * | 2013-04-23 | 2014-10-29 | 苏州热工研究院有限公司 | Nuclear power plant radioactive effluent disposal system |
| US20170203138A1 (en) * | 2016-01-20 | 2017-07-20 | Vail Scientific, Llc | Apparatus and Method for the Disposal of Waste Pharmaceuticals |
| CN110482748A (en) * | 2019-05-28 | 2019-11-22 | 中国航发北京航空材料研究院 | A kind of laboratory waste liquid processing unit |
Non-Patent Citations (1)
| Title |
|---|
| 吴祥明: "《浦东国际机场建设-配套设施》", 30 September 1999, 上海科学技术出版社, pages: 42 * |
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