CN114457309A - Method for treating easy-to-clean surface of hardware - Google Patents
Method for treating easy-to-clean surface of hardware Download PDFInfo
- Publication number
- CN114457309A CN114457309A CN202210129870.3A CN202210129870A CN114457309A CN 114457309 A CN114457309 A CN 114457309A CN 202210129870 A CN202210129870 A CN 202210129870A CN 114457309 A CN114457309 A CN 114457309A
- Authority
- CN
- China
- Prior art keywords
- easy
- clean
- hardware
- coating
- treating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003670 easy-to-clean Effects 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000000576 coating method Methods 0.000 claims abstract description 48
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 23
- 239000011651 chromium Substances 0.000 claims abstract description 23
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 21
- 238000005507 spraying Methods 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000007733 ion plating Methods 0.000 claims abstract description 11
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- 239000013077 target material Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000001035 drying Methods 0.000 claims abstract description 7
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 5
- 239000010936 titanium Substances 0.000 claims abstract description 5
- 239000002904 solvent Substances 0.000 claims description 14
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 7
- 239000010702 perfluoropolyether Substances 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 239000011538 cleaning material Substances 0.000 claims description 5
- 238000010891 electric arc Methods 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 3
- -1 perfluoro compounds Chemical class 0.000 claims description 3
- 239000010939 rose gold Substances 0.000 claims description 3
- 229910001112 rose gold Inorganic materials 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims description 2
- 238000004381 surface treatment Methods 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims 1
- 238000009713 electroplating Methods 0.000 abstract description 8
- 238000007790 scraping Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 11
- 238000007747 plating Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000009501 film coating Methods 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 230000037452 priming Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002103 nanocoating Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006119 easy-to-clean coating Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a method for treating an easy-to-clean surface of hardware, which specifically comprises the following steps: installing a multi-arc ion plating target material, wherein the target material can be one or more of chromium, zirconium and titanium; loading a cleaned and dried electroplating sample, vacuumizing to reach background vacuum, and performing ion plating; keeping clean, and spraying nanometer easy-to-clean materials on the sample after the PVD coating; and baking and drying the sample sprayed with the nano easy-to-clean material at the baking temperature of 60-140 ℃ for 20-60 min. According to the invention, a metal film layer with certain roughness is deposited on the surface of a hardware product through a PVD physical vapor deposition process, and then a layer of nano easy-to-clean material is sprayed on the surface of the prepared film layer, so that the product surface with strong scraping resistance, easy cleaning and long service life is obtained.
Description
Technical Field
The invention belongs to the technical field of hardware surface treatment, and particularly relates to a method for treating an easy-to-clean surface of hardware.
Background
The problems that the surfaces of electroplated or PVD coatings of hardware products in kitchens and bathrooms are easily attached by various pollution sources to form marks and are not easy to clean are always a big pain point in kitchens and bathrooms. The prior art schemes for obtaining an easy-to-clean coating with certain wear resistance and binding force on a metal surface without changing the color of the metal are very few, and the technical route generally comprises the following two types: lowering surface energy and building microstructures. The surface energy can be reduced by directly coating a surface energy coating, but if the thickness is too low, the wear resistance is poor, and if the thickness is too high, the metal texture is changed; or the surface energy is reduced by ion implantation, but the ion implantation has specific requirements on the substrate and needs higher temperature, and the process time is long and the cost is high. The process of constructing the microstructure is poor in wear resistance and is not suitable for complex workpieces.
At present, the existing solution (AF Coating) for increasing the easy-to-clean function of kitchen and bathroom hardware products on the premise of not changing the color and luster of metal texture is to coat low-surface-energy materials, such as fluorosilane, fluorosilicone compounds, perfluoro compounds and the like, directly on a hardware electroplating layer or on a sputtered silicon oxide/aluminum oxide Coating layer in a spraying or evaporation mode. But the scheme of directly spraying on the hardware electroplated layer has poor binding force and is not wear-resistant; the scheme of spraying or evaporating the film after sputtering and film coating has high cost, high requirement on equipment, complex manufacturing process and higher requirement on production environment.
Therefore, it is necessary to develop a method for treating the easy-to-clean surface of hardware with low cost, simple manufacturing process, strong scratch resistance, easy cleaning and long service life to meet the production requirements of kitchen and bathroom hardware products.
Disclosure of Invention
The invention aims to overcome the defects in the prior art, and provides a method for treating the easy-to-clean surface of hardware, which has the advantages of low cost, simple manufacturing process, strong scratch resistance and long service life.
In order to achieve the purpose, the technical scheme of the invention is a method for treating the easy-to-clean surface of hardware, which comprises the following steps:
(1) installing a multi-arc ion plating target material, wherein the target material can be one or more of chromium, zirconium and titanium;
(2) loading a cleaned and dried electroplating sample, vacuumizing to perform PVD (physical vapor deposition) coating, and performing ion coating after reaching a background vacuum, wherein the working gas is argon, the reaction gas (according to the coating requirement) is one or more of nitrogen, acetylene and methane, the coating vacuum is 0.1-0.5pa, the coating current is 80-120A, and the coating time is 2-6 min;
(3) keeping clean, and spraying nanometer easy-to-clean materials on the sample after the PVD coating;
(4) and baking and drying the sample sprayed with the nano easy-to-clean material at the baking temperature of 60-140 ℃ for 20-60 min.
In a preferred embodiment of the present invention, in the step (1), the target material is one or more of zirconium, chromium and titanium.
In a preferred embodiment of the present invention, the PVD coating process in step (2) is a multi-arc ion plating process, which can deposit a pure metal film or a reactive film of carbide or nitride, and the final appearance can be chrome plating, gold, rose gold, gun color, black, etc.
In a preferred embodiment of the present invention, the background vacuum of the coating film in the step (2) is 0.002-0.008pa, the vacuum of the coating film is 0.1-0.5pa, the arc target current is 80-100A, and the coating time is 2-6min.
In a preferred embodiment of the present invention, in the step (2), the surface roughness Ra of the PVD coating film is 4-15 μm, and the Rq value is 10-100 μm.
In a preferred embodiment of the present invention, the thickness of the plated film in the step (2) is in a range of 0.1-0.6 μm.
In a preferred embodiment of the present invention, in the step (3), the main agent of the nano easy-cleaning material is perfluoropolyether, perfluorocarbon, or other perfluoro compounds, the content of the main agent is 3-7%, and the solvent is a fluorocarbon solvent.
In a preferred embodiment of the present invention, the temperature for baking and drying in step (4) is 60-140 ℃ and the time is 20-60 min.
Compared with the prior art, the invention has the beneficial effects that:
1. the surface of the kitchen and bath hardware sample treated by the method can realize the function of easy cleaning, and has better scratch resistance and longer service life of easy cleaning;
2. compared with the common chromium-electroplated nano easy-to-clean material, the surface of the kitchen and bath hardware sample treated by the method has stronger binding force between the nano material and the substrate;
3. the invention has simple batch production process and lower cost.
Drawings
FIG. 1 is an AFM chart and a gold phase chart of a PVD chromium plating film, a PVD chromium + zirconium plating film and a general chromium plating film obtained in examples 1, 2, 3 and comparative example 1.
Detailed Description
A method for treating an easy-to-clean surface of hardware specifically comprises the following steps:
(1) installing a multi-arc ion plating target material;
(2) after loading a sample, vacuumizing and carrying out PVD coating;
(3) spraying nanometer easy-to-clean materials on the PVD coated sample after being transferred to a spraying hanger;
(4) and baking and drying the sample sprayed with the nano easy-to-clean material.
The target material in the step (1) is one or more of zirconium, chromium and titanium.
The PVD coating process in the step (2) is a multi-arc ion plating process, a pure metal film or a reaction film of carbide or nitride and the like can be deposited, and the final appearance can be electroplating chromium color, gold color, rose gold color, gun color, black color and the like.
In the step (2), the background vacuum of the coating is 0.002-0.008pa, the vacuum of the coating is 0.1-0.5pa, the electric arc target current is 80-100A, and the coating time is 2-6min.
In the step (2), the surface roughness Ra value of the PVD coating film is 4-15 μm, and the Rq value is 10-100 μm.
The thickness range of the coating film in the step (2) is 0.1-0.6 mu m.
In the step (3), the nano easy-cleaning material is prepared from perfluoropolyether, perfluorocarbon or other perfluorinated compounds as a main agent, the content of the main agent is 3-7%, and the solvent is a fluorocarbon solvent.
The temperature for baking and drying in the step (4) is 100-140 ℃, and the time is 20-40 min.
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in more detail below with reference to the accompanying drawings and specific embodiments, but the scope of the present invention is not limited to these embodiments.
Example 1
Installing 10 chromium targets in 2 rows of multi-arc ion plating; loading an electroplated chromium sample, and then vacuumizing and coating, wherein the coating process comprises bias glow cleaning, and plating a priming layer, a transition layer and an appearance layer; the background vacuum of the coating is 0.005pa, the vacuum of the coating is 0.3pa, the electric arc target current is 80A, and the coating time is 4 min; the appearance of the film is electroplated chromium after the film coating is finished, the Ra of the film coating surface is 4.25 mu m, and the Rq is 16.5 mu m; after the spraying hanging tool is rotated, uniformly spraying a nano easy-to-clean material, wherein the nano easy-to-clean material contains 5% of perfluoropolyether, and the solvent is a fluorocarbon solvent; after spraying, baking for 30min at 120 ℃.
The initial contact angle is 114 degrees, the scratch resistance is tested, and after 10000 times of reciprocating friction, the water contact angle is 96 degrees.
Example 2
Installing 10 chromium targets in 2 rows of multi-arc ion plating; carrying out vacuum coating after loading the chromium electroplating sample; the coating process comprises bias glow cleaning, and coating of a priming layer, a transition layer and an appearance layer. The background vacuum of the coating is 0.005pa, the vacuum of the coating is 0.3pa, the electric arc target current is 100A, and the coating time is 4 min. The appearance is electroplating chromium color after the film plating is finished, the Ra of the film plating surface is 8.49 mu m, and the Rq is 24.1 mu m; spraying a nano easy-to-clean material after the spraying hanging tool is transferred, wherein the nano easy-to-clean material contains 5% of perfluoropolyether, and the solvent is a fluorocarbon solvent; after spraying, baking for 30min at 120 ℃.
The initial contact angle is 115 degrees, the scratch resistance is tested, and after 10000 times of reciprocating friction, the water contact angle is 101 degrees.
Example 3
Installing a multi-arc ion plating 2-row 10-chromium target; carrying out vacuum coating after loading the chromium electroplating sample; the coating process comprises bias glow cleaning, and plating a priming layer, a transition layer and an appearance layer. The background vacuum of the coating is 0.005pa, the vacuum of the coating is 0.3pa, the electric arc target current is 80A, and the coating time is 8 min; the appearance is chromium color after the film plating is finished, the Ra of the film plating surface is 12 mu m, and the Rq is 38.6 mu m); spraying a nano easy-to-clean material after the spraying of the hanging tool is changed, wherein the nano easy-to-clean material contains 5% of perfluoropolyether, and a solvent is a fluorocarbon solvent; after spraying, baking for 30min at 120 ℃.
The initial contact angle was 115 °, the scratch resistance was tested, and after 10000 reciprocatory rubs, the water contact angle was 112 °.
Comparative example 1
Cleaning a common chromium electroplating product (the Ra of the surface of a plated film is 3.25 mu m, and the Rq is 4.24 mu m), and then spraying a nano easy-cleaning material, wherein the nano easy-cleaning material contains 5% of perfluoropolyether, and the solvent is a fluorocarbon solvent; baking at 120 deg.C for 30min after spraying.
The initial contact angle is 115 degrees, the scratch resistance is tested, and after 10000 times of reciprocating friction, the water contact angle is 71 degrees.
FIG. 1 shows AFM and Au phase diagrams of the electroplated chromium, PVD chromium coating, PVD zirconium + chromium coating prepared in examples 1-3 and comparative example 1, and it can be seen from FIG. 1 that the roughness of the film can be improved by controlling the coating current and coating time, and the wear resistance of the nano-coating can be improved.
Comparing the roughness of the plating films of examples 1-3 and comparative example 1, it can be seen that the higher the roughness, the higher the water contact angle of the corresponding nano coating after 10000 times of rubbing tests, i.e. the nano material has better rub resistance in combination with the substrate under the process conditions of the present invention, as shown in fig. 1.
The friction resistance and the binding force of the nano material are judged by 10000 times of reciprocating friction tests, the bristle brush loaded with 500g carries out 10000 times of reciprocating friction tests on the surface of a flat workpiece under a wetting condition, a static water contact angle is tested after the workpiece is cleaned and dried, and the higher the contact angle is, the higher the wear resistance and the binding force are.
The above embodiments are merely preferred embodiments of the present invention, which are provided for illustrating the principles and effects of the present invention and not for limiting the present invention. It should be noted that modifications to the above-described embodiments can be made by persons skilled in the art without departing from the spirit and scope of the invention, and such modifications should also be considered as within the scope of the invention.
Claims (10)
1. The method for treating the easy-to-clean hardware surface is characterized by comprising the following steps of:
(1) installing a multi-arc ion plating target material;
(2) carrying out vacuum pumping after loading a sample, and carrying out PVD coating after reaching the background vacuum;
(3) spraying nanometer easy-to-clean materials on the PVD coated sample after being transferred to a spraying hanger;
(4) and baking and drying the sample sprayed with the nano easy-to-clean material.
2. The method for treating the easy-to-clean surface of hardware as claimed in claim 1, wherein the target material in the step (1) is one or more of zirconium, chromium and titanium.
3. The method for easy-cleaning hardware surface treatment according to claim 1, wherein the PVD coating process in the step (2) is a multi-arc ion plating process, and can deposit a reaction film comprising a pure metal film or carbide or nitride, and the final appearance comprises electroplated chromium color, gold color, rose gold color, gun color or black color.
4. The method for treating the easy-to-clean hardware surface according to claim 1, wherein in the step (2), the background vacuum of the coating is 0.002-0.008pa, the vacuum of the coating is 0.1-0.5pa, the electric arc target current is 80-100A, and the coating time is 2-6min.
5. The method for treating the easy-to-clean hardware surface according to claim 1, wherein the reaction gas in the step (2) is one or more of nitrogen, acetylene and methane.
6. The method for treating the easy-to-clean hardware surface as claimed in claim 1, wherein in the step (2), the PVD coating surface roughness Ra value is 4-15 μm, and the Rq value is 10-100 μm.
7. The method for treating the easy-to-clean hardware surface as claimed in claim 1, wherein the thickness of the plated film in the step (2) is 0.1-0.6 μm.
8. The method for processing the easy-to-clean surface of hardware as claimed in claim 1, wherein the main agent of the nano easy-to-clean material in the step (3) is perfluoropolyether, perfluorocarbon or other perfluoro compounds, and the solvent is a fluorocarbon solvent.
9. The method for treating the hardware easy-cleaning surface according to claim 1 or 8, wherein the main agent content of the nano easy-cleaning material is 3-7%.
10. The method for treating the easy-to-clean hardware surface according to claim 1, wherein the baking and drying temperature in the step (4) is 60-140 ℃ and the time is 20-60 min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210129870.3A CN114457309A (en) | 2022-02-11 | 2022-02-11 | Method for treating easy-to-clean surface of hardware |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210129870.3A CN114457309A (en) | 2022-02-11 | 2022-02-11 | Method for treating easy-to-clean surface of hardware |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114457309A true CN114457309A (en) | 2022-05-10 |
Family
ID=81412767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210129870.3A Pending CN114457309A (en) | 2022-02-11 | 2022-02-11 | Method for treating easy-to-clean surface of hardware |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114457309A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104694929A (en) * | 2015-03-17 | 2015-06-10 | 厦门建霖工业有限公司 | Method for forming anti-fingerprint membrane on sanitary product |
| CN105779943A (en) * | 2016-05-05 | 2016-07-20 | 厦门建霖工业有限公司 | Method of preparing hydrophobic membrane through physical vapor deposition of fluoroalkyl silane |
| CN106521417A (en) * | 2016-12-22 | 2017-03-22 | 北京科勒有限公司 | Vacuum coating method for clean film and coating apparatus |
| CN109594049A (en) * | 2019-02-14 | 2019-04-09 | 东莞市日信真空科技有限公司 | A method of utilizing sputter coating and spray treatment golf club |
| US20190161847A1 (en) * | 2017-11-29 | 2019-05-30 | Georgia Tech Research Corporation | Methods to impart color and durable properties to substrates |
| CN111411332A (en) * | 2020-03-31 | 2020-07-14 | 厦门大锦工贸有限公司 | Anhydrous low-cost imitation electroplating film and surface treatment method thereof |
| CN111534798A (en) * | 2020-03-31 | 2020-08-14 | 成霖企业股份有限公司 | Base material dry-type surface treatment method and bathroom accessory applying same |
-
2022
- 2022-02-11 CN CN202210129870.3A patent/CN114457309A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104694929A (en) * | 2015-03-17 | 2015-06-10 | 厦门建霖工业有限公司 | Method for forming anti-fingerprint membrane on sanitary product |
| CN105779943A (en) * | 2016-05-05 | 2016-07-20 | 厦门建霖工业有限公司 | Method of preparing hydrophobic membrane through physical vapor deposition of fluoroalkyl silane |
| CN106521417A (en) * | 2016-12-22 | 2017-03-22 | 北京科勒有限公司 | Vacuum coating method for clean film and coating apparatus |
| US20190161847A1 (en) * | 2017-11-29 | 2019-05-30 | Georgia Tech Research Corporation | Methods to impart color and durable properties to substrates |
| CN109594049A (en) * | 2019-02-14 | 2019-04-09 | 东莞市日信真空科技有限公司 | A method of utilizing sputter coating and spray treatment golf club |
| CN111411332A (en) * | 2020-03-31 | 2020-07-14 | 厦门大锦工贸有限公司 | Anhydrous low-cost imitation electroplating film and surface treatment method thereof |
| CN111534798A (en) * | 2020-03-31 | 2020-08-14 | 成霖企业股份有限公司 | Base material dry-type surface treatment method and bathroom accessory applying same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Navinšek et al. | PVD coatings as an environmentally clean alternative to electroplating and electroless processes | |
| CN102392246B (en) | Metal surface treatment process | |
| CN103953772B (en) | Tungsten carbide nitrogenizes the superhard wear valve of chromium composite coat | |
| US20220042178A1 (en) | Corrosion resistant carbon coatings | |
| CN106637155A (en) | Magnesium alloy surface abrasion-resistant corrosion-resistant thin film and preparation method thereof | |
| CN104831233A (en) | Decorative blue ceramic coating and preparation method thereof | |
| CN211497760U (en) | Champagne gold PVD film | |
| CN102029765B (en) | Method for manufacturing multicolor wear-resistant metal decorative film layer | |
| CN105779943A (en) | Method of preparing hydrophobic membrane through physical vapor deposition of fluoroalkyl silane | |
| US11065642B2 (en) | Multicolor fixture finishes | |
| CN111809151A (en) | Coating process for brass and zinc alloy base material | |
| CN114457309A (en) | Method for treating easy-to-clean surface of hardware | |
| CN109985787A (en) | A kind of surface treatment method of aluminum silicon carbide composite material | |
| CN110438421A (en) | A kind of aluminum alloy materials and the synchronous intensifying method of Aluminium Alloy Solution Treatment+PVD coating | |
| CN105506567A (en) | Preparation method for aluminum-based transition coating of die-casting aluminum alloy shell | |
| CN102367566B (en) | Cast iron vacuum chromium plating method | |
| WO2021114068A1 (en) | Preparation method for tin coating on titanium alloy part of aircraft engine | |
| CN109055910B (en) | Wear-resistant, corrosion-resistant and anti-fouling integrated (Cr, Cu) -GLC composite coating and preparation method thereof | |
| CN114369794A (en) | Process for plating wear-resistant film on surface of high polymer material and wear-resistant film prepared by process | |
| JP4993857B2 (en) | Decoration method | |
| Jehn | PVD and ECD-competition, alternative or combination? | |
| CN104775094A (en) | Surface gold-plating method for plastic product | |
| CN102899611A (en) | Technology for depositing ZrN film on aluminum alloy surface | |
| CN1170956C (en) | Nm-class Ti-base ceramic covered piston ring and its method | |
| CN114351084B (en) | High polymer material surface brightening wear-resistant coating process and optical coating prepared by same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220510 |