CN114442289A - 一种高功率激光照射变焦光学系统 - Google Patents

一种高功率激光照射变焦光学系统 Download PDF

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CN114442289A
CN114442289A CN202111655024.7A CN202111655024A CN114442289A CN 114442289 A CN114442289 A CN 114442289A CN 202111655024 A CN202111655024 A CN 202111655024A CN 114442289 A CN114442289 A CN 114442289A
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lens
optical system
irradiation
power laser
laser irradiation
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范淑静
杨亚林
王世先
李国俊
杨欣凯
秦建峰
闫学纯
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Henan Costar Group Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/18Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00Optical objectives with means for varying the magnification
    • G02B15/14Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/143Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having three groups only
    • G02B15/1435Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having three groups only the first group being negative
    • G02B15/143507Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having three groups only the first group being negative arranged -++
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/04Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
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Abstract

本发明公开了一种高功率激光照射变焦光学系统,包括激光器,在激光器发射的光轴上设有透镜Ⅰ作为前固定组、透镜Ⅱ作为变焦组、透镜Ⅲ作为后固定组。通过采用变焦光学设计、高功率激光技术、非球面设计、二元衍射面设计等技术,构成一种新型的三组三片式,焦距为530毫米‑550毫米,F数为8的高功率激光照射变焦光学系统,该系统既实现对不同距离目标的照射要求,又可根据要求调整扩束角度,解决不同照射距离照射光斑大小一致的难题,实现不同距离的目标销毁要求,在实际应用中,效果良好。

Description

一种高功率激光照射变焦光学系统
技术领域
本发明属于光学设计技术领域,具体涉及一种高功率激光照射变焦光学系统。
背景技术
随着高功率光纤激光技术的快速发展,激光照射变焦镜头以它特有的结构简单、性能稳定可靠、视场转换快等优势,越来越广泛的应用于不同距离的救援切割、烧毁布料、目标毁伤等。
利用高功率光纤激光进行照射的光学系统对远、近距离目标毁伤作业时,如何实现不同距离的照射要求、同时满足系统对不同照射距离照射光斑大小一致的使用要求成为设计的难点。
发明内容
本发明的目的是提供一种新型的三组三片式的高功率激光照射变焦光学系统,采用变焦光学设计、高功率激光技术、非球面设计、二元衍射面设计等技术,该系统既实现对不同距离目标的照射要求,又可根据要求调整扩束角度,解决不同照射距离照射光斑大小一致的难题,实现不同距离的目标销毁要求。
为了达到上述目的,本发明采用的技术方案是:一种高功率激光照射变焦光学系统,包括激光器,所述激光器发射的光轴上设有透镜Ⅰ作为前固定组、透镜Ⅱ作为变焦组、透镜Ⅲ作为后固定组;
其中激光器的波长为1064nm或1053nm或1080nm;
所述透镜Ⅰ为凸面向前的负弯月透镜;
透镜Ⅱ为凸面向后的二元衍射面正弯月透镜;
透镜Ⅲ为凸面向后的正弯月透镜;
通过轴向移动透镜Ⅱ能够实现系统焦距的连续变化,透镜Ⅲ作为后固定组实现大小视场状态下系统的像差平衡。
进一步的,所述二元衍射面的系统参数为:半径:-78.6mm ;厚度:7mm ;口径:54mm。
所述高功率激光照射变焦光学系统的焦距为530mm-550mm,F数为8。
采用上述设计的高功率激光照射变焦光学系统,具有以下优点:该光学系统采用变焦光学设计、高功率激光技术、非球面设计、二元衍射面设计等技术,既实现对不同距离目标的照射要求,又可根据要求调整扩束角度,解决不同照射距离照射光斑大小一致的难题,实现不同距离的目标销毁要求;结构简单、易于加工和推广。
附图说明
图1所示为本发明的结构示意图。
具体实施方式
下面结合附图和具体实施例对本发明技术方案进行清楚、完整地描述。
参照图1所示,一种高功率激光照射变焦光学系统,包括激光器,在激光器发射的光轴上设有透镜Ⅰ作为前固定组、透镜Ⅱ作为变焦组、透镜Ⅲ作为后固定组;
其中激光器的波长为1064nm或1053nm或1080nm;
透镜Ⅰ为凸面向前的负弯月透镜;
透镜Ⅱ为凸面向后的二元衍射面正弯月透镜;
透镜Ⅲ为凸面向后的正弯月透镜;
通过轴向移动透镜Ⅱ能够实现系统焦距的连续变化,透镜Ⅲ作为后固定组实现大小视场状态下系统的像差平衡。
二元衍射面的系统参数为:半径:-78.6mm ;厚度:7mm ;口径:54mm。该高功率激光照射变焦光学系统的焦距为530mm-550mm,F数为8。
按照上述方案,设计了一种波长分别为1080nm的高功率激光照射变焦光学系统,其系统参数如下:
Figure DEST_PATH_IMAGE001
其中*为二元衍射面,其相位参数如下:
Figure 990928DEST_PATH_IMAGE002
式中M为衍射级数,N为衍射面多项式系数,Ai为衍射面多项式的系数,ρ为衍射面的口径。
其中衍射面数据如下:
M N A1 A2 A3 A4 A5 A6
1 6 -55.6 60.9 -197.4 310.1 -225.2 59.22
该系统既实现了对不同距离的照射要求,又实现了根据不同距离调整扩束角度,解决不同照射距离照射光斑大小一致的难题。
以上所述仅为本发明的优选实施例而已,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均包含在本发明的保护范围之内。

Claims (3)

1.一种高功率激光照射变焦光学系统,其特征在于:包括激光器,所述激光器发射的光轴上设有透镜Ⅰ作为前固定组、透镜Ⅱ作为变焦组、透镜Ⅲ作为后固定组;
其中激光器的波长为1064nm或1053nm或1080nm;
所述透镜Ⅰ为凸面向前的负弯月透镜;
透镜Ⅱ为凸面向后的二元衍射面正弯月透镜;
透镜Ⅲ为凸面向后的正弯月透镜;
通过轴向移动透镜Ⅱ能够实现系统焦距的连续变化,透镜Ⅲ作为后固定组实现大小视场状态下系统的像差平衡。
2.根据权利要求1所述的高功率激光照射变焦光学系统,其特征在于:所述二元衍射面的系统参数为:半径:-78.6mm ;厚度:7mm ;口径:54mm。
3.根据权利要求2所述的高功率激光照射变焦光学系统,其特征在于:所述高功率激光照射变焦光学系统的焦距为530mm-550mm,F数为8。
CN202111655024.7A 2021-12-31 2021-12-31 一种高功率激光照射变焦光学系统 Pending CN114442289A (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114442293A (zh) * 2021-12-29 2022-05-06 河南中光学集团有限公司 一种激光照明扩束变焦光学系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004221560A (ja) * 2002-12-25 2004-08-05 Semiconductor Energy Lab Co Ltd レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
CN106054361A (zh) * 2015-04-03 2016-10-26 株式会社腾龙 光学系统及摄像装置
CN111856712A (zh) * 2020-07-31 2020-10-30 南京波长光电科技股份有限公司 一种扫描幅面可调的新型激光扫描光学系统

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004221560A (ja) * 2002-12-25 2004-08-05 Semiconductor Energy Lab Co Ltd レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
CN106054361A (zh) * 2015-04-03 2016-10-26 株式会社腾龙 光学系统及摄像装置
CN111856712A (zh) * 2020-07-31 2020-10-30 南京波长光电科技股份有限公司 一种扫描幅面可调的新型激光扫描光学系统

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114442293A (zh) * 2021-12-29 2022-05-06 河南中光学集团有限公司 一种激光照明扩束变焦光学系统
CN114442293B (zh) * 2021-12-29 2023-09-12 河南中光学集团有限公司 一种激光照明扩束变焦光学系统

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