CN114397799A - EUV radiation source generating device for photoetching machine - Google Patents

EUV radiation source generating device for photoetching machine Download PDF

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Publication number
CN114397799A
CN114397799A CN202210069647.4A CN202210069647A CN114397799A CN 114397799 A CN114397799 A CN 114397799A CN 202210069647 A CN202210069647 A CN 202210069647A CN 114397799 A CN114397799 A CN 114397799A
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radiation source
cavity
euv radiation
laser
fuel injection
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张玥
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70033Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001X-ray radiation generated from plasma
    • H05G2/003X-ray radiation generated from plasma being produced from a liquid or gas
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001X-ray radiation generated from plasma
    • H05G2/008X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
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  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention discloses an EUV radiation source generating device for a photoetching machine, which comprises a conveyor belt; the method is characterized in that: the device also comprises an EUV radiation source generating unit, a cleaning unit, a fuel injection unit and a vacuum control unit; the EUV radiation source generating unit comprises a reflecting cup and a laser; the belt body of the conveyor belt is provided with a light through hole, a laser crystal is arranged in the light through hole, the upper part of the laser crystal is provided with a coating, the coating is provided with a plurality of micron holes, and fuels capable of generating extreme ultraviolet light are arranged in the micron holes; the cleaning unit comprises a fragment cleaning cavity and a steam nozzle; the fuel injection unit comprises a fuel injection cavity and a high-pressure nozzle; the front part of the fuel injection cavity is provided with a first mechanical arm and an auxiliary light source, and the rear part of the fuel injection cavity is provided with a second mechanical arm. The invention effectively realizes the continuous operation of the device, ensures the reliability of fuel filling, improves the production efficiency of the device and simultaneously achieves the aim of improving the photoetching precision.

Description

EUV radiation source generating device for photoetching machine
Technical Field
The invention belongs to the technical field of auxiliary devices of photoetching machines, and particularly relates to an EUV radiation source generating device for a photoetching machine.
Background
Extreme ultraviolet lithography (Extreme Ultra-violet-lithography), often referred to as EUV lithography, is a lithography technique using Extreme ultraviolet light with a wavelength of 10 to 14 nm as a radiation source, and the currently common wavelength is 13.4 nm. In the existing photoetching machines, the most advanced photoetching machine at present reaches the level of 3nm, and the design scheme of the NA EUV photoetching machine of 1nm level is also completed; the difficulty in manufacturing high-end lithography machines is the manufacturing and collection of EUV light, but the existing domestic lithography machines lack the manufacturing technology of EUV extreme ultraviolet light.
Photoluminescence (PL) is a kind of cold luminescence, and refers to a process in which a substance absorbs photons (or electromagnetic waves) and then re-radiates the photons (or electromagnetic waves).
The utility model with the patent number ZL 202120462649.0 discloses an EUV light source generator structure for a photoetching machine, which comprises a conveyor belt, wherein a plurality of groups of EUV light source generators are arranged on the conveyor belt, and a laser is arranged at the lower part of the conveyor belt; the EUV light source generator comprises a belt body, wherein a light through hole is formed in the belt body, a nanotube bundle consisting of a plurality of nanotubes is longitudinally arranged in the light through hole, a light-transmitting plug is arranged on the lower side of the nanotube bundle, and a photoinduced luminous body is arranged on the upper part of the plug; and a through hole for the light emitted by the laser to pass through is arranged at the position of the conveyor belt corresponding to the light through hole. The utility model discloses an in the structure, incident beam hits the photoluminescence body on the EUV light source generator through hitting several times, make it stimulate out extreme ultraviolet ray photon, extreme ultraviolet ray photon passes through nanotube bundle's guide and reposition of redundant personnel effect, form many light beams that are close to the parallel, devices such as rethread light beam correction system, finally carry to objective and be used for carrying out the sculpture, continuous rotation through the conveyer belt, will contain the EUV light source generator of the photoluminescence body that is not aroused by laser, carry to the perpendicular top of laser instrument in succession, the incident light that makes the laser instrument send can hit in succession and beat fresh photoluminescence body, thereby realize exciting out extreme ultraviolet's effect in succession.
However, the utility model discloses a method is produced with the invention patent EUV radiation source and the EUV radiation source of application publication No. CN102823330A, and the method that provides is similar, has influenced the stability of this utility model patent, and this utility model adopts tube bank structure, makes it have the collection angle of extreme ultraviolet light little, and the easy problem that is damaged of being attacked by extreme ultraviolet light of tube bottom, because this utility model can only carry out saturation attack, can't avoid laser to hit nanotube bundle bottom to further influence the life of device. In addition, the utility model lacks of a 'photoinduced luminous body' cleaning and injecting device, so that the full automation can not be realized.
An invention patent EUV radiation source and EUV radiation source producing method of application publication No. CN102823330A discloses an EUV radiation source producing method including a fuel supply configured to deliver droplets of a fuel to a plasma producing location; a first laser beam source configured to provide first laser beam radiation that is incident on the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet to generate a plasma for emitting EUV radiation; and a second laser beam source configured to subsequently provide a second beam of laser radiation at the plasma generation location, the second beam of laser radiation configured to vaporize debris particles caused by incomplete vaporization of the fuel droplets. The patent can prepare an EUV radiation source, but because the quantity of fuel droplets carried by one time is small, the intensity of the generated EUV radiation is not high, if the volume of the fuel droplets is increased to increase the carrying quantity of the fuel droplets carried by one time, the radiation intensity of a laser beam also needs to be increased correspondingly, but the intensity of laser excited by the current laser cannot meet the requirement, and therefore the laser cannot be used as a radiation source of an EUV lithography machine at present.
Under the condition that the laser intensity excited by the existing laser is limited, in the prior art, 5 ten thousand of tin droplets with the diameter of about 20 micrometers are continuously beaten every second to realize the preparation of the EUV radiation source, but the performance of the EUV radiation source still has a space for further improving. In addition, the intensity of the EUV radiation source can be increased by increasing the amount of tin introduced into the EUV radiation source generating device per unit time, by reducing the absorption of EUV light, and the like.
Disclosure of Invention
The purpose of the invention is: an EUV radiation source generating device for a lithography machine is provided to solve the problems in the prior art.
The invention is realized by the following technical scheme: an EUV radiation source generating device for a lithographic apparatus, comprising a conveyor belt; the method is characterized in that: the device also comprises an EUV radiation source generating unit, a cleaning unit, a fuel injection unit and a vacuum control unit;
the EUV radiation source generating unit comprises a reflecting cup sleeved on the conveying belt and a laser arranged below the reflecting cup; the lower part of the reflecting cup is provided with an arc-shaped seal, and a laser emitting hole matched with a laser is arranged on the seal; the belt body of the conveyor belt is provided with a light through hole, a laser crystal is arranged in the light through hole, the upper part of the laser crystal is provided with a coating, the coating is provided with a plurality of micron holes, and fuels capable of generating extreme ultraviolet light are arranged in the micron holes; the laser is provided with a probe capable of identifying colors;
the cleaning unit comprises a fragment cleaning cavity sleeved on the conveyor belt, and the conveyor belt in the fragment cleaning cavity is provided with a loop; a steam spray head is arranged in the cleaning cavity and corresponds to the laser crystal at the top of the circular ring;
the fuel injection unit comprises a fuel injection cavity, and a high-pressure nozzle is arranged in the fuel injection cavity, communicated with the fuel liquid storage tank and corresponding to the micro-hole; the front part of the fuel injection cavity is provided with a first mechanical arm and an auxiliary light source, the first mechanical arm is used for moving the photosensitive barrier sheet on the laser crystal, and the auxiliary light source is used for emitting a light beam to the laser crystal to puncture the photosensitive barrier sheet; and a second mechanical arm is arranged at the rear part of the fuel injection cavity and is used for removing the photosensitive blocking sheet.
Further: the interior of the light reflecting cup is coated with a reflecting coating.
Further: the fuel is metallic tin.
Further: the coating is formed by alternately arranging silicon materials and molybdenum materials.
Further: the coating is 40 layers.
Further: the thickness of the cup body of the reflective cup is 1 cm, the inner diameter of the upper part of the cup body is 38 cm, the lower part of the cup body is 28 cm, and the height of the cup body is 50 cm.
Further: the aperture of the light through hole is 20 cm.
Further: the thickness of the coating on the laser crystal is 30 micrometers, the micropores on the coating are distributed in two rectangular areas, the size of each rectangular area is 10 centimeters by 4 centimeters, and the pore diameter of each micropore is 20 micrometers.
Further: the high-pressure nozzle is circular, the thickness of the pipe wall is 1 cm, the inner diameter is 20 cm, the high-pressure nozzle can be tightly matched with the top of a laser crystal, two small spray heads with the inner diameter of 10 cm 4 cm 20 microns are arranged in the bottom of the high-pressure nozzle, a pre-pumping cavity is arranged on the upper portion of each small spray head, a movable baffle is arranged on the upper portion of the relative position of the small spray heads at the bottom of the pre-pumping cavity, the thickness of the movable baffle is 0.5 cm, a baffle moving cavity is arranged on one side of the baffle, the baffle can be moved into or out of the baffle moving cavity under the control of electric power, and an air inlet guide pipe is arranged on the baffle.
Further: the conveyor belt is made of quartz or glass or steel and is provided with a reflective coating.
The invention has the advantages that: according to the scheme of the invention, the vacuum control cavities on two sides of the reflecting cup are respectively pumped by a vacuum pump to ensure that the reflecting cup is in a vacuum state, the reflecting cup comprises two cup-shaped tube barrels, a conveyor belt conveys 80 cm per second, two laser crystals carrying fuel droplets are respectively conveyed to central areas in the two cup-shaped tube barrels of the reflecting cup, the laser crystals pause for 1 second after being conveyed for 1 second, a color recognition system on a laser recognizes the specific positions of the fuel droplets through color difference in 100 nanoseconds after the conveyor belt pauses, four groups of emitting devices of the laser selectively hit the fuel droplets (with the color of silver white) in a specified rectangular area (with the color of grey) above the laser crystals within 1 second respectively, a first laser beam source is prepared, the fuel droplets above the laser crystals are hit to the air, forming a powder cake-shaped plasma, preparing a second laser beam source within the following 100 nanoseconds, striking the powder cake-shaped fuel droplets struck in the air to excite extreme ultraviolet light, directly transmitting the generated extreme ultraviolet light out of the reflector cup or reflecting the extreme ultraviolet light out of the reflector cup through a conveyor belt and the inner wall of the reflector cup to form two divergent light beams, finally conveying the two divergent light beams to an objective lens through devices such as a light beam correction system, simultaneously supplying two wafers for etching, continuously conveying laser crystals containing the fuel droplets which do not form the plasma to central areas in two cup-shaped tubes of the reflector cup through the continuous rotation of the conveyor belt, and continuously striking fresh fuel droplets by laser emitted by a laser so as to realize the effect of continuously exciting the extreme ultraviolet light;
after fuel droplets above the laser crystal are beaten by laser to generate extreme ultraviolet light, the fuel droplets are conveyed to a fragment cleaning cavity by a conveyor belt, the laser crystal is conveyed to the top of a circular loop track through a preset circular loop track to be inverted by the conveyor belt, a steam nozzle at the lower part of the conveyor belt emits steam to the laser crystal under the action of 2 atmospheric pressures, the fragments in the laser crystal coating are flushed into a tray below the steam nozzle, and the laser crystal is conveyed to the bottom in the cavity along the preset track by the conveyor belt to be upright and conveyed out;
can be before the fuel injection, at laser crystal top installation separation blade, the fuel injection back is shifted out the separation blade again to when avoiding the fuel injection, pollute laser crystal top coating, and avoid in the data send process, outside the fuel droplet spills the micron hole, specific method is as follows: after the conveyor belt is conveyed out of the fragment cleaning cavity, the conveyor belt is conveyed to the side of the first mechanical arm, and the first mechanical arm installs the photosensitive barrier sheet above the laser crystal through the conveying port within 1 second after the conveyor belt stops; then the auxiliary light source emits light beams at the lower part of the laser crystal within 1 second of the pause of the conveyor belt, so that the light beams irradiate the photosensitive barrier through the micron holes in the coating above the laser crystal to generate substances with lower boiling points, and the substances are evaporated at high temperature to form holes with the same aperture as the micron holes; then the conveyor belt transfers the laser crystal without fuel in the coating into a fuel injection cavity, a vacuum control system in the fuel injection cavity pumps out gas in the cavity to keep the gas in the cavity in a nearly vacuum state, and pre-pumps fuel liquid into a pre-pumping cavity, a scanning system identifies the specific position of the laser crystal provided with a photosensitive barrier within 100 nanoseconds after the conveyor belt stops, a high-pressure nozzle is tightly combined with the laser crystal within 0.3 second, a baffle plate at the bottom of the pre-pumping cavity is rapidly inserted into a baffle plate moving cavity within 0.4 second and then moves back, the height of the fuel liquid in the two small spray heads is controlled to be 20 micrometers, and the fuel in the two small spray heads is quantitatively injected into the micrometer holes in the laser crystal coating within 0.3 second through the pressurization of an air inlet guide pipe on the baffle plate to complete the injection of the fuel; after the fuel is injected, the conveyor belt transfers the fuel out of the fuel injection cavity, and the second mechanical arm moves the photosensitive barrier sheet away through the conveying opening within 1 second of the pause of the conveyor belt, and the process is repeated to enter the next cycle.
The invention identifies the position of tin through the difference of colors, and the method for realizing accurate striking is different from the method provided in the invention patent with the application publication number CN 102823330A. Estimating according to the fact that 100 nanoseconds are needed for identifying and striking tin once by a laser, and 1000 ten thousand drops of tin can be struck by one group of lasers in one second; according to the parameter estimation provided above, the conveyer belt can convey 2 laser crystals containing fuel droplets to the central area of two cup-shaped tube barrels of the reflector cup per second, and the tin carrying amount of each laser crystal is at most 2 × 4 cm × 10 cm ÷ (20 microns × 20 microns/droplet) =2000 ten thousand droplets, so that the intensity of the EUV radiation source can be effectively increased by increasing the tin carrying amount of the laser crystal, the conveying speed of the conveyer belt and the number of laser groups, thereby increasing the exposure rate, reducing the chip manufacturing time, and providing possibility for increasing the number of reflector groups, increasing the NA numerical aperture and achieving the purpose of improving the photoetching precision.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic structural diagram of an EUV radiation source generating unit;
FIG. 3 is a schematic view of the structure of the cleaning unit;
FIG. 4 is a schematic structural view of a fuel injection unit;
FIG. 5 is a schematic diagram of the auxiliary light source and the laser crystal;
fig. 6 is a schematic structural view of a vacuum control unit.
The sequence numbers in the figures illustrate: the device comprises a conveyor belt 1, an EUV radiation source generating unit 2, a cleaning unit 3, a fuel injection unit 4 and a vacuum control unit 5;
11 is a light through hole, 12 is a belt body;
21 is a reflecting cup, 22 is a laser, 23 is a seal, 24 is a laser emitting hole, 25 is an identification probe, 26 is a laser crystal, 27 is a coating, 28 is a micron hole, and 29 is fuel;
31 is a fragment cleaning cavity, 32 is a return ring, and 33 is a steam nozzle;
41 is a fuel injection cavity, 42 is a high-pressure nozzle, 43 is a first mechanical arm, 44 is an auxiliary light source, 45 is a photosensitive barrier and 46 is a second mechanical arm;
the 51 is a vacuum control cavity I, and the 52 is a vacuum control cavity II.
Detailed Description
As shown in fig. 1-6, an EUV radiation source generating device for a lithography machine according to the present invention comprises a conveyor belt 1, wherein the conveyor belt is arranged in a ring shape, a belt body can move freely within a range defined by a conveyor belt frame, and can run at a constant speed or in a pulse mode under the driving of a servo motor, the conveyor belt comprises a plurality of through holes, and the belt body is coated with a silicon material and a molybdenum material and has the capability of reflecting extreme ultraviolet light; the device also comprises an EUV radiation source generating unit 2, a cleaning unit 3, a fuel injection unit 4 and a vacuum control unit 5;
the EUV radiation source generating unit 2 comprises a reflecting cup 21 sleeved on a part of the conveyor belt and a laser 22 arranged below the reflecting cup; an opening for the conveyor belt to pass through is formed in the cup body of the reflecting cup, an arc-shaped seal 23 is arranged at the lower part of the reflecting cup, and a laser emitting hole 24 matched with the laser is formed in the seal; a light through hole 11 is arranged on a belt body 12 of the conveyor belt, a laser crystal 26 is arranged in the light through hole, a coating 27 is arranged on the upper part of the laser crystal, a plurality of micron holes 28 are arranged on the coating, and fuel 29 capable of generating extreme ultraviolet light is arranged in the micron holes; an identification probe 25 for determining the position of the metal tin is arranged on the laser 25, and the identification probe is a sensor with a color identification function and can identify different colors so as to determine the position of the tin;
the cleaning unit 3 comprises a fragment cleaning cavity 31 sleeved on a part of the conveyor belt, and the conveyor belt in the fragment cleaning cavity is provided with a return ring 32; a steam spray nozzle 33 is arranged in the cleaning cavity and corresponds to the laser crystal at the top of the circular ring;
the fuel injection unit 4 comprises a fuel injection cavity 41, and a high-pressure nozzle 42 is arranged in the fuel injection cavity, is communicated with the fuel storage tank and corresponds to the micro-hole; a first mechanical arm 43 and an auxiliary light source 44 are arranged in front of the fuel injection cavity (which can be the front inside the cavity or the front of the whole cavity), the first mechanical arm is used for moving a photosensitive barrier 45 on the laser crystal, and the auxiliary light source is used for emitting a light beam to the laser crystal to puncture the photosensitive barrier; a second robot arm 46 is provided at the rear of the fuel injection chamber for removing the photosensitive shutter.
Preferably: the thickness of the cup body of the reflective cup is 1 cm, the inner diameter of the upper part of the cup body is 38 cm, the lower part of the cup body is 28 cm, and the height of the cup body is 50 cm.
Preferably: and the inner part and the outer part of the reflecting cup are coated with reflecting coatings.
Preferably: the coating (including the reflective coating on the reflective cup and the coating on the conveyor belt) is formed by alternately forming a silicon material and a molybdenum material.
Preferably: the coating is 40 layers.
Preferably: the fuel is metallic tin.
Preferably: the aperture of the light through hole is 20 cm.
Preferably: the thickness of the coating on the laser crystal is 30 micrometers, the micropores on the coating are distributed in two rectangular areas, the size of each rectangular area is 10 centimeters by 4 centimeters, and the pore diameter of each micropore is 20 micrometers.
Preferably: the vacuum control unit 5 comprises a vacuum control cavity I and a vacuum control cavity II which are arranged at the position of a conveying port where the reflection cup is matched with the conveying belt, wherein the vacuum control cavity at the rear part of the reflection cup is a vacuum control cavity I51, and the vacuum control cavity at the front part of the reflection cup is a vacuum control cavity II 52; the two vacuum control cavities are sleeved outside the conveying belt and are respectively communicated with the conveying opening, and the opening position of the reflecting cup is pumped so as to ensure the vacuum inside the reflecting cup and avoid the influence of air on light. The opening on the upper part of the reflecting cup is communicated with a light processing device (the prior structure, which is not the technical point of the scheme), so that sealing and vacuum are realized.
Preferably: the high-pressure nozzle is circular, the thickness of the pipe wall is 1 cm, the inner diameter is 20 cm, the high-pressure nozzle is tightly matched with the top of the laser crystal, two small spray heads with the size of 10 cm 4 cm 20 microns are arranged in the bottom of the high-pressure nozzle, a pre-pumping cavity is arranged on the upper portion of each small spray head, the upper portion of the relative position of the small spray heads at the bottom of the pre-pumping cavity is provided with a movable baffle, the thickness of the movable baffle is 0.5 cm, a baffle moving cavity is arranged on one side of the baffle, the baffle can move into or out of the baffle moving cavity, and an air inlet guide pipe is arranged on the baffle.
Preferably: the conveyor belt is made of quartz or glass or steel and is provided with a reflective coating.
Preferably: the vacuum control unit comprises a vacuum control cavity respectively arranged at two sides of the reflection cup, and a vacuum pump and a pneumatic pressure monitoring device are arranged in the vacuum control cavities;
the invention will be further described by means of the methods and principles of use.
The invention relates to a radiation source generating device of a photoetching machine, which can continuously prepare extreme ultraviolet light and consists of nine parts:
the transmission belt is made of high-temperature-resistant materials, a plurality of through holes are formed in the transmission belt, and the transmission belt is coated with silicon materials and molybdenum materials and has the capability of reflecting extreme ultraviolet light so as to prevent the transmission belt from being damaged by the extreme ultraviolet light;
2, each through hole is correspondingly provided with a laser crystal, a coating layer consisting of silicon materials and molybdenum materials is arranged above the laser crystal, the thickness of the coating layer is about 30 micrometers, two rectangular areas on two sides of the central position in the coating layer are provided with micro holes with consistent sizes and matrix arrangement, and fuel liquid drops are contained in the micro holes;
3, in the EUV radiation source generating unit area, two reflecting cups are provided, and are respectively composed of a cup-shaped tube body arranged above the conveyor belt and an arc-shaped seal arranged below the conveyor belt, the cup body is provided with a conveyor belt conveying inlet and a conveyor belt conveying outlet, and each arc-shaped bottom is provided with two laser emitting holes;
4, the laser is arranged at the lower part of the reflecting cup, the laser is provided with a color recognition system and four groups of laser emitting devices, and a probe of the color recognition system and the four groups of laser emitting devices are arranged below the laser emitting hole;
5, two sides of the reflecting cup are respectively provided with a vacuum control cavity which is a compartment made of high-temperature resistant materials, a conveying belt conveying inlet and a conveying belt conveying outlet are arranged, an access door is arranged, and the control cavities are communicated with a vacuum pump and a pressure monitoring device;
6, the fragment cleaning cavity is a compartment made of high-temperature-resistant materials, is provided with a conveyor belt conveying inlet and a conveyor belt conveying outlet, and is provided with an access door, the conveyor belt in the fragment cleaning cavity is provided with a loop, the loop is similar to a track of a roller coaster, so that the conveyor belt is in an inverted mode of being positioned under the head and feet when running to the top area of the loop, a plurality of groups of steam nozzles are arranged below the top of the loop, a tray is arranged below the steam nozzles, a steam generating device is connected with the steam nozzles through a pipeline, and micron holes in the coating are cleaned through steam so as to remove residual fuel fragments in the micron holes;
7, the fuel injection cavity is a compartment made of high-temperature-resistant materials, is provided with a conveyor belt conveying inlet and a conveyor belt conveying outlet, and is provided with an access door; a fuel injection machine is arranged in the fuel injection cavity and comprises a plurality of groups of scanning systems and high-pressure nozzles which are arranged at the upper part of the conveyor belt, and a vacuum control system, a liquid storage tank and the like are also arranged in the fuel injection cavity;
8, a first mechanical arm and an auxiliary light source are arranged at the front part of the fuel injection cavity, the first mechanical arm is arranged at the upstream of the conveying direction of the conveying belt, the auxiliary light source is arranged below the conveying belt, the first mechanical arm places a photosensitive baffle above the laser crystal coating and enables the photosensitive baffle to be tightly attached to the coating, then the auxiliary light source is started to excite a laser to generate light beams, the light beams act on the photosensitive baffle through the micropores and break down the photosensitive baffle, and the broken holes are completely consistent with the micropores; the structure of the mechanical arm is the prior art, the photosensitive baffle and the coating can be jointed for limiting and fixing in the modes of clamping, limiting grooves and the like, and the specific structure is not described in detail in the prior art;
9, a second mechanical arm is installed at the rear part of the fuel injection cavity, the second mechanical arm is installed at the downstream of the conveying direction of the conveying belt, the second mechanical arm removes the photosensitive baffle above the micron hole after fuel injection, and therefore the fuel injection process in the micron hole is completed.
In addition, in this scheme, the unexplained connection relationship and structure may be in the form of clamping, bonding, or other forms in the prior art, and are not described in detail in this scheme.
In order to better understand the scheme, the preparation method of each part of the scheme is illustrated as follows, the method is only one example and is not limited to the scheme, and the structure of the scheme can also be prepared by other methods disclosed in the prior art. Specific examples are as follows:
first, preparing micron pores on laser crystal
1, punching a circle with the radius of 10 cm on a substrate with the thickness of 1 cm by using laser, punching two rectangular light through holes with the size of 10 cm x 4 cm at the positions of 1 cm on two sides of the center of the obtained circular substrate, and placing the prepared substrate on a horizontal flat plate;
2, preparing a micron tube bundle: firstly, combining chemical functional groups such as hydroxyl, methyl, hydroxymethyl, carboxyl and the like with a micron tube with the radius of 10 microns through corresponding chemical reaction, and then combining a silicon carbon nitrogen intermediate with the functional groups introduced by the micron tube, wherein the silicon carbon nitrogen intermediate refers to all substances capable of being combined with the micron tube and also comprises the micron tube, the micron tube bundle can also be prepared through a 3D printing technology, and the length, the width and the height of the micron tube bundle are respectively 10 cm, 4 cm and 1.5 cm;
3, inserting the two micron tube bundles into the rectangular holes of the circular base plate to enable one side close to the flat plate to be flush with the base plate;
4, sealing the other side of the micro tube bundle by using a laser crystal, fixing the micro tube bundle, the substrate and the laser crystal, specifically, adhering the outer wall of the micro tube bundle, the substrate and the laser crystal by using glue, or clamping the micro tube on a machine shell by molding, or adopting other existing modes, and fixing the substrate and the laser crystal by using screws;
5, adopting a numerical control machine tool to make the laser crystal into a circular structure with the thickness of 1 cm and the radius of 10 cm, and repeatedly coating a silicon material and a molybdenum material on one side of the laser crystal to ensure that the thickness of the coating is 30 microns;
and 6, fixing the laser crystal and the substrate containing the micron tube bundle together, emitting laser by a laser, irradiating the laser crystal through the micron tube bundle on the side of the substrate, and breaking down a coating on the laser crystal to form micron holes with consistent sizes and orderly arrangement in two rectangular areas on the coating.
Preparation and installation of EUV radiation source generating device
1, drilling a through hole with the radius of 10 cm at the interval of 20 cm on a conveying belt made of a high-temperature-resistant material and with the thickness of 5 cm by adopting numerical control machine tool equipment, drilling a groove with the bottom length of 20 cm and the bottom depth of 1 cm on the upper part of the conveying belt and on the left side of a light through hole, wherein the height of the annular frame is 0.5 cm lower than that of the top of the conveying belt, and on the right side of the light through hole, the two ends of the groove are connected with the two ends of the right semicircle of the light through hole and are used as a conveying port of a photosensitive blocking sheet, repeatedly and alternately coating silicon materials and molybdenum materials on the conveying belt to form 40 layers, so that the conveying belt has the capacity of reflecting extreme ultraviolet light;
2, clamping the laser crystal containing the micron holes with the coating facing upwards on the light through holes on the conveyor belt, and enabling the top to be flush with the bottom of the groove;
3, manufacturing two reflecting cups by using numerical control machine equipment, wherein the inner diameter of the upper part of each reflecting cup is 38 cm, the inner diameter of the lower part of each reflecting cup is 28 cm, the wall thickness of each cup-shaped tube barrel is 1 cm, the lower part of each cup-shaped tube barrel is sealed by an arc-shaped bottom, a conveying inlet and a conveying outlet of a conveying belt are arranged at the joint, two laser emitting ports are arranged on each arc-shaped bottom, the upper edges of the two cup-shaped tube barrels are welded together, the outer wall of the inner wall of each reflecting cup is repeatedly and alternately coated by silicon materials and molybdenum materials, and 40 layers are coated in total, so that the reflecting cups have the capacity of reflecting extreme ultraviolet light;
preferably, a channel for accommodating the conveyor belt is welded at the conveying port at the adjacent position of the two reflection cups, so that the two reflection cups are welded into a whole and can be passed by the conveyor belt, the conveyor belt is sealed at the part, and the influence of the external environment on fuel droplets on the conveyor belt is avoided;
4, a CO2 laser is arranged below the reflection cup, and a probe of a color recognition system on the laser and four groups of laser emitting devices are arranged below a laser emitting port;
5, respectively installing a vacuum control cavity on two sides of the reflecting cup, wherein the vacuum control cavity is a compartment made of high-temperature-resistant materials, only a conveying belt conveying inlet and a conveying outlet are reserved, and an access door is arranged in the vacuum control cavity;
6, a partition is made of high-temperature-resistant materials at the rear part of the vacuum control cavity I and serves as a fragment cleaning cavity, only a conveying belt conveying inlet and a conveying outlet are reserved, an access door is arranged, a return ring is arranged on a conveying belt in the fragment cleaning cavity, a steam nozzle is installed below the top of the circular return ring, a tray is installed below the steam nozzle, and a steam generating device is connected with the steam nozzle through a pipeline;
7, a partition is made of high-temperature-resistant materials at the front part of the vacuum control cavity II and is used as a fuel injection cavity, only a transmission belt transmission port and a transmission port are reserved, an access door is arranged, a fuel injection machine is installed in the fuel injection cavity and is provided with a vacuum control system, a liquid storage tank, a high-pressure nozzle, a scanning system and the like, wherein the size of the inner diameter of the pipe wall of the nozzle is consistent with that of the laser crystal, the size of a small nozzle at the bottom of the nozzle is consistent with that of two rectangular areas in the laser crystal coating, so that fuel droplets emitted by the fuel nozzle can only flow into a micron hole in the coating above the laser crystal, a pre-pumping cavity is arranged in the nozzle, a movable baffle is arranged at the bottom of the cavity, and a baffle moving cavity is arranged on one side of the baffle;
8, an auxiliary light source is arranged at the front part of the fuel injection cavity and below the conveyor belt;
9, a plurality of groups of first mechanical arms are arranged at the front part of the auxiliary light source and on the outer side of the conveyor belt;
and 10, a plurality of groups of second mechanical arms are arranged at the rear part of the fuel injection cavity and outside the conveying belt, and the mechanical arms can be arranged at the front part of the vacuum control cavity II and can also be arranged in the vacuum control cavity II.
The working principle of the scheme is as follows:
the cleaning unit comprises a fragment cleaning cavity, a conveyor belt is conveyed into the fragment cleaning cavity through a vacuum control cavity I after being conveyed out of the reflection cup, a circular loop is arranged on the conveyor belt inside the fragment cleaning cavity, the conveyor belt is enabled to operate in an inverted mode in the top area of the circular loop, a plurality of groups of steam nozzles are arranged below the top of the circular loop, a tray is arranged below the steam nozzles, a steam generating device is connected with the steam nozzles through a pipeline, and the conveyor belt returns to operate in an upright mode before being conveyed out of the fragment cleaning cavity;
the fuel injection unit comprises a fuel injection cavity, a fuel injector is arranged in the fuel injection cavity, the fuel injector is obtained by modifying a proper ion injector, the fuel injection unit comprises a plurality of groups of scanning systems and high-pressure nozzles which are arranged at the upper part of a conveyor, a vacuum control system, a liquid storage tank and the like are also arranged in the fuel injection cavity, and the nozzles are communicated with the liquid storage tank through pipelines and correspond to laser crystals with coatings on a conveyor belt; a first mechanical arm is arranged at the front part of the fuel injection cavity and at the right side of the conveyor belt, and an auxiliary light source is arranged at the lower part of the conveyor belt; and a second mechanical arm is arranged at the rear part of the fuel injection cavity and at the right side of the conveyor belt.
The color recognition system is an emerging detection technology, which is proposed after the appearance of an automatic control system, and determines the color of an object by recognizing the RGB value of the surface of the object to be recognized.
The conveyor belt is made of quartz or glass or steel, the belt width of the conveyor belt is 25 cm, the thickness of the conveyor belt is 5 cm, the average conveying speed during conveying is 80 cm/s, 1 second of the conveyor belt stops every 1 second of the conveyor belt, through holes in the conveyor belt are circles with the radius of 10 cm, the distance between the through holes is 20 cm, the thickness of a left semicircle of the through holes (the center direction of the annular conveyor belt is the left side, and the outer side of the conveyor belt is the right side) is 4.5 cm, 1 cm wide annular frames are arranged and are 0.5 cm lower than the top of the conveyor belt respectively, the width of each annular frame is consistent with the thickness of a high-pressure nozzle pipe arm on a fuel injector, the thickness of a right semicircle of the through holes is 4 cm, grooves with the length of 20 cm and the depth of 1 cm are arranged on the right sides of the through holes, the bottoms of the grooves are level with the right semicircle of the through holes and are connected with the two ends of the right semicircle of the through holes to serve as conveying ports of photosensitive retaining pieces, and the right semicircle of the through holes and the grooves are 1 cm lower than the top of the conveyor belt, the conveyer belt is coated with 40 layers of silicon material and molybdenum material alternately and repeatedly, so that the conveyer belt has the capability of reflecting extreme ultraviolet light.
The material of the reflecting cup is quartz or glass or steel, the wall thickness of the tube is 1 cm, the inner diameter of the upper circle is 38 cm, the inner diameter of the lower circle is 28 cm, the height of the cup is 50 cm, and the silicon material and the molybdenum material are repeatedly coated alternately for 40 layers, so that the reflecting cup has the capability of reflecting extreme ultraviolet light.
The laser crystal is a circle with the radius of 10 cm and the thickness of 1 cm, the upper part of the laser crystal is provided with a coating layer made of silicon materials and molybdenum materials, the thickness of the coating layer is 30 microns, the color of the coating layer is gray, rectangular areas with the length and the width of 10 cm and 4 cm are respectively arranged at the positions 1 cm away from the center of the circle, and micron holes with the diameter of 20 microns, the height of 30 microns and orderly arrangement are arranged in the rectangular areas.
The fuel is prepared by injecting liquid fuel into the micropores through a high-pressure nozzle, solidifying and packaging, such as tin, and the color of the fuel is silvery white.
The laser crystal is arranged on the conveyor belt in a thread matching mode.
The vacuum control chamber, the fragment cleaning chamber and the fuel injection chamber are all compartments made of high-temperature-resistant materials, only a conveying belt conveying inlet and a conveying belt conveying outlet are reserved, and a door is arranged.
The vacuum control cavity is provided with a vacuum pump for pumping gas in the cavity, and is provided with a gas pressure monitoring device, and the gas pressure is controlled to be 0-5 Pa during working.
The steam nozzle is made of high-temperature-resistant materials, such as steel, the temperature is controlled to be 250-300 ℃ during working, and the internal pressure of the nozzle is controlled to be 2 atmospheric pressures.
The liquid storage tank is a fuel liquid storage tank, and the fuel liquid is liquid metal tin.
The high-pressure nozzle is a circular spray head with the pipe wall thickness of 1 cm and the inner radius of 10 cm, the circular spray head is arranged at a position 2 cm above a conveyor belt and can correspond to laser crystals on the conveyor belt, two small spray heads with the inner diameter of 10 cm 4 cm 20 microns are arranged in the bottom of the circular spray head, the relative positions of the small spray heads correspond to two rectangular areas on a laser crystal coating, a pre-pumping cavity is arranged at the upper part of each small spray head, a movable baffle is arranged at the upper part of the relative position of the small spray head at the bottom of the pre-pumping cavity and is 0.5 cm thick, a baffle moving cavity is arranged on one side of the baffle, the baffle can be moved in or out of the baffle moving cavity under the control of electric power, and an air inlet guide pipe is arranged on the baffle.
The vacuum control system adopts a vacuum pump to pump out gas in the fuel injection cavity, is provided with a gas pressure monitoring device, controls the gas pressure to be 0-10 Pa during working, and pumps fuel liquid into the pre-pumping cavity by the other group of vacuum pumps.
The scanning system is used for scanning the specific position of the laser crystal and assisting the high-pressure nozzle to be combined with the laser crystal.
The auxiliary light source emits light beams, and the photosensitive blocking piece is broken down through the micron hole above the laser crystal.
The photosensitive barrier sheet has an upper part and a lower part which are not blocked, is a circle with the radius of 10 cm and the thickness of 0.5 cm, is unstable to light and can generate chemical reaction when meeting light to generate substances with lower boiling points, for example, the substances with lower boiling points (such as ethanol, acetic acid, phenol and the like) are taken as monomers and combined with each other through chemical bonds to form a polymer, and the polymer is rapidly decomposed into the monomers under the irradiation of strong light or a light source with a specific wavelength and is gasified into gas at high temperature.
The EUV radiation source generating device should be operated at a temperature above the melting point of the fuel, for example, above 232 ℃ if tin is chosen. The transmission belt transmits two laser crystals carrying fuel droplets into two cup-shaped tube barrels of the reflection cup every second, the transmission is stopped for 1 second, four groups of laser emitting devices of the CO2 laser selectively hit the fuel droplets (the color is silver white) in a designated area (the color is gray) within 1 second of the stop to release ultraviolet light, the extreme ultraviolet light can be directly transmitted out of the reflection cup or reflected out of the reflection cup through the transmission belt and the inner wall of the reflection cup to form two divergent light beams, and finally transmitted to the objective lens through a light beam correction system and other devices, two wafers are etched at the same time, and the fuel droplets which are not excited by laser are continuously transmitted to the central area in the two tube barrels of the reflection cup through the continuous rotation of the transmission belt, so that the effect of continuously exciting the extreme ultraviolet light is realized; the vacuum control cavity pumps the gas in the cavity to be dry, so that the reflecting cup is ensured to be in a vacuum state; the debris cleaning chamber and the fuel injection chamber ensure that the EUV radiation source generating device can generate the EUV radiation source in a full-automatic continuous manner through cleaning of the laser crystal and fuel droplet injection. Meanwhile, in order to prevent the coating on the top of the laser crystal from being polluted by tin and prevent fuel droplets from splashing out of the micron holes during transmission, the blocking piece is arranged on the top of the laser crystal before fuel injection through the mechanical arm, and the blocking piece is moved away through the mechanical arm after the fuel injection, so that the top of the laser crystal is prevented from being polluted by tin and the fuel droplets are prevented from splashing out, and the stability of light beams is ensured.

Claims (10)

1. An EUV radiation source generating device for a lithographic apparatus, comprising a conveyor belt; the method is characterized in that: the device also comprises an EUV radiation source generating unit, a cleaning unit, a fuel injection unit and a vacuum control unit;
the EUV radiation source generating unit comprises a reflecting cup sleeved on the conveying belt and a laser arranged below the reflecting cup; the lower part of the reflecting cup is provided with an arc-shaped seal, and a laser emitting hole matched with a laser is arranged on the seal; the belt body of the conveyor belt is provided with a light through hole, a laser crystal is arranged in the light through hole, the upper part of the laser crystal is provided with a coating, the coating is provided with a plurality of micron holes, and fuels capable of generating extreme ultraviolet light are arranged in the micron holes; the laser is provided with a probe capable of identifying colors;
the cleaning unit comprises a fragment cleaning cavity sleeved on the conveyor belt, and the conveyor belt in the fragment cleaning cavity is provided with a loop; a steam spray head is arranged in the cleaning cavity and corresponds to the laser crystal at the top of the circular ring;
the fuel injection unit comprises a fuel injection cavity, and a high-pressure nozzle is arranged in the fuel injection cavity, communicated with the fuel liquid storage tank and corresponding to the micro-hole; the front part of the fuel injection cavity is provided with a first mechanical arm and an auxiliary light source, the first mechanical arm is used for moving the photosensitive barrier sheet on the laser crystal, and the auxiliary light source is used for emitting a light beam to the laser crystal to puncture the photosensitive barrier sheet; and a second mechanical arm is arranged at the rear part of the fuel injection cavity and is used for removing the photosensitive blocking sheet.
2. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the interior of the light reflecting cup is coated with a reflecting coating.
3. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the fuel is metallic tin.
4. An EUV radiation source generating device for a lithographic apparatus according to claim 2, wherein: the reflective coating is formed by alternately forming silicon materials and molybdenum materials.
5. An EUV radiation source generating device for a lithographic apparatus according to claim 4, wherein: the coating is 40 layers.
6. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the thickness of the cup body of the reflective cup is 1 cm, the inner diameter of the upper part of the cup body is 38 cm, the lower part of the cup body is 28 cm, and the height of the cup body is 50 cm.
7. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the aperture of the light through hole is 20 cm.
8. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the thickness of the coating on the laser crystal is 30 micrometers, the micropores on the coating are distributed in two rectangular areas, the size of each rectangular area is 10 centimeters by 4 centimeters, and the pore diameter of each micropore is 20 micrometers.
9. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the high-pressure nozzle is circular, the thickness of the pipe wall is 1 cm, the inner diameter is 20 cm, the high-pressure nozzle can be tightly matched with the top of a laser crystal, two small spray heads with the inner diameter of 10 cm 4 cm 20 microns are arranged in the bottom of the high-pressure nozzle, a pre-pumping cavity is arranged on the upper portion of each small spray head, a movable baffle is arranged on the upper portion of the relative position of the small spray heads at the bottom of the pre-pumping cavity, the thickness of the movable baffle is 0.5 cm, a baffle moving cavity is arranged on one side of the baffle, the baffle can be moved into or out of the baffle moving cavity under the control of electric power, and an air inlet guide pipe is arranged on the baffle.
10. An EUV radiation source generating device for a lithographic apparatus according to claim 1, wherein: the conveying belt is made of quartz, glass or steel and is provided with a reflecting coating.
CN202210069647.4A 2022-01-21 2022-01-21 EUV radiation source generating device for photoetching machine Pending CN114397799A (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060151717A1 (en) * 2005-01-10 2006-07-13 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles o
US20100025231A1 (en) * 2007-04-27 2010-02-04 Komatsu Ltd. Method for cleaning optical element of EUV light source device and optical element cleaning device
CN105573062A (en) * 2014-10-17 2016-05-11 中芯国际集成电路制造(上海)有限公司 Euv light source and exposure device
CN110967936A (en) * 2018-09-28 2020-04-07 台湾积体电路制造股份有限公司 Metal recycling system for extreme ultraviolet radiation source device
US20200163197A1 (en) * 2018-08-14 2020-05-21 Isteq B.V. High brightness laser-produced plasma light source
CN216696984U (en) * 2022-01-21 2022-06-07 张玥 EUV radiation source generating device for photoetching machine

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060151717A1 (en) * 2005-01-10 2006-07-13 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles o
US20100025231A1 (en) * 2007-04-27 2010-02-04 Komatsu Ltd. Method for cleaning optical element of EUV light source device and optical element cleaning device
CN105573062A (en) * 2014-10-17 2016-05-11 中芯国际集成电路制造(上海)有限公司 Euv light source and exposure device
US20200163197A1 (en) * 2018-08-14 2020-05-21 Isteq B.V. High brightness laser-produced plasma light source
CN110967936A (en) * 2018-09-28 2020-04-07 台湾积体电路制造股份有限公司 Metal recycling system for extreme ultraviolet radiation source device
CN216696984U (en) * 2022-01-21 2022-06-07 张玥 EUV radiation source generating device for photoetching machine

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