CN114381709A - Coating, use and preparation method - Google Patents

Coating, use and preparation method Download PDF

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Publication number
CN114381709A
CN114381709A CN202011134111.3A CN202011134111A CN114381709A CN 114381709 A CN114381709 A CN 114381709A CN 202011134111 A CN202011134111 A CN 202011134111A CN 114381709 A CN114381709 A CN 114381709A
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coating
carbon
catalyst
intermediate layer
substrate
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Chinese (zh)
Inventor
郭靖
孙红胜
杨海生
王加朋
杨旺林
张玉国
张鑫
吴柯萱
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Beijing Zhenxing Metrology and Test Institute
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Beijing Zhenxing Metrology and Test Institute
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Priority to CN202011134111.3A priority Critical patent/CN114381709A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention provides a coating, application and a preparation method thereof. The special catalyst intermediate layer is prepared, and the carbon nano structure prepared by plasma enhanced chemical vapor deposition is introduced into the black body coating, so that the coating has high light absorption performance and high emissivity, has good bonding force with a substrate material, and improves stability and durability.

Description

Coating, use and preparation method
Technical Field
The invention relates to a coating, application and a preparation method, and belongs to the technical field of black body coating preparation.
Background
The blackbody is an ideal physical model based on Planck's law, is an ideal diffuse reflector, and has wide application in scientific research, aerospace, industrial production and other aspects. As a broadband infrared radiation source, the wavelength range of a high-stability medium-temperature surface source black body covers a wave band from near infrared to far infrared, is the basis of radiation theory analysis and radiation measurement, and is more and more widely applied in the aspects of absolute calibration of an infrared optical system and test equipment, measurement of object radiation characteristics, calibration of an infrared detector, test of infrared target simulation and overall performance evaluation. The surface source black body as an infrared target source can be applied to detection, identification and positioning of an infrared system; can be used as a radiation source background for interfering the detection of an infrared system; and can also be used as a calibration radiation source for radiation calibration of a black body. These applications have high requirements on the temperature stability and radiation accuracy of the radiation surface.
The blackbody coating is one of the core components of a surface source blackbody, and the parameters directly determine the performance of the surface source blackbody. At present, a coating used by a common black body is a special paint with high emissivity, and can be deposited by a brush coating or spray coating method, such as adding carbon to a polymer or adding metal oxide to silicon resin, but the emissivity at normal temperature or high temperature is low, the components of the coating are generally polymers (such as silicon rubber, polyurethane, epoxy resin, silicon resin and the like) and fillers (such as carbon, metal oxide and the like), however, the emissivity of the high-emissivity coatings is generally 0.92-0.95, and the high-emissivity coatings still cannot meet the requirements of a new generation of high-performance radiation sources; in addition, these blackbody coatings still suffer from low stability and poor durability due to poor adhesion of some polymers to the metal substrate and the tendency of polymers to age crack.
The carbon nano structure prepared by the plasma enhanced chemical vapor deposition has very high light absorption rate and infrared emissivity, however, the existing carbon nano coating prepared based on the plasma enhanced chemical vapor deposition has higher substrate selectivity, and can only be prepared on specific substrates such as metal or silicon wafers, and the in-plane uniformity can be reduced along with the increase of the substrate size. Meanwhile, the carbon material and the substrate material have weak binding force, the coating has low mechanical strength and poor stability and durability, so the coating is rarely applied to the preparation of the surface source black body radiation layer.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a coating with high light absorption performance, high emissivity, high stability and good durability, an application and a preparation method thereof.
The technical solution of the invention is as follows: the coating comprises a catalyst middle layer and a carbon-based coating, wherein the catalyst middle layer is of an island-shaped structure, and the carbon-based coating is deposited on the catalyst middle layer of the island-shaped structure through a plasma enhanced chemical vapor deposition process.
The utility model provides a blackbody, includes the blackbody basement and attaches the blackbody coating on the blackbody basement, the blackbody coating include catalyst intermediate level and carbon base coating, the catalyst intermediate level be island structure, the carbon base coating passes through the deposition of plasma enhanced chemical vapor deposition technology on the catalyst intermediate level of island structure.
A coating preparation method is realized by the following steps:
pre-treating a substrate;
preparing a catalyst intermediate layer, namely preparing a catalyst intermediate layer,
preparing an island-shaped structure formed by a transition metal catalyst on a substrate;
the deposition of the carbon-based coating,
and depositing the carbon-based coating on the catalyst intermediate layer with the island-shaped structure.
The application of a composite coating consisting of a catalyst intermediate layer and a carbon-based coating on the catalyst intermediate layer in a black body coating.
Compared with the prior art, the invention has the beneficial effects that:
(1) the special catalyst intermediate layer is prepared, and the carbon nano structure prepared by plasma enhanced chemical vapor deposition is introduced into the black body coating, so that the coating has high light absorption performance and high emissivity, has good bonding force with a substrate material, and improves stability and durability;
(2) by preparing the island-shaped catalyst intermediate layer, the subsequently deposited carbon-based coating has a loose nano-sheet structure and higher roughness, the emissivity of the coating is improved, and the requirements of a new generation of high-performance radiation source are met;
(3) the invention can prepare the carbon-based coating with high surface roughness, and the emissivity is not lower than 0.98 at normal temperature and 200 ℃;
(4) the invention adopts mature plasma enhanced chemical vapor deposition and other processes, can be used for preparing large-area coatings (maximum 1m multiplied by 1m), and the prepared black body coatings have the advantages of high uniformity, good stability and the like;
(5) the invention adopts the catalyst intermediate layer, so that the plasma enhanced chemical vapor deposition can be suitable for high-thermal-conductivity substrates such as metal, graphite and the like, the applicability on various substrates is realized, and the preparation method can be used for preparing a new generation of high-performance radiation source;
(6) the black body of the black body coating prepared by the method has higher comprehensive performance due to higher emissivity and heat conduction performance of the carbon-based coating, and is a necessary condition for preparing a high-performance radiation source.
Drawings
FIG. 1 is a flow chart of the preparation of the present invention;
FIG. 2 is a scanning electron microscope photomicrograph of a carbon-based black body coating deposited on a copper substrate according to example 1 of the present invention;
FIG. 3 is a scanning electron microscope photomicrograph of a carbon-based blackbody coating deposited on an aluminum substrate according to example 2 of the present invention.
Detailed Description
The present invention will be described in detail with reference to the following examples and accompanying drawings.
The invention provides a coating, which comprises a catalyst intermediate layer and a carbon-based coating on the catalyst intermediate layer, wherein the catalyst intermediate layer is of an island-shaped structure, and the carbon-based coating is deposited on the catalyst intermediate layer of the island-shaped structure through a plasma enhanced chemical vapor deposition process.
The intermediate layer of the catalyst is a transition metal coating and is prepared by deposition on a substrate by methods such as electroplating, magnetron sputtering or electron beam deposition.
The catalyst of the invention adopts a transition metal catalyst which has stronger interaction with carbon materials, including but not limited to nickel, cobalt, iron, manganese and other materials, and the preferred catalyst is metallic nickel. The deposition of the catalyst has a very important influence on the deposition of the black body coating, and the type, thickness and morphology of the catalyst play a decisive role in the microstructure and heat radiation performance of the black body coating. In the invention, the thickness of the catalyst intermediate layer is preferably 5 nm to 20 nm, preferably not more than 10 nm, and the carbon-based coating deposited on the catalyst intermediate layer can form a loose nano-sheet structure. If the thickness of the catalyst intermediate layer is too thick, the deposited carbon nano structure is very compact, and the emissivity is low; and if the thickness of the catalyst intermediate layer is too small, a continuous carbon-based coating cannot be obtained.
The deposition amount of the catalyst layer is 0.01-1 mg/cm2By controlling the deposition amount of the catalyst layer, the growth of the catalyst layer is controlled at the nucleation stage, and an island-like structure can be formed. The island-shaped structures can enable the carbon material to form a loose nanosheet structure in the growing process, and the rough structure can increase the emissivity of the coating. If the deposition amount of the catalyst is too high, the catalyst particles are aggregated, the growth of the carbon material on the substrate is not selective, and the obtained carbon nano structure is relatively more compact and has lower emissivity.
According to the invention, by preparing the catalyst intermediate layer, under the condition that the catalysts exist, a carbon precursor such as common methane, ethylene, acetylene and the like is decomposed into carbon under the action of the catalyst, and the carbon precursor grows along a specific crystal face of the carbon to form a sheet-shaped structure, so that the nanosheet layered carbon-based coating with high roughness is finally obtained.
The carbon-based coating of the present invention uses a plasma enhanced chemical vapor deposition method to perform vapor deposition of a carbon material on a substrate supporting a catalyst interlayer.
In the plasma enhanced chemical vapor deposition process, the flow speed of reaction gas is 0.1-5L/h, preferably 0.1-2L/h; under the process control that the flow rate of reaction gas is 0.1-5L/h, the carbon-based coating obtained by deposition has a carbon nano-sheet structure, the thickness of the sheet layer is 10-50 nm, and the carbon-based coating is easy to form high roughness. When the thickness of the sheet layer is within the nanometer size range of 10-50 nm, electrons excited by light to vibrate can be damped more due to the quantum size effect, so that the light absorption effect is stronger, and the emissivity is higher according to kirchhoff's law.
If the flow rate is too high and exceeds 5L/h, the obtained carbon-based coating has a very compact structure and low emissivity and does not have practical value; when the flow rate is less than 0.1L/h, the deposition rate is very slow and the production efficiency is too low.
The thickness of the carbon-based coating is preferably 500 nm-20 microns, if the thickness of the coating is too low, the total absorption of incident light cannot be realized, the reflectivity of the substrate is increased due to reflection of the substrate, and the emissivity is reduced; if the coating thickness is too high, the carbon nanostructure support is weak and the coating stability is reduced.
Other plasma enhanced chemical vapor deposition processes of the present invention are well known in the art, and those skilled in the art can adjust the process according to the flow rate of the reaction gas and the thickness of the carbon-based coating, in combination with the actual requirements.
The following plasma enhanced chemical vapor deposition conditions are preferred in the present invention:
a. carrier gas: selecting hydrogen or argon, and adding 1-20% nitrogen into carrier gas as nitrogen doping source;
b. reaction gas: carbon precursors (methane, ethylene, acetylene, etc.)
c. Gas purity: the purity of the carrier gas and the reaction gas is adjustable between 3N and 5N;
d. flow rate of reaction gas: 0.1-5L/h;
e. flow rate of carrier gas: 5-10L/h;
f. total reaction chamber pressure: 1X 10-5Torr～500×10-5Torr；
g. Substrate temperature: 400-800 ℃;
h. plasma power: 10W-100W;
i. the deposition time is 10min to 50 min;
preferably, in the plasma enhanced chemical vapor deposition, firstly, the substrate is vacuumized to the magnitude range of 10 to 50Torr, argon or hydrogen is used for washing, after the substrate is heated to a specified temperature, reaction gas/carrier gas is introduced, and a plasma device is started for chemical vapor deposition.
Furthermore, the composite coating consisting of the catalyst intermediate layer and the carbon-based coating on the catalyst intermediate layer is applied to the black body coating.
Further, the present invention provides a coating preparation method, as shown in fig. 1, comprising substrate pretreatment, catalyst interlayer deposition and carbon-based coating deposition.
Substrate pretreatment:
the pretreatment of the substrate refers to removing impurities on the surface of the substrate material by using a chemical (including but not limited to acid washing, alkali washing, water or organic solvent washing), physical (including but not limited to sand blasting, grinding, ultrasound) or a combination of the two methods, so as to improve the bonding force between the substrate and a subsequent deposition coating.
The choice of the manner of pretreatment of the substrate is well known in the art and will be determined by the skilled person in particular in the light of the circumstances.
Preferably sandblasting or sanding followed by cleaning with an organic solvent, this combined treatment method favours the formation of a rough surface capable of increasing the emissivity of the final coating obtained.
Preparing a catalyst intermediate layer:
the catalyst intermediate layer adopts a transition metal catalyst, the thickness of the catalyst intermediate layer is 5 to 20 nanometers, and the catalyst intermediate layer is of an island-shaped structure.
In the step, a catalyst intermediate layer is prepared on a substrate by adopting a known electroplating method, a magnetron sputtering method, an electron beam deposition method or the like, and a person skilled in the art adjusts the prior art according to the requirements for obtaining the catalyst intermediate layer to obtain proper process parameters.
Deposition of carbon-based coating:
the carbon-based coating is deposited on the catalyst intermediate layer by using a plasma enhanced chemical vapor deposition method, the flow rate of reaction gas is 0.1-5L/h, and the thickness of the carbon-based coating is preferably 500 nm-20 mu m.
Further, the invention provides a black body, comprising a black body substrate and a black body coating.
The substrate includes a metal substrate (including but not limited to brass, copper, aluminum, stainless steel), or a pressed graphite substrate, among others. The substrate preferably has high heat conductivity (the heat conductivity is more than 20W/(m.K)), so that the temperature rise and the temperature drop of the black body coating are conveniently controlled, and the high uniform heat performance of the substrate can ensure that the in-plane temperature has high uniformity.
Example 1
Using red copper with the area of 20cm multiplied by 20cm and the purity of 99.8 percent as a substrate, after sand blasting and polishing, using acetone to scrub, ultrasonically process and wash the surface, and then depositing a layer with the thickness of 10 nanometers on the copper substrate by an electron beam deposition method, wherein the deposition amount is 0.05mg/cm2The metallic nickel having an island-like structure of (2) serves as a catalyst intermediate layer.
Placing the copper substrate in a plasma enhanced chemical vapor deposition device, and vacuumizing to 1 × 10-5Torr was used, argon gas was used for purging three times, the substrate was heated to 800 ℃ and a mixed gas of methane/argon gas/nitrogen gas was introduced (the flow rates of the three were 0.5, 9.0 and 1.0L/h, respectively). Adjusting the output power of the plasma generator to 50W, and depositing for 30min to obtain the carbon-based coating.
The morphology of the coating is shown in figure 2, the structure is a carbon nano lamellar structure which is randomly arranged, the thickness of the lamellar is 20 nanometers, and the height is 5 micrometers. The emissivity is 0.991 at normal temperature and 0.995 at 200 ℃ due to the loose structure and high surface roughness.
Examples 2 and 3
Other conditions and preparation process are the same as those of example 1, when the thickness of the catalyst intermediate layer is respectively 5 nm and 8 nm, the deposition amount is respectively 0.02-0.04 mg/cm2The coating morphology and emissivity were similar to those of example 1.
Example 4
Other conditions and preparation process were the same as in example 1, when the thickness of the catalyst intermediate layer was 20 nm, the deposition amount was 0.7mg/cm2Between the resulting catalyst island structuresThe space is small, after plasma enhanced chemical vapor deposition, the carbon nano sheet structure in the obtained carbon coating structure is compact compared with that in the embodiment 1-3, the thickness of the sheet layer is 50 nanometers, the thickness of the carbon coating layer is 10 micrometers, the emissivity is 0.985 at normal temperature, and the emissivity is 0.989 at 200 ℃.
Example 5
An aluminum plate with an area of 50cm × 50cm is used as a substrate, the aluminum plate is polished by sand paper, the surface of the aluminum plate is scrubbed by acetone, and after the aluminum plate is rapidly dried, a layer of 10-nanometer-thick deposit with the deposition amount of 0.05mg/cm is deposited on the aluminum substrate by a chemical plating method2The metallic nickel having an island-like structure of (2) serves as a catalyst intermediate layer.
Placing the aluminum substrate in a plasma enhanced chemical vapor deposition device, and vacuumizing to 1 × 10-5Torr was used, and the substrate was purged with hydrogen three times, and the temperature of the substrate was raised to 400 ℃ and a mixed gas of methane and hydrogen was introduced (the flow rates of both were 1.0 and 10L/h, respectively). Adjusting the output power of the plasma generator to be 100W, and depositing for 20min to obtain the carbon-based coating.
The morphology of the coating is shown in figure 3, the structure is a carbon nano lamellar structure which is randomly arranged, the thickness of the lamellar is 50 nanometers, and the height is 3 micrometers. The emissivity is 0.982 at normal temperature and 0.987 at 200 ℃ because the structure is very loose and the surface roughness is high.
Examples 6 and 7
And introducing a methane/hydrogen mixed gas, wherein the flow rates of the methane/hydrogen mixed gas and the methane/hydrogen mixed gas are respectively (5.0 and 10L/h) and (0.1 and 10L/h), and other conditions and processes are the same as those of the example 6, so that the morphology and the emissivity of the obtained coating are similar to those of the example 5.
The invention has not been described in detail and is in part known to those of skill in the art.

Claims (12)

1. A coating, characterized by: the catalyst comprises a catalyst middle layer and a carbon-based coating, wherein the catalyst middle layer is of an island-shaped structure, and the carbon-based coating is deposited on the catalyst middle layer of the island-shaped structure through a plasma enhanced chemical vapor deposition process.
2. A coating according to claim 1, wherein: the catalyst intermediate layer is a transition metal catalyst and has a thickness of 5-20 nm.
3. A coating according to claim 1, wherein: the deposition amount of the catalyst intermediate layer is 0.01-1 mg/cm2。
4. A coating according to claim 2, wherein: the thickness of the catalyst intermediate layer is not more than 10 nanometers.
5. A coating according to claim 1, wherein: the carbon-based coating has a carbon nano-sheet layer structure, and the thickness of the sheet layer is 10-50 nm.
6. A blackbody comprising a blackbody substrate and a blackbody coating attached to the blackbody substrate, wherein the blackbody coating is any one of the coatings of claims 1-5.
7. A coating preparation method is characterized by comprising the following steps:
pre-treating a substrate;
preparing a catalyst intermediate layer, namely preparing a catalyst intermediate layer,
preparing an island-shaped structure formed by a transition metal catalyst on a substrate;
the preparation of the carbon-based coating,
and depositing the carbon-based coating on the catalyst intermediate layer with the island-shaped structure.
8. A method of preparing a coating according to claim 7, wherein: in the preparation step of the catalyst intermediate layer, the thickness of the catalyst intermediate layer is 5 to 20 nanometers, and the deposition amount is 0.01 to 1mg/cm2。
9. A method of preparing a coating according to claim 8, wherein: in the preparation step of the catalyst intermediate layer, the thickness of the catalyst intermediate layer is not more than 10 nanometers.
10. A method of preparing a coating according to claim 7, wherein: in the carbon-based coating deposition step, the carbon-based coating has a carbon nano sheet layer structure, and the thickness of the sheet layer is 10-50 nm.
11. A method of preparing a coating according to claim 10, wherein: in the carbon-based coating deposition step, a plasma enhanced chemical vapor deposition process is adopted, and the flow speed of reaction gas is 0.1-5L/h.
12. Use of a coating according to any one of claims 1 to 5 in a blackbody coating.
CN202011134111.3A 2020-10-21 2020-10-21 Coating, use and preparation method Pending CN114381709A (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11199378A (en) * 1998-01-06 1999-07-27 Kobe Steel Ltd Formation of diamond membrane
CN1919727A (en) * 2005-08-26 2007-02-28 鸿富锦精密工业（深圳）有限公司 Preparing method for carbon nano-tube
US20080280067A1 (en) * 2007-05-10 2008-11-13 Feng Chia University Method of forming a carbon film on a metal substrate at a low temperature
JP2012176856A (en) * 2011-02-25 2012-09-13 Tokyo Electron Ltd Carbon nanotube forming method, pre-treatment method therefor, electron emitter, and lighting apparatus
US20170120220A1 (en) * 2014-06-12 2017-05-04 National Institute Of Advanced Industrial Science And Technology Optical member and method for producing same
CN111455339A (en) * 2020-05-22 2020-07-28 厦门市计量检定测试院 Preparation method of vertical carbon nanotube array for high-absorption-ratio material

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11199378A (en) * 1998-01-06 1999-07-27 Kobe Steel Ltd Formation of diamond membrane
CN1919727A (en) * 2005-08-26 2007-02-28 鸿富锦精密工业（深圳）有限公司 Preparing method for carbon nano-tube
US20080280067A1 (en) * 2007-05-10 2008-11-13 Feng Chia University Method of forming a carbon film on a metal substrate at a low temperature
JP2012176856A (en) * 2011-02-25 2012-09-13 Tokyo Electron Ltd Carbon nanotube forming method, pre-treatment method therefor, electron emitter, and lighting apparatus
US20170120220A1 (en) * 2014-06-12 2017-05-04 National Institute Of Advanced Industrial Science And Technology Optical member and method for producing same
CN111455339A (en) * 2020-05-22 2020-07-28 厦门市计量检定测试院 Preparation method of vertical carbon nanotube array for high-absorption-ratio material

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