CN114318861A - Method for preparing structural yarn dyed fabric based on magnetron sputtering method - Google Patents
Method for preparing structural yarn dyed fabric based on magnetron sputtering method Download PDFInfo
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- CN114318861A CN114318861A CN202011077391.9A CN202011077391A CN114318861A CN 114318861 A CN114318861 A CN 114318861A CN 202011077391 A CN202011077391 A CN 202011077391A CN 114318861 A CN114318861 A CN 114318861A
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- 239000004744 fabric Substances 0.000 title claims abstract description 95
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 38
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000007747 plating Methods 0.000 claims abstract description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 60
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 54
- 229910052786 argon Inorganic materials 0.000 claims description 30
- 239000007789 gas Substances 0.000 claims description 28
- 239000004408 titanium dioxide Substances 0.000 claims description 27
- 238000004544 sputter deposition Methods 0.000 claims description 25
- 238000004140 cleaning Methods 0.000 claims description 18
- 238000001035 drying Methods 0.000 claims description 15
- 239000013077 target material Substances 0.000 claims description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 238000001020 plasma etching Methods 0.000 claims description 8
- 239000012153 distilled water Substances 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 238000002791 soaking Methods 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000005546 reactive sputtering Methods 0.000 claims description 3
- 238000005477 sputtering target Methods 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 6
- 239000003086 colorant Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 2
- 238000004043 dyeing Methods 0.000 description 14
- 230000008901 benefit Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000975 dye Substances 0.000 description 3
- 238000007730 finishing process Methods 0.000 description 3
- 241000282414 Homo sapiens Species 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000004753 textile Substances 0.000 description 2
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229940024548 aluminum oxide Drugs 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000001054 cortical effect Effects 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 210000003041 ligament Anatomy 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Substances [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Chemical Or Physical Treatment Of Fibers (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a method for preparing a structural yarn-dyed fabric based on a magnetron sputtering method. The method comprises the steps of pretreating the fabric, plating a nano metal film on the surface of the fabric, and plating a nano titanium dioxide film on the fabric. Through the selection of different metal layers on the surface of the fabric, structural colors with different colors can be formed on the surface of the fabric, and meanwhile, the electrical and magnetic functions of the fabric can be realized through the process. The technical method reduces the use of the traditional chemical dye, avoids the disadvantage of the traditional fabric fastness loss, and has a certain application prospect.
Description
Technical Field
The invention relates to a fabric preparation method, and particularly discloses a structure yarn dyed fabric preparation method based on a magnetron sputtering method.
Background
At present, various colors of textiles are mainly realized by attaching dyes on fibers or fabrics through a dyeing and printing process. In the traditional dyeing and finishing process, a large amount of dyeing materials and auxiliaries which affect the environment and hinder the health of human bodies are used, the dyeing materials and the auxiliaries are discharged in the forms of gas, liquid and solid to pollute the environment and harm the health of human beings, and meanwhile, a large amount of energy and water are consumed in the dyeing and finishing process. Along with the enhancement of environmental awareness of people, the pollution of the traditional dyeing and finishing process to water resources and environment is more and more concerned by people. Therefore, energy conservation and emission reduction, green dyeing and finishing, ecological dyeing and finishing and the like are one of the hot spots concerned in the industry by providing an effort direction and a final target for the dyeing and finishing technology after people fully know the importance of environmental protection energy sources and developing an ecological dyeing process and a new dyeing method.
The biological structural color is originally discovered in the 17 th century, and the structural color existing in nature is a color effect generated by the interference, transmission, diffraction, scattering and other actions of incident visible light at a fine microstructure such as a ligament layer, a cortical layer, a ridge and the like on a biological surface. The structural color is nontoxic and environment-friendly, and needs less energy, so that the method is expected to become a novel waterless dyeing technology to solve the problem of environmental pollution of the current printing and dyeing industry and produce colorful colors which cannot be realized by dyeing.
The magnetron sputtering coating has the advantages of high target deposition rate, good film forming quality, suitability for large-area production and the like, is widely applied to the coating industry, such as mobile phone screens, high-grade door handles, automobile ultraviolet-proof films, faucet outer layer metal films and the like, and has important significance for reducing pollution and protecting the environment by applying the magnetron sputtering method to the textile field.
Disclosure of Invention
The invention aims to overcome the problems in the prior art and provides a method for preparing a structural yarn dyed fabric based on a magnetron sputtering method, which can form structural color on the surface of the fabric, is easy for industrial production and reduces the pollution of the dye industry to the environment.
The invention is realized by the following steps: a method for preparing a structural yarn-dyed fabric based on a magnetron sputtering method comprises the following steps:
(1) pretreatment of the fabric:
immersing the fabric into an acetone solution with the mass concentration of 90-99% for soaking, and then carrying out low-pressure vacuum plasma etching; wherein the low pressure vacuum or the likeThe parameters of the plasma etching are as follows: the temperature is 40-100 ℃, and the pressure is 8 x 10-4-0.5*10-3Pa, power supply power of 40-350W, time of 10-30min, and working gas of argon;
(2) plating a nano metal film on the surface of the fabric:
putting the pretreated fabric into a magnetron sputtering device for nano metal coating; the distance between the fabric and the metal target is 80-100mm, the working gas is argon, the purity is 95-99.9%, and the vacuum degree is 1 x 10-4-2*10-3Pa, the gas flow rate is 5-10sccm, the fabric rotating speed is 8-12r/min, the magnetron sputtering power is 120-280W, and the magnetron sputtering time is 10-20 min; the metal target is one of metal copper, silver or aluminum;
(3) plating nano titanium dioxide film on fabric
Plating a nano titanium dioxide film on the surface of the fabric plated with the nano metal film again by adopting radio frequency reactive sputtering;
the sputtering target material is a metal titanium target, and the sputtering parameters are as follows: the distance between the fabric and the target material is 80-100mm, and the vacuum degree is 2 x 10-4-2*10-3Pa; the purity of the argon is 95-99.9 percent, and the flow rate of the argon is 10ml/min-50 ml/min; oxygen as a reaction gas, and the ratio of the oxygen to the argon flow velocity is 1: 3-1: 5, the sputtering power is 100W-300W; the coating time is 5min-50 min; the air pressure is 0.5Pa-1Pa, and the fabric plated with the nano titanium dioxide film is obtained.
Further comprising the step of washing the fabric obtained in the step (3): placing the fabric in ethanol for ultrasonic cleaning for 15min, rinsing with distilled water after cleaning, and placing in an oven for drying; wherein the rinsing mode is ultrasonic or soaking, the rinsing time is 10-60min, the drying temperature is 100 ℃, and the drying time is 30 min.
In the step (2), the metal target is a film with a reticular structure formed by uniformly distributing nano-scale copper, silver or aluminum particles transversely and longitudinally, and the thickness of the film is 800-1500 nm.
In the step (3), the titanium dioxide film comprises a plurality of titanium dioxide particles, and the titanium dioxide particles are attached to the surface of the metal layer and form a compact structure with the metal layer.
The invention has the beneficial effects that: sequentially plating a nano metal film and a nano titanium dioxide film on the surface of the fabric by a magnetron sputtering method to prepare a periodic film, successfully obtaining beautiful structural color with an iridescent effect, and exploring the change condition of changing different single-factor sputtering conditions and the excellent effect of the structural color of the polyester fabric; the invention reduces the use of traditional chemical dyes, avoids the disadvantage of the traditional fabric fastness loss, and has certain application prospect.
Detailed Description
The invention relates to a method for preparing a structural yarn-dyed fabric based on a magnetron sputtering method, which comprises the following steps:
(1) pretreatment of the fabric:
immersing the fabric into an acetone solution with the mass concentration of 90-99% for soaking, and then carrying out low-pressure vacuum plasma etching; wherein, the parameters of the low-pressure vacuum plasma etching are as follows: the temperature is 40-100 ℃, and the pressure is 8 x 10-4-0.5*10-3Pa, power supply power of 40-350W, time of 10-30min, and working gas of argon.
(2) Plating a nano metal film on the surface of the fabric:
putting the pretreated fabric into a magnetron sputtering device for nano metal coating; the distance between the fabric and the metal target is 80-100mm, the working gas is argon, the purity is 95-99.9%, and the vacuum degree is 1 x 10-4-2*10-3Pa, the gas flow rate is 5-10sccm, the fabric rotating speed is 8-12r/min, the magnetron sputtering power is 120-280W, and the magnetron sputtering time is 10-20 min; the metal target is one of metal copper, silver or aluminum. The metal target is a film with a reticular structure formed by uniformly distributing nano-scale copper, silver or aluminum particles transversely and longitudinally, and the thickness of the film is 800-1500 nm.
(3) Plating nano titanium dioxide film on fabric
Plating a nano titanium dioxide film on the surface of the fabric plated with the nano metal film again by adopting radio frequency reactive sputtering;
the sputtering target material is a metal titanium target, and the sputtering parameters are as follows: the distance between the fabric and the target material is 80-100mm, and the vacuum degree is 2 x 10-4-2*10-3Pa; the purity of the argon is 95-99.9 percent, and the flow rate of the argon is 10ml/min-50 ml/min; oxygen as a reaction gas, and the ratio of the oxygen to the argon flow velocity is 1: 3-1: 5, the sputtering power is 100W-300W; the coating time is 5min-50 min; the air pressure is 0.5Pa-1Pa, and the fabric plated with the nano titanium dioxide film is obtained. The titanium dioxide film comprises a plurality of titanium dioxide particles, and the titanium dioxide particles are attached to the surface of the metal layer and form a compact structure with the metal layer.
Cleaning the fabric obtained in the step (3): placing the fabric in ethanol for ultrasonic cleaning for 15min, rinsing with distilled water after cleaning, and placing in an oven for drying; wherein the rinsing mode is ultrasonic or soaking, the rinsing time is 10-60min, the drying temperature is 100 ℃, and the drying time is 30 min.
The first embodiment is as follows:
(1) pretreating the fabric, ultrasonically cleaning the fabric in acetone with the purity of 99% for 30min, cleaning the fabric with distilled water after cleaning, and drying the fabric by using an oven. Then, low-pressure vacuum plasma etching was performed, wherein the degree of vacuum was 9 × 10-4Pa, power supply power of 200W, time of 15min, and working gas of argon.
(2) Plating a nano metal copper film layer on the surface of the fabric. The distance between the fabric and the target material is 80mm, the working gas is argon, the purity is 96 percent, and the vacuum degree is 5 x 10-4Pa, the gas flow rate is 7sccm, the fabric rotating speed is 8r/min, and the magnetron sputtering power is 140W. The size of the copper particles can be controlled by the amount of argon flow and the degree of vacuum during the magnetron sputtering process.
(3) The fabric is plated with a nano titanium dioxide film. The titanium dioxide target material is arranged in a magnetron sputtering target, the distance between the fabric and the target material is 80mm, and the sputtering chamber is vacuumized to the vacuum degree of 9 x 10-4Pa, argon as working gas, and 96% of purity. Then high-purity argon gas is injected into the sputtering chamber until the pressure reaches 0.7 Pa. And starting a radio frequency power supply applied to the titanium dioxide target, and starting sputtering the titanium dioxide target to clean the surface of the titanium dioxide target, wherein the sputtering time is 1 min. And after the cleaning is finished, turning off the radio frequency power supply, and setting the radio frequency sputtering power to be 120W. Opening titanium dioxide target siteAnd sputtering the fabric with the radio frequency power supply for 10min at 90 ℃ to obtain the fabric plated with the nano titanium dioxide film.
Cleaning the fabric obtained in the step (3): placing the fabric in ethanol for ultrasonic cleaning for 15min, rinsing with distilled water after cleaning, and placing in an oven for drying; wherein the rinsing mode is ultrasonic or soaking, the rinsing time is 30min, the drying temperature is 100 ℃, and the drying time is 30 min.
The advantage of this embodiment is that copper/titanium dioxide multilayer composite structure can effectively reflect the infrared ray, realizes compound polychrome fabric surface color effect.
Example two:
(1) pretreating the fabric, ultrasonically cleaning the fabric in acetone with the purity of 95% for 50min, cleaning the fabric with distilled water after cleaning, and drying the fabric by using an oven. Then, low-pressure vacuum plasma etching is carried out, wherein the vacuum degree is 10 x 10-4Pa, power supply power 180W, time 20min, and working gas argon.
(2) Plating a nano metal copper film layer on the surface of the fabric. The distance between the fabric and the target material is 100mm, the working gas is argon, the purity is 99 percent, and the vacuum degree is 6 x 10-4Pa, the gas flow rate is 8sccm, and the fabric rotating speed is 10 r/min. The size of the aluminum particles can be controlled by the amount of argon flow and the degree of vacuum during magnetron sputtering.
(3) The fabric is plated with a nano titanium dioxide film. The titanium dioxide target material is arranged in a magnetron sputtering target, the distance between the fabric and the target material is 100mm, and the sputtering chamber is vacuumized to the vacuum degree of 8 x 10-4Pa, the working gas is argon gas, the purity is 99%, and then high-purity argon gas is injected into the sputtering chamber until the air pressure reaches 0.9 Pa. And starting a radio frequency power supply applied to the titanium dioxide target, and starting sputtering the titanium dioxide target to clean the surface of the titanium dioxide target, wherein the sputtering time is 1 min. After the cleaning is finished, the radio frequency power supply is turned off, and the radio frequency sputtering power is set to be 130W. And starting a titanium dioxide target position radio frequency power supply, and sputtering for 15min at 90 ℃ to obtain the fabric plated with the nano titanium dioxide film.
The method has the advantages that the metal aluminum raw material is easy to process, the ductility is good, the thickness of the aluminum/titanium dioxide composite film layer is easier to control, and the color shows blue and yellow.
Example three:
(1) pretreating the fabric, ultrasonically cleaning the fabric in acetone with the purity of 99% for 20min, cleaning the fabric with distilled water after cleaning, and drying the fabric by using an oven. Then, low-pressure vacuum plasma etching is carried out, wherein the vacuum degree is 8 x 10-4Pa, power supply power 180W, time 20min, and working gas argon.
(2) Plating a nano metal copper film layer on the surface of the fabric. The distance between the fabric and the target material is 70mm, the working gas is argon, the purity is 98 percent, and the vacuum degree is 6 x 10-4Pa, the gas flow rate is 8sccm, and the fabric rotating speed is 5 r/min. The size of the silver particles can be controlled by the amount of argon gas flow and the degree of vacuum during the magnetron sputtering process.
(3) The fabric is plated with a nano titanium dioxide film. The titanium dioxide target material is arranged in a magnetron sputtering target, the distance between the fabric and the target material is 70mm, and the sputtering chamber is vacuumized to the vacuum degree of 9 x 10-4Pa, the working gas is argon gas, the purity is 98%, and then high-purity argon gas is injected into the sputtering chamber until the air pressure reaches 1 Pa. And starting a radio frequency power supply applied to the titanium dioxide target, and starting sputtering the titanium dioxide target to clean the surface of the titanium dioxide target, wherein the sputtering time is 2 min. And after the cleaning is finished, turning off the radio frequency power supply and setting the radio frequency sputtering power to be 150W. And starting a titanium dioxide target position radio frequency power supply, and sputtering for 15min at 80 ℃ to obtain the fabric plated with the nano titanium dioxide film.
The advantage of this embodiment is that the silver/titanium dioxide film layer fabric can display blue and green under natural illumination.
Claims (4)
1. A method for preparing a structural yarn-dyed fabric based on a magnetron sputtering method is characterized by comprising the following steps: the method comprises the following steps:
(1) pretreatment of the fabric:
immersing the fabric into an acetone solution with the mass concentration of 90-99% for soaking, and then carrying out low-pressure vacuum plasma etching; wherein the low pressure vacuum plasma etchingThe parameters of (A) are as follows: the temperature is 40-100 ℃, and the pressure is 8 x 10-4-0.5*10-3Pa, power supply power of 40-350W, time of 10-30min, and working gas of argon;
(2) plating a nano metal film on the surface of the fabric:
putting the pretreated fabric into a magnetron sputtering device for nano metal coating; the distance between the fabric and the metal target is 80-100mm, the working gas is argon, the purity is 95-99.9%, and the vacuum degree is 1 x 10-4-2*10-3Pa, the gas flow rate is 5-10sccm, the fabric rotating speed is 8-12r/min, the magnetron sputtering power is 120-280W, and the magnetron sputtering time is 10-20 min; the metal target is one of metal copper, silver or aluminum;
(3) plating nano titanium dioxide film on fabric
Plating a nano titanium dioxide film on the surface of the fabric plated with the nano metal film again by adopting radio frequency reactive sputtering;
the sputtering target material is a metal titanium target, and the sputtering parameters are as follows: the distance between the fabric and the target material is 80-100mm, and the vacuum degree is 2 x 10-4-2*10-3Pa; the purity of the argon is 95-99.9 percent, and the flow rate of the argon is 10ml/min-50 ml/min; oxygen as a reaction gas, and the ratio of the oxygen to the argon flow velocity is 1: 3-1: 5, the sputtering power is 100W-300W; the coating time is 5min-50 min; the air pressure is 0.5Pa-1Pa, and the fabric plated with the nano titanium dioxide film is obtained.
2. The method for preparing a structural yarn dyed fabric based on a magnetron sputtering method according to claim 1, characterized in that: further comprising the step of washing the fabric obtained in the step (3): placing the fabric in ethanol for ultrasonic cleaning for 15min, rinsing with distilled water after cleaning, and placing in an oven for drying; wherein the rinsing mode is ultrasonic or soaking, the rinsing time is 10-60min, the drying temperature is 100 ℃, and the drying time is 30 min.
3. The method for preparing a structural yarn dyed fabric based on a magnetron sputtering method according to claim 1, characterized in that: in the step (2), the metal target is a film with a reticular structure formed by uniformly distributing nano-scale copper, silver or aluminum particles transversely and longitudinally, and the thickness of the film is 800-1500 nm.
4. The method for preparing a structural yarn dyed fabric based on a magnetron sputtering method according to claim 1, characterized in that: in the step (3), the titanium dioxide film comprises a plurality of titanium dioxide particles, and the titanium dioxide particles are attached to the surface of the metal layer and form a compact structure with the metal layer.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022232870A1 (en) * | 2021-05-03 | 2022-11-10 | Survivon Ltd | Vapour deposition product and method therefor |
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| CN111021085A (en) * | 2019-12-02 | 2020-04-17 | 上海工程技术大学 | Cu/TiO based on magnetron sputtering2Heat insulation fabric and preparation method thereof |
| CN111621976A (en) * | 2020-04-29 | 2020-09-04 | 上海工程技术大学 | Wool composite material and preparation method and application thereof |
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2020
- 2020-10-10 CN CN202011077391.9A patent/CN114318861A/en active Pending
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|---|---|---|---|---|
| WO2006058722A1 (en) * | 2004-12-03 | 2006-06-08 | Mascioni S.P.A. | Process of surface finishing and colouration of an article |
| CN101637679A (en) * | 2009-08-25 | 2010-02-03 | 江南大学 | Method for preparing antibacterial filter screen |
| CN105603715A (en) * | 2014-10-31 | 2016-05-25 | 广东欣丰科技有限公司 | Fabric structure color preparation method |
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| WO2022232870A1 (en) * | 2021-05-03 | 2022-11-10 | Survivon Ltd | Vapour deposition product and method therefor |
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Application publication date: 20220412 |