CN114280334A - Optical surface polishing state judging method - Google Patents
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- CN114280334A CN114280334A CN202111609956.8A CN202111609956A CN114280334A CN 114280334 A CN114280334 A CN 114280334A CN 202111609956 A CN202111609956 A CN 202111609956A CN 114280334 A CN114280334 A CN 114280334A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 57
- 238000005498 polishing Methods 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000012876 topography Methods 0.000 claims abstract description 15
- 238000011065 in-situ storage Methods 0.000 claims abstract description 14
- 238000005259 measurement Methods 0.000 claims description 6
- 238000011326 mechanical measurement Methods 0.000 claims description 3
- 230000005251 gamma ray Effects 0.000 claims description 2
- 238000011156 evaluation Methods 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 4
- 238000004439 roughness measurement Methods 0.000 abstract description 2
- 230000000007 visual effect Effects 0.000 abstract description 2
- 230000003746 surface roughness Effects 0.000 description 8
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012854 evaluation process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
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Abstract
The invention provides a method for judging the polishing state of an optical surface, belonging to the technical field of optics. The method comprises the steps of measuring micro-topography data and in-situ hardness/modulus data of the optical surface to be measured, carrying out correlation operation on the two sets of data to obtain a correlation coefficient gamma of the two sets of data, and finally setting a judgment threshold gamma according to actual conditions0Then, the threshold value gamma is determined according to the absolute value of the correlation coefficient gamma0The relationship of (2) to determine whether the polishing state of the optical surface is optimal. Compared with the existing judging method directly based on the roughness measurement result, the judging process is visual and simple, the evaluation parameters can be quantized, whether the polishing state has an improved space can be judged, and the method is more suitable for engineering application.
Description
Technical Field
The invention belongs to the technical field of optics, relates to an optical surface polishing state judging method, and particularly relates to an ultra-smooth surface polishing state judging method.
Background
The performance of optical surfaces, the most fundamental and central component of many optical instruments and optoelectronic systems, largely determines their level of application. There are many parameters that measure the properties of an optical surface, such as surface type, quality (e.g., scratches, traces, etc.), and roughness (also called finish), wherein roughness mainly refers to the degree of micro-topography fluctuation of the optical surface, which mainly affects the scattering properties and imaging quality of the optical surface. According to the theory of light scattering, the rougher the optical surface, the larger the roughness value, the larger the scattering loss of the optical surface, and the worse the contrast of the optical system. At the same time, roughness also restricts lightThe application effect of the optical surface in many precision technical fields, such as laser gyroscope, X-ray, high-power laser, gravitational wave detection, ultraviolet optical system and the like, all of which require the roughness of the optical surface to be as low as nanometer or even lower; taking a laser gyroscope as an example, in order to reduce the resonant cavity loss of the laser gyroscope as much as possible and reduce the backscattering coupling of a ring-shaped light path so as to improve the performance of the laser gyroscope, the surface roughness of an endoscope is improved from the initial sub-nanometer to the sub-angstrom level
。
Such surface roughness is often referred to as ultra-smooth surfaces, to achieve or exceed nanometer optical surface roughness. How to obtain the super-smooth surface is a problem which is generally concerned by people and needs to be intensively researched and solved in the technical field of engineering. In fact, in order to process ultra-smooth surfaces, in addition to the conventional pitch polishing method, many new optical manufacturing methods such as float polishing, chemical mechanical polishing, magnetorheological polishing, ion beam polishing, etc. have been proposed and developed in recent years at home and abroad. However, published data shows that the highest level of optical surface reported in international publications is still achieved by classical pitch polishing. For example, for fused silica glass materials, the pitch polishing process can produce ultra-smooth surface roughness of up to about
(ii) a level of (d); for sapphire glass, the minimum roughness is even up to
. Therefore, the basic problems of the appearance evolution of the ultra-smooth surface, the forming mechanism and the like are deeply researched around the traditional polishing process, and the method has important significance for further improving the processing quality of the optical surface and promoting the development of other novel polishing modes.
In the past engineering practice, how to judge the polishing state of an optical surface (especially an ultra-smooth surface) to determine whether to continue polishing is a problem which needs to be solved urgently in engineering practice, so that various precise instruments and methods which take the roughness of the optical surface as an evaluation parameter, such as an atomic force microscope, a laser confocal microscope, a white light interferometer and the like, are developed, and the polishing state is judged according to the surface roughness test results at different stages of polishing. The target-oriented evaluation mode has high efficiency and good effect in engineering practice, particularly large-scale industrial production, but does not solve a very important problem: how to judge whether there is room for improvement in the surface roughness in this polished state? Is the surface properties optimal in the current polishing state? Therefore, the invention provides a novel optical surface polishing state judging method based on the research on the optical surface forming process and mechanism, so as to promote the processing level of the prior art and further promote the development of the ultra-smooth surface processing technology.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: a method for judging the polishing state of optical surface features that during the polishing of ultra-smooth surface, the polishing state of optical surface is judged to be optimal, that is, the polishing is continued in existing state and the roughness of optical surface has a space for increasing it.
The technical scheme adopted by the invention for solving the technical problem is as follows:
an optical surface polishing state evaluation method includes the following steps:
firstly, measuring and acquiring optical surface micro-topography data;
secondly, measuring and acquiring in-situ hardness or modulus data of the optical surface;
performing correlation operation on the optical surface micro-topography data obtained by measurement in the previous two steps and in-situ hardness or modulus data to obtain a correlation coefficient gamma of the optical surface micro-topography data and the in-situ hardness or modulus data;
fourthly, setting a judgment threshold gamma according to the actual demand0And 0 is<γ0Less than or equal to 0.5: gamma ray>γ0Judging that the polishing state is not optimal and that | γ | deviates from γ0The farther away, the less ideal the polishing state is; if gamma is less than or equal to gamma0Then, the polishing state is judged to be optimal.
Furthermore, in the first step, the spatial lateral resolution of the optical surface topography data obtained by measurement is in the order of nm to mum.
Further, in the first step, an atomic force microscope, a laser confocal microscope or a white light interferometer is used for measuring and acquiring the optical surface micro-topography data.
Further, in the second step, the in-situ hardness or modulus data of the optical surface is measured and obtained by adopting a nano indenter or atomic force quantitative nano mechanical measurement.
The method is suitable for judging the polishing state of the optical surface with the roughness below the nanometer level, and no public report related to a polishing state evaluation method is found except the traditional judgment based on roughness measurement. The invention has the advantages that:
(1) the evaluation process is visual and simple, and the evaluation parameters can be quantized;
(2) not only can the current state be given, but also whether the optical surface performance is improved through polishing energy can be predicted;
drawings
Fig. 1 is a block diagram of the basic idea of the present invention.
FIG. 2 is a test chart and results of the current polishing status in the embodiment of the present invention.
FIG. 3 is a graph showing the measurement of particle size distribution of two selected polishing particles according to the present invention.
FIG. 4 is a test chart and results of the polishing state after the polishing was continued in the example of the present invention.
Detailed Description
The following describes embodiments of the present invention with reference to the drawings.
As shown in fig. 1 and 2, a method for evaluating a polishing state of an optical surface includes the steps of:
firstly, measuring and acquiring optical surface micro-topography data: obtaining microscopic morphology DATA DATA1 of 10 μm × 10 μm area on the optical surface of the fused silica glass sample by measurement with a Dimension Icon type atomic force microscope (Bruker corporation) with a resolution of 512 × 512, and obtaining surface roughness Rq of 0.453nm and Ra of 0.345nm in the polished state;
secondly, measuring and acquiring in-situ modulus data of the optical surface; carrying out in-situ quantitative nano-mechanical measurement on a 10-micrometer multiplied by 10-micrometer area of the optical surface of a fused silica glass sample by using a PeakForceQNM module of a Dimension Icon type atomic force microscope of Bruker company, and measuring to obtain DTM modulus DATA DATA2 of each point of the in-situ area of the micro-morphology with the resolution of 512 multiplied by 512;
thirdly, performing correlation operation on the measured optical surface micro-topography DATA DATA1 and the in-situ modulus DATA DATA2 by using a CORREL function in Excel to obtain a correlation coefficient gamma of the two1＝-0.26；
Fourthly, setting a judgment threshold value gamma00.02: because of | γ1|>γ0Therefore, the polishing state is judged to be not optimal.
As shown in fig. 3, the polishing solution with smaller particle size and more uniform distribution is selected to continuously polish the optical surface, and after the polishing is finished.
Repeating the processes from the first step to the third step to obtain new ultra-smooth surface micro-topography DATA DATA3, in-situ modulus DATA DATA4 and correlation coefficient gamma of the DATA and the DATA2-0.017. Fourthly, according to the judgment threshold value gamma0It can be seen that at this time, | γ2|<γ0Therefore, it is judged that the polishing state has reached the optimum.
As shown in FIG. 4, the novel ultra-smooth optical surface roughness Rq＝0.0589nm、Ra＝0.0462nm。
The above is a specific example of one implementation of the present invention given by the inventor, but the present invention is not limited to this example. The invention is not limited to the above embodiments, but may be modified in various ways.
Claims (4)
1. A method for judging the polishing state of an optical surface is characterized by comprising the following steps:
firstly, measuring and acquiring optical surface micro-topography data;
secondly, measuring and acquiring in-situ hardness or modulus data of the optical surface;
performing correlation operation on the optical surface micro-topography data obtained by measurement in the previous two steps and in-situ hardness or modulus data to obtain a correlation coefficient gamma of the optical surface micro-topography data and the in-situ hardness or modulus data;
fourthly, setting a judgment threshold gamma according to the actual demand0And 0 is<γ0Less than or equal to 0.5: gamma ray>γ0Judging that the polishing state is not optimal and that | γ | deviates from γ0The farther away, the less ideal the polishing state is; if gamma is less than or equal to gamma0Then, the polishing state is judged to be optimal.
2. The method for evaluating a polishing state of an optical surface according to claim 1,
in the first step, the spatial lateral resolution of the optical surface topography data obtained by measurement is in the order of nm to mum.
3. The method for evaluating a polishing state of an optical surface according to claim 2,
in the first step, an atomic force microscope, a laser confocal microscope or a white light interferometer is used for measuring and acquiring optical surface micro-topography data.
4. The method for evaluating a polishing state of an optical surface according to any one of claims 1 to 3,
in the second step, the in-situ hardness or modulus data of the optical surface is measured and obtained by adopting a nano indenter or atomic force quantitative nano mechanical measurement.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104197872A (en) * | 2014-09-21 | 2014-12-10 | 大连理工大学 | Method for measuring coating thickness and interfacial roughness simultaneously by ultrasonic |
| CN104732003A (en) * | 2014-12-22 | 2015-06-24 | 北京航空航天大学 | Grinding process assessment method based on reliability |
| CN105653891A (en) * | 2016-04-19 | 2016-06-08 | 哈尔滨工程大学 | Comprehensive evaluation method of surface integrity of rotary ultrasonic abrasive machining of engineering ceramic |
| CN110576342A (en) * | 2018-07-17 | 2019-12-17 | 蓝思科技（长沙）有限公司 | Polishing method for improving surface shape precision yield of glass mirror, camera and electronic equipment |
| CN110599474A (en) * | 2019-09-11 | 2019-12-20 | 上海理工大学 | Nondestructive evaluation method for laser damage threshold of large-caliber polished workpiece |
| CN111881560A (en) * | 2020-07-08 | 2020-11-03 | 南京航空航天大学 | Machining parameter optimization method based on grey correlation analysis method-entropy weight ideal point method and machining surface integrity multi-index |
-
2021
- 2021-12-27 CN CN202111609956.8A patent/CN114280334B/en active Active
Patent Citations (6)
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|---|---|---|---|---|
| CN104197872A (en) * | 2014-09-21 | 2014-12-10 | 大连理工大学 | Method for measuring coating thickness and interfacial roughness simultaneously by ultrasonic |
| CN104732003A (en) * | 2014-12-22 | 2015-06-24 | 北京航空航天大学 | Grinding process assessment method based on reliability |
| CN105653891A (en) * | 2016-04-19 | 2016-06-08 | 哈尔滨工程大学 | Comprehensive evaluation method of surface integrity of rotary ultrasonic abrasive machining of engineering ceramic |
| CN110576342A (en) * | 2018-07-17 | 2019-12-17 | 蓝思科技（长沙）有限公司 | Polishing method for improving surface shape precision yield of glass mirror, camera and electronic equipment |
| CN110599474A (en) * | 2019-09-11 | 2019-12-20 | 上海理工大学 | Nondestructive evaluation method for laser damage threshold of large-caliber polished workpiece |
| CN111881560A (en) * | 2020-07-08 | 2020-11-03 | 南京航空航天大学 | Machining parameter optimization method based on grey correlation analysis method-entropy weight ideal point method and machining surface integrity multi-index |
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