CN114267702A

CN114267702A - Display panel, manufacturing method thereof and electronic equipment

Info

Publication number: CN114267702A
Application number: CN202010971394.0A
Authority: CN
Inventors: 张译文; 欧阳世宏; 何仲宇; 李孟庭
Original assignee: Huawei Technologies Co Ltd
Current assignee: Huawei Technologies Co Ltd
Priority date: 2020-09-16
Filing date: 2020-09-16
Publication date: 2022-04-01

Abstract

The embodiment of the application provides a display panel, a manufacturing method thereof and electronic equipment. The display panel includes: a substrate base plate; the functional structure is positioned on the substrate base plate, the edge of the functional structure is provided with a slope, and the slope is provided with a slope surface; the dielectric layer is in contact with at least part of area of the slope surface of the slope, and the refractive index of the dielectric layer is different from that of the slope; the display area of the display panel comprises a first display area and a second display area, and the light transmittance of the first display area is greater than that of the second display area; the edge of the functional structure positioned in the first display area is provided with a first slope, and the first slope is manufactured by adopting a specific process so as to enhance the scattering effect of the slope surface of the first slope on light. The application can improve the influence of light deflection generated when light penetrates through the slope on imaging quality, the phenomenon of ghost images is generated when imaging is improved, and the imaging effect is improved.

Description

Display panel, manufacturing method thereof and electronic equipment

Technical Field

The invention belongs to the technical field of display, and particularly relates to a display panel, a manufacturing method of the display panel and electronic equipment.

Background

In recent years, the full screen design technology becomes a new element which is bitter and pursued by each large manufacturer. The screen proportion of the current mainstream display products reaches over 80 percent. In the present full face screen technique, because leading camera uses the necessity to lead to unable this function of cancellation, lead to current screen mostly to adopt various types of trompil technical path, formed such as design such as "bang hai screen", "water droplet screen", "utmost point screen". However, these openings destroy the uniformity of the display screen, and prevent the further improvement of the screen occupation ratio. To further increase the screen ratio, researchers consider the implementation of an optical element under the screen, such as a camera, disposed below the display area.

The optical element is arranged below the display area, and when the display is needed, the position of the optical element can be normally displayed; when the optical element is needed, the light penetrates through the display panel to reach the optical element and is finally utilized by the optical element. The optical element is arranged under the screen, and light rays need to penetrate through the film layer structure of the display panel to be utilized by the optical element. The circuit and the film layer structure above the optical element can influence the light path of the light penetrating the display panel, thereby influencing the optical effect of the optical element under the screen.

Disclosure of Invention

In view of the above, the present application provides a display panel, a manufacturing method thereof and an electronic device, so as to solve the problem of poor imaging quality of an optical element under a screen.

In a first aspect, an embodiment of the present application provides a display panel, where the display panel includes:

a substrate base plate;

the functional structure is positioned on the substrate base plate, the edge of the functional structure is provided with a slope, and the slope is provided with a slope surface;

the dielectric layer is in contact with at least part of area of the slope surface of the slope, and the refractive index of the dielectric layer is different from that of the slope;

the display area of the display panel comprises a first display area and a second display area, and the light transmittance of the first display area is greater than that of the second display area; wherein the content of the first and second substances,

the edge of the functional structure positioned in the first display area is provided with a first slope, and the first slope is manufactured by adopting a specific process so as to enhance the scattering effect of the slope surface of the first slope on light.

In one embodiment, the edge of the functional structure located in the second display area has a second slope; the second slope and the first slope are manufactured by the same specific process.

Specifically, the display panel comprises a pixel defining layer and a plurality of light emitting devices, wherein the pixel defining layer is positioned on the substrate and used for spacing adjacent light emitting devices, and each light emitting device comprises an anode layer, a light emitting layer and a cathode layer which are sequentially stacked;

the pixel definition layer is a functional structure and is provided with a plurality of openings, the edge of the pixel definition layer close to the openings is a slope, and the side wall of each opening is a slope surface of the slope.

Specifically, the display panel comprises a pixel defining layer, a plurality of light emitting devices and a plurality of supporting columns, wherein the pixel defining layer is positioned on a substrate and used for spacing adjacent light emitting devices, each light emitting device comprises an anode layer, a light emitting layer and a cathode layer which are sequentially stacked, the pixel defining layer is provided with a plurality of openings, and the supporting columns are positioned on one side, far away from the substrate, of the pixel defining layer;

the support column is of a functional structure, the edge of the support column is a slope, and the side wall of the support column is a slope surface of the slope.

Furthermore, the display panel also comprises a light shielding unit positioned in the first display area, and the light shielding unit is positioned on one side of the first slope, which is close to the substrate; in the direction vertical to the display panel, the orthographic projection of the first slope on the substrate base plate is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection.

Furthermore, the distance between the edge of the first projection and the edge of the second projection is d, wherein d is more than or equal to 0 and less than or equal to 7 mu m.

In one embodiment, the display panel further comprises a light shielding unit located in the first display region, the light shielding unit being located at one side of the pixel defining layer close to the substrate; in the direction vertical to the display panel, the orthographic projection of the first slope on the plane where the light shielding unit is located is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection; the shading unit and the anode layer are made of the same material.

Optionally, the shape of the opening of the pixel defining layer is circular or elliptical.

In a second aspect, an embodiment of the present invention provides another display panel, where the display panel includes:

a substrate base plate;

the edge of the functional structure positioned in the first display area is provided with a first slope;

the display panel further comprises a shading unit, wherein the shading unit is positioned on one side of the first slope, which is close to the substrate base plate;

in the direction vertical to the display panel, the orthographic projection of the first slope on the substrate base plate is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection.

In a third aspect, an embodiment of the present application provides a method for manufacturing a display panel, where the display panel includes: a substrate base plate;

the display area of the display panel comprises a first display area and a second display area, and the light transmittance of the first display area is greater than that of the second display area; the edge of the functional structure positioned in the first display area is provided with a first slope; the manufacturing method comprises the following steps:

manufacturing a functional structure in a photoetching process by adopting a first mask plate, wherein the first mask plate comprises a first mask area, and the first mask area is used for forming the functional structure in a first display area; first mask district includes first shading area, first figure district and first transition district, and first transition district is located between first figure district and the first shading area, and the luminousness of first transition district is less than the luminousness of first figure district, and the luminousness of first transition district is greater than the luminousness of first shading district, and lithography processes includes:

manufacturing a functional material layer on one side of a substrate, wherein the functional material layer is divided into a reserved area and an etched area, the reserved area is used for forming a functional structure, the reserved area also comprises an edge area, the edge area is adjacent to the etched area, and the edge area is used for forming a slope of the functional structure;

coating photoresist on the functional material layer;

and aligning the first mask plate with the substrate, wherein the first transition region corresponds to the edge region of the first display region.

Furthermore, the first mask plate also comprises a second mask area, the second mask area is used for forming a functional structure in the second display area, the second mask area comprises a second shading area, a second graph area and a second transition area, the second transition area is positioned between the second graph area and the second shading area, the light transmittance of the second transition area is smaller than that of the second graph area, and the light transmittance of the second transition area is larger than that of the second shading area;

counterpoint first mask plate and substrate base plate, still include: the second transition region corresponds to an edge region located in the second display region.

In a fourth aspect, an embodiment of the present application further provides an electronic device, where the electronic device includes the display panel provided in any embodiment of the present application, and the electronic device further includes an optical component, where the optical component is located on one side of the display panel, and in a direction perpendicular to the display panel, the optical component overlaps with the first display area.

The display panel, the manufacturing method thereof and the electronic device have the following beneficial effects: the optical element is overlapped with the first display area, the first slope of the functional structure positioned in the first display area is manufactured by adopting a specific process to enhance the scattering effect of the slope surface of the first slope on light, and when the light penetrates through the interface formed by the slope surface of the first slope and the dielectric layer, the light deflects towards a plurality of different directions, namely the deflected light is scattered, so that the concentration of deflected energy caused by the deflection of the light towards the same direction is avoided. The influence of light deflection generated when light penetrates through the slope on imaging quality can be improved, the phenomenon of ghost images during imaging is improved, and the imaging effect is improved. Or the shading unit is arranged below the first slope in the first display area, and the deflected light penetrating through the first slope is shielded by the shading unit, so that the deflected light is prevented from participating in imaging, the phenomenon of ghost images during imaging can be improved, and the imaging effect is improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and those skilled in the art can also obtain other drawings according to the drawings without inventive labor.

FIG. 1 is a schematic diagram of an inner slope of a display panel according to the related art;

FIG. 2 is a simplified cross-sectional diagram of an organic light emitting display panel;

FIG. 3 is a schematic view of the refraction direction of a light ray passing through a slope;

FIG. 4 is a schematic top view of a display panel according to an embodiment of the present application;

FIG. 5 is a schematic cross-sectional view taken along line A-A' of FIG. 4;

FIG. 6 is another schematic cross-sectional view taken along line A-A' of FIG. 4;

FIG. 7 is another schematic cross-sectional view taken along line A-A' of FIG. 4;

FIG. 8 is another schematic cross-sectional view taken along line A-A' of FIG. 4;

FIG. 9 is another schematic cross-sectional view taken at line A-A' of FIG. 4;

FIG. 10 is another schematic cross-sectional view taken at line A-A' of FIG. 4;

FIG. 11 is a simplified diagram of a ramp in a display panel according to an embodiment of the present disclosure;

fig. 12 is another schematic top view of a pixel definition layer in a display panel according to an embodiment of the present disclosure;

fig. 13 is another schematic top view of a pixel definition layer in a display panel according to an embodiment of the present disclosure;

FIG. 14 is a partial view of a mask used in a pixel definition layer etching process in the prior art;

fig. 15 is a schematic structural view of a mask used in an etching process of a functional structure in the embodiment of the present application;

fig. 16 is a flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present disclosure;

fig. 17 is another schematic structural view of a mask used in an etching process of a functional structure in the embodiment of the present application;

fig. 18 is another schematic structural view of a mask used in the etching process of the functional structure in the embodiment of the present application;

fig. 19 is another schematic structural view of a mask used in the etching process of the functional structure in the embodiment of the present application;

fig. 20 is a schematic cross-sectional view of an electronic device according to an embodiment of the present application.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The terminology used in the embodiments of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in the examples of the present invention and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

The embodiment of the application provides a display panel, and a display area of the display panel comprises a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area. The display panel can be used in the optical element scheme under the screen, for example, optical element is the camera, when assembling into electronic equipment, sets up the camera in the below that first display area corresponds, can improve the screen and account for the ratio. When the camera function is not started, the first display area can normally display, and the integrity of images in the display area is ensured; when starting the camera function, because the luminousness of first display area is great, then ambient light can be gathered by the camera after penetrating first display area to the realization is shot and is imaged. That is, in the scheme of the optical element under the screen, when the optical element is activated, the optical element receives the light penetrating through the first display area of the display panel and then achieves the optical performance.

The imaging effect of the conventional optical element under the screen is poor, so that the requirement of a user is difficult to meet. In order to improve the imaging effect of the optical element under the screen, the inventor of the application analyzes the influence factors of the imaging effect of the optical element under the screen. At present, display panels are all of a multi-layer stacked structure, and due to the influence of the process of the display panel (such as material exposure, development, deposition, evaporation or sputtering), there is a slope at the edge of some functional structures inside the display panel. Fig. 1 is a schematic diagram of an inner slope of a display panel in the related art. As shown in fig. 1, a functional structure 1 is shown, the edge of the functional structure 1 has a slope 10, and the slope 10 has a slope 11, and the slope has an included angle with the substrate base plate 101, i.e. the slope 11 is not parallel to the substrate base plate 101. A dielectric layer 20 is also provided over the ramp 11. When the ambient light penetrates the region where the ramp 10 is located, the refractive indexes of the ramp 10 and the dielectric layer 20 are different due to the difference between the manufacturing materials of the ramp 10 and the dielectric layer 20. The light is refracted at the contact interface between the slope 11 and the dielectric layer 20, which causes the light to be deflected, thereby affecting the imaging quality of the optical element.

Based on the above assumption, the inventors conducted analysis and experiments taking an organic light emitting display panel as an example. Fig. 2 is a simplified cross-sectional diagram of an organic light emitting display panel. As shown in fig. 2, the pixel defining layer 30 in the organic light emitting display panel has an opening (not shown), and a sidewall 32 of the opening is a slope, that is, an edge of the pixel defining layer 30 close to the opening is a slope 10. Among them, the light emitting device 40 includes an anode layer 41, a light emitting layer 42, and a cathode layer 43. A light emitting layer 42 is deposited within the opening and a cathode layer 43 of the light emitting device 40 overlies the sidewalls 32 of the opening. As illustrated in fig. 2, when light passes through the sidewall 32 of the opening, refraction occurs at the interface where the sidewall 32 and the cathode layer 43 contact, changing the direction of the light path.

After the light penetrates through the slope, the refraction direction and the light energy distribution of the light are both related to the distribution direction of the slope in the display area. FIG. 3 is a schematic view showing a refraction direction of a light ray passing through a slope. As shown in fig. 3, the opening 31 of the pixel defining layer 30 is hexagonal when viewed from a top view, six sidewalls of the hexagonal opening 31 are slopes, and when light passes through a periphery of one opening 31, the deflection directions are six directions indicated by arrows in the figure.

When the optical element is applied to the under-screen optical element scheme, when light penetrates through the slope of the pixel definition layer, since the light is refracted at the interface between the sidewall of the opening and the dielectric layer (such as the cathode layer), the energy of the refracted light is distributed around the slope, that is, dispersed around the opening of the pixel definition layer. In practical applications, the light energy scattered around the opening causes ghost images in the image. Ghost images around the scattered real images seriously affect the imaging effect.

Based on the analysis, the embodiment of the application provides a display panel, improves display panel's structure to when realizing using under the screen optical element scheme, the light deflection that produces when can improve light and pierce through the slope influences the formation of image quality, promotes the formation of image quality.

Fig. 4 is a schematic top view of a display panel provided in the embodiments of the present application, and as shown in fig. 4, a display area 2 of the display panel includes a first display area 21 and a second display area 22, and a light transmittance of the first display area 21 is greater than a light transmittance of the second display area 22. Wherein, when the display panel is an organic light emitting display panel, in one embodiment, the increase of the light transmittance of the first display region is achieved by setting the size of the light emitting devices in the first display region to be smaller than the size of the light emitting devices of the second display region. In another embodiment, the increase in light transmittance of the first display region is achieved by setting the density of the light emitting devices of the first display region to be less than the density of the light emitting devices of the second display region.

In the embodiment of the present application, the display panel includes a functional structure, the functional structure is located on the substrate, the functional structure is manufactured by using a photolithography process, a slope is formed at an edge of the functional structure, and the slope has a slope surface. And a dielectric layer is covered on the slope surface, wherein the refractive index of the dielectric layer is different from that of the slope surface. In the embodiment of the invention, the first slope of the functional structure positioned in the first display area is manufactured by adopting a specific process so as to enhance the scattering effect of the slope surface of the first slope on light. For example, the slope surface of the first slope manufactured by a specific process has a larger roughness, so that the scattering effect on light can be enhanced. Roughness is also referred to as surface roughness, roughness being understood as the degree of surface roughness. The rougher the slope, the greater the roughness, and the smoother the slope, the less the roughness. The slope surface of the first slope manufactured by the specific process has larger roughness, namely the unevenness degree of the slope surface of the first slope manufactured by the specific process is increased.

In one embodiment, the specific process refers to the design of the mask used in the fabrication of the functional structure. In the related art, the functional structure is manufactured by adopting an etching process, and the slope surface of the slope of the actual functional structure also has certain roughness, but in the embodiment of the application, the first slope which is designed to be positioned in the first display area is manufactured by adopting a specific process, so that the roughness of the slope surface of the first slope can be increased on the basis of the related art. When the optical element is applied to the scheme of the optical element under the screen, when light penetrates through an interface formed by the slope surface of the first slope and the dielectric layer, the light deflects towards a plurality of different directions due to the scattering effect of the slope surface of the first slope on the light. The light rays with deflection are scattered, and the concentration of deflection energy caused by the deflection of the light rays in the same direction is avoided. The phenomenon of ghost image appears in the time of can improving formation of image, promotes the formation of image effect. The functional structure in the display panel may be a pixel definition layer or a support pillar. The structure of the display panel and the process for manufacturing the first slope in the present application will be described in detail with specific embodiments.

Specifically, in one embodiment, FIG. 5 is a schematic cross-sectional view taken along line A-A' of FIG. 4. As shown in fig. 5, the display panel includes a substrate base plate 101, an array layer 102 and a display layer 103, and the array layer 102 includes a plurality of transistors T. The display layer 103 includes a pixel defining layer 30 and a plurality of light emitting devices 40 (only two are illustrated in fig. 5), the pixel defining layer 30 is used to space adjacent light emitting devices 40, and the light emitting devices 40 include an anode layer 41, a light emitting layer 42, and a cathode layer 43, which are sequentially stacked. The pixel defining layer 30 is a functional structure, the pixel defining layer 30 has a plurality of openings, an edge of the pixel defining layer 30 close to the openings is a slope (not shown), and a sidewall of the opening is a slope 11 of the slope. A light emitting layer 42 of the light emitting device 40 is deposited within the opening and a cathode layer 43 covers the sloping surfaces 11 and extends outside the opening. That is, the cathode layer 43 is a dielectric layer contacting with the slope of the slope, and the refractive index of the cathode layer 43 is different from that of the pixel defining layer 30.

Also shown in fig. 5 is an encapsulation structure 104 located over the display layer 103. The encapsulation structure 104 is used for protecting the light emitting device 40 so as to prolong the service life of the light emitting device 40. The encapsulation structure 104 may be a thin film encapsulation, and the encapsulation structure 104 includes at least one organic encapsulation layer and one inorganic encapsulation layer. In another embodiment, the package structure 104 is a rigid package, and includes a package cover plate and a frame sealing adhesive, and the package cover plate is bonded to the array layer by the frame sealing adhesive.

The slope formed by the edge of the pixel defining layer near the opening includes a first slope 10-1 and a second slope 10-2, and as illustrated in fig. 5, the edge of the pixel defining layer 30 located in the first display area 21 has the first slope 10-1, and the edge of the pixel defining layer 30 located in the second display area 22 has the second slope 10-2; wherein, the slope surface of the first slope has larger roughness after being manufactured by adopting a specific process. As the roughness of the slope 11-1 of the first slope 10-1 increases, the scattering effect of the slope of the first slope on light is enhanced. When the light penetrates through the interface formed by the slope 11-1 of the first slope 10-1 and the dielectric layer (the cathode layer 43 in fig. 5), the light is deflected in a plurality of different directions, which is equivalent to scattering the deflected light, and concentration of deflected energy caused by deflection of the light in the same direction is avoided. The optical element under the screen is applied to the scheme of the optical element, the influence of light deflection generated when light penetrates through a slope on imaging quality can be improved, the phenomenon of ghost images during imaging is improved, and the imaging effect is improved.

In the embodiment of fig. 5, the slope surface of the second slope may be a rough surface or a flat surface. In the embodiment of the present application, the magnitude relationship between the roughness of the slope surface of the first slope and the roughness of the slope surface of the second slope is not limited. In one embodiment, the slope 11-1 of the first slope 10-1 has a first roughness and the slope of the second slope has a second roughness, the first roughness being greater than the second roughness. In the embodiment, the slope in the first display area is only manufactured by adopting a specific process so as to improve the scattering effect of the slope surface of the first slope in the first display area on light, and the manufacturing process of the slope in the second display area does not need to be changed.

Specifically, the manufacturing process of the pixel defining layer may be designed to form a first slope with a larger roughness of the slope surface in the first display region. When the display panel is manufactured, the pixel definition layer is manufactured by adopting a photoetching process, firstly, a whole layer of organic material layer is manufactured, and then, the organic material layer is etched to form a plurality of openings so as to form the pixel definition layer. In the etching process, the light transmittance of the pattern region of the mask is designed to form the sidewall of the opening in the first display region to have a larger roughness, and this embodiment mode will be described in the following manufacturing method embodiments.

In another embodiment, after the pixel definition layer is manufactured, a roughness treatment is performed on the sidewall of the opening of the pixel definition layer in the first display area, and a layer of atomized material or roughened material is added on the sidewall of the opening of the pixel definition layer in the first display area, so as to increase the roughness of the sidewall of the opening of the pixel definition layer in the first display area.

Specifically, in another embodiment, fig. 6 is another schematic cross-sectional view at the position of the tangent line a-a' in fig. 4. As shown in fig. 6, the edge of the pixel defining layer 30 positioned at the first display area 21 has a first slope 10-1, and the edge of the pixel defining layer 30 positioned at the second display area 22 has a second slope 10-2; the first slope 10-1 is manufactured by a specific process so as to enhance the scattering effect of the slope surface of the first slope 10-1 on light. The second slope 10-2 and the first slope 10-1 are manufactured by the same specific process, that is, the slope of the second slope 10-2 has an enhanced light scattering effect. As illustrated in fig. 6, after the characteristic process is adopted for manufacturing, the roughness of the slope surface 11-1 of the first slope 10-1 and the roughness of the slope surface 11-2 of the second slope 10-2 are both increased. That is to say the roughness of the slope of the functional structure located in the second display area is also increased compared to the prior art. Optionally, the roughness of the slope surface 11-1 of the first slope 10-1 is substantially the same as the roughness of the slope surface 11-2 of the second slope 10-2. When the optical element is applied to the scheme of the optical element under the screen, the optical element corresponds to the first display area 21, and light rays can deflect towards a plurality of different directions when penetrating through the edge of the pixel definition layer in the first display area and the interface contacted with the cathode layer, so that the phenomenon of ghost images during imaging is improved, and the imaging effect is improved. Although the under-screen optical element scheme does not limit the transmittance of the second display region 22 and the intensity of the scattering effect of the slope in the second display region 22 on light. However, in this embodiment, the second slope and the first slope are set to be manufactured by using the same specific process, that is, the edge of the pixel definition layer located in the first display region and the edge of the pixel definition layer located in the second display region are manufactured by using the same specific process, so that the mask plate used in the functional structure (the pixel definition layer in this embodiment) etching process can be designed to be uniform over the whole surface, and the design of the mask plate is simplified.

In the organic light emitting display panel, a film structure of the display panel further includes a support pillar, a material of the support pillar includes an organic material, the support pillar is usually manufactured by an etching process, and an edge of the support pillar may also form a slope. That is to say the support post is also a functional structure.

In one embodiment, FIG. 7 is another cross-sectional view taken at line A-A' of FIG. 4. As shown in fig. 7, the display panel further includes a plurality of supporting pillars 50, the supporting pillars 50 are located on a side of the pixel defining layer 30 away from the substrate base plate 101; the edge of the supporting column 50 is a slope 10, and the side wall of the supporting column 50 is a sloping surface of the slope 10. The side walls of the support posts 50 are covered with a cathode layer 43. The slope constituted by the edges of the support column 50 includes a first slope 10-1 and a second slope 10-2. The first slope 10-1 is positioned in the first display area 21, and the second slope 10-2 is positioned in the second display area 22; the slope surface of the first slope is made by a specific process and has larger roughness, so that the scattering effect of the slope surface of the first slope on light is enhanced.

In the embodiment of fig. 7, the slope surface of the second slope may be a rough surface or a flat surface. In the embodiment of the present application, the magnitude relationship between the roughness of the slope surface of the first slope and the roughness of the slope surface of the second slope is not limited. In one embodiment, the slope 11-1 of the first slope 10-1 has a first roughness and the slope of the second slope has a second roughness, the first roughness being greater than the second roughness. In the embodiment, the slope in the first display area is only manufactured by adopting a specific process so as to improve the scattering effect of the slope surface of the first slope in the first display area on light, and the manufacturing process of the slope in the second display area does not need to be changed. When the display panel is manufactured, the anode layer 41 of the light emitting device 40 is first manufactured, a plurality of anode layers 41 insulated from each other are formed, and then the pixel defining layer 30 is manufactured, wherein the pixel defining layer 30 has a plurality of openings, and one opening corresponds to one anode layer 41, that is, the opening exposes the anode layer 41. Then, the supporting pillars 50 are formed on the pixel defining layer 30, and the supporting pillars 50 are located between two adjacent openings. The light emitting layer 42 of the light emitting device 40 is then evaporated, and the support posts 50 can be used to support a mask used in the evaporation process. Then, the cathode layer 43 of the light emitting device 40 is formed, and the cathode layer 43 is formed in a whole layer, so that the side walls of the support posts 50 are covered with the cathode layer 43. In this embodiment, the cathode layer 43 is a dielectric layer in contact with the sidewalls of the support posts 50, and ambient light is refracted when it penetrates the interface where the cathode layer 43 contacts the sidewalls of the support posts 50.

In this embodiment, through the roughness of the lateral wall of the support column of increase first display area, strengthened the scattering effect of the lateral wall of support column to light, light can take place the deflection to a plurality of different directions when penetrating the lateral wall of the support column in the first display area and the interface of cathode layer contact, is equivalent to and breaks up the deflection light, has avoided light to the concentration that the same direction deflection caused the deflection energy. The optical element under the screen is applied to the scheme of the optical element, the influence of light deflection generated when light penetrates through a slope on imaging quality can be improved, the phenomenon of ghost images during imaging is improved, and the imaging effect is improved.

In another embodiment, FIG. 8 is another cross-sectional view taken at line A-A' of FIG. 4. As shown in fig. 8, the sidewall of the support column 50 located at the first display region 21 has a first slope 10-1, and the sidewall of the support column 50 located at the second display region 22 has a second slope 10-2; the first slope 10-1 is manufactured by a specific process so as to enhance the scattering effect of the slope surface of the first slope 10-1 on light. The second slope 10-2 and the first slope 10-1 are manufactured by the same specific process, that is, the slope of the second slope 10-2 has an enhanced light scattering effect. As illustrated in fig. 8, after the characteristic process is adopted for manufacturing, the roughness of the slope surface 11-1 of the first slope 10-1 and the roughness of the slope surface 11-2 of the second slope 10-2 are both increased. That is to say the roughness of the slope of the functional structures located in the second display area is also increased compared to the prior art. Alternatively, the roughness of the sidewalls of the supporting pillars 50 located in the first display region 21 is substantially the same as the roughness of the sidewalls of the supporting pillars 50 located in the second display region 22. When the optical element is applied to the scheme of the optical element under the screen, the optical element corresponds to the first display area 21, light rays can deflect in a plurality of different directions when penetrating through the side wall of the support column in the first display area and the interface of the cathode layer contact, the phenomenon of double image images during imaging is improved, and the imaging effect is improved. Although the under-screen optical element scheme does not limit the transmittance of the second display region 22 and the intensity of the scattering effect of the slope in the second display region 22 on light. However, in this embodiment, the second slope and the first slope are arranged and manufactured by using the same specific process, that is, the edge of the supporting column in the first display area and the edge of the supporting column in the second display area are manufactured by using the same specific process, so that the supporting column in the first display area and the supporting column in the second display area can be manufactured in the same process, and the mask used in the supporting column etching process can be designed uniformly over the whole surface, thereby simplifying the design of the mask.

In another embodiment, the present application further provides a passively driven organic light emitting display panel, and fig. 9 is another schematic cross-sectional view at a position of a cut line a-a' in fig. 4. If the shape of the support posts in fig. 9 is different from that of the support posts in the embodiment of fig. 7, the support posts in the cross-sectional view of the embodiment of fig. 7 are regular trapezoids, that is, the surface of the support posts on the side close to the substrate base has a larger area than the surface of the support posts on the side far from the substrate base. In the cross-sectional view illustrated in fig. 9, the support column 50 has an inverted trapezoidal shape, that is, the surface of the support column 50 on the side close to the substrate base 101 has a smaller area than the surface of the support column 50 on the side away from the substrate base 101. Also illustrated is a display layer 103, the display layer 103 comprising a light emitting device 40 and a pixel defining layer 30, wherein the light emitting device 40 comprises an anode layer 41, a light emitting layer 42 and a cathode layer 43. A common electrode 107 is also illustrated, wherein the anode layers 41 of the light emitting devices 40 are each electrically connected to the common electrode 107, while the cathode layers 43 of the light emitting devices 40 are independent from each other. In the manufacturing of the display panel according to this embodiment, the anode layer 41 of the light emitting device 40 is first manufactured, the pixel defining layer 30 is then manufactured, the supporting pillars 50 are then manufactured, the light emitting layer 42 of the light emitting device 40 is vapor-deposited, and the cathode layer 43 of the light emitting device 40 is then manufactured. Here, since the support columns 50 have an inverted trapezoidal shape, the cathode layer 43 is broken at the side walls of the support columns 50 when the cathode layer 43 is manufactured. That is, the sidewalls of the support posts 50 in the embodiment of fig. 9 are not covered with the cathode layer 43. After the cathode layer 43 is formed, the optical-grade dielectric material 1041 is coated to form a flat surface, and then the package cover 1042 is formed on the dielectric material 1041 to form a package protection for the light emitting device 40. Between the package cover 1042 and the display layer 103 is a dielectric material 1041. The sidewalls of the support pillars 50 are in contact with the dielectric material 1041, i.e. the dielectric layer in contact with the slope of the slope, of the dielectric material 1041.

As illustrated in fig. 9, the slope constituted by the edges of the inverted trapezoidal support column 50 includes a first slope 10-1 and a second slope 10-2. The first slope 10-1 is positioned in the first display area 21, and the second slope 10-2 is positioned in the second display area 22; the first slope 10-1 is manufactured by a specific process so as to enhance the scattering effect of the slope surface of the first slope 10-1 on light. Through the roughness of the lateral wall of the support column of the first display area, when light penetrates through the lateral wall of the support column in the first display area and the interface contacted with the medium layer, deflection can occur in a plurality of different directions, and concentration of deflection energy caused by deflection of the light in the same direction is avoided. The optical element under the screen is applied to the scheme of the optical element, the influence of light deflection generated when light penetrates through a slope on imaging quality can be improved, the phenomenon of ghost images during imaging is improved, and the imaging effect is improved.

In the embodiment of fig. 9, the slope surface of the second slope may be a rough surface or a flat surface. In the embodiment of the present application, the magnitude relationship between the roughness of the slope surface of the first slope and the roughness of the slope surface of the second slope is not limited.

In another embodiment, the passively driven organic light emitting display panel includes inverted trapezoid-shaped support pillars, and the sidewalls of the support pillars in the first display region and the sidewalls of the support pillars in the second display region are manufactured by the same specific process. That is, roughness of the sidewalls of the supporting pillars at the first display area is increased, and roughness of the sidewalls of the supporting pillars at the second display area is also increased, compared to the related art. In the embodiment, the side wall of the supporting column positioned in the first display area and the side wall of the supporting column positioned in the second display area are manufactured by the same specific process, so that the supporting column positioned in the first display area and the supporting column positioned in the second display area can be manufactured in the same process, and the mask plate used in the supporting column etching process can adopt the design of uniform whole surface, thereby simplifying the design of the mask plate. Which are not illustrated in the drawings.

The supporting columns in the embodiments of fig. 7 to 9 are all manufactured by adopting a photoetching process. In one embodiment, a mask used in the support pillar etching process is designed to realize that the support pillar sidewall of the first display region is manufactured by a specific process, so that the sidewall of the support pillar in the first display region has a larger roughness. In another embodiment, after the support pillars are manufactured, the side walls of the support pillars in the first display area are subjected to roughness treatment, and a layer of atomized material or roughened material is added on the side walls of the support pillars in the first display area, so that the roughness of the side walls of the support pillars in the first display area is improved.

In another embodiment, the light shielding unit is arranged to shield the deflected light rays generated by the penetrating slope. Fig. 10 is another schematic cross-sectional view taken at the location of line a-a' of fig. 4. As shown in fig. 10, the edge of the pixel defining layer 30 near the opening is a slope (not shown), the sidewall of the opening is a slope 11 of the slope, the edge of the pixel defining layer 30 near the opening in the first display region 21 forms a first slope 10-1, and the cathode layer 43 covers the first slope 10-1. The display panel further includes a light shielding unit 90 located at the first display area 21, the light shielding unit 90 being located at a side of the first slope 10 close to the substrate base 101; in the direction e perpendicular to the display panel, the orthographic projection of the first slope 10-1 on the substrate base plate 101 is a first projection; the orthographic projection of the light shielding unit 90 on the substrate 101 is a second projection, and the second projection covers the first projection, that is, the area of the second projection is larger than or equal to the area of the first projection, and the orthographic projection is not shown in the figure. The light shielding structure 90 shown in fig. 10 shields the deflected light rays penetrating through the slope, which corresponds to the light shielding unit 90 located right below the first slope 10-1. Use in the optical element scheme under the screen, the shading structure can shelter from the bias light that produces when environment light pierces through the slope result, avoids bias light to participate in the formation of image to the phenomenon that appears the ghost image when can improving the formation of image promotes the formation of image effect.

The film position of the shading unit in the display panel is not limited in the embodiment of the application, and the shading unit is applied to an organic light-emitting display panel, wherein the display panel comprises a grid metal layer, a source drain metal layer, a capacitor metal layer and an anode metal layer, and the shading unit can be made of any metal layer. Or additionally adding a metal layer in the process of manufacturing the display panel for manufacturing the shading unit.

Specifically, in an embodiment, as shown in fig. 10, the light shielding unit 90 and the anode layer 41 are located on the same layer, that is, the light shielding unit 90 and the anode layer 41 are made of the same material on the same layer. Optionally, the light shielding unit is connected with the anode layer. When the anode layer is manufactured, the shading unit and the cathode layer can be manufactured in the same manufacturing process only by designing the shape of the mask plate adopted for etching the anode layer, no additional process is needed, and the process is relatively simple.

The magnitude relationship between the slope and the refractive index of the medium layer in contact with the slope is not limited in the embodiments of the present application. Fig. 11 is a simplified schematic diagram of a ramp in a display panel according to an embodiment of the present disclosure.

As shown in fig. 11 (a), the refractive index of the primary slope 10-1 is n1, and the refractive index of the dielectric layer 20 is n2, where n1> n 2. When the light is emitted from the medium layer 20 to the first slope 10-1, according to the refraction law, since n1> n2, sin θ 1< sin θ 2, the incident angle is larger than the refraction angle. A shading unit 90 is arranged below the first slope 10-1, and the orthographic projection of the first slope 10-1 on the substrate base plate 101 in the direction e perpendicular to the display panel is a first projection; the orthographic projection of the light shielding unit 90 on the substrate base plate 101 is a second projection. The distance between the edge of the first projection and the edge of the second projection is d, wherein d is more than or equal to 0 and less than or equal to 7 mu m. The first projection and the second projection are not shown in the drawing, but the projection direction is the direction e schematically shown in the drawing, and it is understood that the first slope 10-1 and the light shielding unit 90 overlap in the direction e, and as shown in fig. (a), on the left side, the edge of the first slope 10-1 and the edge of the light shielding unit 90 are substantially aligned; on the right side, the edge of the light shielding unit 90 extends beyond the edge of the first slope 10-1 by a length d. The first slope includes a first end and a second end, wherein, in a direction perpendicular to the substrate base plate, a thickness of the first end is smaller than a thickness of the second end. When the refractive index of the first slope is larger than that of the medium layer, the light penetrating through the slope is deflected towards the direction of the first end. The length of the first end of the shading unit extending out is d, and d is more than or equal to 0 and less than or equal to 7 microns, so that the shading unit can shade the deflected light penetrating through the slope.

As shown in fig. 11 (b), the refractive index of the primary slope 10-1 is n1, and the refractive index of the dielectric layer is n2, where n1< n 2. When light is emitted from the medium layer to the first slope 10-1, according to the refraction law, since n1< n2, sin θ 1> sin θ 2, that is, the incident angle is smaller than the refraction angle. A light shielding unit 90 is arranged below the first slope 10-1, and the orthographic projection of the first slope 10-1 on the substrate base plate 101 in the direction e perpendicular to the display panel is a first projection; the orthographic projection of the light shielding unit 90 on the substrate base plate 101 is a second projection. The distance between the edge of the first projection and the edge of the second projection is d, wherein d is more than or equal to 0 and less than or equal to 7 mu m. The first slope 10-1 and the light shielding unit 90 overlap in the direction e, and as shown in fig. (a), on the right side, the edge of the first slope 10-1 and the edge of the light shielding unit 90 are substantially aligned; on the left side, the edge of the shade unit 90 extends beyond the edge of the first ramp 10-1 by a length d. The first slope includes a first end and a second end, wherein, in a direction perpendicular to the substrate base plate, a thickness of the first end is smaller than a thickness of the second end. When the refractive index of the first slope is smaller than that of the medium layer, the light penetrating through the slope is deflected towards the direction of the second end. The length of the light shading unit extending out of the second end is d, and d is more than or equal to 0 and less than or equal to 7 microns, so that the light shading unit can shade the deflected light penetrating through the slope.

Fig. 11 described above shows the arrangement of the light shielding unit in different cases. In a specific structure, the light shielding unit is designed according to the size relationship between the refractive index of the first slope and the dielectric layer, as described above with reference to fig. 11.

Fig. 10 is only illustrated by a slope formed at an edge of the pixel defining layer near the opening, and the scheme in fig. 10 may be applied to any of the embodiments of fig. 5 to 9. And will not be described in detail herein.

In another embodiment, the display panel includes a functional structure, the edge of the functional structure has a slope, wherein the edge of the functional structure located in the first display area has a first slope, and the first slope is manufactured by a specific process to increase the scattering effect of the slope surface of the first slope on light. Meanwhile, a light shielding unit is arranged on one side of the first slope, which is close to the substrate base plate. In the direction vertical to the display panel, the orthographic projection of the first slope on the substrate base plate is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection. This embodiment combines through the scheme that the slope surface that increases the slope that is located the first display area was to the scattering effect of light and the scheme that shelters from through setting up the shading unit to the light that pierces through the slope to improve the light deflection that produces when light pierces through the slope and to the influence of formation of image quality, the phenomenon of ghost image appears when improving the formation of image, promote the formation of image effect.

The organic light emitting display panel is applied to the scheme of the optical element under the screen to improve the imaging effect. The embodiment of the present application further designs the shape of the opening of the pixel defining layer. As illustrated in fig. 3, the openings 31 of the pixel defining layer are hexagonal and are regularly arranged, so that six side walls of the hexagonal openings 31 are sloped, and when light passes through the periphery of one opening 31, the deflection directions are six directions indicated by arrows in the figure. There will be a concentration of deflected light rays between two adjacent openings resulting in ghost images. Based on this, the present application further designs the shape of the opening of the pixel defining layer, and designs that two adjacent sides of at least part of two adjacent openings are not parallel, or designs that the shape of the opening is circular or elliptical. Therefore, the problem that the concentration of deflected light rays exists between two adjacent openings can be solved, the intensity of imaging double images is reduced, and the imaging effect is improved.

Specifically, in an embodiment, fig. 12 is another schematic top view of a pixel definition layer in a display panel provided in the embodiment of the present application. As shown in fig. 12, the shape of the opening 31 of the pixel defining layer is illustrated as a hexagon, and two adjacent sides of at least some of the two adjacent openings 31 are not parallel. That is, in the adjacent two openings 31: the pattern of one opening is equivalent to the pattern of the other opening which is obtained after a certain angle of rotation.

In another embodiment, fig. 13 is another schematic top view of a pixel definition layer in a display panel provided in this embodiment. As shown in fig. 13, the shape of the opening 31 of the pixel defining layer is circular, and when light penetrates through the side wall of the circular opening, the propagation direction of the deflected light is evenly distributed around the circular opening, so that the concentration of energy of the deflected light is reduced, the intensity of the imaging ghost is reduced, and the imaging effect is improved.

The embodiment of the application further provides a manufacturing method of the display panel, which can be used for manufacturing the display panel provided by the embodiment of the application. The manufacturing method comprises the following steps: manufacturing a functional structure in a photoetching process by adopting a first mask plate, wherein the first mask plate comprises a first mask area, and the first mask area is used for forming the functional structure in a first display area; the first mask area comprises a first shading area, a first graph area and a first transition area, the first transition area is located between the first graph area and the shading area, the light transmittance of the first transition area is smaller than that of the first graph area, and the light transmittance of the first transition area is larger than that of the first shading area. The functional structure in the embodiment of the application can be a pixel definition layer or a support column, and when the display panel is manufactured, the pixel definition layer and the support column need to adopt different mask plates. However, in order to increase the light scattering effect of the slope of the edge slope of the pixel defining layer or the slope of the edge slope of the supporting pillar in the first display region, the structure of the mask is designed in the same way.

Fig. 14 is a partial schematic view of a mask used in a pixel definition layer etching process in the prior art, and as shown in fig. 14, the mask includes a pattern region S and a light-shielding region Z, where the light-shielding region Z is opaque and the pattern region S has a certain light transmittance. Taking the positive photoresist as an example in the etching process, the shape of the pixel defining layer formed by final etching is the same as that of the shading area Z, and then an opening of the pixel defining layer is formed at a position corresponding to the pattern area S. Fig. 14 also shows the pixel defining layer 30 formed after the mask plate in the related art is used, and the slope of the edge of the pixel defining layer 30. Wherein the slope of the edge corresponds to the position of the boundary between the pattern area S and the light-shielding area Z. The reason for the formation of the edge slope is: the boundary position of the pattern area S and the shading area Z has light diffusion during the exposure step in the photoetching process, the exposure degree of the photoresist irradiated by the diffused light is smaller than that of the photoresist corresponding to the central area of the pattern area, so that the edge of the photoresist forms a slope after the development step, and further the edge of the functional structure also forms a slope in the etching step.

Fig. 15 is a schematic structural diagram of a mask used in an etching process of a functional structure in the embodiment of the present application. As shown in fig. 15, a first mask region M1 of the mask is illustrated, wherein the first mask region M1 is used to form a functional structure in the first display region; the first mask region M1 includes a first light-shielding region Z1, a first pattern region X1, and a first transition region G1, the first transition region G1 is located between the first pattern region X1 and the first light-shielding region Z1, the light transmittance of the first transition region G1 is smaller than that of the first pattern region X1, and the light transmittance of the first transition region G1 is greater than that of the first light-shielding region Z1. When the positive photoresist is used for etching, the mask illustrated in fig. 15 can be used for manufacturing the pixel defining layer. The shape of the first graphic area X1 is only schematically indicated in the figure.

Fig. 16 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure. In the embodiment of fig. 16, the functional structure is manufactured by using the mask illustrated in fig. 15. As shown in fig. 16, the photolithography process includes:

step S101: manufacturing a functional material layer 300 on one side of a substrate base plate 101, wherein the functional material layer 300 is divided into a reserved area 310 and an etching area 320, the reserved area 310 is used for forming a functional structure, the reserved area 310 further comprises an edge area 311, the edge area 311 is adjacent to the etching area 320, and the edge area 311 is used for forming a slope of the functional structure;

step S102: coating a photoresist 400 on the functional material layer 300;

step S103: the first mask M is aligned with the substrate 101, and a UV light source is turned on to irradiate the photoresist 400 from one side of the first mask M, wherein the first transition region G1 corresponds to the edge region 311 of the first display region 21. As can be seen from the light path diagram illustrated in the figure, there is diffusion of light at the boundary position of the different transmittance regions.

Step S104: developing, removing the photoresist in the UV light irradiation area to form a photoresist pattern; due to the diffusion phenomenon, the exposure degree of the photoresist in the region irradiated with the diffused light is small, and the photoresist remains after development. Since the first transition region G1 is provided in the mask, the roughness of the slope surface of the edge of the photoresist pattern increases after development.

Step S105: the functional material layer 300 is etched using the photoresist pattern as a hard mask. The increased roughness of the slope surface of the edge of the photoresist pattern can affect the infiltration of the etching solution used in the etching process, thereby causing the edge etching degree of the functional structure to change compared with the related art. After the etching process, the shape of the slope surface of the slope of the edge of the functional structure is substantially the same as the shape of the slope surface of the slope of the edge of the photoresist pattern. That is, the roughness of the slope surface of the slope located at the first display region is increased, so that the scattering effect of the slope surface on the light is enhanced.

Fig. 15 only illustrates a structure of a mask, and in another embodiment, fig. 17 is a schematic view of another structure of a mask used in an etching process of a functional structure in the embodiment of the present application. As shown in fig. 17, the first mask region M1 includes a first light-shielding region Z1, a first pattern region X1, and a first transition region G1, the first transition region G1 is located between the first pattern region X1 and the first light-shielding region Z1, the light transmittance of the first transition region G1 is smaller than that of the first pattern region X1, and the light transmittance of the first transition region G1 is greater than that of the first light-shielding region Z1. The first transition region G1 includes a first region G11 and a second region G11, in which light transmittances of the first region G11 and the second region G11 are different, that is, regions having different transmittances are provided in the first transition region G1. So that the roughness of the slope surface of the slope can be further increased in application.

In another embodiment, fig. 18 is a schematic structural diagram of a mask used in an etching process of a functional structure in this embodiment. As shown in fig. 18, the first mask region M1 includes a first light-shielding region Z1, a first pattern region X1, and a first transition region G1, the first transition region G1 is located between the first pattern region X1 and the first light-shielding region Z1, the light transmittance of the first transition region G1 is smaller than that of the first pattern region X1, and the light transmittance of the first transition region G1 is greater than that of the first light-shielding region Z1. The first transition region G1 includes a first region G11 and a second region G11, and the light transmittances of the first region G11 and the second region G11 are different, wherein the first region G11 may have the same light transmittance as the first light-shielding region Z1, that is, the first region G11 may be substantially opaque.

In another embodiment, fig. 19 is a schematic structural diagram of a mask used in an etching process of a functional structure in this embodiment. As shown in fig. 19, the first mask region M1 includes a first light-shielding region Z1, a first pattern region X1, and a first transition region G1, the first transition region G1 is located between the first pattern region X1 and the first light-shielding region Z1, the light transmittance of the first transition region G1 is smaller than that of the first pattern region X1, and the light transmittance of the first transition region G1 is greater than that of the first light-shielding region Z1. The first transition region G1 includes a first region G11 and a second region G11, and the light transmittances of the first region G11 and the second region G11 are different, wherein the first region G11 may have the same light transmittance as the first light-shielding region Z1, that is, the first region G11 may be substantially opaque. Optionally, the boundary between the first region G11 and the second region G11 is wavy or zigzag.

The mask in the embodiments of fig. 17 to 19 may be used to fabricate the pixel defining layer, wherein the shape of the first pattern region is only schematically shown. For the mask plate used in the fabrication of the supporting pillar, the corresponding design can be performed with reference to the above description and the drawings of the embodiments, and details are not repeated herein.

Furthermore, the first mask plate also comprises a second mask area, the second mask area is used for forming a functional structure in the second display area, the second mask area comprises a second shading area, a second graph area and a second transition area, the second transition area is positioned between the second graph area and the second shading area, the light transmittance of the second transition area is smaller than that of the second graph area, and the light transmittance of the second transition area is larger than that of the second shading area; counterpoint first mask plate and substrate base plate, still include: the second transition region corresponds to an edge region located in the second display region.

That is, the second mask region for forming the functional structure in the second display region may adopt the same design as the first mask region, and a transition region is provided between the pattern region and the light-shielding region for increasing the roughness of the slope surface of the slope. That is, the slope in the first display area and the slope in the second display area are manufactured by the same specific process, so that the functional structure in the first display area and the functional structure in the second display area can be manufactured in the same process, and the mask plate used in the functional structure etching process can be designed in a unified mode, so that the design of the mask plate is simplified.

The embodiment of the application also provides electronic equipment, and the electronic equipment comprises the display panel provided by any embodiment of the application. The electronic device may be any electronic device with a display function, such as a mobile phone, a tablet computer, a notebook computer, an electronic book, a television, a smart watch, and the like. Fig. 20 is a schematic cross-sectional view of an electronic device according to an embodiment of the present application. As shown in fig. 20, the electronic device further includes an optical assembly 200, the optical assembly 200 is located at one side of the display panel 100, and the optical assembly 200 overlaps the first display area 21 in a direction e perpendicular to the display panel 100. Optionally, the optical assembly 200 is a camera.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A display panel, comprising:

a substrate base plate;

the functional structure is positioned above the substrate base plate, the edge of the functional structure is provided with a slope, and the slope is provided with a slope surface;

2. The display panel according to claim 1,

the edge of the functional structure positioned in the second display area is provided with a second slope; wherein the content of the first and second substances,

the second slope and the first slope are manufactured by the same specific process.

3. The display panel according to claim 1,

the display panel comprises a pixel defining layer and a plurality of light emitting devices, wherein the pixel defining layer is positioned on the substrate and used for spacing the adjacent light emitting devices, and each light emitting device comprises an anode layer, a light emitting layer and a cathode layer which are sequentially stacked;

the pixel definition layer is the functional structure, the pixel definition layer is provided with a plurality of openings, the edge of the pixel definition layer close to the openings is the slope, and the side wall of each opening is the slope surface of the slope.

4. The display panel according to claim 1,

the display panel comprises a pixel defining layer, a plurality of light emitting devices and a plurality of supporting columns, wherein the pixel defining layer is located above the substrate and used for spacing the adjacent light emitting devices, the light emitting devices comprise an anode layer, a light emitting layer and a cathode layer which are sequentially stacked, the pixel defining layer is provided with a plurality of openings, and the supporting columns are located on one side, far away from the substrate, of the pixel defining layer;

the support column is the functional structure, the edge of support column is the slope, the lateral wall of support column is the domatic of slope.

5. The display panel according to any one of claims 1 to 4,

the display panel further comprises a light shielding unit positioned in the first display area, and the light shielding unit is positioned on one side of the first slope, which is close to the substrate base plate;

in the direction perpendicular to the display panel, the orthographic projection of the first slope on the substrate base plate is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection.

6. The display panel according to claim 5,

the distance between the edge of the first projection and the edge of the second projection is d, wherein d is more than or equal to 0 and less than or equal to 7 mu m.

7. The display panel according to claim 3 or 4,

the display panel further comprises a shading unit positioned in the first display area, and the shading unit is positioned on one side of the pixel definition layer close to the substrate base plate;

in the direction perpendicular to the display panel, the orthographic projection of the first slope on the plane where the shading unit is located is a first projection; the orthographic projection of the shading unit on the substrate base plate is a second projection, and the second projection covers the first projection;

the shading unit and the anode layer are made of the same material.

8. The display panel according to claim 3 or 4,

the shape of the opening is circular or oval.

9. A display panel, comprising:

a substrate base plate;

the display panel further comprises a light shielding unit, wherein the light shielding unit is positioned on one side of the first slope, which is close to the substrate base plate;

10. The display panel according to claim 9,

11. A method of making a display panel, the display panel comprising: a substrate base plate;

the display area of the display panel comprises a first display area and a second display area, and the light transmittance of the first display area is greater than that of the second display area; the edge of the functional structure positioned in the first display area is provided with a first slope; the manufacturing method is characterized by comprising the following steps:

manufacturing the functional structure in a photoetching process by adopting a first mask plate, wherein the first mask plate comprises a first mask area, and the first mask area is used for forming the functional structure in the first display area; the first mask area comprises a first shading area, a first graph area and a first transition area, the first transition area is located between the first graph area and the first shading area, the light transmittance of the first transition area is smaller than that of the first graph area, the light transmittance of the first transition area is larger than that of the first shading area, and the photoetching process comprises the following steps:

manufacturing a functional material layer on one side of the substrate, wherein the functional material layer is divided into a reserved area and an etched area, the reserved area is used for forming the functional structure, the reserved area further comprises an edge area, the edge area is adjacent to the etched area, and the edge area is used for forming a slope of the functional structure;

coating photoresist on the functional material layer;

and aligning the first mask plate with the substrate base plate, wherein the first transition area corresponds to the edge area of the first display area.

12. The method of manufacturing according to claim 11,

the first mask plate further comprises a second mask area, the second mask area is used for enabling the functional structure to be formed in the second display area, the second mask area comprises a second shading area, a second graph area and a second transition area, the second transition area is located between the second graph area and the second shading area, the light transmittance of the second transition area is smaller than that of the second graph area, and the light transmittance of the second transition area is larger than that of the second shading area;

aligning the first mask plate with the substrate base plate, and further comprising: the second transition region corresponds to the edge region located in the second display region.

13. An electronic device characterized in that the electronic device includes the display panel of any one of claims 1 to 12,

the electronic device further comprises an optical component, wherein the optical component is positioned on one side of the display panel and is overlapped with the first display area in the direction perpendicular to the display panel.