CN114231924A - Surface treatment method for improving wear resistance of bearing rubber sealing ring - Google Patents
Surface treatment method for improving wear resistance of bearing rubber sealing ring Download PDFInfo
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- CN114231924A CN114231924A CN202111528455.7A CN202111528455A CN114231924A CN 114231924 A CN114231924 A CN 114231924A CN 202111528455 A CN202111528455 A CN 202111528455A CN 114231924 A CN114231924 A CN 114231924A
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- rubber sealing
- sealing ring
- sputtering target
- wear resistance
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- 238000007789 sealing Methods 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000004381 surface treatment Methods 0.000 title claims abstract description 20
- 238000005477 sputtering target Methods 0.000 claims abstract description 65
- 239000013077 target material Substances 0.000 claims abstract description 47
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000007789 gas Substances 0.000 claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 25
- 238000004544 sputter deposition Methods 0.000 claims abstract description 21
- 229910052786 argon Inorganic materials 0.000 claims abstract description 15
- 238000000151 deposition Methods 0.000 claims abstract description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 8
- 229920000459 Nitrile rubber Polymers 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910002804 graphite Inorganic materials 0.000 claims description 6
- 239000010439 graphite Substances 0.000 claims description 6
- 239000010687 lubricating oil Substances 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229920001973 fluoroelastomer Polymers 0.000 claims description 3
- 230000001050 lubricating effect Effects 0.000 claims description 3
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
Abstract
The invention discloses a surface treatment method for improving wear resistance of a bearing rubber sealing ring, and particularly relates to the technical field of material surface treatment. The method comprises the following steps: the rubber sealing ring is subjected to ultrasonic cleaning and then placed in a vacuum chamber, argon is introduced, and plasma is formed by glow discharge to clean the sputtering target material; after the rubber sealing ring is treated by S1, introducing gas into the vacuum chamber and adjusting the air pressure to 0.5-5.0 Pa, and sealing the rubber sealing ring with the rubber sealing ringApplying a bias voltage of-10 to-200V on the ring, then starting a sputtering power supply to sputter a first sputtering target material onto the surface of the rubber sealing ring, wherein the average power of the first sputtering target material is 0W/cm2~3W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 1W/cm2~10W/cm2. The technical scheme of the invention solves the problem of poor wear resistance of the existing rubber sealing ring, and the scheme has the advantages of high deposition speed, small damage to a substrate, good process repeatability and easy realization of industrialization.
Description
Technical Field
The invention relates to the technical field of material surface treatment, in particular to a surface treatment method for improving the wear resistance of a bearing rubber sealing ring.
Background
In the bearing component, the rubber seal ring plays a role of preventing the leakage of the lubricating oil and the intrusion of foreign matters. Various types of failure of rubber seals occur during operation, the main failure modes including but not limited to: rubber corrosion due to long-term contact and friction with lubricating oil, surface scratches and abrasion due to the external conditions during storage or a coupling transmission machine, ablation and expansion due to high-temperature environments caused by friction, and inevitable deterioration of mechanical properties of rubber materials under long-term operation, and the occurrence of hardened or embrittled rubber aging. The failure of a sealing rubber ring of the bearing can cause the leakage of lubricating oil, great rapid abrasion to the bearing and even the operation failure and damage of the whole mechanical product, and the inspection and repair of a closed instrument and the replacement of parts of the bearing are difficult projects.
In order to improve the wear resistance and corrosion resistance of the bearing rubber sealing ring in operation and prolong the service life of the bearing rubber sealing ring, the surface of a sealing ring workpiece needs to be modified. In order to improve the wear resistance of the bearing seal ring prepared from nitrile rubber, a lot of researchers have deposited a diamond-like carbon (DLC) film on the surface by using a plasma method in order to increase the service life of the bearing seal ring. However, the DLC film has high brittleness, and the eggshell effect is very easy to occur in the service process, so that the film falls off, serious three-body abrasion is caused, and the service life of the rubber sealing ring is influenced.
Disclosure of Invention
The invention aims to provide a surface treatment method for improving the wear resistance of a bearing rubber sealing ring, and solves the problem of poor wear resistance of the traditional rubber sealing ring.
In order to achieve the purpose, the technical scheme of the invention is as follows: a surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, and the air pressure of the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a sputtering target material by glow discharge to form plasma, wherein the sputtering target material comprises a first sputtering target material which contains one or two metal elements of Cu and Mo and has the function of catalyzing lubricating oil molecules to degrade to generate a graphite-like carbon lubricating layer and a second sputtering target material which is composed of graphite or pure titanium and a Ti base thereof;
s2: after the rubber sealing ring is treated by S1, introducing gas into the vacuum chamber, adjusting the air pressure to 0.5-5.0 Pa, applying a bias voltage of-10-200V to the rubber sealing ring, then starting a sputtering power supply, and sputtering the first sputtering target to the surface of the rubber sealing ring, wherein the average power of the first sputtering target is 0W/cm2~3W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 1W/cm2~10W/cm2Depositing a film material containing one or more metal elements of Cu and Mo on the surface of the rubber sealing element, wherein the content of Cu or Mo in the film material is 1-10%.
The principle of the technical scheme is as follows: the film is deposited by adopting a double-target co-sputtering mode, and the sputtering rate of the sputtered target material can be regulated and controlled only by regulating the power of the sputtering power supply of the double targets, so that the doping amount of the metal of the deposited film can be regulated and controlled.
Further, the first sputtering target comprises a pure metal or alloy target containing one or two metal elements of Cu and Mo.
Further, the second sputtering target material adopts a pure graphite target, pure Ti or a high-entropy alloy target material containing one or more elements. Through the arrangement, the alloy target can increase the mixing entropy of the prepared film and improve the wear-resistant characteristic of the film.
Further, the gas is pure argon or a mixed gas of argon, a carbon source gas and a nitrogen source gas.
Further, the mixed gas is Ar/C2H2、Ar/CH4、Ar/N2One or more of the above.
By the arrangement, the composition of the film can be regulated by the mixed gas, for example, Ar/N is used as the mixed gas when the film is deposited2Mixed gas, the deposited film is a nitride ceramic film, if the mixed gas used is Ar/N2/C2H2The mixed gas containing nitrogen and carbon can deposit film of carbon and nitrogen compound. Therefore, the mixed gas deposition can be adopted to prepare the ceramic with a multiphase structure, and the mechanical property of the film is improved.
Furthermore, the rubber sealing ring is made of nitrile rubber, silicon rubber or fluororubber.
Through the arrangement, the deposited thin film material for surface modification and the rubber material have high bonding strength, good toughness and difficult desorption, and are suitable for rubber type sealing elements.
Compared with the prior art, the beneficial effect of this scheme:
1. the thin film material for surface modification deposited by the scheme has high bonding strength with the rubber material, has good toughness, is not easy to desorb, and is suitable for rubber type sealing elements.
2. In the working process of the friction pair, the film material contained in the scheme catalyzes hydrocarbon organic matters in the lubricating oil by metal ions such as Cu, Mo and the like generated under the action of shear stress, and a graphite layer is attached to the surface of the rubber sealing ring to generate a self-lubricating effect.
3. The solid lubricating layer can effectively cover the defects on the surface of the film, so that the condition that corrosive media permeate to the film-substrate interface to corrode rubber materials is avoided, and the corrosion resistance of the rubber sealing ring can be effectively improved.
Drawings
FIG. 1 is a diagram showing the wear marks of the rubber seal ring of example 1 after treatment by the present method;
FIG. 2 is a graph showing the wear marks of the rubber seal ring of example 1 which were not treated by the present method.
Detailed Description
The present invention will be described in further detail below by way of specific embodiments:
example 1
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the rubber sealing ring in the embodiment is made of nitrile rubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a first sputtering target material and a second sputtering target material containing Cu metal elements by utilizing glow discharge formed plasma, wherein the second sputtering target material is a pure titanium target.
S2: and after the rubber sealing ring is ultrasonically cleaned in S1, introducing mixed gas of gas and nitrogen into the vacuum chamber, and adjusting the air pressure to 0.5-5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 1W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 9W/cm2。
By adopting the method, TiN film material containing Cu elements is deposited on the surface of the rubber sealing element, and the content of Cu element substances in the film material is 3%.
The rubber seal ring treated in the embodiment and the rubber seal ring not treated by the method are subjected to frictional wear under the same conditions, so that wear trace graphs shown in fig. 1 and fig. 2 are obtained, and it can be seen that the width of the wear trace of the rubber seal ring of the embodiment is obviously smaller than that of the rubber seal ring not treated by the method.
Example 2
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the rubber sealing ring in the embodiment is made of nitrile rubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a first sputtering target material and a second sputtering target material containing Cu and Mo elements by utilizing glow discharge formed plasma, wherein the second sputtering target material is a pure titanium target.
S2: and after the rubber sealing ring is ultrasonically cleaned by S1, introducing mixed gas of argon and nitrogen into the vacuum chamber, and adjusting the air pressure to 0.5-5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 0.5W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 9W/cm2。
By adopting the method, TiN film material containing Cu and Mo elements is deposited on the surface of the rubber sealing element, and the content of Cu and Mo elements in the film material is 2%.
Example 3
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the rubber sealing ring in the embodiment is made of nitrile rubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a first sputtering target material containing Cu element and a second sputtering target material by utilizing glow discharge formed plasma, wherein the second sputtering target material is a pure titanium target.
S2: and after the rubber sealing ring is ultrasonically cleaned by S1, introducing mixed gas of argon/nitrogen into the vacuum chamber, and adjusting the air pressure to 0.5-5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 2W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the surface is flatThe average power is 8W/cm2。
By adopting the method, the MoN film material containing the Cu element is deposited on the surface of the rubber sealing element, and the content of copper and other metal element substances in the film material accounts for 10%.
Example 4
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the rubber sealing ring in the embodiment is made of silicon rubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a first sputtering target material containing Cu element and a second sputtering target material by utilizing glow discharge formed plasma, wherein the second sputtering target material is a pure titanium target.
S2 ultrasonic cleaning of the rubber seal ring by S1, and introducing Ar/CH into the vacuum chamber4The pressure of the mixed gas is adjusted to 0.5 to 5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 1W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 8W/cm2。
By adopting the method, the TiC film material containing Cu element is deposited on the surface of the rubber sealing element, and the content of copper and other metal element substances in the film material is 2%.
Example 5
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the material of the rubber sealing ring in the embodiment is fluororubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a first sputtering target material containing Cu element and a second sputtering target material by utilizing glow discharge formed plasma, wherein the second sputtering target material is a graphite target.
S2, sealing with rubberAfter the ring is ultrasonically cleaned by S1, Ar/C is introduced into the vacuum chamber2H2The pressure of the mixed gas is adjusted to 0.5 to 5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 1W/cm2Simultaneously turning on an electron cyclotron resonance plasma power supply, adjusting the magnetron power to 800W, carrying out chemical vapor deposition of a diamond-like carbon film, and sputtering a second sputtering target material to the surface of the rubber sealing ring, wherein the average power is 8W/cm2。
By adopting the method, the diamond-like carbon film material containing Cu elements is deposited on the surface of the rubber sealing element, and the content of copper and other metal element substances in the film material is 1 percent.
Example 6
A surface treatment method for improving the wear resistance of a bearing rubber sealing ring comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, the rubber sealing ring in the embodiment is made of nitrile rubber, and then the air pressure in the vacuum chamber is reduced to 3 multiplied by 10-3Introducing pure argon after Pa, and cleaning a first sputtering target material containing Cu element and a second sputtering target material by utilizing glow discharge formed plasma, wherein the second sputtering target material adopts an AlCrFeNiCoCu high-entropy alloy target.
S2: after the rubber seal ring is ultrasonically cleaned by S1, Ar/C is introduced into the vacuum chamber2H4/N2The pressure of the mixed gas is adjusted to 0.5 to 5.0 Pa. Applying a bias voltage of-10 to-200V on the rubber sealing ring, then starting a sputtering power supply, and sputtering a first sputtering target material to the surface of the rubber sealing ring by adopting a chemical vapor deposition method, wherein the average power of the first sputtering target material is 0.5W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 9W/cm2。
By adopting the method, a high-entropy alloy ceramic film material (AlCrFeNiCoCu) (C, N) containing Cu elements is deposited on the surface of the rubber sealing element, and the content of Cu element substances in the film is 5%.
The foregoing are merely examples of the present invention and common general knowledge of known specific structures and/or features of the schemes has not been described herein in any greater detail. It should be noted that, for those skilled in the art, without departing from the structure of the present invention, several changes and modifications can be made, which should also be regarded as the protection scope of the present invention, and these will not affect the effect of the implementation of the present invention and the practicability of the patent. The scope of the claims of the present application shall be determined by the contents of the claims, and the description of the embodiments and the like in the specification shall be used to explain the contents of the claims.
Claims (6)
1. A surface treatment method for improving the wear resistance of a bearing rubber sealing ring is characterized by comprising the following steps: the method comprises the following steps:
s1: the rubber sealing ring is ultrasonically cleaned and then placed in a vacuum chamber, and the air pressure of the vacuum chamber is reduced to 3 multiplied by 10-3Introducing argon after Pa, and cleaning a sputtering target material by glow discharge to form plasma, wherein the sputtering target material comprises a first sputtering target material which contains one or two metal elements of Cu and Mo and has the function of catalyzing lubricating oil molecules to degrade to generate a graphite-like carbon lubricating layer and a second sputtering target material which is composed of graphite or pure titanium and a Ti base thereof;
s2: after the rubber sealing ring is treated by S1, introducing gas into the vacuum chamber, adjusting the air pressure to 0.5-5.0 Pa, applying a bias voltage of-10-200V to the rubber sealing ring, then starting a sputtering power supply, and sputtering the first sputtering target to the surface of the rubber sealing ring, wherein the average power of the first sputtering target is 0W/cm2~3W/cm2Then, a second sputtering target is sputtered to the surface of the rubber sealing ring, and the average power of the second sputtering target is 1W/cm2~10W/cm2The method comprises the following steps of depositing a film material containing one or two metal elements of Cu and Mo on the surface of the rubber sealing element, wherein the content of Cu or Mo in the film material is 1-10%.
2. The surface treatment method for improving the wear resistance of the bearing rubber sealing ring according to claim 1, characterized by comprising the following steps: the first sputtering target comprises a pure metal or alloy target containing one or two metal elements of Cu and Mo.
3. The surface treatment method for improving the wear resistance of the bearing rubber sealing ring according to claim 1, characterized by comprising the following steps: the second sputtering target material adopts a pure graphite target, pure Ti or a high-entropy alloy target material containing one or more elements.
4. The surface treatment method for improving the wear resistance of the bearing rubber sealing ring according to claim 1, characterized by comprising the following steps: the gas is pure argon or a mixed gas of argon, carbon source gas and nitrogen source gas.
5. The surface treatment method for improving the wear resistance of the bearing rubber sealing ring according to claim 4, characterized by comprising the following steps: the mixed gas is Ar/C2H2、Ar/CH4、Ar/N2One or more of the above.
6. The surface treatment method for improving the wear resistance of the bearing rubber sealing ring according to claim 1, characterized by comprising the following steps: the rubber sealing ring is made of nitrile rubber, silicon rubber or fluororubber.
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CN113201713A (en) * | 2021-05-18 | 2021-08-03 | 中国科学院兰州化学物理研究所 | Construction method of rubber surface ultra-low friction carbon-based composite film |
CN214361654U (en) * | 2021-02-23 | 2021-10-08 | 黑龙江省海振科技有限公司 | Radio frequency coupling magnetron sputtering device for depositing DLC coating on rubber surface |
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CN102650043A (en) * | 2011-02-24 | 2012-08-29 | 中国科学院兰州化学物理研究所 | Preparation method for nano composite lubricating film |
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CN105597149A (en) * | 2015-10-08 | 2016-05-25 | 西南交通大学 | Preparation method of carbon film biomaterial with wear self-repairing function in in-vivo environment |
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