CN114180854A - Process for changing ultimate pressure bearing capacity of coated flat glass - Google Patents
Process for changing ultimate pressure bearing capacity of coated flat glass Download PDFInfo
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- CN114180854A CN114180854A CN202111392751.9A CN202111392751A CN114180854A CN 114180854 A CN114180854 A CN 114180854A CN 202111392751 A CN202111392751 A CN 202111392751A CN 114180854 A CN114180854 A CN 114180854A
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- Prior art keywords
- layer
- processing
- film system
- changing
- film
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a process for changing the bearing limit pressure of a coated flat glass, which comprises the following steps: 1) processing a hardened layer: plating a tempering layer on the plane glass; 2) processing the soft material layer: processing a layer of material with relatively soft chemical characteristics on the toughening layer; 3) processing an antireflection film system: processing a film system on the soft material layer by adopting an ion source assisted film coating mode; 4) plating a waterproof material: after the film system is processed, plating a layer of waterproof material with the thickness of 12-25 nm; the extreme pressure that can effectual change lens bore increases to 25~35Kg from former coating film processing back pressure 8~12Kg, promotes product quality.
Description
Technical Field
The invention relates to the technical field of plane glass processing, in particular to a process for changing the bearing limit pressure of plane glass after film coating.
Background
The processing of the plane glass is used in various industries at present, and is applied to military and life aspects, and the current lens processing environment is that the limit pressure born by the glass after film coating processing is basically 8-12 Kg, so that the quality of the product can have a fragile characteristic when the product is used.
Disclosure of Invention
The invention aims to design a process for changing the bearing limit pressure of a coated flat glass, which can effectively change the bearing limit pressure of a lens, increase the pressure from 8-12 Kg to 25-35 Kg after the original coating processing, and improve the quality of a product.
The invention is realized by the following technical scheme: a process for changing the ultimate pressure bearing capacity of a flat glass after coating comprises the following steps:
1) processing a hardened layer: plating a tempering layer on the plane glass;
2) processing the soft material layer: processing a layer of material with relatively soft chemical characteristics on the toughening layer;
3) processing an antireflection film system: processing a film system on the soft material layer by adopting an ion source assisted film coating mode;
4) plating a waterproof material: after the film system is processed, a layer of waterproof material with the thickness of 12-25 nm is plated.
In order to further realize the invention, the following arrangement mode is adopted: in the step 2), no ion source is used for assisting in processing the soft material layer.
In order to further realize the invention, the following arrangement mode is adopted: when the film system is processed, the setting parameters of the ion source for the first layer auxiliary film coating of the film system are as follows: 100-200 ml of Beaml, 200-400V of BeamV, ACCV: 100-200V.
In order to further realize the invention, the following arrangement mode is adopted: when the film system is processed, the ion source sets parameters for the auxiliary film plating of the second layer of the film system as follows: 700ml of Beaml, 900V of beamV, ACCV: 700V.
In order to further realize the invention, the following arrangement mode is adopted: the material with relatively soft chemical characteristics is BP500 and Ti3O5、SiO2Any one of the above.
In order to further realize the invention, the following arrangement mode is adopted: when the material with relatively soft chemical characteristics is processed on the toughened layer, the electron gun is set according to the following parameters: BP 500: 8mA, Ti3O5:360~300mA,SiO2:6mA。
In order to further realize the invention, the following arrangement mode is adopted: when the waterproof material is plated, the processing parameters of the electron gun are set as follows: 70-80 mA.
Compared with the prior art, the invention has the following advantages and beneficial effects:
the invention changes the limit pressure of the plane glass, and the plane glass system processed by the process is applied to various fields of mobile phone lenses, mobile phone panels, lens placement and the like, so that the risk of crushing the glass due to overlarge pressure caused by personal errors in the using process of a user can be effectively reduced. The user can use the product more safely.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the detailed description of the embodiments of the present invention provided below is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention.
In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise specifically stated or limited, the terms "mounting," "connecting," "disposing," "fixing," and the like are to be understood in a broad sense, and may be, for example, a fixed connection, a detachable connection, or an integral connection, and are not limited to any conventional mechanical connection means such as screwing, interference fitting, riveting, screw-assisted connection, and the like. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
It is worth noting that: in the present application, when it is necessary to apply the known technology or the conventional technology in the field, the applicant may have the case that the known technology or/and the conventional technology is not specifically described in the text, but the technical means is not specifically disclosed in the text, and the present application is considered to be not in compliance with the twenty-sixth clause of the patent law.
Example 1:
a process for changing the ultimate pressure bearing capacity of a flat glass after coating comprises the following steps:
1) processing a hardened layer: plating a tempering layer on the plane glass;
2) processing the soft material layer: processing a layer of material with relatively soft chemical characteristics on the toughening layer;
3) processing an antireflection film system: processing a film system on the soft material layer by adopting an ion source assisted film coating mode;
4) plating a waterproof material: after the film system is processed, a layer of waterproof material with the thickness of 12-25 nm is plated.
The glass body structure processed by the process sequentially comprises a waterproof material layer, a film system layer, a soft material layer, a toughening layer and a plane glass layer from outside to inside.
In order to further realize the invention, the following arrangement mode is adopted: in the step 2), no ion source is used for assisting in processing the soft material layer.
In order to further realize the invention, the following arrangement mode is adopted: when the film system is processed, the setting parameters of the ion source for the first layer auxiliary film coating of the film system are as follows: 100-200 ml of Beaml, 200-400V of BeamV, ACCV: 100-200V.
In order to further realize the invention, the following arrangement mode is adopted: when the film system is processed, the ion source sets parameters for the auxiliary film plating of the second layer of the film system as follows: 700ml of Beaml, 900V of beamV, ACCV: 700V.
In order to further realize the invention, the following arrangement mode is adopted: the material with relatively soft chemical characteristics is BP500 and Ti3O5、SiO2Any one of the above.
In order to further realize the invention, the following arrangement mode is adopted: when the material with relatively soft chemical characteristics is processed on the toughened layer, the electron gun is set according to the following parameters: BP 500: 8mA, Ti3O5:360~300mA,SiO2:6mA。
In order to further realize the invention, the following arrangement mode is adopted: when the waterproof material is plated, the processing parameters of the electron gun are set as follows: 70-80 mA.
Example 2:
a process for changing the ultimate pressure bearing capacity of a flat glass after coating comprises the following steps:
1. the plane glass is plated with a layer of tempering layer.
2. Processing a material (BP 500, Ti) with relatively soft chemical characteristics on the surface of the toughened layer3O5、SiO2Any of the above), the tension of the entire glass structure is changed, but notThe transmittance of the glass structure is changed, and the processing of the material with relatively soft chemical characteristics is carried out on the toughened layer without the aid of an ion source (RF source) in the processing process, and the electron gun is set according to the following parameters: BP 500: 8mA, Ti3O5:360~300mA,SiO2:6mA。
3. After a material layer with soft chemical characteristics is processed, a film system is processed according to the transmission or emission requirement of the whole glass structure, an ion source (RF source) is adopted for auxiliary coating during the processing of the film system, and the power of the first auxiliary coating of the film system (namely the processing parameters of the ion source are 100-200 ml, 200-400V and 100-200V) is ensured to avoid damaging a surface film layer in the processing process.
4. When a first layer (an improved limiting pressure layer) is evaporated to process a second layer, the energy of an ion source (an RF source) is adjusted to 700-1000 MA (the processing parameters of the preferred ion source are beam: 700ml, beam V:900V and ACCV: 700V) so as to ensure the adsorption force of the film layer, and therefore other properties of the whole glass structure are not affected.
5. After the film system is processed, a layer of waterproof material is plated under the condition that the processing parameter of the electron gun is 70-80 mA, and the thickness is 12-25 nm.
By adopting the process, the transmission and reflectivity required by the glass coating processing can not be influenced besides the change of the limit pressure borne by the surface of the plane glass.
After the processing is finished, when the reliability of the obtained product is tested: no demoulding in water boiling, no demoulding or corrosion in salt spray, no membrane falling in a Baige test, a water drop angle of 100-.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and all simple modifications and equivalent variations of the above embodiments according to the technical spirit of the present invention are within the scope of the present invention.
Claims (7)
1. A process for changing the bearing limit pressure of a coated plane glass is characterized in that: the method comprises the following steps:
1) processing a hardened layer: plating a tempering layer on the plane glass;
2) processing the soft material layer: processing a layer of material with relatively soft chemical characteristics on the toughening layer;
3) processing an antireflection film system: processing a film system on the soft material layer by adopting an ion source assisted film coating mode;
4) plating a waterproof material: after the film system is processed, a layer of waterproof material with the thickness of 12-25 nm is plated.
2. The process of claim 1, wherein the process comprises the following steps: in the step 2), no ion source is used for assisting in processing the soft material layer.
3. The process for changing the ultimate pressure to which a flat glass is subjected after being coated according to claim 1 or 2, wherein: when the film system is processed, the setting parameters of the ion source for the first layer auxiliary film coating of the film system are as follows: 100-200 ml of Beaml, 200-400V of BeamV, ACCV: 100-200V.
4. The process for changing the ultimate pressure to which a flat glass is subjected after being coated according to claim 1 or 2, wherein: when the film system is processed, the ion source sets parameters for the auxiliary film plating of the second layer of the film system as follows: 700ml of Beaml, 900V of beamV, ACCV: 700V.
5. The process for changing the ultimate pressure to which a flat glass is subjected after being coated according to claim 1 or 2, wherein: the material with relatively soft chemical characteristics is BP500 and Ti3O5、SiO2Any one of the above.
6. The process of claim 5, wherein the process comprises the following steps: when a material with relatively soft chemical characteristics is processed on the tempered layer, the electron gun is pressed as followsSetting parameters: BP 500: 8mA, Ti3O5:360~300mA,SiO2:6mA。
7. The process of claim 1, 2 or 6, wherein the process comprises the following steps: when the waterproof material is plated, the processing parameters of the electron gun are set as follows: 70-80 mA.
Priority Applications (1)
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CN202111392751.9A CN114180854A (en) | 2021-11-23 | 2021-11-23 | Process for changing ultimate pressure bearing capacity of coated flat glass |
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CN202111392751.9A CN114180854A (en) | 2021-11-23 | 2021-11-23 | Process for changing ultimate pressure bearing capacity of coated flat glass |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08254612A (en) * | 1995-03-15 | 1996-10-01 | Canon Inc | Multilayer film optical component and manufacture thereof |
CN102584027A (en) * | 2012-01-09 | 2012-07-18 | 宁波永新光学股份有限公司 | Method for plating antireflection film on surface of optical glass tempered by chemical method |
CN108897076A (en) * | 2018-08-28 | 2018-11-27 | 东莞市旭瑞光电科技有限公司 | A kind of film plating process of optics plastic lens |
CN111399103A (en) * | 2020-04-22 | 2020-07-10 | 杭州科汀光学技术有限公司 | Low-stress multilayer thin film optical filter and preparation method thereof |
CN113151789A (en) * | 2021-04-20 | 2021-07-23 | 湖北华鑫光电有限公司 | Ion source coating process for optical plastic lens |
-
2021
- 2021-11-23 CN CN202111392751.9A patent/CN114180854A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08254612A (en) * | 1995-03-15 | 1996-10-01 | Canon Inc | Multilayer film optical component and manufacture thereof |
CN102584027A (en) * | 2012-01-09 | 2012-07-18 | 宁波永新光学股份有限公司 | Method for plating antireflection film on surface of optical glass tempered by chemical method |
CN108897076A (en) * | 2018-08-28 | 2018-11-27 | 东莞市旭瑞光电科技有限公司 | A kind of film plating process of optics plastic lens |
CN111399103A (en) * | 2020-04-22 | 2020-07-10 | 杭州科汀光学技术有限公司 | Low-stress multilayer thin film optical filter and preparation method thereof |
CN113151789A (en) * | 2021-04-20 | 2021-07-23 | 湖北华鑫光电有限公司 | Ion source coating process for optical plastic lens |
Non-Patent Citations (1)
Title |
---|
王月花主编: "《薄膜光学原理与技术》", vol. 1, 徐州:中国矿业大学出版社, pages: 92 * |
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