CN114166875A - Backscatter inspection system - Google Patents

Backscatter inspection system Download PDF

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Publication number
CN114166875A
CN114166875A CN202010954645.4A CN202010954645A CN114166875A CN 114166875 A CN114166875 A CN 114166875A CN 202010954645 A CN202010954645 A CN 202010954645A CN 114166875 A CN114166875 A CN 114166875A
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CN
China
Prior art keywords
detectors
detector
ray
inspection system
gap
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Granted
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CN202010954645.4A
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Chinese (zh)
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CN114166875B (en
Inventor
陈志强
李元景
唐晓
吴万龙
唐乐
桑斌
孙秀平
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Tsinghua University
Nuctech Co Ltd
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Tsinghua University
Nuctech Co Ltd
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Priority to CN202010954645.4A priority Critical patent/CN114166875B/en
Priority to PCT/CN2021/116726 priority patent/WO2022052892A1/en
Publication of CN114166875A publication Critical patent/CN114166875A/en
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Publication of CN114166875B publication Critical patent/CN114166875B/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203—Measuring back scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
    • G01V5/00—Prospecting or detecting by the use of nuclear radiation, e.g. of natural or induced radioactivity
    • G01V5/222—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016—X-ray

Abstract

The present invention relates to a backscatter inspection system. A backscatter inspection system is disclosed, comprising: an X-ray source for generating X-rays; the pencil beam forming device is used for modulating the X rays generated by the X ray source into an X ray pencil beam; two detectors for receiving X-rays scattered from a back of an object to be inspected upon irradiation of the modulated X-ray pen beam thereto, the two detectors being spaced apart to form a gap, the detectors including a receiving face for facing the object to be inspected; and a shielding device, which is positioned at the gap between two adjacent detectors and/or the receiving surface of the detector and is used for reducing the influence of scattering caused before the X-ray pen beam reaches the object to be inspected on the detector.

Description

Backscatter inspection system
Technical Field
The present invention relates to the field of X-ray inspection, and in particular to a backscatter inspection system.
Background
The X-ray back scattering imaging technology has been widely used in the field of safety inspection of human bodies, goods and vehicles due to its advantages of low radiation dose, good safety and sensitivity to light materials. The X-ray back scattering imaging technology is used for obtaining a substance image within a certain depth of the surface of an object by detecting the intensity of different substances on X-ray scattering. The back scattering inspection system comprises an X-ray source and a detector, wherein X-rays emitted by the X-ray source form a pencil beam through a pencil beam forming device, and the surface of an object to be inspected is scanned point by point; the detector receives the scattering signal of the object and forms a depth image of the surface of the object.
The intensity of the X-ray scattered from the surface of the object after being irradiated by the X-ray is in inverse square relation with the distance from the irradiated point on the surface of the object. Therefore, it is desirable that the position of the detector is as close as possible to the irradiation point on the object surface. Current backscatter inspection systems typically include two detectors at the front end, with an X-ray source and a pencil beam forming device located behind the detectors. The X-ray pen beam passes through the gap between the two detectors and continuously moves to scan and inspect the target object.
The above-described backscatter inspection systems put conflicting requirements on the width of the gap between the detectors. On the one hand, it is desirable that the gap between the detectors is as narrow as possible to reduce the distance between the detectors and the illumination point on the object surface for a stronger scatter signal. On the other hand, because the X-ray source and the pen beam forming device are located behind the detector, when the pen beam passes through a narrow detector gap, the scattering of the pen beam itself may cause interference signals to the detector, which affects the imaging quality. In addition, the scatter caused by the X-rays as they pass through the front panel of the backscatter inspection system can also cause interference signals to the detectors.
For this reason, a need exists for a backscatter inspection system that can reduce internal scattering interference.
Disclosure of Invention
It is an object of the invention to provide a backscatter inspection system capable of reducing internal scattering interference. It is a further object of the invention to provide a backscatter inspection system that can improve the quality of the imaging.
One aspect of the invention provides a backscatter inspection system comprising: an X-ray source for generating X-rays; the pencil beam forming device is used for modulating the X rays generated by the X ray source into an X ray pencil beam; two detectors for receiving X-rays scattered from a back of an object to be inspected upon irradiation of the modulated X-ray pen beam thereto, the two detectors being spaced apart to form a gap, the detectors including a receiving face for facing the object to be inspected; and a shielding device, which is positioned at the gap between two adjacent detectors and/or the receiving surface of the detector and is used for reducing the influence of scattering caused before the X-ray pen beam reaches the object to be inspected on the detector.
According to an embodiment of the invention, the shielding means comprises two slit shielding sections arranged in the slit between the two detectors and forming a gap, wherein the gap between the two slit shielding sections is aligned with the pencil beam forming means to enable the modulated X-ray pencil beam to pass through the gap between the two slit shielding sections.
According to an embodiment of the invention, the backscatter inspection system further comprises a front panel arranged in front of the receiving surface of the detector for blocking foreign objects from contacting the detector.
According to an embodiment of the invention, the shielding device comprises two front side shielding portions arranged between the front panel and the receiving face of the detector and covering a portion of the receiving face of the detector close to the slit, the two front side shielding portions being spaced apart to form a gap, the gap between the two front side shielding portions being aligned with the pencil beam forming device to enable the modulated X-ray pencil beam to pass through the gap between the two front side shielding portions.
According to an embodiment of the present invention, the first slot-shielding portion and the first front-side shielding portion are integrally formed, and the second slot-shielding portion and the second front-side shielding portion are integrally formed.
According to an embodiment of the present invention, the first slot-shielding portion, the first front-side shielding portion, the second slot-shielding portion, and the second front-side shielding portion are integrally formed.
According to an embodiment of the invention, the backscatter inspection system further comprises an enclosure within which the X-ray source, the pencil beam forming means, the two detectors and the shielding means are arranged.
According to an embodiment of the invention, the backscatter inspection system further comprises a controller for generating a backscatter X-ray image from the backscatter X-rays received by the detector.
According to an embodiment of the invention, the backscatter inspection system further comprises a display for displaying the backscatter X-ray image generated by the controller.
According to an embodiment of the invention, the backscatter inspection system comprises shielding means that reduce the influence of scatter on the detector caused before the X-ray pen beam reaches the object to be inspected, i.e. that reduce the influence of disturbing scatter caused inside the backscatter inspection system. Therefore, the backscattering inspection system comprising the shielding device can effectively reduce the influence of internal interference scattering on scanning imaging and improve the quality of a backscattering image, such as image contrast and the like.
Drawings
FIG. 1 is a schematic diagram of a backscatter inspection system according to an embodiment of the invention.
FIG. 2 is a schematic diagram of a pencil beam forming device according to an embodiment of the invention.
Fig. 3 is a schematic view of a backscatter inspection system including a shielding apparatus according to an embodiment of the invention.
Fig. 4 is a schematic view of a shielding device according to an embodiment of the invention.
Fig. 5 is a schematic view of a backscatter inspection system including a shielding apparatus according to an embodiment of the invention.
Fig. 6 is a schematic view of a shielding device according to an embodiment of the invention.
Detailed Description
Hereinafter, embodiments of the present invention are described with reference to the drawings. The following detailed description and drawings are illustrative of the principles of the invention, which is not limited to the preferred embodiments described, but is defined by the claims. The invention will now be described in detail with reference to exemplary embodiments thereof, some of which are illustrated in the accompanying drawings. The following description refers to the accompanying drawings, in which like reference numerals refer to the same or similar elements in different drawings unless otherwise indicated. The aspects described in the following exemplary embodiments do not represent all aspects of the present invention. Rather, these aspects are merely exemplary of the systems and methods according to the various aspects of the present invention as recited in the appended claims.
The backscatter inspection apparatus according to an embodiment of the present invention can scan and inspect an object, such as a vehicle, a building wall, or other object requiring authentication of the security of internal structures and internal articles. The backscatter inspection apparatus according to embodiments of the invention is particularly suitable as a portable backscatter inspection apparatus.
FIG. 1 is a schematic diagram of a backscatter inspection system according to some embodiments of the invention. As shown in FIG. 1, backscatter inspection system 10 may include a housing 11, an X-ray source 12, a pencil beam forming device 13, a detector 14, a controller 15, and a display 16. The X-ray source 12, the pencil beam forming means 13 and the detector 14 may be arranged inside the housing 11. It should be noted that fig. 1 illustrates the housing 11 in partial cutaway for ease of illustration of the components within the housing 11. The backscatter inspection system can scan towards the object 20 to be inspected. One side of the housing 11 is intended to face an object 20 to be examined.
The X-ray source 12 is used to generate X-rays. The pen beam former 13 is used to modulate the X-rays generated by the X-ray source 12 into an X-ray pen beam. The detector 14 is used for receiving the X-rays backscattered from the object 20 to be examined after the X-ray pen beam modulated by the pen beam forming device 13 is irradiated on the object 20 to be examined.
The controller 15 is adapted to generate a back-scattered X-ray image based on the back-scattered X-rays received by the detector 14. The controller 15 may be located inside the housing 11 as shown in fig. 1, for example on the side of the housing 11 remote from the detector 14, or may be located outside the housing 11. The controller 15 is communicatively connected to the X-ray source 12, the detector 14, etc., such as by wired or wireless communication.
The display 16 is used to display the backscatter X-ray image generated by the controller 15. The display 16 is communicatively coupled to the controller 15, such as by wired or wireless communication. In some embodiments, the display 16 may be disposed outside of the housing 11, for example, separately from the housing 11 as shown in FIG. 1, or the display 16 may be attached to the housing 11.
In a backscatter inspection system, the X-ray source 12 is located at the rear of the backscatter inspection system, the detector 14 is located at the front, and the pencil beam forming device 13 is located between the X-ray source 12 and the detector 14. In this context, "front" and "front" refer to the side of the backscatter inspection system facing the object 20 to be inspected and "rear" refer to the side of the backscatter inspection system facing away from the object 20 to be inspected.
According to an embodiment of the invention, the backscatter inspection system comprises two detectors 14. The two detectors 14 are arranged spaced apart so that a gap is formed between the two detectors 14. Each detector 14 comprises a front surface for facing the object 20 to be examined and a side surface facing the other detector at the aperture. The front surface serves as a receiving face of the detector 14 for receiving the backscattered X-rays.
When the backscatter inspection system scans and inspects the object to be inspected 20, the X-ray source 12 emits X-rays (e.g., large field angle X-rays); the pencil beam forming device 13 modulates the X-ray emitted by the X-ray source 12 into an X-ray pencil beam rotating at a high speed; the X-ray pen beam passes through the gap between the two detectors 14 and finally impinges on the object 20 to be examined. In some embodiments, the pencil beam shaping device modulates the pencil beam into a high-speed movement of its projection along a straight line, whereby the object 20 to be examined can be scanned in one dimension. In addition, when the object 20 to be inspected is scanned in one dimension, the backscatter inspection system can also be moved in a direction perpendicular to the one-dimensional scanning direction, so that the backscatter inspection system scans over a range of a certain area, i.e. the object 20 to be inspected is scanned in two dimensions. The detector 14 may receive backscattered X-rays from the object 20 to be examined and generate a backscatter signal during the scan, and the controller 15 may acquire the backscatter signal from the detector 14 and generate an X-ray backscatter image, e.g., a two-dimensional image having a depth. The display 16 may then display the generated X-ray backscatter image. During scanning, the outer surface of the backscatter inspection system conforms to the surface of the object 20 to be inspected.
The pencil forming means 13 may take various forms, such as a disk, wheel, post, etc. rotary modulation means. The following description will be made taking a disc chopper as an example. FIG. 2 is a schematic diagram of a pencil beam forming device according to an embodiment of the invention. As shown in fig. 2, the pencil shaping device 13 may include a shield plate 31, a chopper wheel 32, and a shield plate 33. During operation, the large field angle X-rays first reach the slotted shield plate 31 and pass through the slots to form a fan-shaped beam, then reach the rotating chopper wheel 32 and form a reciprocating X-ray pen beam. A shielding plate 33 with slits may be placed on the exit side of chopper wheel 32. Generally, the shield plates 31, 33 and the chopper plate 32 are made of a metal material having a high atomic number, such as lead, tin, iron, tungsten, or an alloy thereof. The shielding plates 31, 33 and chopper wheel 32 need to have a certain thickness in order to have a sufficient shielding effect against radiation outside the desired X-ray pen beam. The shield plates 31, 33 and the chopper wheel 32 are parallel to each other and are kept at a fixed distance from each other, so that the chopper wheel 32 can be kept stably rotating at high speed. The beam former 13 enables the formation of an X-ray beam and has an effective shielding effect, but on the exit side of the beam former 13 there is still a certain amount of scattered X-rays which are difficult to avoid.
The X-ray pencil beam modulated by the pencil beam shaping device 13 passes through the gap between the two detectors 14 and finally strikes the surface of the object 20 to be examined. The X-ray pen beam will penetrate a certain depth of the object 20 to be examined and interact with the object 20 to be examined. A portion of the X-rays are backscattered back and reach the front surface of the detector 14. With the scanning movement of the backscatter inspection system, the X-ray pen beam is moved over the surface of the object 20 to be inspected. Since the X-ray pen beam irradiated onto the object 20 to be inspected has a certain moving range and the receiving range of the front surface of the detector 14 needs to cover the backscattered X-rays of sufficient intensity from the moving range, the front surface of the detector 14 needs to have a sufficient area to receive the backscattered X-rays. In some embodiments, to collect backscattered X-rays of sufficient intensity within the area, the detector 14 may be configured as a polyhedron with a cavity that is capable of reflecting optical signals, i.e., the detector 14 has a certain thickness.
According to some embodiments of the present invention, the backscatter inspection system may further include a front panel 17 placed in front of the detector 14 for blocking foreign objects from contacting the detector 14. The front panel 17 may be used to block external dust, moisture, foreign substances, etc. from entering gaps between the detectors 14 or scratching the surface of the detectors 14. When the backscatter inspection system comprises a front panel 17, the X-ray pen beam passing through the slit between the two detectors 14 needs to penetrate the front panel 17 as well before reaching the object 20 to be inspected. The front panel 17 is typically made of a lighter material to reduce attenuation of radiation, such as acrylic, plastic, carbon fiber, etc. These materials attenuate X-rays less, but scatter more as X-rays pass through.
In backscatter inspection system 10, the X-ray pen beam may produce scatter from other surfaces before reaching the surface of object 20 to be inspected, which scatter may be detected as interfering scatter by detector 14 and thus affect the accuracy of the backscatter inspection. For example, when an X-ray pen beam passes through a gap between two detectors 14, scattered X-rays leaking from the pen beam forming device 13 may reach side surfaces of the two detectors 14 at the gap. Furthermore, scattered X-rays caused by the front panel 17 may also reach the surface of the detector 14 as disturbing scatter when the X-ray pen beam penetrates the front panel 17. Both types of scatter may be interfering scatter to the detector 14.
In accordance with an embodiment of the present invention, to reduce the effect of interfering scatter on the detector 14, the backscatter inspection system 10 may further include shielding. The structure of the shielding device and the backscatter inspection system including the shielding device are described below with reference to the drawings. Fig. 3 is a schematic diagram of a backscatter inspection system including a shielding apparatus according to some embodiments of the invention. Fig. 4 is a schematic view of the shielding device shown in fig. 3. Fig. 5 is a schematic diagram of a backscatter inspection system including a shielding apparatus according to some embodiments of the invention. Fig. 6 is a schematic view of the shielding device shown in fig. 5. It should be noted that the housing 11 is shown only partially in section in fig. 3 and 5 for ease of illustration and to avoid obscuring the emphasis, and that the X-ray source 12, the pencil forming arrangement 13, the controller 15 and the display 16 of the backscatter inspection system 10 are not shown. The description of these not shown components is referred to above and will not be repeated here.
As shown in fig. 3 and 5, shielding 18 may be provided adjacent the gap between two detectors 14 and/or at the front surface of the detectors 14 to reduce the effect on the detectors 14 of scatter caused before the X-ray pen beam reaches the object to be examined.
In an exemplary embodiment, as shown in fig. 4 and 6, the shielding device 18 may include a slot shielding portion 81 and a front side shielding portion 82. The slit shielding portion 81 serves to shield interference scattering in the slit between the two detectors 14. The front shielding portion 82 serves to shield the interference scatter at a position near the slit of the front surface of the detector 14.
In an exemplary embodiment, the shielding device 18 may include two slot shielding portions 81 and two front side shielding portions 82. Thereby, the shielding device 18 is divided into two shielding units each including one slot shielding portion 81 and one front side shielding portion 82. One for one detector 14 and the other for the other detector 14. The two slit shielding portions 81 are arranged spaced apart to form a gap and the gap is aligned with the pencil beam shaping means of the backscatter inspection system to enable an X-ray pencil beam to pass through the gap. Further, the two front shielding portions 82 are spaced apart to form a gap, and the gap is aligned with the pencil beam forming device to enable the X-ray pencil beam to pass through the gap.
According to some embodiments of the present invention, as shown in fig. 4, two slot shielding portions 81 and two front side shielding portions 82 may be integrally formed. For example, the shielding device 18 may be integrally formed in a flat barrel shape open at both ends. The two slot-shielding portions 81 may be attached to side surfaces of the two detectors 14, respectively, and the two front-side shielding portions 82 may be attached to front surfaces of the two detectors 14 at junctions of the side surfaces and the front surfaces of the detectors 14, respectively. The two slot-shielding portions 81 may be connected at both lateral sides thereof by side plates. The two slit-shielding sections 81 and the two side plates may form an opening on the X-ray entrance side and an opening on the X-ray exit side. The X-ray pen beam can enter from the opening on the X-ray entrance side, pass through the gap between the slit shielding parts 81 and exit from the opening on the X-ray exit side. The X-ray pen beam will sweep through a fan-shaped space with a certain thickness. The gap between the slit shield portions 81 allows a fan-shaped space having a certain thickness swept by the X-ray pen beam to pass therethrough. In some embodiments, the slot shield portion 81 may have a generally fan shape. The area of the aperture shielding portion 81 is large enough to cover the sector area swept by the X-ray pen beam entering the aperture. The two side plates may be closed at both lateral sides of the slit shielding portion 81, thereby further facilitating blocking of interference scatter leaking from the pencil beam forming device 13 and/or interference scatter from the front plate 17 from reaching the side surfaces of the two detectors 14 at the slit.
According to some embodiments of the present invention, as shown in fig. 5 and 6, the shielding device 18 may include two independent shielding units, i.e., two slit shielding portions 81 for the two detectors 14, respectively, are separated from each other, and front side shielding portions 82 for the two detectors 14, respectively, are also separated from each other. In some embodiments, the slot shielding portion 81 and the front side shielding portion 82 for one detector 14 may be integrally formed, and the slot shielding portion 81 and the front side shielding portion 82 for the other detector 14 may be integrally formed. The two slot-shielding portions 81 may be attached to side surfaces of the two detectors 14, respectively, and the two front-side shielding portions 82 may be attached to front surfaces of the two detectors 14 at junctions of the side surfaces and the front surfaces of the detectors 14, respectively. The gap between the slit shield portions 81 allows a fan-shaped space having a certain thickness swept by the X-ray pen beam to pass therethrough. The area of the aperture shielding portion 81 is large enough to cover the sector area swept by the X-ray pen beam entering the aperture. In some embodiments, the area of the two-piece aperture shielding portion 81 may cover the side surfaces of the two detectors 14, so that interference scatter leaking from the pencil beam shaping device 13 and/or interference scatter from the front panel 17 may be more advantageously blocked from reaching the aperture-located side surfaces of the two detectors 14.
The front shielding portion 82 of the shielding device 18 is mainly used to shield interfering scatter occurring when the X-ray pen beam reaches and penetrates the front panel 17. This portion of the disturbing scatter will reach the detector 14 closest to where the X-ray pen beam reaches the front panel 17, i.e. the junction of the side and front surfaces of the detector 14. The front shielding portion 82 of the shielding device 18 may be disposed to cover an edge of the front surface of the detector 14 near the side surface. The area or width of the front shield portion 82 (the distance extending from the intersection of the side surface and the front surface of the detector 14) may be determined according to, for example, the material of the front panel 17 and the intensity of interference scattering, etc. The thickness of the slot shield portion 81 and/or the front side shield portion 82 of the shielding device 18 may be determined according to the desired shielding effect and the material used. The shielding device 18 may be fixed to the housing 11 or other specially designed holder.
In some embodiments, the shielding device 18 may be made of a high atomic number metal material, such as lead, tin, iron, tungsten, or alloys thereof, for better shielding effect. In some embodiments, to reduce the weight of the shielding 18 and the backscatter inspection system, the shielding 18 may be made of a low atomic number metallic material, such as aluminum, copper, or alloys thereof.
The above description describes the shielding device 18 as including both the slit shielding portion 81 and the front side shielding portion 82. However, the present invention is not limited thereto. For example, in the case where the interference scattering from the front panel 17 is strong, the shielding device 18 may include only the front side shielding portion 82 without the slit shielding portion 81 located between the two detectors 14. In case the interference scatter from the front panel 17 is weak, the shielding device 18 may comprise only the slot shielding portion 81 between the two detectors 14 without the front side shielding portion 82.
The slot shielding portion 81 and the front side shielding portion 82 of each shielding unit are integrally formed as described above. However, the present invention is not limited thereto. According to some embodiments of the present invention, the slot shielding portion 81 and the front side shielding portion 82 of each shielding unit may also be separately formed and separately installed.
According to an embodiment of the invention, the backscatter inspection system comprises shielding means that reduce the influence of scatter on the detector caused before the X-ray pen beam reaches the object to be inspected, i.e. that reduce the influence of disturbing scatter caused inside the backscatter inspection system. Therefore, the backscattering inspection system comprising the shielding device can effectively reduce the influence of internal interference scattering on scanning imaging and improve the quality of a backscattering image, such as image contrast and the like.
While the invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the construction and methods of the embodiments described above. On the contrary, the invention is intended to cover various modifications and equivalent arrangements. In addition, while the various elements and method steps of the disclosed invention are shown in various example combinations and configurations, other combinations, including more, less or all, of the elements or methods are also within the scope of the invention.

Claims (10)

1. A backscatter inspection system, comprising:
an X-ray source for generating X-rays;
the pencil beam forming device is used for modulating the X rays generated by the X ray source into an X ray pencil beam;
two detectors for receiving X-rays scattered from a back of an object to be inspected upon irradiation of a modulated X-ray pen beam thereto, the two detectors being spaced apart to form a gap, the detectors comprising a receiving face for facing the object to be inspected; and
shielding means located adjacent to the gap between the two detectors and/or the receiving face of the detector for reducing the effect of scatter on the detector caused before the X-ray pen beam reaches the object to be examined.
2. The backscatter inspection system of claim 1, wherein the shielding means comprises two slit shielding portions for the two detectors, respectively, disposed in the slit between the two detectors and forming a gap, wherein the gap between the two slit shielding portions is aligned with the pencil beam forming means to enable the modulated X-ray pencil beam to pass through the gap between the two slit shielding portions.
3. The backscatter inspection system of claim 2, further comprising a front panel disposed in front of the receiving face of the detector for blocking foreign objects from contacting the detector.
4. The backscatter inspection system of claim 3, wherein the shielding device comprises two front side shielding portions for the two detectors, respectively, disposed between the front panel and the receiving face of the detectors and covering a portion of the receiving face of the detectors proximate to the gap, the two front side shielding portions being spaced apart to form a gap, the gap between the two front side shielding portions being aligned with the pencil beam forming device to enable the modulated X-ray pencil beam to pass through the gap between the two front side shielding portions.
5. The backscatter inspection system of claim 4, wherein the slot-shield portion and the front-side shield portion for one detector are integrally formed, and the slot-shield portion and the front-side shield portion for the other detector are integrally formed.
6. The backscatter inspection system of claim 5, wherein the two slot shield portions and the two front side shield portions for the two detectors, respectively, are integrally formed.
7. The backscatter inspection system of claim 1, further comprising a front panel disposed in front of the receiving face of the detector for blocking foreign objects from contacting the detector,
wherein the shielding device comprises two front side shielding portions arranged between the front panel and the receiving face of the detector and covering a portion of the receiving face of the detector close to the slit, the two front side shielding portions being spaced apart to form a gap, the gap between the two front side shielding portions being aligned with the pencil beam forming device to enable the modulated X-ray pencil beam to pass through the gap between the two front side shielding portions.
8. The backscatter inspection system of any one of claims 1 to 7, further comprising an enclosure within which the X-ray source, the pencil beam forming device, the two detectors, and the shielding device are disposed.
9. The backscatter inspection system of claim 8, further comprising a controller to generate a backscatter X-ray image from backscatter X-rays received by the detector.
10. The backscatter inspection system of claim 8, further comprising a display for displaying the backscatter X-ray image generated by the controller.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115855990A (en) * 2023-02-15 2023-03-28 同方威视技术股份有限公司 Back scattering inspection device for detecting m-layer structure object to be inspected

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030063708A1 (en) * 2001-10-02 2003-04-03 Takehiko Shoji Cassette for radiographic imaging, radiographic image reading apparatus and radiographic image reading method
DE102006046033A1 (en) * 2006-09-28 2008-04-03 Siemens Ag Scattered-ray grid for screening X-ray detector against a scattering radiation, comprises scattered-ray grid lamellas formed as screening device for electrical and/or magnetic interference fields and coated by ferromagnetic material
CN101706460A (en) * 2009-11-17 2010-05-12 公安部第一研究所 Miniature back scattering X-ray inspection device
CN202928969U (en) * 2012-10-24 2013-05-08 清华大学 Ray emission device and imaging system
CN103901485A (en) * 2012-12-27 2014-07-02 同方威视技术股份有限公司 Human body safety check system
CN105445303A (en) * 2015-12-29 2016-03-30 清华大学 Handheld back-scatter imager and back-scatter imaging method
US20170023696A1 (en) * 2015-03-20 2017-01-26 Rapiscan Systems, Inc. Hand-Held Portable Backscatter Inspection System
CN109031441A (en) * 2018-08-16 2018-12-18 东莞深圳清华大学研究院创新中心 A kind of X-ray back scattering scanner and scan method
CN208752213U (en) * 2018-08-16 2019-04-16 东莞深圳清华大学研究院创新中心 A kind of X-ray back scattering scanner
US20190242834A1 (en) * 2018-02-02 2019-08-08 Heuresis Corporation System and Kit for X-Ray Backscatter Imaging with Removable Detector

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2862043A1 (en) * 2012-01-27 2013-08-01 American Science And Engineering, Inc. Hand-held x-ray backscatter imaging device
CN102707324B (en) * 2012-05-21 2015-01-21 貊梁 Backscatter and transmission combined safety detector of X rays
CN108121014A (en) * 2017-12-07 2018-06-05 公安部第三研究所 Perspective view scatters array detection system and method
CN111624217A (en) * 2020-06-10 2020-09-04 浙江云特森科技有限公司 Flying spot scanning device and security check equipment

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030063708A1 (en) * 2001-10-02 2003-04-03 Takehiko Shoji Cassette for radiographic imaging, radiographic image reading apparatus and radiographic image reading method
DE102006046033A1 (en) * 2006-09-28 2008-04-03 Siemens Ag Scattered-ray grid for screening X-ray detector against a scattering radiation, comprises scattered-ray grid lamellas formed as screening device for electrical and/or magnetic interference fields and coated by ferromagnetic material
CN101706460A (en) * 2009-11-17 2010-05-12 公安部第一研究所 Miniature back scattering X-ray inspection device
CN202928969U (en) * 2012-10-24 2013-05-08 清华大学 Ray emission device and imaging system
CN103901485A (en) * 2012-12-27 2014-07-02 同方威视技术股份有限公司 Human body safety check system
US20170023696A1 (en) * 2015-03-20 2017-01-26 Rapiscan Systems, Inc. Hand-Held Portable Backscatter Inspection System
CN105445303A (en) * 2015-12-29 2016-03-30 清华大学 Handheld back-scatter imager and back-scatter imaging method
US20190242834A1 (en) * 2018-02-02 2019-08-08 Heuresis Corporation System and Kit for X-Ray Backscatter Imaging with Removable Detector
CN109031441A (en) * 2018-08-16 2018-12-18 东莞深圳清华大学研究院创新中心 A kind of X-ray back scattering scanner and scan method
CN208752213U (en) * 2018-08-16 2019-04-16 东莞深圳清华大学研究院创新中心 A kind of X-ray back scattering scanner

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115855990A (en) * 2023-02-15 2023-03-28 同方威视技术股份有限公司 Back scattering inspection device for detecting m-layer structure object to be inspected
CN115855990B (en) * 2023-02-15 2023-04-28 同方威视技术股份有限公司 Back scattering inspection device for detecting m-layer structure object to be inspected

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