CN114077090A - Color film substrate and manufacturing method thereof, display panel and display device - Google Patents

Color film substrate and manufacturing method thereof, display panel and display device Download PDF

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Publication number
CN114077090A
CN114077090A CN202111435058.5A CN202111435058A CN114077090A CN 114077090 A CN114077090 A CN 114077090A CN 202111435058 A CN202111435058 A CN 202111435058A CN 114077090 A CN114077090 A CN 114077090A
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Prior art keywords
color
layer
substrate
resist layer
film substrate
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CN202111435058.5A
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Chinese (zh)
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CN114077090B (en
Inventor
孙语琳
古宏刚
邵贤杰
王炎
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Nanjing Boe Display Technology Co ltd
BOE Technology Group Co Ltd
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Nanjing Boe Display Technology Co ltd
BOE Technology Group Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

The application relates to a color film substrate, a manufacturing method thereof, a display panel and a display device, wherein the color film substrate comprises: a substrate including a display region and a non-display region; the black matrix is formed on the substrate base plate, and a groove penetrating through the black matrix is formed in the black matrix positioned in the non-display area; a color resist layer formed on the display region of the substrate base plate; and the shading layer is formed on the black matrix and covers the groove, and the shading layer corresponds to the color resistance layer. The color film substrate provided by the application can be compatible with display panels with three-sided frameless and four-sided frameless designs, can effectively prevent the problems of light leakage, light reflection and the like of grooves of black matrixes arranged in non-display areas, improves the display effect of the display device, and is strong in universality.

Description

Color film substrate and manufacturing method thereof, display panel and display device
Technical Field
The application relates to the technical field of display, in particular to a color film substrate, a manufacturing method of the color film substrate, a display panel and a display device.
Background
With the continuous development of the display industry, the four-side frameless display technology is becoming an important direction for the development of the future display field. The traditional three-edge frameless liquid crystal display device is provided with a display area and an opaque non-display area, wherein the non-display area is positioned outside the display area. In order to increase the anti-static Electricity (ESD) capability of the lcd panel, a groove penetrating through the black matrix in the non-display area of the lcd panel is usually dug to block the black matrix from transmitting static electricity from the non-display area to the display area of the lcd panel, so as to prevent poor image display caused by static electricity.
The light leakage phenomenon may occur at the groove of the black matrix, so that a bright line appears in the non-display area of the liquid crystal display panel, and the display quality of the liquid crystal display panel is affected. The conventional light shielding layer is generally suitable for a three-side borderless (3side borderless) display panel, and for a four-side borderless (4side borderless) display panel, light leakage or light reflection at a groove cannot be effectively shielded, that is, the conventional scheme cannot be compatible with the three-side borderless and four-side borderless display panels, and the universality is low.
Disclosure of Invention
The embodiment of the application provides a color film substrate, a manufacturing method thereof, a display panel and a display device, and can solve the technical problems that in the prior art, the color film substrate cannot be compatible with three-edge frameless and four-edge frameless designs of the display panel, light leakage or light reflection phenomena are easy to occur, the display effect is influenced, and the universality is low.
According to one aspect of the present disclosure, a color filter substrate is provided, including:
a substrate including a display region and a non-display region;
the black matrix is formed on the substrate base plate, and a groove penetrating through the black matrix is formed in the black matrix positioned in the non-display area;
a color resist layer formed on the display region of the substrate base plate;
and the shading layer is formed on the black matrix and covers the groove, and the shading layer corresponds to the color resistance layer.
In some embodiments, the color-resist layer is a first color-resist layer or a second color-resist layer, the first color-resist layer and the second color-resist layer being formed using the same mask;
the light shielding layer comprises two strip-shaped first light shielding strips arranged at intervals of a first preset distance, and the width of each first light shielding strip is larger than that of the groove, so that when the formed color resistance layer is a first color resistance layer or a second color resistance layer, the groove is covered by the different first light shielding strips.
In some embodiments, the first preset distance is twice the distance between two adjacent color resists on the color resist layer.
In some embodiments, the color-resist layer is a first color-resist layer or a second color-resist layer, the first color-resist layer and the second color-resist layer being formed using the same mask;
the light shielding layer comprises a second light shielding strip with a first width, and the second light shielding strip can cover the groove when the formed color resistance layer is a first color resistance layer or a second color resistance layer.
In some embodiments, the first width is twice a spacing between two adjacent color resists on the color resist layer.
In some embodiments, the material of the light shielding layer is a blue color resist, a red color resist or a green color resist.
According to one of the schemes of the application, a method for manufacturing a color film substrate is also provided, and the method comprises the following steps:
forming a black matrix on a substrate base plate, wherein the substrate base plate comprises a display area and a non-display area;
forming a groove penetrating through the black matrix on the black matrix in the non-display area;
forming a color resistance layer on the display region of the substrate;
and forming a light shielding layer on the black matrix, wherein the light shielding layer covers the groove and corresponds to the color resistance layer.
In some embodiments, forming a color resist layer on the display area of the substrate base includes:
providing a first mask and a second mask, wherein the first mask is provided with a first color resistance pattern and a second color resistance pattern, and the second mask is provided with a third color resistance pattern;
and moving the corresponding first mask and/or second mask based on the determined pixel arrangement mode to form a first color resistance layer or a second color resistance layer.
According to one of the schemes of the application, a display panel is further provided, and the display panel comprises an array substrate and the color film substrate, wherein the color film substrate is a first color film substrate or a second color film substrate, and after the first color film substrate and the array substrate are paired, the display panel with no frame on three sides is formed; and the second color film substrate and the array substrate are oppositely arranged and turned over to form the display panel without frames on four sides.
According to one of the aspects of the present application, a display device is also provided, which includes the display panel.
According to the color film substrate and the manufacturing method thereof, the display panel and the display device, the light shielding layer is arranged to cover the groove of the black matrix in the non-display area, and the light shielding layer corresponds to the color resistance layer, so that the display panel with three-edge frameless design and four-edge frameless design can be compatible, the light leakage or light reflection phenomenon possibly occurring in the groove can be effectively prevented, the bright line in the non-display area of the display panel can be prevented, the display effect of the display panel can be ensured, and the display quality of the display panel can be improved. In addition, the color film substrate is compatible with the manufacture of the display panel with three-sided frameless design and four-sided frameless design, the universality of the color film substrate can be improved, and the manufacture cost of the display panel is reduced.
Drawings
Fig. 1 is a schematic structural diagram of a color film substrate provided with a light-shielding layer in the prior art;
fig. 2 is a schematic structural diagram of another color film substrate with a light-shielding layer in the prior art;
fig. 3 is a schematic side view illustrating a first color filter substrate according to an embodiment of the present disclosure;
fig. 4 is a schematic top-view structure diagram of a first color film substrate according to an embodiment of the present disclosure;
fig. 5 is a schematic side view illustrating a second color filter substrate according to an embodiment of the present disclosure;
fig. 6 is a schematic top-view structure diagram of a second color film substrate according to an embodiment of the present disclosure;
fig. 7 is a schematic top view illustrating a first color filter substrate according to an embodiment of the present disclosure;
fig. 8 is a schematic top-view structure diagram of another second color film substrate according to an embodiment of the present disclosure;
FIG. 9 is a schematic diagram illustrating a display panel according to an embodiment of the present disclosure;
fig. 10 is a schematic diagram illustrating a manufacturing process of another display panel according to an embodiment of the present application.
Reference numerals:
10-a first color film substrate; 20-a second color film substrate; 30-an array substrate;
1-substrate base plate, 11-display area, 12-non-display area; 2-black matrix, 21-trench; 3-color resistance layer, 31-first color resistance layer, 32-second color resistance layer, 301-first color resistance, 302-second color resistance and 303-third color resistance; 4-light-shielding layer, 41-first sub light-shielding tape, 42-second sub light-shielding tape, 43-second light-shielding tape; 5-mask, 51-first mask, 52-second mask.
Detailed Description
Various aspects and features of the present application are described herein with reference to the drawings.
It will be understood that various modifications may be made to the embodiments of the present application. Accordingly, the foregoing description should not be construed as limiting, but merely as exemplifications of embodiments. Those skilled in the art will envision other modifications within the scope and spirit of the application.
The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the application and, together with a general description of the application given above and the detailed description of the embodiments given below, serve to explain the principles of the application.
These and other characteristics of the present application will become apparent from the following description of preferred forms of embodiment, given as non-limiting examples, with reference to the attached drawings.
It is also to be understood that although the present application has been described with reference to some specific examples, those skilled in the art are able to ascertain many other equivalents to the practice of the present application.
The above and other aspects, features and advantages of the present application will become more apparent in view of the following detailed description when taken in conjunction with the accompanying drawings.
Specific embodiments of the present application are described hereinafter with reference to the accompanying drawings; however, it is to be understood that the disclosed embodiments are merely exemplary of the application, which can be embodied in various forms. Well-known and/or repeated functions and constructions are not described in detail to avoid obscuring the application of unnecessary or unnecessary detail. Therefore, specific structural and functional details disclosed herein are not to be interpreted as limiting, but merely as a basis for the claims and as a representative basis for teaching one skilled in the art to variously employ the present application in virtually any appropriately detailed structure.
The display panel generally includes an array substrate (TFT) and a color filter substrate (CF) which are arranged in a box-to-box manner, a first signal line is arranged on one side of the array substrate facing the color filter substrate, a second signal line for electrically connecting the first signal line and the flexible circuit board is arranged on one side of the color filter substrate facing the array substrate, a black matrix is arranged on the color filter substrate, and an orthographic projection of the second signal line on the color filter substrate is located in an orthographic projection of the black matrix on the color filter substrate.
When a display panel with a traditional three-sided frameless design (the upper side, the left side and the right side are all designed almost without frames), a color film substrate is arranged on the upper side, and an array substrate is arranged on the lower side (because the color film substrate is arranged on the upper side, a frame is required to shield a part of TFT regions). In order to improve the appearance attractiveness and user experience of the display panel, the display panel with the four-side frameless design becomes a future development trend, and in order to reduce the manufacturing cost and the like, the display panel with the four-side frameless design can adopt the same manufacturing mode as the display panel with the three-side frameless design, firstly, the display panel with the color film substrate on the upper part and the array substrate on the lower part is manufactured, then, the display panel (the color film substrate and the array substrate after box alignment) is turned over, and the display panel with the array substrate on the upper part and the array substrate on the lower part is formed for use.
The display panel with the four frameless sides omits a frame outside the color film substrate in the prior art, so that the black matrix covers the second signal circuit, the second signal circuit can be hidden on the back of the color film substrate, the influence of the second signal circuit on display is avoided, and the display effect is better.
Fig. 1 and fig. 2 show schematic structural diagrams of a color film substrate provided with a light-shielding layer in the prior art. As shown in fig. 1 and 2, although a light-shielding layer 4 is disposed in a color film substrate to shield a trench 21 of a black matrix 2 in the prior art, the light-shielding layer 4 is mainly suitable for a display panel with a three-sided frameless design, as shown in fig. 1, when the color film substrate is a first color film substrate 10 for manufacturing a display panel with a three-sided frameless structure, the light-shielding layer 4 may cover the trench 21 of the black matrix 2; as shown in fig. 2, when the color filter substrate manufactured by the same process is the second color filter substrate 20 used for manufacturing the display panel with no frame on four sides, the light-shielding layer 4 cannot cover the groove 21 on the black matrix 2, so that light leakage and light reflection occur, which affects the display effect of the display panel.
In view of the problems of light leakage and light reflection in the prior art that a light shielding layer arranged on a color film substrate cannot be compatible with three-sided and four-sided frameless designs of a display panel, embodiments of the present application provide a color film substrate and a manufacturing method thereof.
Fig. 3 to 8 are schematic structural diagrams illustrating a color filter substrate according to an embodiment of the present disclosure; fig. 9 and fig. 10 show schematic diagrams of manufacturing a color filter substrate according to an embodiment of the present application (including manufacturing of a subsequent display panel). As shown in fig. 3 to 10, an embodiment of the present application provides a color filter substrate, including:
a substrate base plate 1 including a display region 11 and a non-display region 12;
a black matrix 2 formed on the substrate 1, wherein a groove 21 penetrating the black matrix 2 is formed in the black matrix 2 in the non-display region 12;
a color resist layer 3 formed on the display region 11 of the base substrate 1;
and a light-shielding layer 4 formed on the black matrix 2 to cover the groove 21, the light-shielding layer 4 corresponding to the color resist layer 3.
Specifically, in the present embodiment, the non-display area 12 is a peripheral area of the display area 11. Since the black matrix 2 contains conductive carbon, external static electricity is easily conducted to the display region 11 through the black matrix 2 in the non-display region 12, and the grooves 21 are formed in the black matrix 2 in the non-display region 12 to prevent static electricity from being conducted to the display region 11, thereby preventing poor display of the display panel due to static electricity.
The color resistance layer 3 comprises a plurality of color resistances with different colors, and after light provided by the backlight unit passes through the color resistances with different colors, the liquid crystal display device can be colored. In this embodiment, the color-resisting layer 3 includes a first color-resisting layer 301, a second color-resisting layer 302 and a third color-resisting layer 303, and the first color-resisting layer 301, the second color-resisting layer 302 and the third color-resisting layer 303 may be a red color-resisting layer (R), a green color-resisting layer (G) and a blue color-resisting layer (B), respectively. Optionally, the color resists may also include color resists such as yellow resists, cyan resists, and magenta resists.
In this embodiment, the color resist layer 3 is a first color resist layer 31 or a second color resist layer 32, and the first color resist layer 31 and the second color resist layer 32 are formed by using the same mask 5, so that different color filter substrates can be formed to be suitable for different display panels. In this embodiment, the color film substrate with the first color resist layer 31 is a first color film substrate 10, and is used for manufacturing a three-sided frameless display panel; the color film substrate with the second color resist layer 32 is a second color film substrate 20, and is used for manufacturing a display panel with four borders and no frame.
In this embodiment, through setting up light shield layer 4 that covers slot 21, and light shield layer 4 corresponds with look resistance layer 3 and can prevent light leak or the reflection of light phenomenon that effective slot 21 department probably appears, prevents that display panel's non-display area from appearing the bright line, guarantees display panel's display effect, promotes display panel's display quality.
The light-shielding layer 4 corresponds to the color resist layer 3, on one hand, the light-shielding layer 4 can form a first color film substrate 10 as shown in fig. 3, 4 or 7 corresponding to the first color resist layer 31, or form a second color film substrate 20 as shown in fig. 5, 6 or 8 corresponding to the second color resist layer 32, so that an orthographic projection of the light-shielding layer 4 on the substrate 1 covers an orthographic projection of the trench 21 on the substrate 1 no matter the color film substrate is the first color film substrate 10 or the second color film substrate 20, and light leakage or light reflection of the trench 21 can be effectively prevented. On the other hand, the relative position relationship between the light-shielding layer 4 and at least one color resistor in the color resistor layer 3 corresponds to each other, so that a color film substrate formed by matching the light-shielding layer 4 and the color resistor layer 3 can be the first color film substrate 10 or the second color film substrate 20, a color film substrate suitable for a display panel with no frame on three sides or no frame on four sides can be manufactured under the condition that a Mask 5(Mask) is not added, the design of the display panel with no frame on three sides and no frame on four sides is compatible, the universality of the color film substrate is improved, and the cost is reduced.
It is understood that the display area 11 may also be provided with the black matrix 2, and the width of the black matrix 2 in the display area 11 is narrow, which is mainly for the purpose of isolating adjacent color resistances of different colors and is not considered.
In some embodiments, as shown in fig. 3 to 6, the light shielding layer 4 includes a first predetermined distance L1Two strip-shaped first light-shielding strips are arranged, the width of each first light-shielding strip is larger than that of the groove 21, so that when the formed color resistance layer 3 is the first color resistance layer 31 or the second color resistance layer 32, the groove 21 is covered by the different first light-shielding strips.
Specifically, the first light-shielding tape includes a first sub light-shielding tape 41 and a second sub light-shielding tape 42, as shown in fig. 3 and 4, when the color resist layer 3 formed on the black matrix 2 is the first color resist layer 31, the groove 21 may be shielded by the second sub light-shielding tape 42 adjacent to the first color resist layer 31; when the color resist layer 3 formed on the black matrix 2 is the second color resist layer 32, since the first color resist 301 formed after the movement is far away from the non-display region 12, at this time, as shown in fig. 5 and 6, the groove 21 can be shielded by the first sub light-shielding tape 41 far away from the second color resist layer 32, so that the light-shielding layer 4 of the manufactured color filter substrate can always shield the groove 21, and light leakage and light reflection are prevented.
The color resistors in the first color resist layer 31 are sequentially arranged as a first color resistor 301, a second color resistor 302 and a third color resistor 303 (for example, RGB arrangement), and the color resistors in the second color resist layer 32 are sequentially arranged as a third color resistor 303, a second color resistor 302 and a first color resistor 301 (for example, BGR arrangement).
As shown in fig. 9 and 10, the first color-resist layer 31 and the second color-resist layer 32 may be formed using both the first mask 51 and the second mask 52. The first mask 51 has a first color resist pattern corresponding to the first color resist 301 and a second color resist pattern corresponding to the second color resist 302, and the second mask 52 has a third color resist pattern corresponding to the third color resist 303. The first or second color resist layer 31 or 32 can be formed by moving the corresponding first mask 51 and/or second mask 52 based on a predetermined pixel arrangement.
The pixel array comprises a plurality of pixel units, each pixel unit comprises three sub-pixels with different colors, and the position color of each sub-pixel corresponds to the color resistance of the three colors respectively.
As shown in fig. 9, based on a predetermined pixel arrangement (for example, RGB arrangement), moving the first mask 51 a first distance in the first direction (left side) can move the first color pixel to a corresponding position for forming the first color resist pattern, and meanwhile, since the second color resist pattern corresponds to the second color pixel and the third color resist pattern corresponds to the third color pixel, the first, second, and third color resist layers arranged side by side corresponding to the arrangement order of the first, second, and third color pixels can be formed by keeping the first mask 51 and the second mask 52 still, thereby forming the first color resist layer 31 (the arranged color resist layer).
As shown in fig. 10, based on a predetermined pixel arrangement (e.g., BGR arrangement), the first mask 51 is moved a second distance along a second direction (right side) so that the first color resist pattern is moved to a position corresponding to the first color pixel, thereby forming a first color resist layer; then, the first mask 51 is kept still, and a second color resist layer is formed by using the second color resist pattern at the intermediate position; then, the second mask 52 is moved by a third distance in a third direction (left side) opposite to the second direction to form a third color resist layer, so that the third color resist layer, the second color resist layer, and the first color resist layer are formed in parallel corresponding to the arrangement order of the third color pixel, the second color pixel, and the first color pixel, and the second color resist layer 32 (the BGR-arranged resist layer) is formed.
In this embodiment, the color resistances of the first color resist layer and the second color resist layer are a red color resist and a green color resist, respectively, and the color resistance of the third color resist layer is a blue color resist. Since the blue color resists require a pattern of non-display areas, one mask 5 is used alone, while the red and green color resists do not require a pattern of the non-display areas, and thus, both can share one mask 5.
In a specific implementation, the first color resist layer 31 may be a color resist layer arranged in a GRB arrangement or other arrangement, or the first color resist layer 31 may be a color resist layer formed by other colors, which is not particularly limited in the present application. Similarly, the color of each color resistor in the second color resistor layer 32 and the arrangement of each color resistor are not specifically limited in this application. Since the second color resist layer 32 needs to form color resist layers corresponding to the color resist arrangements of the first color resist layer 31 (in this embodiment, the same arrangement) after being turned over so as to form a display panel without a frame on four sides, in this embodiment, the colors of the color resists and the arrangement of the color resists in the second color resist layer 32 can be determined based on the first color resist layer 31.
Further, the first preset distance L1Is twice the spacing between two adjacent color resists on the color resist layer 3 (i.e., L1＝L0)。
In this embodiment, the first predetermined distance L1The maximum distance that the mask 5 can move when the first color resist layer 31 and the second color resist layer 32 are formed is determined based on the color resists of different colors. In this embodiment, since the maximum moving distance is the third distance, which is at least twice as long as the distance between two adjacent color resists, the first preset distance L can be set without considering the black matrix 2 between different color resists1Twice the distance between two adjacent color resists is set to ensure that the first sub light-shielding tape 41 or the second sub light-shielding tape 42 shields the groove 21, respectively.
The distance between two adjacent color resistors is a sub-pixel size distance, so the first preset distance L1May be two sub-pixel size distances.
In one embodiment, the first predetermined distance L1Can be determined according to actual needs, and the application is not particularly limited. For example, to ensure the accuracy of the moving distance and thus to precisely cover the groove 21, the width of the black matrix between two adjacent color resistors may be considered to determine the first preset distance L1。
In other embodiments, as shown in fig. 7 and 8, the light-shielding layer 4 includes a second light-shielding tape 43 having the first width D, and the second light-shielding tape 43 can cover the groove 21 when the color-resist layer 3 is formed as the first color-resist layer 31 or the second color-resist layer 32.
In this embodiment, by providing the second light-shielding tape 43 having a wide width, the light-shielding layer 4 can always shield the groove 21 regardless of whether the color resist layer 3 is the first color resist layer 31 or the second color resist layer 32.
Further, the first width D is twice the distance between two adjacent color resists on the color resist layer 3 (i.e., D ═ L)0)。
Similar to the light-shielding layer 4 formed by the two stripe-shaped first light-shielding strips, the first width D is determined based on the maximum distance that the mask 5 corresponding to the color resists of different colors can move when the first color resist layer 31 and the second color resist layer 32 are formed, for example, the distance of two sub-pixel sizes in the present embodiment.
In particular, in some embodiments, as shown in fig. 4, 6, 7 and 8, the distance between the light shielding layer 4 and the first color resist layer corresponding to the first color resist 301 is fixed (all are L)2Or L3) The light-shielding layer 4 corresponds to the color resist layer 3. Specifically, as shown in fig. 4 and 6, the distance (center-to-center distance) between the center line of the first color resist layer 31 and the center line of the second sub light-shielding tape 42 is L2The distance between the center line of the first color resist layer of the second color resist layer 32 and the center line of the second sub light-shielding tape 42 is still L2. As shown in fig. 7 and 8, the distance between the center line of the first color resist layer 31 and the center line of the second light-shielding tape 43 is L3The distance between the center line of the first color resist layer of the second color resist layer 32 and the center line of the second light-shielding tape 43 is still L3。
In some embodiments, the material of the light shielding layer 4 is a blue color resist, a red color resist or a green color resist.
In particular, the light shielding layer 4 is preferably formed using a blue color resist preparation because of low transmittance of the blue color resist. Human eyes are sensitive to red color resistance and are easy to observe.
In this embodiment, since the light-shielding layer 4 is made of the color resist material, the light-shielding layer 4 and the color resist layer 3 can be made by the same process, thereby saving the manufacturing process. For example, when the light-shielding layer 4 is formed using a blue color resist, the light-shielding layer 4 may be formed simultaneously with the blue color resist of the color resist layer 3.
Based on the same inventive concept, an embodiment of the present application further provides a method for manufacturing a color film substrate, including:
s101: forming a black matrix 2 on a substrate base plate 1, wherein the substrate base plate 1 includes a display region 11 and a non-display region 12;
s102: forming a groove 21 penetrating through the black matrix 2 on the black matrix 2 in the non-display area 12;
s103: forming a color resist layer 3 on the display region 11 of the base substrate 1;
s104: and forming a light shielding layer 4 on the black matrix 2, wherein the light shielding layer 4 covers the groove 21, and the light shielding layer 4 corresponds to the color resistance layer 3.
When manufacturing the color film substrate, a substrate 1 is provided first. The substrate 1 may be a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate, and in the present embodiment, a glass substrate is preferable.
The black matrix 2 and the color resist layer 3 may be formed according to the prior art, for example, a black resin layer may be coated on the base substrate 1, the black matrix 2 may be formed by a patterning process, and the black resin layer may be exposed and developed using a mask to form the black matrix 2. Similarly, a photoresist material may be coated on the display region 11 of the base substrate 1, and the photoresist material may be exposed and developed using masks (the above-described first mask 51 and second mask 52) to form the resist layer 3.
In some embodiments, in step S103, forming a color-resist layer 3 on the display region 11 of the base substrate 1 includes:
s1031: providing a first mask 51 and a second mask 52, wherein the first mask 51 has a first color resistance pattern and a second color resistance pattern thereon, and the second mask 52 has a third color resistance pattern thereon;
s1032: and moving the corresponding first mask 51 and/or second mask 52 based on the determined pixel arrangement mode to form the first color resist layer 31 or the second color resist layer 32.
When the first color filter substrate 10 needs to be formed, the determined pixel arrangement mode may be RGB arrangement, and the first color resist layer 31 is formed by moving the corresponding first mask 51 and/or the second mask 52 based on the RGB arrangement sequence; when the second color filter substrate 20 needs to be formed, the determined pixel arrangement mode may be a BGR arrangement, and the second color resist layer 32 is formed by moving the corresponding first mask 51 and/or second mask 52 based on the BGR arrangement sequence.
The specific manufacturing method of the first color resist layer 31 or the second color resist layer 32 can refer to the above embodiment of the color film substrate, and details are not repeated here.
The light-shielding layer 4 and the color resist layer 3 can be fabricated in the same layer to form a color filter substrate as shown in fig. 3 or fig. 5.
As shown in fig. 9 and fig. 10, an embodiment of the present application further provides a display panel, which includes an array substrate 30 and the color film substrate, where the color film substrate is a first color film substrate 10 or a second color film substrate 20, and after the first color film substrate 10 and the array substrate 30 are paired, a three-sided frameless display panel is formed; and the second color film substrate 20 and the array substrate 30 are boxed and turned over to form a display panel with four sides without a frame.
This application can enough provide trilateral frameless's display panel, can provide four sides frameless's display panel again, and application scope is wide, and the display panel who provides can effectively prevent the light leak or reflect light, improves display panel's display effect.
The embodiment of the application also provides a display device which comprises the display panel. One example of the display device is a liquid crystal display device. The display device can be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a wearable watch, a navigator and the like.
The manufacturing method of the color film substrate, the display panel and the display device provided in the embodiment of the present application correspond to the color film substrate of the above embodiment, and any optional item in the embodiment of the color film substrate is also applicable to the manufacturing method of the color film substrate, the display panel and the embodiment of the display device, and is not described herein again.
The above embodiments are only exemplary embodiments of the present application, and are not intended to limit the present application, and the protection scope of the present application is defined by the claims. Various modifications and equivalents may be made by those skilled in the art within the spirit and scope of the present application and such modifications and equivalents should also be considered to be within the scope of the present application.

Claims (10)

1. A color film substrate is characterized by comprising:
a substrate including a display region and a non-display region;
the black matrix is formed on the substrate base plate, and a groove penetrating through the black matrix is formed in the black matrix positioned in the non-display area;
a color resist layer formed on the display region of the substrate base plate;
and the shading layer is formed on the black matrix and covers the groove, and the shading layer corresponds to the color resistance layer.
2. The color filter substrate according to claim 1, wherein the color resist layer is a first color resist layer or a second color resist layer, and the first color resist layer and the second color resist layer are formed using the same mask;
the light shielding layer comprises two strip-shaped first light shielding strips arranged at intervals of a first preset distance, and the width of each first light shielding strip is larger than that of the groove, so that when the formed color resistance layer is a first color resistance layer or a second color resistance layer, the groove is covered by the different first light shielding strips.
3. The color filter substrate according to claim 2, wherein the first predetermined distance is twice a distance between two adjacent color resistors on the color resistor layer.
4. The color filter substrate according to claim 1, wherein the color resist layer is a first color resist layer or a second color resist layer, and the first color resist layer and the second color resist layer are formed using the same mask;
the light shielding layer comprises a second light shielding strip with a first width, and the second light shielding strip can cover the groove when the formed color resistance layer is a first color resistance layer or a second color resistance layer.
5. The color filter substrate according to claim 4, wherein the first width is twice a distance between two adjacent color resists on the color resist layer.
6. A color film substrate according to any one of claims 1 to 5, wherein the light-shielding layer is made of a blue color resist, a red color resist or a green color resist.
7. A manufacturing method of a color film substrate is characterized by comprising the following steps:
forming a black matrix on a substrate base plate, wherein the substrate base plate comprises a display area and a non-display area;
forming a groove penetrating through the black matrix on the black matrix in the non-display area;
forming a color resistance layer on the display region of the substrate;
and forming a light shielding layer on the black matrix, wherein the light shielding layer covers the groove and corresponds to the color resistance layer.
8. The method of claim 7, wherein forming a color resist layer on the display area of the substrate base plate comprises:
providing a first mask and a second mask, wherein the first mask is provided with a first color resistance pattern and a second color resistance pattern, and the second mask is provided with a third color resistance pattern;
and moving the corresponding first mask and/or second mask based on the determined pixel arrangement mode to form a first color resistance layer or a second color resistance layer.
9. A display panel, comprising an array substrate and the color film substrate according to any one of claims 1 to 6, wherein the color film substrate is a first color film substrate or a second color film substrate, and after the first color film substrate and the array substrate are paired, the display panel without a frame on three sides is formed; and the second color film substrate and the array substrate are oppositely arranged and turned over to form the display panel without frames on four sides.
10. A display device characterized by comprising the display panel according to claim 9.
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