CN114069368A

CN114069368A - Laser light source device containing solid-state slice group and measuring system

Info

Publication number: CN114069368A
Application number: CN202010759882.5A
Authority: CN
Inventors: 杨尚达; 卢志轩; 郭展佑; 林兆阳
Original assignee: Individual
Current assignee: Individual
Priority date: 2020-07-31
Filing date: 2020-07-31
Publication date: 2022-02-18

Abstract

A laser light source device containing a solid-state slice group and a measuring system are provided, wherein the laser light source device is used for providing a light beam path to generate a first laser beam and a second laser beam, and the laser light source device comprises a laser generator, at least one spread spectrum unit and a pulse beam splitter on the light beam path. The laser generator is used for generating an original laser beam with the pulse duration less than 1 ps. The spread spectrum unit is arranged at the rear stage of the laser generator and comprises a solid-state sheet group, wherein the solid-state sheet group comprises a plurality of solid-state sheets, and the solid-state sheets are sequentially arranged along the beam path. The pulse beam splitter is configured at the rear stage of the laser generator and is used for splitting the original laser beam into a first laser beam and a second laser beam. Therefore, the first laser beam and the second laser beam have the characteristics of short pulse, high repetition rate, high brightness and super-continuous spectrum.

Description

Laser light source device containing solid-state slice group and measuring system

Technical Field

The present invention relates to a laser source device and a measuring system, and more particularly, to a laser source device and a measuring system including a solid-state slice group.

Background

Ultra fast Spectroscopy (Ultrafast Spectroscopy) is an important tool for novel material measurement and basic scientific analysis, and in the prior art of Spectroscopy, two different sets of optical devices or elements are used to establish the beam paths of a Pump beam and a Probe beam, respectively, according to the characteristics required by the Pump (Pump) beam (i.e., excitation beam) and the Probe (Probe) beam, respectively. For example, most of the pump beams use wavelength conversion devices, such as an Optical Parametric Amplifier (OPA), an Optical Parametric oscillator, etc., and the probe beams are focused on the bulk crystal to generate a super-continuum spectrum.

However, there are still other problems to be improved in the laser source device applying the above-mentioned technologies in the prior art. For example, the absorption band of faster Gain Medium (Gain Medium) cannot be directly pumped by diode laser, but currently, the technical pump of solid-state laser and frequency doubling module is still relied on, and the cost is that the average power of light output is limited to about ten watts, the pulse repetition rate is about several kilohertz (kHz), so that the signal-to-noise ratio is reduced due to insufficient luminous flux, and the measurement time is lengthened due to low repetition rate, which is not favorable for most applications. Furthermore, the ultrafast spectroscopy pump beam needs to provide a short pulse capable of modulating the central wavelength range, and the most widely used wavelength conversion device is an optical parametric amplifier, but the wavelength capable of supporting is generally only about tens of nanometers (nm), and the crystal angle needs to be precisely adjusted to satisfy the phase matching condition when the required wavelength is switched, so that the system is very sensitive to the light path and beam directivity, needs frequent maintenance by experts for a long time, is not favorable for users to rapidly switch the wavelength, and is also not favorable for cross-field application. On the other hand, the ultra-short pulse is focused on the bulk crystal, although the ultra-continuous spectrum can be generated through the high-intensity nonlinear effect as the probe beam of the ultra-fast spectroscopy, the beam has the self-focusing characteristic due to the space kerr effect, so that the power density of light can be increased along with the increase of the transmission distance until the bulk crystal is damaged, the upper limit of the input pulse energy is limited by the damage threshold of the bulk crystal, and the output ultra-continuous spectrum pulse energy and the measurement signal-to-noise ratio are further limited.

In short, because the ultrafast spectrum signal is weak, the signal-to-noise ratio must be increased after a plurality of pulse measurements, and the number of measurements is substantially proportional to the repetition rate of the laser, which often causes the problem of too long measurement time. Furthermore, the stability of the laser system is also inversely proportional to the time, for example, the longer the measurement time, the higher the noise, and therefore, in addition to the too long measurement time, the more serious noise problem is generated.

In view of the above, there is a need in the current market for ultrafast spectroscopy to develop a laser source apparatus and a measurement system that have narrow pulse and high bandwidth characteristics, effectively improve the problems of low repetition rate and light source brightness, and reduce the complexity of the beam path configuration.

Disclosure of Invention

The invention provides a laser light source device and a measuring system, and through the configuration of a laser generator, a solid-state slice group and a pulse beam splitter, a first laser beam and a second laser beam emitted by the laser light source device have the characteristics of short pulse, high repetition rate, high brightness and super-continuous spectrum, and are further beneficial to being widely applied to different fields.

According to an embodiment of the present invention, a laser source apparatus for providing a beam path to generate a first laser beam and a second laser beam includes a laser generator, at least one spreading unit, and a pulse splitter. The laser generator is used for generating an original laser beam with the pulse duration less than 1 ps. The spread spectrum unit is arranged at the rear stage of the laser generator and comprises a solid-state sheet group, wherein the solid-state sheet group comprises a plurality of solid-state sheets, and the solid-state sheets are sequentially arranged along the beam path. The pulse beam splitter is configured at the rear stage of the laser generator and is used for splitting the original laser beam into a first laser beam and a second laser beam. Therefore, the first laser beam and the second laser beam emitted by the laser light source device have the characteristics of short pulse, high repetition rate, high brightness and super-continuous frequency spectrum, and are further beneficial to being widely applied to different fields.

The laser source apparatus according to the foregoing embodiment, wherein the spreading unit may sequentially include a solid-state slice group and a dispersion compensator along the beam path.

The laser light source apparatus according to the foregoing embodiment, wherein the dispersion compensator may be a chirped mirror.

The laser source device according to the aforementioned embodiments, wherein the laser source device further includes a wavelength converter disposed at a rear stage of the laser generator.

The laser light source device according to the foregoing embodiment, wherein the pulse splitter may be a surface reflector, an interferometer or a beam splitter, and the wavelength converter may be a second harmonic generator.

The laser source device according to the foregoing embodiment, wherein the number of the at least one spreading unit may be at least two, and the at least two spreading units are sequentially arranged along the beam path.

The laser source device according to the foregoing embodiments, wherein the pulse splitter can be disposed at a later stage of the spread spectrum unit and the wavelength converter.

The laser source device according to the aforementioned embodiment, wherein the spreading unit, the pulse splitter and the wavelength converter are sequentially disposed at a later stage of the laser generator, and the wavelength converter is used for converting at least one of the frequency spectrum of the first laser beam and the frequency spectrum of the second laser beam.

The laser source apparatus according to the aforementioned embodiments, wherein the pulse duration of the terminal of the first laser beam and the pulse duration of the terminal of the second laser beam are both less than 300 fs.

The laser light source device according to the foregoing embodiment contributes to reducing the complexity of the arrangement of the light beam path in the laser light source device.

According to another embodiment of the present invention, a measurement system for providing a beam path to generate a first laser beam and a second laser beam, at least one of the first laser beam and the second laser beam being incident on an object to be measured, the measurement system includes a laser generator, at least one spreading unit, a pulse splitter, and a position of the object to be measured on the beam path. The laser generator is used for generating an original laser beam with the pulse duration less than 1 ps. The spread spectrum unit is arranged at the rear stage of the laser generator and comprises a solid-state sheet group, wherein the solid-state sheet group comprises a plurality of solid-state sheets, and the solid-state sheets are sequentially arranged along the beam path. The pulse beam splitter is configured at the rear stage of the laser generator and is used for splitting the original laser beam into a first laser beam and a second laser beam. The position of the object to be measured is arranged at the rear stage of the spread spectrum unit and the pulse beam splitter, and the position of the object to be measured is provided for the object to be measured to be arranged. Therefore, the high repetition rate characteristic provided by the measuring system can effectively shorten the measuring time.

The measurement system according to the aforementioned embodiment, wherein the spreading unit may comprise a solid-state slice group and a dispersion compensator in sequence along the beam path.

The measuring system according to the foregoing embodiment, wherein the number of the at least one spreading unit may be at least two, and the at least two spreading units are sequentially arranged along the beam path. The measuring system may further include a wavelength converter disposed at a rear stage of the laser generator.

The measurement system according to the foregoing embodiment, wherein the pulse splitter can be disposed at a later stage of the spread spectrum unit and the wavelength converter.

The measuring system according to the aforementioned embodiment, wherein the spreading unit, the pulse splitter and the wavelength converter are sequentially disposed at a later stage of the laser generator, and the wavelength converter is configured to convert at least one of the frequency spectrum of the first laser beam and the frequency spectrum of the second laser beam.

The measuring system according to the foregoing embodiment, wherein the measuring system is configured such that the pulse duration of the at least one of the first laser beam and the second laser beam incident on the object is less than 300 fs.

The measurement system according to the foregoing embodiment, wherein the first laser beam is configured to be incident and excite the object to be measured to an excited state.

The measurement system according to the aforementioned embodiments, wherein the measurement system may further include a spectrometer disposed at a later stage of the position of the object to be measured.

The measuring system according to the foregoing embodiment, wherein the second laser beam is capable of being incident on and passing through the object to be measured, and a delay time of a time when the second laser beam is incident on the object to be measured relative to a time when the first laser beam is incident on the object to be measured is greater than-100 ps and less than 10 ms.

The measurement system according to the aforementioned embodiment, wherein the first laser beam is used to make the object to be measured emit a fluorescence beam, the measurement system further includes an up-conversion crystal disposed at a rear stage of the position of the object to be measured, the fluorescence beam and the second laser beam are used to enter the up-conversion crystal, and a portion of the fluorescence beam is converted into an up-conversion fluorescence signal after passing through the up-conversion crystal.

The measuring system according to the aforementioned embodiment, wherein the measuring system may be a material measuring system or a photoluminescence measuring system of an object.

By the measuring system of the foregoing embodiment, the measuring system is facilitated to be applied to spectral measurement.

Drawings

Fig. 1A shows a block diagram of a laser light source apparatus according to a first embodiment of the present invention;

fig. 1B shows another block diagram of the laser light source device of the first embodiment;

fig. 1C shows a further block diagram of the laser light source device of the first embodiment;

fig. 1D shows a spectrum diagram of a laser light source apparatus of the first embodiment;

fig. 2 shows a block diagram of a laser light source device of a second embodiment of the present invention;

fig. 3 is a block diagram showing a laser light source device according to a third embodiment of the present invention;

fig. 4 is a block diagram showing a laser light source device according to a fourth embodiment of the present invention;

fig. 5 is a block diagram showing a laser light source device according to a fifth embodiment of the present invention;

FIG. 6A shows a block diagram of a measurement system of a sixth embodiment of the invention;

fig. 6B shows a configuration diagram of a measurement system of a sixth embodiment;

fig. 6C is a schematic view showing the measurement result of the measurement system of the sixth embodiment;

FIG. 6D is a schematic view showing another measurement result of the measurement system of the sixth embodiment;

FIG. 7A shows a block diagram of a measurement system of a seventh embodiment of the invention; and

fig. 7B shows a configuration diagram of a measurement system of the seventh embodiment.

Description of reference numerals:

6000,7000: measuring system

100,200,300,400,500: laser light source device

130,230,330,430,530: laser generator

140,143,240,340,440,540,543: spread spectrum unit

150,153,250,350,450,550,553: solid sheet set

155,555: solid flakes

160,163,260,360,460,560,563: dispersion compensator

170,270,370,470,570: wavelength converter

180,280,380,480,580: pulse light splitter

101,102,103,104,501,502,503,504: convex lens

191,192,193,591,592: plane mirror

6300,7300: position of the object to be measured

6221: light modulator

7001: convex lens

6991,6992,6993,6994,6995,6996,6997,7991,7992,7993,7994,7995,7996,7997,7998: plane mirror

6441,6442,7441,7442,7443: concave mirror

7700: up-conversion crystal

6800,7800: prism

6900,7900: light detector

10,20,30,40,50: original laser beam

11,21,31,41,51: first laser beam

12,22,32,42,52: second laser beam

56: fluorescent light beam

57: up-conversion of fluorescent signals

63,73: test object

Detailed Description

Various embodiments of the present invention will be described below with reference to the accompanying drawings. For the purpose of clarity, numerous implementation details are set forth in the following description. It should be understood, however, that these implementation details are not to be interpreted as limiting the invention. That is, in some embodiments of the invention, these implementation details are not necessary. In addition, some conventional structures and elements are shown in simplified schematic form in the drawings for the sake of simplifying the drawings; and repeated elements will likely be referred to using the same reference numerals.

Fig. 1A is a block diagram of a laser light source device 100 according to a first embodiment of the invention, which is also a schematic diagram of the laser light source device 100 generating a first laser beam 11 and a second laser beam 12. As shown in fig. 1A, the laser source apparatus 100 is configured to provide a beam path (not numbered) to generate the first laser beam 11 and the second laser beam 12, and the laser source apparatus 100 includes a laser generator 130, a spreading unit 140 and a Pulse Splitter (Pulse Splitter)180 on the beam path.

The laser generator 130 is used to generate a raw laser beam 10 with a Pulse Duration (Pulse Duration) less than 1 ps. The spread unit 140 is disposed at a rear stage of the laser generator 130, the spread unit 140 includes a solid sheet group (MPC) 150, the solid sheet group 150 includes a plurality of solid sheets 155 for spectrum spreading, and the solid sheets 155 are sequentially disposed along the beam path (i.e. along the beam propagation direction) at the pruster angle (i.e. in series), as shown in fig. 6B. The pulse splitter 180 is disposed at a rear stage of the laser generator 130, and the pulse splitter 180 is used for splitting the original laser beam 10 into a first laser beam 11 and a second laser beam 12. Therefore, the laser generator 130 is selected to generate the original laser beam 10 with a high repetition rate of less than 1ps, and the solid-state spreading mechanism of the solid-state slice group 150 is used to generate the super-continuous spectrum, so that the first laser beam 11 and the second laser beam 12 emitted by the laser source device 100 have the characteristics of short pulse, high repetition rate, high brightness and super-continuous spectrum, i.e., have good light source quality, and are further suitable for being widely applied in different fields. Furthermore, the laser source apparatus 100 avoids the complexity of using two different sets of optical devices or components to respectively establish two laser beams, and thus has the advantages of simplicity, compactness and economy. In addition, the laser generator 130 can be used to generate a raw laser beam 10 having a pulse duration less than 500fs (femtoseconds). In other laser source devices (not shown) according to the present invention, the laser source device can be used to provide a beam path to generate at least three laser beams (i.e. a first laser beam, a second laser beam, a third laser beam or more laser beams).

In the first embodiment, the laser generator 130 generates the original laser beam 10 with a pulse duration less than 1ps through the ytterbium (Yb) doped gain medium, amplifies the Energy Density (Energy Density) or Intensity (Intensity), and helps the first laser beam 11 and the second laser beam 12 to reach a higher average power, so that the pulse train with a repetition rate of tens of khz to mhz can be supported, and the generated high light flux can greatly increase the signal-to-noise ratio and shorten the measurement time, so as to create an ultrafast spectroscopy measurement platform with a high average wattage, a high repetition rate, and an easily and rapidly modulated operating wavelength. In addition, the Laser generator in the Laser source device according to the present invention can also generate the original Laser beam with a pulse duration less than 1ps through a Fiber Laser (Fiber Laser), a titanium sapphire Laser (Ti), and a holmium (Ho) -containing gain medium, and is not limited thereto.

Furthermore, the solid-state slice group supercontinuum generation technology is based on a solid-state spread spectrum mechanism, and in order to solve the problem of self-focusing damage encountered by using single block spread spectrum in the prior art, a plurality of solid-state slices (namely crystals) with the thickness of about ten micrometers (micrometer) to several millimeters (mm) are arranged on an optical path of pulse input, and the interval of the solid-state slices is about several millimeters to several centimeters (cm) according to the initial condition. The solid-state slice group can save the advantages of low input pulse energy requirement and high output beam coherence of a bulk crystal spread spectrum mechanism, simultaneously, the focus of a self-focusing phenomenon is arranged outside the solid-state slice, when the laser beam is expanded outside the solid-state slice due to diffraction to the extent that the solid-state slice is not damaged, the laser beam is injected into the next solid-state slice to carry out serial spread spectrum, and a broadband supercontinuum frequency spectrum reaching hundreds of nanometers can be generated after passing through a plurality of solid-state slices. The pulse energy generated by the solid-state slice group can be from micro-Joule (micro-Joule) to millijoule (mJ), and has time-domain compressibility, i.e. higher time resolution. The solid-state slice group has simple structure, does not need special and precise frequent maintenance of users, can easily and quickly switch the wave band, is insensitive to the beam directivity, and is suitable for long-time measurement.

Fig. 1B shows another more specific block diagram of the laser light source device 100 according to the first embodiment, and as can be seen from fig. 1B, the spreading unit 140 may sequentially include a solid-state slice group 150 and a Dispersion Compensator (Dispersion Compensator)160 along the beam path, and the solid-state slice group 150 and the Dispersion Compensator 160 are used for Pulse Compression (Pulse Compression), i.e., to shorten the Pulse duration. Therefore, the pulse duration of the first laser beam 11 and the second laser beam 12 passing through the dispersion compensator 160 can be compressed to a magnitude of several cycles, the pulse duration can be shortened by matching the solid-state thin plate set 150 and the dispersion compensator 160 to increase the resolution in the time domain, and the pulse width is wide and the nonlinear effect can be generated.

The laser source device 100 may further include a Wavelength Converter (Wavelength Converter)170 disposed at a rear stage of the laser generator 130, wherein the Wavelength Converter 170 is configured to convert a spectrum. Thereby, the wavelength converter 170 facilitates converting a specific wavelength in the frequency spectrum of at least one of the first laser beam 11 and the second laser beam 12 into 1/2 double frequency or difference frequency (not limited thereto), and still maintains a continuous frequency spectrum.

The pulse Splitter 180 may be a Surface Reflector (Surface Reflector), an Interferometer (Interferometer) or a Beam Splitter (Beam Splitter), and the wavelength converter 170 may be a Second Harmonic Generator (SHG). Therefore, the engineering difficulty of accurate phase matching can be avoided, and the complexity of the configuration of the light beam path in the laser light source device 100 can be reduced. In the first embodiment, the pulse splitter 180 is specifically an area reflector, and the wavelength converter 170 is specifically a second harmonic generator. In addition, the pulse beam splitter in the laser Light source device according to the present invention may also be a Spatial Light Modulator (SLM) or a birefringent Crystal (Birefringence Crystal), and the wavelength converter may also be an optical parametric amplifier (opg), a Sum Frequency Generator (SFG), a Difference Frequency Generator (DFG) or an element using Raman Scattering (Raman Scattering).

Fig. 1C shows another more specific block diagram of the laser light source device 100 of the first embodiment, and as can be seen from fig. 1C, the number of the spreading units of the laser light source device 100 of the first embodiment may be at least two, the spreading units are specifically spreading

units

140 and 143, that is, the number of the spreading units of the laser light source device 100 is specifically two, and the spreading

units

140 and 143 are sequentially arranged along the beam path. Thereby, by sequentially arranging a plurality of spreading units (e.g., spreading units 140, 143) along the beam path, it is helpful to gradually achieve smaller pulse duration and wider and more uniform spectrum of the laser beam. According to other embodiments of the present invention (not shown), the number of the spreading units of the laser source device may be one, or the number of the spreading units of the laser source device may be at least three, and the at least three spreading units are sequentially arranged along the beam path.

Fig. 1D shows a spectrum diagram of the laser light source apparatus 100 of the first embodiment, with the abscissa representing wavelength and the ordinate representing intensity. For example, the data curves in fig. 1D respectively show the intensities of the original laser beams 10 emitted from the laser generator 130 and the spreading

units

140 and 143 at the respective wavelengths. As shown in fig. 1D, the original laser beam 10 has a significantly wider spectrum emitted from the spreading unit 140 than emitted from the laser generator 130, and the original laser beam 10 has a wider and more uniform spectrum after passing through the spreading unit 143 (i.e., the second spreading unit).

As shown in fig. 1C, the pulse splitter 180 can be disposed at the rear stage of the spreading

units

140 and 143 and the wavelength converter 170. Thereby, the first laser beam 11 and the second laser beam 12 can have similar wave bands with a less complex beam path and devices or components thereon.

In the first embodiment, as shown in fig. 1C, the laser source apparatus 100 sequentially includes a laser generator 130, spreading

units

140 and 143, a wavelength converter 170 and a pulse splitter 180 along a beam path. The spreading unit 140 includes a solid-state slice group 150 and a dispersion compensator 160 in sequence along the beam path, the spreading unit 143 includes a solid-state slice group 153 and a dispersion compensator 163 in sequence along the beam path, each of the solid-state slice groups 150,153 includes a plurality of solid-state slices 155 for spreading the spectrum, and the solid-state slices 155 of each of the solid-state slice groups 150,153 are arranged in sequence along the beam path at the pruster angle. The original laser beam 10 is split into a first laser beam 11 and a second laser beam 12 after passing through the pulse splitter 180. Furthermore, it should be understood that the optical characteristics (e.g., pulse duration, spectrum, intensity, etc.) of each of the original laser beam 10, the first laser beam 11, and the second laser beam 12 may be different after passing through different optical elements in the beam path.

Each of the dispersion compensators 160,163 may be a Chirped Mirror (chirper). This helps to reduce the complexity of the arrangement of the beam paths in the laser light source device 100. In the first embodiment, each of the dispersion compensators 160,163 is specifically a chirped mirror. In addition, the Dispersion compensator in the laser source device according to the present invention may also be a prism, a Grating (Grating) or a Dispersion Material (Dispersion Material) capable of compensating for phase.

The laser source apparatus 100 can be configured such that the pulse duration of the end of the first laser beam 11 and the pulse duration of the end of the second laser beam 12 are both less than 300fs, or a Compression Factor (Compression Factor) of the laser source apparatus 100 can be greater than 3, wherein the Compression Factor is a ratio of the pulse duration provided by the laser generator 130 to the pulse durations of the end of the first laser beam 11 and the second laser beam 12. Therefore, the laser light source device 100 with lower complexity can provide short pulses and application of a super-continuous spectrum. Furthermore, the laser light source apparatus 100 can be used for setting at least one of the pulse duration of the terminal end of the first laser beam 11 and the pulse duration of the terminal end of the second laser beam 12 to be less than 100fs, i.e. the compression factor of the laser light source apparatus 100 is greater than 10.

Fig. 2 is a block diagram of a laser source device 200 according to a second embodiment of the invention, which is also a schematic diagram of the laser source device 200 generating a first laser beam 21 and a second laser beam 22. As shown in fig. 2, the laser source apparatus 200 is used for providing a beam path (not numbered) to generate the first laser beam 21 and the second laser beam 22, and the laser source apparatus 200 includes a laser generator 230, a spreading unit 240 and a pulse splitter 280.

The laser generator 230 is configured to generate the original laser beam 20 with a pulse duration less than 1ps, and the spreading unit 240 is disposed at a subsequent stage of the laser generator 230. The spreading unit 240 includes a solid-state slice group 250, and the solid-state slice group 250 includes a plurality of solid-state slices and spreads a spectrum, and the solid-state slices are sequentially arranged along a beam path. The pulse splitter 280 is disposed at a rear stage of the laser generator 230, and the pulse splitter 280 is used for splitting the original laser beam 20 into the first laser beam 21 and the second laser beam 22.

In the second embodiment, the spreading unit 240 sequentially includes a solid-state slice group 250 and a dispersion compensator 260 along the beam path. The laser source apparatus 200 further includes a wavelength converter 270 disposed at a rear stage of the laser generator 230, wherein the wavelength converter 270 is configured to convert a spectrum.

Specifically, the laser light source apparatus 200 sequentially includes a laser generator 230, a pulse splitter 280, a spreading unit 240 and a wavelength converter 270 along a beam path. The original laser beam 20 is divided into a first laser beam 21 and a second laser beam 22 after passing through the pulse splitter 280, at least one of the first laser beam 21 and the second laser beam 22 sequentially passes through the frequency spreading unit 240 and the wavelength converter 270, and the frequency spreading unit 240 sequentially includes a solid-state slice group 250 and a dispersion compensator 260 along the beam path. Furthermore, it should be understood that the number of the spreading units 240 of the laser source apparatus 200 may be at least two, the at least two spreading units are sequentially disposed along the beam path, and the optical characteristics of each of the original laser beam 20, the first laser beam 21 and the second laser beam 22 passing through different optical elements on the beam path may be different.

In a second embodiment, the laser generator 230 passes through a ytterbium-doped gain medium to generate the original laser beam 20 with a pulse duration less than 1ps, the pulse splitter 280 is a surface reflector, the dispersion compensator 260 is a chirped mirror, and the wavelength converter 270 is a second harmonic generator.

The laser light source device 200 is used for at least one of the pulse duration of the terminal end of the first laser beam 21 and the pulse duration of the terminal end of the second laser beam 22 to be less than 300 fs.

Fig. 3 is a block diagram of a laser source device 300 according to a third embodiment of the invention, which is also a schematic diagram of the laser source device 300 generating a first laser beam 31 and a second laser beam 32. As shown in fig. 3, the laser source apparatus 300 is used for providing a beam path (not numbered) to generate the first laser beam 31 and the second laser beam 32, and the laser source apparatus 300 includes a laser generator 330, a spreading unit 340 and a pulse splitter 380 on the beam path.

The laser generator 330 is used for generating the original laser beam 30 with a pulse duration less than 1ps, and the spreading unit 340 is disposed at the rear stage of the laser generator 330. The spreading unit 340 includes a solid-state slice group 350, and the solid-state slice group 350 includes a plurality of solid-state slices and is used for spreading a spectrum, and the solid-state slices are sequentially arranged along a beam path. The pulse splitter 380 is disposed at a rear stage of the laser generator 330, and the pulse splitter 380 is used for splitting the original laser beam 30 into a first laser beam 31 and a second laser beam 32.

In the third embodiment, the spreading unit 340 includes a solid-state slice group 350 and a dispersion compensator 360 in sequence along the beam path. The laser source device 300 further includes a wavelength converter 370 disposed at a rear stage of the laser generator 330, wherein the wavelength converter 370 is configured to convert a spectrum. The pulse splitter 380 is disposed at the rear stage of the spread spectrum unit 340 and the wavelength converter 370.

Specifically, the laser light source device 300 includes a laser generator 330, a wavelength converter 370, a spread spectrum unit 340 and a pulse splitter 380 in sequence along a beam path. The spread spectrum unit 340 includes a solid-state slice group 350 and a dispersion compensator 360 along the beam path in sequence, and the original laser beam 30 is divided into a first laser beam 31 and a second laser beam 32 after passing through a pulse splitter 380. Furthermore, it should be understood that the number of the spreading units 340 of the laser source apparatus 300 may be at least two, the at least two spreading units are sequentially disposed along the beam path, and the optical characteristics of each of the original laser beam 30, the first laser beam 31 and the second laser beam 32 passing through different optical elements on the beam path may be different.

In a third embodiment, laser generator 330 passes through ytterbium-doped gain medium to produce raw laser beam 30 with pulse duration less than 1ps, pulse splitter 380 is a surface reflector, dispersion compensator 360 is a chirped mirror, and wavelength converter 370 is a second harmonic generator.

The laser light source device 300 is used for at least one of the pulse duration of the terminal of the first laser beam 31 and the pulse duration of the terminal of the second laser beam 32 to be less than 300 fs.

Fig. 4 is a block diagram of a laser source device 400 according to a fourth embodiment of the invention, which is also a schematic diagram of the laser source device 400 generating a first laser beam 41 and a second laser beam 42. As shown in fig. 4, the laser source apparatus 400 is used for providing a beam path (not numbered) to generate the first laser beam 41 and the second laser beam 42, and the laser source apparatus 400 includes a laser generator 430, a spreading unit 440, and a pulse splitter 480 in the beam path.

The laser generator 430 is configured to generate the original laser beam 40 with a pulse duration less than 1ps, and the spreading unit 440 is configured at a subsequent stage of the laser generator 430. The spreading unit 440 includes a solid-state slice group 450, and the solid-state slice group 450 includes a plurality of solid-state slices and spreads the spectrum, and the solid-state slices are sequentially arranged along the beam path at the Prusser angle. The pulse splitter 480 is disposed at a rear stage of the laser generator 430, and the pulse splitter 480 is used for splitting the original laser beam 40 into a first laser beam 41 and a second laser beam 42.

In the fourth embodiment, the spreading unit 440 includes a solid-state slice group 450 and a dispersion compensator 460 in sequence along the beam path. The laser source apparatus 400 further includes a wavelength converter 470 disposed at a rear stage of the laser generator 430, wherein the wavelength converter 470 is used for converting a spectrum.

Specifically, the laser light source device 400 includes a laser generator 430, a pulse splitter 480, a wavelength converter 470 and a spreading unit 440 in sequence along a beam path. The original laser beam 40 is split into a first laser beam 41 and a second laser beam 42 after passing through the pulse splitter 480, at least one of the first laser beam 41 and the second laser beam 42 sequentially passes through the wavelength converter 470 and the spreading unit 440, and the spreading unit 440 sequentially includes the solid-state pellicle 450 and the dispersion compensator 460 along the beam path. Furthermore, it should be understood that the number of the spreading units 440 of the laser source apparatus 400 may be at least two, the at least two spreading units are sequentially disposed along the beam path, and the optical characteristics of each of the original laser beam 40, the first laser beam 41 and the second laser beam 42 passing through different optical elements on the beam path may be different.

In a fourth embodiment, the laser generator 430 passes through a ytterbium-doped gain medium to produce the original laser beam 40 with a pulse duration less than 1ps, the pulse splitter 480 is a surface reflector, the dispersion compensator 460 is a chirped mirror, and the wavelength converter 470 is a second harmonic generator.

The laser light source device 400 is used for at least one of the pulse duration of the terminal end of the first laser beam 41 and the pulse duration of the terminal end of the second laser beam 42 to be less than 300 fs.

Fig. 5 is a block diagram of a laser source device 500 according to a fifth embodiment of the invention, which is also a schematic diagram of the laser source device 500 generating a first laser beam 51 and a second laser beam 52. As shown in fig. 5, the laser source apparatus 500 is used for providing a beam path (not numbered) to generate the first laser beam 51 and the second laser beam 52, and the laser source apparatus 500 includes a laser generator 530, spreading units 540,543 and a pulse splitter 580 on the beam path.

The laser generator 530 is used for generating an original laser beam 50 with a pulse duration less than 1ps, and the spreading

units

540 and 543 are sequentially disposed at a later stage of the laser generator 530 along a beam path. The spreading unit 540 comprises a solid sheet set 550, the solid sheet set 550 comprises a plurality of solid sheets 555 and is used for spreading the spectrum, and the solid sheets 555 are arranged in sequence along the beam path, as also shown in fig. 7B. The spreading unit 543 comprises a set of solid slices 553, the set of solid slices 553 comprises a plurality of solid slices 555 and is used for spreading the spectrum, the solid slices 555 are arranged in sequence along the beam path, as can also be seen in fig. 7B. The pulse splitter 580 is disposed at a rear stage of the laser generator 530, and the pulse splitter 580 is used for splitting the original laser beam 50 into a first laser beam 51 and a second laser beam 52.

In the fifth embodiment, the spreading unit 540 includes a solid-state slice group 550 and a dispersion compensator 560 in sequence along the beam path, and the spreading unit 543 includes a solid-state slice group 553 and a dispersion compensator 563 in sequence along the beam path. Therefore, the solid-state slice set 550 and the dispersion compensator 560 are matched, and the solid-state slice set 553 and the dispersion compensator 563 are further matched, which is helpful for shortening the pulse duration to increase the resolution in the time domain, and when the laser source device 500 is applied to the imaging related technology (such as the photoluminescence technology), the time resolution is facilitated to be improved, and the overall detection sensitivity is further improved. The high resolution of space and time is achieved simultaneously by combining the microscopic technique and the ultrafast technique, and the requirement of the prior art for sensitivity is higher, and an ultrafast laser system with high repetition rate must be used, however, the high repetition rate system in the conventional art cannot simultaneously satisfy the high pulse intensity and the ultrashort pulse duration, and the

spread spectrum units

540 and 543 in the laser source device 500 according to the present invention can effectively solve the problem by matching the laser generator 530 with high repetition rate.

The laser source apparatus 500 further includes a wavelength converter 570 disposed at a rear stage of the laser generator 530, wherein the wavelength converter 570 is configured to convert a spectrum.

The spreading

units

540 and 543, the pulse splitter 580 and the wavelength converter 570 are sequentially disposed at the rear stage of the laser generator 530, and the wavelength converter 570 is used for converting at least one of the spectrum of the first laser beam 51 and the spectrum of the second laser beam 52. This facilitates the first laser beam 51 and the second laser beam 52 to have different desired wavelength bands with a less complex beam path and devices or components thereon.

Specifically, the laser light source device 500 includes a laser generator 530, spreading units 540,543, a pulse splitter 580 and a wavelength converter 570 in sequence along a beam path. The spreading unit 540 sequentially includes a solid-state slice group 550 and a dispersion compensator 560 along the beam path, the spreading unit 543 sequentially includes a solid-state slice group 553 and a dispersion compensator 563 along the beam path, the original laser beam 50 is divided into a first laser beam 51 and a second laser beam 52 after passing through the pulse splitter 580, and at least one of the first laser beam 51 and the second laser beam 52 passes through the wavelength converter 570. Furthermore, it should be understood that the original laser beam 50, the first laser beam 51 and the second laser beam 52 may have different optical characteristics after passing through different optical elements on the beam path. According to another embodiment of the present invention (not shown), the laser source apparatus includes a laser generator, a spreading unit, a pulse splitter and a wavelength converter in sequence along the beam path, wherein the number of the spreading unit may be specifically one, or the number of the spreading unit may be specifically at least three, and the at least three spreading units are sequentially arranged along the beam path.

In a fifth embodiment, laser generator 530 passes through a ytterbium-doped gain medium to produce a raw laser beam 50 having a pulse duration less than 1ps, pulse splitter 580 is a facet reflector, each of dispersion compensators 560,563 is a chirped mirror, and wavelength converter 570 is a second harmonic generator.

The laser light source device 500 is used for at least one of the pulse duration of the terminal end of the first laser beam 51 and the pulse duration of the terminal end of the second laser beam 52 to be less than 300 fs.

Fig. 6A shows a block diagram of a measurement system 6000 according to a sixth embodiment of the present invention, and fig. 6B shows a configuration diagram of the measurement system 6000 according to the sixth embodiment. As shown in fig. 6A and 6B, the measuring system 6000 is configured to provide a beam path (not numbered) to generate the first laser beam 11 and the second laser beam 12, at least one of the first laser beam 11 and the second laser beam 12 is configured to enter the object 63, and the measuring system 6000 includes the laser generator 130, the spreading

units

140 and 143, the pulse beam splitter 180, and the object position 6300 on the beam path. Specifically, the measuring system 6000 sequentially includes the laser source device 100 and the object position 6300 of the first embodiment on the beam path, and details of the laser source device 100 can be found in the foregoing first embodiment.

The laser generator 130 is used for generating an original laser beam 10 with a pulse duration less than 1ps, and the spreading

units

140 and 143 are sequentially disposed at a later stage of the laser generator 130 along a beam path. The spread unit 140 includes a solid sheet set 150, the solid sheet set 150 includes a plurality of solid sheets 155 and is used for spreading a spectrum, and the solid sheets 155 are sequentially arranged along a beam path at a Prusser angle. The spreading unit 143 includes a solid sheet set 153, the solid sheet set 153 includes a plurality of solid sheets 155 and is used for spreading a spectrum, and the solid sheets 155 are sequentially arranged along a beam path at a Prusser angle. The pulse splitter 180 is disposed at a rear stage of the laser generator 130, and the pulse splitter 180 is used for splitting the original laser beam 10 into a first laser beam 11 and a second laser beam 12. The object position 6300 is disposed at the rear stage of the

spread spectrum units

140 and 143 and the pulse beam splitter 180, and the object position 6300 is provided for the object 63 to be measured. Therefore, the high repetition rate characteristic provided by the measurement system 6000 can effectively shorten the measurement time, and is helpful to improve the signal-to-noise ratio (signal-to-noise ratio) of high-speed and high repetition rate measurement, further increase the stability of the measurement system 6000, and the faster measurement speed is helpful to obtain a large amount of data in a short time to average and increase the signal quality. In addition, the limit of the signal-to-noise ratio of the optical measurement technology is limited by the quantum noise, that is, the signal-to-noise ratio is directly proportional to the 0.5 th power of the number of photons, so that the measurement sensitivity can be effectively increased by increasing the brightness of the light source, and the high-brightness light source is favorable for simultaneously measuring a large area or a plurality of objects or samples to be measured. In addition, the laser generator 130 may be used to generate a raw laser beam 10 having a pulse duration less than 500 fs. In other measurement systems (not shown) according to the present invention, the measurement system may be configured to provide a beam path to generate at least three laser beams (i.e., a first laser beam, a second laser beam, a third laser beam, or more laser beams).

In detail, the spreading unit 140 includes a solid-state slice group 150 and a dispersion compensator 160 along the optical beam path in sequence, and the spreading unit 143 includes a solid-state slice group 153 and a dispersion compensator 163 along the optical beam path in sequence. The number of the spread spectrum units of the measurement system 6000 is at least two, the spread spectrum units are specifically the spread spectrum units 140,143, that is, the number of the spread spectrum units of the measurement system 6000 is specifically two, and the spread spectrum units 140,143 are sequentially arranged along the beam path. The measuring system 6000 further includes a wavelength converter 170 disposed at a rear stage of the laser generator 130 in the beam path, and the wavelength converter 170 converts the spectrum. The pulse splitter 180 is disposed at the rear stage of the spreading

units

140 and 143 and the wavelength converter 170.

The measuring system 6000 may be configured such that the pulse duration of at least one of the first laser beam 11 and the second laser beam 12 incident on the object 63 is less than 300 fs. Thereby, the measurement system 6000 with lower complexity can provide short pulse and supercontinuum measurement. Furthermore, the measuring system 6000 can be used for the pulse duration of at least one of the first laser beam 11 and the second laser beam 12 incident on the object 63 to be measured being less than 100 fs.

The first laser beam 11 can be used to enter and excite the object 63 to be tested to an excited state. Thereby, the first laser beam 11 can be used as a pump laser.

The measurement system 6000 may further include a spectrometer (not numbered) disposed at a rear stage of the object position 6300 in the beam path, and the spectrometer may specifically include a prism 6800 and a photodetector 6900. Thereby, the assistant measuring system 6000 is applied to the spectrum measurement.

The second laser beam 12 can be used to enter and pass through the object 63 to be measured, and the delay time of the time when the second laser beam 12 enters the object 63 to be measured relative to the time when the first laser beam 11 enters the object 63 to be measured is greater than-100 ps and less than 10ms (millisecond). Therefore, the first Laser beam 11 can be used as a pump Laser, the second Laser beam 12 can be used as a Probe Laser, the appropriate Laser generator 130 is selected to generate the original Laser beam 10 with high repetition rate, the wavelength of the Probe Laser can be easily adjusted by combining the frequency spreading unit 140, and the method has the advantages of spatial Line Scan (Line Scan) or Global Scan (Global) and rapid measurement, thereby effectively avoiding the problems of point light source mapping and overlong measurement time in the prior art. Other measurement systems according to the present invention can be used as a measurement system for nonlinear optical imaging, such as Coherent Raman Spectroscopy (Coherent Raman Spectroscopy), Stimulated Raman Scattering microscope (Stimulated Raman Scattering microscope), Stimulated Emission microscope (Stimulated Emission microscope), or Pump Probe microscope (Pump-Probe microscope), but not limited thereto. Furthermore, the delay time of the time when the second laser beam 12 enters the object 63 to be tested relative to the time when the first laser beam 11 enters the object 63 to be tested may be greater than 0s and less than 10 ms.

The measurement system 6000 is a material measurement system of the object 63 to be measured. Therefore, the measurement system 6000 can be used for measuring the optical characteristics of materials at different wavelengths, the wavelength and the pulse width of the ultrafast laser light source are limited by the laser gain medium, the light source bandwidth needs to be expanded by utilizing the nonlinear effect, and the solid-state slice group 150 has the characteristic of efficient wavelength conversion nonlinear optics.

In the sixth embodiment, as shown in fig. 6B, the measuring system 6000 sequentially includes the laser generator 130, the spreading

units

140 and 143, the wavelength converter 170, the pulse splitter 180 and the object position 6300 along the beam path. The spreading unit 140 includes a solid-state slice group 150 and a dispersion compensator 160 along the beam path in sequence, and the spreading unit 143 includes a solid-state slice group 153 and a dispersion compensator 163 along the beam path in sequence. The convex lenses 101,102,103,104 and the plane mirrors 191,192,193 may be disposed between the laser generator 130 and the pulse splitter 180 on the beam path, as shown in fig. 6B, but not limited thereto.

The original laser beam 10 is split into a first laser beam 11 and a second laser beam 12 after passing through the pulse splitter 180. The first laser beam 11 is used as a pump laser to be incident and excite the object 63 to be measured to an excited state, and the Light Modulator (Light Source Modulator, which may be a Chopper, Optical Chopper)6221, the plane mirrors 6991 and 6992, and the concave mirror 6441 may be disposed between the pulse beam splitter 180 and the object position 6300 on the beam path providing the first laser beam 11, as shown in fig. 6B, but not limited thereto. The second laser beam 12 is used as a detection laser to be incident on and pass through the object 63, and the plane mirrors 6993,6994,6995,6996,6997 and the concave mirror 6442 may be disposed between the pulse beam splitter 180 providing the beam path of the second laser beam 12 and the object position 6300, as shown in fig. 6B, but not limited thereto.

The beam path of the second laser beam 12 is longer than that of the first laser beam 11 through configuration, so that the delay time of the second laser beam 12 entering the object 63 to be measured relative to the time of the first laser beam 11 entering the object 63 to be measured is larger than 0s and smaller than 100 ps. In the spectrometer, the prism 6800 and the photodetector 6900 are sequentially disposed at a stage subsequent to the position 6300 of the object to be measured, the prism 6800 can be replaced by a grating, and the photodetector 6900 can specifically include a Charge Coupled Device (Charge Coupled Device), so that the measurement system 6000 can be used as a material measurement system for the object 63, for example, first exciting the object 63 to an excited state with the first laser beam 11, and then measuring a spectral response of the second laser beam 12 having a continuous spectrum passing through the object 63. Further, it should be understood that the optical characteristics of each of the original laser beam 10, the first laser beam 11 and the second laser beam 12 may be different after passing through different optical elements on the beam path, and it should be understood that the prism 6800 (or grating) and the photodetector 6900 in the spectrometer may be integrated into one instrument or may be two separate elements.

In the sixth embodiment, the laser generator 130 passes through the ytterbium-doped gain medium to generate the original laser beam 10 having a pulse duration less than 1ps, the pulse splitter 180 is a surface reflector, each of the dispersion compensators 160,163 is a chirped mirror, and the wavelength converter 170 is a second harmonic generator.

Fig. 6C is a schematic diagram showing a measurement result of the measurement system 6000 of the sixth embodiment, and fig. 6D is a schematic diagram showing another measurement result of the measurement system 6000 of the sixth embodiment, in which the measurement system 6000 is specifically a material measurement system of the object 63, the first laser beam 11 is used as a pump laser to excite the object 63 to an excited state, and the second laser beam 12 is used as a detection laser. For example, as shown in the data curve in fig. 6C, the delay times of the time when the second laser beam 12 enters the object 63 to be tested are-1 ps, 5fs, 50fs, 500fs and 5ps respectively relative to the time when the first laser beam 11 enters the object 63 to be tested, the ordinate is the ratio of the intensity difference of the second laser beam 12 after and before passing through the object 63 to the intensity before passing through the object 63, the abscissa is the wavelength, wherein the delay time of-1 ps indicates that the time when the second laser beam 12 enters the object 63 to be tested is earlier than the time when the first laser beam 11 enters the object 63 to be tested, that is, the object 63 to be tested is not excited to the excited state when the second laser beam 12 enters, and thus the data curve with the delay time of-1 ps is used as the reference curve of other data curves.

For another example, as shown in fig. 6D, the abscissa is time, time 0ps represents time when the second laser beam 12 passes through the object 63, the ordinate is a ratio of an intensity difference of the second laser beam 12 at the time and before the second laser beam passes through the object 63 to an intensity before the second laser beam passes through the object 63, and the data curves in fig. 6D represent intensities of wavelength components of 550nm, 645nm, 750nm, and 800nm in the pulse spectrum of the second laser beam 12 in the time domain, respectively.

Fig. 7A shows a block diagram of a measurement system 7000 according to a seventh embodiment of the present invention, and fig. 7B shows a configuration diagram of the measurement system 7000 according to the seventh embodiment. As shown in fig. 7A and 7B, the measurement system 7000 is configured to provide a beam path (not numbered) for generating the first laser beam 51 and the second laser beam 52, at least one of the first laser beam 51 and the second laser beam 52 is configured to enter the object 73, and the measurement system 7000 includes a laser generator 530, spreading units 540,543, a pulse beam splitter 580 and an object position 7300 on the beam path. Specifically, the measurement system 7000 sequentially includes the laser source device 500 and the object position 7300 of the fifth embodiment on the beam path, and details of the laser source device 500 can be found in the content of the fifth embodiment.

units

540 and 543 are sequentially disposed at a later stage of the laser generator 530 along a beam path. The spreading unit 540 comprises a solid sheet set 550, the solid sheet set 550 comprises a plurality of solid sheets 555 and is used for spreading spectrum, and the solid sheets 555 are sequentially arranged along the light beam path. The spreading unit 543 comprises a set of solid slices 553, the set of solid slices 553 comprises a plurality of solid slices 555 and is used for spreading the spectrum, the solid slices 555 are arranged in sequence along the beam path. The pulse splitter 580 is disposed at a rear stage of the laser generator 530, and the pulse splitter 580 is used for splitting the original laser beam 50 into a first laser beam 51 and a second laser beam 52. The object position 7300 is disposed at the rear stage of the spreading

units

540 and 543 and the pulse splitter 580, and the object position 7300 is provided for the object 73.

In detail, the spreading unit 540 includes a solid-state slice group 550 and a dispersion compensator 560 along the beam path, and the spreading unit 543 includes a solid-state slice group 553 and a dispersion compensator 563 along the beam path. The measurement system 7000 further includes a wavelength converter 570 disposed at a rear stage of the laser generator 530, in the beam path, the wavelength converter 570 converting the spectrum. The spreading

units

540 and 543, the pulse splitter 580 and the wavelength converter 570 are sequentially disposed at the rear stage of the laser generator 530, the wavelength converter 570 is used for converting at least one of the spectrum of the first laser beam 51 and the spectrum of the second laser beam 52, and the wavelength converter 570 is specifically used for converting the spectrum of the first laser beam 51.

The measuring system 7000 is used for allowing the pulse duration of the at least one of the first laser beam 51 and the second laser beam 52 to enter the object 73 to be measured to be less than 300 fs.

The first laser beam 51 is used for incidence and exciting the object 73 to be tested to an excited state, i.e. the first laser beam 51 can be used as a pump laser. The measurement system 7000 further includes a spectrometer (not numbered) disposed at a rear stage of the object position 7300 in the beam path, and the spectrometer may specifically include a prism 7800 and a photodetector 7900.

The first laser beam 51 is configured to emit a fluorescent beam 56 from the object 73, the measurement system 7000 further includes an Up-conversion (Up-conversion) crystal 7700 disposed at a position 7300 behind the object, the fluorescent beam 56 and the second laser beam 52 are configured to enter the Up-conversion crystal 7700, and a portion of the fluorescent beam 56 is converted into an Up-conversion fluorescent signal 57 after passing through the Up-conversion crystal 7700. Therefore, the measurement system 7000 can be applied to time-resolved ultrafast spectroscopy, so that the pulses of the first laser beam 51 and the second laser beam 52 can have different wavelengths, the first laser beam 51 emits light (e.g., fluorescence) to the object 73 due to the material property thereof after entering the object 73, and then the single-wavelength pulse laser (i.e., shutter) of the second laser beam 52 detects the change of the fluorescence signal of the object 73.

The measurement system 7000 is a photoluminescence measurement system of the object under test 73. Therefore, the measurement system 7000 can make the pulses of the first laser beam 51 and the second laser beam 52 have different wavelengths, and the first laser beam 51 emits light (e.g., fluorescence) to the object 73 due to the material property thereof after entering the object 73, and then the single-wavelength pulse laser (i.e., shutter) of the second laser beam 52 detects the change of the fluorescence signal of the object 73.

In the seventh embodiment, as shown in fig. 7B, the measurement system 7000 sequentially includes a laser generator 530, spreading

units

540 and 543, a pulse splitter 580, a wavelength converter 570 and an object position 7300 along a beam path. The spreading unit 540 includes a solid-state slice group 550 and a dispersion compensator 560 in order along the beam path, and the spreading unit 543 includes a solid-state slice group 553 and a dispersion compensator 563 in order along the beam path. The convex lenses 501,502,503,504 and the plane mirrors 591,592 may be disposed between the laser generator 530 and the pulse splitter 580 on the beam path, as shown in fig. 7B, but not limited thereto.

The original laser beam 50 is split into a first laser beam 51 and a second laser beam 52 after passing through the pulse splitter 580, and the first laser beam 51 is sequentially incident on the wavelength converter 570 and the object 73 to be measured. The first laser beam 51 serving as a pump laser is incident to excite the object 73 to be measured to an excited state, and the object 73 emits the fluorescence beam 56, the fluorescence beam 56 is incident to the upconversion crystal 7700, and the convex lens 7001, the plane mirrors 7991 and 7992, and the

concave mirrors

7441 and 7442 may be disposed between the pulse beam splitter 580 and the upconversion crystal 7700 on the beam path providing the first laser beam 51, as shown in fig. 7B, but not limited thereto. The second laser beam 52 is incident on the upconversion crystal 7700, and the plane mirrors 7993,7994,7995,7996,7997,7998 and the concave mirror 7443 may be disposed between the pulse splitter 580 and the upconversion crystal 7700 on the beam path providing the second laser beam 52, as shown in fig. 7B, but not limited thereto.

In the seventh embodiment, the beam path of the second laser beam 52 and the beam path of the first laser beam 51 are configured to be substantially equal in length, so that the delay time of the time when the second laser beam 52 enters the upconversion crystal 7700 relative to the time when the first laser beam 51 enters the upconversion crystal 7700 is substantially 0s, and a part of the fluorescent beam 56 is converted into the upconversion fluorescent signal 57 after passing through the upconversion crystal 7700. The prism 7800 and the photodetector 7900 of the spectrometer are sequentially disposed at the rear stage of the upconversion crystal 7700, the prism 7800 can be replaced by a grating, the photodetector 7900 can specifically include a photosensitive coupling element, and the photodetector 7900 can also be used to measure the change of the upconversion fluorescence signal 57 with time, so that the measurement system 7000 can be used as a photoluminescence measurement system for the object 73 to be measured. Furthermore, it should be understood that the original laser beam 50, the first laser beam 51 and the second laser beam 52 may have different optical characteristics after passing through different optical elements on the beam path.

In the seventh embodiment, laser generator 530 passes through a ytterbium-doped gain medium to produce a raw laser beam 50 having a pulse duration less than 1ps, pulse splitter 580 is a surface reflector, each of dispersion compensators 560,563 is a chirped mirror, and wavelength converter 570 is a second harmonic generator.

Although the present invention has been described with reference to the above embodiments, it should be understood that various changes and modifications can be made therein by those skilled in the art without departing from the spirit and scope of the invention.

Claims

1. A laser light source device is characterized in that the laser light source device is used for providing a light beam path to generate a first laser beam and a second laser beam, and the laser light source device comprises the following components on the light beam path:

a laser generator for generating an original laser beam having a pulse duration less than 1 ps;

at least one spread spectrum unit arranged at the rear stage of the laser generator, wherein the spread spectrum unit comprises a solid sheet group, the solid sheet group comprises a plurality of solid sheets, and the solid sheets are sequentially arranged along the beam path; and

and the pulse beam splitter is configured at the rear stage of the laser generator and is used for splitting the original laser beam into the first laser beam and the second laser beam.

2. The laser source apparatus of claim 1, wherein the spreading unit comprises the solid-state slice group and a dispersion compensator in sequence along the beam path.

3. The laser light source apparatus of claim 2, wherein the dispersion compensator is a chirped mirror.

4. The laser light source device of claim 2, further comprising, in the beam path:

a wavelength converter disposed at the rear stage of the laser generator.

5. The laser source apparatus of claim 4, wherein the pulse splitter is a plane reflector, an interferometer or a beam splitter, and the wavelength converter is a second harmonic generator.

6. The laser light source device according to claim 4, wherein the number of the at least one spread spectrum unit is at least two, and the at least two spread spectrum units are sequentially arranged along the beam path.

7. The laser source device according to claim 6, wherein the pulse splitter is disposed at a rear stage of the at least one spread spectrum unit and the wavelength converter.

8. The laser source apparatus of claim 6, wherein the at least one spreading unit, the pulse splitter and the wavelength converter are sequentially disposed at a later stage of the laser generator, the wavelength converter being configured to convert at least one of a spectrum of the first laser beam and a spectrum of the second laser beam.

9. The laser source apparatus of claim 1, wherein the laser source apparatus is configured such that the pulse duration of the end of the first laser beam and the pulse duration of the end of the second laser beam are both less than 300 fs.

10. A measurement system for providing a beam path to generate a first laser beam and a second laser beam, at least one of the first laser beam and the second laser beam being incident on an object to be measured, the measurement system comprising:

at least one spread spectrum unit arranged at the rear stage of the laser generator, wherein the spread spectrum unit comprises a solid sheet group, the solid sheet group comprises a plurality of solid sheets, and the solid sheets are sequentially arranged along the beam path;

a pulse beam splitter disposed at the rear stage of the laser generator, for splitting the original laser beam into the first laser beam and the second laser beam; and

and the object position to be measured is configured at the rear stage of the at least one spread spectrum unit and the pulse beam splitter and is used for the object to be measured to be arranged.

11. The measurement system of claim 10, wherein the spreading unit comprises, in order along the beam path, the solid-state slice group and a dispersion compensator.

12. The measurement system of claim 11, wherein the number of the at least one spreading unit is at least two, the at least two spreading units being sequentially arranged along the beam path, the measurement system further comprising, on the beam path:

a wavelength converter disposed at the rear stage of the laser generator.

13. The measurement system of claim 12, wherein the pulse splitter is disposed at a stage subsequent to the at least one spread spectrum unit and the wavelength converter.

14. The measurement system of claim 12, wherein the at least one spreading unit, the pulse splitter and the wavelength converter are sequentially disposed at a later stage of the laser generator, the wavelength converter being configured to convert at least one of a spectrum of the first laser beam and a spectrum of the second laser beam.

15. The measurement system of claim 10, wherein the measurement system is configured such that the pulse duration of the at least one of the first laser beam and the second laser beam incident on the test object is less than 300 fs.

16. The measurement system of claim 10, wherein the first laser beam is configured to impinge upon and excite the analyte into an excited state.

17. The measurement system of claim 16, further comprising, in the beam path:

a spectrometer disposed at the rear stage of the position of the object to be measured.

18. The measurement system of claim 16, wherein the second laser beam is configured to be incident on and pass through the object, and a delay time of the second laser beam incident on the object relative to the first laser beam incident on the object is greater than-100 ps and less than 10 ms.

19. The measurement system of claim 16, wherein the first laser beam is configured to cause the test object to emit a fluorescent beam, the measurement system further comprising, in the beam path:

and the fluorescent light beam and the second laser beam are used for being incident to the upconversion crystal, and part of the fluorescent light beam is converted into an upconversion fluorescent signal after passing through the upconversion crystal.

20. The measurement system of claim 16, wherein the measurement system is a material measurement system or a photoluminescence measurement system of the dut.