CN114058880A - Method for purifying sodium vanadate solution - Google Patents
Method for purifying sodium vanadate solution Download PDFInfo
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- CN114058880A CN114058880A CN202111204950.2A CN202111204950A CN114058880A CN 114058880 A CN114058880 A CN 114058880A CN 202111204950 A CN202111204950 A CN 202111204950A CN 114058880 A CN114058880 A CN 114058880A
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- sodium vanadate
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- 229910000166 zirconium phosphate Inorganic materials 0.000 title claims abstract description 186
- 238000000034 method Methods 0.000 title claims abstract description 49
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 title claims abstract 21
- 239000012535 impurity Substances 0.000 claims abstract description 99
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 32
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 30
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000011574 phosphorus Substances 0.000 claims abstract description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000010703 silicon Substances 0.000 claims abstract description 27
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 26
- 238000003756 stirring Methods 0.000 claims abstract description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 53
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical group [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims description 41
- 239000002253 acid Substances 0.000 claims description 6
- 230000008569 process Effects 0.000 abstract description 9
- 229910052720 vanadium Inorganic materials 0.000 abstract description 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 239000002699 waste material Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- IHIXIJGXTJIKRB-UHFFFAOYSA-N trisodium vanadate Chemical compound [Na+].[Na+].[Na+].[O-][V]([O-])([O-])=O IHIXIJGXTJIKRB-UHFFFAOYSA-N 0.000 description 166
- 239000000243 solution Substances 0.000 description 143
- 238000000746 purification Methods 0.000 description 23
- 239000007788 liquid Substances 0.000 description 20
- 238000002386 leaching Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000001514 detection method Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 230000009286 beneficial effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 150000005838 radical anions Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- -1 silicate ions Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/22—Obtaining vanadium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G31/00—Compounds of vanadium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
- C22B3/44—Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Removal Of Specific Substances (AREA)
Abstract
The invention belongs to the technical field of vanadium chemical industry, and particularly relates to a method for purifying a sodium vanadate solution, which comprises the steps of adjusting the pH value of the sodium vanadate solution to 7.5-8.5, adding an impurity removing agent, and stirring for reaction to obtain the purified sodium vanadate solution; the adding mass of the impurity removing agent is K multiplied by the impurity removing coefficient multiplied by the volume of the sodium vanadate solution, wherein the impurity removing coefficient is the larger value of the silicon impurity removing coefficient and the phosphorus impurity removing coefficient, the silicon impurity removing coefficient is silicon content/(400-700), the phosphorus impurity removing coefficient is phosphorus content/(40-160), the units of the silicon content and the phosphorus content are both mg/L, and the volume of the sodium vanadate solution is L; k is a constant of 6. The method for purifying the sodium vanadate solution provided by the invention can accurately determine the addition amount of the impurity removing agent in the impurity removing process, greatly improve the efficiency of the sodium vanadate solution purifying process, simultaneously avoid the waste of raw and auxiliary materials, and ensure the effective removal of impurities Si and P in the sodium vanadate solution.
Description
Technical Field
The invention belongs to the technical field of vanadium chemical industry, and particularly relates to a method for purifying a sodium vanadate solution.
Background
In the vanadium slag clinker leaching process, some impurity metal cations and acid radical anions are leached into an aqueous solution along with a sodium vanadate solution, and in order to better ensure the normal operation of the next precipitation operation and the quality of a vanadium product, the impurities are effectively removed to purify the sodium vanadate solution.
The purification operation process of the sodium vanadate solution is to remove main impurities Si and P by using an impurity removing agent. The operation method of the existing impurity removal process is that sodium orthovanadate solution is conveyed to one part of an impurity removal tank, sulfuric acid and an impurity removal agent are added, and finally the rest sodium vanadate solution is added. The method has the defects of frequent operation, low operation efficiency, inaccurate addition of sulfuric acid and an impurity removing agent and need of repeatedly measuring solution components for adjustment. Therefore, the method for searching for the sodium vanadate solution to be more accurate and efficient has a vital significance.
Disclosure of Invention
Aiming at the technical problems, the invention provides a method for purifying a sodium vanadate solution with high efficiency and good impurity removal effect.
In order to achieve the purpose of the invention, the embodiment of the invention adopts the following technical scheme:
a method for purifying a sodium vanadate solution comprises the steps of adjusting the pH value of the sodium vanadate solution to 7.5-8.5, adding an impurity removing agent, and stirring for reaction to obtain a purified sodium vanadate solution; the adding mass of the impurity removing agent is K multiplied by the impurity removing coefficient multiplied by the volume of the sodium vanadate solution, wherein the impurity removing coefficient is the larger value of the silicon impurity removing coefficient and the phosphorus impurity removing coefficient, the silicon impurity removing coefficient is silicon content/(400-700), the phosphorus impurity removing coefficient is phosphorus content/(40-160), the units of the silicon content and the phosphorus content are both mg/L, and the volume of the sodium vanadate solution is L; k is a constant of 6.
Compared with the prior art, the method for purifying the sodium vanadate solution can accurately determine the addition amount of the impurity removing agent in the impurity removing process, greatly improves the efficiency of the sodium vanadate solution purifying process, and simultaneously avoids the waste of raw and auxiliary materials; by controlling the pH value to be 7.5-8.5, the hydrolysis of silicate ions as impurities into SiO is facilitated3 2-、Si2O5 2-Further forming silicic acid colloid to be adsorbed on the surface of the impurity removing agent, and being beneficial to the impurity phosphorus to be H2PO4 -、HPO4 3-The sodium vanadate solution exists in a form, and is adsorbed on the surface of an impurity removing agent to form complex phosphorus, so that the aim of thoroughly purifying the sodium vanadate solution is fulfilled.
Although the units of the silicon content, the phosphorus content and the volume of the sodium vanadate solution are limited in the invention, the calculation formula obtained by converting other measurement units does not depart from the scope of the invention. For example, when the unit of the silicon content and the phosphorus content is mg/ml, the unit of the volume of the sodium vanadate solution is ml; or when the unit of the silicon content and the phosphorus content is mg/ml and the unit of the volume of the sodium vanadate solution is L, the silicon impurity removal coefficient is equal to the silicon content/(0.4-0.7), and the phosphorus impurity removal coefficient is equal to the phosphorus content/(0.04-0.16).
Preferably, the concentration of the sodium vanadate solution is 25-35 g/L.
The qualification rate of sodium vanadate precipitated in the next procedure is not influenced by controlling the concentration of sodium vanadate, the yield per day is guaranteed, and the production efficiency is greatly improved; if the concentration is outside the above range, it can be adjusted by dilution or concentration.
Preferably, the impurity removing agent is aluminum sulfate solution, wherein Al is3+The content of (b) is 25-35 g/L.
Preferably, when the pH of the sodium vanadate solution is adjusted with an acid, the acid is sulfuric acid.
Sodium vanadate solutions generally have a pH of > 9, and preference is given to usingw(H2SO4) More than or equal to 90 percent of sulfuric acid is used for adjusting the pH value so as to avoid introducing other anions.
Preferably, the sodium vanadate solution is heated to 65-70 ℃.
The preferable temperature range has less side reaction, high purification efficiency and good purification effect.
Preferably, the reaction time is 5-10 min.
Preferably, the rotating speed of the stirring is 80-100 r/min.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example 1:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, measuring the sodium vanadate content of the sodium vanadate solution to be 25.98g/L, pH, wherein the value is 9.2, the Si content is 548.3mg/L and the P content is 104.9mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.0 and a phosphorus impurity removal coefficient of 1.05, so that the impurity removal coefficient is set to be 1.05, and the adding mass of aluminum sulfate serving as an impurity removal agent is 210 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.5, then adding an aluminum sulfate aqueous solution with the volume being 1.5 percent of that of the sodium vanadate solution, heating to 65 ℃, and reacting for 6min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (A) is 32.50g/L, namely the content of aluminum sulfate is 393 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 24.5g/L, Si of 165.1mg/L, P of 0.89mg/L, pH of 6.4, the purification rate of impurities Si in the sodium vanadate solution is 69.89% through calculation, and the purification rate of P is 99.15%, so that the sodium vanadate solution can be used for the next production process.
Example 2:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 27.6g/L, pH, the value is 9.4, the Si content is 586.8mg/L, and the P content is 45,2mg/L, and calculating that the silicon impurity removal coefficient is 1.07 and the phosphorus impurity removal coefficient is 0.45, so that the impurity removal coefficient is set to be 1.07, and the adding mass of the impurity removing agent aluminum sulfate is 224.7 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.5, then adding an aluminum sulfate aqueous solution with the volume being 1.6% of that of the sodium vanadate solution, heating to 70 ℃, and reacting for 8min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (A) is 31.87g/L, namely the content of aluminum sulfate is 400 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 26.5g/L, Si, the sodium vanadate content of 170.3mg/L, P, the sodium vanadate content of 0.17mg/L, pH value of 6.3, the purification rate of impurities Si in the sodium vanadate solution is 70.98% through calculation, the purification rate of P is 99.62%, and the sodium vanadate solution can be used for the next production process.
Example 3:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 30.5g/L, pH, the value is 9.7, the Si content is 632.4mg/L and the P content is 89.5mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.15 and a phosphorus impurity removal coefficient of 0.9, so that the impurity removal coefficient is set to be 1.15, and the adding mass of the aluminum sulfate as an impurity removal agent is 241.5 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 8.2, then adding an aluminum sulfate aqueous solution with the volume being 1.7% of that of the sodium vanadate solution, heating to 68 ℃, and reacting for 8min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (A) is 33.1g/L, namely the content of aluminum sulfate is 408 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 26.5g/L, Si, the sodium vanadate content of 174.3mg/L, P, the sodium vanadate content of 0.62mg/L, pH value of 6.1, the purification rate of impurities Si in the sodium vanadate solution is 72.44% through calculation, the purification rate of P is 99.31%, and the sodium vanadate solution can be used for the next production process.
Example 4:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the ammonium vanadate content of the sodium vanadate solution is 32.4g/L, pH, the value is 9.8, the Si content is 662.8mg/L and the P content is 105.2mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.2 and a phosphorus impurity removal coefficient of 1.05, wherein the impurity removal coefficient is set to be 1.2, and the adding mass of the impurity removing agent aluminum sulfate is 252 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 8.2, then adding an aluminum sulfate aqueous solution with the volume being 1.7% of that of the sodium vanadate solution, heating to 65 ℃, and reacting for 9min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 34.5g/L, i.e. the content of aluminum sulfate is 425 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 30.5g/L, Si, the sodium vanadate content of 151.6mg/L, P, the sodium vanadate content of 0.19mg/L, pH value of 6.2, the purification rate of impurities Si in the sodium vanadate solution is 77.13% through calculation, the purification rate of P is 99.82%, and the sodium vanadate solution can be used for the next production process.
Example 5:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 33.4g/L, pH, the value is 9.8, the Si content is 675.2mg/L and the P content is 73.53mg/L, and calculating that the silicon impurity removal coefficient is 1.22 and the phosphorus impurity removal coefficient is 0.74, so that the impurity removal coefficient is set to be 1.22, and the adding mass of the aluminum sulfate as an impurity removal agent is 256.2 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.8, then adding an aluminum sulfate aqueous solution with the volume being 1.7% of that of the sodium vanadate solution, heating to 70 ℃, and reacting for 10min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 34.5g/L, i.e. the content of aluminum sulfate is 425 g/L.
Through detection, the content of sodium vanadate in the purified sodium vanadate solution is 31.9g/L, Si, the content of sodium vanadate is 133.6mg/L, P, the content of sodium vanadate is 0.16mg/L, pH, the value is 6.2, the purification rate of impurities Si in the sodium vanadate solution is 80.21% through calculation, the purification rate of P is 99.78%, and the sodium vanadate solution can be used for the next production process.
Example 6:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 31.7g/L, pH, the value is 9.6, the Si content is 593mg/L and the P content is 73.47mg/L, and calculating that the silicon impurity removal coefficient is 1.08 and the phosphorus impurity removal coefficient is 0.73, so that the impurity removal coefficient is set to be 1.08, and the adding mass of the aluminum sulfate as an impurity removal agent is 226.8 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.6, and then adding sulfuric acid with the volume being 1.6 percent of that of the sodium vanadate solutionHeating the aluminum water solution to 67 ℃, and reacting for 7min at the stirring speed of 80r/min to obtain the purified sodium vanadate solution, wherein the w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (A) is 32.5g/L, namely the content of aluminum sulfate is 400 g/L.
Through detection, the concentration of the purified sodium vanadate solution is 30.1g/L, Si, the content of 132.2mg/L, P, the content of 0.64mg/L, pH and the value of 6.5, the purification rate of impurities Si in the sodium vanadate solution is 77.7 percent through calculation, the purification rate of P is 99.13 percent, and the sodium vanadate solution can be used for the next production process.
Example 7:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 34.9g/L, pH, the value is 9.9, the Si content is 625.1mg/L and the P content is 56.29mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.14 and a phosphorus impurity removal coefficient of 0.56, so that the impurity removal coefficient is set to be 1.14, and the adding mass of aluminum sulfate serving as an impurity removal agent is 239.4 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 8.5, then adding an aluminum sulfate aqueous solution with the volume being 1.65% of that of the sodium vanadate solution, heating to 66 ℃, and reacting for 8min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 33.5g/L, i.e. the content of aluminum sulfate is 413 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 33.2g/L, Si, the sodium vanadate content of 119.8mg/L, P, the sodium vanadate content of 0.22mg/L, pH and the value of 6.4, the purification rate of impurities Si in the sodium vanadate solution is 80.84% through calculation, the purification rate of P is 99.61%, and the sodium vanadate solution can be used for the next production process.
Example 8:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step (ii) ofFirstly, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 32.7g/L, pH, the value is 9.6, the Si content is 607.3mg/L and the P content is 49.23mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.10 and a phosphorus impurity removal coefficient of 0.5, so that the impurity removal coefficient is set to be 1.10, and the adding mass of the aluminum sulfate as an impurity removal agent is 231 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.8, then adding an aluminum sulfate aqueous solution with the volume being 1.6 percent of that of the sodium vanadate solution, heating to 70 ℃, and reacting for 7min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 33.8g/L, i.e. the content of aluminum sulfate is 417 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 30.3g/L, Si, the sodium vanadate content of 146.4mg/L, P, the sodium vanadate content of 0.28mg/L, pH value of 6.3, the purification rate of impurities Si in the sodium vanadate solution is calculated to be 75.59%, the purification rate of P is calculated to be 99.43%, and the sodium vanadate solution can be used for the next production process.
Example 9:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 31.8g/L, pH, the value is 9.7, the Si content is 602.9mg/L and the P content is 65.35mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.10 and a phosphorus impurity removal coefficient of 0.65, so that the impurity removal coefficient is set to be 1.10, and the adding mass of the aluminum sulfate as an impurity removal agent is 231 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 7.7, then adding an aluminum sulfate aqueous solution with the volume being 1.6 percent of that of the sodium vanadate solution, heating to 65 ℃, and reacting for 8min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 33.9g/L, i.e. the content of aluminum sulfate is 418 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 29.6g/L, Si, the sodium vanadate content of 166mg/L, P, the sodium vanadate content of 0.55mg/L, pH value of 6.3, the purification rate of impurities Si in the sodium vanadate solution is 77.7% through calculation, the purification rate of P is 99.13%, and the sodium vanadate solution can be used for the next production process.
Example 10:
a method for purifying a sodium vanadate solution specifically comprises the following steps:
step one, conveying the sodium vanadate solution in the leaching procedure to a liquid storage tank, and calculating to obtain the sodium vanadate solution with the volume of 35m in the liquid storage tank3；
Step two, determining that the sodium vanadate content of the sodium vanadate solution is 34.7g/L, pH, the value is 9.8, the Si content is 635.3mg/L and the P content is 73.87mg/L, and calculating to obtain a silicon impurity removal coefficient of 1.16 and a phosphorus impurity removal coefficient of 0.74, so that the impurity removal coefficient is set to be 1.16, and the adding mass of aluminum sulfate serving as an impurity removal agent is 243.6 kg;
step three, adding sulfuric acid to adjust the pH value of the sodium vanadate solution to 8.0, then adding an aluminum sulfate aqueous solution with the volume being 1.7% of that of the sodium vanadate solution, heating to 68 ℃, and reacting for 8min at a stirring speed of 80r/min to obtain a purified sodium vanadate solution, wherein w (H) of sulfuric acid2SO4) 92.5% of Al in aqueous aluminum sulfate solution3+The content of (b) is 32.9g/L, i.e. the content of aluminum sulfate is 406 g/L.
Through detection, the purified sodium vanadate solution has the sodium vanadate content of 32.9g/L, Si, the sodium vanadate content of 142mg/L, P, the sodium vanadate content of 0.70mg/L, pH value of 6.2, the purification rate of impurities Si in the sodium vanadate solution is 77.69% through calculation, the purification rate of P is 99.05%, and the sodium vanadate solution can be used for the next production process.
The embodiment can show that the invention can accurately determine the addition amount of acid and impurity removing agent required by the impurity removing process, and ensure the effective removal of impurities Si and P in the sodium vanadate solution, specifically, the impurity Si content of the purified sodium vanadate solution is less than 175mg/L, and the P content is less than 0.90 mg/L; furthermore, the prior artMedium purifying one-pot sodium vanadate solution (about 35 m)3) The required time is 40-60 min, and the time of the whole process for purifying the sodium vanadate solution is shortened to 20min, so that the method can effectively accelerate the purification process of the sodium vanadate solution, is beneficial to improving the yield and efficiency of enterprises, is simple and feasible, avoids waste of raw and auxiliary materials, and is beneficial to cost reduction and efficiency improvement of enterprises.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents or improvements made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (7)
1. A method for purifying a sodium vanadate solution is characterized in that the pH value of the sodium vanadate solution is adjusted to 7.5-8.5, an impurity removing agent is added, and the purified sodium vanadate solution is obtained after stirring and reaction; the adding mass of the impurity removing agent is K multiplied by the impurity removing coefficient multiplied by the volume of the sodium vanadate solution, wherein the impurity removing coefficient is the larger value of the silicon impurity removing coefficient and the phosphorus impurity removing coefficient, the silicon impurity removing coefficient is silicon content/(400-700), the phosphorus impurity removing coefficient is phosphorus content/(40-160), the units of the silicon content and the phosphorus content are both mg/L, and the volume of the sodium vanadate solution is L; k is a constant of 6.
2. The method for purifying a sodium vanadate solution according to claim 1, wherein the concentration of the sodium vanadate solution is 25-35 g/L.
3. The method of claim 1, wherein the decontaminating agent is aluminum sulfate solution.
4. A method for purifying a sodium vanadate solution according to claim 3, wherein the acid is sulfuric acid when the pH of the sodium vanadate solution is adjusted with an acid.
5. The method for purifying a sodium vanadate solution according to claim 1, wherein the temperature of the stirring reaction is 65-70 ℃.
6. The method for purifying a sodium vanadate solution according to claim 5, wherein the stirring reaction is carried out for 5-10 min.
7. The method for purifying a sodium vanadate solution according to claim 1, wherein the stirring speed is 80-100 r/min.
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