CN114019594A - Non-periodic micro-nano structure color filter and preparation method and device thereof - Google Patents
Non-periodic micro-nano structure color filter and preparation method and device thereof Download PDFInfo
- Publication number
- CN114019594A CN114019594A CN202111405145.6A CN202111405145A CN114019594A CN 114019594 A CN114019594 A CN 114019594A CN 202111405145 A CN202111405145 A CN 202111405145A CN 114019594 A CN114019594 A CN 114019594A
- Authority
- CN
- China
- Prior art keywords
- micro
- substrate
- metal particles
- color filter
- nano structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002086 nanomaterial Substances 0.000 title claims abstract description 57
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 239000002923 metal particle Substances 0.000 claims abstract description 45
- 230000000737 periodic effect Effects 0.000 claims abstract description 32
- 239000002184 metal Substances 0.000 claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 28
- 230000001788 irregular Effects 0.000 claims abstract description 25
- 238000000137 annealing Methods 0.000 claims abstract description 22
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 claims abstract description 11
- 238000005566 electron beam evaporation Methods 0.000 claims abstract description 6
- 230000003287 optical effect Effects 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 12
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000985 reflectance spectrum Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/206—Filters comprising particles embedded in a solid matrix
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a non-periodic micro-nano structure color filter and a preparation method and a device thereof, wherein the color filter comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, and the metal particles are gathered to form irregular micron scale block structures; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles. The preparation method comprises the following steps: providing a substrate; preparing a preset metal film with a preset thickness on the substrate by adopting electron beam evaporation; and carrying out thermal annealing treatment on the substrate containing the metal film to form irregular micro-nano scale metal particles. The non-periodic micro-nano structure color filter in the embodiment of the invention has low manufacturing cost and high yield, is suitable for large-scale production, and can be widely applied to the technical field of optical devices.
Description
Technical Field
The invention relates to the technical field of optical devices, in particular to a non-periodic micro-nano structure color filter and a preparation method and device thereof.
Background
The periodic micro-nano structure color filter is an important component of most display technologies, particularly liquid crystal display. The periodic micro-nano structure color filter is characterized in that a periodic micro-nano structure is carved on a substrate through micro-processing technologies such as photoetching, etching and the like, and the color filter displays red, green and blue colors based on a plasma resonance principle. The color filter with the periodic micro-nano structure needs micro-processing technologies such as photoetching, etching and the like, photoetching equipment is expensive, the requirements on the working environment are high, and the relative manufacturing cost is high; in addition, because the structure is in a micro-nano structure, defects are easy to occur in the photoetching process, a complete periodic structure is difficult to obtain, the yield is relatively poor, and large-scale preparation is difficult.
Disclosure of Invention
In view of this, an object of the embodiments of the present invention is to provide a color filter with an aperiodic micro-nano structure, and a method and an apparatus for manufacturing the same, wherein the color filter has a low manufacturing cost and a high yield, and is suitable for mass production.
In a first aspect, an embodiment of the invention provides a non-periodic micro-nano structure color filter, which comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, wherein the metal particles are aggregated to form an irregular micro-nano scale block structure; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles.
Optionally, the material of the metal particles comprises a material having a property of generating localized surface plasmon resonances.
Optionally, the material of the metal particles comprises any one of nickel or titanium.
Optionally, the metal particles have a size range including 10nm to 400 nm.
Optionally, the material of the substrate comprises any one of silicon or quartz glass.
In a second aspect, an embodiment of the present invention provides an optical device, including the aperiodic micro-nano structure color filter.
In a third aspect, the embodiment of the invention provides a method for preparing a non-periodic micro-nano structure color filter, wherein the non-periodic micro-nano structure color filter comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, and the metal particles are aggregated to form a irregular micron scale block structure; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles; the preparation method comprises the following steps:
providing a substrate;
preparing a preset metal film with a preset thickness on the substrate by adopting electron beam evaporation;
and carrying out thermal annealing treatment on the substrate containing the metal film to form irregular micro-nano scale metal particles.
Optionally, the performing thermal annealing treatment on the substrate including the metal film specifically includes:
raising the temperature of the substrate containing the metal film from room temperature to a preset temperature at a first preset rate and storing the constant temperature for a preset time;
and reducing the preset temperature to the room temperature according to a second preset speed.
The implementation of the embodiment of the invention has the following beneficial effects: the aperiodic micro-nano structure color filter in the embodiment of the invention comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, wherein the metal particles are gathered to form an irregular micron scale block structure, and under the irradiation of a light source, local surface plasma resonance is generated among the metal particles, so that the surface generates a certain color of reflected light to realize the filtering effect on the incident light source; the non-periodic micro-nano structure color filter has no periodic requirement, low requirement on preparation equipment, low manufacturing cost and high yield, and is suitable for large-scale production.
Drawings
Fig. 1 is a schematic structural diagram of a non-periodic micro-nano structure color filter according to an embodiment of the present invention;
fig. 2 is a reflectance spectrum of a non-periodic micro-nano structure color filter provided in an embodiment of the present invention;
fig. 3 is a reflectance spectrum of another aperiodic micro-nano structure color filter provided in the embodiment of the present invention;
fig. 4 is a transmittance spectrum of another aperiodic micro-nano structure color filter provided in the embodiment of the present invention;
fig. 5 is a schematic flow chart illustrating steps of a method for manufacturing a non-periodic micro-nano structure color filter according to an embodiment of the present invention;
fig. 6 is a schematic flow chart of another method for manufacturing a color filter with a non-periodic micro-nano structure according to an embodiment of the present invention.
Detailed Description
The invention is described in further detail below with reference to the figures and the specific embodiments. The step numbers in the following embodiments are provided only for convenience of illustration, the order between the steps is not limited at all, and the execution order of each step in the embodiments can be adapted according to the understanding of those skilled in the art.
As shown in fig. 1, an embodiment of the present invention provides a color filter with a non-periodic micro-nano structure, including a substrate and a plurality of irregular micro-nano scale metal particles on the substrate, where the metal particles are aggregated to form a irregular micro-nano scale block structure; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles.
It should be noted that the irregular micro-nano metal particles are formed by sintering a metal film through thermal annealing treatment, and the size of the metal crystal grains and the size of the blocky structure formed by the metal crystal grains are different due to the thermal annealing problem at different temperatures.
As will be understood by those skilled in the art, the micro-nano structure with non-periodicity has polarization independence, i.e. the same reflected light is still maintained under the irradiation of different polarized lights, and meanwhile, the characteristics of large bandwidth and wide viewing angle are realized. Meanwhile, based on the electromagnetic field principle, under the irradiation of incident light with different incidence angles, slight shift of the wavelength of the reflected light can be generated.
It should be noted that the reflective colors of the metal particles of different materials are different.
It should be noted that, because the size of the color filter with the aperiodic micro-nano structure depends on the size of the metal thin film, the preparation of various small-area and large-area applications can be supported.
Optionally, the material of the metal particles comprises a material having a property of generating localized surface plasmon resonances.
Optionally, the material of the metal particles comprises any one of nickel or titanium.
Optionally, the metal particles have a size range including 10nm to 400 nm.
Optionally, the material of the substrate comprises any one of silicon or quartz glass.
Specifically, referring to fig. 2, fig. 2 shows a reflection spectrum of a non-periodic micro-nano structure color filter prepared by depositing a 100nm metal Ni (nickel) material on a silicon substrate and annealing at different temperatures at an incident angle of 10 °; as can be seen from fig. 2, for visible light, the reflectance of the aperiodic micro-nano structure color filter prepared at different annealing temperatures to incident light with different wavelengths is different.
Specifically, referring to fig. 3, fig. 3 shows a reflection spectrum of a aperiodic micro-nano structure color filter prepared by depositing a 100nm metal Ni (nickel) material on a quartz glass substrate and annealing at different temperatures at an incident angle of 10 °; as can be seen from fig. 3, for visible light, the reflectance of the aperiodic micro-nano structure color filter prepared at different annealing temperatures to incident light with different wavelengths is different.
As can be seen from fig. 2 and 3, the aperiodic micro-nano structure color filter prepared by using different substrate materials has the same change trend although the reflectivity and the reflection wavelength slightly change.
Specifically, referring to fig. 4, fig. 4 shows a transmission spectrum of a sample at an incident angle of 10 ° in a non-periodic micro-nano structure color filter prepared by depositing a 100nm metal Ni material on a quartz glass substrate and annealing at different temperatures; as can be seen from fig. 4, the transmittance of the aperiodic micro-nano structure color filter with different annealing temperatures for the same wavelength does not change much, but the transmittance increases with the increase of the wavelength of the incident light.
As can be seen from fig. 2 to fig. 4, the reflectivity of the aperiodic micro-nano structure color filter at different wavelengths and the central wavelength of the reflection peak are changed by changing the thermal annealing problem, so as to change the color of the reflected light of the aperiodic micro-nano structure color filter.
The implementation of the embodiment of the invention has the following beneficial effects: the aperiodic micro-nano structure color filter in the embodiment of the invention comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, wherein the metal particles are gathered to form an irregular micron scale block structure, and under the irradiation of a light source, local surface plasma resonance is generated among the metal particles, so that the surface generates a certain color of reflected light to realize the filtering effect on the incident light source; the non-periodic micro-nano structure color filter has no periodic requirement, low requirement on preparation equipment, low manufacturing cost and high yield, and is suitable for large-scale production.
The embodiment of the invention also provides an optical device which comprises the non-periodic micro-nano structure color filter.
The kind of the above optical device is not limited: if the method is applied to anti-counterfeiting design, the non-periodic micro-nano structure color filter prepared by designing different annealing temperatures generates patterns under the irradiation of an external light source, and meanwhile, because the colors of different incidence angles can generate slight changes, the authenticity of the non-periodic micro-nano structure color filter can be judged under the irradiation of the light sources with different incidence angles; and for example, the method is applied to a reflection-type display device, and the display screen without a power supply, such as a large-screen billboard without a power supply and the like, is realized by designing the distribution of the non-periodic micro-nano structure color filters prepared at different annealing temperatures.
Referring to fig. 5 and 6, an embodiment of the present invention provides a method for manufacturing a non-periodic micro-nano structure color filter, where the non-periodic micro-nano structure color filter includes a substrate and a plurality of irregular micro-nano scale metal particles on the substrate, and the metal particles are aggregated to form an irregular micro-nano scale block structure; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles; the preparation method comprises the following steps:
s1, providing a substrate;
s2, preparing a preset metal film with a preset thickness on the substrate by adopting electron beam evaporation;
and S3, carrying out thermal annealing treatment on the substrate containing the metal film to form irregular micro-nano scale metal particles.
Optionally, the performing thermal annealing treatment on the substrate including the metal film specifically includes:
s31, raising the temperature of the substrate containing the metal film from room temperature to a preset temperature according to a first preset speed, and storing the constant temperature for a preset time;
and S32, reducing the preset temperature to the room temperature according to a second preset speed.
It should be noted that the material of the metal thin film includes a material capable of generating localized surface plasmon resonance, and the material and the thickness of the metal thin film are set according to actual requirements, and the embodiment is not particularly limited.
Those skilled in the art can understand that the speeds of the first preset speed and the second preset speed are not limited, and are specifically set according to actual requirements, and the embodiment is not particularly limited.
The following describes a method for manufacturing a color filter with a periodic micro-nano structure according to a specific embodiment.
Step one, depositing metal Ni on a silicon substrate or a quartz glass substrate through electron beam evaporation, wherein the thickness of the metal Ni is 100nm, and electron beam evaporation equipment used in the process needs to be carried out in a clean room.
And step two, carrying out thermal annealing treatment at different temperatures on the sample with the metal Ni deposited on the substrate, wherein the annealing temperature range comprises 400 ℃ to 1000 ℃, and the annealing process can be carried out only in an atmospheric environment without strict conditions. The annealing process comprises the following steps: raising the temperature of the sample to a specified temperature at a rate of about 20 ℃/min, and then carrying out constant temperature treatment on the sample for 20 min; and then cooling to room temperature, wherein the cooling process is natural cooling, and the average cooling rate is 10 ℃/min.
It should be noted that the metal film of the sample is not completely sintered into a micro-nano structure at 400 ℃, and a thinner metal film is not sintered at the part close to the substrate, so that the sample based on quartz glass is not transparent at this time. In addition, the reflectance of all samples is slightly improved as the incident angle of incident light increases, which is a phenomenon due to the principle of electromagnetic field.
The implementation of the embodiment of the invention has the following beneficial effects: the aperiodic micro-nano structure color filter in the embodiment of the invention comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, wherein the metal particles are gathered to form an irregular micron scale block structure, and under the irradiation of a light source, local surface plasma resonance is generated among the metal particles, so that the surface generates a certain color of reflected light to realize the filtering effect on the incident light source; the preparation process of the non-periodic micro-nano structure color filter is easy, only a single layer of metal material is needed, the micro-nano structure preparation process only needs to be carried out in an atmospheric environment and less depends on a clean room vacuum environment, large-area, small-scale and batch manufacturing can be realized, and the problem of low yield of the periodic micro-nano structure color filter is solved. Is a potential color filter realization scheme.
While the preferred embodiments of the present invention have been illustrated and described, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (8)
1. A non-periodic micro-nano structure color filter is characterized by comprising a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, wherein the metal particles are gathered to form irregular micron scale blocky structures; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles.
2. The aperiodic micro-nano structure color filter according to claim 1, wherein the material of the metal particles comprises a material capable of generating localized surface plasmon resonance.
3. The aperiodic micro-nano structure color filter according to claim 1, wherein the material of the metal particles comprises any one of nickel or titanium.
4. The aperiodic micro-nano structure color filter according to claim 1, wherein the scale range of the metal particles comprises 10nm to 400 nm.
5. The aperiodic micro-nano structure color filter according to claim 1, wherein the material of the substrate comprises any one of silicon or quartz glass.
6. An optical device, comprising the aperiodic micro-nano structure color filter of any one of claims 1 to 5.
7. The preparation method of the aperiodic micro-nano structure colored filter is characterized in that the aperiodic micro-nano structure colored filter comprises a substrate and a plurality of irregular micro-nano scale metal particles positioned on the substrate, and the metal particles are gathered to form irregular micron scale block structures; under the irradiation of a light source, local surface plasmon resonance is generated among the metal particles; the preparation method comprises the following steps:
providing a substrate;
preparing a preset metal film with a preset thickness on the substrate by adopting electron beam evaporation;
and carrying out thermal annealing treatment on the substrate containing the metal film to form irregular micro-nano scale metal particles.
8. The method according to claim 7, wherein the thermal annealing of the substrate including the metal thin film comprises:
raising the temperature of the substrate containing the metal film from room temperature to a preset temperature at a first preset rate and storing the constant temperature for a preset time;
and reducing the preset temperature to the room temperature according to a second preset speed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111405145.6A CN114019594A (en) | 2021-11-24 | 2021-11-24 | Non-periodic micro-nano structure color filter and preparation method and device thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111405145.6A CN114019594A (en) | 2021-11-24 | 2021-11-24 | Non-periodic micro-nano structure color filter and preparation method and device thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114019594A true CN114019594A (en) | 2022-02-08 |
Family
ID=80066093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111405145.6A Pending CN114019594A (en) | 2021-11-24 | 2021-11-24 | Non-periodic micro-nano structure color filter and preparation method and device thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114019594A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104965253A (en) * | 2015-07-09 | 2015-10-07 | 浙江大学 | Disordered metallic cylinder array-based large-angle optical color modulation device and method |
| CN110164910A (en) * | 2018-05-28 | 2019-08-23 | 京东方科技集团股份有限公司 | Color conversion layer and preparation method thereof, display device |
-
2021
- 2021-11-24 CN CN202111405145.6A patent/CN114019594A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104965253A (en) * | 2015-07-09 | 2015-10-07 | 浙江大学 | Disordered metallic cylinder array-based large-angle optical color modulation device and method |
| CN110164910A (en) * | 2018-05-28 | 2019-08-23 | 京东方科技集团股份有限公司 | Color conversion layer and preparation method thereof, display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104360534B (en) | Production method, color membrane substrates and the display device of color membrane substrates | |
| JP2902456B2 (en) | Inorganic polarizing thin film | |
| US8767282B2 (en) | Plasmonic in-cell polarizer | |
| JPH05203958A (en) | Liquid crystal display device and production of liquid crystal display device | |
| WO2019223203A1 (en) | Method for building polarizer in liquid crystal panel, and liquid crystal display device and manufacturing method therefor | |
| CN105572780A (en) | Wire grid polarization device, manufacturing method thereof and display device | |
| CN101785071A (en) | Conductor layer manufacturing method | |
| KR20080093443A (en) | Mask blank and photomask | |
| CN110183113A (en) | The preparation method of glare proof glass | |
| CN109642979A (en) | Polarization plates, the image display device and moving body for having used the polarization plates | |
| CN114019594A (en) | Non-periodic micro-nano structure color filter and preparation method and device thereof | |
| US20140293196A1 (en) | Method for producing polarizing element, polarizing element, liquid crystal display device, and electronic apparatus | |
| Sun et al. | Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region | |
| CN105759494A (en) | Color film substrate, preparation method thereof and display device | |
| CN110888189B (en) | Ultrathin substrate-free color tunable surface plasma filter | |
| JP2004176081A (en) | Method of producing optical multilayer film by atomic layer deposition method | |
| JP2012198308A (en) | Method for manufacturing polarizer | |
| TW202330961A (en) | Amorphous transparent conductive oxide films and methods of fabricating the same | |
| CN106048526B (en) | Zinc nitride film, the preparation method of touch screen cover board and film, application | |
| Truman | Processing and Characterization of Spin-Coated As2S3 Films for Direct Laser Writing | |
| KR20160099451A (en) | Method for Preparing Transparent Electrodes and Vertically-oriented Liquid Crystal Display Device Using Macro-pre-pattern | |
| JPH0365529A (en) | Production of glass substrate for liquid crystal display element | |
| CN1725046A (en) | Manufacturing method of color filters | |
| JP5810975B2 (en) | Manufacturing method of polarizing element | |
| CN116594092A (en) | Cross hole structure adjustable luminous color filter and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20220208 |