CN114014517B - Method for adjusting glass production environment - Google Patents
Method for adjusting glass production environment Download PDFInfo
- Publication number
- CN114014517B CN114014517B CN202111455250.0A CN202111455250A CN114014517B CN 114014517 B CN114014517 B CN 114014517B CN 202111455250 A CN202111455250 A CN 202111455250A CN 114014517 B CN114014517 B CN 114014517B
- Authority
- CN
- China
- Prior art keywords
- platinum
- electrode
- refractory material
- glass
- channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims abstract description 92
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims abstract description 56
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 292
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 146
- 239000011819 refractory material Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 239000008400 supply water Substances 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 56
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000010276 construction Methods 0.000 claims description 10
- 230000003750 conditioning effect Effects 0.000 abstract description 7
- 239000007772 electrode material Substances 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 15
- 230000007547 defect Effects 0.000 description 15
- 239000006060 molten glass Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000003203 everyday effect Effects 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- -1 hydrogen ions Chemical class 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000002354 daily effect Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000011265 semifinished product Substances 0.000 description 2
- 238000012430 stability testing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B7/00—Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
- C03B7/02—Forehearths, i.e. feeder channels
- C03B7/06—Means for thermal conditioning or controlling the temperature of the glass
- C03B7/07—Electric means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
- Resistance Heating (AREA)
Abstract
The present disclosure relates to an apparatus and method for conditioning a glass production environment, the apparatus comprising: a platinum tube, a first electrode, a second electrode and a refractory material; a platinum channel is formed in the platinum tube, two sides of the platinum channel are respectively connected with a first electrode and a second electrode, and refractory materials are wrapped around the outer wall of the platinum tube; the surface of the refractory material is provided with a feed point. The method comprises the following steps: and current is introduced between the first electrode and the second electrode to heat the platinum pipe, the heated platinum pipe heats glass liquid passing through a platinum channel, and supply water is supplied to a supply point on the surface of the refractory material according to a certain flow rate. The method meets the requirements of production quality of the substrate glass and the medicinal glass on the basis of guaranteeing adjustment and differential control of the glass production environment, reduces the production cost, reduces the operation difficulty, protects the operation safety of equipment attached to a platinum channel, and integrally improves the production efficiency.
Description
Technical Field
The present disclosure relates to a glass manufacturing apparatus and method, and in particular, to a method of regulating a glass production environment.
Background
In the manufacturing process of UTG glass substrate glass, TFT substrate glass, LTPS substrate glass, OLED substrate glass and medicinal glass products, the kiln procedure melts the batch into glass liquid, the glass liquid enters a platinum channel for clarification and adjustment, the glass liquid is sent to a forming procedure after being adjusted by the platinum channel procedure to be manufactured into substrate glass or semi-finished products in other shapes, and the semi-finished products are manufactured into finished products after being processed.
As display device manufacturers make displays with higher definition and accuracy, the display device manufacturers have higher and higher quality requirements for glass products, and for some of the fine defects previously allowed in glass products, it is now becoming more and more intolerable, especially bubble defects, the size and number of which in the substrate glass products have greater and greater impact on the display devices, and therefore the allowed specifications of bubble defects are about to be smaller and smaller. In the pharmaceutical glass industry, the quality control requirements for bubble defects are also higher and higher, so that the requirements of people on the market at present are met, the occurrence probability of the bubble defects is reduced, and the quality of glass is continuously improved.
In the traditional substrate glass manufacturing process, a platinum channel is a key and indispensable process, after a glass raw material is melted in a kiln, a glass liquid is formed to flow into the platinum channel, and as the glass raw material contains a large amount of water, the water is decomposed into hydrogen ions and hydroxide ions in the melting process: the chemical reaction reaches equilibrium in the glass liquid, ions generated by the reaction always exist in the glass liquid, the working temperature of the glass liquid in a platinum channel is generally in the range of 1200 ℃ to 1650 ℃, H + The volume is the smallest in nature, and can pass through the platinum pipe wall of the platinum channel to cause H in glass liquid + The balance of the chemical reaction formula is reduced to the right, and OH is caused near the inner wall of the platinum tube - Ion enrichment, enriched OH - Ions are decomposed into cations and hydrogen ions under the catalysis of high temperature and platinum:wherein O is 2- The glass liquid loses electrons and becomes oxygen molecules O 2 Enriched on the inner wall of the platinum tube, oxygen bubbles are formed along with the progress of the reaction, and the bubbles are transferred to the forming along with the flow of the glass liquidAnd (3) a step of forming bubble defects in the glass product. Through the above analysis, the platinum channel process is an important process for generating bubble defects.
In order to solve the problems, the conventional solution is to build a sealed house around the platinum channel, and the house is filled with a large amount of steam which reacts on the outer wall of the platinum channel to generate H + Ions form a balance H inside and outside the platinum pipe wall + The environment can balance the chemical reaction of water molecules in the glass liquid and inhibit the generation of bubbles. The disadvantage of this approach is that: the first cost is relatively high, and the whole platinum channel is completely sealed in the same humidity environment, so that different requirements cannot be controlled differently; the second pair of personnel operate and maintain the platinum channel to enter and exit the area to cause great pressure, and particularly the operators cannot work in the high-humidity high-temperature environment for a long time; and a third building is provided with a plurality of matched mechanical and electrical equipment, and the equipment is easy to fail in a high-temperature and high-humidity environment, so that great hidden danger is caused to the stable and safe operation of the production line.
The other solution is to build a sealed shell closely attached to the periphery of the platinum channel, and the shell is filled with a large amount of steam which reacts on the outer wall of the platinum channel to generate H + Ions form a balance H inside and outside the platinum pipe wall + The environment can balance the chemical reaction of water molecules in the glass liquid and inhibit the generation of bubbles. The method solves the problems that personnel operation and a large number of equipment are affected by high-temperature and high-humidity environments to cause faults. However, this method also has the following disadvantages: the first airtight shell has high cost, and the whole platinum channel is completely sealed in the same humidity environment, so that different control can not be performed according to different requirements; secondly, for reasons of inspection and maintenance of the platinum tube, the closed shell needs to be opened frequently, which causes great trouble to the stable operation of the platinum channel.
Therefore, there is a need for a method of adjusting the glass production environment that ensures stable continuous operation of equipment and reduced cost, and that does not cause inconvenience to operators, thereby improving the overall efficiency of the production process, on the basis of ensuring the quality of the glass product.
Disclosure of Invention
It is an object of the present disclosure to provide an apparatus and method for conditioning a glass production environment that is capable of forming a balanced H inside and outside of a platinum tube wall + The environment meets the production quality requirement of the substrate glass, and can reduce the cost and facilitate the operation.
To achieve the above object, a first aspect of the present disclosure provides a platinum channel apparatus for adjusting a glass production environment, the apparatus comprising: a platinum tube, a first electrode, a second electrode and a refractory material;
the inside of the platinum tube is a platinum channel, two sides of the platinum channel are respectively connected with the first electrode and the second electrode, and the refractory material is wrapped around the outer wall of the platinum tube;
the surface of the refractory material is provided with a feed point for supplying feed water.
Optionally, the feed point is located at the surface of the refractory material (4) and has a depth; the certain depth is the area of 80-130 ℃ of the refractory material (4); preferably, the certain depth is a region where the refractory material (4) is 110-120 ℃.
Optionally, the outer surface control range of the feed point is 100-2500cm 2 The method comprises the steps of carrying out a first treatment on the surface of the The feed point is located at the center of the outer surface control range.
Alternatively, the outer surface of the feed point is controlled to be in the range of 100-1500cm when the temperature of the platinum channel is 1400-1650 DEG C 2 The method comprises the steps of carrying out a first treatment on the surface of the When the temperature of the platinum channel is 1200-1400 ℃, the control range of the outer surface of the supply point is 1000-2500cm 2 。
A second aspect of the present disclosure provides a method of conditioning a glass production environment, the method comprising the steps of: and passing electric current through the first electrode and the second electrode to heat the platinum tube, wherein the heated platinum tube heats glass liquid passing through a platinum channel, and supplies supply water to a supply point on the surface of the refractory material.
Optionally, the heating temperature for heating the platinum tube is 1200-1650 ℃.
Optionally, the conditions of the supply of the feed water are:
when the temperature of the platinum channel is 1500-1650 ℃, the water flow rate of the supply point is 80-150mL/h;
when the temperature of the platinum channel is 1400-1500 ℃, the water flow rate of the supply point is 50-100mL/h;
when the temperature of the platinum channel is 1300-1400 ℃, the water flow rate of the supply point is 30-70mL/h;
when the temperature of the platinum channel is 1200-1300 ℃, the water flow rate of the supply point is 0-50mL/h.
Optionally, the temperature of the platinum tube is transferred to the refractory material, the refractory material is transferred to the supply water in the supply point on the surface of the refractory material, and the supply water is heated and evaporated to form water vapor and then reacts on the outer wall of the platinum tube to generate H + 。
Optionally, H is arranged on the outer wall of the platinum tube + And H in platinum channel + H forming a balance + An environment.
A third aspect of the present disclosure provides a device according to the first aspect or a method according to the second aspect for use in constructing a substrate glass production line and a pharmaceutical glass production line.
Through the technical scheme, the method for adjusting the glass production environment meets the requirements of production quality of substrate glass and medicinal glass on the basis of guaranteeing that the glass production environment is adjusted and controlled differently, reduces the production cost, reduces the operation difficulty, protects the operation safety of equipment attached to a platinum channel, and integrally improves the production efficiency of a production line.
Additional features and advantages of the present disclosure will be set forth in the detailed description which follows.
Drawings
The accompanying drawings are included to provide a further understanding of the disclosure, and are incorporated in and constitute a part of this specification, illustrate the disclosure and together with the description serve to explain, but do not limit the disclosure. In the drawings:
fig. 1 is a front view of a platinum channel device for conditioning a glass production environment.
Fig. 2 is a left side view of a platinum channel device for conditioning a glass production environment.
Description of the reference numerals
1 platinum tube; 2 a first electrode; 3 a second electrode; 4 refractory material.
Detailed Description
Specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating and illustrating the disclosure, are not intended to limit the disclosure.
A first aspect of the present disclosure provides a platinum channel device for conditioning a glass production environment, the device comprising: a platinum tube 1, a first electrode 2, a second electrode 3 and a refractory material 4;
a platinum channel is arranged in the platinum tube 1, two sides of the platinum channel are respectively connected with the first electrode 2 and the second electrode 3, and the refractory material 4 is wrapped around the outer wall of the platinum tube 1;
the surface of the refractory material 4 is provided with a feed point for supplying feed water.
According to the present disclosure, the feed point is located at the surface of the refractory material 4 and has a depth; the certain depth is the area of 80-130 ℃ of the refractory material 4; preferably, the certain depth is in the region of 110-120 ℃ of the refractory material 4.
In the method, the method for providing the supply point for supplying the supply water on the surface of the refractory material is utilized, and the operation difficulty is reduced and the operation safety of equipment attached to a platinum channel is protected by supplying the water at the supply point; the water at the supply point is pure water.
According to the present disclosure, the outer surface control range of the feed point is 100-2500cm 2 The method comprises the steps of carrying out a first treatment on the surface of the The feed point is located at the center of the outer surface control range.
According to the present disclosure, when the platinumThe control range of the outer surface of the supply point is 100-1500cm when the temperature of the channel is 1400-1650 DEG C 2 The method comprises the steps of carrying out a first treatment on the surface of the When the temperature of the platinum channel is 1200-1400 ℃, the control range of the outer surface of the supply point is 1000-2500cm 2 。
In the present disclosure, the higher the temperature, the more feed points are required, the smaller the outer surface control range of the feed points.
A second aspect of the present disclosure provides a method of conditioning a glass production environment, the method comprising the steps of: and passing electric current through the first electrode 2 and the second electrode 3 to heat the platinum tube 1, wherein the heated platinum tube 1 heats glass liquid passing through a platinum channel, and supplies supply water to a supply point on the surface of the refractory material 4.
In the method, a current is introduced between a first electrode and a second electrode, a platinum tube can be heated, heat of the platinum tube is transferred to glass liquid in a platinum channel, heat of the platinum tube is transferred to a refractory material, water is supplied to a supply point on the surface of the refractory material according to a certain flow, heat in the refractory material can be transferred to water in the supply point, the water is heated and evaporated to form water vapor, and the water vapor can react with the platinum tube to generate H on the outer surface of the platinum tube + H on the outer surface of platinum tube + With H in platinum channels + H for forming stable balance + The environment is used for inhibiting the generation of bubbles and ensuring the quality of glass.
According to the present disclosure, the heating temperature for heating the platinum tube 1 is 1200-1650 ℃.
According to the present disclosure, the conditions of the supply water are:
when the temperature of the platinum channel is 1500-1650 ℃, the water flow rate of the supply point is 80-150mL/h;
when the temperature of the platinum channel is 1400-1500 ℃, the water flow rate of the supply point is 50-100mL/h;
when the temperature of the platinum channel is 1300-1400 ℃, the water flow rate of the supply point is 30-70mL/h;
when the temperature of the platinum channel is 1200-1300 ℃, the water flow rate of the supply point is 0-50mL/h.
According to the disclosure, the temperature of the platinum tube 1 is transferred to the refractory material 4, the refractory material 4 is transferred to the feed water in the feed point on the surface of the refractory material 4, and the feed water is heated and evaporated to form water vapor and then reacts on the outer wall of the platinum tube 1 to generate H + 。
According to the disclosure, H of the outer wall of the platinum tube + And H in platinum channel + H forming a balance + An environment.
A third aspect of the present disclosure provides a device according to the first aspect or a method according to the second aspect for use in constructing a substrate glass production line and a pharmaceutical glass production line.
The present disclosure is further illustrated by the following examples, but the present disclosure is not limited thereby.
Example 1
This example is illustrative of the application of the present disclosure in a substrate glass production line
The production line is a TFT substrate glass production line;
and (3) introducing current into the first electrode and the second electrode, heating the platinum pipe to 1620 ℃, heating the heated platinum pipe to 1620 ℃ through glass liquid in a platinum channel, setting 10 supply points, and supplying water to the supply points on the surface of the refractory material at a water flow rate of 100mL/h, wherein the construction cost, the running cost, the production line stability, the bubble defect rate (%) and the accessory equipment failure rate (%) are recorded and calculated in the running process.
The construction cost comprises: the water supply and distribution system is built.
The operation cost comprises the following steps: the electricity and water fees are operated every day.
The production line stability testing method comprises the following steps: the platinum tube has stable operation temperature, stable power and stable flow every day. The bubble defect rate (%) calculation method: the total amount of waste due to bubbles was detected daily, divided by the total yield.
The auxiliary equipment failure rate (%) calculating method comprises the following steps: equipment failure maintenance time divided by total run time.
The experimental results are shown in table 1.
Example 2
Based on the application of the present disclosure in a substrate glass production line as in example 1, the difference is that the first electrode and the second electrode are supplied with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through molten glass in a platinum channel, 9 supply points are set, and supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 100 mL/h.
The experimental results are shown in table 1.
Example 3
Based on the application of the present disclosure in a substrate glass production line as in example 1, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through molten glass in a platinum channel, 8 supply points are set, and supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 100 mL/h.
The experimental results are shown in table 1.
Example 4
Based on the application of the present disclosure to a substrate glass production line as in example 1, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through the molten glass in the platinum channel, 10 supply points are set, and the supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 135 mL/h.
The experimental results are shown in table 1.
Example 5
Based on the application of the present disclosure in a substrate glass production line, the same as in example 1 is distinguished in that the production line is an LTPS substrate glass production line.
The experimental results are shown in table 1.
Example 6
Based on the application of the present disclosure in a substrate glass production line, the same as in embodiment 1 is distinguished in that the production line is an OLED substrate glass production line.
The experimental results are shown in table 1.
Example 7
Based on the application of the present disclosure in a substrate glass production line, the same as in example 1 was distinguished in that the production line was a UTG substrate glass production line.
The experimental results are shown in table 1.
Example 8
This example is illustrative of the application of the present disclosure in a pharmaceutical glass production line
And (3) introducing current into the first electrode and the second electrode, heating the platinum tube to 1400 ℃, heating the heated platinum tube to 1400 ℃ through glass liquid in a platinum channel, setting 6 supply points, and supplying water to the supply points on the surface of the refractory material at a water flow rate of 65mL/h, wherein the construction cost, the running cost, the production line stability, the bubble defect rate (%) and the accessory equipment failure rate (%) are recorded and calculated in the running process.
The construction cost comprises: the water supply and distribution system is built.
The operation cost comprises the following steps: the electricity and water fees are operated every day.
The production line stability testing method comprises the following steps: the platinum tube has stable operation temperature, stable power and stable flow (the temperature fluctuation is +/-0.5 ℃, the power fluctuation is +/-60 watts, and the flow is stable to +/-1.5 kg/h) every day.
The bubble defect rate (%) calculation method: the total amount of waste due to bubbles was detected daily, divided by the total yield.
The auxiliary equipment failure rate (%) calculating method comprises the following steps: equipment failure maintenance time divided by total run time.
The experimental results are shown in table 2.
Example 9
Based on the application of the present disclosure to a substrate glass production line as in example 8, the difference is that the first electrode and the second electrode are energized with current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through the molten glass in the platinum channel, 8 supply points are set, and the supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 80 mL/h.
The experimental results are shown in table 2.
Example 10
Based on the application of the present disclosure to a substrate glass production line as in example 8, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through the molten glass in the platinum channel, 10 supply points are set, and the supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 80 mL/h.
The experimental results are shown in table 2.
Example 11
Based on the application of the present disclosure to a substrate glass production line as in example 8, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through the molten glass in the platinum channel, 7 supply points are set, and the supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 80 mL/h.
The experimental results are shown in table 2.
Comparative example 1
Based on the application of the present disclosure to a TFT substrate glass production line as in example 1, the difference is that the first electrode and the second electrode are supplied with electric current, the platinum tube is heated to 1620 ℃, the heated platinum tube is heated to 1620 ℃ through molten glass in a platinum channel, 5 supply points are set, and supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 30 mL/h.
The experimental results are shown in table 1.
Comparative example 2
Based on the application of the present disclosure to a TFT substrate glass production line as in example 1, the difference is that the first electrode and the second electrode are supplied with electric current, the platinum tube is heated to 1550 ℃, the heated platinum tube is heated to 1550 ℃ through the molten glass in the platinum channel, 10 supply points are set, and supply water is supplied to the supply points on the surface of the refractory material at a water flow rate of 25 mL/h.
The experimental results are shown in table 1.
Comparative example 3
Other methods are the same as in example 1 based on the application of the conventional sealed house to the substrate glass production line.
The experimental results are shown in table 1.
Comparative example 4
Other methods are the same as in example 1 based on the application of the pressure shell in the substrate glass production line.
The experimental results are shown in table 1.
Comparative example 5
Based on the application of the present disclosure to a substrate glass production line as in example 8, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1400 ℃, the heated platinum tube is heated to 1400 ℃ through the molten glass in the platinum channel, 6 supply points are set, and the supply water is supplied to the supply points of the refractory surface at a water flow rate of 10 mL/h.
The experimental results are shown in table 2.
Comparative example 6
Based on the application of the present disclosure in a substrate glass production line as in example 8, the difference is that the first electrode and the second electrode are energized with electric current, the platinum tube is heated to 1400 ℃, the heated platinum tube is heated to 1400 ℃ through the molten glass in the platinum channel, 8 supply points are set, and the supply water is supplied to the supply points of the refractory surface at a water flow rate of 5 mL/h.
The experimental results are shown in table 2.
Comparative example 7
Other methods are the same as in example 8 based on the application of the conventional sealed house to the substrate glass production line.
The experimental results are shown in table 2.
Comparative example 8
Other methods are the same as in example 8 based on the application of the pressure shell in the substrate glass production line.
The experimental results are shown in table 2.
TABLE 1
As can be seen from examples 1 to 7 and comparative examples 3 to 4, by adopting the method of the present disclosure, in the TFT, LTPS, OLED, UTG substrate glass production line, not only the occurrence probability of bubble defects can be reduced, but also the construction and operation costs can be reduced, the stability of the production line can be improved, and the operation is convenient; it can be seen from example 1 and comparative example 1 that reducing the number of supply points and reducing the water flow rate reduced the construction cost, and from example 1 and comparative example 2 that reducing the temperature of the platinum tube and the platinum channel and reducing the water flow rate reduced the construction cost, but the bubble defect rate of comparative examples 1-2 was significantly improved.
TABLE 2
As can be seen from examples 8 to 11 and comparative examples 7 to 8, by adopting the method of the present disclosure, in the pharmaceutical glass production line, not only the occurrence probability of bubble defects can be reduced, but also the construction and operation costs can be reduced, and the stability of the production line can be improved, and the operation is convenient; it can be seen from examples 8 and comparative examples 5 to 6 that reducing the water flow rate reduces the construction cost, but the bubble defect rate of comparative examples 5 to 6 is significantly improved.
In summary, by using the method disclosed by the invention, the glass production environment can be ensured to meet the requirements of the production quality of the substrate glass and the medicinal glass on the basis of being regulated and controlled differently, the production cost is reduced, the operation difficulty is reduced, the operation safety of the equipment attached to the platinum channel is protected, and the production efficiency of the production line is integrally improved.
The preferred embodiments of the present disclosure have been described in detail above with reference to the accompanying drawings, but the present disclosure is not limited to the specific details of the above embodiments, and various simple modifications may be made to the technical solutions of the present disclosure within the scope of the technical concept of the present disclosure, and all the simple modifications belong to the protection scope of the present disclosure.
In addition, the specific features described in the foregoing embodiments may be combined in any suitable manner, and in order to avoid unnecessary repetition, the present disclosure does not further describe various possible combinations.
Moreover, any combination between the various embodiments of the present disclosure is possible as long as it does not depart from the spirit of the present disclosure, which should also be construed as the disclosure of the present disclosure.
Claims (9)
1. A method of adjusting a glass production environment using a platinum channel device, the platinum channel device comprising: a platinum tube (1), a first electrode (2), a second electrode (3) and a refractory material (4); the inside of the platinum pipe (1) is a platinum channel, two sides of the platinum channel are respectively connected with the first electrode (2) and the second electrode (3), and the periphery of the outer wall of the platinum pipe (1) is wrapped with the refractory material (4); the surface of the refractory material (4) is provided with a supply point for supplying supply water;
the method comprises the following steps: passing an electric current through the first electrode (2) and the second electrode (3), heating the platinum tube (1), heating the heated platinum tube (1) through a glass liquid in a platinum channel, and supplying supply water to a supply point on the surface of the refractory material (4);
the conditions of the supply of the feed water are:
when the temperature of the platinum channel is 1500-1650 ℃, the water flow rate of the supply point is 80-150mL/h;
when the temperature of the platinum channel is 1400-1500 ℃, the water flow rate of the supply point is 50-100mL/h;
when the temperature of the platinum channel is 1300-1400 ℃, the water flow rate of the supply point is 30-70mL/h;
when the temperature of the platinum channel is 1200-1300 ℃, the water flow rate of the supply point is 0-50mL/h.
2. The method according to claim 1, wherein the feed point is located at the surface of the refractory material (4) and has a depth; the certain depth is the area of 80-130 ℃ of the refractory material (4).
3. The method according to claim 2, wherein the certain depth is a region where the refractory material (4) is 110-120 ℃.
4. The method of claim 1, wherein the outer surface control of the feed point is in the range of 100-2500cm 2 The method comprises the steps of carrying out a first treatment on the surface of the The feed point is located at the center of the outer surface control range.
5. The method of claim 1, wherein the outer surface of the feed point is controlled in the range of 100-1500cm when the temperature of the platinum channel is 1400-1650 °c 2 The method comprises the steps of carrying out a first treatment on the surface of the When the temperature of the platinum channel is 1200-1400 ℃, the control range of the outer surface of the supply point is 1000-2500cm 2 。
6. The method according to claim 1, wherein the heating temperature for heating the platinum tube (1) is 1200-1650 ℃.
7. The method according to claim 1, wherein the temperature of the platinum tube (1) is transferred to the refractory material (4), the refractory material (4) transfers to the feed water in the feed point on the surface of the refractory material (4), and the feed water is heated and evaporated to form water vapor and then reacts on the outer wall of the platinum tube (1) to generate H + 。
8. The method according to claim 7, wherein the platinum tube (1) has an outer wall H + And H in platinum channel + H forming a balance + An environment.
9. Use of the method of any one of claims 1-8 in the construction of a substrate glass production line and a pharmaceutical glass production line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111455250.0A CN114014517B (en) | 2021-12-01 | 2021-12-01 | Method for adjusting glass production environment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111455250.0A CN114014517B (en) | 2021-12-01 | 2021-12-01 | Method for adjusting glass production environment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114014517A CN114014517A (en) | 2022-02-08 |
| CN114014517B true CN114014517B (en) | 2023-09-15 |
Family
ID=80067366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111455250.0A Active CN114014517B (en) | 2021-12-01 | 2021-12-01 | Method for adjusting glass production environment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114014517B (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10141585C2 (en) * | 2001-08-24 | 2003-10-02 | Schott Glas | Precious metal tube for guiding a glass melt |
| JP6435827B2 (en) * | 2014-12-09 | 2018-12-12 | 日本電気硝子株式会社 | Temperature control method for molten glass |
| CN207713625U (en) * | 2017-09-12 | 2018-08-10 | 彩虹显示器件股份有限公司 | A kind of bilayer platinum channel structure |
| CN108069579B (en) * | 2018-02-05 | 2024-06-21 | 东旭光电科技股份有限公司 | Platinum passageway and improve equipment of glass clarification effect |
| CN111649432B (en) * | 2020-05-25 | 2022-05-17 | 彩虹集团（邵阳）特种玻璃有限公司 | Platinum channel humidifying device and method |
-
2021
- 2021-12-01 CN CN202111455250.0A patent/CN114014517B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN114014517A (en) | 2022-02-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5173058B2 (en) | Bubble removal method in glass making process | |
| US10934200B2 (en) | Apparatus and method for conditioning molten glass | |
| US8347655B2 (en) | Method and system for producing glass, in which chemical reduction of glass components is avoided | |
| US9073771B2 (en) | Integral capsule for blister suppression in molten glass | |
| KR102615608B1 (en) | Method for decreasing bubble lifetime on a glass melt surface | |
| CN202785956U (en) | Humidifier used during delivering of molten glass | |
| CN107001092B (en) | Glass inlet tube environmental control | |
| CN114014517B (en) | Method for adjusting glass production environment | |
| TWI567037B (en) | Method for manufacturing glass substrates | |
| US20210061694A1 (en) | Glass product manufacturing apparatus | |
| JP2017065961A (en) | Glass conduit and manufacturing method of glass substrate | |
| JP6638076B2 (en) | Apparatus for generating a vapor-containing gas atmosphere and system components including such an apparatus | |
| CN112313181B (en) | Apparatus and method for controlling oxygen-containing atmosphere in glass manufacturing process | |
| CN221644775U (en) | Dew point environment assembly for platinum channel structure and platinum channel device | |
| US20230148040A1 (en) | Apparatus and method for melting glass with thermal plasma | |
| WO2024076515A1 (en) | Apparatus and method for cooling molten glass in a conduit | |
| GB190410881A (en) | Improvements in and relating to Methods of Conducting Chemical Reactions by Means of a Mercury Vapour Arc. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A method for regulating the glass production environment Granted publication date: 20230915 Pledgee: Hengshui Bank Co.,Ltd. Pledgor: Hebei Guangxing Semiconductor Technology Co.,Ltd.|Beijing Yuanda Xinda Technology Co.,Ltd. Registration number: Y2024980031980 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right |