CN114001823A - Method and device for measuring characteristics of double-color ultrashort laser pulse - Google Patents
Method and device for measuring characteristics of double-color ultrashort laser pulse Download PDFInfo
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Abstract
The invention relates to the technical field of ultrashort laser pulse measurement, in particular to a method and a device for measuring characteristics of a bicolor ultrashort laser pulse, and aims to solve the problems that when an existing laser measurement method is used for measuring multiple lasers with spectral span exceeding one octave, the measurement method is complicated, and the spectral measurement range cannot be fully covered. The invention delays the double-color ultrashort laser pulse through the double D mirrors, focuses the three-hole grating on the mixed effect crystal after beam splitting, respectively realizes frequency doubling and transient grating on the mixed light to be detected through the mixed effect crystal, and outputs the measuring light for detection and inversion. The invention utilizes the mixed effect crystal to realize the purpose of measuring multiple beams of mixed light, simplifies the measuring method and covers the area which can not be measured by the traditional method.
Description
Technical Field
The invention relates to the technical field of ultrashort laser pulse measurement, in particular to a method and a device for measuring characteristics of a bicolor ultrashort laser pulse.
Background
With the development of ultra-strong and ultra-fast laser technology, the advanced technical researches such as bicolor field pump detection, optical parametric amplification, sub-period light field coherent synthesis and the like by utilizing the interaction of a plurality of laser pulses provide a brand new technical means for subjects such as intense field physics, condensed state physics, chemistry, information science, biomedicine and the like. How to perform waveform measurement on a plurality of beams, especially on pulses with different spectral components, is a very important and challenging research content.
For waveform measurement of ultrafast laser, the waveform of single-channel laser pulse is usually measured by using frequency-resolved optical switching (FROG) and spectral phase coherent direct electric field reconstruction (SPIDER), which are well verified internationally. However, when two beams of dual-color ultrashort laser pulses with different spectral components, especially large span, need to be measured, the above scheme is limited by the nonlinear crystal response bandwidth of the measuring device and the detection range of the spectrometer, so that the spectral range that can be measured is limited, and the full spectrum cannot be measured, so that the information such as pulse waveform obtained by final inversion is wrong. When the device is used for measuring and monitoring the characteristics of the double-color ultrashort laser pulse in real time, two sets of the devices are required, so that the measuring process is complicated and the operation difficulty is high.
Disclosure of Invention
The invention aims to solve the problems that the measurement method is complicated and the spectrum measurement range cannot be fully covered when the prior art is used for measuring a plurality of lasers with spectrum span exceeding one octave, and provides a method and a device for measuring the characteristics of double-color ultrashort laser pulses.
In order to solve the above-mentioned purpose, the invention provides the following technical scheme:
a method for measuring the characteristics of a bicolor ultrashort laser pulse is characterized by comprising the following steps:
the method comprises the following steps: delay processing of incident two-color ultrashort laser pulses
Using a double D mirror with a time delay effect to carry out time delay processing on the bicolor ultrashort laser pulse to be detected;
step two: splitting the delayed bicolor ultrashort laser pulse
Dividing the delayed bicolor ultrashort laser pulse into three beams of laser through a three-hole diaphragm;
step three: mixed effect crystal processing
The three beams of laser are focused to a mixed effect crystal through a first ultra-wideband focusing lens, and the mixed effect crystal generates two beams of measuring light which are frequency doubling measuring light and diffraction measuring light respectively; two beams of measuring light and the three beams of laser are simultaneously emitted from the mixed effect crystal;
step four: filtering the measuring light and carrying out the measurement
When two bunches of measuring light and three bunches of laser light pass through the diplopore diaphragm, the diplopore diaphragm separates and keeps off three bunches of laser light, only lets two bunches of measuring light pass through, and two bunches of measuring light focus to the spectrum appearance through the second ultra wide band focusing mirror again in, obtain the pulse characteristic of double-colored laser through the inversion, the pulse characteristic includes one or more in electric field shape, spectral structure, spectral bandwidth, pulse width, phase information and the chirp information.
Further, the specific process of the first step is to reflect the to-be-detected two-color ultrashort laser pulse through the double D mirror, so that the to-be-detected two-color ultrashort laser pulse is divided into half of the switching light and half of the signal light with the delay information.
Further, the specific process of the second step is to divide half of the switching light and half of the signal light into three beams of laser light with a spatial distance therebetween through the three-hole diaphragm; wherein half of the switching light is divided into first switching light and second switching light, and half of the signal light generates a beam of signal light.
Further, in the third step, the mixed effect crystal uses a crystal having both second-order and third-order nonlinearity;
the mixed effect crystal is monocrystalline silicon dioxide or monocrystalline barium metaborate or lithium triborate crystal or lithium cesium triborate crystal or ammonium dihydrogen phosphate crystal or potassium dideuterium phosphate crystal;
the mixed effect crystal thickness is below 100 μm.
Further, in the first step, the double-D mirror is two D-shaped mirrors with opposite straight edges, wherein one D-shaped mirror is arranged on the translation stage;
in the third step, the focal length of the first ultra-wideband focusing mirror is 100 mm;
in the fourth step, the focal length of the second ultra-wideband focusing mirror is 50 mm;
in the fourth step, the measurement range of the spectrometer is 200-1000 nm.
In order to realize the method, the invention also provides a device for measuring the characteristics of the bicolor ultrashort laser pulse, which is characterized in that: the system comprises a double-D lens 6, a three-hole diaphragm 7, a first ultra-wideband focusing lens 8, a mixed effect crystal 9, a two-hole diaphragm 10, a second ultra-wideband focusing lens 11 and a spectrometer 12 which are sequentially arranged along a light path;
the mixed effect crystal 9 is arranged at the focus of the first ultra-wideband focusing mirror 8; the focus of the second ultra-wideband focusing mirror 11 coincides with the receiving point of the spectrometer 12;
the double-color ultrashort laser pulse is incident to a double D mirror 6 with a delay effect and is subjected to delay processing, then is split into three beams of laser through a three-hole diaphragm 7, the three beams of laser are focused through a first ultra-wideband focusing mirror 8 and then are incident to a mixed effect crystal 9 to generate two new beams of measuring light, the two beams of measuring light and the three beams of laser are separated after passing through a double-hole diaphragm 10, the two beams of measuring light pass through, and are focused into a spectrometer 12 through a second ultra-wideband focusing mirror 11.
Further, the double D-mirror 6 is two D-mirrors with opposite straight edges, wherein one D-mirror is mounted on the translation stage.
Further, the mixed effect crystal 9 uses a crystal having both second-order and third-order nonlinearities; the mixed effect crystal 9 is monocrystalline silicon dioxide or monocrystalline barium metaborate or lithium triborate crystal or lithium cesium triborate crystal or ammonium dihydrogen phosphate crystal or potassium dideuterium phosphate crystal;
the thickness of the mixed effect crystal 9 is below 100 μm.
Further, three holes on the three-hole diaphragm 7 are distributed in an isosceles right triangle.
Further, the focal length of the first ultra-wideband focusing mirror 8 is 100 mm;
the focal length of the second ultra-wideband focusing mirror 11 is 50 mm;
the spectrometer 12 measures over a range of 200 and 1000 nm.
The invention has the beneficial effects that:
1. the invention utilizes the characteristic of the mixed effect crystal to realize the double-color ultrashort laser pulse frequency multiplication and transient grating effect at the same time, so that one spectrometer can measure the double-color ultrashort laser pulse at the same time, thereby reducing the operation difficulty;
2. the invention utilizes the characteristic of the mixed effect crystal to realize the double-color ultrashort laser pulse frequency multiplication and transient grating effect simultaneously, so that the measurement can be realized in the frequency band which cannot be covered by the prior art, and the defects of the prior art are overcome;
3. the specific embodiment provided by the invention measures the to-be-measured two-color ultrashort laser pulse simulated by the laser beam combination with the center wavelength of 800nm and 1350nm and the pulse width of about 30fs, and the measurement result is that the two-color ultrashort laser pulse comprises the laser with the wavelength of 750-850nm and the electric field envelope of 1200-1500nm and the electric field envelope of 27fs and 29fs respectively, thereby proving that the measurement result of the invention is reliable;
4. the device for measuring the characteristics of the double-color ultrashort laser pulse provided by the invention is simple in structure, and compared with the prior art, the difficulty of measuring specific laser is reduced.
Drawings
FIG. 1 is a schematic diagram of an embodiment of a dual-color ultrashort laser pulse characteristic measuring apparatus according to the present invention;
FIG. 2 is a schematic diagram of mixed effect crystal emergent light in an embodiment of a method for measuring characteristics of a bicolor ultrashort laser pulse according to the present invention.
FIG. 3 is a spectrum trace diagram of two beams of measuring light obtained by the spectrometer in the embodiment of the present invention; wherein, the solid line square frame is a spectrum trace diagram obtained by diffracting the measuring light, and the dotted line square frame is a spectrum trace diagram obtained by frequency doubling measuring light;
fig. 4 is a processing result of the frequency doubling measured optical spectrum trace diagram in fig. 3, wherein (a) the optical spectrum trace diagram is obtained directly through a spectrometer, (b) the optical spectrum trace diagram is inverted, (c) the spectral bandwidth and chirp information, and (d) the pulse width and phase information;
fig. 5 is a processing result of the diffraction measurement optical spectrum trace map of fig. 3, in which (a) the spectrum trace map obtained directly by the spectrometer, (b) the spectrum trace map is inverted, (c) the spectral bandwidth and chirp information, and (d) the pulse width and phase information;
description of reference numerals:
1-laser, 2-first laser, 3-second laser, 4-plane mirror, 5-dichroic mirror, 6-double-D mirror, 7-three-hole diaphragm, 8-first ultra-wideband focusing mirror, 9-mixed effect crystal, 10-two-hole diaphragm, 11-second ultra-wideband focusing mirror, and 12-spectrometer;
01-first switch light, 02-second switch light, 03-signal light, 04-frequency doubling measuring light, 05-diffraction measuring light.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The specific realization principle of the method for measuring the characteristics of the bicolor ultrashort laser pulse provided by the invention is as follows: firstly, carrying out time delay processing on double-color ultrashort laser pulses, splitting the time-delayed double-color ultrashort laser pulses into three beams of laser, focusing the three beams of laser, then, enabling the three beams of laser to enter a mixed effect crystal, generating two new beams of measuring light by the mixed effect crystal, and enabling the two beams of measuring light and the three beams of laser to simultaneously exit from the mixed effect crystal; and then separating and blocking three beams of laser by a double-hole diaphragm, allowing only two beams of measuring light to pass through and focus into a spectrometer, and obtaining the pulse characteristic of the bicolor laser through inversion.
Based on the description of the implementation principle of the method, the invention also provides a specific device for implementing the method, which comprises a double-D lens 6, a three-hole diaphragm 7, a first ultra-wideband focusing lens 8, a mixed effect crystal 9, a two-hole diaphragm 10, a second ultra-wideband focusing lens 11 and a spectrometer 12.
In this embodiment, the two-color ultrashort laser pulse is generated by using a laser 1, a plane mirror 4 and a dichroic mirror 5.
As shown in fig. 1, the laser 1 has two laser exit ports and can simultaneously emit laser light having different spectral components. A plane mirror 4 and a dichroic mirror 5 are respectively arranged on the light paths of the two laser emitting ports, and two beams of laser with different spectral components are combined in space through the matching of the plane mirror 4 and the dichroic mirror 5, so as to simulate the bicolor ultrashort laser pulse to be measured. The two-color ultrashort laser pulses are incident on the double-D mirror 6. The double-D mirror 6 is two D-shaped mirrors with opposite straight edges, in particular to a broadband reflecting dielectric mirror, wherein one D-shaped mirror is arranged on the translation stage. A first ultra-wideband focusing mirror 8 with the focal length of 100mm is arranged on a reflection light path of the double D mirror 6; a three-hole diaphragm 7 is arranged on a light path between the double D mirror 6 and the first ultra-wideband focusing mirror 8; a mixed effect crystal 9 is arranged at the focus of the first ultra-wideband focusing mirror 8; the mixed effect crystal 9 is a crystal having both second-order and third-order nonlinearities, and has a thickness of 100 μm or less, and in this embodiment, the mixed effect crystal 9 is a single crystal silicon dioxide crystal having a thickness of 30 μm and a size of 5 × 5 mm. The second ultra-wideband focusing lens 11 with the focal length of 50mm is arranged on the light path of the emergent light of the mixing effect crystal 9. A double aperture diaphragm 10 is arranged between the mixing effect crystal 9 and a second ultra-wideband focusing mirror 11. Three holes on the three-hole diaphragm 7 are distributed in an isosceles right triangle shape. The focus of the second ultra-wideband focusing mirror 11 coincides with the focus of the spectrometer 12. The spectrometer 12 measures over a range of 200 and 1000 nm.
According to the apparatus shown in fig. 1, the specific measurement experiment process is as follows:
1. generating two-color ultrashort laser pulses
The laser 1 emits two beams of pulses to be detected with different spectral components, namely a first laser 2 and a second laser 3; wherein, the pulse width of the first laser 2 and the second laser 3 is about 30fs, and the energy is 0.2 mJ; the center wavelength of the first laser 2 is 800nm, and the center wavelength of the second laser 3 is 1350 nm.
The first laser 2 is reflected to a dichroic mirror 5 through a plane mirror 4 to be spatially combined with the second laser 3, thereby forming a two-color ultrashort laser pulse.
2. Delayed processing of two-color ultrashort laser pulses
The obtained double-color ultrashort laser pulse passes through a double D mirror 6 with a time delay effect, the double D mirror 6 can be a broadband reflection medium mirror or a silver mirror, one D-shaped mirror is placed on a precise translation stage, the translation stage can be a PZT piezoelectric ceramic translation stage, and the precision of the translation stage is 1 nm. The combined laser is divided into a half of switch light and a half of signal light with delay information through the double D mirror 6, and the half of switch light and the half of signal light are independently distributed on the double D mirror;
3. beam-splitting time-delay processed bicolor ultrashort laser pulse
Half of the switching light and half of the signal light with the time delay information are divided into three beams of laser by a three-hole diaphragm 7 with three holes distributed in an isosceles right triangle. Half of the switching light passes through the hole at the right-angle position on the three-hole diaphragm 7 and the hole at one acute-angle position to generate first switching light 01 and second switching light 02, and half of the signal light passes through the hole at the other acute-angle position on the three-hole diaphragm 7 to generate signal light 03;
4. mixed effect crystal processing
Focusing the first switch light 01, the second switch light 02 and the signal light 03 to a mixed effect crystal 9 through a first ultra-wideband focusing lens 8 with the focal length of 100mm, wherein the mixed effect crystal 9 generates two beams of measuring light; the mixed effect crystal 9 is monocrystalline silicon dioxide with a crystal thickness of 30 μm and dimensions of 5X 5 mm.
The two measuring beams exit the mixed effect crystal 9 simultaneously with the first switching light 01, the second switching light 02 and the signal light 03.
For the convenience of understanding the principle of the mixed effect crystal 9, it is assumed that a light screen is disposed on the emergent light path of the mixed effect crystal 9, and the distribution of the two beams of measurement light and the first switch light 01, the second switch light 02 and the signal light 03 is shown in fig. 2, wherein three large circles represent the first switch light 01, the second switch light 02 and the signal light 03 respectively, and two small circles represent the two beams of measurement light generated by the mixed effect crystal.
The first switch light 01 and the signal light 03 generate a frequency doubling effect in the mixed effect crystal 9, and frequency doubling measuring light 04 is obtained at the position between the first switch light 01 and the signal light 03;
the first switch light 01, the second switch light 02 and the signal light 03 generate a transient grating effect in the mixed effect crystal 9, and diffraction measuring light 05 is obtained at the diagonal position of the first switch light 01;
the frequency doubling measuring light 04 and the diffraction measuring light 05 are two beams of measuring light generated by the mixed effect crystal 9.
5. Filtering the measuring light and carrying out the measurement
Referring to fig. 2, a certain divergence angle exists between the first switch light 01, the second switch light 02 and the signal light 03 passing through the mixed effect crystal 9 and between the frequency doubling measuring light 04 and the diffraction measuring light 05, the first switch light 01, the second switch light 02 and the signal light 03 passing through the mixed effect crystal 9 in the fourth step are blocked by a double-aperture diaphragm 10 arranged according to the spatial position, so that the frequency doubling measuring light 04 and the diffraction measuring light 05 pass through, the frequency doubling measuring light 04 and the diffraction measuring light 05 are focused into a spectrometer 12 through a second ultra-wide band focusing mirror 11 with a focal length of 50mm, and the measurement range of the spectrometer 12 is 200-1000 nm. At the moment, the pulse characteristics of the bicolor laser are obtained through inversion, and two bicolor field pulses with different spectral components can be measured by using the same spectrometer.
The measurement results are shown in fig. 3.
In fig. 3, the solid-line frame is a spectrum trace obtained by diffracting the signal light 05, the dotted-line frame is a spectrum trace obtained by the frequency-doubled signal light 04, and finally, the optical information of the two-color field is obtained by respectively processing the spectrum signal changing with the time delay through a software algorithm, wherein the optical information includes pulse width, phase information, spectral bandwidth, chirp information, a spectrum trace obtained directly through a spectrometer and a spectrum trace obtained by software inversion, so as to obtain fig. 4 and 5.
Specifically, fig. 4 is a processing result of a spectral trace pattern obtained by diffracting the signal light 05, wherein (a) is a spectral trace pattern obtained directly by a spectrometer, and (b) is an inverted spectral trace pattern; (c) the solid line in the graph is the actually measured spectrum, the long dashed line is the inverted spectrum, the spectrum range is 750-; (d) the figure shows the electric field profile of the pulse, where the solid line is the electric field envelope, the known pulse width is 27fs, and the dashed line is the electric field phase, within 5 rad.
Fig. 5 is a processing result of a spectral trace plot obtained by frequency doubling signal light 04, wherein (a) is a spectral trace plot obtained directly by a spectrometer, and (b) is an inverted spectral trace plot; (c) the solid line in the graph is the actually measured spectrum, the long dashed line is the inverted spectrum, the spectrum range is 1200 and 1500nm, and the short dashed line is the spectrum phase within 10 rad; (d) the figure shows the electric field profile of the pulse, where the solid line is the electric field envelope, the known pulse width is 29fs, and the dashed line is the electric field phase, within 10 rad.
Combining the results obtained in FIG. 4 and FIG. 5, obtaining the information of the measured two-color ultrashort laser pulses, wherein the two-color ultrashort laser pulses comprise lasers with wavelengths between 750-850nm and 1200-1500nm, spectral phases within 5rad and 10rad, and electric field envelopes of 27fs and 29fs, respectively; corresponding to the laser information emitted by the laser 1 in the first step of this embodiment, that is, the pulse widths of the first laser 2 and the second laser 3 are both about 30fs, and the energy is both 0.2 mJ; the central wavelength of the first laser 2 is 800nm, and the central wavelength of the second laser 3 is 1350nm, which proves that the result obtained by the embodiment is reliable.
The method and the device for measuring two-color ultrashort laser pulses provided by the embodiment of the invention are described in detail, a specific example is applied in the description to explain the principle and the implementation mode of the invention, and the description of the embodiment is only used for helping to understand the method and the core idea of the invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. A method for measuring the characteristics of a bicolor ultrashort laser pulse is characterized by comprising the following steps:
the method comprises the following steps: delay processing of incident two-color ultrashort laser pulses
Using a double D mirror with a time delay effect to carry out time delay processing on the bicolor ultrashort laser pulse to be detected;
step two: splitting the delayed bicolor ultrashort laser pulse
Dividing the delayed bicolor ultrashort laser pulse into three beams of laser through a three-hole diaphragm;
step three: mixed effect crystal processing
The three beams of laser are focused to a mixed effect crystal through a first ultra-wideband focusing lens, and the mixed effect crystal generates two beams of measuring light which are frequency doubling measuring light and diffraction measuring light respectively; two beams of measuring light and the three beams of laser are simultaneously emitted from the mixed effect crystal;
step four: filtering the measuring light and carrying out the measurement
When two bunches of measuring light and three bunches of laser light pass through the diplopore diaphragm, the diplopore diaphragm separates and keeps off three bunches of laser light, only lets two bunches of measuring light pass through, and two bunches of measuring light focus to the spectrum appearance through the second ultra wide band focusing mirror again in, obtain the pulse characteristic of double-colored laser through the inversion, the pulse characteristic includes one or more in electric field shape, spectral structure, spectral bandwidth, pulse width, phase information and the chirp information.
2. The method of claim 1, wherein the method comprises: the specific process of the first step is to reflect the to-be-detected two-color ultrashort laser pulse through the double D mirror, so that the to-be-detected two-color ultrashort laser pulse is divided into half of switching light and half of signal light with time delay information.
3. The method of claim 2, wherein the method comprises: the specific process of the second step is that half of the switching light and half of the signal light are divided into three beams of laser with space distance between each other through the three-hole diaphragm; wherein half of the switching light is divided into first switching light and second switching light, and half of the signal light generates a beam of signal light.
4. The method of claim 3, wherein the method comprises: in the third step, the mixed effect crystal uses a crystal which has second-order and third-order nonlinearity simultaneously;
the mixed effect crystal is monocrystalline silicon dioxide or monocrystalline barium metaborate or lithium triborate crystal or lithium cesium triborate crystal or ammonium dihydrogen phosphate crystal or potassium dideuterium phosphate crystal;
the mixed effect crystal thickness is below 100 μm.
5. The method of claim 4, wherein the method comprises:
in the first step, the double-D mirror is two D-shaped mirrors with opposite straight edges, wherein one D-shaped mirror is arranged on the translation table;
in the third step, the focal length of the first ultra-wideband focusing mirror is 100 mm;
in the fourth step, the focal length of the second ultra-wideband focusing mirror is 50 mm;
in the fourth step, the measurement range of the spectrometer is 200-1000 nm.
6. A kind of double-colored ultrashort laser pulse characteristic measuring device, characterized by that: the device comprises a double-D lens (6), a three-hole diaphragm (7), a first ultra-wideband focusing lens (8), a mixed effect crystal (9), a two-hole diaphragm (10), a second ultra-wideband focusing lens (11) and a spectrometer (12) which are sequentially arranged along a light path;
the mixed effect crystal (9) is arranged at the focus of the first ultra-wideband focusing mirror (8); the focus of the second ultra-wideband focusing mirror (11) is superposed with the receiving point of the spectrometer (12);
the double-color ultrashort laser pulse is incident to a double D mirror (6) with a delay effect and is subjected to delay processing, then is split into three beams of laser through a three-hole diaphragm (7), the three beams of laser are focused through a first ultra-wideband focusing mirror (8) and then are incident to a mixed effect crystal (9) to generate two new beams of measuring light, the two beams of measuring light and the three beams of laser are separated after passing through a double-hole diaphragm (10), the two beams of measuring light pass through, and are focused into a spectrometer (12) through a second ultra-wideband focusing mirror (11).
7. The apparatus of claim 6, wherein: the double-D mirror (6) is two D-shaped mirrors with opposite straight edges, and one D-shaped mirror is arranged on the translation stage.
8. The apparatus of claim 6, wherein: the mixed effect crystal (9) uses a crystal with second-order and third-order nonlinearity simultaneously; the mixed effect crystal (9) is monocrystalline silicon dioxide or monocrystalline barium metaborate or lithium triborate crystal or lithium cesium triborate crystal or ammonium dihydrogen phosphate crystal or potassium dideuterium phosphate crystal;
the thickness of the mixed effect crystal (9) is less than 100 mu m.
9. The apparatus of claim 6, wherein: three holes on the three-hole diaphragm (7) are distributed in an isosceles right triangle shape.
10. The apparatus of claim 6, wherein: the focal length of the first ultra-wideband focusing mirror (8) is 100 mm;
the focal length of the second ultra-wideband focusing mirror (11) is 50 mm;
the measurement range of the spectrometer (12) is 200-1000 nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111198004.1A CN114001823B (en) | 2021-10-14 | 2021-10-14 | Method and device for measuring characteristics of double-color ultrashort laser pulse |
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| CN102636272A (en) * | 2012-03-22 | 2012-08-15 | 中国科学院上海光学精密机械研究所 | Femtosecond laser pulse measurement method based on transient grating effect and device |
| CN106197693A (en) * | 2016-07-13 | 2016-12-07 | 中国工程物理研究院激光聚变研究中心 | A kind of ultrashort laser pulse waveform meter |
| CN107101730A (en) * | 2017-05-03 | 2017-08-29 | 天津大学 | The frequency resolved optical gating measuring instrument of interference displacement measurement auxiliary |
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| CN102636272A (en) * | 2012-03-22 | 2012-08-15 | 中国科学院上海光学精密机械研究所 | Femtosecond laser pulse measurement method based on transient grating effect and device |
| CN106197693A (en) * | 2016-07-13 | 2016-12-07 | 中国工程物理研究院激光聚变研究中心 | A kind of ultrashort laser pulse waveform meter |
| CN107101730A (en) * | 2017-05-03 | 2017-08-29 | 天津大学 | The frequency resolved optical gating measuring instrument of interference displacement measurement auxiliary |
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