CN113960714A - Grating processing method and system for planar waveguide substrate - Google Patents
Grating processing method and system for planar waveguide substrate Download PDFInfo
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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Abstract
The invention discloses a grating processing method of a planar waveguide substrate, which comprises the following steps: placing a planar waveguide substrate on an object stage, and adjusting the object stage to focus laser emitted by a femtosecond laser on the central position of a waveguide core area of the planar waveguide substrate; acquiring the laser repetition frequency of the femtosecond laser, determining the moving speed of the objective table according to the laser repetition frequency, and controlling the objective table to move at the determined moving speed; controlling the femtosecond laser to emit laser according to the laser repetition frequency; adjusting the power of the laser through a polarization control sheet to obtain processing laser; and performing grating writing on the waveguide core region by the processing laser in a point-by-point processing mode. The invention has the beneficial effects that: the grating with different lengths and central wavelengths can be flexibly written, the efficiency is high, and the processing is convenient.
Description
Technical Field
The embodiment of the invention relates to the field of grating processing, in particular to a grating processing method and system for a planar waveguide substrate.
Technical Field
With the progress of society, as light has the characteristics of high propagation speed, strong anti-interference capability, low attenuation and the like relative to points, communication systems and sensing systems increasingly adopt the technology in the aspect of the light field. The optical waveguide can restrict the propagation path of light, control the propagation aspect of light, and realize the chip of the optical device. Optical waveguides can be used to carry data, video and voice signals simultaneously, transmitting signals from one place to another. At present, a plurality of paths of signals can be transmitted in one optical fiber, each path of optical signal has different wavelengths, and all the wavelengths are separated far enough to ensure that the optical signals of different paths cannot be overlapped. After the multi-channel mixing at the transmission end, different wavelength channels can be separated at the receiving end. Such a technique in which multiplexed information is transmitted in one optical band is called a wavelength division multiplexing technique. Therefore, the writing of the grating is particularly important, stable and efficient.
Disclosure of Invention
In view of this, an object of the embodiments of the present invention is to provide a method and a system for processing gratings on a planar waveguide substrate, which can flexibly write gratings with different lengths and central wavelengths, and have high efficiency and convenient processing.
In order to achieve the above object, an embodiment of the present invention provides a grating processing method for a planar waveguide substrate, including:
placing a planar waveguide substrate on an object stage, and adjusting the object stage to focus laser emitted by a femtosecond laser on the central position of a waveguide core area of the planar waveguide substrate;
acquiring the laser repetition frequency of the femtosecond laser, determining the moving speed of the objective table according to the laser repetition frequency, and controlling the objective table to move at the determined moving speed;
controlling the femtosecond laser to emit laser according to the laser repetition frequency;
adjusting the power of the laser through a polarization control sheet to obtain processing laser;
and performing grating writing on the waveguide core region by the processing laser in a point-by-point processing mode.
Further, the placing the planar waveguide substrate on a stage, and adjusting the stage to focus laser light emitted by the femtosecond laser on a central position of the waveguide core area of the planar waveguide substrate includes:
placing the planar waveguide substrate on the stage, the planar waveguide substrate comprising a waveguide core region;
and adjusting the objective table to enable the laser emitted by the femtosecond laser to sequentially pass through a reflector and an objective lens and be focused on the central position of the waveguide core area.
Further, the polarization control sheet includes a glass sheet and a glan prism sheet, and the power adjustment of the laser light by the polarization control sheet to obtain the processing laser light includes:
adjusting the incidence angle of the laser through the slide;
and according to the incident angle, carrying out power adjustment on the laser through the Glan prism sheet to obtain the processing laser.
Further, the performing grating writing on the waveguide core area by the processing laser by using a point-by-point processing mode includes:
obtaining the refractive index of the waveguide core region and the order of the grating;
obtaining the processing wavelength of the grating according to the refractive index, the order, the laser repetition frequency and the moving speed;
and performing grating writing on the waveguide core region according to the processing wavelength by adopting a point-by-point processing mode.
Further, the obtaining the processing wavelength of the grating according to the refractive index, the order, the laser repetition frequency, and the moving speed includes:
calculating the processing wavelength through a first formula;
the first formula is: λ ═ 2nV/mfr, where λ is the processing wavelength; n is a refractive index, n is a constant; m is the order of the grating, and m is a constant; fr is the laser repetition frequency and V is the moving speed.
Further, the performing, by using a point-by-point processing manner, grating writing on the waveguide core region by the processing laser according to the processing wavelength includes:
changing the processing wavelength by changing the order of the grating;
and writing the gratings with different processing wavelengths on the waveguide core region in a point-by-point processing mode.
Further, the method further comprises:
and arranging an optical input port and a plurality of optical output ports on the planar waveguide substrate, wherein the plurality of optical output ports correspond to the gratings with different processing wavelengths.
Further, the method further comprises:
coupling red light at a light input port of the planar waveguide substrate;
and projecting the writing process of the grating onto a charge coupled device through a reflector by the red light so as to observe an image.
Further, the method further comprises:
controlling the on-off of the laser through an optical switch; and/or
The object stage is a three-dimensional adjusting platform.
In order to achieve the above object, an embodiment of the present invention provides a grating processing system for a planar waveguide substrate, including:
the femtosecond grating device is used for emitting laser;
the first polaroid is used for adjusting the incidence angle of the laser;
the second polaroid is used for adjusting the polarization state of the laser based on the incident angle so as to adjust the power of the laser to obtain processing laser;
the optical switch is used for controlling the on-off of the processing laser;
a mirror for reflecting the processing laser light;
an objective lens for focusing the processing laser reflected by the mirror;
and the object stage is provided with a planar waveguide substrate and is used for moving the waveguide substrate so as to enable the focused processing laser to perform grating writing on the planar waveguide substrate.
According to the grating processing method and system for the planar waveguide substrate, the femtosecond laser is used for emitting laser, the laser is focused on the waveguide chip for grating processing after polarization adjustment is carried out on the laser, the space between gratings can be changed by setting different laser repetition frequencies and movement rates, the central wavelength of the gratings is further changed, the gratings with different lengths and central wavelengths can be flexibly written, and the efficiency is high.
Drawings
Fig. 1 is a flowchart of a first embodiment of a grating processing method for a planar waveguide substrate according to the present invention.
Fig. 2 is a flowchart of step S100 according to an embodiment of the present invention.
Fig. 3 is a flowchart of step S160 according to an embodiment of the present invention.
Fig. 4 is a flowchart of step S180 according to an embodiment of the present invention.
Fig. 5 is a flowchart of step S183 according to the first embodiment of the present invention.
Fig. 6 is a flowchart of step S190 according to an embodiment of the present invention.
FIG. 7 is a diagram of a second embodiment of a grating processing system for a planar waveguide substrate according to the present invention.
Fig. 8 is a schematic diagram illustrating a first effect of the first embodiment of the invention.
Fig. 9 is a diagram illustrating a second effect of the first embodiment of the invention.
Fig. 10 is a diagram illustrating a third effect of the first embodiment of the invention.
Fig. 11 is a schematic structural diagram of a planar waveguide substrate according to a first embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example one
As shown in fig. 1, an embodiment of the present invention describes a grating processing method for a planar waveguide substrate.
Step S100, a planar waveguide substrate is placed on an objective table, and the objective table is adjusted to focus laser emitted by a femtosecond laser on the central position of a waveguide core area of the planar waveguide substrate.
Specifically, the object stage is preferably a three-dimensional adjusting platform and comprises an X-dimensional platform, a Y-dimensional platform and a Z-dimensional platform, the planar waveguide substrate is placed on a plane formed by the X, Y-dimensional platforms, and laser emitted by the femtosecond laser is emitted from the Z-dimensional plane and focused on the central position of a waveguide core area of the planar waveguide substrate.
Exemplarily, referring to fig. 2, the step S100 further includes:
the step S101 is to place the planar waveguide substrate on the stage, where the planar waveguide substrate includes a waveguide core region.
Specifically, as shown in fig. 11, the planar waveguide substrate is an embedded trench waveguide, and includes an upper substrate, a lower substrate, and a waveguide core region portion in the middle.
And step S102, adjusting the objective table to enable the laser emitted by the femtosecond laser to sequentially pass through a reflector and an objective lens and focus on the central position of the waveguide core area.
Specifically, with a high-power focusing objective lens, laser light emitted from a femtosecond laser can be focused on the central region of the core region to perform grating processing.
And step S120, acquiring the laser repetition frequency of the femtosecond laser, determining the moving speed of the objective table according to the laser repetition frequency, and controlling the objective table to move at the determined moving speed.
Specifically, the parameters of the femtosecond laser can be controlled by a controller of the femtosecond laser, for example, a matched upper computer performs parameter configuration. The parameters of the configuration include, but are not limited to, laser wavelength and laser repetition rate. And the moving speed at the moment is set according to the laser repetition frequency so as to realize the periodic modulation of the refractive index of the waveguide core region and ensure that gratings with different periods are processed.
And step S140, controlling the femtosecond laser to emit laser according to the laser repetition frequency.
Specifically, after the laser repetition frequency is determined, laser is emitted at the determined laser repetition frequency, and the periodic modulation of the refractive index of the core area is realized by adopting a point-by-point processing mode.
And step S160, adjusting the power of the laser through the polarization control sheet to obtain the processing laser.
Specifically, the laser light emitted from the femtosecond laser is power-adjusted through the half glass W and the glan mirror P. Because the laser emitted by the femtosecond laser is linearly polarized light, the linearly polarized light is still polarized light after passing through the glass slide, but the polarization state has a certain relation with the incident angle of the laser and the glass slide, the polarization state of the laser can be controlled by controlling the angle, and the power can be adjusted by combining the angle of the Glan prism.
Exemplarily, the polarization control sheet includes a glass sheet and a glan prism sheet, and referring to fig. 3, the step S160 further includes:
step S161, adjusting an incident angle of the laser light by the slide.
Specifically, the femtosecond laser firstly adjusts the incident angle through a two-half slide, when the laser passes through the two-half slide, the incident angle is one half of the emergent angle, and the incident angle of the laser is adjusted, so that the emergent angle passing through the reflector is focused on the planar waveguide substrate through the objective lens.
And S162, carrying out power adjustment on the laser through the Glan prism sheet according to the incident angle to obtain the processing laser.
Specifically, the glan prism maximizes the frequency of the polarized laser light emitted from the incident angle, and the processing laser light is obtained, so that grating processing can be performed better.
And S180, performing grating writing on the waveguide core area by the processing laser in a point-by-point processing mode.
Specifically, the point-by-point processing mode is line-by-line processing, and gratings with the same width in each line are processed in the waveguide core region. The femtosecond laser can directly write the grating on the planar waveguide point by point without adding a phase mask plate, can flexibly write the grating with different lengths and central wavelengths, and has low cost, high efficiency and convenient processing.
Exemplarily, referring to fig. 4, the step S180 further includes:
and step S181, obtaining the refractive index of the waveguide core region and the order of the grating.
Specifically, the upper and lower substrates of the planar waveguide substrate can be made of quartz materials, the refractive index is m, the material of the waveguide core area can be germanium-doped quartz, the refractive index is n, the refractive index of n is larger than the value of the refractive index of n, the waveguide core area with high refractive index is wrapped inside the substrate with low refractive index, a boundary with dense light and sparse light is formed at the boundary, and when light is transmitted in the waveguide core area, the light meets the total reflection phenomenon and is bound in the core area for lossless transmission. The grating order is set by the period of the grating.
And S182, obtaining the processing wavelength of the grating according to the refractive index, the order, the laser repetition frequency and the moving speed.
Exemplarily, the step S182 further includes:
calculating the processing wavelength through a first formula;
the first formula is: λ ═ 2nV/mfr, where λ is the processing wavelength; n is a refractive index, n is a constant; m is the order of the grating, and m is a constant; fr is the laser repetition frequency and V is the moving speed.
Specifically, when the grating is written, the center wavelength of the grating can be set by the refractive index, the order, the laser repetition frequency, and the moving speed. Similarly, when a certain central wavelength needs to be processed, the laser repetition frequency and the moving speed can be determined according to the period of the grating.
And step S183, performing grating writing on the waveguide core region according to the processing wavelength by adopting a point-by-point processing mode.
Specifically, the ultrashort pulse laser of the femtosecond laser is adopted to carry out nonlinear processing on the waveguide material, the periodic change of the refractive index of the waveguide can be directly modulated, the grating writing with different periods is realized by controlling the point-by-point processing distance of the femtosecond laser, and the writing of the Bragg grating with different central wavelengths is further realized.
Exemplarily, referring to fig. 5, the step S183 further includes:
step S183A, changing the processing wavelength by changing the order of the grating.
Specifically, the bragg grating is a part of the planar waveguide, the bragg grating has a specific reflection wavelength called bragg wavelength, the bragg center wavelength is determined by the refractive index of the waveguide and the grating period, and λ ═ 2a Λ; wherein λ is the Bragg wavelength of the grating, a is the effective refractive index of the waveguide core region, and Λ is the period of the grating. It follows that the pitch of the periods determines the bragg wavelength, i.e. the center wavelength, of the grating.
Step S183B, writing the gratings with different processing wavelengths on the waveguide core region in a point-by-point processing manner.
Specifically, after the processing wavelength of the grating is changed, wavelengths with different periods can be written on the waveguide core region to transmit light with different wavelengths. As shown in fig. 8, the processed planar waveguide substrate includes a planar waveguide substrate and four waveguide core region structures, and is obtained by processing a bragg grating in each of the core region structures, where the grating region periods are all the same, and are d1, d2, d3 and d4, respectively, so that the four bragg gratings have different bragg center wavelengths, and can select light with different center wavelengths, and as can be seen from the corresponding relationship in fig. 9, the grating periods d1, d2, d3 and d4 correspond to reflection peaks λ 1, λ 2, λ 3 and λ 4 with different center wavelengths, and can select light with λ 1, λ 2, λ 3 and λ 4, respectively.
Illustratively, the processed waveguide can realize that light with different wavelengths is selected and output through a formulated output interface. The multi-channel mixed signal input from the input port 5 passes through the first grating 4, and the light of the channel with the center wavelength of lambda 4 is reflected and output from the interface 4; the mixed signal passes through the grating 3, and the light of the channel with the center wavelength of lambda 3 is reflected and output from the interface 3; the mixed signal passes through the grating 2, and the light of the channel with the center wavelength of lambda 2 is reflected and output from the interface 2; the mixed signal passes through the grating 1, and the light of the channel with the center wavelength of lambda 1 is reflected and output from the interface 1; the optical device performs a wavelength selective output function.
Illustratively, the method further comprises:
and arranging an optical input port and a plurality of optical output ports on the planar waveguide substrate, wherein the plurality of optical output ports correspond to the gratings with different processing wavelengths.
Specifically, as shown in fig. 10, waveguide input/output ports of a special structure are pre-processed on a substrate, and each of the waveguide input/output ports includes a light input port 5, a light output port 6, and four side output ports 1, 2, 3, 4, and the waveguide has a branched structure, and gratings 1, 2, 3, 4 are processed at the illustrated positions, and the reflection center wavelengths of the gratings are λ 1, λ 2, λ 3, λ 4, respectively.
Exemplarily, referring to fig. 6, the method further includes step S190:
step S191, coupling red light at the light input port of the planar waveguide substrate.
In particular, by introducing red light in the planar waveguide substrate, the image effect of the observation can be enhanced. The input end of the optical waveguide is coupled by using a collimator, red light can be coupled into the waveguide in a butt joint mode, and the red light is generated by a red laser.
And step S192, projecting the writing process of the grating onto a charge coupled device through a reflector by the red light so as to observe an image.
Specifically, fig. 10 is an image seen through a CCD (charge coupled device) during grating processing, which is used to image a processing area and observe the processing effect.
Illustratively, the method further comprises:
controlling the on-off of the laser through an optical switch; and/or
The object stage is a three-dimensional adjusting platform.
Specifically, the transmission of the laser to the planar waveguide substrate can be controlled by the optical switch, and the femtosecond laser is turned off in time and can be turned off by the optical switch. The objective table is a three-dimensional adjusting platform, and the three-dimensional adjusting platform adopts a high-precision electric control displacement platform, so that the displacement control with submicron precision can be realized.
Example two
As shown in fig. 7, an embodiment of the present invention describes a grating processing system for a planar waveguide substrate, including:
the femtosecond grating device is used for emitting laser;
the first polaroid is used for adjusting the incidence angle of the laser;
the second polaroid is used for adjusting the polarization state of the laser based on the incident angle so as to adjust the power of the laser to obtain processing laser;
the optical switch is used for controlling the on-off of the processing laser;
a mirror for reflecting the processing laser light;
an objective lens for focusing the processing laser reflected by the mirror;
and the object stage is provided with a planar waveguide substrate and is used for moving the waveguide substrate so as to enable the focused processing laser to perform grating writing on the planar waveguide substrate.
Specifically, the planar waveguide is fixed on a three-dimensional adjusting platform, the pitching and tilting angles of the three-dimensional platform are adjusted, the planar waveguide is horizontally placed, the distance between an objective lens and the planar waveguide is adjusted, the focus of the objective lens is focused to the center of a fluctuating core area, and the laser spot is determined to be focused on the center of the core area. The power of laser emitted by a femtosecond laser is adjusted through a half glass slide W and a Glan mirror P, an optical switch is used for switching on and off a light path, the laser enters an objective lens through reflection of a reflector and is focused, the planar waveguide is used for micro-nano processing on a three-dimensional adjusting platform, and the three-dimensional adjusting platform adopts a high-precision electric control displacement platform, so that the submicron-precision displacement control can be realized. The CCD is used for imaging the processing area and observing the processing effect.
According to the grating processing method and system for the planar waveguide substrate, the femtosecond laser is used for emitting laser, the laser is focused on the waveguide chip for grating processing after polarization adjustment is carried out on the laser, the space between gratings can be changed by setting different laser repetition frequencies and movement rates, the central wavelength of the gratings is further changed, the gratings with different lengths and central wavelengths can be flexibly written, and the efficiency is high. And the femtosecond laser can process the grating on the planar waveguide point by point and can directly write without adding a phase mask plate, thereby having low cost and convenient processing.
The above-mentioned serial numbers of the embodiments of the present invention are merely for description and do not represent the merits of the embodiments.
Through the above description of the embodiments, those skilled in the art will clearly understand that the method of the above embodiments can be implemented by software plus a necessary general hardware platform, and certainly can also be implemented by hardware, but in many cases, the former is a better implementation manner.
The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. A grating processing method of a planar waveguide substrate is characterized by comprising the following steps:
placing a planar waveguide substrate on an object stage, and adjusting the object stage to focus laser emitted by a femtosecond laser on the central position of a waveguide core area of the planar waveguide substrate;
acquiring the laser repetition frequency of the femtosecond laser, determining the moving speed of the objective table according to the laser repetition frequency, and controlling the objective table to move at the determined moving speed;
controlling the femtosecond laser to emit laser according to the laser repetition frequency;
adjusting the power of the laser through a polarization control sheet to obtain processing laser;
and performing grating writing on the waveguide core region by the processing laser in a point-by-point processing mode.
2. The method of claim 1, wherein the positioning the planar waveguide substrate on a stage, and the adjusting the stage to focus the laser light emitted from the femtosecond laser on a central position of the waveguide core region of the planar waveguide substrate comprises:
placing the planar waveguide substrate on the stage, the planar waveguide substrate comprising a waveguide core region;
and adjusting the objective table to enable the laser emitted by the femtosecond laser to sequentially pass through a reflector and an objective lens and be focused on the central position of the waveguide core area.
3. The grating processing method of the planar waveguide substrate as claimed in claim 1, wherein the polarization control plate comprises a glass slide and a glan prism, and the power adjustment of the laser by the polarization control plate to obtain the processing laser comprises:
adjusting the incidence angle of the laser through the slide;
and according to the incident angle, carrying out power adjustment on the laser through the Glan prism sheet to obtain the processing laser.
4. The grating processing method of the planar waveguide substrate according to claim 1, wherein the grating writing of the waveguide core region by the processing laser in a point-by-point processing manner includes:
obtaining the refractive index of the waveguide core region and the order of the grating;
obtaining the processing wavelength of the grating according to the refractive index, the order, the laser repetition frequency and the moving speed;
and performing grating writing on the waveguide core region according to the processing wavelength by adopting a point-by-point processing mode.
5. The method of claim 4, wherein said deriving a processing wavelength of said grating from said refractive index, said order, said laser repetition frequency, and said translation speed comprises:
calculating the processing wavelength through a first formula;
the first formula is: λ ═ 2nV/mfr, where λ is the processing wavelength; n is a refractive index, n is a constant; m is the order of the grating, and m is a constant; fr is the laser repetition frequency and V is the moving speed.
6. The grating processing method of the planar waveguide substrate according to claim 4, wherein the grating writing of the waveguide core region by the processing laser according to the processing wavelength by using a point-by-point processing manner comprises:
changing the processing wavelength by changing the order of the grating;
and writing the gratings with different processing wavelengths on the waveguide core region in a point-by-point processing mode.
7. The method of claim 6, further comprising:
and arranging an optical input port and a plurality of optical output ports on the planar waveguide substrate, wherein the plurality of optical output ports correspond to the gratings with different processing wavelengths.
8. The method of claim 1, further comprising:
coupling red light at a light input port of the planar waveguide substrate;
and projecting the writing process of the grating onto a charge coupled device through a reflector by the red light so as to observe an image.
9. The method of claim 1, further comprising:
controlling the on-off of the laser through an optical switch; and/or
The object stage is a three-dimensional adjusting platform.
10. A grating processing system for a planar waveguide substrate, comprising:
the femtosecond grating device is used for emitting laser;
the first polaroid is used for adjusting the incidence angle of the laser;
the second polaroid is used for adjusting the polarization state of the laser based on the incident angle so as to adjust the power of the laser to obtain processing laser;
the optical switch is used for controlling the on-off of the processing laser;
a mirror for reflecting the processing laser light;
an objective lens for focusing the processing laser reflected by the mirror;
and the object stage is provided with a planar waveguide substrate and is used for moving the waveguide substrate so as to enable the focused processing laser to perform grating writing on the planar waveguide substrate.
Priority Applications (1)
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| CN101915961A (en) * | 2010-07-13 | 2010-12-15 | 宁波大学 | Multi-cascade fiber bragg grating filter |
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| CN104199144A (en) * | 2014-09-19 | 2014-12-10 | 天津理工大学 | Device and method for writing gratings on lithium niobate waveguides by aid of femtosecond laser device |
| CN104777534A (en) * | 2014-12-25 | 2015-07-15 | 西南科技大学 | Device and method for preparing waveguide and grating by femtosecond laser etching |
| CN106153088A (en) * | 2015-03-23 | 2016-11-23 | 东南大学 | Bilateral array fiber grating composite sensing system |
| CN111175885A (en) * | 2020-02-25 | 2020-05-19 | 江苏师范大学 | Femtosecond laser direct-writing fiber grating preparation device and preparation method based on machine learning image recognition |
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| CN101915961A (en) * | 2010-07-13 | 2010-12-15 | 宁波大学 | Multi-cascade fiber bragg grating filter |
| CN104076435A (en) * | 2014-07-14 | 2014-10-01 | 西北工业大学 | Femtosecond laser manufacturing device and method of SFBG |
| CN104199144A (en) * | 2014-09-19 | 2014-12-10 | 天津理工大学 | Device and method for writing gratings on lithium niobate waveguides by aid of femtosecond laser device |
| CN104777534A (en) * | 2014-12-25 | 2015-07-15 | 西南科技大学 | Device and method for preparing waveguide and grating by femtosecond laser etching |
| CN106153088A (en) * | 2015-03-23 | 2016-11-23 | 东南大学 | Bilateral array fiber grating composite sensing system |
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