CN1139535C - Probe transferred particle method of making nanometer line structure - Google Patents
Probe transferred particle method of making nanometer line structure Download PDFInfo
- Publication number
- CN1139535C CN1139535C CNB011136456A CN01113645A CN1139535C CN 1139535 C CN1139535 C CN 1139535C CN B011136456 A CNB011136456 A CN B011136456A CN 01113645 A CN01113645 A CN 01113645A CN 1139535 C CN1139535 C CN 1139535C
- Authority
- CN
- China
- Prior art keywords
- bifunctional molecule
- ink
- thin layer
- microprobe
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The present invention relates to a method for manufacturing a nanometer line structure by probe transferred particles, particularly to a method for manufacturing a nanometer device and a circuit. The present invention has the manufacturing method that (1) the cleanness and the roughness of a base sheet are preprocessed; (2) a bifunctional molecule thin layer is automatically assembled by molecules on the surface of the base sheet, and a functional group on one end of a bifunctional molecule is tightly combined with a functional group after the surface pretreatment of the base sheet by chemical linkage; (3) nanometer particle ink carried by an SFM microprobe is drawn on the upper surface of the bifunctional molecule thin layer by the SFM microprobe, so the nanometer particle ink can be in linkage with the other end of the bifunctional molecule; (4) a surface non-ink definition structure is eliminated.
Description
One, technical field
The present invention is a kind of electronic device of manufacturing nano thread structure or method of circuit of being mainly used in, especially a kind of method of making nano thread structure with probe transferred particle.
Two, background technology
Continuous development along with nanometer technology is used in all trades and professions has also constantly proposed more higher requirements to nano-device and process technology thereof.Utilize scanning probe microscopy to carry out the processing of nanostructured,, in nanofabrication technique research, just play the part of more and more important role because easy and simple to handle and can be in conjunction with functions such as field observations.Particularly because the appearance and the fast development of multiprobe technology, and development of technology such as probe location and replacing automatically, can bring into play bigger effect based on the nanofabrication technique of scanning probe microscopy.
Scanning probe microscopy is to utilize microprobe (here, usually the characteristic size of needle point is in nanometer scale) various interactions take place with the material micro-structure, and utilize these interaction detection material fine structures, an and class microscopy of the physical property that interrelates.Present more use comprise scanning tunnel microscopy (STM), atomic force microscopy (AFM), electric force microscopy (EFM), magnetic field force microscopy (MFM), electric capacity force microscopy (CFM), frictional force microscopy or the like.The technology of utilizing SFM to carry out nanoprocessing, also have many kinds (referring to Gu Ning etc., STM nanofabrication technique progress, electrician's electric energy new technology, 1994, (2): 18-23).For example, the nanoscale that the micro needlepoint that utilizes STM and AFM is made the possible mechanism in surface is drawn the structure at quarter, utilizes the nanostructured, the field evaporation based on scanning probe microscopy, potential barrier perturbation, electrochemical etching etc. of the low field energy exposure resist of STM and relevant processing also all to process good nanoscale structures.
The Chad A.Mirkin seminar of department of chemistry of Northwestern Univ USA reported that the employing thiol molecule was " ink " in 1999, with the AFM microprobe is that Dip-Pen carries out nanostructured and draws the result of making (referring to Richard D.Piner, Jin Zhu, Feng Xu, Seundlun Hong, Chad A.Mirkin; " Dip-Pen " Nanolithography, Science, 285; 5402,1999).This research be the array microprobe based on the group of molecules packing technique, make nanostructured fast and efficiently on the surface and laid good basis.But this method comes with some shortcomings, for example can only be at metal, and particularly surface such as gold, silver, copper forms structure.Also need such method is further developed at semiconductor, and process nanostructured on the insulator.
Three, technology contents
1, technical problem
Purpose of the present invention just provide a kind of can be nonmetal, particularly scan transferred particle with Dip-pen (scanning probe microscopy microprobe), be applicable to the method for making nano-device and circuit with probe transferred particle manufacturing nano thread structure at semiconductor surface.
2, technical scheme
The method of manufacturing of the present invention is:
1. the preliminary treatment of substrate cleaning degree, roughness;
2. at substrate surface molecule self assembly bifunctional molecule thin layer, the functional group of this bifunctional molecule one end is by chemical bonding and the pretreated functional group strong bonded of substrate surface;
3. by the scanning probe microscopy microprobe its nanoparticle of carrying " ink " is drawn above the bifunctional molecule thin layer, draw and define certain structure,, make the other end bonding of nanoparticle " ink " and bifunctional molecule as lines;
4. remove non-" ink " definition structure on surface.
3, technique effect
The invention has the advantages that:
1, can on nonmetal or semi-conducting material, scan the transfer nanoparticle, thereby reach the purpose of making nano thread structure at nonmetal or semiconductor material surface with Dip-pen.
2, have principle clear, be easy to implement, the treatment process expense is little, device requirement is few (except scanning probe microscopy and relevant pattern generator and software, more key equipment);
3, relatively with the Dip-Pen nanoprocessing method of Northwestern Univ USA's proposition, the method that we proposed can further be used in semiconductor surface and some other nonmetallic surface.Be suitable for the processing of nano electron device (circuit);
4, combine with the nano-colloid particulate by bifunctional molecule, except that gold, silver, copper particulate, by selecting the end group of bifunctional molecule, also can combine with the particulate (comprising molecule) of more kinds, and 1 woman this can further extend in manufacturing perpendicular to the more structures on the substrate surface direction.
Four, specific embodiments embodiment of the present invention are as follows:
Utilize Dip-Pen (SFM microprobe) to draw; in conjunction with relevant treatment technology; adopt bifunctional molecule by self assembly; molecule one end and substrate join (chemical bonding); non-metallic part at substrate surface forms thin layer; the molecule other end can with " ink " molecule of microprobe or nanoparticle chemistry bonding, thereby reach in the purpose of making nanostructured such as semiconductor surface.
Concrete grammar is:
(1) preliminary treatment of substrate (silicon chip) reaches the requirement (comprising cleaning requirement, roughness requirement etc.) that is suitable for the molecule assembling; (2) with the hydroxylating surface-treated silicon chip of cleaning, place 10
-3In the toluene solution of the MPTS of mol/L ((3-sulfydryl propyl group) trimethoxy silane), soak appropriate time after, take out and used toluene and acetone rinsing successively 10 minutes, air dry in surface plate; (3) the AFM probe carries the ink of nm of gold (about 10 nanometer particle sizes) colloidal particles,, draws and defines certain structure (as lines) at MPTS thin layer surface scan by microprobe; (4) stablize certain hour under the room temperature after, water and toluene solution wash certain hour respectively, observe to measure after the air dry, can obtain the nm of gold linear of size at tens nanometer.
Claims (2)
1, a kind of method with probe transferred particle manufacturing nano thread structure is characterized in that the method for manufacturing is:
1. the preliminary treatment of substrate cleaning degree, roughness;
2. at substrate surface molecule self assembly bifunctional molecule thin layer, the functional group of this bifunctional molecule one end is by chemical bonding and the pretreated functional group strong bonded of substrate surface;
3. by scanning probe microscopy, microprobe is drawn its nanoparticle of carrying " ink " above the bifunctional molecule thin layer, draws and defines certain structure, as lines, makes the other end bonding of nanoparticle " ink " and bifunctional molecule;
4. remove non-" ink " definition structure on surface.
2, the method with probe transferred particle manufacturing nano thread structure according to claim 1 is characterized in that the bifunctional molecule thin layer of substrate surface is (3-sulfydryl propyl group) trimethoxy silane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011136456A CN1139535C (en) | 2001-05-28 | 2001-05-28 | Probe transferred particle method of making nanometer line structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011136456A CN1139535C (en) | 2001-05-28 | 2001-05-28 | Probe transferred particle method of making nanometer line structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1318509A CN1318509A (en) | 2001-10-24 |
| CN1139535C true CN1139535C (en) | 2004-02-25 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB011136456A Expired - Fee Related CN1139535C (en) | 2001-05-28 | 2001-05-28 | Probe transferred particle method of making nanometer line structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1139535C (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7273636B2 (en) * | 2001-12-17 | 2007-09-25 | Northwestern University | Patterning of solid state features by direct write nanolithographic printing |
| US7923109B2 (en) * | 2004-01-05 | 2011-04-12 | Board Of Regents, The University Of Texas System | Inorganic nanowires |
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2001
- 2001-05-28 CN CNB011136456A patent/CN1139535C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1318509A (en) | 2001-10-24 |
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