CN113936840B - Temperature control X-ray deformable mirror - Google Patents

Temperature control X-ray deformable mirror Download PDF

Info

Publication number
CN113936840B
CN113936840B CN202111234959.8A CN202111234959A CN113936840B CN 113936840 B CN113936840 B CN 113936840B CN 202111234959 A CN202111234959 A CN 202111234959A CN 113936840 B CN113936840 B CN 113936840B
Authority
CN
China
Prior art keywords
heat
temperature
ray
contact
deformable mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202111234959.8A
Other languages
Chinese (zh)
Other versions
CN113936840A (en
Inventor
蒋晖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Advanced Research Institute of CAS
Original Assignee
Shanghai Advanced Research Institute of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Advanced Research Institute of CAS filed Critical Shanghai Advanced Research Institute of CAS
Priority to CN202111234959.8A priority Critical patent/CN113936840B/en
Publication of CN113936840A publication Critical patent/CN113936840A/en
Application granted granted Critical
Publication of CN113936840B publication Critical patent/CN113936840B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings

Abstract

The invention provides a temperature-control X-ray deformable mirror, which comprises a substrate and an optical reflection film arranged on the upper surface of the substrate, wherein the optical reflection film is plated on the position of a central line on the upper surface of the substrate, a plurality of heat conduction contacts are arranged at positions outside the optical reflection film on the substrate, and each heat conduction contact is arranged to generate local expansion and contraction under the action of high temperature or low temperature so as to generate a required surface shape of the temperature-control X-ray deformable mirror; the upper surface of the substrate is provided with a sliding rail, and the heat conduction contact can freely move along the extending direction of the sliding rail. The temperature control X-ray deformable mirror is provided with the movable heat conducting contact, and the heat conducting contact generates local expansion and contraction under the action of high temperature or low temperature, so that the convex or concave shape can be correspondingly compensated at different positions by the movable contact according to the distribution condition of actual surface shape errors, and the surface shape characteristics of a target are achieved.

Description

Temperature control X-ray deformable mirror
Technical Field
The invention belongs to the field of active X-ray optical wavefront correction, and particularly relates to a temperature control deformable mirror which is used for focusing and wavefront adjustment of grazing incidence X-rays.
Background
In the hard X-ray band, the refractive index of any material is close to 1. Thus, higher reflectivity can be obtained only at small glancing incidence angles. Grazing incidence reflecting elements are a major form of achieving hard X-ray imaging and focusing functions. After the X-rays are collimated, deflected and focused by the element, the wavefront characteristics and the coherence of the light beam are significantly destroyed. Deviations of the surface shape from the ideal surface shape produced by the polishing and coating of optical elements, in particular reflective elements, can have an effect on the wavefront of the light beam. The best direct surface polishing technique in the world at present cannot fully meet the limit focusing or the maintenance of coherence. While the traditional mechanical bending has less adjustment dimension and cannot form a perfect surface shape.
In recent years, active surface shape correction technology represented by piezoelectric deformation is paid attention to, and the active surface shape correction technology can generate larger deformation and accurately compensate the surface shape error on line in real time. However, the actuator of the piezo-deformable mirror is deposited or attached to the piezo-ceramic with a fixed arrangement, which results in a limitation of the piezo-deformable mirror to compensate for the shape of the surface. Other compensation techniques such as temperature control and magnetic control are rarely applied worldwide at present, and are similar to the fixed arrangement design of the piezoelectric deformable mirror.
Disclosure of Invention
The invention aims to provide a temperature control X-ray deformable mirror so as to conduct targeted compensation on surface shape errors of different positions of the mirror surface.
In order to achieve the above-mentioned purpose, the present invention provides a temperature-controlled X-ray deformable mirror, comprising a substrate and an optical reflection film disposed on the upper surface of the substrate, wherein the optical reflection film is plated on the position of the central line on the upper surface of the substrate, and a plurality of heat-conducting contacts are arranged on the substrate at positions other than the optical reflection film, each heat-conducting contact is configured to generate local expansion and contraction under the action of high temperature or low temperature, so that the temperature-controlled X-ray deformable mirror generates a required surface shape; the upper surface of the substrate is provided with a sliding rail, and the heat conduction contact can freely move along the extending direction of the sliding rail.
Each heat conducting contact comprises a vertical contact rod and a joint positioned at the top end of the contact rod, and the heat conducting contacts are fully contacted with the substrate through the contact rod.
The substrate is provided with a groove structure at the lower part of the sliding rail, and an opening of the groove structure is aligned with the sliding rail; the contact rod of the heat conduction contact is accommodated in the groove structure, and the connector is clamped on the sliding rail.
The extending direction of the sliding rail is parallel to the central line, and a part of the sliding rail extends to an area beyond the substrate.
The heat conducting contacts are arranged in a double-row mode, and the plurality of pairs of heat conducting contacts are symmetrically arranged on two sides of the optical reflecting film, so that the temperature uniformly and symmetrically acts on the area of the optical reflecting film.
Each pair of heat conducting contacts symmetrically arranged on two sides of the optical reflection film are respectively connected with a heat source and/or a cold source.
Each heat conducting contact is connected with a heat source and/or a cold source respectively.
The change-over switch is connected with the heat conduction contact, the heat source and/or the cold source through a heat conduction wire, and the heat conduction wire is wrapped with a heat insulation material.
The temperature control X-ray deformable mirror further comprises an insulation cavity, wherein the insulation cavity is a cavity placed in a low vacuum environment or a closed cavity isolated from the environment, and the temperature control X-ray deformable mirror is placed in the insulation cavity except for the optical reflection film.
The substrate is respectively connected with a thermistor at different positions and each heat conducting contact, and temperature measurement is carried out through the thermistor and the resistance measuring device, so that the resistance reading number of the thermistor is fed back to a control output system in real time, and the temperature control precision of the control output system is at most 0.1 ℃ error.
The temperature control X-ray deformable mirror is provided with the movable heat conducting contact, and the heat conducting contact generates local expansion and contraction under the action of high temperature or low temperature, so that the convex or concave shape can be correspondingly compensated at different positions by the movable contact according to the distribution condition of actual surface shape errors, and the surface shape characteristics of a target are achieved. The invention overcomes the defects that the arrangement of the traditional active deformable mirror actuators such as piezoelectricity, temperature control or magnetic control is fixed, and the correction of the surface shape is limited, and the bulge or the dent of the surface of the mirror surface is formed by the expansion and contraction of heat generated by high temperature or low temperature locally on the mirror surface by utilizing the movement of a heat source and a cold source on the mirror surface, so that the corresponding position of the surface shape error is compensated.
Drawings
Fig. 1 is a schematic structural view of a temperature-controlled X-ray deformable mirror according to an embodiment of the present invention.
FIG. 2 is a schematic diagram of a thermal contact under high or low temperature for surface curvature manipulation, where the thermal contact under high or low temperature causes localized thermal expansion and contraction of the mirror surface to create the desired bulge or depression.
Fig. 3 is a schematic view of the variation of the surface height of the heat conducting contact of copper material with different temperatures on the mirror surface of silicon material with the mirror length.
Detailed Description
The invention will be further illustrated with reference to specific examples. It should be understood that the following examples are illustrative of the present invention and are not intended to limit the scope of the present invention.
As shown in fig. 1-2, a temperature-controlled X-ray deformable mirror according to one embodiment of the invention includes a substrate 11 (i.e., a mirror body substrate) and an optical reflective film 12 disposed on an upper surface of the substrate 11. The upper surface of the optical reflection film 12 constitutes a mirror surface.
Wherein the substrate 11 (i.e., the mirror substrate) is rectangular, or is generally shaped like a trapezoid, a spinning cone, a circle, or the like. The material of the substrate 11 of the temperature-controlled X-ray deformable mirror is a material with a thermal conductivity greater than 100W/m·k, such as a monocrystalline silicon or silicon carbide substrate, so as to satisfy the rapid thermal response of the mirror surface under temperature changes.
The temperature-controlled X-ray deformable mirror has a center line extending in the noon direction of the mirror length on the upper surface of its substrate 11. In this embodiment, the optical reflective film 12 is plated on the upper surface of the substrate 11 at the position of the center line, and the pairs of heat conducting contacts 2 are symmetrically arranged on two sides of the optical reflective film 12, so that the temperature uniformly and symmetrically acts on the area of the optical reflective film 12, and the temperature-controlled X-ray deformable mirror generates controllable surface shape fluctuation. The heat conducting contacts 2 are arranged in two rows, however, in other embodiments, the arrangement of the temperature control contacts is not limited to the described array in two rows, but may be in a multi-row array or a multi-row array, and accordingly, the heat conducting contacts 2 may be arranged at any position on the substrate 11 other than the optical reflection film 12.
As shown in fig. 2, each heat-conducting contact 2 is configured to generate local expansion and contraction of heat on the surface of the substrate 11 within a certain radius with each heat-conducting contact 2 as a center under the action of high temperature or low temperature, so as to generate a required bulge or recess (generally, the bulge is caused by the high temperature, and the recess is caused by the low temperature), and further, the temperature-controlled X-ray deformable mirror generates a required shape of surface so as to correct the wavefront of the light beam and generate a required diffusion or focusing effect. Each pair of symmetrical heat conducting contacts along the central line can be combined to generate a change in the surface shape of the middle optical reflection film 12 area, so that a ideal wave front is obtained.
Referring to fig. 1 again, a sliding rail 13 is further disposed on the upper surface of the base 11, and the heat conducting contact 2 can move freely along the extending direction of the sliding rail 13. In X-rayUnder line grazing incidence condition, wavefront errorThe height error Δd from the surface shape satisfies the following relation: />Where K is the wave vector. Therefore, by adjusting the surface shape, the surface shape height error delta d of each region is reduced, and an ideal and perfect wave front can be obtained. The wavefront error of one optical path is derived from the surface shape errors of the light source and all optical elements, but the effective correction of the wavefront error of the meridian dimension can be realized by an actively compensated reflector. Therefore, the invention realizes the active regulation and control of the surface shape of the grazing incidence reflector, and the same reflector system can be used in complex beam wavefront environments or under different beams because the temperature contact in the design can be moved, so as to correct the surface shape error of the reflector and the wavefront error brought by other elements in the front light path. It can also be used in combination with other mechanical and adaptive deformable mirror systems, and the difference between temperature control and spatial frequency of mechanical and piezoelectric excitation is used to form complementary shape correction. Whereas for monochromators or mirrors like synchrotron radiation and free electron lasers with a high thermal load in front, it is more desirable from a spatial frequency point of view to compensate for the shape errors under thermal load by thermally induced deformations.
Specifically, each heat conducting contact 2 comprises a vertical contact bar 21 and a tab 22 at the top end of said bar, which is in sufficient contact with the substrate 11 via the bar 21 to conduct heat, i.e. heat transfer, in the presence of a temperature difference. The base 11 is provided with a groove structure at the lower part of the slide rail 13, and the opening of the groove structure is aligned with the slide rail 13; the contact rod 21 of the heat conducting contact 2 is accommodated in the groove structure, and the joint 22 is clamped on the sliding rail 13, so that the effect that the heat conducting contact 2 is fully contacted with the substrate 11 is achieved, and the heat conducting contact 2 can freely move along the extending direction of the sliding rail 13. The extending direction of the sliding rail 13 is parallel to the center line, and a part of the sliding rail 13 extends to an area outside the substrate 11, so that the running position of the heat conducting contact 2 on the substrate 11 is ensured. In this embodiment, since the pairs of heat conductive contacts 2 are symmetrically arranged on both sides of the optical reflection film 12, the number of the slide rails 13 is two, which are respectively located on both sides of the optical reflection film 12.
In addition, on the premise of not damaging the optical reflection film 12, the two sliding rails 13 are arranged to be close to the area of the optical reflection film 12 as much as possible, for example, the nearest distance between the two sliding rails 13 and the boundary of the optical reflection film 12 is smaller than 10 mm, so as to increase the regulation sensitivity of the temperature to the surface shape of the mirror surface of the temperature control X-ray deformation mirror.
In this embodiment, each pair of heat conductive contacts 2 symmetrically arranged on both sides of the optical reflection film 12 is simultaneously connected to a heat source 4 and a heat sink 5 through a switch 3, respectively, so as to switch between the heat source 4 and the heat sink 5 through the switch 3. For each pair of heat conducting contacts 2, the fixed contact of the corresponding change-over switch 3 is connected with the heat conducting contacts 2, and the two moving contacts are respectively connected with the heat source 4 and the cold source 5. In other embodiments, each pair of heat-conducting contacts 2 is not limited to the described switching use of heat sources and heat sinks, but each pair of heat-conducting contacts 2 may be connected to only one heat source 4 or only one heat sink 5, respectively, to achieve separate heat source control or heat sink control. Further, in other embodiments, each heat conducting contact 2 may be connected to a heat source 4 and a cold source 5 through a switch 3, or connected to only a heat source 4, or connected to only a cold source 5.
The number of the pairs of the heat conducting contacts 2 (i.e. the number of the heat sources 4 and the cold sources 5) can be one to tens according to the length of the temperature control X-ray deformable mirror and the practical application, so that each pair of the heat conducting contacts 2 can compensate the local surface shape defect of the temperature control X-ray deformable mirror or the surface shape error of low frequency in modulation. Specifically, when the mirror surface shape error distribution is measured, a certain number of the heat conductive contacts 2 are set to manually or electrically slide to a position of the surface shape to be corrected to compensate for the partial surface shape at the position, while unnecessary contacts remain in the slide rail 3 extending to the area other than the base 11.
The change-over switch 3 is connected with the heat conducting contact 2, the heat source 4 and/or the cold source 5 through heat conducting wires. The material of the heat conductive contacts 2 and the heat conductive wires should maintain good heat conductivity (for example, the material may be copper, the heat conductivity of which is about 398W/m·k; aluminum, the heat conductivity of which is 237W/m·k; silver, the heat conductivity of which is 411W/m·k; gold, the heat conductivity of which is 315W/m·k, etc.), and reduce the distances of the heat source and the heat sink to the contacts so that the distances of the heat source and the heat sink to the contacts are within at least 10 cm, while wrapping a special heat insulating material (especially for the heat sink) for the heat conductive wires to ensure that the contacts are close to the set temperature of the heat source or the heat sink. The sliding rail 13 of the mirror body adopts a material with poor heat conduction (namely, the heat conductivity of the material of the sliding rail 13 is lower than 10W/m.K), so that direct heat conduction between contacts is prevented, and the contacts are mutually influenced.
The temperature-controlled X-ray deformable mirror of the invention can be isolated by using heat insulation materials except for the optical reflection film 12 (namely the substrate 11, the sliding rail 13, the heat conduction contact 2, the change-over switch 3, the heat conduction wires, the heat source 4 and the cold source 5), especially the heat conduction wires, so as to prevent the rapid heat dissipation of the fast mirror surface and the surface temperature from reaching an equilibrium state. Specifically, the temperature-controlled X-ray deformable mirror of the present invention further comprises an insulating cavity, wherein the insulating cavity is a cavity placed in a low vacuum environment or a closed cavity isolated from the environment, and the portions (especially the heat conducting wire portions) of the temperature-controlled X-ray deformable mirror except the optical reflection film 12 are all placed in the insulating cavity, so as to reduce heat exchange with air, and prevent the mirror surface from being unable to quickly reach the required heat balance due to disturbance of the environment on heat conduction.
The substrate 11 is respectively connected with a high-precision thermistor at different positions and each heat conducting contact 2, and temperature measurement is carried out through the thermistor and a resistance measuring device, so that the resistance reading of the thermistor is fed back to a high-precision control output system in real time, and the precision of temperature control is further maintained. The temperature control precision of the high-precision control output system needs to be kept at the precision of errors of at most 0.1 ℃ so that the surface shape maintains higher stability.
The heat conduction contact 2, the heat source 4 and the cold source 5 form a temperature control surface shape control system, and the temperature control surface shape control system can be independently applied to the surface shape correction of the mirror body, can also be combined with other self-adaptive mirrors such as mechanical bending mirrors or piezoelectric deformable mirrors for use, and is mainly based on the characteristic that the spatial frequencies of the temperature and other deformation corresponding correction surface shape errors are different, so as to achieve a more flexible surface shape correction effect. That is, the temperature-controlled X-ray deformable mirror of the present invention may also be provided with a piezoelectric deforming means and/or a mechanical buckling means for changing the shape of the temperature-controlled X-ray deformable mirror.
The length of the temperature control X-ray deformable mirror (along the length of the mirror in the noon direction) can be a long mirror of the meter level or a small mirror of the centimeter level. The surface shape of the mirror surface to which the invention is applicable is not limited, and can comprise common planes, various cylindrical surfaces, toroidal surfaces, various spherical surfaces and the like.
Fig. 3 shows a schematic view of the surface height of the middle area of two heat conducting contacts after mirror heating of silicon material, wherein 4 lines in the diagram show the conditions of 20, 60, 80 and 100 ℃ respectively. Since the thermal conductivity of silicon is not high, temperature changes of tens of degrees only cause changes of about 10 degrees in the center of the mirror surface, but since the temperature is very sensitive to surface shape changes, the mirror surface part still has a height change exceeding 100 nm. For substrates of a particular size and material, the temperature change may produce a corresponding thermally induced response function. The thermal response function can be obtained by measuring a Fizeau laser interferometer with high precision, and the relationship between the surface shape change of the temperature control X-ray deformable mirror and the temperature can be directly calculated by using the thermal response function, so that the resistance reading of the thermistor is determined.
The foregoing description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, and various modifications can be made to the above-described embodiment of the present invention. All simple, equivalent changes and modifications made in accordance with the claims and the specification of the present application fall within the scope of the patent claims. The present invention is not described in detail in the conventional art.

Claims (10)

1. The temperature control X-ray deformable mirror is characterized by comprising a substrate and an optical reflection film arranged on the upper surface of the substrate, wherein the optical reflection film is plated on the position of a central line on the upper surface of the substrate, a plurality of heat conduction contacts are arranged at positions outside the optical reflection film on the substrate, and each heat conduction contact is arranged to generate local expansion and contraction under the action of high temperature or low temperature so as to generate a required surface shape; the upper surface of the substrate is provided with a sliding rail, and the heat conduction contact can freely move along the extending direction of the sliding rail.
2. The temperature-controlled X-ray deformable mirror of claim 1, wherein each thermally conductive contact comprises a vertical contact bar and a tab at a top end of the contact bar, the contact bar being in substantial contact with the substrate.
3. The temperature-controlled X-ray deformable mirror of claim 2, wherein the base has a channel structure at a lower portion of the slide rail, an opening of the channel structure being aligned with the slide rail; the contact rod of the heat conduction contact is accommodated in the groove structure, and the connector is clamped on the sliding rail.
4. A temperature-controlled X-ray deformable mirror according to claim 3, wherein the slide rail extends in a direction parallel to the center line and a portion of the slide rail extends beyond the base.
5. The temperature-controlled X-ray deformable mirror of claim 1, wherein the thermally conductive contacts are arranged in a multi-row array.
6. The temperature-controlled X-ray deformable mirror of claim 5, wherein the heat-conducting contacts are arranged in a double-row array, and a plurality of pairs of heat-conducting contacts are symmetrically arranged on both sides of the optical reflection film, so that the temperature uniformly and symmetrically acts on the area of the optical reflection film, and each pair of heat-conducting contacts symmetrically arranged on both sides of the optical reflection film is respectively connected with only a heat source, only a cold source, or both the heat source and the cold source through a switch.
7. The temperature-controlled X-ray deformable mirror of claim 5, wherein each thermally conductive contact is connected to only the heat source, only the cold source, or both the heat source and the cold source, respectively, via a switch.
8. A temperature-controlled X-ray deformable mirror according to claim 6 or 7, wherein when the heat-conducting contact is connected to the heat source only by a switch, the switch is connected to the heat-conducting contact and the heat source by a heat-conducting wire, the heat-conducting wire being wrapped with a heat-insulating material;
when the heat conduction contact is only connected with the cold source through the change-over switch, the change-over switch is connected with the heat conduction contact and the cold source through a heat conduction wire, and the heat conduction wire is wrapped with a heat insulation material;
the heat conducting contact is connected with the heat source and the cold source through the change-over switch, the change-over switch is connected with the heat conducting contact, the heat source and the cold source through the heat conducting wire, and the heat conducting wire is wrapped with the heat insulating material.
9. The temperature-controlled X-ray deformable mirror of claim 1, further comprising an insulating cavity, wherein the insulating cavity is a cavity placed in a low vacuum environment or a closed cavity isolated from the environment, and wherein the temperature-controlled X-ray deformable mirror is placed in the insulating cavity except for the optical reflective film.
10. The temperature-controlled X-ray deformable mirror of claim 1, wherein the substrate is connected to one thermistor at different positions and each heat conducting contact, and temperature measurement is performed by the thermistor and the resistance measuring device to feed back the resistance reading of the thermistor to a control output system in real time, wherein the temperature control accuracy of the control output system is at most 0.1 degree celsius error.
CN202111234959.8A 2021-10-22 2021-10-22 Temperature control X-ray deformable mirror Active CN113936840B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111234959.8A CN113936840B (en) 2021-10-22 2021-10-22 Temperature control X-ray deformable mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111234959.8A CN113936840B (en) 2021-10-22 2021-10-22 Temperature control X-ray deformable mirror

Publications (2)

Publication Number Publication Date
CN113936840A CN113936840A (en) 2022-01-14
CN113936840B true CN113936840B (en) 2023-08-25

Family

ID=79283941

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111234959.8A Active CN113936840B (en) 2021-10-22 2021-10-22 Temperature control X-ray deformable mirror

Country Status (1)

Country Link
CN (1) CN113936840B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114967036B (en) * 2022-05-30 2024-02-02 深圳综合粒子设施研究院 Mirror surface shape control structure and beam line device
CN114924378B (en) * 2022-05-30 2023-10-27 深圳综合粒子设施研究院 Mirror surface shape control structure and beam line device

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1284995B (en) * 1962-10-17 1968-12-12 Gen Electric Method and device for information recording on a dielectric storage medium
JP2001013297A (en) * 1999-06-30 2001-01-19 Nikon Corp Catoptric element and exposure device
JP2003218023A (en) * 2002-01-28 2003-07-31 Nikon Corp X-ray reflecting mirror, x-ray exposure transfer apparatus, and method of manufacturing semiconductor device
DE10328819A1 (en) * 2003-06-22 2005-01-20 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH Beam focussing optical adaptive arrangement, has a thermal actuator forming part of a control loop, which is heated or cooled to deform a focussing element with which it forms a bimorphous structure and thus focus the light beam
WO2011081182A1 (en) * 2009-12-28 2011-07-07 株式会社ジェイテック Mirror device for controlling shape of reflective surface, and method for producing mirror for controlling shape of reflective surface
EP2378345A1 (en) * 2010-04-14 2011-10-19 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Deformable mirror device with replaceable mirror sheet and method to adhere a mirror sheet
JP2014085194A (en) * 2012-10-23 2014-05-12 Jtec Corp Deformable x-ray mirror system
DE102014103949A1 (en) * 2014-03-21 2015-09-24 Deutsches Elektronen-Synchrotron Desy Mirror for intensive X-radiation
CN107907905A (en) * 2017-12-06 2018-04-13 山东航天电子技术研究所 A kind of in-orbit smart X-ray optical system
CN112611774A (en) * 2020-12-03 2021-04-06 中国科学院上海高等研究院 Micro-focusing synchrotron radiation small-angle scattering and polarization microscope system combined device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4814782B2 (en) * 2006-12-28 2011-11-16 株式会社ジェイテック X-ray focusing method and apparatus using phase recovery method

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1284995B (en) * 1962-10-17 1968-12-12 Gen Electric Method and device for information recording on a dielectric storage medium
JP2001013297A (en) * 1999-06-30 2001-01-19 Nikon Corp Catoptric element and exposure device
JP2003218023A (en) * 2002-01-28 2003-07-31 Nikon Corp X-ray reflecting mirror, x-ray exposure transfer apparatus, and method of manufacturing semiconductor device
DE10328819A1 (en) * 2003-06-22 2005-01-20 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH Beam focussing optical adaptive arrangement, has a thermal actuator forming part of a control loop, which is heated or cooled to deform a focussing element with which it forms a bimorphous structure and thus focus the light beam
WO2011081182A1 (en) * 2009-12-28 2011-07-07 株式会社ジェイテック Mirror device for controlling shape of reflective surface, and method for producing mirror for controlling shape of reflective surface
EP2378345A1 (en) * 2010-04-14 2011-10-19 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Deformable mirror device with replaceable mirror sheet and method to adhere a mirror sheet
JP2014085194A (en) * 2012-10-23 2014-05-12 Jtec Corp Deformable x-ray mirror system
DE102014103949A1 (en) * 2014-03-21 2015-09-24 Deutsches Elektronen-Synchrotron Desy Mirror for intensive X-radiation
CN107907905A (en) * 2017-12-06 2018-04-13 山东航天电子技术研究所 A kind of in-orbit smart X-ray optical system
CN112611774A (en) * 2020-12-03 2021-04-06 中国科学院上海高等研究院 Micro-focusing synchrotron radiation small-angle scattering and polarization microscope system combined device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"Apiezoelectric deformable X-ray mirror for phase compensation based on global optimization";Jiang,H et al.;《Journal of Synchrotron Radiation》;全文 *

Also Published As

Publication number Publication date
CN113936840A (en) 2022-01-14

Similar Documents

Publication Publication Date Title
CN113936840B (en) Temperature control X-ray deformable mirror
TWI451202B (en) Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
US8891172B2 (en) Optical element and method
Signorato et al. Multi-segmented piezoelectric mirrors as active/adaptive optics components
US4825062A (en) Extendable large aperture phased array mirror system
KR101895083B1 (en) Euv exposure apparatus
US20130100426A1 (en) Method for producing facet mirrors and projection exposure apparatus
JPS63501383A (en) Mounting structure of movable parts
KR20160127160A (en) Device for controlling temperature of an optical element
EP3455617B1 (en) Apparatus and method for the determination of the absolute coefficient of thermal expansion in ultralow expansion materials
US9287016B2 (en) Reflective surface shape controllable mirror device, and method for manufacturing reflective surface shape controllable mirror
US20130063833A1 (en) Shape stabilized mirror module and method to stabilize a reflective element
CN110543010B (en) Ultra-precise active optical modulation method and system
US6809888B1 (en) Apparatus and methods for thermal reduction of optical distortion
KR101626737B1 (en) Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement
US20230384685A1 (en) Field facet system and lithography apparatus
KR20120024682A (en) Folded lasers system
JP4935884B2 (en) Optical reflector
Fermé New improvements in bendable mirrors
JPH0448724A (en) Semiconductor heat treatment device
Gaffard et al. Active bimorph structure for x-ray gratings and mirrors
CN116705597A (en) Laser annealing system and annealing method thereof
Nicolas et al. Optics and mechanics of mirror benders
EP3391120A1 (en) High power adaptive mirror

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant