CN113897587B

CN113897587B - Equipment monitoring method and device of coating machine and coating machine

Info

Publication number: CN113897587B
Application number: CN202111152527.2A
Authority: CN
Inventors: 冀鸣; 易洪波; 刘伟基; 赵刚
Original assignee: Zhongshan Ibd Technology Co ltd; Foshan Bolton Photoelectric Technology Co ltd
Current assignee: Zhongshan Ibd Technology Co ltd; Foshan Bolton Photoelectric Technology Co ltd
Priority date: 2021-09-29
Filing date: 2021-09-29
Publication date: 2024-03-01
Anticipated expiration: 2041-09-29
Also published as: CN113897587A

Abstract

The embodiment of the application provides a device monitoring method and device of a coating machine and the coating machine. The method comprises the following steps: acquiring multimedia data in a chamber of a coating machine in a coating process; determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data; when the state information of the mechanism to be detected is detected to meet the preset abnormal state condition, corresponding first alarm information is sent out. The technical problem that the abnormal condition of equipment mechanism in the coating machine cavity can not be found in time is solved to this application.

Description

Equipment monitoring method and device of coating machine and coating machine

Technical Field

The application relates to the technical field of coating machines, in particular to a device monitoring method and device of a coating machine and the coating machine.

Background

Generally, equipment mechanisms such as a film coating umbrella stand, a correction plate, a baffle plate, a crucible and the like are arranged in a vacuum film coating equipment chamber. Wherein, an evaporation source is arranged in the vacuum coating equipment chamber, and the coating umbrella stand is arranged above the evaporation source. In the film coating process, the film coating umbrella stand can rotate to ensure that the film thickness of the substrate distributed at each part of the film coating umbrella stand is uniform. A correction plate is arranged between the film plating umbrella stand and the evaporation source, and the evaporation object above the evaporation source is shielded by the correction plate, so that the difference of the film thickness along with the position of the film plating umbrella stand is reduced.

In addition, a plurality of baffle structures are arranged in the film plating machine, and the baffle structures comprise a baffle above the evaporation source and a baffle above the ion source. Before coating, the molten material in the evaporation source is heated to a molten state, a baffle plate positioned above the evaporation source is controlled to cover the evaporation source so as to prevent the molten material from evaporating, and the baffle plate is retracted after the molten material is heated to a stable coating state. And aiming at the film plating machine provided with the ion source auxiliary film plating, the baffle plays a role of shielding in the preparation stage of the ion source, and the baffle is retracted after the ion source state is stabilized to a film plating state, so that the film deposition process is started.

In the film coating process, the film coating umbrella stand revolves and/or rotates, and the correction plate and the baffle plate need to be adjusted to the designated positions, so that the high efficiency of film coating and the high quality of products can be ensured. In practice, however, the baffle and the correction plate are not adjusted to the designated positions in the film coating process, and the film coating umbrella stand rotates abnormally, so that the film coating effect is greatly affected. At present, the abnormal conditions of equipment mechanisms in a chamber of a coating machine, such as abnormal positions of a baffle plate and a correction plate and abnormal movements of a coating umbrella stand, cannot be found in time mainly by manual observation.

Disclosure of Invention

Aiming at the defects of the existing mode, the application provides a device monitoring method and device of a coating machine and the coating machine, which are used for solving the technical problem that the abnormal condition of a device mechanism in a chamber of the coating machine cannot be found in time in the prior art.

In a first aspect, an embodiment of the present application provides a method for monitoring equipment of a film plating machine, including:

acquiring multimedia data in a chamber of a coating machine in a coating process;

determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data;

when the state information of the mechanism to be detected is detected to meet the preset abnormal state condition, corresponding first alarm information is sent out.

In some embodiments, the mechanism to be tested includes a film coating umbrella stand, a correction plate and a baffle, and the detecting whether the state information of the mechanism to be tested meets the preset abnormal state condition includes:

according to the multimedia data, determining umbrella stand rotation information of the film plating umbrella stand, correction plate position information of the correction plate and baffle plate position information of the baffle plate;

when at least one of the umbrella stand rotation information, the correction plate position information and the baffle position information is detected to meet the corresponding preset abnormal state condition, corresponding first alarm information is sent out, and the abnormal state condition comprises an abnormal rotation condition corresponding to the umbrella stand rotation information, a first abnormal position condition corresponding to the correction plate position information and a second abnormal position condition corresponding to the baffle position information.

In some embodiments, the determining, according to the multimedia data, umbrella stand rotation information of the film-coated umbrella stand, correction plate position information of the correction plate, and baffle position information of the baffle includes:

performing image recognition on the multimedia data to extract a film-coated umbrella stand image, a correction plate image and a baffle plate image;

traversing a preset template library, and respectively carrying out template matching on the correction plate image and the baffle image to obtain correction plate position information of the correction plate and baffle position information of the baffle;

and determining the motion trail of the film coating umbrella stand and the umbrella stand rotation information corresponding to the motion trail according to the film coating umbrella stand image frames of at least two continuous frames.

In some embodiments, the determining the motion track of the film-coated umbrella frame and the umbrella frame rotation information corresponding to the motion track according to the film-coated umbrella frame image frames of at least two continuous frames includes:

determining an umbrella stand reference point positioned on the film plating umbrella stand;

acquiring displacement information of the umbrella stand reference points in at least two continuous film-coated umbrella stand image frames so as to be convenient for fitting a motion track of the umbrella stand reference points according to the displacement information;

Matching the motion trail of the umbrella stand reference point with a planned trail to generate corresponding umbrella stand rotation information, wherein the planned trail is constructed based on preset rotation information, and the preset rotation information comprises a preset rotation type and a rotation speed corresponding to the preset rotation type.

In some embodiments, the abnormal rotation condition includes the umbrella frame rotation information not conforming to a preset rotation information;

the first abnormal position condition includes that the correction plate position information does not coincide with a specified correction plate position;

the second abnormal position condition includes that the barrier position information does not coincide with a specified barrier position.

In some embodiments, the method further comprises:

determining a detection plan based on a current detection result, the detection result including mechanism state information, the detection plan including a detection interval time between a current detection and a next detection;

according to the detection plan, detecting after acquiring state information of a mechanism to be detected in the film plating machine chamber again;

and after the detection plan is completed, updating the detection plan.

In some embodiments, the determining a detection plan based on the detection result includes:

When any one of the umbrella stand rotation information, the correction plate position information and the baffle position information is detected to meet the abnormal state condition, identifying the corresponding mechanism state information as a first type of mechanism state, and determining corresponding first detection interval time;

when any two of the umbrella stand rotation information, the correction plate position information and the baffle position information are detected to meet the abnormal state condition, identifying the corresponding mechanism state information as a second type mechanism state, and determining corresponding second detection interval time; or alternatively, the first and second heat exchangers may be,

when the umbrella stand rotation information, the correction plate position information and the baffle position information are detected to meet the abnormal state conditions, identifying the corresponding mechanism state information as a third type mechanism state, and determining corresponding third detection interval time;

the first detection interval time is greater than the second detection interval time, and the second detection interval time is greater than the third detection interval time.

In some embodiments, the method further comprises:

and when the number of the mechanisms to be detected, the state information of which meets the abnormal state condition, is not less than the number of the mechanisms to be detected, the state information of which meets the abnormal state condition in the last detection, sending out second alarm information.

In a second aspect, an embodiment of the present application provides an apparatus monitoring device of a film plating machine, including:

the multimedia data acquisition module is used for acquiring multimedia data in a coating machine cavity in the coating process;

the state information acquisition module is used for determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data;

the detection module is used for sending out corresponding first alarm information when detecting that the state information of the mechanism to be detected meets the preset abnormal state condition.

In a third aspect, an embodiment of the present application provides a film plating machine, including: the equipment monitoring device of the coating machine according to the embodiment.

Compared with the prior art, the embodiment of the application provides a device monitoring method and device of a film plating machine, which have the following beneficial effects:

the method comprises the steps of acquiring multimedia data in a coating machine chamber in a coating process, determining state information of a mechanism to be detected in the coating machine chamber according to the multimedia data, and sending corresponding first alarm information when the state information of the mechanism to be detected is detected to meet a preset abnormal state condition, so that when at least one mechanism in equipment mechanisms in the coating machine chamber is monitored to be in an abnormal operation state in real time, timely alarming and timely correction are carried out. Therefore, the technical problem that the abnormal condition of the equipment mechanism in the chamber of the coating machine cannot be found in time in the coating process in the prior art can be solved, and timely reminding of a worker to overhaul and maintain is realized, so that the coating efficiency is improved, and meanwhile, the uniformity of the film thickness of the substrate is improved, and the coating quality of the substrate is improved.

The embodiment of the application provides a coating machine, through setting up the equipment monitoring devices of foretell coating machine, realize the running situation of real-time supervision coating machine intracavity equipment mechanism, can in time discover the work abnormal condition of coating machine to in time send out the warning, with remind the staff to overhaul and maintain, improved the coating efficiency of coating machine, and improved the coating quality of substrate.

Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the application.

Drawings

The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:

fig. 1 is a schematic flow chart of a method for monitoring equipment of a film plating machine according to an embodiment of the present application;

FIG. 2 is a schematic flow chart of a method for monitoring equipment of a coated umbrella stand, a correction plate and a baffle plate according to an embodiment of the present application;

fig. 3 is a schematic structural diagram of an apparatus monitoring device of a film plating machine according to an embodiment of the present application.

Detailed Description

Embodiments of the present application are described below with reference to the drawings in the present application. It should be understood that the embodiments described below with reference to the drawings are exemplary descriptions for explaining the technical solutions of the embodiments of the present application, and the technical solutions of the embodiments of the present application are not limited.

As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless expressly stated otherwise, as understood by those skilled in the art. It will be further understood that the terms "comprises" and "comprising," when used in this application, specify the presence of stated features, information, data, steps, operations, elements, and/or components, but do not preclude the presence of other features, information, data, steps, operations, elements, components, and/or groups thereof, all being implemented as desired by the person skilled in the art. It will be understood that when an element is referred to as being "connected" or "coupled" to another element, it can be directly connected or coupled to the other element or intervening elements may be present. Further, "connected" or "coupled" as used herein may include wirelessly connected or wirelessly coupled. The term "and/or" as used herein indicates at least one of the items defined by the term, e.g. "a and/or B" indicates implementation as "a", or as "B", or as "a and B".

For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the embodiments of the present application will be described in further detail below with reference to the accompanying drawings.

The structure of the coating machine designed in the application will be described first:

the coating machine of the application includes but is not limited to: coating umbrella stand, correction board, baffle, camera equipment and the equipment monitoring devices of coating machine. The equipment mechanisms such as a film plating umbrella stand, a correction plate, a baffle plate, a crucible and the like are arranged in the film plating machine chamber, and the camera equipment and the equipment monitoring device of the film plating machine can be arranged in the film plating machine chamber or outside the chamber. Wherein, a coating umbrella stand for bearing the substrate is hung at the top of the chamber of the coating machine, the coating umbrella stand is arranged above the evaporation source, a correction plate is arranged between the coating umbrella stand and the evaporation source, and the baffle is arranged above the evaporation source and above the ion source. In the film coating process, the film coating umbrella stand rotates to enable the film thickness of the substrate distributed on each position of the film coating umbrella stand to be uniform, the correction plate is adjusted to a designated position to shield the evaporant above the evaporation source, the difference of the film thickness along with the position of the film coating umbrella stand is reduced, the baffle is adjusted to the designated position in the preparation stage before film coating to play a role of shielding, such as shielding the melting material evaporation of the evaporation source, and the baffle is retracted in the film coating process. The camera device is used for video, image and other multimedia data of the running conditions of equipment mechanisms such as a film coating umbrella stand, a correction plate, a baffle plate, a crucible and the like in a film coating machine cavity in the film coating process. The camera equipment is connected with the equipment monitoring device of the coating machine and is used for sending the multimedia data to the equipment monitoring device of the coating machine so that the equipment monitoring device of the coating machine can conveniently detect whether the moving equipment such as a coating umbrella stand, a crucible and the like normally rotate and whether the non-moving equipment such as a correction plate, a baffle and the like is adjusted to a specified position. The connection between the camera device and the equipment monitoring device of the film plating machine can be through a wired network or a wireless network, wherein the wired network comprises but is not limited to: universal serial bus, wireless network includes but is not limited to: wiFi, bluetooth, etc.

Further, the coating machine of the application also comprises a monitoring platform, wherein the monitoring platform is in communication connection with the equipment monitoring device of the coating machine so as to receive real-time information such as equipment running condition, mechanism state information, alarm information and the like sent by the equipment monitoring device of the coating machine, and adjust equipment mechanisms in a cavity of the coating machine in time. The monitoring platform is also used for issuing a control instruction for controlling the camera to the equipment monitoring device or the camera of the film plating machine, and the control instruction is used for adjusting parameters such as shooting angle, position and the like of the camera. Preferably, the monitoring platform is connected with equipment of the film plating machine such as the film plating umbrella stand, the correction plate and the baffle plate, and is used for controlling the actions of the equipment such as the rotation of the film plating umbrella stand and the crucible and the positions of the correction plate and the baffle plate according to real-time information from the equipment monitoring device of the film plating machine, so that the intelligent degree of the real-time monitoring and control flow is improved. The monitoring platform can be arranged at the cloud end, and a worker can access the monitoring platform through terminals such as a computer, a tablet, a mobile phone and the like to perform data viewing and control processing, for example, remote login control can be performed through mobile phone application.

Referring to fig. 1, a flow chart of a method for monitoring equipment of a film plating machine according to an embodiment of the present application is provided, and the method includes steps S101 to S103.

S101, acquiring multimedia data in a film plating machine chamber in a film plating process.

In the application, the video, image and other multimedia data of the running conditions of equipment mechanisms such as a film coating umbrella stand, a crucible, a correction plate, a baffle and the like in a film coating machine cavity in the film coating process are acquired through the image pickup equipment. The camera equipment can be arranged in the film plating machine chamber and can also be arranged outside the film plating machine chamber, namely, the multimedia data of the equipment mechanism operation in the film plating machine chamber is shot through a visual window on the side wall of the film plating machine, and the installation position of the camera equipment is not limited.

S102, determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data.

It should be noted that, the present application obtains the multimedia data in the chamber of the film plating machine through the image capturing device, and performs image recognition on the video image frame in the multimedia data to obtain the image of the mechanism to be tested. And determining the state information of the mechanism to be detected according to the image of the mechanism to be detected obtained by image recognition, wherein the state information comprises the rotation information of the motion equipment mechanism and the position information of the non-motion equipment mechanism. The image recognition refers to a technology for processing, analyzing and understanding images by using a computer to recognize targets and objects in various different modes, and is a practical application of artificial intelligence algorithms such as a deep learning algorithm, a computer vision algorithm and the like. Three recognition modes generally exist in image recognition, namely character recognition, digital image processing and recognition and object recognition. Because the arrangement area of the equipment mechanism in the chamber of the coating machine is fixed, in the embodiment of the application, the object identification can be used for identifying the area of the mechanism to be tested, so that the accurate identification of the mechanism to be tested in the chamber of the coating machine can be realized.

And S103, when the state information of the mechanism to be detected is detected to meet the preset abnormal state condition, corresponding first alarm information is sent out.

The embodiment of the application provides a device monitoring method of a coating machine, which comprises the steps of obtaining multimedia data in a coating machine chamber in a coating process, determining state information of a mechanism to be tested in the coating machine chamber according to the multimedia data, and sending corresponding first alarm information when detecting that the state information of the mechanism to be tested meets a preset abnormal state condition, so that when monitoring that at least one mechanism in the device mechanisms in the coating machine chamber is in an abnormal operation state in real time, timely alarming and timely correcting. Therefore, the technical problem that the abnormal condition of the equipment mechanism in the chamber of the coating machine cannot be found in time in the coating process in the prior art can be solved, and timely reminding of a worker to overhaul and maintain is realized, so that the coating efficiency is improved, and meanwhile, the uniformity of the film thickness of the substrate is improved, and the coating quality of the substrate is improved.

In a specific embodiment, a mechanism to be tested in a chamber of a film plating machine is exemplified by a film plating umbrella stand, a correction plate and a baffle, refer to fig. 2, which is a schematic flow chart of a method for monitoring equipment of the film plating umbrella stand, the correction plate and the baffle provided in the embodiment of the application, and the method includes steps S201 to S203.

S201, acquiring multimedia data in a film plating machine chamber in a film plating process.

S202, determining umbrella stand rotation information of a film plating umbrella stand in the film plating machine cavity, correction plate position information of a correction plate and baffle plate position information of a baffle plate according to the multimedia data.

It should be noted that, the present application performs image recognition on a video image frame in multimedia data to obtain a film-coated umbrella stand image, a correction plate image and a baffle plate image. And determining umbrella stand rotation information of the film coating umbrella stand, correction plate position information of the correction plate and baffle plate position information of the baffle plate according to the baffle plate image, the correction plate image and the film coating umbrella stand image obtained by image identification. In the embodiment, the area where the film plating umbrella stand is located, the area where the correction plate is located and the area where the baffle is located are identified, so that the film plating umbrella stand, the correction plate and the baffle in the film plating machine chamber can be accurately identified.

In some embodiments, step S202 includes:

In a preferred embodiment, in the prior art, a threshold segmentation algorithm is often used for image segmentation and identification, but if the differences between the color gray scales of the baffle plate and the correction plate in the chamber of the film plating machine and the color gray scale of the background of the chamber are not obvious, the image segmentation is often caused to be not obvious, and the processing efficiency and accuracy are affected. Therefore, the embodiment inputs the multimedia data into a preset semantic segmentation model to output a film-coated umbrella stand image, a correction plate image and a baffle plate image. The semantic segmentation model is adopted to carry out image recognition on the film coating umbrella stand, the correction plate and the baffle plate in the film coating machine cavity, so that images of the film coating umbrella stand, the correction plate and the baffle plate in a video image frame are rapidly extracted in a target area where the film coating umbrella stand, the correction plate and the baffle plate are located, the image recognition of the equipment mechanism is less influenced by gray-scale chromatic aberration of the equipment mechanism and a background environment, and the image extraction accuracy of the target equipment mechanism is higher.

On the basis of the above embodiments, in some embodiments, the method includes constructing the semantic segmentation model, including the following steps:

Collecting a video image sample in a cavity of a film plating machine in the film plating process;

classifying each pixel in the video image sample, and marking the category corresponding to each pixel, wherein the category comprises a film coating umbrella stand, a correction plate and a baffle plate;

training a preset learning model by using the marked video image sample to obtain a semantic segmentation model.

In this embodiment, a plurality of image frames in video data in a film plating machine chamber in a film plating process are used as video image samples, each pixel in a corresponding area in the video image samples is classified and marked according to the film plating umbrella stand, the correction plate and the area where the baffle is located in the film plating machine chamber, and then the marked video image samples are input into a preset learning model for training, so as to obtain a semantic segmentation model of images in the film plating machine chamber, wherein the learning model can be a neural network model such as a convolutional neural network, a cyclic neural network and the like. The training process of the semantic segmentation model includes iterative computation of input marked video image samples, processing of the input samples through a multi-layer network structure of the model, calculating of output values of the model to loss values of target values, calculating of parameters of the model using a back propagation gradient algorithm, updating of weight values in the network according to update rules, but is not limited thereto.

In some embodiments, for a device mechanism that does not require movement during the coating process, the position information of the device mechanism may be obtained by matching the image templates of the template library, so as to detect whether the device mechanism is operating normally. Specifically, taking a correction plate and a baffle as an example, traversing a preset template library to respectively perform template matching on the correction plate image and the baffle image to obtain correction plate position information of the correction plate and baffle position information of the baffle, including:

matching the correction plate image identified by the image with a correction plate image template in a preset template library to obtain the position information of the correction plate in the correction plate image template with the highest matching degree with the correction plate image in the template library as the current position information of the correction plate;

and matching the baffle image identified by the image with a baffle image template in a preset template library to obtain the position information of the baffle in the baffle image template with the highest matching degree with the baffle image in the template library as the current baffle position information.

In this embodiment, the construction of the template library includes: the method comprises the steps of acquiring images of a correction plate and a baffle at a plurality of state moments in advance, and carrying out image processing such as graying and filtering on the acquired images; further, corresponding correction plate position information, correction plate opening and closing state and other state information are marked on the processed correction plate image to obtain a correction plate image template; and identifying corresponding baffle position information, baffle opening and closing state and other state information for the processed baffle image to obtain a baffle image template, thereby completing the construction of a template library. The position information of the correction plate includes information such as a position, a height, an angle formed with a preset reference object, a rotation angle, and the like of the correction plate, and the position information of the baffle includes information such as a position, a height, an angle formed with a preset reference object, a rotation angle, and the like of the baffle. Therefore, the embodiment does not need to construct models such as an image edge recognition model and the like to specifically recognize the positions and states of the correction plate and the baffle, and reduces the computational complexity.

In some embodiments, for a device mechanism that needs to move in the film plating process, the rotation information of the device mechanism can be obtained through whether the movement track of the device mechanism is matched with the planned track, so as to detect whether the device mechanism operates normally. Specifically, taking a film-coated umbrella stand as an example, determining a motion track of the film-coated umbrella stand and umbrella stand rotation information corresponding to the motion track according to film-coated umbrella stand image frames of at least two continuous frames, including:

In this embodiment, a planned track is constructed in advance according to a preset rotation type and a rotation speed corresponding to the preset rotation type, so that in the film plating process, the motion track of the film plating umbrella stand is obtained by judging the motion track of an umbrella stand reference point on the film plating umbrella stand, and the motion track of the film plating umbrella stand is matched with the planned track, namely, whether the rotation condition of the film plating umbrella stand accords with the preset rotation type and the rotation speed of the preset rotation type is judged. The preset rotation type comprises revolution and/or rotation, namely the preset rotation type is revolution only, rotation only and revolution and rotation simultaneously, and the umbrella stand rotation information comprises the rotation type of the umbrella stand and the rotation speed corresponding to the rotation type.

Specifically, displacement information of an umbrella stand reference point in at least two continuous film plating umbrella stand image frames is obtained, wherein the displacement information is the position change of the umbrella stand reference point, namely the change of the three-dimensional coordinates of the umbrella stand reference point. And further, fitting the displacement information of the umbrella stand reference points into the motion trail of the umbrella stand reference points, namely obtaining the motion trail of the film-coated umbrella stand, wherein the motion trail of the umbrella stand reference points is marked with the three-dimensional coordinates of the umbrella stand reference points at all times. And matching the motion trail of the fitted umbrella stand reference points with the planned trail, and obtaining the difference between the motion trail and the planned trail, so that the umbrella stand rotation information such as the rotation type, the rotation speed and the like of the film plating umbrella stand can be detected according to the difference, and the abnormal condition of the film plating umbrella stand can be timely and accurately found.

Illustratively, the film plating umbrella stand is preset as a rotation type of revolution and rotation at the same time, and one of positioning holes on the film plating umbrella stand for installing the substrate to be plated is used as an umbrella stand reference point. And acquiring the current frame and the previous three frames of film coating umbrella stand image frames, identifying the positioning hole from the current frame and the previous three frames of film coating umbrella stand image frames, and acquiring the three-dimensional coordinates of the positioning hole in the film coating umbrella stand image frames of four continuous frames so as to fit the three-dimensional coordinates of the positioning hole into a spatial motion track, thereby deducing the motion track of the film coating umbrella stand. And matching the three-dimensional coordinates on the motion track of the positioning hole with the three-dimensional coordinates on the planning track at the selected three moments. If so, marking the umbrella stand rotation information of the film plating umbrella stand as a rotation type of revolution and rotation at the same time, otherwise, marking the umbrella stand rotation information as a rotation type of non-revolution and rotation at the same time. Preferably, whether the rotation type of the current film plating umbrella stand is rotation or revolution can be further judged according to the matching result, so that the rotation type of the umbrella stand is specifically recorded, a worker can conveniently and rapidly overhaul and maintain the film plating umbrella stand according to recorded information, and the film plating efficiency is improved. Further, according to the matching result, calculating data such as a rotation speed synchronization time difference and a displacement synchronization time difference, so as to judge whether the revolution rotation speed and the rotation speed of the film plating umbrella stand respectively accord with a preset revolution rotation speed and a preset rotation speed, if so, marking the rotation information of the umbrella stand by the preset revolution rotation speed and the preset rotation speed, otherwise, marking the rotation information of the umbrella stand as a non-preset revolution rotation speed and/or a preset rotation speed, or calculating current rotation speed data.

Similarly, taking a crucible as an example, in the film coating process, the melting material is placed in the crucible for heating and evaporation, and the crucible slowly rotates. In this embodiment, a reference point on the crucible is determined, and according to displacement information of the reference point in at least two continuous crucible image frames, a motion track of the reference point is fitted, that is, a motion track of the crucible is generated, and then the motion track is matched with a planned track generated by a rotation type specified by the crucible and a rotation speed corresponding to the rotation type, so as to obtain rotation information of the crucible, thereby monitoring whether the crucible normally rotates according to the specification. Therefore, the method and the device can quickly, intuitively and accurately acquire whether the current moving equipment mechanism normally rotates according to the regulation by comparing the difference between the motion track of the reference point on the moving equipment mechanism and the planned track, and improve the timeliness of film coating monitoring.

S203, when at least one of the umbrella stand rotation information, the correction plate position information and the baffle position information is detected to meet the corresponding preset abnormal state conditions, corresponding first alarm information is sent out, and the abnormal state conditions comprise abnormal rotation conditions corresponding to the umbrella stand rotation information, first abnormal position conditions corresponding to the correction plate position information and second abnormal position conditions corresponding to the baffle position information.

In the present application, before step S203, it includes:

and detecting whether the umbrella stand rotation information, the correction plate position information and the baffle position information meet the corresponding preset abnormal state conditions or not.

In the film coating process, the moving equipment mechanism needs to rotate according to the regulation, the non-moving equipment mechanism needs to be adjusted to the specified position, for example, the correction plate needs to be adjusted to the specified correction plate position, the baffle needs to be adjusted to the specified baffle position and the film coating umbrella stand needs to rotate according to the preset rotation information, so that the mechanisms to be detected (for example, the correction plate, the baffle and the film coating umbrella stand) in the film coating machine are in a normal running state. Specifically, the designated correction plate position includes information such as the position, the height, the angle formed by the correction plate and a preset reference object, the rotation angle and the like, and all parameter values in the designated correction plate position need to correspond to all parameter values in the correction plate position information one by one under the condition that the correction plate normally operates. The designated baffle position comprises information such as the position, the height, the angle formed by the baffle and a preset reference object, the rotation angle and the like, and all parameter values in the designated baffle position need to correspond to all parameter values in the baffle position information one by one under the condition that the baffle operates normally. The preset rotation information comprises a preset rotation type and a rotation speed corresponding to the preset rotation type, and all parameter values in the preset rotation information need to be in one-to-one correspondence with all parameter values in the umbrella frame rotation information of the film plating umbrella frame under the condition that the film plating umbrella frame normally rotates.

Therefore, when the umbrella stand rotation information of the film plating umbrella stand is not consistent with the preset rotation information, the umbrella stand rotation information is considered to meet the abnormal rotation condition, namely the current film plating umbrella stand is abnormal in rotation. When the correction plate position information does not coincide with the specified correction plate position, the correction plate position information is considered to satisfy the first abnormal position condition, that is, the current correction plate position abnormality. When the baffle position information does not coincide with the specified baffle position, the baffle position information is considered to satisfy a second abnormal position condition, i.e., the current baffle position is abnormal. In this way, if at least one of the current film plating umbrella stand, the correction plate and the baffle is in an abnormal state, corresponding first alarm information is sent out. Wherein the first alarm information includes, but is not limited to: the name of the abnormal equipment mechanism, the information of the abnormal equipment mechanism (such as umbrella frame rotation information of a film plating umbrella frame, correction plate position information of a correction plate and baffle plate position information of a baffle plate) and the mechanism state information are used for reminding the abnormal operation condition of the equipment mechanism in the chamber of the current film plating machine, so that the abnormal equipment mechanism is timely adjusted, and the film plating efficiency is improved.

In addition, when the umbrella stand rotation information, the correction plate position information and the baffle position information are detected not to meet the corresponding abnormal state conditions, namely, none of the current film plating umbrella stand, the correction plate and the baffle is in an abnormal state, the equipment mechanisms are operated normally, and at the moment, the first alarm information is not required to be sent out.

Therefore, in this embodiment, by acquiring multimedia data in a film plating machine chamber in a film plating process, according to the multimedia data, umbrella frame rotation information of a film plating umbrella frame in the film plating machine chamber, correction plate position information of a correction plate and baffle plate position information of a baffle plate are determined, so that when at least one of the umbrella frame rotation information, the correction plate position information and the baffle plate position information is detected to meet a corresponding preset abnormal state condition, corresponding first alarm information is sent, and thus when at least one equipment mechanism in the film plating umbrella frame, the correction plate and the baffle plate is monitored to be in an abnormal operation state in real time, timely alarm and timely correction are performed. Therefore, whether the real-time monitoring correction plate and the baffle are adjusted to the current designated position or not and the motion condition of the film plating umbrella stand are monitored in real time, so that workers are reminded to overhaul and maintain, the film plating efficiency is improved, and meanwhile, the uniformity of the film thickness of the substrate is improved, and the film plating quality of the substrate is improved.

In some embodiments, the method further comprises:

and after the detection plan is completed, updating the detection plan.

In this embodiment, in the film plating process, the state of the mechanism to be tested in the film plating machine may change along with the operation time or step, for example, the umbrella stand rotation information of the film plating umbrella stand, the correction plate position information of the correction plate and the baffle plate position information of the baffle plate may change along with the film plating time or step, so that it is necessary to detect whether the mechanism to be tested normally operates according to the current setting at fixed time, thereby improving the film plating efficiency and improving the film plating quality of the substrate. Specifically, the detection interval time between the current detection and the next detection is determined according to the detection result of the current detection, and a detection plan is formulated according to the detection interval time. In other words, according to the abnormal operation condition of the equipment mechanism in the current detection result, the corresponding monitoring frequency, namely the detection interval time, is set so as to determine a detection plan and reasonably schedule the monitoring resources. Further, after the detection plan is executed and the next detection is completed, the detection interval time is redetermined according to the detection result of the next detection to make a new detection plan, so that the monitoring frequency is reasonably distributed to generate a high-efficiency detection plan, and meanwhile, the waste of monitoring resources is reduced, and the calculated amount is reduced.

On the basis of the foregoing embodiments, in some embodiments, taking a film-coated umbrella stand, a correction plate and a baffle plate as examples, the determining a detection plan based on the detection result includes:

In this embodiment, the detection result includes mechanism state information, and corresponding detection interval time is determined according to the mechanism state information, so as to make a corresponding detection plan. Specifically, when the rotation of the film plating umbrella stand is abnormal, the position of the correction plate is abnormal or the position of the baffle is abnormal, the corresponding mechanism state information is marked as a first type of mechanism state, and a first detection interval time corresponding to the first type of mechanism state is allocated. When any two equipment mechanisms in the film coating umbrella stand, the correction plate and the baffle are abnormal in operation, identifying the corresponding mechanism state information as a second type mechanism state, and distributing a second detection interval time corresponding to the second type mechanism state. When the film plating umbrella stand, the correction plate and the baffle are abnormal in operation, the corresponding mechanism state information is marked as a third type mechanism state, and a third detection interval time corresponding to the third type mechanism state is allocated.

In this way, since the running risk of the abnormal condition of the third type mechanism state is higher than that of the second type mechanism state and the running risk of the second type mechanism state is higher than that of the first type mechanism state, the monitoring frequency of the third type mechanism state is set to be greater than that of the second type mechanism state and the monitoring frequency of the second type mechanism state is set to be greater than that of the first type mechanism state according to the running risk and severity of the abnormal condition of the equipment mechanism. Namely, the third detection interval time is smaller than the second detection interval time, the second detection interval time is smaller than the first detection interval time, the monitoring resources are reasonably distributed, the monitoring frequency of a scene with relatively serious monitoring abnormal conditions is increased, and the coating monitoring efficiency is improved.

In an embodiment, when it is detected that the umbrella stand rotation information, the correction plate position information and the baffle position information do not meet the abnormal state condition, the corresponding mechanism state information is identified as a normal mechanism state, and a corresponding fourth detection interval time is determined. The equipment mechanism in the film plating machine chamber is in a normal running state, and at the moment, the running risk of the equipment mechanism is low, the monitoring frequency of the normal mechanism state is set to be smaller than that of the first mechanism state, the fourth detection interval time is set to be larger than the first detection interval time, so that the next detection plan is planned, the monitoring frequency is reduced, and the monitoring resources are saved.

When the number of the device mechanisms meeting the abnormal state condition in the current detection result is smaller than the number of the device mechanisms meeting the abnormal state condition detected last time, the level of the running risk of the mechanism state information is reduced, namely, the third type of mechanism state is reduced to the second type of mechanism state, the first type of mechanism state or the normal mechanism state, the second type of mechanism state is reduced to the first type of mechanism state or the normal mechanism state, and the first type of mechanism state is reduced to the normal mechanism state. Meanwhile, the detection interval time is correspondingly modified, so that the monitoring frequency is timely and pertinently adjusted to optimize the detection plan and improve the monitoring efficiency of the coating process.

The first detection interval time is allocated to the first detection interval time, and the second detection interval time is allocated to the second detection interval time, so that the second detection interval time is set to be equal to the first detection interval time. The detection plan is executed, so that the state of the equipment mechanism is re-detected after the second detection interval time, if the condition that only the umbrella stand rotation information meets the abnormal rotation condition is detected, namely, the film coating umbrella stand rotates abnormally, the position of the correction plate is normal, and the position of the baffle is normal, at the moment, the state information of the mechanism is degraded from the state of the second mechanism to the state of the first mechanism, and meanwhile, the second detection interval time is modified to the first detection interval time, so that the detection plan is updated, and the state of the equipment mechanism is re-detected after the first detection interval time.

In some embodiments, the method further comprises:

In this embodiment, the method is not limited to the case that the setting of the equipment mechanism changes with time, steps, etc. or the equipment mechanism is detected to be running abnormally but not adjusted last time, and for the number of the abnormal equipment mechanisms in the current detection result is not less than the number of the abnormal equipment mechanisms detected last time, if the abnormal running condition of the equipment mechanism in the film plating machine is more serious or still not improved than before, additional alarm information, namely second alarm information, is sent to indicate the severity of the abnormal running condition of the current equipment mechanism, and the abnormal running condition needs to be overhauled in time. Therefore, the embodiment can realize timely early warning and take urgent measures by sending the second warning information to the equipment mechanism which is not timely regulated to be in the normal running state, and can timely reduce the loss of the substrate film coating quality caused by abnormal operation.

The first detection interval time is allocated when the state information of the marking mechanism is the first type of mechanism state at the moment that the position of the correction plate is normal and the position of the baffle is normal when the rotation abnormality of the film plating umbrella stand is detected last time. And re-detecting the state of the equipment mechanism after the first detection interval time, wherein the position of the correction plate is required to be adjusted at the current moment or in the coating step. If the rotation of the film plating umbrella stand is detected to be normal at present, the position of the correction plate is abnormal, and the position of the baffle plate is abnormal, at the moment, the mechanism state information is updated from the first mechanism state to the second mechanism state, and the change of the specified position of the current correction plate and the specified position of the baffle plate can be considered to be caused, and the worker does not adjust the specified position in time, so that the detection plan is updated. Similarly, if the rotation abnormality of the film plating umbrella stand is detected currently, the position of the correction plate is normal, and the position of the baffle is normal, the worker can consider that the rotation condition of the film plating umbrella stand is not adjusted in time according to the last detection result, or the rotation information of the film plating umbrella stand is changed but not adjusted in time currently, at this time, the mechanism state information is still the first mechanism state, and the detection plan is determined according to the first detection interval time. In the two cases, the second alarm information is sent out so as to provide the emergency maintenance for the staff.

Preferably, in the present application, the detection interval time may be determined according to abnormal conditions of the film plating umbrella stand, the correction plate and the baffle plate, and the first detection interval time, the second detection interval time and the third detection interval time are not fixed, and may be determined by setting weights of the film plating umbrella stand, the correction plate and the baffle plate and detection frequencies corresponding to abnormal equipment mechanisms. The weights of the film coating umbrella stand, the correction plate and the baffle plate are reduced in sequence, and the detection frequency of the film coating umbrella stand, the correction plate and the baffle plate is reduced in sequence along with the weights, so that when the abnormality of the film coating umbrella stand and the correction plate is detected, the corresponding second detection interval time is calculated according to the weights and the detection time of the film coating umbrella stand and the correction plate. Similarly, when the abnormality of the baffle plate and the correction plate is detected, calculating the corresponding second detection interval time according to the weights and the detection time of the baffle plate and the correction plate. At this time, the monitoring frequency corresponding to the abnormal condition of the film coating umbrella stand and the correction plate is larger than the monitoring frequency corresponding to the abnormal condition of the baffle plate and the correction plate, and the second detection interval time corresponding to the abnormal condition of the film coating umbrella stand and the correction plate is smaller than the second detection interval time corresponding to the abnormal condition of the baffle plate and the correction plate.

Referring to fig. 3, a schematic structural diagram of an apparatus monitoring device of a coating machine according to an embodiment of the present application is provided, where the apparatus monitoring device 300 of the coating machine includes:

a multimedia data acquisition module 301, configured to acquire multimedia data in a chamber of a film plating machine during a film plating process;

the state information obtaining module 302 is configured to determine state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data;

and the detection module 303 is configured to send out corresponding first alarm information when detecting that the state information of the mechanism to be detected meets a preset abnormal state condition.

In some embodiments, the mechanism to be tested comprises a film coating umbrella stand, a correction plate and a baffle plate, and the device comprises:

the state information acquisition unit is used for determining umbrella stand rotation information of the film plating umbrella stand, correction plate position information of the correction plate and baffle plate position information of the baffle plate according to the multimedia data;

and the state information detection unit is used for sending corresponding first alarm information when detecting that at least one of the umbrella stand rotation information, the correction plate position information and the baffle position information meets the corresponding preset abnormal state conditions, wherein the abnormal state conditions comprise abnormal rotation conditions corresponding to the umbrella stand rotation information, first abnormal position conditions corresponding to the correction plate position information and second abnormal position conditions corresponding to the baffle position information.

In some embodiments, the status information acquisition unit includes:

the equipment mechanism image extraction unit is used for carrying out image recognition on the multimedia data so as to extract a film-coated umbrella stand image, a correction plate image and a baffle plate image;

the device comprises a correction plate and baffle position information acquisition unit, a template matching unit and a template matching unit, wherein the correction plate and baffle position information acquisition unit is used for traversing a preset template library and respectively carrying out template matching on the correction plate image and the baffle image so as to acquire correction plate position information of the correction plate and baffle position information of the baffle;

the umbrella stand rotation information acquisition unit is used for determining a motion track of the film-coated umbrella stand and umbrella stand rotation information corresponding to the motion track according to film-coated umbrella stand image frames of at least two continuous frames.

In some embodiments, the umbrella frame rotation information acquisition unit includes:

the umbrella stand reference point determining unit is used for determining umbrella stand reference points positioned on the film-coated umbrella stand;

the reference motion track fitting unit is used for obtaining displacement information of the umbrella stand reference points in the film plating umbrella stand image frames of at least two continuous frames so as to fit the motion track of the umbrella stand reference points according to the displacement information;

the motion track matching unit is used for matching the motion track of the umbrella stand reference point with a planned track to generate corresponding umbrella stand rotation information, the planned track is constructed based on preset rotation information, and the preset rotation information comprises a preset rotation type and a rotation speed corresponding to the preset rotation type.

In some embodiments, the device monitoring apparatus 300 of the coating machine further comprises:

a detection plan making unit configured to determine a detection plan based on a current detection result including mechanism state information, the detection plan including a detection interval time between current detection and next detection;

the detection plan execution unit is used for detecting after acquiring the state information of the mechanism to be detected in the film plating machine chamber again according to the detection plan;

and the detection plan updating unit is used for updating the detection plan after the detection plan is completed.

In some embodiments, the detection planning unit comprises:

the first mechanism state identification unit is used for identifying corresponding mechanism state information as a first type of mechanism state when any one of the umbrella stand rotation information, the correction plate position information and the baffle plate position information is detected to meet the abnormal state condition, and determining corresponding first detection interval time;

The second mechanism state identification unit is used for identifying the corresponding mechanism state information as a second type mechanism state when any two of the umbrella stand rotation information, the correction plate position information and the baffle plate position information are detected to meet the abnormal state condition, and determining corresponding second detection interval time;

a third mechanism state identification unit, configured to identify corresponding mechanism state information as a third type of mechanism state when it is detected that the umbrella stand rotation information, the correction plate position information and the baffle position information all meet the abnormal state condition, and determine a corresponding third detection interval time;

and the alarm unit is used for sending out second alarm information when the number of the mechanisms to be detected, the state information of which meets the abnormal state condition, is detected to be not less than the number of the mechanisms to be detected, the abnormal state condition of which is met in the last detection.

The device monitoring apparatus 300 for a film plating machine according to the embodiment of the present application may execute the device monitoring method for a film plating machine provided by the embodiment of the present application, and the implementation principle and the beneficial effects of the two are similar, and actions executed by each module in the apparatus according to each embodiment of the present application correspond to steps in the method according to each embodiment of the present application, and detailed functional descriptions of each module of the apparatus may be referred to the descriptions in the corresponding methods shown in the foregoing, which are not repeated herein.

The embodiment of the application provides a coating machine, including: the equipment monitoring device 300 of the coating machine is described above. By arranging the equipment monitoring device 300 of the coating machine, the running condition of equipment mechanisms in a chamber of the coating machine can be monitored in real time, abnormal conditions of the equipment mechanisms of the coating machine can be found in time, and an alarm can be sent out in time to remind a worker to overhaul and maintain, so that the coating efficiency of the coating machine is improved, and the coating quality of a substrate is improved.

The foregoing is only a partial embodiment of the present application, and it should be noted that, for a person skilled in the art, several improvements and modifications can be made without departing from the principle of the present application, and these improvements and modifications should also be considered as the protection scope of the present application.

Claims

1. A method for monitoring equipment of a coating machine, comprising:

acquiring multimedia data in a film plating machine cavity in a film plating process, wherein the multimedia data comprises videos and/or images which are acquired through a camera device and used for representing the running conditions of a film plating umbrella stand, a correction plate and a baffle in the film plating machine cavity;

determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data, wherein the mechanism to be tested comprises a film plating umbrella stand, a correction plate and a baffle plate;

When the state information of the mechanism to be detected is detected to meet the preset abnormal state condition, corresponding first alarm information is sent out;

the method for detecting whether the state information of the mechanism to be detected meets the preset abnormal state condition comprises the following steps:

according to the multimedia data, determining umbrella stand rotation information of the film plating umbrella stand, correction plate position information of the correction plate and baffle plate position information of the baffle plate comprises the following steps: performing image recognition on the multimedia data to extract a film-coated umbrella stand image, a correction plate image and a baffle plate image; traversing a preset template library, and respectively carrying out template matching on the correction plate image and the baffle image to obtain correction plate position information of the correction plate and baffle position information of the baffle; determining an umbrella stand reference point positioned on the film plating umbrella stand; acquiring displacement information of the umbrella stand reference points in at least two continuous film-coated umbrella stand image frames so as to be convenient for fitting a motion track of the umbrella stand reference points according to the displacement information; matching the motion trail of the umbrella stand reference point with a planned trail to generate corresponding umbrella stand rotation information, wherein the planned trail is constructed based on preset rotation information, and the preset rotation information comprises a preset rotation type and a rotation speed corresponding to the preset rotation type;

2. The equipment monitoring method of a coating machine according to claim 1, wherein the abnormal rotation condition includes that the umbrella stand rotation information does not coincide with preset rotation information;

3. The equipment monitoring method of a coating machine according to claim 1, further comprising:

and after the detection plan is completed, updating the detection plan.

4. The apparatus monitoring method of claim 3, wherein the determining a detection plan based on the detection result comprises:

when any two of the umbrella stand rotation information, the correction plate position information and the baffle position information are detected to meet the abnormal state condition, identifying the corresponding mechanism state information as a second type mechanism state, and determining corresponding second detection interval time;

5. A method of monitoring equipment of a coating machine according to claim 1 or 3, further comprising:

6. An equipment monitoring device of a coating machine, characterized in that the equipment monitoring device is used for realizing the equipment monitoring method of the coating machine according to any one of claims 1-5, comprising:

the device comprises a multimedia data acquisition module, a camera device and a camera device, wherein the multimedia data acquisition module is used for acquiring multimedia data in a film plating machine cavity in the film plating process, and the multimedia data comprises videos and/or images which are acquired through the camera device and used for representing the running conditions of a film plating umbrella stand, a correction plate and a baffle in the film plating machine cavity;

the state information acquisition module is used for determining state information of a mechanism to be tested in the film plating machine chamber according to the multimedia data, wherein the mechanism to be tested comprises a film plating umbrella stand, a correction plate and a baffle plate;

The detection module is used for sending out corresponding first alarm information when detecting that the state information of the mechanism to be detected meets the preset abnormal state condition;

7. A film plating machine, comprising: the apparatus monitoring device of claim 6.