CN113834167A - Plasma generator and air purifier with self-cleaning mechanism - Google Patents
Plasma generator and air purifier with self-cleaning mechanism Download PDFInfo
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- CN113834167A CN113834167A CN202111232188.9A CN202111232188A CN113834167A CN 113834167 A CN113834167 A CN 113834167A CN 202111232188 A CN202111232188 A CN 202111232188A CN 113834167 A CN113834167 A CN 113834167A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 132
- 230000007246 mechanism Effects 0.000 title claims abstract description 35
- 230000001681 protective effect Effects 0.000 claims abstract description 9
- 229910000831 Steel Inorganic materials 0.000 claims description 5
- 239000010959 steel Substances 0.000 claims description 5
- 210000000078 claw Anatomy 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 19
- 230000008569 process Effects 0.000 abstract description 17
- 230000000694 effects Effects 0.000 abstract description 6
- 210000002381 plasma Anatomy 0.000 description 26
- 239000000428 dust Substances 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000033001 locomotion Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000002457 bidirectional effect Effects 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/30—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by ionisation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/20—Casings or covers
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/28—Arrangement or mounting of filters
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/10—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering
- F24F8/108—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering using dry filter elements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/90—Cleaning of purification apparatus
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning In General (AREA)
Abstract
The application relates to the technical field of ionizers, and provides a plasma generator with an automatic cleaning mechanism and an air purifier, wherein the plasma generator comprises a base and an emitting electrode support arranged on the base; the protective cover is sleeved around the emitter strut and rotates relative to the emitter strut; at least one layer of emitter is arranged on the emitter strut, and if the emitters are multi-layer, the multi-layer emitters are arranged along the extension direction of the emitter strut; at least one layer of cleaning device is arranged on the shield to clean the emitter when the emitter support and the shield rotate relatively. In practical application process, the projecting pole pillar is rotatory for the guard shield to carry out omnidirectional cleanness to the projecting pole, compare in traditional self-cleaning device's overall arrangement mode, this scheme adopts the rotatory mode of projecting pole pillar for the guard shield, avoids increasing under the condition of other clean structures, with minimum structure complexity and equipment area occupancy, realizes better clean effect.
Description
Technical Field
The application relates to the technical field of ionizers, in particular to a plasma generator with an automatic cleaning mechanism and an air purifier.
Background
The ion generator ionizes air into corresponding positive and negative ions through high-voltage discharge, releases the positive and negative ions obtained through ionization into surrounding air, purifies the air, and improves the living environment of people. In actual use, fine dust particles in the environment are subjected to electrostatic attraction due to the fact that the positive/negative charges are carried on the surface of the emitting electrode of the ion generator, and thus the fine dust particles are adsorbed to the surface of the emitting electrode. When the dust particles adsorbed on the surface of the emitter are more, the performance of the emitter is greatly influenced, and the ion concentration of the ion generation amount is reduced, so that the capacity attenuation efficiency of the ion generator is reduced.
In order to perform dust cleaning on the emitting electrode, as shown in fig. 1, dust cleaning may be performed by manual intervention or by an automatic cleaning device, for example, by manually using a cleaning brush tool to perform manual cleaning on dust accumulated on the surface of the emitting electrode, but during the manual cleaning, there are situations where cleaning is incomplete or uneven, which may also cause a problem of reduction of attenuation efficiency, and during the manual cleaning, a certain disassembly and assembly of the ionizer is required, which is complicated in the cleaning process.
For another example, when an automatic cleaning device is used to clean dust, a cleaning device is generally disposed on a side surface of the emitter, and a movement track of the cleaning device needs to be parallel to an arrangement direction of the emitter, such a layout mode results in a large occupied area of the cleaning device, and because the cleaning mode is to perform single-side cleaning on the emitter, the cleaning effect is poor, on this basis, if a double-side cleaning mode needs to be employed, a cleaning device needs to be disposed on the other side surface of the emitter, thereby further resulting in a complex structure of the cleaning device and an increase in occupied area.
Disclosure of Invention
In order to provide a simple structure, the less self-cleaning structure of area occupied to realize the emitting pole self-cleaning to plasma generator, this application provides a plasma generator and air purifier with self-cleaning mechanism.
The first aspect of the application provides a plasma generator with an automatic cleaning mechanism, which comprises a base and an emitter support arranged on the base; the protective cover is sleeved around the emitter strut and rotates relative to the emitter strut so as to protect the emitter strut;
at least one layer of emitter is arranged on the emitter strut, and if the emitters are multi-layer, the multi-layer emitters are arranged along the extension direction of the emitter strut; at least one layer of cleaning device is arranged on the shield to clean the emitter when the emitter support and the shield rotate relatively.
Like this, through the projecting pole pillar with the guard shield carries out relative rotation, right the projecting pole carries out omnidirectional cleanness, compares in traditional self-cleaning device's overall arrangement mode, and this scheme adopts the projecting pole pillar for the rotatory mode of guard shield realizes better cleaning performance with minimum structure complexity and equipment area occupancy under the circumstances of avoiding increasing other clean structures.
In one implementation, the plasma generator with the automatic cleaning mechanism further comprises a ring-shaped driven gear arranged at the bottom of the shield, and the ring-shaped driven gear is meshed with a driving gear arranged on an output shaft of the motor.
The gear transmission has the characteristics of large transmission force and stable transmission, so that the stable motion relation between the shield and the emitter strut is facilitated, and the cleaning precision of the emitter can be improved.
In one implementation, the number of the emitter layers is equal to the number of the cleaning devices, and if the emitter layers are multi-layer, the distance between two adjacent layers of the cleaning devices is equal to the distance between two adjacent layers of the emitter layers.
Therefore, the cleaning devices can be in layered correspondence with the emitting electrodes, and the fixed cleaning devices are guaranteed to be arranged on each layer of the emitting electrodes.
In one implementation, if the emitter is multi-layered, the emitters of two adjacent layers are on different vertical axes, which are parallel to the emitter support.
Thus, even if the distance between the emitters of the adjacent layers is short, the mutual interference between the upper layer and the lower layer in the cleaning process can be avoided.
In one implementation, if the cleaning devices are multi-layered, the cleaning devices of adjacent two layers are on different vertical axes, which are parallel to the emitter posts.
In this way, by arranging the cleaning devices at two adjacent layers in a staggered manner, the mutual interference of dust generated in the process of cleaning the lower-layer emitting electrodes can also be avoided.
In one implementation manner, a first fixing portion is arranged at the top of the shield, a first fixing portion for clamping the first fixing portion is arranged on the emitter strut, specifically, the first fixing portion is a fixing groove, and the second fixing portion is a fixing column;
or,
the first fixing part is a fixing column, and the second fixing part is a fixing groove.
Therefore, the fixing grooves for clamping the fixing columns are formed in the protective cover, coaxiality of the protective cover and the emitting electrode support is improved, and the protective cover and the emitting electrode support can stably rotate relatively.
In one implementation mode, a third fixing part used for clamping the bottom of the shield is arranged on the base; specifically, the third fixing portion is an annular clamping groove or an annular boss.
In this way, the third fixing portion restricts the movement of the shield in the horizontal direction, so that the coaxiality of the shield and the emitter strut is improved, and the shield and the emitter strut can be further ensured to stably rotate relatively.
In one implementation, the outer contour of the shield is a hollow structure.
Therefore, the emitter can be communicated with the outside, plasma movement in the running process of the ion generator is prevented from being influenced, cleaned dust can be guaranteed in the cleaning process, and the plasma generator can be effectively discharged.
In one implementation, the cleaning device is a cleaning brush or a cleaning steel claw.
Thus, different cleaning devices can be arranged according to the actual structure of the emitter, and the emitter can be better cleaned through targeted arrangement. The second aspect of the application provides an air purifier, which comprises the plasma generator with the automatic cleaning mechanism provided by the first aspect of the application, a filter screen and a shell;
the filter screen is detachably covered outside the protective cover of the plasma generator with the automatic cleaning mechanism; the shell covers the base of the plasma generator with the automatic cleaning mechanism, and a cleaning fan and a cleaning air channel are arranged at the top of the shell.
Therefore, in the actual cleaning process, after the emitting electrode is cleaned to generate dust, the dust can be quickly sucked into the cleaning air duct through the action of the cleaning fan so as to be quickly discharged out of the plasma generator.
According to the technical scheme, the plasma generator with the automatic cleaning mechanism and the air purifier are characterized in that the plasma generator with the automatic cleaning mechanism comprises a base and an emitting electrode support arranged on the base; the protective cover is sleeved around the emitter strut and rotates relative to the emitter strut so as to protect the emitter strut; at least emitter electrodes are arranged on the emitter electrode support columns, and if the emitter electrodes are in multiple layers, the multiple layers of emitter electrodes are arranged along the extension direction of the emitter electrode support columns; at least a cleaning device is arranged on the shield to clean the emitter when the emitter support and the shield rotate relatively.
In the practical application process, the emitter strut rotates relative to the shield to carry out all-round cleaning on the emitter, compared with the layout mode of the traditional automatic cleaning device, the emitter strut rotates relative to the shield, and under the condition of avoiding adding other cleaning structures, better cleaning effect is achieved with the minimum structural complexity and the equipment area occupancy rate.
Drawings
In order to more clearly illustrate the technical solution of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious to those skilled in the art that other drawings can be obtained from the drawings without creative efforts
FIG. 1 is a schematic diagram of a prior art emitter hand cleaning approach;
FIG. 2 is a schematic view of the overall structure of a plasma generator with an automatic cleaning mechanism according to an embodiment of the present disclosure;
fig. 3 is an exploded view of an emitter pillar and shield layout according to an embodiment of the present application;
FIG. 4 is a schematic view of the overall structure of a shield according to an embodiment of the present disclosure;
FIG. 5 is a bottom view of the emitter support and shield assembly of FIG. 2;
FIG. 6 is a schematic diagram of a rotating component of the shield according to an exemplary embodiment of the present disclosure;
FIG. 7 is a schematic structural diagram of an emitter support rotating member according to an embodiment of the present application;
fig. 8 is a schematic cross-sectional view of an overall structure of an air purifier according to an embodiment of the present application.
In the figure: 1-base, 11-ring-shaped clamping groove, 2-emitter support, 21-emitter, 22-fixing column, 3-shield, 31-fixing groove, 4-cleaning device, 5-ring-shaped driven gear, 6-motor, 7-driving gear, 8-filter screen, 9-shell, 91-cleaning fan, 92-cleaning air duct and 10-power gear.
Detailed Description
In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application.
It should be noted that, the descriptions of "first", "second", etc. in this document are used for distinguishing different messages, devices, modules, etc., and do not represent a sequential order, nor limit the types of "first" and "second" to be different.
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In order to provide a plasma generator which has a simple structure, occupies a small area, and can efficiently and automatically clean an emitter, a first aspect of the embodiments of the present application provides a plasma generator with an automatic cleaning mechanism, as shown in fig. 2, which is a schematic view of an overall structure of the plasma generator with an automatic cleaning mechanism provided in the embodiments of the present application; fig. 3 is a schematic diagram of an exploded structure of an emitter pillar and shield layout according to an embodiment of the present application; the plasma generator with the automatic cleaning mechanism comprises a base 1, wherein an emitter strut 2 is arranged on the base 1, the emitter strut 2 is in a long strip structure, such as a cylinder, a square column or a strut with the cross section in other shapes, the emitter strut 2 is not limited to be a complete strut, the emitter strut 2 can be formed by a plurality of struts together, at least one layer of emitter 21 is arranged on the emitter strut 2, the number of each layer of emitter 21 is not less than 1, when the plasma generator comprises a plurality of layers of emitters 21, the emitters 21 in different layers can be on the same vertical axis or different vertical axes, and the vertical axis is parallel to the emitter strut 2. The number of the emitters is larger in the multi-layer emitter compared with that in the emitter in one layer, and more plasmas can be generated.
Still be provided with guard shield 3 on the base 1, 3 covers of guard shield are established on the projecting pole pillar 2, form and encircle the safety cover of projecting pole pillar 2, it is right to protect projecting pole pillar 2, avoid dismantling or install the in-process of other devices, to setting up projecting pole 21 on the projecting pole pillar 2 causes the damage, perhaps projecting pole 21 causes the injury to operating personnel.
Specifically, as shown in fig. 3 and fig. 5, a plurality of emitters 21 are disposed on the emitter support 2, and the plurality of emitters 21 are distributed on the emitter support 2 in a layered manner to form at least one layer of emitters 21, when a plurality of layers of emitters 21 are included, the plurality of layers of emitters 21 are arranged along the extending direction of the emitter support 2, and at least one emitter 21 is present in each layer, and accordingly, as shown in fig. 4, an overall structural diagram of the shield provided for the embodiment of the present application is shown; at least one layer of cleaning device 4 is arranged on the shield 3, when the emitter support 2 and the shield 3 rotate relatively, the emitter 21 is cleaned by the cleaning device 4, in the actual cleaning process, one layer of cleaning device 4 correspondingly cleans one layer of emitter 21, it should be noted that, the emitter support 2 and the shield 3 rotate relatively, the emitter support 2 can be stationary, and the shield 3 rotates; alternatively, the emitter strut 2 rotates and the shield 3 is stationary; alternatively, the emitter support 2 and the shield 3 both rotate at different speeds, including rotation speed and rotation direction.
It should be noted that, in the actual cleaning process, in order to ensure a better cleaning effect, the emitter support 2 rotates relative to the shield 3 to perform all-directional cleaning on the emitter 21, compared with the layout of the conventional automatic cleaning device, the present scheme adopts a manner that the emitter support rotates relative to the shield, and achieves a better cleaning effect with a minimum structural complexity and an equipment area occupancy rate under the condition of avoiding adding other cleaning structures, and it should be noted that, as shown in fig. 4, in order to ensure the communication between the emitter 21 and the outside, the outer contour of the shield 3 is a hollow structure.
Specifically, in order to realize the relative rotation between the emitter strut 2 and the shield 3, as shown in fig. 3 and fig. 6, in some embodiments of the present application, the plasma generator with the automatic cleaning mechanism further includes a ring-shaped driven gear 5 disposed at the bottom of the shield 3, the ring-shaped driven gear 5 is engaged with an outer side of a driving gear 7 disposed on an output shaft of a motor 6, and the shield 3 is driven to rotate by the disposed motor 6, so as to realize the relative rotation between the emitter strut 2 and the shield 3. As also shown in fig. 7, a schematic structural diagram of an emitter support rotating member is provided for an embodiment of the present application; in order to rotate the emitter support 2, a power device may be disposed at the bottom of the emitter support 2, and the emitter support 2 is driven to rotate by a power gear 10, so that the emitter support 2 and the shield 3 rotate relatively. It should be noted that, in the practical application process, the emitter support 2 rotates relative to the shield 3 (i.e. the shield 3 rotates around the emitter support 2, or the emitter support 2 rotates around the shield 3, or both the shield 3 and the emitter support 2 rotate around each other), including forward rotation and reverse rotation, and by adopting the bidirectional rotation mode, dead corners which are not completely cleaned exist during unidirectional rotation, and by adopting the bidirectional rotation mode (forward rotation and reverse rotation), the structural complexity and the equipment area occupancy rate of the automatic cleaning device can be further reduced.
Specifically, in order to realize that one layer of cleaning device 4 cleans one layer of emitter 21, in some embodiments of the present application, the distance between two adjacent layers of cleaning devices 4 is equal to the distance between two adjacent layers of emitter 21, so as to ensure that each layer of emitter 21 has a corresponding cleaning device 4 for cleaning. It should be noted that the multiple layers of emitters 21 may be uniformly distributed, or the spacing between emitters 21 in each layer may be set to different values according to actual conditions, so that it is only necessary to ensure that the position of the corresponding cleaning device 4 corresponds to the position of the emitter 21, so as to clean the corresponding emitter 21.
Specifically, since the emitters 21 of two adjacent layers are closer to each other, in order to avoid mutual interference between the upper and lower layers during the cleaning process, for example, the removed dust moves to the emitter 21 of the upper or lower layer during the cleaning process of one layer of emitters 21, in some embodiments of the present application, the emitters 21 of two adjacent layers are located on different vertical axes, or the cleaning devices 4 of two adjacent layers are also set to be located on different vertical axes.
Further, in order to ensure that the shield 3 and the emitter strut 2 can rotate stably relative to each other, as shown in fig. 4, in some embodiments of the present application, a first fixing portion 31 is disposed on the top of the shield 3, and a first fixing portion 22 for clamping the first fixing portion 31 is disposed on the emitter strut 2. In practical applications, the first fixing portion 31 and the first fixing portion 22 may be connected by a connecting device to enhance the stability of the first fixing portion 31 and the first fixing portion 22 in the vertical direction, for example, a screw or a connecting shaft is used to connect the fixing groove 31 and the first fixing portion 22, so as to ensure that the first fixing portion 31 and the first fixing portion 22 have high coaxiality when relatively rotating.
In the embodiment of the present application, as shown in fig. 4, the first fixing portion 31 is a fixing groove, and the second fixing portion 22 is a fixing column; however, the connection method is not limited to this, and the first fixing portion 31 may be a fixing column, and the second fixing portion 22 may be a fixing groove, so that it is only necessary to ensure that the first fixing portion 31 and the first fixing portion 22 can be coaxially connected and can rotate relatively.
Further, in order to ensure the coaxiality of the shield 3 and the emitter strut 2, as shown in fig. 3, in some embodiments of the present application, the base 1 is provided with a third fixing portion 11 for clamping the bottom of the shield 3, the movement of the shield 3 in the horizontal direction is limited by the third fixing portion 11, so that the coaxiality of the shield 3 and the emitter strut 2 is improved, and specifically, in the practical application process, the third fixing portion 11 is an annular clamping groove or an annular boss. In the practical application process, the emitter 21 can be designed into a hairbrush or a steel needle as required, and correspondingly, if the emitter 21 is the hairbrush, the cleaning device is a cleaning steel claw; if the emitter 21 is a steel needle, the cleaning device is a cleaning brush to better clean the emitter 21.
The second aspect of the embodiment of the present application provides an air purifier, which comprises the plasma generator with the automatic cleaning mechanism provided by the first aspect of the embodiment of the present application, and further comprises a filter screen 8 and a shell 9.
Wherein, as shown in fig. 8, for the air purifier overall structure's that this application embodiment provided a cross-sectional view schematic diagram, filter screen 8 detachable cover is established the guard shield 3 outsides of plasma generator who has self-cleaning mechanism, filter screen 8 needs regularly to be changed, when changing filter screen 8, sets up 2 outsides of projecting pole pillar, and is in the inside guard shield 3 of filter screen 8 can effectual protection projecting pole pillar 2 avoids projecting pole 21 to cause the destruction.
In order to ensure that the dust on the emitting electrode 21 can be cleaned quickly during the practical application, as shown in fig. 8, in some embodiments of the present application, the housing 9 is covered on the base 1 of the plasma generator with the automatic cleaning mechanism, and the top of the housing 9 is provided with a cleaning fan 91 and a cleaning air duct 92. In practical applications, by activating the cleaning fan 91, the cleaned dust is sucked into the cleaning air duct 92, so as to achieve a rapid cleaning process.
According to the technical scheme, the plasma generator with the automatic cleaning mechanism comprises a base 1 and an emitter support 2 arranged on the base 1; the protective cover 3 is sleeved around the emitter strut 2 and rotates relative to the emitter strut 2 so as to protect the emitter strut 2; at least one layer of emitter 21 is arranged on the emitter strut 2, and if the emitter 21 is multi-layer, the multi-layer emitters 21 are arranged along the extending direction of the emitter strut 2; at least one layer of cleaning means 4 is arranged on the shield 3 to clean the emitter 21 when the emitter support 2 and the shield 3 are rotated relatively.
In the practical application process, the emitter strut 2 rotates relative to the shield 3 to clean the emitter 21 in all directions, compared with the layout mode of the traditional automatic cleaning device, the emitter strut 2 rotates relative to the shield 3 in the scheme, and a better cleaning effect is achieved with the minimum structural complexity and the equipment area occupancy rate under the condition of avoiding adding other cleaning structures.
The above embodiments are provided to explain the purpose, technical solutions and advantages of the present application in further detail, and it should be understood that the above embodiments are merely illustrative of the present application and are not intended to limit the scope of the present application, and any modifications, equivalent substitutions, improvements and the like made on the basis of the technical solutions of the present application should be included in the scope of the present application.
Claims (12)
1. A plasma generator with an automatic cleaning mechanism comprises a base (1) and is characterized by also comprising an emitting electrode support (2) arranged on the base (1); the protective cover (3) is sleeved around the emitter strut (2) and rotates relative to the emitter strut (2) so as to protect the emitter strut (2);
at least one layer of emitter (21) is arranged on the emitter strut (2), and if the emitter (21) is multi-layer, the multi-layer emitters (21) are arranged along the extension direction of the emitter strut (2); at least one layer of cleaning device (4) is arranged on the shield (3) so as to clean the emitter (21) when the emitter support (2) and the shield (3) rotate relatively.
2. The plasma generator with automatic cleaning mechanism according to claim 1, further comprising a ring-shaped driven gear (5) provided at the bottom of said shield (3), said ring-shaped driven gear (5) being engaged with a driving gear (7) provided on an output shaft of a motor (6).
3. The plasma generator with automatic cleaning mechanism according to claim 1, wherein the number of the emitting electrodes (21) is equal to the number of the layers of the cleaning devices (4), and if the emitting electrodes (21) are multi-layered, the interval between the adjacent two layers of the cleaning devices (4) is equal to the interval between the adjacent two layers of the emitting electrodes (21).
4. The plasma generator with automatic cleaning mechanism according to claim 1, characterized in that if the emitter (21) is multi-layered, the emitters (21) of two adjacent layers are on different vertical axes, which are parallel to the emitter support (2).
5. The plasma generator with automatic cleaning mechanism according to claim 1, characterized in that if the cleaning devices (4) are multi-layered, the cleaning devices (4) of two adjacent layers are on different vertical axes, which are parallel to the emitter pole (2).
6. The plasma generator with the automatic cleaning mechanism according to claim 1, wherein a first fixing portion (31) is provided on the top of the shield (3), and a first fixing portion (22) for engaging with the first fixing portion (31) is provided on the emitter column (2).
7. The plasma generator with a self-cleaning mechanism according to claim 6, wherein the first fixing portion (31) is a fixing groove, and the second fixing portion (22) is a fixing post;
or,
the first fixing portion (31) is a fixing column, and the second fixing portion (22) is a fixing groove.
8. The plasma generator with the automatic cleaning mechanism according to claim 1, wherein a third fixing portion (11) for clamping the bottom of the shield (3) is provided on the base (1).
9. The plasma generator with automatic cleaning mechanism according to claim 8, wherein the third fixing portion (11) is a ring-shaped slot or a ring-shaped boss.
10. The plasma generator with automatic cleaning mechanism according to claim 1, wherein the outer contour of the shield (3) is a hollow structure.
11. The plasma generator with automatic cleaning mechanism according to claim 1, wherein the cleaning means (4) is a cleaning brush or a cleaning steel claw.
12. An air cleaner, characterized by comprising the plasma generator with an automatic cleaning mechanism according to any one of claims 1 to 11, and further comprising a filter screen (8) and a housing (9);
the filter screen (8) is detachably covered on the outer side of the shield (3) of the plasma generator with the automatic cleaning mechanism; the shell (9) is covered on the base (1) of the plasma generator with the automatic cleaning mechanism, and the top of the shell (9) is provided with a cleaning fan (91) and a cleaning air duct (92).
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