CN113831459A - Low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing and preparation method thereof - Google Patents
Low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing and preparation method thereof Download PDFInfo
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- 238000010146 3D printing Methods 0.000 title claims abstract description 38
- 238000000016 photochemical curing Methods 0.000 title claims abstract description 31
- 239000011342 resin composition Substances 0.000 title claims abstract description 25
- 238000002360 preparation method Methods 0.000 title abstract description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229920002635 polyurethane Polymers 0.000 claims abstract description 15
- 239000004814 polyurethane Substances 0.000 claims abstract description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229920001730 Moisture cure polyurethane Polymers 0.000 claims abstract description 11
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 9
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 7
- 239000003085 diluting agent Substances 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 16
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 12
- 229920000570 polyether Polymers 0.000 claims description 12
- 229920000728 polyester Polymers 0.000 claims description 11
- 229920002545 silicone oil Polymers 0.000 claims description 10
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 8
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 claims description 8
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 8
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical group COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- 239000012948 isocyanate Substances 0.000 claims description 7
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 7
- 150000002513 isocyanates Chemical group 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 125000005442 diisocyanate group Chemical group 0.000 claims description 6
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 claims description 4
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims description 4
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 235000010354 butylated hydroxytoluene Nutrition 0.000 claims description 4
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 claims description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 claims description 3
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 claims description 3
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 claims description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical group OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 3
- DYUMLJSJISTVPV-UHFFFAOYSA-N phenyl propanoate Chemical compound CCC(=O)OC1=CC=CC=C1 DYUMLJSJISTVPV-UHFFFAOYSA-N 0.000 claims description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 claims description 2
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 claims description 2
- BVQSPVZSXBJYEN-UHFFFAOYSA-N C(C=C)(=O)O.CN(C(=O)OCC)C Chemical compound C(C=C)(=O)O.CN(C(=O)OCC)C BVQSPVZSXBJYEN-UHFFFAOYSA-N 0.000 claims description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 claims description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 claims description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 2
- KNSXNCFKSZZHEA-UHFFFAOYSA-N [3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C KNSXNCFKSZZHEA-UHFFFAOYSA-N 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 229920003232 aliphatic polyester Polymers 0.000 claims description 2
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 claims description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 claims 1
- 239000007983 Tris buffer Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
- 230000009257 reactivity Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 22
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 229920002379 silicone rubber Polymers 0.000 description 7
- 238000001723 curing Methods 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 239000004945 silicone rubber Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- FDQYPNPQVNVXOJ-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C1C(C)O1.OCC(O)CO Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C1C(C)O1.OCC(O)CO FDQYPNPQVNVXOJ-UHFFFAOYSA-N 0.000 description 1
- 208000005623 Carcinogenesis Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004944 Liquid Silicone Rubber Substances 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 230000036952 cancer formation Effects 0.000 description 1
- 231100000504 carcinogenesis Toxicity 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/006—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00
- C08F283/008—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00 on to unsaturated polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
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- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Civil Engineering (AREA)
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- Manufacturing & Machinery (AREA)
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- Ceramic Engineering (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
The invention discloses a low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing and a preparation method thereof. The composition comprises the following raw materials in parts by weight: 5-40 parts of acrylic group-terminated silicon chain-containing polyurethane prepolymer, 20-60 parts of acrylic group-terminated flexible polyurethane prepolymer, 5-10 parts of polyurethane acrylate resin, 20-70 parts of reactive diluent, 1.0-5.0 parts of photoinitiator and 0.1-1.0 part of antioxidant. The low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing has high reactivity, and can be used for conventional desktop-level 3D printing equipment such as SLA and DLP. Meanwhile, the printed product contains silicon chains, has good low temperature resistance, small shrinkage rate, is not easy to yellow and has excellent mechanical properties.
Description
Technical Field
The application belongs to the technical field of chemical industry, and particularly relates to a low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing and a preparation method thereof.
Background
With popularization and application of SLA technology and DLP technology, 3D printing consumables are required to be more and more diversified in the market, and photosensitive resin is required to have different systems and different performances. With the development of some medical models and artware designs, the demand for flexible resin materials is increasing, so that the development of flexible resin meeting the requirements has great promotion effect on promoting the application of SLA and DLP technologies.
The photocuring organic silicon material has been researched and applied in a plurality of fields by virtue of excellent physical and chemical properties, and a new way is opened for solving the wide application of the flexible material in 3D printing. In particular, the organosilicon material has a series of excellent characteristics of good temperature resistance, oxidation resistance, hydrophobicity, flexibility, permeability, aging resistance, high transparency, physiological inertia, no adhesion with human tissues and blood, good biocompatibility, no toxicity, no odor, no carcinogenesis and the like. And the excellent low-temperature resistance of the silicone rubber can well solve the problem of low-temperature resistance of the 3D printing material. But the existing domestic and foreign researches are rarely related to the performance.
Silicone rubbers used for 3D printing are relatively rare and are mainly associated with the complexity of the formulation of the rubber and the limitations of the curing regime. These resins are also synthetic and high viscosity resins based on silicone acrylate resins, requiring further dilution with monomers. Based on this, Andrew j. boydston team reports a series of photo-resins suitable for DLP elastomer production, which use monofunctional acrylate monomer, bifunctional acrylate cross-linking agent monomer and acrylate-modified polysiloxane as main raw materials, and by adjusting the contents of the components, a series of elastomers with different mechanical properties can be obtained. The Kurary publication in japan proposes a photocurable elastomer having both curability and flexibility. By controlling the relative molecular mass and arrangement of the elastomer portion and the photocurable portion, it achieves both curability and flexibility, and can be used as an adhesive, a coating material, and a molding material. Kai Parthy has derived a 3D printing material that can be used for the sole, still can improve its elasticity and shock attenuation effect through intelligent design and section technique. German invention patent application Hochviskose silicone gum sheet, wherein the Horhviskose silicone gum sheet, the Holtellung elastomerer, the femto titels balistischer generator, the Verfahren (publication number WO 2017089496A1) discloses a method for 3D printing of high-viscosity silicone rubber, and silicon hydrogen addition liquid silicone rubber is used as a raw material, and a large amount of filler can be added to ensure the mechanical property; the photosensitive platinum catalyst with a special structure is adopted, and printing and curing are carried out under the irradiation of ultraviolet light. The method combines a photosensitive catalyst with the existing silicone rubber to realize DIW3D printing of the silicone rubber, can adapt to higher viscosity, and allows filling of a large amount of fillers. However, this method requires the use of an expensive platinum catalyst and is unstable during storage of the raw material.
In summary, the main problems of the photocuring 3D printing flexible material in the currently reported method are: most materials are thermosetting resins, not true rubber materials; the photosensitive platinum catalyst with a special structure is expensive; the synthesis method of the acrylic organosilicon material is complex, and the problem of oxygen inhibition also exists in the curing process; the compatibility problem of the acrylate and the organic silicon exists, the mechanical property of the product is lower, and the elasticity is poorer; the high and low temperature resistance of the silicon rubber can be greatly reduced by the acrylic acid, epoxy resin modified organic silicon and other structures; the material system is limited by the printing method and cannot achieve ideal mechanical properties. In addition, related products are not really pushed out about the flexible body material for 3D printing in China, and at present, few research reports about the flexible body material for 3D printing are reported, and the low-temperature resistant flexible body material for 3D printing is needless to say. Therefore, the flexible body material which has good flexibility, mechanical property and high and low temperature resistance, simple process and quick curing is researched and developed, is suitable for photocuring 3D printing, can reduce the material use cost of equipment, breaks the technical monopoly of foreign materials, and promotes the quick development of domestic photocuring 3D materials, thereby laying a certain foundation for the wide development of photocuring 3D printing in the industrial field.
Disclosure of Invention
Aiming at the condition of the prior art, the invention provides the low-temperature-resistant flexible photosensitive resin composition for the photocuring 3D printing, which is low in cost and excellent in mechanical property, and the preparation method thereof. The photosensitive resin composition has the advantages of low cost, wide applicability and cold resistance, is used for 3D printing technology, effectively solves the problems of high price of 3D printing resin, improvement on mechanical properties based on the flexible polyurethane photosensitive resin composition and the like, and lays a foundation for large-scale application of the 3D printing technology.
In order to achieve the purpose, the invention adopts the technical scheme that:
the flexible photosensitive resin composition for the low-temperature-resistant photocuring 3D printing comprises the following raw materials in parts by weight:
the structural formula of the acrylic acid group-terminated silicon chain polyurethane prepolymer is as follows:
in the above formula, R1,R2Not limited to the listed categories;
the structural formula of the acrylic group-terminated flexible polyurethane prepolymer is as follows:
in the above formula, R1,R2Not limited to the listed categories.
The preparation method of the low-temperature-resistant flexible photosensitive resin composition for the photocuring 3D printing comprises the following steps:
(1) continuously dropwise adding metered hydroxyl silicone oil into a round-bottom flask containing diisocyanate through a separating funnel, reacting for 3-6 hours under the protection of nitrogen and at the temperature of 80-100 ℃, then adding metered hydroxyl-containing acrylic acid monomer, continuously reacting for 2-3 hours, and vacuumizing and defoaming a product after reaction to obtain an acrylic acid group-terminated silicon-chain polyurethane photosensitive prepolymer;
wherein, the diisocyanate is one or more of toluene diisocyanate, p-phenylene diisocyanate, hexamethylene diisocyanate and isophorone diisocyanate; the hydroxyl silicone oil is one or more of hydroxyl silicone oils with molecular weight of 20000 (hydroxyl content of 0.2%), 2000 (hydroxyl content of 2%), 1800 (hydroxyl content of 1.8%), 500 (hydroxyl content of 8%) and the like; the acrylic monomer containing hydroxyl is one or the combination of hydroxyethyl methacrylate, hydroxypropyl methacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate and the like; the input ratio of the diisocyanate to the hydroxyl silicone oil to the hydroxyl-containing acrylic monomer is as follows: the amount of-OH species is calculated as 1: 1.
(2) Continuously dropwise adding metered hydroxyl-containing acrylic monomers into a round-bottom flask filled with polyester or polyether with an isocyanate group end capping through a separating funnel, and reacting for 0.1-7.0 h under the protection of nitrogen and at the temperature of 50-100 ℃; vacuumizing and defoaming the product after reaction to obtain the acrylic group-terminated flexible polyurethane photosensitive prepolymer;
wherein, the polyester or polyether blocked by the isocyanate group is one or the combination of aliphatic polyester or polyether blocked by the isocyanate group (NCO content is 0.1-6.0%), alicyclic polyester or polyether blocked by the isocyanate group (NCO content is 0.1-4.0%), and aromatic polyester or polyether blocked by the isocyanate group (NCO content is 0.1-5.0%); the acrylic monomer containing hydroxyl is one or the combination of hydroxyethyl methacrylate, hydroxypropyl methacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate and the like; the isocyanate group-terminated polyester or polyether and the hydroxyl-containing acrylic monomer are added according to the proportion of-NCO: the amount of-OH species is calculated as 1: 1.
(3) According to the weight, 5-40 parts of acrylic group-terminated silicon chain polyurethane photosensitive prepolymer, 20-60 parts of acrylic group-terminated flexible polyurethane prepolymer, 5-10 parts of polyurethane acrylate resin, 20-70 parts of reactive diluent, 1.0-5.0 parts of photoinitiator and 0.1-1.0 part of antioxidant are mixed and heated to 30-80 ℃, and the mixture is stirred and mixed uniformly to obtain the low-temperature-resistant photocuring flexible photosensitive resin composition for 3D printing.
Preferably, the urethane acrylate resin is selected from one of aliphatic urethane acrylate oligomer, aromatic urethane acrylate oligomer, urethane diacrylate, and dimethyl urethane acrylate resin or a combination thereof.
Preferably, the reactive diluent is selected from one or a combination of glycerol propylene oxide triacrylate, ethoxylated pentaerythritol tetraacrylate, hydroxypropyl methacrylate, hydroxyethyl methacrylate, trimethylolpropane triacrylate, isobornyl acrylate and cyclotrimethylolpropane formal acrylate.
Preferably, the photoinitiator is selected from one of phenyl bis (2,4, 6-trimethylbenzoyl) phosphine oxide, 1-hydroxycyclohexyl phenyl ketone or a combination thereof.
Preferably, the antioxidant is selected from one or a combination of pentaerythritol tetrakis (3, 5-di-tert-butyl-4-hydroxy) phenylpropionate and 2, 6-di-tert-butyl-4-methylphenol.
The invention has the beneficial effects that:
(1) according to the low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing, provided by the invention, the silicon chain is subjected to photosensitive modification and is connected into a structural system of photosensitive resin, so that a flexible material which is suitable for photocuring 3D printing and has excellent mechanical property and low-temperature resistance is developed.
(2) The photosensitive resin composition has the advantages of simple process, quick curing and the like, can reduce the material use cost of equipment, break through the technical monopoly of foreign materials, promote the quick development of domestic photocuring 3D materials, expand the application range of photocuring 3D printing, and is particularly applied to the shoe and clothes industry.
Drawings
Fig. 1 is a product printed by a desktop-level photocuring 3D printer from a low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing prepared in an example of the present invention.
Detailed Description
In the examples, the sources of the raw materials used and the abbreviations in the examples are as follows:
acrylic group-terminated silicon chain-containing polyurethane prepolymer
13.38g of toluene diisocyanate was added into a round-bottom flask, 72.57g of hydroxy silicone oil was continuously added dropwise through a separating funnel, and the reaction was stirred for 5 hours under the protection of nitrogen at 90 ℃. Adding 10g of hydroxyethyl methacrylate, and continuously stirring and reacting for 2 hours under the conditions of nitrogen protection and 90 ℃ to obtain an acrylic group-terminated silicon-chain-containing polyurethane photosensitive prepolymer, which is abbreviated as A-1;
12.07g of toluene diisocyanate was added into a round bottom flask, 65.51g of hydroxy silicone oil was continuously added dropwise through a separating funnel, and the mixture was stirred and reacted for 5 hours under the protection of nitrogen at 90 ℃. Adding 10g of hydroxypropyl methacrylate, and continuously stirring and reacting for 2h under the protection of nitrogen and at the temperature of 90 ℃ to obtain the acrylic group-terminated silicon-chain-containing polyurethane photosensitive prepolymer, which is abbreviated as A2.
Acrylic group-terminated flexible polyurethane prepolymer
In a round-bottom flask containing isocyanate group terminated polyester (ether), metered acrylic monomers with hydroxyl and C ═ C are added dropwise continuously through a separating funnel, and the mixture is reacted for 0 to 5 hours under the protection of nitrogen and at the temperature of 50 to 100 ℃. Vacuumizing and defoaming the product after reaction to obtain an isocyanate group-terminated flexible polyurethane photosensitive prepolymer, which is abbreviated as B-1;
urethane acrylate resin
Aliphatic urethane acrylate: purchased from sandoma corporation, product number CN9010, abbreviated as C-1;
aliphatic urethane acrylate: purchased from sandoma corporation under product number CN991, abbreviated as C-2;
reactive diluent
Hydroxyethyl methacrylate: purchased from Aladdin reagent (Shanghai) Co., Ltd, abbreviated as D-1;
hydroxypropyl methacrylate: purchased from Aladdin reagent (Shanghai) Co., Ltd, abbreviated as D-2;
cyclotrimethylolpropane formal acrylate (CTFA): purchased from sandoma corporation, abbreviated as D-3;
photoinitiator
Phenylbis (2,4, 6-trimethylbenzoyl) phosphine oxide: purchased from Aladdin reagent (Shanghai) Inc., product number photoinitiator XBPO, abbreviated as E-1;
1-hydroxycyclohexyl phenyl ketone: available from Allantin reagents (Shanghai) Inc., product number photoinitiator 184, abbreviated as E-2;
antioxidant agent
2, 6-di-tert-butyl-4-methylphenol: available from Allantin reagent (Shanghai) Inc., product number antioxidant BHT, abbreviated as F-1;
pentaerythritol tetrakis (3, 5-di-tert-butyl-4-hydroxy) phenylpropionate: purchased from Kyon chemical Co., Ltd, Guangzhou, antioxidant 1010, abbreviated as F-2.
Examples 1 to 6 (preparation of sample No. 1 to sample No. 6)
According to parts by weight, 5-40 parts of silicon chain polyurethane photosensitive prepolymer terminated by acrylic groups, 20-60 parts of flexible polyurethane prepolymer terminated by acrylic groups, 5-10 parts of polyurethane acrylate resin, 20-70 parts of reactive diluent, 1.0-5.0 parts of photoinitiator and 0.1-1.0 part of antioxidant are mixed and heated to 30-80 ℃, and the mixture is stirred and mixed uniformly to obtain the low-temperature-resistant flexible photosensitive resin composition for photocuring 3D printing. The relationship between the sample number and the types and ratios of the components is shown in Table 1.
TABLE 1
Application of product prepared by embodiment in photocuring 3D printer
And introducing the prepared photosensitive resin composition into a photocuring 3D printer, and performing computer modeling, composition and molding after printing. For the products obtained in the above examples, the photosensitive resin compositions were evaluated by curing and observing the appearance of the cured products, and the results are shown in table 2 below:
TABLE 2
Claims (9)
1. The low-temperature-resistant flexible photosensitive resin composition for the photocuring 3D printing is characterized by comprising the following raw materials in parts by weight:
the structural formula of the acrylic acid group-terminated silicon chain polyurethane prepolymer is as follows:
in the above formula, R1,R2Is one of the listed categories;
the structural formula of the acrylic group-terminated flexible polyurethane prepolymer is as follows:
in the above formula, R1,R2Is one of the listed categories.
2. The method for preparing the flexible photosensitive resin composition for low temperature resistant photocuring 3D printing according to claim 1, comprising the steps of:
(1) continuously dropwise adding metered hydroxyl silicone oil into a round-bottom flask containing diisocyanate through a separating funnel, reacting for 3-6 hours under the protection of nitrogen and at the temperature of 80-100 ℃, then adding metered hydroxyl-containing acrylic acid monomer, continuously reacting for 2-3 hours, and vacuumizing and defoaming a product after reaction to obtain an acrylic acid group-terminated silicon-chain polyurethane photosensitive prepolymer;
(2) continuously dropwise adding metered hydroxyl-containing acrylic monomers into a round-bottom flask filled with polyester or polyether with an isocyanate group end capping through a separating funnel, and reacting for 0.1-7.0 h under the protection of nitrogen and at the temperature of 50-100 ℃; vacuumizing and defoaming the product after reaction to obtain the acrylic group-terminated flexible polyurethane photosensitive prepolymer;
(3) according to the weight, 5-40 parts of acrylic group-terminated silicon chain polyurethane photosensitive prepolymer, 20-60 parts of acrylic group-terminated flexible polyurethane prepolymer, 5-10 parts of polyurethane acrylate resin, 20-70 parts of reactive diluent, 1.0-5.0 parts of photoinitiator and 0.1-1.0 part of antioxidant are mixed and heated to 30-80 ℃, and the mixture is stirred and mixed uniformly to obtain the low-temperature-resistant photocuring flexible photosensitive resin composition for 3D printing.
3. The method for preparing the flexible photosensitive resin composition for low temperature resistant photocuring 3D printing according to claim 2, characterized in that in the step (1), the diisocyanate is one or more of toluene diisocyanate, p-phenylene diisocyanate, hexamethylene diisocyanate and isophorone diisocyanate; the hydroxyl silicone oil is one or more of hydroxyl silicone oils with molecular weights of 20000, 2000, 1800 and 500; the acrylic monomer containing hydroxyl is one or the combination of hydroxyethyl methacrylate, hydroxypropyl methacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate and the like; the input ratio of the diisocyanate to the hydroxyl silicone oil to the hydroxyl-containing acrylic monomer is as follows: the amount of-OH species is calculated as 1: 1.
4. The method for preparing the flexible photosensitive resin composition for low temperature resistant photocuring 3D printing according to claim 2, wherein in the step (2), the isocyanate group-terminated polyester or polyether is one or a combination of isocyanate group-terminated aliphatic polyester or polyether, isocyanate group-terminated alicyclic polyester or polyether, and isocyanate group-terminated aromatic polyester or polyether; the acrylic monomer containing hydroxyl is one or the combination of hydroxyethyl methacrylate, hydroxypropyl methacrylate, pentaerythritol triacrylate and dipentaerythritol pentaacrylate; the isocyanate group-terminated polyester or polyether and the hydroxyl-containing acrylic monomer are added according to the proportion of-NCO: the amount of-OH species is calculated as 1: 1.
5. The method for preparing the flexible photosensitive resin composition for low temperature resistant photo-curing 3D printing according to claim 2, wherein the urethane acrylate resin is selected from one or a combination of aliphatic urethane acrylate oligomer, aromatic urethane acrylate oligomer, urethane diacrylate and dimethyl urethane acrylate resin.
6. The method of claim 2, wherein the reactive diluent is selected from one or a combination of glycerol triacrylate, ethoxylated pentaerythritol tetraacrylate, hydroxypropyl methacrylate, hydroxyethyl methacrylate, trimethylolpropane triacrylate, isobornyl acrylate and cyclotrimethylolpropane formal acrylate.
7. The method for preparing the low temperature resistant photo-curing flexible photosensitive resin composition for 3D printing according to claim 2, wherein the photo-initiator is selected from one of phenyl bis (2,4, 6-trimethylbenzoyl) phosphine oxide, 1-hydroxycyclohexyl phenyl ketone or a combination thereof.
8. The method of claim 2, wherein the antioxidant is selected from pentaerythritol tetrakis (3, 5-di-tert-butyl-4-hydroxy) phenylpropionate, phenyl tris (2, 4-di-tert-butyl) phosphite, N' -bis- (3- (3, 5-di-tert-butyl-4-hydroxyphenyl) propionyl) hexanediamine, 2, 6-di-tert-butyl-4-methylphenol, or a combination thereof.
9. Use of the photosensitive resin composition obtained by the production method according to any one of claims 2 to 8 for photocuring 3D printing.
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