CN113797661A - Tail gas treatment system and method in electronic grade polycrystalline silicon production - Google Patents
Tail gas treatment system and method in electronic grade polycrystalline silicon production Download PDFInfo
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- CN113797661A CN113797661A CN202111232132.3A CN202111232132A CN113797661A CN 113797661 A CN113797661 A CN 113797661A CN 202111232132 A CN202111232132 A CN 202111232132A CN 113797661 A CN113797661 A CN 113797661A
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- dust collecting
- tail gas
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- absorption tower
- production
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 39
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000000428 dust Substances 0.000 claims abstract description 101
- 239000007788 liquid Substances 0.000 claims abstract description 82
- 238000010521 absorption reaction Methods 0.000 claims abstract description 45
- 239000002699 waste material Substances 0.000 claims abstract description 41
- 238000011084 recovery Methods 0.000 claims abstract description 38
- 238000005507 spraying Methods 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 19
- 239000002893 slag Substances 0.000 claims abstract description 8
- 238000007664 blowing Methods 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000007921 spray Substances 0.000 claims description 14
- 238000012856 packing Methods 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000000945 filler Substances 0.000 claims description 6
- 230000018044 dehydration Effects 0.000 claims description 5
- 238000006297 dehydration reaction Methods 0.000 claims description 5
- 241000883990 Flabellum Species 0.000 claims description 4
- 238000009826 distribution Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 claims description 3
- 239000000344 soap Substances 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000011010 flushing procedure Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 36
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- -1 sodium aluminum fluoride Chemical compound 0.000 description 5
- 239000012071 phase Substances 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011897 real-time detection Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
- B01D46/023—Pockets filters, i.e. multiple bag filters mounted on a common frame
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/02—Particle separators, e.g. dust precipitators, having hollow filters made of flexible material
- B01D46/04—Cleaning filters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
- B01D53/185—Liquid distributors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/96—Regeneration, reactivation or recycling of reactants
Abstract
The invention discloses a tail gas treatment system in electronic-grade polycrystalline silicon production and a method thereof, and the tail gas treatment system comprises a dust collecting device, an absorption tower and a waste liquid recovery box, wherein a back-flushing air pump is arranged at an exhaust port at the top of the dust collecting device, a Venturi tube is connected with the outside of an air inlet on the side wall of the dust collecting device, a rotary valve is arranged at a slag discharge port at the bottom of the dust collecting device, an exhaust port at the top of the dust collecting device is communicated with an air inlet below the absorption tower, a rotary guide fan is arranged at the exhaust port at the top of the absorption tower, a water collecting port at the bottom of the absorption tower is communicated with the waste liquid recovery box, and the top of the waste liquid recovery box is communicated with the inside of the absorption tower through a multi-stage spraying device. The invention has the advantages that the recovery of dust collection is realized by matching the dust collection device with the back-blowing air pump, dust particles in tail gas in production can be effectively isolated, the recovery is more convenient, the waste liquid which is not completely reacted is recovered and is sprayed and utilized again, the utilization efficiency is improved, the cost is reduced, and the emission quality of the tail gas in production is improved.
Description
Technical Field
The invention relates to the technical field of polycrystalline silicon tail gas treatment, in particular to a tail gas treatment system and method in electronic grade polycrystalline silicon production.
Background
The new silane method is used for producing polycrystalline silicon, and sodium aluminum fluoride and silane are generated after sodium aluminum hydride and silicon tetrafluoride react in toluene and DME solvent. The aluminum fluoride sodium solid-liquid mixture is separated into a solvent and aluminum fluoride sodium powder through a film dryer, and the solvent and the aluminum fluoride sodium powder respectively enter a rectification system and a negative pressure conveying system and enter different production areas. And the organic solvent steam separated by the film dryer enters a rectification system for purification and separation, and then returns to the solvent storage tank.
Organic solvent steam enters a condenser from an outlet pipeline at the upper end of the film dryer, is liquefied under the cooling action and enters a feeding tank, then enters a rectifying tower as a feed through a feeding pump, and toluene and DME separated by the rectifying tower return to a solvent storage tank. Meanwhile, under the action of the rectification system, light components such as non-condensable gas in the solvent are also discharged from the tower top reflux tank and enter an incineration system for incineration treatment, and harmful gases in the waste gas mainly comprise part of incineration dust particles, sulfur oxides, a small amount of halides and phosphorus compounds.
Disclosure of Invention
The invention aims to provide a tail gas treatment system and a tail gas treatment method in electronic grade polycrystalline silicon production, and the tail gas emission quality in production is improved.
The technical purpose of the invention is realized by the following technical scheme:
the utility model provides a tail gas processing system in production of electronic grade polycrystalline silicon, a serial communication port, including dust collecting device, absorption tower and waste liquid recovery case, dust collecting device's top exhaust port department is provided with the blowback air pump, dust collecting device's lateral wall air inlet external connection has venturi, dust collecting device's bottom scum outlet is provided with the rotary valve, dust collecting device's top exhaust port and the air inlet intercommunication of absorption tower below, the exhaust port department at absorption tower top is provided with rotatory guide fan, the mouth that catchments and the waste liquid recovery case intercommunication of absorption tower bottom, the waste liquid recovery case top is through multistage spray set and the inside intercommunication of absorption tower.
Preferably, the dust collecting device is internally provided with a plurality of groups of dust collecting pipes at a top exhaust port, the dust collecting pipes are externally fixedly sleeved with dust collecting bags through flanges, a flow baffle is arranged at the position, close to the side wall air inlet, of the top of the dust collecting device, and a rotary dredging fan is arranged above the rotary valve at a bottom slag discharge port.
Preferably, the rotation axis of the rotary dredging fan is vertically arranged, the arc-shaped fan blades are symmetrically arranged and fixed on the rotation axis, and the two arc-shaped fan blades are symmetrically arranged, wherein one end of each arc-shaped fan blade faces upwards, and the other end of each arc-shaped fan blade faces downwards.
Preferably, a first stop valve is arranged between the top exhaust port of the dust collecting device and the back-blowing air pump, and a second stop valve is arranged between the top exhaust port of the dust collecting device and the air inlet below the absorption tower.
Preferably, an ultrasonic dust collector is arranged on the inner wall of the dust collecting device, and the output end of the ultrasonic dust collector is fixedly arranged at the bottom of the dust collecting pipe.
Preferably, a second cyclone plate, a flow collecting conical plate, a first cyclone plate and a packing layer are sequentially arranged in the absorption tower from bottom to bottom in the rotary guide fan, and the packing layer is arranged above the air inlet below the absorption tower.
Preferably, a third stop valve and a pressure pump are arranged between the water collecting opening at the bottom of the absorption tower and the waste liquid recovery tank, and a PH tester is arranged inside the waste liquid recovery tank.
Preferably, the multistage spraying device comprises at least three groups of spraying pumps, spraying heads and a liquid inlet pipe, the spraying heads are communicated with the spraying pumps and the waste liquid recovery box through the liquid inlet pipe, the spraying heads are respectively arranged between the rotary guide fan and the second spiral-flow plate, between the flow collecting conical plate and the first spiral-flow plate and between the first spiral-flow plate and the packing layer, a fourth stop valve is arranged at the main end of the liquid inlet pipe, and the output end of the spraying heads is upwards arranged.
A tail gas treatment method in electronic grade polycrystalline silicon production is characterized by comprising the following steps: the method comprises the following steps:
(1) firstly, closing the first stop valve and the fourth stop valve, opening the other stop valves, introducing the production tail gas into a dust collecting device through a Venturi tube, cutting off and collecting dust particles in the production tail gas through a dust collecting bag, and introducing the dust particles into an absorption tower through a top exhaust port of the dust collecting device;
(2) the production tail gas enters the absorption tower and then passes through the filler layer, the filler layer is contacted with the treatment liquid on the upper part of the absorption tower to form a liquid film, the liquid film is fully contacted with the production tail gas, and the liquid film is discharged by the rotary guide fan after the full reaction is realized by the upper multistage spray pipe and the rotational flow plate to complete dehydration;
(3) liquid at the bottom of the absorption tower after reaction is guided into a waste liquid recovery box through a pressure pump, waste liquid recovery is realized through a spray pump and a spray head, real-time PH detection is realized in the waste liquid recovery box, if the waste liquid in the waste liquid recovery box tends to be neutral, a third stop valve and the pressure pump are closed, and the liquid is guided into a liquid inlet pipe through external liquid soap;
(4) after the dust collecting device works for a certain time, stopping the air intake of the production tail gas, closing the second stop valve, opening the first stop valve and the pressure pump, blowing down the dust particles on the dust collecting bag, shaking off the dust particles through the ultrasonic dust collector, discharging the dust particles from a slag discharge port at the bottom of the dust collecting device, and opening the rotary dredging fan to dredge and discharge dust in time after the dust collecting device is blocked.
In conclusion, the invention has the following beneficial effects:
1. the invention realizes the recovery of dust collection by matching the dust collection device with the back-blowing air pump, can effectively isolate dust particles in tail gas in production, and is more convenient to recover.
2. The second cyclone plate, the flow collecting conical plate, the first cyclone plate and the filler layer are sequentially arranged in the absorption tower, so that dehydration and discharge are completed through full reaction, a liquid film is formed when liquid is sprayed on the filler, the liquid film increases the contact area of gas phase and liquid phase, the gas phase and the liquid phase are in full contact, and physical dissolution and chemical reaction processes occur between the liquid phase and the gas phase in the contact process, so that harmful ingredients in tail gas are removed, and the emission quality of the tail gas in production is improved.
3. The invention adopts the waste liquid recovery box to recover and spray the incompletely-reacted waste liquid for reuse, thereby improving the utilization efficiency and reducing the cost.
Drawings
FIG. 1 is a schematic view of the structures of the present invention.
Detailed Description
The following further describes the embodiments of the present invention with reference to the drawings, and the present embodiment is not to be construed as limiting the invention.
As shown in fig. 1, a tail gas treatment system in electronic grade polycrystalline silicon production, including dust collector 1, absorption tower 2 and waste liquid recovery case 3, dust collector 1's top exhaust port department is provided with blowback air pump 4, dust collector 1's lateral wall air inlet external connection has venturi 25, dust collector 1's bottom deslagging mouth is provided with rotary valve 5, dust collector 1's top gas vent and the air inlet intercommunication of absorption tower 2 below, the exhaust port department at absorption tower 2 top is provided with rotatory guide fan 6, the water catch bowl and the waste liquid recovery case 3 intercommunication of absorption tower 2 bottom, the inside intercommunication of waste liquid recovery case 3 top through multistage spray set and absorption tower 2.
Be provided with first stop valve 11 between dust collecting device 1's the top gas vent and the blowback air pump 4, be provided with second stop valve 12 between dust collecting device 1's the top gas vent and the air inlet of absorption tower 2 below, be provided with ultrasonic cleaner 13 on the dust collecting device 1 inner wall, ultrasonic cleaner 13 output end is fixed to be set up in the dust collecting tube 7 bottom, realizes shaking of dirt particle through ultrasonic cleaner 13 and falls, realizes the clearance to dust collecting device 1 inside more easily.
Inside 2 inside in the rotatory guiding fan 6 of absorption tower down has set gradually second whirl board 14, mass flow awl board 15, first whirl board 16 and packing layer 17, and packing layer 17 sets up in the air inlet top of absorption tower 2 below, realizes fully reacting through top multistage spray set and whirl board and accomplishes the dehydration.
The mouth that catchments of absorption tower 2 bottom is provided with third stop valve 18 and force (forcing) pump 19 between with waste liquid recovery case 3, and waste liquid recovery case 3 is inside to be provided with PH apparatus 20, realizes PH real-time detection in the waste liquid recovery case 3 to judge subsequent waste liquid recovery according to the PH value.
The multi-stage spraying device comprises at least three groups of spraying pumps 21, spraying heads 22 and a liquid inlet pipe 23, the spraying heads 22 are communicated with the spraying pumps 21 through the liquid inlet pipe 23, a waste liquid recycling tank 3 is communicated, the spraying heads 22 are respectively arranged between the rotary guide fan 6 and the second spiral-flow plate 14, between the flow collecting conical plate 15 and the first spiral-flow plate 16 and between the first spiral-flow plate 16 and the packing layer 17, a fourth stop valve 24 is arranged at the general end of the liquid inlet pipe 23, the output end of the spraying heads 22 is upwards arranged, a liquid film is formed when liquid is sprayed on the packing, the liquid film increases the contact area of gas and liquid phases, the liquid and liquid phases are fully contacted, the physical dissolution and chemical reaction processes occur between the liquid phase and the gas phase in the contact process, therefore harmful ingredients in tail gas can be removed, and the emission quality of the produced tail gas is improved.
A tail gas treatment method in electronic grade polycrystalline silicon production comprises the following steps:
(1) the first stop valve 11 and the fourth stop valve 24 are closed, the rest stop valves are opened, the production tail gas is guided into the dust collecting device 1 through the venturi tube 25, dust particles in the production tail gas are cut off and collected through the dust collecting bag 8, and the dust particles enter the absorption tower 2 through the top exhaust port of the dust collecting device 1.
(2) The production tail gas firstly passes through the packing layer 17 after entering the absorption tower 2, the packing layer 17 is contacted with the treatment liquid on the upper part of the absorption tower 2 to form a liquid film, the liquid film is fully contacted with the production tail gas, and the liquid film is discharged through the rotary guide fan 6 after the full reaction is realized through the upper multi-stage spray device and the rotational flow plate to complete the dehydration.
(3) Liquid at the bottom of the absorption tower 2 after reaction is led into the waste liquid recovery box 3 through the pressure pump, waste liquid recovery is realized through the spray pump 21 and the spray header 22, real-time PH detection is realized in the waste liquid recovery box 3, if the waste liquid in the waste liquid recovery box 3 tends to be neutral, the third stop valve 18 and the pressure pump 19 are closed, and the liquid is led into the liquid inlet pipe 23 through the external liquid soap.
(4) After the dust collecting device 1 works for a certain time, stopping the air intake of the production tail gas, closing the second stop valve 12, opening the first stop valve 11 and the pressure pump 19, blowing down the dust particles on the dust collecting bag 8, shaking off the dust particles through the ultrasonic dust collector 13, discharging the dust particles from a slag discharge port at the bottom of the dust collecting device 1, and opening the rotary dredging fan 10 to dredge and discharge dust in time after blockage occurs.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the spirit and scope of the invention.
Claims (9)
1. The utility model provides a tail gas processing system in production of electronic grade polycrystalline silicon, a serial communication port, including dust collecting device, absorption tower and waste liquid recovery case, dust collecting device's top exhaust port department is provided with the blowback air pump, dust collecting device's lateral wall air inlet external connection has venturi, dust collecting device's bottom scum outlet is provided with the rotary valve, dust collecting device's top exhaust port and the air inlet intercommunication of absorption tower below, the exhaust port department at absorption tower top is provided with rotatory guide fan, the mouth that catchments and the waste liquid recovery case intercommunication of absorption tower bottom, the waste liquid recovery case top is through multistage spray set and the inside intercommunication of absorption tower.
2. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: the dust collecting device is characterized in that a plurality of groups of dust collecting pipes are arranged in the top exhaust port of the dust collecting device, a dust collecting bag is fixedly sleeved outside the dust collecting pipes through flanges, a flow baffle is arranged at the position, close to the side wall air inlet, of the top of the dust collecting device, and a rotary dredging fan is arranged above the rotary valve at the bottom slag discharge port.
3. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 2, characterized in that: the axis of rotation of rotatory dredging the fan sets up for perpendicular, the fixed arc flabellum that is provided with the symmetric distribution in the axis of rotation, two of symmetric distribution the arc flabellum is one end other end down fixed.
4. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: a first stop valve is arranged between a top exhaust port of the dust collecting device and the back-blowing air pump, and a second stop valve is arranged between the top exhaust port of the dust collecting device and an air inlet below the absorption tower.
5. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: an ultrasonic dust collector is arranged on the inner wall of the dust collecting device, and the output end of the ultrasonic dust collector is fixedly arranged at the bottom of the dust collecting pipe.
6. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: the absorption tower is internally provided with a second cyclone plate, a flow collecting conical plate, a first cyclone plate and a packing layer in sequence from bottom to bottom in the rotary guide fan, and the packing layer is arranged above an air inlet below the absorption tower.
7. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: the water collecting opening at the bottom of the absorption tower is provided with a third stop valve and a pressure pump between the water collecting opening and the waste liquid recovery tank, and the inside of the waste liquid recovery tank is provided with a PH tester.
8. The tail gas treatment system in the production of electronic grade polycrystalline silicon according to claim 1, characterized in that: the multistage spraying device comprises at least three groups of spraying pumps, a spraying head and a liquid inlet pipe, the spraying head is communicated with the spraying pumps and a waste liquid recovery box through the liquid inlet pipe, the spraying head is respectively arranged between the rotary guide fan and the second spiral-flow plate, between the flow collecting conical plate and the first spiral-flow plate and between the first spiral-flow plate and the packing layer, a fourth stop valve is arranged at the main end of the liquid inlet pipe, and the output end of the spraying head is upwards arranged.
9. A tail gas treatment method in electronic grade polycrystalline silicon production is characterized by comprising the following steps: the method comprises the following steps:
(1) firstly, closing the first stop valve and the fourth stop valve, opening the other stop valves, introducing the production tail gas into a dust collecting device through a Venturi tube, cutting off and collecting dust particles in the production tail gas through a dust collecting bag, and introducing the dust particles into an absorption tower through a top exhaust port of the dust collecting device;
(2) the production tail gas enters the absorption tower and then passes through the filler layer, the filler layer is contacted with the treatment liquid on the upper part of the absorption tower to form a liquid film, the liquid film is fully contacted with the production tail gas, and the liquid film is discharged by the rotary guide fan after the full reaction is realized by the upper multistage spray pipe and the rotational flow plate to complete dehydration;
(3) liquid at the bottom of the absorption tower after reaction is guided into a waste liquid recovery box through a pressure pump, waste liquid recovery is realized through a spray pump and a spray head, real-time PH detection is realized in the waste liquid recovery box, if the waste liquid in the waste liquid recovery box tends to be neutral, a third stop valve and the pressure pump are closed, and the liquid is guided into a liquid inlet pipe through external liquid soap;
(4) after the dust collecting device works for a certain time, stopping the air intake of the production tail gas, closing the second stop valve, opening the first stop valve and the pressure pump, blowing down the dust particles on the dust collecting bag, shaking off the dust particles through the ultrasonic dust collector, discharging the dust particles from a slag discharge port at the bottom of the dust collecting device, and opening the rotary dredging fan to dredge and discharge dust in time after the dust collecting device is blocked.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111232132.3A CN113797661A (en) | 2021-10-22 | 2021-10-22 | Tail gas treatment system and method in electronic grade polycrystalline silicon production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111232132.3A CN113797661A (en) | 2021-10-22 | 2021-10-22 | Tail gas treatment system and method in electronic grade polycrystalline silicon production |
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| Publication Number | Publication Date |
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| CN113797661A true CN113797661A (en) | 2021-12-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202111232132.3A Pending CN113797661A (en) | 2021-10-22 | 2021-10-22 | Tail gas treatment system and method in electronic grade polycrystalline silicon production |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116889776A (en) * | 2023-07-14 | 2023-10-17 | 营口市中日友协环保节能设备有限责任公司 | Wet dust removal recovery system and equipment and method thereof |
| CN116889776B (en) * | 2023-07-14 | 2024-05-10 | 营口市中日友协环保节能设备有限责任公司 | Wet dust removal recovery system and equipment and method thereof |
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| US5250267A (en) * | 1992-06-24 | 1993-10-05 | The Babcock & Wilcox Company | Particulate collection device with integral wet scrubber |
| CN108404629A (en) * | 2018-02-01 | 2018-08-17 | 高博集团有限公司 | A kind of filter case phosphatization exhaust treatment system |
| CN209576148U (en) * | 2019-01-03 | 2019-11-05 | 西安丹辉环保科技有限公司 | Dust-laden exhaust gas processing system |
| CN212188425U (en) * | 2020-04-29 | 2020-12-22 | 宁夏福泰硅业有限公司新材料分公司 | Gaseous phase white carbon black tail gas processing system |
| CN212236674U (en) * | 2020-05-19 | 2020-12-29 | 清远市中源环保科技有限公司 | Boiler waste gas's processing apparatus |
| CN213160196U (en) * | 2020-02-06 | 2021-05-11 | 中国恩菲工程技术有限公司 | System for handle dusty tail gas |
-
2021
- 2021-10-22 CN CN202111232132.3A patent/CN113797661A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US5250267A (en) * | 1992-06-24 | 1993-10-05 | The Babcock & Wilcox Company | Particulate collection device with integral wet scrubber |
| CN108404629A (en) * | 2018-02-01 | 2018-08-17 | 高博集团有限公司 | A kind of filter case phosphatization exhaust treatment system |
| CN209576148U (en) * | 2019-01-03 | 2019-11-05 | 西安丹辉环保科技有限公司 | Dust-laden exhaust gas processing system |
| CN213160196U (en) * | 2020-02-06 | 2021-05-11 | 中国恩菲工程技术有限公司 | System for handle dusty tail gas |
| CN212188425U (en) * | 2020-04-29 | 2020-12-22 | 宁夏福泰硅业有限公司新材料分公司 | Gaseous phase white carbon black tail gas processing system |
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| CN116889776A (en) * | 2023-07-14 | 2023-10-17 | 营口市中日友协环保节能设备有限责任公司 | Wet dust removal recovery system and equipment and method thereof |
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Application publication date: 20211217 |
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| RJ01 | Rejection of invention patent application after publication |