CN113766755A - Selective rapid differential etching process for printed circuit - Google Patents

Selective rapid differential etching process for printed circuit Download PDF

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Publication number
CN113766755A
CN113766755A CN202110848674.7A CN202110848674A CN113766755A CN 113766755 A CN113766755 A CN 113766755A CN 202110848674 A CN202110848674 A CN 202110848674A CN 113766755 A CN113766755 A CN 113766755A
Authority
CN
China
Prior art keywords
circuits
differential etching
etching process
printed circuit
imidazole derivatives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110848674.7A
Other languages
Chinese (zh)
Inventor
文泽生
王泉勇
周国云
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ganzhou Shenlian Circuit Co ltd
Original Assignee
Ganzhou Shenlian Circuit Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ganzhou Shenlian Circuit Co ltd filed Critical Ganzhou Shenlian Circuit Co ltd
Priority to CN202110848674.7A priority Critical patent/CN113766755A/en
Publication of CN113766755A publication Critical patent/CN113766755A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067Etchants

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The invention discloses a selective rapid differential etching process for printed circuits, wherein a corrosion inhibitor is added into differential etching solution, the corrosion inhibitor is imidazole derivatives, the imidazole derivatives act on electroplated thickened circuits, and protective agents, namely the imidazole derivatives can be adsorbed at the sharp corners of the circuits to well protect the circuits, so that the circuits are prevented from being over-etched. The minimum line width/line distance of the printed circuit is 50 mu m/50 mu m, and the etching factor exceeds 4.

Description

Selective rapid differential etching process for printed circuit
Technical Field
The invention belongs to the field of circuit board preparation, and particularly belongs to a selective rapid differential etching process for a printed circuit.
Background
The miniaturization, the light weight and the high density of the multifunctional printed circuit of the electronic product can not be separated, the high density of the circuit is realized, and meanwhile, the circuit has higher circuit thickness, and the method is an important scheme for solving the transmission of the large circuit. The differential etching method for manufacturing fine circuits is a solution which is commonly used in the industry, and the technical process of the differential method is as follows: copper clad laminate pattern transfer making circuit negative direction → electroplating thickening circuit → removing negative direction dry film → differential etching. In the differential etching process, the thin circuit and the thickened circuit are etched by spraying external pressure, and the etching amount of the thickened circuit is larger. For this reason, it is desirable to develop a selective, fast differential etch technique.
Disclosure of Invention
(1) Technical problem to be solved
In view of the deficiencies of the prior art, it is an object of the present invention to provide a selective fast differential etching process for printed circuits.
(2) Technical scheme
In order to solve the technical problem, the invention provides a selective rapid differential etching process for a printed circuit, wherein a corrosion inhibitor is added into a differential etching solution, the corrosion inhibitor is an imidazole derivative, the imidazole derivative acts on a circuit which is thickened by electroplating, and a protective agent, namely the imidazole derivative can be adsorbed at the sharp corner of the circuit to well protect the circuit, so that the circuit is prevented from being over-etched.
(3) Advantageous effects
Compared with the prior art, the invention has the beneficial effects that: the minimum line width/line distance of the printed circuit is 50 mu m/50 mu m, and the etching factor exceeds 4.
Detailed Description
In order to make the technical means, the original characteristics, the achieved purposes and the effects of the invention easily understood and obvious, the technical solutions in the embodiments of the present invention are clearly and completely described below to further illustrate the invention, and obviously, the described embodiments are only a part of the embodiments of the present invention, but not all the embodiments.
Example 1
A selective rapid differential etching process for printed circuits is characterized in that a corrosion inhibitor is added into differential etching solution, the corrosion inhibitor is an imidazole derivative, the imidazole derivative acts on electroplated and thickened circuits, and a protective agent, namely the imidazole derivative can be adsorbed at the sharp corners of the circuits to well protect the circuits, so that the circuits are prevented from being over-etched. The minimum line width/line distance of the printed circuit is 50 mu m/50 mu m, and the etching factor exceeds 4.
Having thus described the principal technical features and basic principles of the invention, and the advantages associated therewith, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.
Furthermore, it should be understood that although the present description is described in terms of various embodiments, not every embodiment includes only a single embodiment, and such descriptions are provided for clarity only, and those skilled in the art will recognize that the embodiments described herein can be combined as a whole to form other embodiments as would be understood by those skilled in the art.

Claims (1)

1. A selective rapid differential etching process for printed circuits is characterized in that a corrosion inhibitor is added into differential etching solution, the corrosion inhibitor is imidazole derivatives, the imidazole derivatives act on electroplated and thickened circuits, and protective agents, namely the imidazole derivatives can be adsorbed at the sharp corners of the circuits to well protect the circuits, so that the circuits are prevented from being over-etched.
CN202110848674.7A 2021-07-26 2021-07-26 Selective rapid differential etching process for printed circuit Pending CN113766755A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110848674.7A CN113766755A (en) 2021-07-26 2021-07-26 Selective rapid differential etching process for printed circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110848674.7A CN113766755A (en) 2021-07-26 2021-07-26 Selective rapid differential etching process for printed circuit

Publications (1)

Publication Number Publication Date
CN113766755A true CN113766755A (en) 2021-12-07

Family

ID=78787984

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110848674.7A Pending CN113766755A (en) 2021-07-26 2021-07-26 Selective rapid differential etching process for printed circuit

Country Status (1)

Country Link
CN (1) CN113766755A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006013307A (en) * 2004-06-29 2006-01-12 Ebara Densan Ltd Circuit formation etchant for subtractive method
CN104562013A (en) * 2014-07-04 2015-04-29 广东丹邦科技有限公司 Copper etching solution and method for manufacturing printed circuit board
CN105957809A (en) * 2016-06-06 2016-09-21 浙江振有电子股份有限公司 HDI plate quick etching combined additive
CN110913596A (en) * 2019-12-10 2020-03-24 深圳市板明科技有限公司 Copper-reducing microetching agent and preparation method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006013307A (en) * 2004-06-29 2006-01-12 Ebara Densan Ltd Circuit formation etchant for subtractive method
CN104562013A (en) * 2014-07-04 2015-04-29 广东丹邦科技有限公司 Copper etching solution and method for manufacturing printed circuit board
CN105957809A (en) * 2016-06-06 2016-09-21 浙江振有电子股份有限公司 HDI plate quick etching combined additive
CN110913596A (en) * 2019-12-10 2020-03-24 深圳市板明科技有限公司 Copper-reducing microetching agent and preparation method thereof

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Application publication date: 20211207