CN113755041A - Anti-reflection liquid for photovoltaic module glass and preparation method and application thereof - Google Patents
Anti-reflection liquid for photovoltaic module glass and preparation method and application thereof Download PDFInfo
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Abstract
The invention relates to an anti-reflection liquid for photovoltaic module glass, a preparation method and application thereof, wherein the preparation method comprises the steps of adding acid liquor into lower alcohol, adjusting the pH value of the solution to 1-2, slowly dropwise adding organic siloxane under stirring, reacting, standing to enable the pH value of the solution to be 2-4, and obtaining nano-scale acidic silica sol; taking a certain amount of silica sol, adding water, a water-soluble organic solvent and a hardening agent, adjusting the pH to 9-10, adding a hydrophilic or hydrophobic surfactant for hydrophilic or hydrophobic modification, uniformly stirring, and standing for a period of time; and adjusting the pH value to 3-4 to obtain the anti-reflection liquid for the photovoltaic module glass, which can be self-dried at normal temperature, has good adhesiveness, long-acting self-cleaning and anti-fouling effects and high visible light transmittance, has a water contact angle of less than 7 degrees or more than 120 degrees, has excellent self-cleaning performance, can be applied to the surface of the photovoltaic module glass, can resist fouling for a long time, can improve the generated energy of the photovoltaic module, and can reduce the cleaning and maintenance cost.
Description
Technical Field
The invention belongs to the technical field of synthesis of nano materials, and particularly relates to an anti-reflection liquid for photovoltaic module glass, and a preparation method and application thereof.
Background
As traditional fossil energy sources are gradually depleted, solar energy is considered to be one of the most promising clean energy sources to replace traditional fossil energy sources. The photovoltaic solar cell (referred to as photovoltaic cell for short) can convert the direct radiation energy of the sun, and can utilize the diffusion energy of the sunlight with the same conversion efficiency, can be used in any place with the sunlight, is not limited by regions, and has attracted attention and developed rapidly in commercialization and academic research in recent years.
Solar electromagnetic radiation energy passes through many intermediate surfaces, either transmitted or reflected at interfaces, before entering the power generation system to become available energy. For a photovoltaic solar cell module (photovoltaic module for short), when light enters the photovoltaic module from the air, the first surface encountered is photovoltaic packaging glass, a packaging polymer film or a condensing lens in a condensing photovoltaic cell. The antireflection film is prepared on the intermediate surfaces, so that the surface reflection can be effectively reduced, more light is transmitted into the solar power generation system, and the antireflection film plays an important role in improving the power generation efficiency of the solar power generation system. However, since the service environment of the photovoltaic cell is complex and severe, for a ground photovoltaic power station, the antireflection film as the outermost layer of the photovoltaic module usually needs to withstand severe environmental conditions such as rain, snow, sunlight, environmental pollutants, and sand and dust in arid desert regions, and thus the complex and severe outdoor environment provides a severe test for the application of the antireflection film in the photovoltaic cell. The single antireflection function can not meet the long-term outdoor use requirement of the photovoltaic cell, and multifunctional modification such as moisture prevention, self-cleaning, antifogging, anti-icing, dust prevention and anti-fouling is carried out on the antireflection film aiming at different use environments, so that the antireflection film becomes a hot spot in the research field of the existing antireflection film.
Solar cell panel mainly relies on shining of sunlight to turn into the electric energy with light energy, and consequently the cleanness on solar cell panel surface does not have and shelters from crucial, but current solar cell panel, as the application number: CN202011538579.9 discloses a liquid for decreasing reflection and increasing permeability for repairing photovoltaic module glass and a preparation method thereof, the self-cleaning performance is poor, after a period of use, dust and bird droppings and the like are easily attached to the surface, and manual cleaning is often needed, and too frequent manual cleaning not only increases the maintenance cost, but also easily scratches the surface of the solar cell panel, so that the light transmittance is reduced, and after manual cleaning, dust can also be attached immediately, thereby affecting the power generation efficiency.
Disclosure of Invention
One of the purposes of the invention is to overcome the defects of the prior art and provide a preparation method of a permeability-increasing liquid for photovoltaic module glass so as to prepare the permeability-increasing liquid for photovoltaic module glass, which can be self-dried at normal temperature, has good adhesiveness, good long-acting self-cleaning performance and high light transmittance.
The invention also aims to overcome the defects of the prior art and provide an anti-reflection liquid for photovoltaic module glass, which is a high-light-transmission inorganic nano silica sol modified by a functional organic ligand, and the organic ligand enables the anti-reflection liquid to have excellent super-hydrophilic or super-hydrophobic performance, so that the anti-reflection liquid has excellent long-acting self-cleaning performance and high light transmittance.
The invention aims to overcome the defects of the prior art and provide application of the anti-reflection liquid for the photovoltaic module glass to the surface of the photovoltaic module glass.
Based on the above, the invention discloses a preparation method of an anti-reflection liquid for photovoltaic module glass, which comprises the following steps:
adding acid liquor into lower alcohol, adjusting the pH value of the solution to 1-2, slowly dropwise adding organic siloxane under stirring, reacting at constant temperature, standing to enable the pH value of the solution to be 2-4, and obtaining nano-scale acidic silica sol;
taking a certain amount of the silica sol obtained in the first step, adding water, a water-soluble organic solvent and a hardening agent, adjusting the pH value of the solution to 9-10, adding a hydrophilic surfactant or a hydrophobic surfactant to perform hydrophilic or hydrophobic modification on the surface of the silica sol, uniformly stirring, and standing for a period of time to obtain a modified mixed solution;
and step three, adjusting the pH value of the mixed liquid modified in the step two to 3-4 to obtain the antireflection liquid for the photovoltaic module glass.
Preferably, in the first step, the slow dropping speed of the organic siloxane is 10-20 drops per second;
the time of the constant-temperature reaction is 1.5-3h, preferably 2h, and the temperature of the constant-temperature reaction is 28-35 ℃, preferably 30 ℃;
the standing time is 1 to 7 days, preferably two days.
Preferably, in the step one, the particle size of the silica sol is 5-30nm, preferably 15-20nm, and the particle size of the nano silica sol is adjusted by the amount of water added in the reaction process;
the acid solution is an acetic acid solution, a hydrochloric acid solution, a nitric acid solution or a sulfuric acid solution;
the lower alcohol is methanol, ethanol, butanol, n-propanol or isopropanol;
the organic siloxane is tetraethyl orthosilicate or tetrabutyl orthosilicate.
Preferably, in the second step, the hydrophobic surfactant is one or more of methyl tri (trimethylsiloxy) silane, dimethyl siloxane and methyl triethoxy silane;
or the hydrophilic surfactant is one or more of triethoxysilane and trimethoxysilane.
The hydrophilic surfactant selected is preferably a silane coupling agent having a group Si-H (e.g., triethoxysilane, trimethoxysilane) such that the group Si-H of the silane coupling agent becomes a group Si-OH under alkaline conditions to achieve hydrophilicity.
Moreover, the hydrophilic surfactant or the hydrophobic surfactant is selected as a silane coupling agent, so that on one hand, the hydrophilic surfactant or the hydrophobic surfactant can be directly bonded on the surface of the silica sol under an alkaline condition to generate hydrophilicity or hydrophobicity, and further the self-cleaning performance of the film layer is improved; on the other hand, under the alkaline condition, the hydrophilic surfactant or the hydrophobic surfactant can be hydrolyzed by itself to generate silicon dioxide with smaller particle size and hydrophilic groups Si-OH (or hydrophobic groups such as Si-CH3), so that gaps among silicon dioxide sol with larger particle size can be filled, the uniformity of the film layer is further improved, and the comprehensive performances of light transmission, adhesion, self-cleaning and the like of the film layer are further improved.
More preferably, the hydrophobic surfactant is a mixed solution of methyl tri (trimethylsiloxy) silane and methyl triethoxysilane, and the mixed mass ratio of the methyl tri (trimethylsiloxy) silane and the methyl triethoxysilane is preferably 10% -70%; or the hydrophobic surfactant is a mixed solution of dimethyl siloxane and methyl triethoxysilane, and the mixing mass ratio of the hydrophobic surfactant and the methyl triethoxysilane is preferably 10-70%.
The hydrophobic surfactant is preferably a mixed solution of two silane coupling agents. Furthermore, the inventors have found that if both silane coupling agents have a methyl group on one silicon atom (i.e., -Si-CH)3) The silane coupling agent is not enough to enable the silica sol and the anti-reflection liquid to achieve good hydrophobic performance; if both silane coupling agents have a bis-methyl group on a silicon atom (i.e., -Si- (CH)3)2) Silane coupling agent of (2) or (2) having a polymethyl group (Si- (CH) on one silicon atom3)3) Silane coupling agent silane) in the system, although the silica in the system becomes very hydrophobic, the silica does not match the surface energy of the glass, thereby deteriorating the film formation of the enhancement liquid on the glass surface. Based on this, of these two silane coupling agents selected, it is preferable that: wherein one silane coupling agent has a group-Si-CH3(i.e., methyltriethoxysilane), and another silane coupling agent has the group-Si- (CH)3)2(i.e., dimethylsiloxane); or both silane coupling agentsAmong them, preferred are: wherein one silane coupling agent has a group-Si-CH3(i.e., methyltriethoxysilane), and another silane coupling agent has the group Si- (CH)3)3The anti-reflection liquid modified by hydrophobic property has good hydrophobic property and self-cleaning property, and a compact film layer can be formed on the surface of the photovoltaic glass.
Further preferably, the hydrophilic surfactant is a mixed solution of triethoxysilane and trimethoxysilane. The hydrophilic surfactant is preferably prepared by mixing two silane coupling agents with groups Si-H (namely a mixed solution of triethoxysilane and trimethoxysilane, wherein the mixing mass ratio of the triethoxysilane to the trimethoxysilane is preferably 20-80%), so that better hydrophilic performance is achieved, and the self-cleaning performance of the hydrophilic surfactant is improved.
Preferably, in the second step, the water-soluble organic solvent is at least two of isopropanol, ethanol, n-propanol, methanol and propylene glycol methyl ether;
the hardening agent is ethyl polysilicate or methyl triethoxysilane.
Further preferably, in the second step, the volume parts of the components are as follows:
5-10 parts of silica sol, 10-20 parts of water, 4-6 parts of isopropanol, 7-17 parts of ethanol, 5-12 parts of n-propanol, 30-50 parts of methanol, 5-12 parts of propylene glycol methyl ether and 0.1-0.5 part of hardening agent; the hydrophilic surfactant or the hydrophobic surfactant accounts for 0.05-0.5% of the total amount of the solution.
Preferably, in the second step, the standing time is 10-15h, and the pH of the solution is adjusted to 9-10 by adopting a methanol solution of ammonia water;
in the third step, the pH value of the mixed solution is adjusted to 3-4 by adopting a methanol solution of nitric acid.
The invention also discloses an antireflection liquid for the photovoltaic module glass, which is prepared by adopting the preparation method of the antireflection liquid for the photovoltaic module glass.
The invention also discloses an application of the anti-reflection liquid for the photovoltaic module glass, and the anti-reflection liquid for the photovoltaic module glass is coated on the surface of the photovoltaic module glass and is cured at normal temperature to form a film layer below 500 nm.
After the anti-reflection liquid is coated on the surface of the photovoltaic module glass in a spraying, rolling or smearing construction mode, a film layer can be formed by curing in a normal-temperature self-drying mode, and the film layer is an ultrathin film layer with the thickness of below 500nm, so that a damaged film on the surface of the photovoltaic module glass can be repaired, the cured ultrathin film layer has high transmittance in the wavelength range of 400 plus 1100nm, the surface of the film layer has a smaller water contact angle or a larger water contact angle, static electricity generated on the surface of a glass substrate can be inhibited, stains are not easy to attach to the glass substrate, the surface of the photovoltaic module has self-cleaning and anti-fouling performances, high light transmittance of the surface of the photovoltaic module can be ensured for a long time, and the generated energy of the photovoltaic module is improved.
Compared with the prior art, the invention at least comprises the following beneficial effects:
the preparation method is characterized in that nano-scale acidic (pH is 2-4) silica sol is synthesized under the acidic (pH is 1-2) condition, compared with alkaline silica, the acidic silica sol has a compact structure and can increase the adhesive property with glass, the nano-scale silica sol has a low refractive index, a high-light-transmission film layer can be formed after the liquid-permeable liquid is solidified, the nano-scale silica sol has uniform particle size, the film layer can be flat and compact, and the comprehensive properties of light transmission, adhesion, self-cleaning and the like of the film layer can be improved; mixing the silica sol with water, a water-soluble organic solvent and a hardening agent to form more hydrogen bonds on the surface of the silica sol, so that the cured film layer is more compact; then the mixed solution is adjusted to be alkaline (namely the pH is 9-10), so that under the alkaline condition, the hydrophilic surfactant or the hydrophobic surfactant can fully exert the hydrophilic or hydrophobic modification effect on the surface of the silica sol, and the self-cleaning performance of the silica sol is improved; and finally, adjusting the pH value to be acidic (namely 3-4) to obtain an acidic anti-reflection liquid, which can enhance the film-forming compactness and the adhesion performance of the anti-reflection liquid on the glass surface.
In conclusion, the anti-reflection liquid prepared by the preparation method can form a smooth and compact film layer through normal-temperature self-drying, the film layer has good adhesion performance with the surface of the photovoltaic glass, the film layer has high light transmittance and excellent self-cleaning performance, so that the long-acting anti-fouling performance can be achieved, the good anti-reflection effect can be maintained for a long time, the power generation capacity of the photovoltaic module is improved, and the cleaning and maintenance cost of the photovoltaic module can be greatly reduced.
The light transmittance of the glass can be improved by more than 2% by the film layer of the obtained anti-reflection liquid for the photovoltaic module glass within the wavelength range of 400-1100nm, the film layer can keep the anti-fouling performance of the photovoltaic module for a long time, and compared with the photovoltaic module without a film coating, after the film layer is formed on the surface of the photovoltaic module glass by adopting the anti-reflection liquid, the generated energy gain of the photovoltaic module with the film coating is more than 2.27%.
Drawings
FIG. 1 is a TEM image of the nano-sized acidic silica sol synthesized in example 2.
Figure 2 is a schematic view of the structure of the glass surface after application of the antireflection liquid-permeable coating.
FIG. 3 is a graph of light transmission data for glass before and after the antireflective solutions of examples 1-2 and comparative example 1 were spray coated on the glass surface of a photovoltaic module.
FIG. 4 is a graph of water contact angle data for antireflective solutions of examples 1-2 and comparative example 1 after forming a film on a glass surface of a photovoltaic module.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
Example 1
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 320g of absolute ethyl alcohol into a reactor, slowly dropwise adding 4.8mL of hydrochloric acid solution into isopropanol, adding 20mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 30 ℃, slowly dropwise adding 90mL of tetraethyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 2h under stirring, and standing for 2 days with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 15mL of water, 6mL of isopropanol, 17mL of absolute ethyl alcohol, 12mL of n-propanol, 30mL of methanol, 10mL of propylene glycol methyl ether and 0.5mL of ethyl polysilicate into 10mL of silicon dioxide sol, adjusting the pH to 9, adding a mixed solution (the mass ratio is 1: 1) of triethoxysilane and trimethoxysilane accounting for 0.5% of the total amount of the solution as a hydrophilic surfactant, uniformly stirring, and standing for 12 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 4 to obtain the anti-reflection solution for the photovoltaic module glass.
Example 2
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 480g of n-propanol into a reactor, slowly dropwise adding 5.2mL of nitric acid solution into isopropanol, adding 25mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 30 ℃, slowly dropwise adding 90mL of tetraethyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 2h under stirring, and standing for 2 days with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 10mL of water, 6mL of isopropanol, 10mL of absolute ethyl alcohol, 12mL of n-propanol, 50mL of methanol, 10mL of propylene glycol methyl ether and 0.5mL of ethyl polysilicate into 8mL of silicon dioxide sol, adjusting the pH to 10, adding a mixed solution (the mass ratio is 3:2) of methyl tris (trimethylsiloxy) silane and methyl triethoxysilane accounting for 0.3% of the total solution as a hydrophobic surfactant, uniformly stirring, and standing for 12 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 3 to obtain the anti-reflection solution for the photovoltaic module glass.
Example 3
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 320g of methanol into a reactor, slowly dropwise adding 4.8mL of acetic acid solution into isopropanol, adding 20mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 35 ℃, slowly dropwise adding 90mL of tetraethyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 1.5h under stirring, and standing for 4 days with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 15mL of water, 6mL of isopropanol, 15mL of absolute ethyl alcohol, 8mL of n-propanol, 35mL of methanol, 12mL of propylene glycol methyl ether and 0.5mL of ethyl polysilicate into 10mL of silicon dioxide sol, adjusting the pH to 9, adding a mixed solution (the mass ratio is 2: 1) of triethoxysilane and trimethoxysilane accounting for 0.5% of the total amount of the solution as a hydrophilic surfactant, uniformly stirring, and standing for 12 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 4 to obtain the anti-reflection solution for the photovoltaic module glass.
Example 4
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 480g of anhydrous butanol into a reactor, slowly dropwise adding 5.5mL of sulfuric acid solution into isopropanol, adding 15mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 28 ℃, slowly dropwise adding 82mL of tetraethyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 3 hours under stirring, and standing for 7 days with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 15mL of water, 6mL of isopropanol, 17mL of absolute ethyl alcohol, 10mL of n-propanol, 30mL of methanol, 10mL of propylene glycol methyl ether and 0.5mL of methyl triethoxysilane into 10mL of silicon dioxide sol, adjusting the pH to 10, adding a mixed solution (the mass ratio is 1: 1) of dimethyl siloxane or methyl triethoxysilane accounting for 0.5% of the total amount of the solution as a hydrophobic surfactant, uniformly stirring, and standing for 10 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 4 to obtain the anti-reflection solution for the photovoltaic module glass.
Example 5
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 320g of absolute ethyl alcohol into a reactor, slowly dropwise adding 4.8mL of acetic acid solution into isopropanol, adding 20mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 30 ℃, slowly dropwise adding 90mL of tetrabutyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 2h under stirring, and standing for 1 day with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 10mL of water, 4mL of isopropanol, 7mL of absolute ethyl alcohol, 5mL of n-propanol, 30mL of methanol, 5mL of propylene glycol methyl ether and 0.1mL of ethyl polysilicate into 5mL of silicon dioxide sol, adjusting the pH to 9, adding a mixed solution (the mass ratio is 1: 1) of triethoxysilane and trimethoxysilane accounting for 0.05% of the total amount of the solution as a hydrophilic surfactant, uniformly stirring, and standing for 15 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 4 to obtain the anti-reflection solution for the photovoltaic module glass.
Example 6
The preparation method of the anti-reflection liquid for the photovoltaic module glass comprises the following steps:
step one, adding 480g of absolute ethyl alcohol into a reactor, slowly dropwise adding 5.5mL of hydrochloric acid solution into isopropanol, adding 15mL of ultrapure water, uniformly stirring to obtain a solution with the pH of 1-2, controlling the temperature of the solution to be 32 ℃, slowly dropwise adding 82mL of tetraethyl orthosilicate by using a dropping funnel under stirring, controlling the dropwise adding speed to be 10-20 drops per second, after the dropwise adding is finished, reacting at constant temperature for 2h under stirring, and standing for 2 days with an open mouth to ensure that the pH of the solution is 2-4 to obtain the nanoscale acidic silica sol.
And step two, adding 15mL of water, 5mL of isopropanol, 15mL of absolute ethyl alcohol, 12mL of n-propanol, 40mL of methanol, 10mL of propylene glycol methyl ether and 0.35mL of methyltriethoxysilane into 7mL of silica sol, adjusting the pH to 10, adding a mixed solution (the mass ratio is 2: 3) of methyltri (trimethylsiloxy) silane and methyltriethoxysilane accounting for 0.2% of the solution as a hydrophobic surfactant, uniformly stirring, and standing for 13 hours to obtain a mixed solution.
And step three, adjusting the pH of the mixed solution to 3 to obtain the anti-reflection solution for the photovoltaic module glass.
Comparative example 1
The preparation method of an anti-reflection liquid of the comparative example is basically the same as that of example 1, and the difference is only that: in the method for producing the liquid-permeable material of the present comparative example, the surfactant triethoxysilane was not added to the solution of the second step, and the liquid-permeable material of the present comparative example was obtained.
Performance testing
1. The nano-sized acidic silica sol synthesized in example 2 was subjected to TEM test, and the test results are shown in fig. 1.
As can be seen from FIG. 1, the silica sol has a particle size of 15 to 20 nm; referring to fig. 2, the invention uses the acidic silica sol with uniform particle size, so that the cured film layer is more uniform and compact, and further the light transmission, adhesion and self-cleaning performance of the film layer are further improved.
2. The antireflection solutions of examples 1 and 2 are respectively sprayed on the surface of the photovoltaic module glass, and the photovoltaic module glass is self-dried at normal temperature to form a film layer with the thickness of below 500nm, as shown in fig. 2, the light transmittance and the water contact angle of the film layer are tested, and the test results are shown in table 1 and fig. 3 to 4.
As can be seen from Table 1 and FIG. 3, the transmittance of the anti-reflection liquid of examples 1-2 in the wavelength range of 400-1100nm is improved by at least 2% compared with that of the glass blank group.
Referring to table 1 and fig. 4, the liquid-permeable membrane layers of examples 1 and 2 had water contact angles of 5 ° and 123 °, respectively, and the water contact angle of comparative example 1 was 34 °; as can be seen, the film has a small water contact angle and super-hydrophilic capability in the embodiment 1, and has super-hydrophobic capability in the embodiment 2, and both the film and the film can ensure that the dirt is not easy to attach to the surface of the glass substrate, so that the film has an excellent long-acting self-cleaning and anti-fouling function.
TABLE 1 light transmittance and Water contact Angle data for antireflective liquid film layers of examples 1-6 and comparative example 1
In Table 1, the room temperature is 25 ℃.
3. The anti-reflection liquid of the embodiment 1 and the anti-reflection liquid of the embodiment 2 are respectively sprayed on the surface of the photovoltaic module glass, and the film layer with the thickness of below 500nm is formed by self-drying at normal temperature, see table 2, and then the power generation amount data of the photovoltaic module is collected.
TABLE 2 generated energy data of photovoltaic modules
Table 2 is collected data of the power generation amounts of the inverters of the 4 photovoltaic modules in the 12-month 10-12-month 20-day group. And in 12 months and 21 days, respectively cleaning or spraying film layers on 4 groups of photovoltaic modules, wherein 6-5 photovoltaic modules are not treated, 6-6 photovoltaic modules are only cleaned without coating the film layers, 6-7 photovoltaic modules are sprayed with the liquid increasing agent of the example 2 to form the film layers, and 6-8 photovoltaic modules are sprayed with the liquid increasing agent of the example 1 to form the film layers. And then collecting the power generation data from 12 months and 22 days to 5 months and 20 days in the next year.
As can be seen from Table 2, after the photovoltaic modules 6-7 and 6-8 are constructed, the power generation gain of the photovoltaic modules is more than 2.27%.
While preferred embodiments of the present invention have been described, additional variations and modifications of these embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the embodiments of the invention.
The technical solutions provided by the present invention are described in detail above, and the principle and the implementation of the present invention are explained in this document by applying specific examples, and the descriptions of the above examples are only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. The preparation method of the anti-reflection liquid for the photovoltaic module glass is characterized by comprising the following steps of:
adding acid liquor into lower alcohol, adjusting the pH value of the solution to 1-2, slowly dropwise adding organic siloxane under stirring, reacting at constant temperature, standing to enable the pH value of the solution to be 2-4, and obtaining nano-scale acidic silica sol;
taking a certain amount of the silica sol obtained in the first step, adding water, a water-soluble organic solvent and a hardening agent, adjusting the pH value of the solution to 9-10, adding a hydrophilic surfactant or a hydrophobic surfactant to perform hydrophilic or hydrophobic modification on the surface of the silica sol, uniformly stirring, and standing for a period of time to obtain a modified mixed solution;
and step three, adjusting the pH value of the mixed liquid modified in the step two to 3-4 to obtain the antireflection liquid for the photovoltaic module glass.
2. The method for preparing the antireflection solution for the glass of the photovoltaic module according to claim 1, wherein in the first step, the organic siloxane is slowly dropped at a speed of 10 to 20 drops per second;
the constant temperature reaction time is 1.5-3h, and the temperature is 28-35 ℃;
the standing time is 1-7 days.
3. The preparation method of the antireflection solution for photovoltaic module glass according to claim 1 or 2, wherein in the first step, the particle size of the silica sol is 5-30 nm;
the acid solution is an acetic acid solution, a hydrochloric acid solution, a nitric acid solution or a sulfuric acid solution;
the lower alcohol is methanol, ethanol, butanol, n-propanol or isopropanol;
the organic siloxane is tetraethyl orthosilicate or tetrabutyl orthosilicate.
4. The method for preparing the antireflection solution for the glass of the photovoltaic module according to claim 1, wherein in the second step, the hydrophobic surfactant is one or more of methyl tris (trimethylsiloxy) silane, dimethyl siloxane and methyl triethoxysilane;
or the hydrophilic surfactant is one or more of triethoxysilane and trimethoxysilane.
5. The method for preparing the antireflection solution for the glass of the photovoltaic module according to claim 4, wherein the hydrophobic surfactant is a mixed solution of methyltris (trimethylsiloxy) silane and methyltriethoxysilane, or a mixed solution of dimethylsiloxane and methyltriethoxysilane;
or the hydrophilic surfactant is a mixed solution of triethoxysilane and trimethoxysilane.
6. The method for preparing the antireflection solution for the glass of the photovoltaic module according to claim 1, wherein in the second step, the water-soluble organic solvent is at least two of isopropanol, ethanol, n-propanol, methanol and propylene glycol methyl ether;
the hardening agent is ethyl polysilicate or methyl triethoxysilane.
7. The preparation method of the antireflection liquid for photovoltaic module glass according to claim 6, wherein in the second step, the volume parts of the components are as follows:
5-10 parts of silica sol, 10-20 parts of water, 4-6 parts of isopropanol, 7-17 parts of ethanol, 5-12 parts of n-propanol, 30-50 parts of methanol, 5-12 parts of propylene glycol methyl ether and 0.1-0.5 part of hardening agent; the hydrophilic surfactant or the hydrophobic surfactant accounts for 0.05-0.5% of the total amount of the solution.
8. The preparation method of the antireflection solution for photovoltaic module glass according to claim 1, wherein in the second step, the standing time is 10-15 hours, and the pH of the solution is adjusted to 9-10 by using a methanol solution of ammonia water;
in the third step, the pH value of the mixed solution is adjusted to 3-4 by adopting a methanol solution of nitric acid.
9. An antireflection liquid for photovoltaic module glass, characterized by being prepared by the method for preparing the antireflection liquid for photovoltaic module glass according to any one of claims 1 to 8.
10. The application of the antireflection liquid for the photovoltaic module glass is characterized in that the antireflection liquid for the photovoltaic module glass according to claim 9 is coated on the surface of the photovoltaic module glass, and a film layer with the thickness of less than 500nm is formed after the antireflection liquid is cured at normal temperature.
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| CN103524048A (en) * | 2013-09-29 | 2014-01-22 | 南通汉瑞实业有限公司 | Preparation method of multi-layer SiO2 inorganic anti-reflection film |
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| CN110002767A (en) * | 2019-04-28 | 2019-07-12 | 湖南邦弗特新材料技术有限公司 | A kind of preparation method of the hydrophobic film of high transparency for photovoltaic glass |
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| CN103524048A (en) * | 2013-09-29 | 2014-01-22 | 南通汉瑞实业有限公司 | Preparation method of multi-layer SiO2 inorganic anti-reflection film |
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