CN113732512A - Method and device for manufacturing anti-reflection material - Google Patents
Method and device for manufacturing anti-reflection material Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/355—Texturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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Abstract
The invention provides a method and a device for manufacturing an anti-reflection material. The manufacturing method of the anti-reflection material comprises the following steps: firstly, providing a material to be treated with the surface roughness lower than 0.1; then, carrying out first-stage laser processing treatment on the surface of the material to be treated to form a periodic micron structure on the surface of the material to be treated; and finally, carrying out second-stage laser processing on the material to be processed after the first-stage laser processing so as to form a periodic micro-nano structure on the surface of the material to be processed. According to the invention, the periodic micro-nano structure is obtained through two stages of laser processing, so that light rays in a wide spectrum wave band can be effectively absorbed, the reflectivity of the surface of the material is reduced, the anti-reflection performance of the material is enhanced, the manufacturing process is simple, and the environment is not polluted.
Description
Technical Field
The invention relates to the technical field of laser processing, in particular to a method and a device for manufacturing an anti-reflection material.
Background
The wide-spectrum (wavelength range 400-9000nm) high-absorptivity material is widely applied to the fields of aircraft manufacturing, aerospace and the like due to high absorptivity of the material to an infrared band.
At present, the methods for increasing the absorption rate of the material surface in the wide spectral band range are mainly the traditional physical and chemical methods, such as chemical corrosion, mechanical grooving and reactive ion etching (RI E), wherein the chemical corrosion can pollute the environment, the mechanical grooving and the reactive ion etching (RI E) can damage the titanium alloy surface, the manufacturing process is complex, and the absorption rate of the anti-reflection material is not high enough.
Disclosure of Invention
Based on the above-mentioned deficiencies in the prior art, the present invention provides a method and an apparatus for manufacturing an anti-reflective material, which can simplify the manufacturing process of the anti-reflective material and further improve the absorption rate of the anti-reflective material in a wide spectral band.
In order to achieve the above object, the present invention provides a method for manufacturing an antireflection material, comprising:
providing a material to be treated with a surface roughness of less than 0.1;
carrying out first-stage laser processing on the surface of the material to be processed to form a periodic micron structure on the surface of the material to be processed;
and carrying out second-stage laser processing on the material to be processed after the first-stage laser processing so as to form a periodic micro-nano structure on the surface of the material to be processed.
Optionally, the step of performing a first stage laser processing treatment on the surface of the material to be treated comprises:
performing laser processing treatment on the surface of the polished material to be treated for 100 to 300 times by low-power laser at a high scanning speed; the low-power laser is a laser with a power value smaller than a power threshold, and the high scanning speed is a scanning speed value larger than a scanning speed threshold.
Optionally, the power value of the low-power laser is 0.5W to 1W, the high scanning speed is 1000mm/s to 2000mm/s, and the line spacing of the laser scanning is 10um to 20 um.
Optionally, the step of performing a second-stage laser processing on the material to be processed after the first-stage laser processing includes:
carrying out laser processing on the material to be processed after the first-stage laser processing by high-power laser at a low scanning speed; the high-power laser is a laser with a power value larger than a power threshold, and the low scanning speed is a scanning speed value smaller than a scanning speed threshold.
Optionally, the power value of the high-power laser is 2W to 3W, the low scanning speed is 80mm/s to 150mm/s, and the line spacing of the laser scanning is 1um to 10 um.
Optionally, the periodic microstructure is a periodic tapered array structure having a period of 10um to 20 um.
Optionally, the periodic micro-nano structure is a periodic submicron corrugated structure and a periodic nano flocculent structure; wherein the period of the sub-micron corrugated structure is less than 1 micron.
Optionally, the step of performing a first stage laser processing on the surface of the material to be processed is preceded by the steps of:
cleaning the surface of the polished material to be treated with ethanol;
ultrasonically cleaning the material to be treated after the ethanol cleaning;
and drying the cleaned material to be treated.
Optionally, after the step of performing the second-stage laser processing on the material to be processed after the first-stage laser processing, the method includes:
and blowing the filtered air to the material to be processed after the second-stage laser processing treatment so as to remove dust on the surface of the material to be processed.
The invention also provides an anti-reflection material manufacturing device, and the anti-reflection material manufacturing method applied in the invention comprises the following steps:
the polishing unit is used for polishing the material to be processed and reducing the surface roughness of the material to be processed;
and the laser processing unit is used for carrying out first-stage laser processing on the surface of the polished material to be processed to form a periodic micron structure on the surface of the material to be processed, and carrying out second-stage laser processing on the material to be processed after the first-stage laser processing to form a periodic micro-nano structure on the surface of the material to be processed.
Compared with the prior art, the invention has the beneficial effects that: firstly, providing a material to be treated with surface roughness lower than 0.1; then, carrying out first-stage laser processing treatment on the surface of the material to be treated to form a periodic micron structure on the surface of the material to be treated; and finally, carrying out second-stage laser processing on the material to be processed after the first-stage laser processing so as to form a periodic micro-nano structure on the surface of the material to be processed. According to the invention, the periodic micro-nano structure is obtained through two stages of laser processing, so that light rays in a wide spectrum wave band can be effectively absorbed, the reflectivity of the surface of the material is reduced, the anti-reflection performance of the material is enhanced, the manufacturing process is simple, and the environment is not polluted.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the invention, and it is obvious for a person skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a first step of a method for manufacturing an anti-reflective material according to an embodiment of the present invention;
FIG. 2 is a second step of the method of making an anti-reflective material according to an embodiment of the present invention;
FIG. 3 is a surface view of an aluminum alloy material after laser machining according to an embodiment of the present invention;
FIG. 4 is an electron microscope image of an aluminum alloy material after laser machining according to an embodiment of the invention;
FIG. 5 is a graph of reflectivity of an aluminum alloy material after laser machining in accordance with an embodiment of the present invention;
fig. 6 is a schematic structural diagram of a laser processing unit according to an embodiment of the present invention.
Detailed Description
The following description of the various embodiments refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. In the description of the present invention, it is to be understood that the terms "first", "second" and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the invention. To simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize applications of other processes and/or uses of other materials.
The embodiment of the invention provides a method for manufacturing an anti-reflection material, which comprises the following steps as shown in figure 1:
In the above steps, the material to be processed may be polished to reduce the surface roughness of the material to be processed to a value lower than 0.1. The material to be treated may be a metallic material, such as an aluminum alloy material, and specifically may be 2a12 aluminum alloy.
In the steps, polishing can be carried out in a polishing mode, and oxide layers and impurities on the surface of the aluminum alloy material are removed. For example, the surface of the material may be subjected to a grinding and polishing process using sandpaper. The rough polishing can be carried out by sand paper with large grain diameter and the fine polishing can be carried out by metal with small grain diameter in sequence until brighter metal color is exposed. In order to improve the smoothness of the surface of the material, the material after being sanded by the sand paper can be polished by using a grinding paste.
And 200, performing first-stage laser processing on the surface of the material to be processed to form a periodic micron structure on the surface of the material to be processed.
The above steps may include: the surface of the material to be processed after the polishing treatment is subjected to laser processing treatment 100 to 300 times by a low-power laser at a high scanning speed. The low-power laser is a laser with a power value smaller than a power threshold, and the high scanning speed is a scanning speed value larger than a scanning speed threshold.
In one embodiment, the surface of the polished material to be processed may be subjected to a first-stage laser processing by an infrared femtosecond laser. Firstly, an aluminum alloy material is placed on an infrared femtosecond laser processing platform, and a focusing field lens focuses laser on the aluminum alloy material, wherein the focal length of the focusing field lens can be 56 mm. Then, the square size is set to be 10mm × 10mm in the marking control software, the filling mode is cross scanning, the line spacing of laser scanning is 10um to 20um (16 um is selected in this embodiment), the high scanning speed is 1000mm/s to 2000mm/s (1500 mm/s is selected in this embodiment), the processing times are 100 to 300 times (200 times is selected in this embodiment), the power of the low-power laser is 0.5W to 1W (0.8W is selected in this embodiment), a microstructure with a period of 10um × 10mm and a period of 10um to 20um (16 um is selected in this embodiment) is prepared on the surface of the aluminum alloy. The microstructures may be embodied as tapered array structures.
And 300, performing second-stage laser processing on the material to be processed after the first-stage laser processing to form a periodic micro-nano structure on the surface of the material to be processed.
The above steps may include: carrying out laser processing on the material to be processed after the first-stage laser processing by high-power laser at a low scanning speed; the high-power laser is a laser with a power value larger than a power threshold, and the low scanning speed is a scanning speed value smaller than a scanning speed threshold.
In one embodiment, the material to be processed after the first-stage laser processing may be subjected to laser processing by an infrared femtosecond laser. Firstly, an aluminum alloy material is placed on an infrared femtosecond laser processing platform, a focusing field lens focuses laser on the aluminum alloy material, and at the moment, the focal length of the focusing field lens can be 100 mm. Then, setting the square size to be 10mm × 10mm in marking control software, wherein the filling mode is cross scanning, the line spacing of laser scanning is 1um to 10um (5 um is selected in this embodiment), the low scanning speed is 80mm/s to 150mm/s (100 mm/s is selected in this embodiment), the processing times are fewer times (e.g. 1 to 3 times, 1 time is selected in this embodiment), the power of high-power laser is 2W to 3W (2.3W is selected in this embodiment), and a periodic micro-nano structure of 10mm × 10mm is prepared on the surface of the aluminum alloy. The periodic micro-nano structure is a periodic submicron corrugated structure and a nano flocculent structure; wherein the period of the sub-micron corrugated structure is less than 1 micron. The nanometer synapse with two outward extending ridges of the submicron corrugated structure is formed by the action of fluid tension generated after the material is melted due to the phase explosion generated in the action process of the ultrashort pulse laser and the material under higher energy density.
In one embodiment, the method further comprises a step 400 of blowing the filtered air to the material to be processed after the second stage laser processing treatment to remove dust on the surface of the material to be processed.
In one embodiment, step 200 is preceded by the following steps, as shown in FIG. 2:
and 120, ultrasonically cleaning the material to be treated after the ethanol cleaning. In this embodiment, the material to be treated may be placed in ethanol or deionized liquid for ultrasonic cleaning.
And step 130, drying the cleaned material to be processed.
After the treatment, the material to be treated with clean surface can be obtained, which is beneficial to the subsequent precise laser processing.
According to the embodiment, the periodic micro-nano structure is obtained through two stages of laser processing, infrared light can be effectively absorbed, the reflectivity of the surface of the material to light rays with wide spectral bands is reduced, the anti-reflection performance of the material is enhanced, the manufacturing process is simple, and the environment cannot be polluted.
By the method of the embodiment, the black aluminum alloy with wide spectrum and high absorptivity can be obtained, and as can be seen from fig. 3, the whole surface of the aluminum alloy is black.
The micro-nano structure of the surface of the processed aluminum alloy material is shown in fig. 4 and is a submicron corrugated structure.
As shown in FIG. 5, the reflectivity of the surface of the aluminum alloy material processed according to the present embodiment is less than 10% in the wavelength range of 400nm to 9000 nm.
The manufacturing method of the anti-reflection material has the advantages of strong controllability, simple manufacturing process, high processing precision, environmental friendliness and the like, and is easy to realize large-scale industrial production and manufacturing.
In one embodiment, step 200 may further comprise:
in the prior art, rie (reactive ion etching) is generally adopted, molecular gas plasma is utilized to etch in a vacuum system, and ion-induced chemical reaction is utilized to realize anisotropic etching, that is, ion energy is utilized to form an easily etched damage layer on the surface of an etched layer and promote chemical reaction, and ions can also remove surface products to expose a clean etched surface. However, this etching technique cannot achieve a high selectivity, causes a large damage to the surface, causes contamination, and makes it difficult to form a finer pattern.
The embodiment overcomes the problem of surface damage caused by mechanical grooving and RI E (reactive ion etching technology), and the surface of the obtained material has very stable absorption performance to light in a wave band of 400nm-9000 nm.
In one embodiment, the method flow is as follows:
firstly, polishing an aluminum alloy material to be processed, reducing the surface roughness of the aluminum alloy material, and removing an oxide layer and impurities on the surface of the material.
Secondly, cleaning the surface of the polished aluminum alloy material with ethanol, then placing the aluminum alloy material in deionized liquid for ultrasonic cleaning, and drying the cleaned aluminum alloy material, such as drying, airing, air drying and the like.
Then, the surface of the aluminum alloy material to be processed is subjected to first-stage laser processing treatment, so that the surface of the aluminum alloy material forms a periodic microstructure. The aluminum alloy material is placed on an infrared femtosecond laser processing platform, and the focusing field lens focuses laser on the aluminum alloy material, wherein the focal length of the focusing field lens can be 82 mm. Then, the square size of 15mm is set in the marking control software, the filling mode is cross scanning, the line spacing of laser scanning is 18um, the high scanning speed is 1600mm/s, the processing times are 150 times, the power of low-power laser is 0.9W, and a micrometer structure with 15mm and 18um period is prepared on the surface of the material. The microstructures may be embodied as tapered array structures.
And thirdly, carrying out second-stage laser processing on the aluminum alloy material to form a periodic micro-nano structure on the surface of the aluminum alloy material. The aluminum alloy material is placed on an infrared femtosecond laser processing platform, the focusing field lens focuses laser on the aluminum alloy material, and at the moment, the focal length of the focusing field lens can be 103 mm. Then, setting a square size of 15mm multiplied by 15mm in marking control software, wherein the filling mode is cross scanning, the line spacing of laser scanning is 6um, the low scanning speed is 120mm/s, the processing times are 1 time, the power of high-power laser is 2.5W, and a periodic micro-nano structure of 15mm multiplied by 15mm is prepared on the surface of the aluminum alloy, and the periodic micro-nano structure is a periodic submicron corrugated structure and a nano flocculent structure.
And finally, blowing the aluminum alloy material by compressed air to remove surface dust, and taking out the aluminum alloy material to obtain the black aluminum alloy with wide spectrum and high absorptivity. The reflectivity of the film is lower than 10% in a wave band of 400nm-9000 nm.
In this embodiment, a periodic submicron corrugated structure is induced on the surface of the material by laser two-stage processing, and a large number of nano flocculent structures are attached. Wherein the submicron fringes are caused by mutual interference between incident laser and material surface plasmon, so that energy is periodically distributed in space. Metal surface plasmons are an electromagnetic excitation propagation phenomenon existing between a metal and an insulator. The amplitude of evanescent waves decays exponentially in the vertical direction, and these electromagnetic surface waves are formed by the resonant coupling of electromagnetic fields with conductor electron plasmons.
When light waves (electromagnetic waves) are incident on a metal and dielectric interface, free electrons on the metal surface generate collective oscillation, the electromagnetic waves and the free electrons on the metal surface are coupled to form near-field electromagnetic waves which propagate along the metal surface, resonance is generated if the oscillation frequency of the electrons is consistent with the frequency of the incident light waves, and the energy of the electromagnetic fields is effectively converted into collective vibration energy of the free electrons on the metal surface in a resonance state, so that a special electromagnetic mode is formed: the electromagnetic field is localized to a small range of the metal surface and enhanced, and this phenomenon is called a surface plasmon phenomenon.
Surface plasmons mainly have the following basic properties:
1. the field strength decays exponentially in the direction perpendicular to the interface;
2. the diffraction limit can be broken through;
3. has strong local field enhancement effect;
4. only on both sides of the interface where the dielectric parameters (real part) are of opposite sign (i.e. metal and dielectric).
The invention also provides an anti-reflection material manufacturing device, and the anti-reflection material manufacturing method provided by the embodiment comprises a polishing unit and a laser processing unit.
The polishing unit is used for polishing the material to be processed, so that the surface roughness of the material to be processed is lower than 0.1.
The laser processing unit is used for carrying out first-stage laser processing on the surface of the polished material to be processed to form a periodic micron structure on the surface of the material to be processed, and carrying out second-stage laser processing on the material to be processed after the first-stage laser processing to form a periodic micro-nano structure on the surface of the material to be processed.
As shown in fig. 6, the laser processing unit includes a laser emitter 1, a reflector 2 arranged along a laser path, a beam expander 3, a scanning galvanometer 4, and a focusing field lens 5, and further includes a moving platform 6 for placing a material to be processed, and the laser is focused by the focusing field lens 5 and then acts on the material a to be processed on the moving platform 6.
The laser that the intensity was adjusted that laser emitter 1 sent is through behind speculum 2 reflection, expands the beam through beam expander 3 again, later jets out from focusing field lens 5 behind scanning galvanometer 4 to focus on the material A surface on moving platform 6. The moving platform 6 can drive the material A to move, and the laser irradiation direction is changed by matching with the scanning galvanometer 4, so that the whole surface of the material A can be processed.
The laser is divided into nanosecond laser, picosecond laser and femtosecond laser according to the pulse time. Where 1 nanosecond equals 10-9 seconds, 1 picosecond equals 10-12 seconds, and 1 femtosecond equals 10-15 seconds. Because the material is melted and continuously evaporated due to the long pulse width and the low laser peak power of the nanosecond laser, although the laser beam can be focused into a very small spot, the thermal effect on the material is still large, and the processing precision is limited. The femtosecond laser has the characteristics of short pulse width and high peak power, can effectively reduce the influence of a heat effect and improve the processing quality.
In this embodiment, the operation method of the apparatus for manufacturing an antireflection material is as follows:
firstly, polishing the aluminum alloy material to be processed by a polishing unit, reducing the surface roughness of the aluminum alloy material to be processed, and removing an oxide layer and impurities on the surface of the material.
Secondly, cleaning the surface of the polished aluminum alloy material with ethanol, then placing the aluminum alloy material in deionized liquid for ultrasonic cleaning, and drying the cleaned aluminum alloy material, such as drying, airing, air drying and the like.
Then, the surface of the aluminum alloy material to be processed is subjected to first-stage laser processing by a laser processing unit, so that a periodic microstructure is formed on the surface of the aluminum alloy material. The aluminum alloy material is placed on an infrared femtosecond laser processing platform, the focusing field lens focuses laser on the aluminum alloy material, and at the moment, the focal length of the focusing field lens can be 56 mm. Then, the square size of 10mm multiplied by 10mm is set in marking control software, the filling mode is cross scanning, the line spacing of laser scanning is 16um, the high scanning speed is 1500mm/s, the processing times are 200 times, the power of low-power laser is 0.8W, and a micrometer structure with the length of 10mm multiplied by 10mm and the period of 16um is prepared on the surface of the material. The microstructures may be embodied as tapered array structures.
And thirdly, carrying out second-stage laser processing on the aluminum alloy material to form a periodic micro-nano structure on the surface of the aluminum alloy material. The aluminum alloy material is placed on an infrared femtosecond laser processing platform, the focusing field lens focuses laser on the aluminum alloy material, and at the moment, the focal length of the focusing field lens can be 100 mm. Then, setting the square size to be 10mm multiplied by 10mm in marking control software, wherein the filling mode is cross scanning, the line spacing of laser scanning is 5um, the low scanning speed is 100mm/s, the processing times are 1 time, the power of high-power laser is 2.3W, and a periodic micro-nano structure of 10mm multiplied by 10mm is prepared on the surface of the aluminum alloy, and the periodic micro-nano structure is a periodic submicron corrugated structure and a nano flocculent structure.
And finally, blowing the aluminum alloy material by compressed air to remove surface dust, and taking out the aluminum alloy material to obtain the black aluminum alloy with wide spectrum and high absorptivity. The reflectivity of the film is lower than 10% in a wave band of 400nm-9000 nm.
According to the embodiment, the periodic micro-nano structure is obtained through two stages of laser processing, infrared light can be effectively absorbed, the reflectivity of the surface of the material to light rays with wide spectral bands is reduced, the anti-reflection performance of the material is enhanced, the manufacturing process is simple, and the environment cannot be polluted.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. A method of making an antireflective material, comprising:
providing a material to be treated with a surface roughness of less than 0.1;
carrying out first-stage laser processing on the surface of the material to be processed to form a periodic micron structure on the surface of the material to be processed;
and carrying out second-stage laser processing on the material to be processed after the first-stage laser processing so as to form a periodic micro-nano structure on the surface of the material to be processed.
2. The method for manufacturing an antireflection material according to claim 1, wherein the step of subjecting the surface of the material to be processed to the first-stage laser processing includes:
performing laser processing treatment on the surface of the polished material to be treated for 100 to 300 times by low-power laser at a high scanning speed; the low-power laser is a laser with a power value smaller than a power threshold, and the high scanning speed is a scanning speed value larger than a scanning speed threshold.
3. The method of claim 2, wherein the low power laser has a power value of 0.5W to 1W, the high scanning speed is 1000mm/s to 2000mm/s, and the line spacing of the laser scanning is 10um to 20 um.
4. The method for manufacturing an antireflection material according to any one of claims 1 to 3, wherein the step of performing the second-stage laser processing treatment on the material to be processed after the first-stage laser processing treatment includes:
carrying out laser processing on the material to be processed after the first-stage laser processing by high-power laser at a low scanning speed; the high-power laser is a laser with a power value larger than a power threshold, and the low scanning speed is a scanning speed value smaller than a scanning speed threshold.
5. The method of claim 4, wherein the power of the high power laser is 2W to 3W, the low scanning speed is 80mm/s to 150mm/s, and the line spacing of the laser scanning is 1um to 10 um.
6. The method of claim 1, wherein the periodic microstructure is a periodic tapered array structure having a period of 10um to 20 um.
7. The manufacturing method of the antireflection material according to claim 1 or 6, wherein the periodic micro-nano structure is a periodic submicron corrugated structure and a nano flocculent structure; wherein the period of the sub-micron corrugated structure is less than 1 micron.
8. The method for manufacturing an antireflection material according to claim 1, wherein the step of subjecting the surface of the material to be processed to the first-stage laser processing is preceded by:
cleaning the surface of the polished material to be treated with ethanol;
ultrasonically cleaning the material to be treated after the ethanol cleaning;
and drying the cleaned material to be treated.
9. The method for manufacturing an antireflection material according to claim 1, wherein the step of subjecting the material to be processed after the first-stage laser processing to the second-stage laser processing is followed by:
and blowing the filtered air to the material to be processed after the second-stage laser processing treatment so as to remove dust on the surface of the material to be processed.
10. An apparatus for manufacturing an antireflection material, characterized by applying the method for manufacturing an antireflection material according to any one of claims 1 to 9, comprising:
the polishing unit is used for polishing a material to be processed to enable the surface roughness of the material to be processed to be lower than 0.1;
and the laser processing unit is used for carrying out first-stage laser processing on the surface of the polished material to be processed to form a periodic micron structure on the surface of the material to be processed, and carrying out second-stage laser processing on the material to be processed after the first-stage laser processing to form a periodic micro-nano structure on the surface of the material to be processed.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540786A (en) * | 2022-02-17 | 2022-05-27 | 山西大学 | Anti-reflection composite material and preparation method and application thereof |
| CN115000203A (en) * | 2022-06-20 | 2022-09-02 | 山东大学 | Monocrystalline silicon micro-nano dual-scale antireflection suede and preparation method thereof |
| CN115091029A (en) * | 2022-07-04 | 2022-09-23 | 上海交通大学 | Micro-cone array femtosecond laser processing device, processing method and system |
| CN115446462A (en) * | 2022-08-31 | 2022-12-09 | 哈尔滨工业大学 | Femtosecond laser-based optical element surface microstructure two-step processing method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101475173A (en) * | 2009-01-20 | 2009-07-08 | 吉林大学 | Method for preparing super-hydrophobic antireflex micron and nano composite structure surface |
| CN103627883A (en) * | 2013-11-07 | 2014-03-12 | 清华大学 | Method of regulating and controlling light absorption property of metal surface by picosecond pulse laser |
| US20160298875A1 (en) * | 2013-12-04 | 2016-10-13 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Surface structure for solar heat absorbers and method for the production thereof |
| CN107262916A (en) * | 2017-06-20 | 2017-10-20 | 长春理工大学 | The nanosecond laser rescan preparation method of aluminum alloy surface superhydrophobic microstructure |
| CN107971628A (en) * | 2017-11-22 | 2018-05-01 | 北京工业大学 | Method based on femtosecond laser dynamic control customization copper surface periodic structure |
-
2021
- 2021-09-14 CN CN202111074512.9A patent/CN113732512B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101475173A (en) * | 2009-01-20 | 2009-07-08 | 吉林大学 | Method for preparing super-hydrophobic antireflex micron and nano composite structure surface |
| CN103627883A (en) * | 2013-11-07 | 2014-03-12 | 清华大学 | Method of regulating and controlling light absorption property of metal surface by picosecond pulse laser |
| US20160298875A1 (en) * | 2013-12-04 | 2016-10-13 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Surface structure for solar heat absorbers and method for the production thereof |
| CN107262916A (en) * | 2017-06-20 | 2017-10-20 | 长春理工大学 | The nanosecond laser rescan preparation method of aluminum alloy surface superhydrophobic microstructure |
| CN107971628A (en) * | 2017-11-22 | 2018-05-01 | 北京工业大学 | Method based on femtosecond laser dynamic control customization copper surface periodic structure |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540786A (en) * | 2022-02-17 | 2022-05-27 | 山西大学 | Anti-reflection composite material and preparation method and application thereof |
| CN115000203A (en) * | 2022-06-20 | 2022-09-02 | 山东大学 | Monocrystalline silicon micro-nano dual-scale antireflection suede and preparation method thereof |
| CN115000203B (en) * | 2022-06-20 | 2023-11-21 | 山东大学 | Single crystal silicon micro-nano double-scale antireflection suede and preparation method thereof |
| CN115091029A (en) * | 2022-07-04 | 2022-09-23 | 上海交通大学 | Micro-cone array femtosecond laser processing device, processing method and system |
| CN115091029B (en) * | 2022-07-04 | 2024-02-06 | 上海交通大学 | Micro-cone array femtosecond laser processing device, processing method and system |
| CN115446462A (en) * | 2022-08-31 | 2022-12-09 | 哈尔滨工业大学 | Femtosecond laser-based optical element surface microstructure two-step processing method |
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