CN113707405B - Magnetic field generating device suitable for vacuum coating equipment - Google Patents
Magnetic field generating device suitable for vacuum coating equipment Download PDFInfo
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- CN113707405B CN113707405B CN202110896470.0A CN202110896470A CN113707405B CN 113707405 B CN113707405 B CN 113707405B CN 202110896470 A CN202110896470 A CN 202110896470A CN 113707405 B CN113707405 B CN 113707405B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/06—Electromagnets; Actuators including electromagnets
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10N50/00—Galvanomagnetic devices
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Abstract
The invention discloses a magnetic field generating device suitable for vacuum coating equipment, which comprises: a toroidal magnetic circuit; a pair of excitation coils; a pair of iron cores; a pair of spherical section pole heads; the annular magnetic circuit adopts a hollow annular structure, so that the sample stage can be embedded in the annular magnetic circuit in a non-contact manner; the annular magnetic circuit is circular; the iron core is vertically arranged and can be bent; the pole head is a spherical section; the excitation coil is connected with an external power supply to accurately control the generated magnetic field. The invention can effectively save the transverse limited space in the vacuum coating equipment; the generated magnetic field intensity can be accurately controlled; a uniformly distributed magnetic field can be generated in the preparation area; the method is suitable for preparing the large-size wafer film stack; the other required conditions (such as heating) for preparing the wafer film stack are not adversely affected; the preparation of high-quality magnetic chip film stack can be carried out.
Description
Technical Field
The invention relates to the field of vacuum coating equipment, in particular to a magnetic field generating device suitable for a sample stage of vacuum equipment, which is used for applying a uniform controllable magnetic field when a magnetic chip is prepared.
Background
The magnetic chip, as a core unit of highly reliable information storage (such as magnetic random access memory) and highly sensitive magnetic signal sensing (such as magnetoresistive sensor), has been widely used in the control systems of airplanes and satellites, as well as in the fields of mobile phone electronic compasses, automobile autopilot, etc., and has become an indispensable basic element in information technology and information industry. The functional film layer of the magnetic chip is usually prepared in a vacuum device, and one of the key core technologies in the preparation process is that a high-uniformity and controllable magnetic field needs to be applied when the functional film stack is deposited. With the development of the integrated circuit industry, the fabrication of large-size wafer film stacks is also increasingly important. Therefore, it is an urgent need to develop a stable and controllable magnetic field generator which is suitable for vacuum coating equipment and compatible with large-size wafer film stacks.
For this reason, some solutions have been proposed for magnetic field generating devices in vacuum equipment. For example, permanent magnets are used as magnetic field generating devices and are placed on two sides of a sample table (for example, ferromagnetic small-droplet amorphous alloy materials prepared by pulse deposition, appl. Phys. Lett.72,3455(1998) and Chinese patent application No. 202011144983.8) or placed behind a sample (for example, Chinese patent application No. 201610469974.3). Generally, a detachable magnet fixing clamp is arranged at the bottom of the sample table to fix the permanent magnet, and the permanent magnet can rotate along with the sample. Although the magnetic field generating device is simple and convenient and can apply a fixed magnetic field, the generated magnetic field can not be controlled, and the uniformity of the magnetic field can not meet the preparation requirements of high-quality wafer film stacks and the like; meanwhile, the permanent magnet is directly contacted with the sample table, so that the magnetic chip film stack cannot be heated or only is subjected to low-temperature heating which does not exceed the working temperature of the magnet during preparation. Therefore, the production of magnetic chip film stacks and the like is greatly limited.
In addition, in order to obtain a controllable magnetic field, an electromagnet magnetic field generating device (e.g. chinese patent application No. 200610001808.7) is partially used in the prior art. The magnetic field generating device mainly comprises an electromagnet assembly, wherein an electromagnet coil of the assembly is placed on the outer side of a projecting cavity of a vacuum chamber, two iron core magnetic poles are connected to two sides of a sample table in the cavity in a ring mode through sealing flanges, and the electromagnet is connected with a computer through a control power supply. However, it employs a laterally placed planar pole head, resulting in a reduction of its laterally limited space. In addition, the adopted pole head is in a plane shape, so that the generated magnetic field is distributed and uneven in a large-size wafer area.
On the other hand, in order to obtain a relatively uniform magnetic field, a few prior arts adopt a helmholtz coil magnetic field generating device (for example, chinese patent application No. 201911020182.8). The uniform magnetic field is obtained by a Helmholtz coil vertically arranged on a magnetron sputtering platform, and the device is vertical to the direction of a deposited film. However, this device occupies a large space in the vacuum apparatus, and since the generated magnetic field is elliptical, it generates a uniform magnetic field with a small space and a low magnetic field strength.
Therefore, it is imperative to introduce a new design method to construct a new magnetic field generator to meet the preparation requirement of high-quality magnetic chip film stack and promote the development of integrated circuit industries such as magnetic random access memory and magnetic sensing.
The scheme of the invention can realize the generation of a controllable uniform magnetic field by modifying the configurations of the iron core and the pole head of the electromagnet magnetic field generating device and modifying the bottom support of the magnetic circuit, and has no adverse effect on other growth environments of the sample.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention provides a magnetic field generating device suitable for vacuum coating equipment, so that a uniform and controllable magnetic field can be formed in a large-size area of a sample table, and the requirements of the current vacuum coating equipment on preparation of a high-quality magnetic chip film stack and the like are met.
In order to solve the above problems, the present invention provides a magnetic field generating device suitable for a vacuum coating apparatus, specifically comprising: a toroidal magnetic circuit; a pair of excitation coils; a pair of iron cores; a pair of spherical section pole heads;
the annular magnetic circuit adopts a hollow annular structure, so that the sample table can be embedded in the annular magnetic circuit without contact, and adverse effects on growth environments such as sample table heating and the like can be avoided;
the annular magnetic circuit is particularly annular;
the iron core is vertically arranged, so that the transverse limited space can be effectively saved;
the specific structure of the iron core can be bent, namely the iron core is folded inwards to the horizontal direction after being vertically extended. The iron core structure with different bending radians can be selected according to requirements. The angle of the inward fold to the horizontal may range from 0 ° to 90 °.
The pole head is a spherical section and is different from a conventional plane pole head.
The spherical tangent plane pole head can select different sizes and models according to the structure in the cavity, is suitable for wafers with different sizes, and generates a uniform magnetic field.
The spherical section pole head can select spherical sections with different radians according to different requirements so as to generate uniformly distributed magnetic induction lines in a wafer area and achieve uniform magnetic field intensity.
The excitation coil is connected with an external power supply to accurately control the generated magnetic field.
The beneficial technical effects are as follows:
the invention provides a magnetic field generating device suitable for vacuum coating equipment. The transverse limited space in the vacuum coating equipment can be effectively saved; the generated magnetic field intensity can be accurately controlled; a uniformly distributed magnetic field can be generated in the preparation area; the method is suitable for preparing the large-size wafer film stack; the other required conditions (such as heating) for preparing the wafer film stack are not adversely affected; the preparation of high-quality magnetic chip film stack can be carried out.
Drawings
FIG. 1 is a front view of a magnetic field generating device suitable for a vacuum coating apparatus according to one embodiment of the present invention;
FIG. 2 is a top view of a magnetic field generator suitable for use in a vacuum deposition apparatus according to one embodiment of the present invention;
FIG. 3 is a side view of a magnetic field generating device suitable for use in a vacuum coating apparatus according to one aspect of the present invention;
FIG. 4 is a graph showing a simulation of the magnetic field generated by the embodiment of the present invention for a 4-inch wafer.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, embodiments of the present invention will be described in detail below with reference to the accompanying drawings. However, it will be appreciated by those of ordinary skill in the art that numerous technical details are set forth in order to provide a better understanding of the present invention in its various embodiments. However, the technical solution claimed in the present invention can be implemented without these technical details and various changes and modifications based on the following embodiments.
A magnetic field generating device suitable for a vacuum coating apparatus, as shown in fig. 1, comprising: a toroidal magnetic circuit 1; a pair of excitation coils 2; a pair of iron cores 3 extending vertically and then folded in the horizontal direction; a pair of spherical tangent plane heads 4.
The annular magnetic circuit 1 adopts a hollow structure, so that the sample stage can be embedded in the annular magnetic circuit 1 in a non-contact manner, and adverse effects on growth environments such as sample stage heating and the like can be avoided.
The annular magnetic circuit is annular and is matched with the sample table in shape.
The iron core 3 is vertically arranged, so that the transverse limited space can be effectively saved.
The iron core 3 can be bent, and is folded inwards to the horizontal direction after being vertically extended. The iron core structure with different bending radians can be selected according to requirements. The bending angle inward toward the horizontal direction may range from 0 ° to 90 °.
The core material may be a ferromagnetic or ferrimagnetic substance including, but not limited to, a metal or alloy containing iron, cobalt, nickel.
The pole head is a spherical section (as shown in fig. 3), as distinguished from a conventional planar pole head. According to different requirements, the spherical section with different radians can be selected, and magnetic induction lines which are uniformly distributed can be generated in a wafer area, so that uniform magnetic field intensity is achieved.
The spherical section pole head 4 can be selected to have different sizes and models according to the structure in the cavity, is suitable for wafers with different sizes, and generates a uniform magnetic field.
The excitation coil 2 can accurately control the generated magnetic field through an external power supply.
Examples 1,
By simulating the internal configuration of the vacuum deposition apparatus, a wafer 5 having a diameter of 4 inches was horizontally placed in the central region of a pair of spherical-section heads (height 60 cm). Wherein the pole head is formed by ball-cutting a sphere with the diameter of 85cm at the center of the wafer. A magnetic field is generated in the central area by simulating an external excitation coil power supply. The excitation coil was a 2mm diameter copper wire with 400 turns, and a uniform magnetic field was generated in the center region of the pole tip by applying a current of 10A.
As can be seen from the magnetic field simulation in fig. 4, the magnetic field strength obtained over this 4-inch region was (23.463-26.337) mT with a uniformity of 89.1%.
Claims (4)
1. The utility model provides a magnetic field generating device suitable for vacuum coating equipment which characterized in that: the device includes: a toroidal magnetic circuit; a pair of excitation coils; a pair of iron cores; a pair of spherical section pole heads;
the annular magnetic circuit adopts a hollow annular structure, so that the sample table can be embedded in the annular magnetic circuit in a non-contact manner;
the annular magnetic circuit is circular;
the iron core is vertically arranged; the concrete structure can be bent, namely the vertical extension is carried out and then the vertical extension is carried out and the horizontal direction is inwards folded;
the pole head is a spherical tangent plane; the pole head is formed by ball-cutting a sphere with the diameter of 85cm at the center of a wafer;
the excitation coil is connected with an external power supply to accurately control the generated magnetic field.
2. The magnetic field generating device of claim 1, wherein: the angle range of the iron core inwards folded to the horizontal direction can be 0-90 degrees.
3. The magnetic field generating device of claim 1, wherein: the size and the model of the spherical tangent plane pole head are selected according to the structure in the cavity so as to adapt to wafers with different sizes and generate a uniform magnetic field.
4. The magnetic field generating device of claim 1, wherein: the spherical section pole head is a spherical section with different radians according to different requirements so as to generate uniformly distributed magnetic induction lines in a wafer area and achieve uniform magnetic field intensity.
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| CN113707405B true CN113707405B (en) | 2022-07-15 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08111160A (en) * | 1994-10-06 | 1996-04-30 | Mitsuki Nagamoto | Rotary fulcrum type polarized electromagnet, rotary fulcrum type polarized relay into which this is incorporated and its manufacture |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| GB2436364B (en) * | 2006-03-21 | 2008-07-02 | Siemens Magnet Technology Ltd | Apparatus for shimming a magnetic field |
| US7667462B2 (en) * | 2006-12-22 | 2010-02-23 | Schlumberger Technology Corporation | Nuclear magnetic resonance module |
| CN108303663B (en) * | 2018-01-23 | 2020-07-03 | 山东迈格尼医疗科技有限公司 | Double-air-gap open type magnetic resonance imaging magnet |
| CN110459378A (en) * | 2019-09-11 | 2019-11-15 | 西南应用磁学研究所 | A kind of permanent magnetic device generating space uniform magnetic field |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08111160A (en) * | 1994-10-06 | 1996-04-30 | Mitsuki Nagamoto | Rotary fulcrum type polarized electromagnet, rotary fulcrum type polarized relay into which this is incorporated and its manufacture |
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