CN113697931B - Self-doping bismuth tungstate (Bi)2.15WO6) Method for efficiently removing bisphenol A by Persulfate (PS) system - Google Patents

Self-doping bismuth tungstate (Bi)2.15WO6) Method for efficiently removing bisphenol A by Persulfate (PS) system Download PDF

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CN113697931B
CN113697931B CN202111042360.4A CN202111042360A CN113697931B CN 113697931 B CN113697931 B CN 113697931B CN 202111042360 A CN202111042360 A CN 202111042360A CN 113697931 B CN113697931 B CN 113697931B
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bisphenol
solution
persulfate
suspension
radical mechanism
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CN113697931A (en
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刘勇
刘天宇
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Tianjin University of Technology
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/725Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/24Chromium, molybdenum or tungsten
    • B01J23/31Chromium, molybdenum or tungsten combined with bismuth
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39Photocatalytic properties
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds
    • C02F2101/34Organic compounds containing oxygen
    • C02F2101/345Phenols
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/02Specific form of oxidant
    • C02F2305/023Reactive oxygen species, singlet oxygen, OH radical
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/10Photocatalysts

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  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
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Abstract

The invention provides a method for efficiently removing bisphenol A by a self-doped bismuth tungstate (Bi 2.15WO6)/Persulfate (PS) system through a non-free radical machine, which comprises the following steps: s1: placing the prepared Bi 2.15WO6 solid in water to obtain a suspension, and adjusting the pH of the suspension to be more than 7.0 by using acid or alkali; s2: respectively adding PS solution with the same pH value into Bi 2.15WO6 suspension, and starting to stir bisphenol A solution at a constant speed; s3: the bisphenol A concentration was measured by starting timing and sampling at the time of adding the bisphenol A solution. The invention discloses a method for efficiently removing bisphenol A by a non-free radical mechanism under the condition of no light of a Bi 2.15WO6/PS system, and a certain amount of phenolic polymer is obtained in the reaction process, so that the bisphenol A is removed and the recycling is realized.

Description

Method for efficiently removing bisphenol A by self-doping bismuth tungstate (Bi 2.15WO6)/Persulfate (PS) system
Technical Field
The invention belongs to the field of bisphenol A-containing wastewater environmental treatment, and particularly relates to a method for removing bisphenol A by a non-radical mechanism self-doped bismuth tungstate (Bi 2.15WO6)/Persulfate (PS) system.
Background
Bisphenol A is an important chemical substance and is widely applied to the synthesis of materials such as polycarbonate, epoxy resin and the like. Bisphenol a can interact with a variety of biological receptors, such as Estrogen Receptor (ER), androgen Receptor (AR), thyroid Hormone Receptor (THR), interfering with human endocrine. In recent years, sewage discharge standards have been established in some countries. Bisphenol A emission limits were 2.5mg/L and 0.5mg/L in Japan and U.S., respectively, and the highest emission limit in China was 1mg/L. Bisphenol a contaminants interfere with human endocrine and have a serious impact on the reproductive, neurological and immune systems of the human body when they enter the aqueous environment.
Advanced oxidation technologies (Advanced oxidation processes, AOPs) are pollutant treatment technologies that arose in the 80 s of the 20 th century. Common AOPs technology degrades organic pollutants in wastewater by generating strong-oxidability OH to mineralize the organic matters. However, this technique has not been effective in removing refractory organics in the face of it. In recent years, PS-based AOPs technology has been increasingly attracting attention of a wide range of scholars. PS exhibits high oxidative reactivity towards many organic contaminants. The oxidation SO 4 ·- and OH generated in the PS activation process under the acidic condition show higher reactivity to organic pollutants. Compared with hydrogen peroxide (H 2O2) and Peroxymonosulfate (PMS), the PS has the advantages of more stable chemical property, lower transportation cost, lower price and the like. However, SO 4 ·- and OH have low selectivity to pollutants, and cause a certain damage to the original environment.
Bi 2.15WO6 is widely used as a photocatalyst in the field of photocatalysis, and in the research of Bi 2.15WO6 photocatalytic oxidation pollutants, various Reactive Oxygen Species (ROS) such as hole (h+), superoxide radical (O 2-) and hydroxyl radical (OH) are used as main oxidizing species. However, bi 2.15WO6 plays a major role in the catalytic oxidation of contaminants, and is a somewhat strong oxidizing radical, so the removal pathway with Bi 2.15WO6 as a catalyst is a radical mechanism.
In conclusion, the Bi 2.15WO6/PS system is efficient and economical in removing pollutants, so that the Bi 2.15WO6/PS system is used for efficiently removing the wastewater containing bisphenol A, the wastewater reacts through a non-radical mechanism, and the oxidized products can be recycled, so that the method is a very great technical innovation.
Disclosure of Invention
In view of the above, the invention discloses a method for efficiently removing bisphenol A by a non-radical mechanism under the condition of no light of a Bi 2.15WO6/PS system, and a certain amount of phenolic polymer is obtained in the reaction process, so that the bisphenol A is removed and the recycling is realized.
In order to achieve the above purpose, the technical scheme of the invention is realized as follows:
The method for efficiently removing bisphenol A by a Bi 2.15WO6/PS system through a non-free radical mechanism under the condition of no light is characterized by comprising the following steps:
In the first step, the prepared Bi 2.15WO6 solid is placed in water to obtain a suspension, and the pH of the suspension is adjusted to be more than 7.0 by using acid or alkali.
And secondly, respectively adding Persulfate (PS) solution and bisphenol A solution with the same pH value into the obtained suspension, and starting uniform stirring.
And thirdly, starting timing and sampling at fixed time when the bisphenol A solution is added to detect the concentration of the bisphenol A.
Further, the solid Bi 2.15WO6 was prepared using a hydrothermal method.
Further, bismuth nitrate solution and sodium tungstate solution are mixed in proportion at normal temperature, the pH is adjusted to 1.0 by acid or alkali, the mixture is stirred uniformly and then placed in an oven to start reaction, and the obtained solid is washed, dried and ground after cooling to obtain the solid Bi 2.15WO6.
Further, bismuth nitrate solution dissolved in 1M nitric acid solution and sodium tungstate solution dissolved in 1M sodium hydroxide solution are uniformly stirred according to the ratio of Bi: w=2.15:1, and after being completely uniform, the bismuth nitrate solution and the sodium tungstate solution are placed in an oven to react, and after cooling, the obtained solid is washed, dried and ground to obtain the solid Bi 2.15WO6.
Further, the bismuth nitrate solution and the sodium tungstate solution which are uniformly mixed are reacted for 24 hours at 180 ℃ in an oven.
Further, in the first step, the prepared Bi 2.15WO6 solid was placed in water to obtain a suspension, and the pH was adjusted to more than 7.0 using 1M sodium hydroxide solution or 1M hydrochloric acid solution.
Further, 1M methanol and 20mM chloroform were added to the solution obtained in the second step, stirring was started at a constant speed, and the bisphenol A concentration was detected by sampling at a fixed time as the addition of the bisphenol A solution was started, and a radical masking experiment was performed.
Further, collecting insoluble solids in the system after the reaction, washing with deionized water, drying to obtain insoluble products, and carrying out FTIR analysis on the insoluble products to obtain the phenolic polymer.
Compared with the prior art, the method for efficiently removing bisphenol A by using the self-doped bismuth tungstate (Bi 2.15WO6)/Persulfate (PS) system has the following advantages:
(1) In the process of removing the wastewater containing bisphenol A by using the Bi 2.15WO6/PS system, a non-radical mechanism is realized to remove bisphenol A, so that not only is the pollutant removed, but also the phenolic polymer is obtained, the reaction is efficient, and the resource utilization is realized.
(2) Under the condition of being more than neutral, the path of removing bisphenol A by the Bi 2.15WO6/PS system is a non-radical mechanism and is completely different from the radical path of the traditional AOPs technology.
(3) The common degradation approach of wastewater containing bisphenol A usually uses photocatalytic oxidation or uses free radicals with strong oxidability to degrade, so that the cost is increased and the primary environment is broken, and the Bi 2.15WO6/PS system is used for removing bisphenol A without an external light source and generating a large amount of free radicals, thereby reducing the cost of wastewater treatment.
(4) The insoluble phenolic polymer is obtained in the pollutant removal process, and the polymer can be obtained while bisphenol A is removed, so that the recycling treatment of bisphenol A wastewater is realized, and a new idea is provided for efficiently and low-cost removing bisphenol A pollutants.
Drawings
FIG. 1 is an XRD pattern of Bi 2.15WO6 obtained in example 1;
FIG. 2 is a degradation chart of Bi 2.15WO6/PS system of examples 1,2 to degrade bisphenol A;
FIG. 3 is a free radical masking experimental plot of the Bi 2.15WO6/PS system of example 1;
FIG. 4 is a FTIR image of the post-reaction insolubles obtained in example 1.
Detailed Description
1. The preparation process of Bi 2.15WO6 is as follows:
Bismuth nitrate solution dissolved in 1M nitric acid solution and sodium tungstate solution dissolved in 1M sodium hydroxide solution are uniformly stirred according to the proportion of Bi:W=2.15:1, the mixture is placed in an oven to react for 24 hours at 180 ℃ after being completely uniform, the obtained solid is washed, dried and ground after being cooled to obtain the solid Bi 2.15WO6, the solid Bi 2.15WO6 is ground into uniform powder by using an agate mortar and then placed in a drying oven for standby, and XRD analysis is carried out on the prepared sample, and the result is shown in figure 1.
Bi 2.15WO6/PS System bisphenol A removal experiment
A quantity of Bi 2.15WO6 was weighed into a 100mL beaker containing a quantity of deionized water and the suspension was adjusted to greater than 7.0 using 1M sodium hydroxide solution or hydrochloric acid solution. Then, a certain volume of PS and bisphenol A solution with the same pH value are added into the suspension in sequence, and the suspension is placed in a stirrer to be uniformly mixed. The bisphenol A solution was added while starting the timing and sampling was timed.
Bisphenol A concentration was measured using a high performance liquid chromatograph.
(1) Assay reagents:
bisphenol a standard stock: 100mg of bisphenol A was placed in a 1L volumetric flask and completely dissolved.
(2) Drawing a standard curve: 5 bisphenol A (5, 10, 20, 25, 40mg L -1) concentrations were taken and tested at 276nm in a mixed solution (50:50) of acetonitrile and water as mobile phase.
(3) And (3) measuring a water sample: taking a small amount of reaction liquid in a certain time, filtering out clear liquid by a filter for testing, and calculating the bisphenol A content in the solution according to a standard curve.
The removal efficiency of the Bi 2.15WO6/PS system to remove bisphenol A under alkaline conditions is shown in FIG. 2.
(3) Free radical masking experiments
A quantity of Bi 2.15WO6 was weighed into a 100mL beaker containing a quantity of deionized water and the suspension was adjusted to be greater than 7.0 using 1M sodium hydroxide solution. Then, a certain volume of PS and bisphenol A solution with the same pH value are added into the suspension in sequence, 1M methanol and 20mM chloroform are respectively added into the system for uniform mixing, and the mixture is placed in a stirrer for uniform mixing. The bisphenol A solution was added while starting the timing and sampling was timed.
A diagram of the free radical masking experiment of the Bi 2.15WO6/PS system under alkaline conditions is shown in FIG. 3.
(4) Characterization of the post-reaction insolubles
Insoluble solids in the reaction system were collected, washed with deionized water and dried to obtain insoluble products, and FTIR analysis was performed on the insoluble products, and the analysis results are shown in fig. 4.

Claims (7)

  1. The method for removing bisphenol A by a Bi 2.15WO6/persulfate system under the dark condition through a non-free radical mechanism, obtaining phenolic polymer in the reaction process, and is characterized by comprising the following steps:
    (1) Placing the prepared Bi 2.15WO6 in water to obtain a suspension, and adjusting the pH of the suspension to 10 by using alkali; respectively adding persulfate solution with the same pH value into the obtained suspension, and starting to stir bisphenol A solution at a constant speed;
    (2) The bisphenol A concentration was measured by starting timing and sampling at the time of adding the bisphenol A solution.
  2. 2. The method of Bi 2.15WO6/persulfate system according to claim 1 for bisphenol a removal by a non-radical mechanism under matt conditions, characterized in that: solid Bi 2.15WO6 was prepared using a hydrothermal process.
  3. 3. The method of Bi 2.15WO6/persulfate system according to claim 2 for bisphenol a removal by a non-radical mechanism under matt conditions, characterized in that: mixing bismuth nitrate solution and sodium tungstate solution in proportion at normal temperature, regulating the pH value to 1.0 by acid or alkali, stirring uniformly, placing in an oven for reaction at 180 ℃ for 24 hours, cooling, and cleaning, drying and grinding the obtained solid to obtain the solid Bi 2.15WO6.
  4. 4. A process for the removal of bisphenol a by a non-radical mechanism under matt conditions of Bi 2.15WO6/persulfate system according to claim 3, characterized in that: uniformly mixing in the ratio of Bi: W=2.15:1.
  5. 5. The method of Bi 2.15WO6/persulfate system according to claim 1 for bisphenol a removal by a non-radical mechanism under matt conditions, characterized in that: in the step (1), the prepared Bi 2.15WO6 was placed in water to obtain a suspension, and the pH was adjusted to 10 with 1M sodium hydroxide solution.
  6. 6. The method of Bi 2.15WO6/persulfate system according to claim 1 for bisphenol a removal by a non-radical mechanism under matt conditions, characterized in that: in the step (1), 1M methanol and 20mM chloroform were added respectively, and the timing was started when the bisphenol A solution was added, and the sample was taken at regular time to carry out a masking experiment.
  7. 7. The method of Bi 2.15WO6/persulfate system according to claim 1 for bisphenol a removal by a non-radical mechanism under matt conditions, characterized in that: and carrying out infrared spectrum analysis on insoluble solids in the system to obtain the phenol polymer as a product.
CN202111042360.4A 2021-09-07 2021-09-07 Self-doping bismuth tungstate (Bi)2.15WO6) Method for efficiently removing bisphenol A by Persulfate (PS) system Active CN113697931B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109126835A (en) * 2018-07-26 2019-01-04 中国电建集团成都勘测设计研究院有限公司 Photochemical catalyst La3+The method of/BiOI and bisphenol AF of degrading
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Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109126835A (en) * 2018-07-26 2019-01-04 中国电建集团成都勘测设计研究院有限公司 Photochemical catalyst La3+The method of/BiOI and bisphenol AF of degrading
CN112062258A (en) * 2020-09-16 2020-12-11 天津理工大学 Method for degrading aniline by using copper oxide persulfate system without free radical mechanism

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Catalytic reactivity of Co3O4 with different facets in the hydrogen abstraction of phenol by persulfate;Wang Cong, wt al;APPLIED CATALYSIS B-ENVIRONMENTAL;20200430;第270卷;118819 *
Efficient peroxodisulfate activation by iodine vacancy rich bismuth oxyiodide: A vacancy induced mechanism;Wei, Y et al;CHEMICAL ENGINEERING JOURNAL;20191101;121971 *
Liu TY,et al.Oxidative polymerization of bisphenol A (BPA) via H-abstraction by Bi2.15WO6 and persulfate: Importance of the surface complexes.CHEMICAL ENGINEERING JOURNAL.2022,第435卷134816. *
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