CN113694686A - Method for regulating adsorption and desorption process through radiation refrigeration and solar heating - Google Patents
Method for regulating adsorption and desorption process through radiation refrigeration and solar heating Download PDFInfo
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- CN113694686A CN113694686A CN202110946831.8A CN202110946831A CN113694686A CN 113694686 A CN113694686 A CN 113694686A CN 202110946831 A CN202110946831 A CN 202110946831A CN 113694686 A CN113694686 A CN 113694686A
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- radiation refrigeration
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- 238000001179 sorption measurement Methods 0.000 title claims abstract description 120
- 238000003795 desorption Methods 0.000 title claims abstract description 106
- 238000000034 method Methods 0.000 title claims abstract description 90
- 238000010438 heat treatment Methods 0.000 title claims abstract description 36
- 230000001105 regulatory effect Effects 0.000 title claims abstract description 28
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
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- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0462—Temperature swing adsorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0407—Constructional details of adsorbing systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/102—Carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/106—Silica or silicates
- B01D2253/108—Zeolites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/106—Silica or silicates
- B01D2253/11—Clays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/20—Organic adsorbents
- B01D2253/204—Metal organic frameworks (MOF's)
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Of Gases By Adsorption (AREA)
- Sorption Type Refrigeration Machines (AREA)
Abstract
The invention discloses a method for regulating and controlling an adsorption and desorption process by radiation refrigeration and solar heating. The method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating comprises the steps of coupling a radiation refrigeration coating with an adsorbent, and reducing the temperature of the adsorbent below the radiation refrigeration coating in a mode of reflecting solar radiation and radiation heat when the radiation refrigeration coating is exposed to sunlight above the adsorbent so as to carry out a gas adsorption process; when the radiation refrigeration coating is arranged below the adsorbent, the adsorbent is exposed to sunlight to obtain energy from solar radiation, the temperature of the adsorbent is raised, and therefore a gas desorption process is carried out.
Description
Technical Field
The invention relates to a method for regulating an adsorption and desorption process, in particular to a method for regulating an adsorption and desorption process through radiation refrigeration and solar heating.
Background
The adsorption separation technology is an important way for gas separation in the current industrial process due to mild operation conditions, simple process and low cost. Temperature swing adsorption and pressure swing adsorption techniques are widely used, which achieve adsorption and desorption of gases by varying temperature and pressure, respectively. The principle of temperature swing adsorption is that under the condition of keeping pressure unchanged, low-temperature adsorption is carried out, and the temperature is raised for desorption. The principle of pressure swing adsorption is that under the premise of keeping the temperature unchanged, high-pressure adsorption and low-pressure or vacuum-pumping desorption are carried out. However, the former technique requires an additional heating process, and the latter technique requires an additional pressurization and depressurization operation, which is a major source of energy consumption in the current adsorption separation technique. Therefore, the problem of how to reduce the energy consumption of the conventional separation technology is receiving wide attention.
Solar radiation, i.e. the sun radiates energy to the earth in the form of electromagnetic waves, and the generated solar energy is a renewable clean energy source. The application of radiation refrigeration technology to realize solar radiation cooling and the application of solar heating to realize object heating are two fields which have wider application of solar radiation energy. Considering the temperature reduction and temperature rise processes required by the temperature swing adsorption, if solar radiation can be used for temperature modulation in the temperature swing adsorption process, the cost of the temperature swing adsorption process can be expected to be greatly reduced. However, there is no report in the field of how to effectively use solar radiation in gas absorption and desorption processes.
Disclosure of Invention
The invention aims to provide a method for regulating and controlling an adsorption and desorption process by radiation refrigeration and solar heating, which couples a coating with a radiation refrigeration effect with an adsorbent, and further regulates and controls the adsorption and desorption process of the adsorbent by utilizing the radiation refrigeration and the solar heating; the adsorption process and the desorption process can be conveniently and continuously operated to carry out adsorption-desorption circulation, the energy required by the temperature reduction and the temperature rise of the adsorbent is respectively provided in the whole process through radiation refrigeration and solar heating, and the energy consumption in the adsorption and desorption process can be obviously reduced.
The invention is realized by the following technical scheme:
the method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating comprises the steps of coupling a radiation refrigeration coating with an adsorbent, and reducing the temperature of the adsorbent below the radiation refrigeration coating in a mode of reflecting solar radiation and radiation heat when the radiation refrigeration coating is exposed to sunlight above the adsorbent so as to perform a gas adsorption process; when the radiation refrigeration coating is arranged below the adsorbent, the adsorbent is exposed to sunlight to obtain energy from solar radiation, the temperature of the adsorbent is raised, and therefore a gas desorption process is carried out.
The method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating has the further technical scheme that the device for coupling the radiation refrigeration coating and the adsorbent is a columnar adsorption tower made of quartz, the upper side and the lower side of the device can be light-transmitting, gas inlets and outlets are arranged on the left and the right, the powdery adsorbent is paved at the bottom of the device to be used as an adsorbent bed layer, a metal thin layer with the same area as the lower bottom surface of the device is pressed tightly, then the radiation refrigeration coating with the same area is covered, and the radiation refrigeration coating is fixedly connected with the metal thin layer; the adsorption gas enters the device from the left side, passes through the adsorbent bed and enters the chromatogram from the right side for detection; after adsorption, turning device changes the relative position of adsorbent bed and radiation refrigeration coating, and at this moment, the radiation refrigeration coating is located the below of adsorbent bed, and the light and heat conversion characteristic of adsorbent under the sunlight makes the adsorbent temperature rise to realize quick desorption under inert gas's sweeping. The technical scheme can be that the adsorbent is activated under high-temperature vacuum or high-temperature inert gas and then coupled with the radiation refrigeration coating.
The method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating further adopts the technical scheme that the radiation refrigeration coating is a micro-nano particle coating or a functional polymer material coating with a radiation refrigeration function. The further technical scheme is that the micro-nano particles are preferably one or a combination of silicon dioxide, titanium dioxide, phosphite crystals, silver nano particles or aluminum; the functional polymer material is preferably one or the combination of polyethylene oxide, polyvinylidene fluoride-hexafluoropropylene, polydimethylsiloxane or polymethylpentene.
The method for regulating and controlling the adsorption and desorption processes through radiation refrigeration and solar heating has the further technical scheme that the adsorbent can be one or a combination of a zeolite molecular sieve, a clay mineral, an oxide, activated carbon, a metal/covalent organic framework material, a metal organic polyhedron/cage/complex, a polymer, an ionic liquid or a porous carbon material. The zeolite molecular sieve is preferably one or the combination of A type, X type, Y type or ZSM type zeolite molecular sieve; the clay mineral is preferably one or a combination of attapulgite, montmorillonite, bentonite, kaolin, hydrotalcite, illite or sepiolite clay; the oxide is preferably one or the combination of silicon oxide, aluminum oxide, titanium oxide and zirconium oxide; the metal/covalent organic framework material is preferably one or the combination of MOF series, MIL series, PCN series, ZIF series, PCP series, UiO series, HKUST series, KAUST series, SIFIX series, NU series, COFs series or NOT series; the metal organic polyhedron/cage/complex polymer is one or the combination of MOPs series, MOCs series and MOCPs series; the polymer is one or the combination of nitrogen-rich conjugated microporous polymer, POPs series porous organic polymer and NUT series nitrogen-containing polymer; the ionic liquid is one or the combination of an ionic liquid-based porous material and polyionic liquid nanofiber; the porous carbon material is one or the combination of NPC nitrogen-doped porous carbon and porous material carbonized derivatives.
The method for regulating the adsorption and desorption process through radiation refrigeration and solar heating can further adopt the technical scheme that the radiation refrigeration coating is exposed to sunlight and is communicated with adsorption gas for adsorption test, wherein the gas is one or the combination of olefin, alkane, alkyne, nitrogen, hydrogen, oxygen, oxysulfide, nitric oxide, oxycarbide, water vapor, organic matter vapor, rare gas, chlorine, ammonia, hydrogen sulfide, hydrogen chloride and fluorine gas; wherein the rare gas is preferably one or the combination of helium, neon, argon, krypton, xenon or radon. In the adsorption test process, the radiation refrigeration coating effectively inhibits the photothermal conversion process of the adsorbent, and simultaneously can dissipate heat through self radiation, so that the adsorbent can be effectively controlled to be at a lower temperature which is favorable for the adsorption process.
The method for regulating the adsorption and desorption processes through radiation refrigeration and solar heating has the further technical scheme that the adsorbent is exposed to sunlight, and desorption purge gas is communicated for desorption, wherein the purge gas is one or the combination of high-purity gas, mixed gas and steam.
The method for regulating the adsorption and desorption processes through radiation refrigeration and solar heating has the further technical scheme that the solar heating comprises one or more of solar capture of an adsorbent, enhancement of solar heating effect through dyeing treatment and addition of additives with strong absorption capacity to solar radiation; the additive with strong absorption capacity to solar radiation is preferably noble metal nano-particles, low-dimensional materials, carbon fiber/gel, metal ceramics or photonic crystals.
Compared with the prior art, the invention has the following beneficial effects:
according to the method for regulating and controlling the adsorption and desorption processes through radiation refrigeration and solar heating, when the radiation refrigeration coating is arranged above the adsorbent, the temperature of the adsorbent below the coating can be effectively reduced in a mode of reflecting solar radiation and radiation heat, so that the gas adsorption process is carried out at a lower temperature; when the radiation refrigeration coating is under the adsorbent, the adsorbent can acquire energy from solar radiation to raise the temperature of the adsorbent, so that the gas desorption process is carried out at a higher temperature, and the relative position of the adsorbent and the radiation refrigeration coating can be changed through overturning in the adsorption and desorption process.
The invention utilizes solar energy to meet the energy required by the temperature rising or reducing process in the temperature swing adsorption technology. The scheme is simple and convenient, the problem of high energy consumption in the traditional adsorption and desorption process is avoided, the radiation refrigeration material is coupled with the adsorbent, the technical scheme capable of optimizing the adsorption and desorption process is constructed, and the whole process is respectively cooled and heated by radiation refrigeration and solar heating, so that the energy consumption requirement in the adsorption and separation process is remarkably reduced; meanwhile, the whole adsorption process and desorption process can be conveniently and continuously operated to carry out adsorption-desorption circulation.
Drawings
FIG. 1 is a schematic view of the adsorption and desorption process and device structure regulated and controlled by radiation refrigeration and solar heating according to the present invention
Detailed Description
The present invention is further illustrated by the following examples, which should not be construed as limiting the scope of the above-described subject matter of the present invention to the examples below.
In the examples: the method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating is characterized in that a radiation refrigeration coating is coupled with an adsorbent, and when the radiation refrigeration coating is exposed to sunlight above the adsorbent, the radiation refrigeration coating reduces the temperature of the adsorbent below in a mode of reflecting solar radiation and radiation heat, so that the gas adsorption process is carried out; when the radiation refrigeration coating is arranged below the adsorbent, the adsorbent is exposed to sunlight to obtain energy from solar radiation, the temperature of the adsorbent is raised, and therefore a gas desorption process is carried out. The device for coupling the radiation refrigeration coating with the adsorbent is a columnar adsorption tower made of quartz, the upper side and the lower side of the device can be transparent, the left side and the right side are provided with gas inlets and outlets, the powdered adsorbent is paved at the bottom of the device to be used as an adsorbent bed layer, a metal thin layer with the same area as the lower bottom surface of the device is used for pressing, then the radiation refrigeration coating with the same area is covered, and the radiation refrigeration coating is fixedly connected with the metal thin layer; the adsorption gas enters the device from the left side, passes through the adsorbent bed and enters the chromatogram from the right side for detection; after adsorption, turning device changes the relative position of adsorbent bed and radiation refrigeration coating, and at this moment, the radiation refrigeration coating is located the below of adsorbent bed, and the light and heat conversion characteristic of adsorbent under the sunlight makes the adsorbent temperature rise to realize quick desorption under inert gas's sweeping.
Example 1
Weighing 10g of 5A type molecular sieve subjected to high-temperature vacuum activation, coupling the molecular sieve with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 2
Weighing 10g of 5A type molecular sieve after high-temperature vacuum activation, coupling the molecular sieve with a coated phosphite crystal coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 3
Weighing 10g of 5A type molecular sieve after high-temperature vacuum activation, coupling the 5A type molecular sieve with the silver/silicon dioxide composite coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) Continuously until the temperature is stable, the radiation refrigeration coating is absorbingThe temperature of the adsorption section is above the adsorbent, and the temperature of the desorption section is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 4
Weighing 10g of activated carbon subjected to high-temperature vacuum activation, coupling the activated carbon with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the activated carbon in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 5
Weighing 10g of activated carbon subjected to high-temperature vacuum activation, coupling the activated carbon with a brushed polytetrafluoroethylene/silicon dioxide coating, filling the activated carbon in a standard quartz experimental device, and communicating nitrogen for blowing, wherein the flow rate of the nitrogen is 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 6
Weighing 10g of activated carbon subjected to high-temperature vacuum activation, coupling the activated carbon with a coated polydimethylsiloxane/silicon dioxide/silver coating, filling the coupled activated carbon in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent.The adsorption and desorption section temperatures are shown in table 1.
Example 7
Weighing 10g of nitrogen-doped porous carbon (PPy-650) subjected to high-temperature vacuum activation, coupling the carbon with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 8
Weighing 10g of HKUST-1 subjected to high-temperature vacuum activation, coupling the HKUST-1 with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coating in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 9
Weighing 10g of ZIF-8 subjected to high-temperature vacuum activation, coupling the ZIF-8 with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 10
Weighing 10g of MIL-100(Fe) subjected to high-temperature vacuum activation, coupling the MIL-100(Fe) with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 11
Weighing 10g of MIL-101(Cr) subjected to high-temperature vacuum activation, coupling with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 12
Weighing 10g of UiO-66 subjected to high-temperature vacuum activation, coupling the UiO-66 with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coating in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 13
Weighing 10g of MOF-74(Ni) subjected to high-temperature vacuum activation and brush-coated polyvinylidene fluorideAnd coupling the ethylene-hexafluoropropylene coating, filling the ethylene-hexafluoropropylene coating in a standard quartz experimental device, and communicating nitrogen for purging, wherein the flow rate of the nitrogen is 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 14
Weighing 10g of Ni-BDC subjected to high-temperature vacuum activation, coupling the Ni-BDC with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 15
Weighing 10g of PCN-245 after high-temperature vacuum activation, coupling the PCN-245 with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for blowing, wherein the flow rate of the nitrogen is 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 16
Weighing 10g of SIFIX-1 (Cu) subjected to high-temperature vacuum activation, coupling with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling into a standard quartz experimental device, communicating nitrogen for purging, and purgingThe flow rate was 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 17
Weighing 10g of ZIF-67 subjected to high-temperature vacuum activation, coupling the ZIF-67 with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 18
Weighing 10g of porous silicon dioxide subjected to high-temperature vacuum activation, coupling the porous silicon dioxide with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the porous silicon dioxide in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 19
Weighing 10g of alkaline alumina subjected to high-temperature vacuum activation, coupling the alkaline alumina with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. The temperature of the internal adsorbent is monitored in real time by using an external temperature measuring device,at the same time, the quartz device was placed on an aluminum film plate and moved to the sun to start the experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 20
Weighing 10g of metal organic polyhedron (NUT-101) subjected to high-temperature vacuum activation, coupling the metal organic polyhedron with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling into a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 21
Weighing 10g of hydrotalcite after high-temperature vacuum activation, coupling the hydrotalcite with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the hydrotalcite in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 22
Weighing 10g of attapulgite subjected to high-temperature vacuum activation, coupling the attapulgite with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupled attapulgite in a standard quartz experimental device, and communicating nitrogen for blowing at the nitrogen flow rate of 10 mL/min. The temperature of the internal adsorbent is monitored in real time by using an external temperature measuring device, and meanwhile, the quartz device is placed on an aluminum film plate and moved to the sun to start to be implementedAnd (6) testing. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 23
Weighing 10g of the ionic liquid-based metal organic framework/mesoporous silica composite material (MOF @ mSiO) after high-temperature vacuum activation2IL) and a brush-coated polyvinylidene fluoride-hexafluoropropylene coating are coupled, filled in a standard quartz experimental device, and purged by communicating nitrogen at the flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Example 24
Weighing 10g of nitrogen-doped porous carbon (NPC-800) subjected to high-temperature vacuum activation, coupling the nitrogen-doped porous carbon with a coated polyvinylidene fluoride-hexafluoropropylene coating, filling the coupling in a standard quartz experimental device, and communicating nitrogen for purging at the nitrogen flow rate of 10 mL/min. And (3) monitoring the temperature of the internal adsorbent in real time by using an external temperature measuring device, and simultaneously placing the quartz device on an aluminum film plate and moving the quartz device to the sun to start an experiment. Solar radiation (100 mW/cm)2) And the temperature is stable continuously, the temperature of the radiation refrigeration coating is the temperature of the adsorption section when the radiation refrigeration coating is above the adsorbent, and the temperature of the desorption section when the radiation refrigeration coating is below the adsorbent. The adsorption and desorption section temperatures are shown in table 1.
Table 1: data measured in examples 1 to 22
According to examples 1-3 and 4-6, the cooling effects of different radiation refrigeration coatings on the adsorbent under solar radiation are not greatly different, and the temperature difference of the desorption section of the same adsorbent under the same intensity illumination is not large.
The temperature of each adsorbent in the adsorption section is obtained according to the table 1, 3, 4, 7-24, and the temperatures of the adsorption sections are relatively close under the same radiation refrigeration coating. The desorption temperature mainly depends on the properties of various samples, such as color, dark-color adsorbents are obviously better than light-color adsorbents, and the light absorption performance of the materials, such as the color of the materials in special cases 7 and 8 is similar to that of part of special cases, but the temperature rise under solar radiation is obvious.
The results of the influence of solar radiation on the temperatures of the adsorption section and the desorption section shown in the examples 1-24 in the table 1 can be combined, so that the method is applicable to various adsorbent materials and various radiation refrigeration coatings, and the technology has better universality. Under the condition of not needing any external energy consumption, the temperature of the adsorption section and the desorption section can be regulated and controlled only by solar energy.
Example 25
And (3) carrying out gas absorption and desorption tests on part of the examples in the embodiments 1-24, wherein the flow rate of the test gas is 10mL/min, the gas absorption and desorption are detected by using a gas chromatograph, the detected external environment is a real solar radiation environment, the specific solar radiation intensity is detected in real time by using a light intensity densitometer, and the test data are shown in table 2.
Table 2: example 25 gas sorption and desorption test data
According to the results of the example 25 in table 2, the invention can realize the absorption and desorption processes of the gas by radiation refrigeration and solar heating regulation, and by taking the carbon dioxide, the olefin and the alkane as examples, the technical scheme can realize the variable temperature absorption and desorption processes of the gas without intervention of other extra energy.
Claims (10)
1. A method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating is characterized in that the method for regulating and controlling the adsorption and desorption process is to couple a radiation refrigeration coating with an adsorbent, and when the radiation refrigeration coating is exposed to sunlight above the adsorbent, the radiation refrigeration coating reduces the temperature of the adsorbent below in a mode of reflecting solar radiation and radiation heat, so as to carry out a gas adsorption process; when the radiation refrigeration coating is arranged below the adsorbent, the adsorbent is exposed to sunlight to obtain energy from solar radiation, the temperature of the adsorbent is raised, and therefore a gas desorption process is carried out.
2. The method for regulating and controlling the adsorption and desorption process by radiation refrigeration and solar heating according to claim 1, wherein the device for coupling the radiation refrigeration coating with the adsorbent is a columnar adsorption tower made of quartz, the upper side and the lower side of the device can be transparent, the left side and the right side of the device are provided with gas inlets and outlets, the powdered adsorbent is paved at the bottom of the device to be used as an adsorbent bed layer, the adsorbent bed layer is tightly pressed by a metal thin layer with the same area as the lower bottom surface of the device, and then the radiation refrigeration coating with the same area is covered on the metal thin layer to fixedly connect the radiation refrigeration coating with the metal thin layer; the adsorption gas enters the device from the left side, passes through the adsorbent bed and enters the chromatogram from the right side for detection; after adsorption, turning device changes the relative position of adsorbent bed and radiation refrigeration coating, and at this moment, the radiation refrigeration coating is located the below of adsorbent bed, and the light and heat conversion characteristic of adsorbent under the sunlight makes the adsorbent temperature rise to realize quick desorption under inert gas's sweeping.
3. The method for regulating adsorption and desorption processes through radiation refrigeration and solar heating as claimed in claim 2, wherein the adsorbents are activated under high temperature vacuum or high temperature inert gas and then coupled with the radiation refrigeration coating.
4. The method for regulating and controlling the adsorption and desorption process through radiation refrigeration and solar heating according to claim 1 or 2, wherein the radiation refrigeration coating is a micro-nano particle coating or a functional polymer material coating with a radiation refrigeration function.
5. The method for regulating and controlling the adsorption and desorption process by radiation refrigeration and solar heating according to claim 4, wherein the micro-nano particles are one or a combination of silicon dioxide, titanium dioxide, phosphite crystals, silver nano particles or aluminum; the functional polymer material is one or the combination of polyethylene oxide, polyvinylidene fluoride-hexafluoropropylene, polydimethylsiloxane or polymethylpentene.
6. The method for regulating and controlling the adsorption and desorption process by radiation refrigeration and solar heating according to claim 1 or 2, wherein the adsorbent is one or a combination of zeolite molecular sieve, clay mineral, oxide, activated carbon, metal organic framework material, covalent organic framework material, metal organic polyhedron/cage/complex, polymer, ionic liquid or porous carbon material.
7. The method for regulating and controlling the adsorption and desorption process by radiation refrigeration and solar heating according to claim 6, wherein the zeolite molecular sieve is preferably one or a combination of zeolite molecular sieves of A type, X type, Y type or ZSM type; the clay mineral is preferably one or a combination of attapulgite, montmorillonite, bentonite, kaolin, hydrotalcite, illite or sepiolite clay; the oxide is preferably one or the combination of silicon oxide, aluminum oxide, titanium oxide and zirconium oxide; the metal/covalent organic framework material is preferably one or the combination of MOF series, MIL series, PCN series, ZIF series, PCP series, UiO series, HKUST series, KAUST series, SIFIX series, NU series, COFs series or NOT series; the metal organic polyhedron/cage/complex polymer is one or the combination of MOPs series, MOCs series and MOCPs series; the polymer is one or the combination of nitrogen-rich conjugated microporous polymer, POPs series porous organic polymer and NUT series nitrogen-containing polymer; the ionic liquid is one or the combination of an ionic liquid-based porous material and polyionic liquid nanofiber; the porous carbon material is one or the combination of NPC nitrogen-doped porous carbon and porous material carbonized derivatives.
8. The method according to claim 1 or 2, wherein the radiation refrigeration coating is exposed to sunlight and is connected with an adsorption gas for adsorption test, and the gas is one or a combination of olefin, alkane, alkyne, nitrogen, hydrogen, oxygen, sulfur oxide, nitrogen oxide, carbon oxide, water vapor, organic vapor, rare gas, chlorine, ammonia, hydrogen sulfide, hydrogen chloride and fluorine.
9. The method for regulating and controlling the adsorption and desorption process by radiation refrigeration and solar heating according to claim 1 or 2, wherein the adsorbent is exposed to sunlight and is desorbed by being communicated with desorption purge gas, and the purge gas is one of high-purity gas, mixed gas and steam or a combination thereof.
10. The method for regulating the absorption and desorption process through radiation refrigeration and solar heating according to claim 1 or 2, wherein the solar heating process comprises one or more of capturing solar energy by an adsorbent, enhancing the solar heating effect through dyeing treatment, and adding additives with strong absorption capacity to solar radiation.
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