CN113684480A - Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating - Google Patents

Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating Download PDF

Info

Publication number
CN113684480A
CN113684480A CN202110941528.9A CN202110941528A CN113684480A CN 113684480 A CN113684480 A CN 113684480A CN 202110941528 A CN202110941528 A CN 202110941528A CN 113684480 A CN113684480 A CN 113684480A
Authority
CN
China
Prior art keywords
chemical nickel
stability
treatment
iron boron
neodymium iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110941528.9A
Other languages
Chinese (zh)
Inventor
唐金华
周小雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hangzhou Xiangxian Technology Co ltd
Original Assignee
Hangzhou Xiangxian Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hangzhou Xiangxian Technology Co ltd filed Critical Hangzhou Xiangxian Technology Co ltd
Priority to CN202110941528.9A priority Critical patent/CN113684480A/en
Publication of CN113684480A publication Critical patent/CN113684480A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1637Composition of the substrate metallic substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/001Magnets
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/026Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Molecular Biology (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The invention discloses a process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating, which comprises the steps of pretreating neodymium iron boron, then carrying out electro-coppering treatment on the surface of the neodymium iron boron, and then carrying out activation treatment; carrying out flash plating and nickel electroplating treatment on the outer surface of the copper plating layer of the neodymium iron boron, and then carrying out activation treatment again; preparing chemical nickel plating solution in a plating bath, firstly measuring the stability of the chemical nickel plating solution, if the stability is qualified, normally using the solution, if the stability is unqualified, adding a stabilizer, and after the regulation and control stability is qualified, normally using the solution; and finally, carrying out chemical nickel plating treatment in the chemical nickel plating solution after the stability of testing or regulation and control to form a chemical nickel plating layer, namely finishing the treatment. The method can adjust the chemical nickel plating solution with poor stability in time, and if the measured result shows that the chemical nickel is unqualified in stability, the stability of the chemical nickel plating solution is improved by adding the stabilizer, the service life of the chemical nickel plating solution is prolonged, and the cost is saved.

Description

Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating
Technical Field
The invention belongs to the technical field of metal surface treatment, and particularly relates to a process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating.
Background
At present, the neodymium iron boron permanent magnet material is used as a magnetic material with high magnetic performance and high cost performance, and is widely applied to a plurality of fields such as electronic machinery, medical equipment and the like. However, because of some characteristics of the ndfeb substrate, such as easy oxidation of the substrate, porous and loose substrate, etc., the surface treatment of the ndfeb substrate has been a difficulty.
The novel neodymium iron boron magnet is a third-generation rare earth material, is a magnetic functional material, has poor corrosion resistance and is easy to be affected by temperature. By adopting the composite plating process, a plating layer with excellent corrosion resistance and small thermal demagnetization scene response on the magnet can be formed on the surface of the neodymium iron boron magnet.
In the prior art, in the surface treatment process of the neodymium iron boron, copper plating treatment and chemical nickel plating treatment are generally required to be performed on the surface of a neodymium iron boron substrate, and a nickel plating solution is adopted in the chemical nickel plating process. However, the stability of the chemical nickel plating solution affects the plating effect of the plating layer, the service life of the bath solution and other problems, and adverse factors such as too high local temperature, too high pH, too high nickel salt concentration and the like of the chemical nickel plating solution are all easy to generate particle precipitates such as nickel phosphite or nickel hydroxide and the like in the chemical nickel plating solution, and the particle precipitates have a certain autocatalysis effect, and when a certain amount is reached, the plating solution is caused to self-decompose, so that the chemical nickel plating solution is invalid, and therefore, the monitoring process of the stability of the chemical nickel plating solution is of great importance. In the chemical nickel treatment process, technical information of poor stability or insufficient stability of a chemical nickel plating solution needs to be monitored in time so as to replace or maintain the electroplating bath solution in time, and then a qualified electroplated product is obtained.
Disclosure of Invention
Aiming at the technical problems in the prior art, the application aims to provide a process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating.
The process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating is characterized by comprising the following steps of:
1) pretreating neodymium iron boron;
2) performing electro-coppering treatment on the surface of the pretreated neodymium iron boron to form a copper plating layer, and then performing activation treatment;
3) carrying out flash plating and nickel electroplating treatment on the outer surface of the neodymium iron boron copper plating layer to form an electroplated nickel plating layer, and then carrying out activation treatment again;
4) preparing chemical nickel plating solution in a plating bath, firstly measuring the stability of the chemical nickel plating solution, normally using the solution if the stability is qualified, adding a stabilizer if the stability is unqualified, and normally using the solution after the regulation and control stability is qualified; and (3) putting the product subjected to the activation treatment in the step 3) into chemical nickel plating solution subjected to testing or regulation and control stabilization to perform chemical nickel plating treatment to form a chemical nickel plating layer, namely finishing the treatment.
The process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating is characterized in that in the step 1), the process for pretreating neodymium iron boron is as follows: firstly, washing and degreasing the neodymium iron boron by using a surfactant solution, then fully washing the neodymium iron boron by using clear water, pickling the neodymium iron boron by using dilute nitric acid with the concentration of 3-5% for 3-5 minutes, and then washing the neodymium iron boron by using the clear water for 2-3 times.
The process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating is characterized in that the step 2) of electroplating copper treatment comprises two electroplating processes which are sequentially carried out, and the two electroplating processes are respectively as follows:
the first step is pre-copper plating treatment, and the plating solution for the pre-copper plating treatment comprises the following components: 3-5g/L, HEDP 100 g/140 g/L of copper carbonate, 60-80g/L of potassium carbonate, 0.02-0.04g/L of bismuth nitrate and 0.003-0.006g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 18-22 ℃, the pH value is 9.3-9.9, the current density is 0.3-0.5ASD, and the electroplating time is 40-60 min;
the second step is the treatment of electroplating thickened copper layer, and the plating solution comprises the following components: 13-15g/L, HEDP 140g/L of copper carbonate, 60-80g/L of potassium carbonate, 0.02-0.04g/L of bismuth nitrate and 0.003-0.006g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 50-60 ℃, the pH value is 9.3-9.9, the current density is 0.2-0.4ASD, and the electroplating time is 50-70 min.
The process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating is characterized in that in the pre-copper plating treatment or the treatment of electroplating a thickened copper layer, the polycation quaternary ammonium salt is polyquaternium-7, polyquaternium-10 or polyquaternium-22.
The process for regulating and controlling the stability of the chemical nickel in the neodymium iron boron electroplating is characterized in that in the step 2) or the step 3), the activation treatment step is as follows: and (3) washing and activating for 30-60 s by using a citric acid solution with the mass concentration of 2-3%, and then fully washing by using clear water.
The process for regulating and controlling the stability of chemical nickel in neodymium iron boron electroplating is characterized in that in the step 3), the plating solution for flash plating nickel electroplating treatment comprises 300-350 g/L of nickel sulfate, 40-50 g/L of nickel chloride and 40-50 g/L of boric acid; the flash plating nickel electroplating treatment process comprises the following steps: the pH value is 3.8-4.4, the temperature is 50-60 ℃, the current density is 0.2-0.4ASD, and the time is 8-15 min.
The process for regulating and controlling the stability of the chemical nickel in the neodymium iron boron electroplating is characterized in that in the step 4), the chemical nickel plating solution comprises the following components: 20-25 g/L of nickel sulfate, 18-23 g/L of sodium hypophosphite, 10-15 g/L of citric acid, 8-12 g/L of malic acid, 16-24 g/L, PPS-OH 0.005-0.01 g/L of sodium hydroxide, 0.002-0.007 g/L of allyl iodide and 3-4 mg/L of stabilizer; the chemical nickel plating treatment process comprises the following steps: the temperature is 80-90 ℃, the pH value is 4.3-4.9, and the treatment time is 25-35 min.
In the formula composition of the chemical nickel plating solution, the stabilizer has the action principle that the stabilizer is adsorbed on the surfaces of colloidal particles in the plating solution and occupies active centers on the surfaces of the colloidal particles, so that nickel is prevented from being deposited on the particles, and therefore, a certain amount of the stabilizer needs to be added into the formula composition of the chemical nickel plating solution. However, the content of the chemical nickel plating solution is not too high, otherwise, the chemical nickel deposition rate is inhibited during the chemical nickel plating treatment, even the chemical nickel plating solution does not start plating, and a stable chemical nickel plating layer cannot be formed on the surface of the neodymium iron boron.
The process for regulating and controlling the stability of the chemical nickel in the neodymium iron boron electroplating is characterized in that the stabilizer is thiourea.
The process for regulating and controlling the stability of the chemical nickel in the neodymium iron boron electroplating is characterized in that the method for measuring the stability of the chemical nickel plating solution comprises the following steps: adding 100ml of chemical nickel plating solution into a beaker, heating to 80-90 ℃, dropwise adding a palladium chloride solution with the Pd concentration of 20ppm into the beaker by using a dropper while stirring until the chemical nickel plating solution becomes turbid due to self-reaction, and recording the volume of the consumed palladium chloride solution; if the volume of the consumed palladium chloride solution is more than or equal to 1.5ml, the content of free thiourea in the chemical nickel plating solution is more than 3mg/L, the chemical nickel plating solution is determined to be qualified in stability, otherwise, the chemical nickel plating solution is determined to be unqualified in stability, then the stabilizer is added into the chemical nickel plating solution for stability regulation and control until the measured stability is qualified, and then the subsequent chemical nickel plating treatment operation is carried out.
The principle of the invention for determining the stability of the chemical nickel plating solution is as follows: when the palladium chloride solution is dropped into the electroless nickel plating solution in the case where the free stabilizer (thiourea) in the electroless nickel plating solution is sufficient, the colloidal palladium is adsorbed by the stabilizer (thiourea) in the plating solution, thereby preventing the spontaneous reaction of the plating solution. With the continuous dropping of the palladium chloride solution, the addition of the colloidal palladium enables the free thiourea to be continuously adsorbed and combined with the colloidal palladium, the free thiourea in the plating solution is consumed, and after the consumption of the free thiourea is finished, the plating solution starts to decompose automatically under the catalytic action of the palladium, so that the chemical nickel plating solution becomes turbid through self reaction. The method of the invention can calculate the content of free stabilizer (thiourea) in the plating solution by measuring and dropping the palladium chloride solution, thereby judging the stability of the chemical nickel plating solution.
Compared with the prior art, the technical effect that this application gained is:
the stability of the nickel plating solution in the chemical nickel plating process affects the plating effect of the plating layer, the service life of the bath solution and the like, and the poor stability of the chemical nickel plating solution easily causes the precipitation of nickel metal in the plating bath, so that the chemical nickel plating solution is ineffective. The method can quickly determine the stability of the chemical nickel plating solution in neodymium iron boron electroplating, can adjust the chemical nickel plating solution with poor stability in time, and can improve the stability of the chemical nickel plating solution in a mode of adding a stabilizer if the measured result shows that the chemical nickel is unqualified in stability, prolong the service life of the chemical nickel plating solution and save the cost.
Detailed Description
The present invention is further illustrated by the following examples, which should not be construed as limiting the scope of the invention.
Example 1:
a process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating comprises the following steps:
1) pre-treating neodymium iron boron
Firstly, washing neodymium iron boron by using a soap solution with the mass concentration of 2%, then ultrasonically cleaning the neodymium iron boron twice by using clear water, then pickling the neodymium iron boron for 3 minutes by using dilute nitric acid with the concentration of 4%, and ultrasonically cleaning the neodymium iron boron twice by using the clear water;
2) electrolytic copper plating treatment
Carrying out electro-coppering treatment on the surface of the pretreated neodymium iron boron, comprising two electroplating processes which are carried out in sequence, wherein the two electroplating processes are respectively as follows:
the first step is pre-copper plating treatment, and the plating solution for the pre-copper plating treatment comprises the following components: 4g/L, HEDP 120g/L of copper carbonate, 70g/L of potassium carbonate, 0.03g/L of bismuth nitrate and 0.005g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 20 ℃, the pH value is about 9.6, the current density is 0.4ASD, and the electroplating time is 50 min;
the second step is the treatment of electroplating thickened copper layer, and the plating solution comprises the following components: 14g/L, HEDP 150g/L of copper carbonate, 70g/L of potassium carbonate, 0.03g/L of bismuth nitrate and 0.005g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 55 ℃, the pH value is about 9.6, the current density is 0.3ASD, and the electroplating time is 60 min;
the polycation quaternary ammonium salt adopts polyquaternium-7.
After the copper electroplating treatment is carried out in two steps, the activation treatment is carried out, and the process comprises the following steps: washing and activating with 3% citric acid solution for 50s, and washing with clear water.
3) Flash nickel electroplating
Carrying out flash plating nickel electroplating treatment on the outer surface of the copper plating layer of the neodymium iron boron, wherein the plating solution of the flash plating nickel electroplating treatment comprises 320g/L of nickel sulfate, 45g/L of nickel chloride and 45g/L of boric acid; the flash plating nickel electroplating treatment process comprises the following steps: the pH value is 4.0-4.2, the temperature is 55 ℃, the current density is 0.3ASD, and the electroplating time is 10 min;
after the flash plating nickel electroplating treatment, the activation treatment is carried out, and the process is as follows: washing and activating with 3% citric acid solution for 50s, and washing with clear water.
4) Chemical nickel treatment
Preparing an electroless nickel plating solution in a plating tank, wherein the electroless nickel plating solution comprises the following components: 23g/L of nickel sulfate, 20g/L of sodium hypophosphite, 12g/L of citric acid, 10g/L of malic acid, 20g/L, PPS-OH 0.008g/L of sodium hydroxide, 0.005g/L of allyl iodide and 3.0mg/L of thiourea as a stabilizer. And then carrying out chemical nickel treatment on the neodymium iron boron treated in the step 3) by using a chemical nickel plating solution in a plating bath, wherein the treatment process conditions are as follows: the temperature is 85 ℃, the pH value is 4.5-4.7, and the treatment time is 30 min; and after the treatment is finished, the final surface-treated neodymium iron boron product is obtained, and the appearance of the product is bright silver and the surface of the product is smooth.
And then measuring the stability of the chemical nickel plating solution in the plating tank, wherein the measuring method comprises the following steps: 100ml of chemical nickel plating solution is taken into a beaker, the chemical nickel plating solution is heated to the required temperature of 85 ℃, a palladium chloride aqueous solution with 20ppm of Pd concentration is dripped into the beaker by a dropper with stirring until the chemical nickel plating solution becomes turbid due to self-reaction, the volume of the used palladium chloride solution is recorded to be 1.5ml (1.5 ml of the palladium chloride solution with 20ppm of Pd concentration is consumed, namely 0.03mg of colloid-containing palladium, free thiourea in the chemical nickel plating solution is obtained by calculation =3 mg/L), and the stability result is qualified.
The cross section of the final surface-treated neodymium iron boron product obtained in example 1 is observed through a scanning electron microscope, and the thicknesses of the pre-copper plating layer, the thickened copper layer, the electroplated nickel plating layer and the chemical nickel plating layer plated on the surface of the neodymium iron boron substrate are respectively 1 μm, 2 μm, 0.3 μm and 2.7 μm.
The final surface treated nd fe-b product obtained in example 1 was subjected to a neutral salt spray test (NSS) according to section 8 of standard GBT 10125-. The test specimen was left in 10 portions and observed every 24 hours. The test result shows that the surface of the neodymium iron boron magnet obtained by the neodymium iron boron surface treatment method of the embodiment 1 has no white rust after the salt spray test is carried out for 80 hours, and the salt spray test can reach more than 80 hours. After 100 hours, the color of each sample is unchanged, the surface of the coating is still good, after 120 hours, the surface of the coating has no white rust, and after 180 hours, the surface of the coating begins to have a little white rust.
Comparative example 1:
the neodymium iron boron permanent magnet sample is plated, the process steps are repeated in the embodiment 1, the difference is only that the process of the step 4) of the comparative example 1 is different from that of the embodiment 1, and the other conditions are the same as the embodiment 1.
Comparative example 1, step 4) the procedure of the chemical nickel treatment was as follows:
preparing an electroless nickel plating solution in a plating tank, wherein the electroless nickel plating solution comprises the following components: 23g/L of nickel sulfate, 20g/L of sodium hypophosphite, 12g/L of citric acid, 10g/L of malic acid, 20g/L, PPS-OH 0.008g/L of sodium hydroxide, 0.005g/L of allyl iodide and 1.0mg/L of thiourea as a stabilizer. And then carrying out chemical nickel treatment on the neodymium iron boron subjected to the flash plating nickel electroplating treatment by using a chemical nickel plating solution in a plating tank, wherein the treatment process conditions are as follows: the temperature is 95 ℃, and the pH value is 4.5-4.7. Because the stability of the chemical nickel plating solution is reduced, the plating speed is accelerated, and the plating time required for obtaining the chemical nickel plating layer with the same thickness is reduced from 30min to 18 min. The stability of the electroless nickel plating solution in the plating tank is measured at this time by the following method: 100ml of chemical nickel plating solution is taken into a beaker, the chemical nickel plating solution is heated to the required temperature of 95 ℃, a palladium chloride aqueous solution with 20ppm of Pd concentration is dripped into the beaker by a dropper while stirring until the chemical nickel plating solution becomes turbid due to self-reaction, the volume of the used palladium chloride solution is recorded as 1.1ml, and the chemical nickel plating solution is judged to be unqualified in stability.
The final surface treated nd fe-b product obtained in example 1 was subjected to a neutral salt spray test (NSS) according to section 8 of standard GBT 10125-. The test specimen was left in 10 portions and observed every 24 hours. The test result shows that:
the neodymium iron boron magnet obtained by the neodymium iron boron surface treatment method of the comparative example 1 has no white rust on the surface after 24 hours of salt spray test, and the salt spray test can reach more than 48 hours. After 48 hours, the surface of the plating layer had no white rust, and after 72 hours, a little white rust began to appear on the surface of the plating layer.
The statements in this specification merely set forth a list of implementations of the inventive concept and the scope of the present invention should not be construed as limited to the particular forms set forth in the examples.

Claims (8)

1. A process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating is characterized by comprising the following steps:
1) pretreating neodymium iron boron;
2) performing electro-coppering treatment on the surface of the pretreated neodymium iron boron to form a copper plating layer, and then performing activation treatment;
carrying out flash plating and nickel electroplating treatment on the outer surface of the neodymium iron boron copper plating layer to form an electroplated nickel plating layer, and then carrying out activation treatment again;
4) preparing chemical nickel plating solution in a plating bath, firstly measuring the stability of the chemical nickel plating solution, normally using the solution if the stability is qualified, adding a stabilizer if the stability is unqualified, and normally using the solution after the regulation and control stability is qualified; and (3) putting the product subjected to the activation treatment in the step 3) into chemical nickel plating solution subjected to testing or regulation and control stabilization to perform chemical nickel plating treatment to form a chemical nickel plating layer, namely finishing the treatment.
2. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 1, wherein in the step 1), the process for pretreating neodymium iron boron comprises the following steps: firstly, washing and degreasing the neodymium iron boron by using a surfactant solution, then fully washing the neodymium iron boron by using clear water, pickling the neodymium iron boron by using dilute nitric acid with the concentration of 3-5% for 3-5 minutes, and then washing the neodymium iron boron by using the clear water for 2-3 times.
3. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 1, wherein the step 2) of electro-coppering treatment comprises two electroplating processes performed in sequence, respectively as follows:
the first step is pre-copper plating treatment, and the plating solution for the pre-copper plating treatment comprises the following components: 3-5g/L, HEDP 100 g/140 g/L of copper carbonate, 60-80g/L of potassium carbonate, 0.02-0.04g/L of bismuth nitrate and 0.003-0.006g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 18-22 ℃, the pH value is 9.3-9.9, the current density is 0.3-0.5ASD, and the electroplating time is 40-60 min;
the second step is the treatment of electroplating thickened copper layer, and the plating solution comprises the following components: 13-15g/L, HEDP 140g/L of copper carbonate, 60-80g/L of potassium carbonate, 0.02-0.04g/L of bismuth nitrate and 0.003-0.006g/L of polycation quaternary ammonium salt; the electroplating process comprises the following steps: the temperature is 50-60 ℃, the pH value is 9.3-9.9, the current density is 0.2-0.4ASD, and the electroplating time is 50-70 min.
4. The process of claim 3, wherein in the pre-copper plating treatment or the treatment of plating the thickened copper layer, the polycationic quaternary ammonium salt is polyquaternium-7, polyquaternium-10 or polyquaternium-22.
5. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 1, wherein in the step 2) or the step 3), the step of activation treatment is as follows: and (3) washing and activating for 30-60 s by using a citric acid solution with the mass concentration of 2-3%, and then fully washing by using clear water.
6. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 1, wherein in the step 3), the plating solution composition of the flash plating nickel electroplating treatment comprises 300-350 g/L of nickel sulfate, 40-50 g/L of nickel chloride and 40-50 g/L of boric acid; the flash plating nickel electroplating treatment process comprises the following steps: the pH value is 3.8-4.4, the temperature is 50-60 ℃, the current density is 0.2-0.4ASD, and the time is 8-15 min.
7. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 1, wherein in the step 4), the chemical nickel plating solution comprises the following components: 20-25 g/L of nickel sulfate, 18-23 g/L of sodium hypophosphite, 10-15 g/L of citric acid, 8-12 g/L of malic acid, 16-24 g/L, PPS-OH 0.005-0.01 g/L of sodium hydroxide, 0.002-0.007 g/L of allyl iodide and 3-4 mg/L of thiourea as a stabilizer; the chemical nickel plating treatment process comprises the following steps: the temperature is 80-90 ℃, the pH value is 4.3-4.9, and the treatment time is 25-35 min.
8. The process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating according to claim 6, wherein the method for measuring the stability of the chemical nickel plating solution comprises the following steps: adding 100ml of chemical nickel plating solution into a beaker, heating to 80-90 ℃, dropwise adding a palladium chloride solution with the Pd concentration of 20ppm into the beaker by using a dropper while stirring until the chemical nickel plating solution becomes turbid due to self-reaction, and recording the volume of the consumed palladium chloride solution; if the volume of the consumed palladium chloride solution is more than or equal to 1.5ml, the content of free thiourea in the chemical nickel plating solution is more than 3mg/L, the chemical nickel plating solution is determined to be qualified in stability, otherwise, the chemical nickel plating solution is determined to be unqualified in stability, then the stabilizer is added into the chemical nickel plating solution for stability regulation and control until the measured stability is qualified, and then the subsequent chemical nickel plating treatment operation is carried out.
CN202110941528.9A 2021-08-17 2021-08-17 Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating Pending CN113684480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110941528.9A CN113684480A (en) 2021-08-17 2021-08-17 Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110941528.9A CN113684480A (en) 2021-08-17 2021-08-17 Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating

Publications (1)

Publication Number Publication Date
CN113684480A true CN113684480A (en) 2021-11-23

Family

ID=78580163

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110941528.9A Pending CN113684480A (en) 2021-08-17 2021-08-17 Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating

Country Status (1)

Country Link
CN (1) CN113684480A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165218A (en) * 2004-12-07 2006-06-22 Shin Etsu Chem Co Ltd Rtmb-based rare earth permanent magnet and manufacturing method therefor
CN102568732A (en) * 2012-02-22 2012-07-11 沈阳中北通磁科技股份有限公司 NdFeB (neodymium iron boron) permanent magnet material with multilayer structure and preparation process thereof
CN104073849A (en) * 2014-07-11 2014-10-01 湖南纳菲尔新材料科技股份有限公司 Technique for electroplating nickel-tungsten-phosphorus on surface of sintered neodymium-iron-boron magnet
JP2016074943A (en) * 2014-10-06 2016-05-12 新日鐵住金株式会社 Thick steel plate
CN112458502A (en) * 2020-09-30 2021-03-09 杭州象限科技有限公司 Electroplating method of ultrathin coating for neodymium iron boron
CN112899684A (en) * 2020-08-21 2021-06-04 天津京磁电子元件制造有限公司 Neodymium iron boron magnet copper nickel electroplating process

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006165218A (en) * 2004-12-07 2006-06-22 Shin Etsu Chem Co Ltd Rtmb-based rare earth permanent magnet and manufacturing method therefor
CN102568732A (en) * 2012-02-22 2012-07-11 沈阳中北通磁科技股份有限公司 NdFeB (neodymium iron boron) permanent magnet material with multilayer structure and preparation process thereof
CN104073849A (en) * 2014-07-11 2014-10-01 湖南纳菲尔新材料科技股份有限公司 Technique for electroplating nickel-tungsten-phosphorus on surface of sintered neodymium-iron-boron magnet
JP2016074943A (en) * 2014-10-06 2016-05-12 新日鐵住金株式会社 Thick steel plate
CN112899684A (en) * 2020-08-21 2021-06-04 天津京磁电子元件制造有限公司 Neodymium iron boron magnet copper nickel electroplating process
CN112458502A (en) * 2020-09-30 2021-03-09 杭州象限科技有限公司 Electroplating method of ultrathin coating for neodymium iron boron

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
赵涛等: ""氯化钯实验评价化学镀镍溶液稳定性的方法与优化"" *

Similar Documents

Publication Publication Date Title
US3870526A (en) Electroless deposition of copper and copper-tin alloys
CN109518237B (en) Zinc-nickel-phosphorus electroplating solution, preparation method thereof and electroplating method
US4824490A (en) Process of producing phosphate coatings on metals
JP4790191B2 (en) Electrolytic bath for electrochemical deposition of palladium or its alloys
US2812299A (en) Electrolytic deposition of gold and gold alloys
US9206321B2 (en) Trivalent chromium-conversion processing solution containing aluminum-modified colloidal silica
WO2009139384A1 (en) Copper‑zinc alloy electroplating bath and plating method using same
CN111235609A (en) Cyanide-free silver plating solution, silver plating layer and preparation method thereof
KR20150093214A (en) Process for metallizing nonconductive plastic surfaces
CN113684480A (en) Process for regulating and controlling chemical nickel stability in neodymium iron boron electroplating
CN113463147A (en) Carbon steel surface cyanide-free gold-imitating copper-zinc-tin alloy electroplating process
JPH0436498A (en) Surface treatment of steel wire
CN112458502A (en) Electroplating method of ultrathin coating for neodymium iron boron
RU2343222C1 (en) Technique of chemical plating made from alloy nickel-copper-phosphorus
TW202028526A (en) Electroless Ni-Fe alloy plating solution
US4615774A (en) Gold alloy plating bath and process
CN107974674A (en) Pollution-free environmental protection nickel plating liquid, its preparation method and its application method
JP3033455B2 (en) Electroless nickel plating of aluminum
US2871172A (en) Electro-plating of metals
CN110592627A (en) Cyanide-free imitation gold electroplating solution and magnesium alloy electroplating process thereof
US4983262A (en) Conversion composition and process
CN115573015B (en) Electrolytic phosphating solution and preparation method thereof
CN115323362A (en) Surface treatment method for aluminum alloy part and aluminum alloy product
JPS63297577A (en) Surface structure of steel material strengthened in physical property and its production
JP2741070B2 (en) Electroless nickel plating method for zinc or zinc alloy

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination