CN113629035A - Electric fuse structure and forming method thereof - Google Patents

Electric fuse structure and forming method thereof Download PDF

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Publication number
CN113629035A
CN113629035A CN202010388165.6A CN202010388165A CN113629035A CN 113629035 A CN113629035 A CN 113629035A CN 202010388165 A CN202010388165 A CN 202010388165A CN 113629035 A CN113629035 A CN 113629035A
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China
Prior art keywords
region
cut
fuse
mask layer
forming
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CN202010388165.6A
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Chinese (zh)
Inventor
余达强
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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Priority to CN202010388165.6A priority Critical patent/CN113629035A/en
Publication of CN113629035A publication Critical patent/CN113629035A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
    • H01L23/5256—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528—Geometry or layout of the interconnection structure
    • H01L23/5283—Cross-sectional geometry

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Fuses (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

An electrical fuse structure and a method of forming the same, the electrical fuse structure comprising: the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extending direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions. By the scheme, the performance of the electric fuse structure can be improved.

Description

Electric fuse structure and forming method thereof
Technical Field
The present invention relates to the field of semiconductor integrated circuits, and more particularly, to an electrical fuse structure and a method for forming the same.
Background
With the improvement of the semiconductor process level and the increase of the complexity of the integrated circuit, the fuse element is widely applied to various integrated circuits. Among them, a fuse that is broken by passing a current or blowing is called an electric fuse (e-fuse).
A particular use is achieved by selectively blowing fuses in an integrated circuit that has multiple potential uses. For example, fuse structures are used to connect redundant circuits (redundancy circuits) in integrated circuits, and when a circuit is defective, a fuse link in the fuse structure is blown to repair or replace the defective circuit with the redundant circuit. Fuse structure is also often used in memory, and when the memory chip is produced, the fuse structure can replace the memory cell with redundant memory cell to realize the repair. In addition, fuse structures are also commonly used in programmable circuits to program standard logic cells in the circuits to achieve specific functions.
However, the performance of the existing electrical fuse structure still needs to be improved.
Disclosure of Invention
The invention provides an electric fuse structure and a forming method thereof, which are used for improving the performance of the electric fuse structure.
In order to solve the above problems, the present invention provides an electrical fuse structure including: the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extension direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions; and the plugs are respectively connected with the electrode regions on two sides of the fusing region.
Optionally, the cutout region and the connection region enclose a cut therebetween, and the cut includes a first sidewall exposing the cutout region and a second sidewall of the connection region.
Optionally, the cut comprises a first cut; the first notch is located on a first side of two sides of the fusing region in a width direction of the fusing region.
Optionally, the cut-out further comprises a second cut-out; the second notch is positioned on a second side of two sides of the fusing area along the width direction of the fusing area, and the second side is opposite to the first side; the second notch and the first notch have a preset first distance in the extending direction of the fusing area.
Optionally, the first pitch is smaller than a width of the kerf region exposed by the first kerf and smaller than a width of the kerf region exposed by the second kerf.
Optionally, the first cutout and the second cutout have the same or different sizes in the width direction of the fuse region.
Optionally, the cut-outs comprise a third cut-out and a fourth cut-out; the third cut and the fourth cut are arranged oppositely in the width direction of the cutting area, and a preset second distance is reserved between the third cut and the fourth cut in the width direction of the fusing area.
Optionally, the electrical fuse structure further includes a substrate and a dielectric layer; the fuse link and the plug are located in the dielectric layer.
Optionally, the electrode regions on two sides of the fusing region are an anode region and a cathode region respectively; the plug comprises a first plug and a second plug;
the first plug is connected with the anode region and is positioned above the anode region; the first plug is also used for being connected with the upper metal layer;
the second plug is connected with the cathode region and is positioned above or below the cathode region; the second plug is also used for connecting with a working device.
Optionally, the first plug and the second plug are respectively arranged in an array.
Optionally, the method further comprises: and the dummy metal interconnection lines are positioned on two sides of the fuse link along the width direction of the fuse link, are not electrically connected, and are separated from the fuse link. Optionally, the width of the connection region and the width of the electrode region coincide.
The embodiment of the invention also provides a method for forming the electric fuse structure, which comprises the following steps:
providing a substrate;
forming a fuse link and a plurality of discrete plugs on the substrate; the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extending direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions.
Optionally, the cutout region and the connection region enclose a cut therebetween, and the cut includes a first sidewall exposing the cutout region and a second sidewall of the connection region.
Optionally, the method of forming the fuse link includes: forming a first dielectric layer on the substrate; forming a cutting mask layer on the first medium layer, wherein the cutting mask layer is used for defining the position of the cut; forming a patterned first mask layer covering the first dielectric layer and part of the cutting mask layer, wherein the patterned first mask layer is provided with a first opening; etching the first dielectric layer by taking the first mask layer and the cutting mask layer as masks, and forming a first groove in the first dielectric layer; after a first groove is formed, removing the first mask layer and the cutting mask layer; and after removing the first mask layer and the cutting mask layer, filling a metal material in the first groove to form the fuse link.
Optionally, the cut comprises a first cut; the first notch is positioned on a first side of two sides of the fusing area along the width direction of the fusing area; the cut mask layer includes a first cut mask layer for defining a location of the first cut.
Optionally, the cut-out further comprises a second cut-out; the second notch is positioned on a second side of two sides of the fusing area along the width direction of the fusing area, and the second side is opposite to the first side; the second notch and the first notch have a preset first distance in the extending direction of the fusing area; the kerf mask layer includes a second kerf mask layer for defining a location of the second kerf.
Optionally, the method further comprises forming a dummy metal interconnection line in the process of forming the fuse link, wherein the dummy metal interconnection line comprises a first dummy metal interconnection line and a first dummy metal interconnection line, the first dummy metal interconnection line and the first dummy metal interconnection line are separated from each other, and the dummy metal interconnection line is not electrically connected.
Optionally, the patterned first mask layer further has a first interconnect mask opening for defining a position of a first dummy metal interconnect; etching the first dielectric layer by taking the first mask layer and the cutting mask layer as masks, and forming a first interconnection groove in the first dielectric layer; after removing the first mask layer and the cutting mask layer, forming a second interconnection groove in the first dielectric layer; the metal material is further filled in the first interconnection groove and the second interconnection groove to form a first dummy metal interconnection line and a second dummy metal interconnection line, respectively.
Compared with the prior art, the technical scheme of the invention has the following advantages:
in the above aspect, the electrical fuse structure includes: the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extension direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions; the width of the cutting region is smaller than that of the connecting region, so that the fusing position of the electric fuse can be limited at the position of the cutting region, the working reliability of the fuse link can be improved, and the performance of the electric fuse structure is improved.
Drawings
FIG. 1 is a schematic diagram of a top view of an electrical fuse structure;
FIG. 2 is a schematic diagram of a top view of another electrical fuse structure;
FIG. 3 is a schematic diagram of a top view of an electrical fuse structure in an embodiment of the present invention;
FIG. 4 is a schematic diagram of a top view of another electrical fuse structure in an embodiment of the present invention;
FIG. 5 is a flow chart illustrating a method for forming an electrical fuse structure according to an embodiment of the present invention;
fig. 6 to 16 are schematic structural diagrams formed in steps of a method for forming an electrical fuse structure according to an embodiment of the present invention.
Detailed Description
As is clear from the background art, the performance of the prior art electrical fuse structure needs to be improved.
Referring to fig. 1, an electrical fuse structure includes: the fuse link comprises a fusing region 111, and a cathode region 112 and an anode region 113 which are respectively positioned at two sides of the fusing region 111, wherein the width of the cathode region 112 and the width of the anode region 113 are respectively greater than the width of the fusing region 111;
a plurality of discrete plugs 12 connected to the cathode region 112 and the anode region 113, respectively.
In the electrical fuse structure of fig. 1, setting the width of the cathode region 112 and the width of the anode region 113 to be respectively greater than the width of the fuse region 111 may make the areas of the cathode region 112 and the anode region 113 larger, and thus make the cathode region 112 and the anode region 113 capable of withstanding a larger current density. However, in the formation process of the electrical fuse structure, the difficulty of the process of providing the cathode region 112 and the anode region 113 with larger widths on the two sides of the fuse region 111 with narrower width is great, and the performance of the formed electrical fuse structure is poor.
With the continuous decrease of process nodes, the fuse link is often formed by a multiple patterning process. Referring to fig. 2, in the fuse link 21 formed by the multiple patterning process, the widths of the cathode region II and the anode region III are respectively equal to the width of the blowing region I. When the widths of the cathode region II and the anode region III are respectively equal to the width of the blowing region I, the blowing position of the fuse link 21 is difficult to control when the same intensity of current flows.
To solve the above problem, an electrical fuse structure according to an embodiment of the present invention includes: the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extension direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions; the width of the cutting region is smaller than that of the connecting region, so that the fusing position of the electric fuse can be limited at the position of the cutting region, the working reliability of the fuse link can be improved, and the performance of the electric fuse structure is improved.
Fig. 3 is a schematic top view illustrating an electrical fuse structure according to an embodiment of the present invention. Referring to fig. 3, an electrical fuse structure in an embodiment of the present invention includes a fuse link 31 and a plurality of discrete plugs 32. Wherein:
the fuse link 31 includes a fuse region I and electrode regions located at both sides of the fuse region I along an extending direction of the fuse region I. The fuse region I comprises a cutting region I1 and connecting regions I2 which are positioned at two sides of the cutting region along the extending direction of the fuse region, and the width of the cutting region I1 is smaller than that of the connecting regions I2.
The cutout region I1 and the attachment region I2 define a cutout therebetween, the cutout including a first sidewall exposing the cutout region and a second sidewall exposing the attachment region. With continued reference to fig. 3, in the present embodiment, the cut-out includes a first cut-out 311, and the first cut-out 311 is located on a first side of two sides of the fuse region along the width direction of the fuse region. The first side may be located on either one of two sides of the fuse region in a width direction of the fuse region.
Since the first cut 311 does not have fuse link material therein, the width of the fuse link material remaining in the cut region I1 is narrower, that is, the size of the cut region I1 in the width direction of the fuse region I is smaller than that of the connection region I2 in the width direction of the fuse region I, so that the resistance of the cut region I1 is greater than that of the connection region I2 on both sides thereof. During the process of blowing the fuse link 31, the cut region I1 generates more heat due to the larger resistance, and therefore, the blowing position of the fuse link 31 is generated at the cut region I1.
Referring to fig. 4, in the present embodiment, the notch further includes a second notch 312. The second cutout 312 is located at a second side of two sides of the fuse region in a width direction of the fuse region, the second side being opposite to the first side; the second opening 312 and the first opening 311 have a predetermined first distance in the extending direction of the fuse region I.
In the present embodiment, the first distance is smaller than the width of the cutout region I1 exposed by the first notch 311 and smaller than the width of the cutout region I1 exposed by the second notch 312. Therefore, in the extending direction of the fuse region, the width of the cut region between the first notch 311 and the second notch 312 is narrowest. In the process of blowing the fuse link 31, the resistance of the cut-off region between the first notch 311 and the second notch 312 in the blowing region extending direction in the blowing region I is relatively large, the generated heat is relatively high, and thus the blowing position of the fuse link 31 is generated in the cut-off region between the first notch 311 and the second notch 312.
In other embodiments, the cuts can also be a third cut and a fourth cut. The third cut and the fourth cut are arranged oppositely in the width direction of the cutting area, and a preset second distance is reserved between the third cut and the fourth cut in the width direction of the fusing area.
In the electric fuse structure in the embodiment of the invention, the fusing position of the electric fuse structure can be limited in the cutting region by arranging the notch in the fusing region I, so that the working reliability of the fuse link is improved, and the performance of the electric fuse structure is improved.
In addition, by arranging the notch in the fuse area I, the dimension of the anode area II and the cathode area III in the width direction of the fuse area is not limited to the minimum value of the design rule of the corresponding manufacturing process, that is, the dimension of the anode area II and the cathode area III in the width direction of the fuse area may be set to be larger than the minimum value of the design rule of the corresponding manufacturing process, so as to reduce the difficulty of the fuse link forming process. In addition, the widths of the anode region II and the cathode region III are increased, and the current passing capacity of the anode region II and the cathode region III can also be improved, so that the anode region II and the cathode region III can bear larger current.
In the present embodiment, the width of the anode region II and the cathode region III coincides with the width of the connection region I2.
In this embodiment, because the areas of the anode region II and the cathode region III are larger, the plurality of plugs 32 connected to the anode region II and the plurality of plugs 32 connected to the cathode region III are respectively arranged in an array.
In this embodiment, among the plurality of plugs 32 connected to the anode region II and the plurality of plugs 32 connected to the cathode region III, the two plugs 32 adjacent to each other in the width direction of the fuse region I have the same pitch in the width direction of the fuse region, and the two plugs 32 adjacent to each other in the extension direction of the fuse region have the same pitch in the width direction of the fuse region. In other embodiments, among the plurality of plugs 32 connected to the anode region II and the plurality of plugs 32 connected to the cathode region III, the distance between two plugs 32 adjacent in the width direction of the fuse region may be different or at least partially different, and the distance between two plugs 32 adjacent in the extension direction of the fuse region in the width direction of the fuse region may be different or at least partially different.
In the present embodiment, the plurality of plugs 32 have the same size in the width direction of the fuse region I. In other embodiments, the plurality of plugs 32 may differ at least in part in size in the width direction of the fuse region. In the process of blowing the fuse link 31, when the sizes of the plurality of plugs 32 in the width direction of the blowing region I are equal, the current intensity in the plug 32 close to the blowing region II is larger than the current intensity in the plug 32 far from the blowing region II. In order to further reduce the risk of damage to the plug 32 near the fuse region II, the size of the plug 32 near the fuse region in the width direction of the fuse region may be set to be greater than or equal to the size of the plug 32 far from the fuse region in the width direction of the fuse region.
In this embodiment, the electrical fuse structure further includes a substrate (not shown) and a dielectric layer (not shown) on the substrate; the fuse link 31 and the plurality of plugs 32 are both located in a dielectric layer.
The plurality of plugs 32 may be further divided into a first plug and a second plug. The plug 32 connected to the anode region II is a first plug, and the plug 32 connected to the cathode region III is a second plug.
In this embodiment, the first plug is located above the anode region II, and the second plug is located below the cathode region III. In other words, the lower end of the first plug is connected with the anode region II, and the upper end of the first plug is connected with the upper metal layer; the upper end of the second plug is connected with the cathode region III, and the lower end of the second plug is connected with the working device. In other embodiments, the second plug can also be located over the cathode region III.
In a specific implementation, the number of plugs 32 may be set according to actual needs. With continued reference to fig. 3 and 4, in the present embodiment, the anode regions II are respectively connected to the upper metal layer through six correspondingly disposed first plugs, and the cathode regions III are respectively connected to the working component through six correspondingly disposed second plugs. In other embodiments, the anode region II and the cathode region III may be connected to the upper metal layer and the operating device, respectively, through a greater or lesser number of plugs 32 than six, respectively.
In an embodiment, the plug 32 is rectangular in cross-sectional shape. In other embodiments, the cross-section of the plug 32 may be provided in other shapes.
In a specific implementation, the electrical fuse structure may further include dummy metal interconnection lines 35 disposed in parallel on both sides of the blowing region I of the fuse link 31 in the width direction. The dummy metal interconnection line 35 can improve the precision of the formed fuse link 31 and can satisfy different requirements for pattern density in a semiconductor process. In this embodiment, the dummy metal interconnection lines 35 are respectively disposed on two sides of the fuse link 31 and are parallel to the fuse link 31, and the number of the dummy metal interconnection lines 35 is four. In other embodiments, the dummy metal interconnection lines 35 may have a greater or lesser number, and may be configured by those skilled in the art according to different requirements for pattern density in different semiconductor processes.
In the embodiment of the present invention, the dummy metal interconnection line 35 is made of the same metal material as the fuse link 31, such as copper or tungsten.
The dummy metal interconnection line is not electrically connected, and the dummy metal interconnection line and the fuse link are separated from each other. In this example. The width of the dummy metal interconnection line is smaller than the width of the connection region I2 and smaller than the width of the electrode region.
The embodiment of the invention also provides a forming method of the electric fuse structure. Referring to fig. 5, a method for forming an electrical fuse structure may specifically include the following steps:
step S501: providing a substrate;
step S502: forming a fuse link and a plurality of discrete plugs on the substrate; the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extending direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions.
A method of forming an electrical fuse structure in the embodiment of the present invention will be described in detail below with reference to fig. 6 to 16.
Referring to fig. 6, a substrate 100 is provided.
In specific implementation, the substrate provides a process basis for the subsequent formation of the electric fuse structure.
Referring to fig. 7, a first interlayer dielectric layer 110 is formed on the substrate 100.
The process for forming the first interlayer dielectric layer 110 may be a chemical vapor deposition process, a physical vapor deposition process, or an atomic layer deposition process.
In the embodiment of the present invention, the first interlayer dielectric layer 110 is made of silicon oxide. In other embodiments, the first interlayer dielectric layer 110 may also be another low-k material layer.
Referring to fig. 8 and 9, fig. 9 is a top view of fig. 8, and a second plug 115 is formed in the first interlayer dielectric layer 110.
The second plug is used for contact between a cathode region of a fuse link to be formed subsequently and a working member.
The method of forming the second plug includes: forming a second plug hole in the first interlayer dielectric layer; a second plug is formed in the first plug aperture.
In this embodiment, a double patterning process is used to form the second plug hole in the first interlayer dielectric layer. In other embodiments, a quadruple patterning process may also be used to form the second plug hole in the first interlayer dielectric layer.
Referring to fig. 10, a first dielectric layer 120 is formed covering the second plug 115 and the first interlayer dielectric layer 110.
The process of forming the first dielectric layer 120 may be a chemical vapor deposition process, a physical vapor deposition process, or an atomic layer deposition process.
In this embodiment, the first dielectric layer 120 is made of silicon oxide.
Referring to fig. 11 and 12, fig. 12 is a top view of fig. 11, in which a fuse link 31 is formed in the first dielectric layer 120.
In this embodiment, the fuse link 31 includes a fuse region I and electrode regions located at two sides of the fuse region I along an extending direction of the fuse region I; the fuse region I comprises a cutting region I1 and connecting regions I2 which are positioned at two sides of the cutting region I1 along the extending direction of the fuse region, and the width of the cutting region I1 is smaller than that of the connecting regions I2.
The cutout region I1 and the attachment region I2 define a cutout therebetween, the cutout including a first sidewall exposing the cutout region and a second sidewall exposing the attachment region. In this embodiment, the cut-out comprises a first cut-out 311; the first notch 311 is located on a first side of both sides of the fuse region in a width direction of the fuse region.
In this embodiment, the electrical fuse structure further includes dummy metal interconnection lines 35 located on both sides of the fuse link in a width direction of the fuse link, and the dummy metal interconnection lines 35 are separated from the fuse link.
In this embodiment, the fuse link 31 and the dummy metal interconnection line 35 are formed in the same process.
Referring to fig. 13(a) to 13(d) in combination with fig. 12, the step of forming the fuse link 31 includes: forming a cut mask layer 130 on first dielectric layer 120, wherein cut mask layer 130 is used to define the position of the cut; forming a patterned first mask layer 140 covering the first dielectric layer 120 and a portion of the cut mask layer 130, wherein the patterned first mask layer 140 has a first opening 145; etching the first dielectric layer 120 by using the first mask layer 140 and the cut mask layer 130 as masks, and forming a first trench 125 in the first dielectric layer 120; after forming the first trench 125, removing the first mask layer 140 and the cut mask layer 130; after removing the first mask layer 140 and the cut mask layer 130, filling a metal material in the first trench 125 to form the fuse link 31.
The cut-out comprises a first cut-out. The cut mask layer includes a first cut mask layer 130, the first cut mask layer 130 is used to define the position of the first cut, and the dimension of the first cut mask layer 130 in the width direction of the fuse region is larger than the dimension of the first cut in the width direction of the fuse region.
In other embodiments of the present invention, the notch further comprises a second notch; the second cutout extends from the second side toward the first side, and is disposed opposite to the first cutout in the width direction of the fuse region.
The kerf mask layer further comprises a second kerf mask layer for defining a location of the second kerf.
In this embodiment, in the process of forming the fuse link, a dummy metal interconnection line is formed, where the dummy metal interconnection line includes a first dummy metal interconnection line and a first dummy metal interconnection line, the first dummy metal interconnection line and the first dummy metal interconnection line are separated from each other, and the dummy metal interconnection lines are not electrically connected.
Specifically, the patterned first mask layer 140 further has a first interconnect mask opening 146 for defining a position of a first dummy metal interconnect; etching the first dielectric layer 120 by using the first mask layer 140 and the cut mask layer 130 as masks, and forming a first interconnection trench 126 in the first dielectric layer 120; after removing the first mask layer 140 and the cut mask layer 130, forming a second interconnection trench 127 in the first dielectric layer 120; the metal material is also filled in the first and second interconnection trenches 126 and 127 to form first and second dummy metal interconnection lines 126a and 127a, respectively.
In this embodiment, after removing the first mask layer 140 and the cut mask layer 130, a sacrificial layer is formed in the first interconnect trench 126 and the first trench 125; forming a second mask layer on the first dielectric layer and the first sacrificial layer, wherein the second mask layer has a second interconnection mask opening defining the position of the second dummy metal interconnection line 127 a; etching the first dielectric layer 120 by using the second mask layer as a mask, and forming a second interconnection groove 127 in the first dielectric layer 120; then, removing the second mask layer and the sacrificial layer; after that, a step of filling a metal material is performed.
In this embodiment, the fuse link includes a fuse region and electrode regions located at two sides of the fuse region along an extending direction of the fuse region, which is described in detail with reference to fig. 3 and 4 and is not repeated herein.
Referring to fig. 14, a second interlayer dielectric layer 160 is formed to cover the fuse link 31 and the first dielectric layer 120.
The process of forming the second interlayer dielectric layer 160 may be a chemical vapor deposition process, a physical vapor deposition process, an atomic layer deposition process, or the like.
In this embodiment, the second interlayer dielectric layer 160 is made of silicon oxide.
Referring to fig. 15 and 16, fig. 16 is a top view of fig. 15, and a first plug 165 is formed in the second interlayer dielectric layer 160.
The first plug serves as a contact between an anode region of the fuse link and an upper metal layer.
The method of forming the first plug includes: forming a first plug hole in the second interlayer dielectric layer; a first plug is formed in the first plug aperture.
In this embodiment, a double patterning process is used to form a first plug hole in the second interlayer dielectric layer. In other embodiments, a quadruple patterning process may also be used to form the first plug hole in the second interlayer dielectric layer.
In the above scheme of the embodiment of the present invention, the electrical fuse structure includes a fuse link, where the fuse link includes a fuse region and electrode regions located at two sides of the fuse region along an extending direction of the fuse region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extension direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions; the width of the cutting region is smaller than that of the connecting region, so that the fusing position of the electric fuse can be limited at the position of the cutting region, the working reliability of the fuse link can be improved, and the performance of the electric fuse structure is improved. .
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (20)

1. An electrical fuse structure, comprising:
the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extension direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions;
and the plugs are respectively connected with the electrode regions on two sides of the fusing region.
2. The electrical fuse structure according to claim 1, wherein a cutout is defined between the cut-off region and the connection region, the cutout including a first sidewall exposing the cut-off region and a second sidewall of the connection region.
3. The electrical fuse structure of claim 2, wherein the cut comprises a first cut; the first notch is located on a first side of two sides of the fusing region in a width direction of the fusing region.
4. The electrical fuse structure of claim 3, wherein the cutout further comprises a second cutout; the second notch is positioned on a second side of two sides of the fusing area along the width direction of the fusing area, and the second side is opposite to the first side; the second notch and the first notch have a preset first distance in the extending direction of the fusing area.
5. The electrical fuse structure of claim 4, wherein the first pitch is less than a width of a kerf exposed by the first cut and less than a width of a kerf exposed by the second cut.
6. The electrical fuse structure according to claim 4, wherein the first cutout and the second cutout are the same or different in size in the fuse region width direction.
7. The electrical fuse structure of claim 2, wherein the cut comprises a third cut and a fourth cut; the third cut and the fourth cut are arranged oppositely in the width direction of the cutting area, and a preset second distance is reserved between the third cut and the fourth cut in the width direction of the fusing area.
8. The electrical fuse structure of claim 1, further comprising a base and a dielectric layer; the fuse link and the plug are located in the dielectric layer.
9. The electrical fuse structure of claim 1, wherein a cross-section of the plug is rectangular in shape.
10. The electrical fuse structure according to claim 1, wherein the electrode regions at two sides of the fuse region are an anode region and a cathode region, respectively; the plug comprises a first plug and a second plug;
the first plug is connected with the anode region and is positioned above the anode region; the first plug is also used for being connected with the upper metal layer;
the second plug is connected with the cathode region and is positioned above or below the cathode region; the second plug is also used for connecting with a working device.
11. The electrical fuse structure of claim 10, wherein the first plugs and the second plugs are arranged in an array, respectively.
12. The electrical fuse structure of claim 1, further comprising: and the dummy metal interconnection lines are positioned on two sides of the fuse link along the width direction of the fuse link, are not electrically connected, and are separated from the fuse link.
13. The electrical fuse structure of claim 1, wherein a width of the connection region and a width of the electrode region are uniform.
14. A method for forming an electrical fuse structure, comprising:
providing a substrate;
forming a fuse link and a plurality of discrete plugs on the substrate; the fuse link comprises a fusing region and electrode regions positioned on two sides of the fusing region along the extending direction of the fusing region; the fuse region comprises a cutting region and connecting regions positioned on two sides of the cutting region along the extending direction of the fuse region, and the width of the cutting region is smaller than that of the connecting regions.
15. The method of forming an electrical fuse structure according to claim 14, wherein a cutout is defined between the cut-off region and the connection region, the cutout including a first sidewall exposing the cut-off region and a second sidewall exposing the connection region.
16. The method of forming an electrical fuse structure according to claim 15, wherein the method of forming the fuse link comprises: forming a first dielectric layer on the substrate; forming a cutting mask layer on the first medium layer, wherein the cutting mask layer is used for defining the position of the cut; forming a patterned first mask layer covering the first dielectric layer and part of the cutting mask layer, wherein the patterned first mask layer is provided with a first opening; etching the first dielectric layer by taking the first mask layer and the cutting mask layer as masks, and forming a first groove in the first dielectric layer; after a first groove is formed, removing the first mask layer and the cutting mask layer; and after removing the first mask layer and the cutting mask layer, filling a metal material in the first groove to form the fuse link.
17. The method of forming an electrical fuse structure according to claim 16, wherein the cut comprises a first cut; the first notch is positioned on a first side of two sides of the fusing area along the width direction of the fusing area; the cut mask layer includes a first cut mask layer for defining a location of the first cut.
18. The method of forming an electrical fuse structure according to claim 17, wherein the cutout further includes a second cutout; the second notch is positioned on a second side of two sides of the fusing area along the width direction of the fusing area, and the second side is opposite to the first side; the second notch and the first notch have a preset first distance in the extending direction of the fusing area; the kerf mask layer includes a second kerf mask layer for defining a location of the second kerf.
19. The method of forming an electrical fuse structure according to claim 16, further comprising forming a dummy metal interconnection line during the forming of the fuse link, the dummy metal interconnection line including a first dummy metal interconnection line and a first dummy metal interconnection line, the first dummy metal interconnection line and the first dummy metal interconnection line being separate from each other, the dummy metal interconnection line not being electrically connected.
20. The method of forming an electrical fuse structure of claim 19, wherein the patterned first mask layer further has a first interconnect mask opening for defining a first dummy metal interconnect location; etching the first dielectric layer by taking the first mask layer and the cutting mask layer as masks, and forming a first interconnection groove in the first dielectric layer; after removing the first mask layer and the cutting mask layer, forming a second interconnection groove in the first dielectric layer; the metal material is further filled in the first interconnection groove and the second interconnection groove to form a first dummy metal interconnection line and a second dummy metal interconnection line, respectively.
CN202010388165.6A 2020-05-09 2020-05-09 Electric fuse structure and forming method thereof Pending CN113629035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010388165.6A CN113629035A (en) 2020-05-09 2020-05-09 Electric fuse structure and forming method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010388165.6A CN113629035A (en) 2020-05-09 2020-05-09 Electric fuse structure and forming method thereof

Publications (1)

Publication Number Publication Date
CN113629035A true CN113629035A (en) 2021-11-09

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