CN113608300B - Double-color grating coupler with crosstalk suppression function and preparation method thereof - Google Patents
Double-color grating coupler with crosstalk suppression function and preparation method thereof Download PDFInfo
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- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
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- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/131—Integrated optical circuits characterised by the manufacturing method by using epitaxial growth
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
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- G—PHYSICS
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12147—Coupler
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12178—Epitaxial growth
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Abstract
The invention provides a double-color grating coupler with crosstalk suppression function, which comprises a substrate and a grating coupling structure positioned on the upper surface of the substrate, wherein a first transmission waveguide and a second transmission waveguide are respectively arranged on two sides of the grating coupling structure, and a first Bragg grating reflector and a second Bragg grating reflector are respectively arranged in the first transmission waveguide and the second transmission waveguide; the grating coupling structure is a periodic grating structure and is used for carrying out double-color coupling on any central wavelength I and central wavelength II in incident dual-band light; the first transmission waveguide is used for transmitting a first central wavelength, and the second transmission waveguide is used for transmitting a second central wavelength. The first Bragg grating reflector and the second Bragg grating reflector form an asymmetric DBR structure to achieve crosstalk wavelength suppression and coupling efficiency improvement, the first transmission waveguide and the second transmission waveguide form an asymmetric transmission waveguide, and the purpose of further improving bicolor coupling efficiency is achieved.
Description
Technical Field
The invention relates to the technical field of optoelectronic devices, in particular to a double-color grating coupler with a crosstalk inhibition function and a preparation method thereof.
Background
The infrared spectral region can be divided into three wave bands of near infrared (NIR: 0.78-2 μm), intermediate infrared (MIR: 2-14 μm) and far infrared (FIR: 14-1000 μm). Because the mid-infrared band covers a chemical molecular fingerprint area and two atmospheric windows (3-5 mu m and 8-12 mu m) which are very important scientifically and technically, the development of mid-infrared transmission and detection technology has great significance for military and civil fields, such as chemical analysis, gas detection, environmental monitoring, laser radar, free space optical communication, remote sensing technology and the like.
At present, the development of on-chip integration of photonic devices is relatively lagged for mid-infrared bands, most of existing grating couplers only aim at single wavelength for optimization of coupling efficiency, and in many future application scenarios, mid-infrared light belonging to two atmospheric window bands needs to be coupled to different waveguides on a chip for transmission, so that parallel processing and noise suppression of information are realized. Gunther Roelkens et al, 2007, realized an integrated grating coupler based on a diffraction grating structure that can be used to optically multiplex or demultiplex light at 1310nm and 1490nm wavelengths, using a one-dimensional grating structure to achieve spatial separation of the two wavelengths. The function of the polarization beam splitter is realized by using a one-dimensional diffraction grating coupling structure by other people in the university of Zhejiang in 2009, signal light enters along an optical fiber, TE/TM polarization separation of two orthogonal polarized waves is realized through the coupling grating structure, and the TE/TM polarization separation is transmitted to the opposite direction along a waveguide. However, the existing research has the following problems or shortcomings: 1. currently, the double-color grating coupling is only limited to the research of near-infrared communication wave bands such as 1550nm and 1310nm, and a medium-infrared double-color grating coupler still needs to be developed; 2. at present, the method for improving the grating coupling efficiency mainly adopts methods of constructing a vertical direction reflection structure, reducing the transmission loss at the bottom of a waveguide, or reducing the reverse coupling loss and the like, and the efficiency improving means is limited, so that more efficiency improving methods need to be developed; 3. when the double-color coupling is realized, the existing wavelength crosstalk problem (the coupling energy of the wavelength in the direction of the reverse port) still needs to be solved.
Disclosure of Invention
The invention provides a double-color grating coupler with crosstalk suppression function and a preparation method thereof, aiming at overcoming the problem of serious wavelength crosstalk existing in a grating coupler in the prior art when realizing double-color coupling.
In order to solve the technical problems, the technical scheme of the invention is as follows:
a double-color grating coupler with crosstalk suppression function comprises a substrate and a grating coupling structure positioned on the upper surface of the substrate, wherein a first transmission waveguide and a second transmission waveguide are respectively arranged on two sides of the grating coupling structure, and a first Bragg grating reflector and a second Bragg grating reflector are respectively arranged in the first transmission waveguide and the second transmission waveguide; the grating coupling structure is a periodic grating structure and is used for carrying out double-color coupling on any central wavelength I and central wavelength II in incident double-waveband light; the first transmission waveguide is used for transmitting a first central wavelength, and the second transmission waveguide is used for transmitting a second central wavelength.
In the using process, a dual-waveband optical signal is guided by an input optical fiber to be incident to the surface of the grating coupling structure at a certain incident angle, and the grating coupling structure realizes the coupling of light from space to waveguide and realizes space separation transmission; the first Bragg grating reflector and the second Bragg grating reflector arranged on two sides of the grating coupling structure form an asymmetric DBR (distributed Bragg reflector) crosstalk suppression structure, wherein the first Bragg grating reflector allows the first central wavelength in the two-band light to pass through and performs reflection filtering on the second central wavelength, the second Bragg grating reflector allows the second central wavelength in the two-band light to pass through and performs reflection filtering on the first central wavelength, and therefore crosstalk wavelength suppression is achieved; the first transmission waveguide and the second transmission waveguide respectively and efficiently transmit the wavelength light output by the first Bragg grating reflector and the second Bragg grating reflector.
Preferably, the parameters of the grating coupling structure are set according to bragg diffraction conditions of the first central wavelength and the second central wavelength, so that coupling transmission of the two wavelengths is realized.
Preferably, the reflection wavelengths of the first bragg grating reflector and the second bragg grating reflector are wavelengths causing crosstalk in the propagation direction of the corresponding central wavelength light.
As a preferred scheme, the etching depth of the first bragg grating reflector is equal to the thickness of the first transmission waveguide; the etching depth of the second bragg grating reflector is equal to the thickness of the second transmission waveguide.
The first transmission waveguide is optimized in thickness according to the first central wavelength, the second transmission waveguide is optimized in thickness according to the second central wavelength, and the first transmission waveguide and the second transmission waveguide form an asymmetric transmission waveguide structure, so that the two-color coupling efficiency can be further improved.
Preferably, the first transmission waveguide, the first bragg grating reflector, the grating coupling structure, the second bragg grating reflector and the second transmission waveguide all adopt waveguide materials for dual-band optical transmission.
Preferably, the substrate comprises one or more of a silicon-on-insulator (SOI) substrate, silicon, germanium, glass, sapphire, gallium arsenide, indium phosphide, quartz, calcium fluoride, magnesium fluoride, barium fluoride, zinc selenide, zinc sulfide, potassium chloride, and potassium bromide.
The invention also provides a preparation method for preparing the two-color grating coupler provided by any technical scheme, which comprises the following steps:
s1: preparing a waveguide layer on the surface of a substrate;
s2: photoetching is carried out on the waveguide layer to obtain photoresist patterns of the first transmission waveguide, the first Bragg grating reflector, the grating coupling structure, the second Bragg grating reflector and the second transmission waveguide on the waveguide layer respectively;
s3: and etching the waveguide layer according to the etching depths respectively set by the first transmission waveguide, the first Bragg grating reflector, the grating coupling structure, the second Bragg grating reflector and the second transmission waveguide to obtain the double-color grating coupler.
Preferably, the technique for preparing the waveguide layer on the surface of the substrate includes one or more of magnetron sputtering preparation method, epitaxial preparation method and electron beam evaporation preparation method.
Preferably, the technologies used for performing photolithography on the waveguide layer include one or more of a super-diffraction nano-lithography technology based on femtosecond laser direct writing, a maskless super-diffraction nano-lithography technology based on femtosecond laser projection, an electron beam lithography technology, and a nano-lithography technology based on a conventional mask.
Preferably, the etching of the waveguide layer is performed by a technique including inductively coupled plasma etching or reactive ion etching.
Compared with the prior art, the technical scheme of the invention has the beneficial effects that: according to the invention, the first Bragg grating reflector and the second Bragg grating reflector are adopted to form an asymmetric DBR crosstalk inhibition structure to realize crosstalk wavelength inhibition and coupling efficiency improvement; the grating coupling structure is used for realizing the double-color optical coupling of the middle infrared band and realizing the separation transmission; the asymmetric transmission waveguide is formed by the first transmission waveguide and the second transmission waveguide, and the purpose of further improving the double-color coupling efficiency is achieved.
Drawings
Fig. 1 is a schematic structural diagram of a two-tone grating coupler having a crosstalk suppression function according to embodiment 1.
Fig. 2 is a side view of the waveguide layer of the double-tone grating coupler with crosstalk suppression function of embodiment 1.
Fig. 3 is a coupling efficiency spectrum plot for the case of a symmetric transmission waveguide and no crosstalk suppression structure.
Fig. 4 is a coupling efficiency spectrum plot for the case of using a symmetric transmission waveguide and asymmetric DBR crosstalk suppression structure.
Fig. 5 is a coupling efficiency spectrum chart in the case of using the double-color grating coupler having the crosstalk suppression function of example 1.
Fig. 6 is a flowchart of a method for manufacturing a two-tone grating coupler with crosstalk suppression according to embodiment 2.
The optical waveguide comprises a substrate 1, a first transmission waveguide 2, a first Bragg grating reflector 3, a grating coupling structure 4, a second Bragg grating reflector 5 and a second transmission waveguide 6.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the patent;
for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product;
it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The technical solution of the present invention is further described below with reference to the accompanying drawings and examples.
Example 1
This embodiment proposes a two-tone grating coupler with crosstalk suppression function, which is a schematic structural diagram of the two-tone grating coupler with crosstalk suppression function in this embodiment, as shown in fig. 1 to 2.
The two-tone grating coupler with crosstalk suppression function proposed in this embodiment includes:
a substrate 1;
the grating coupling structure 4 is positioned on the upper surface of the substrate, a first transmission waveguide 2 and a second transmission waveguide 6 are respectively arranged on two sides of the grating coupling structure 4, and a first Bragg grating reflector 3 and a second Bragg grating reflector 5 are respectively arranged in the first transmission waveguide 2 and the second transmission waveguide 6;
the grating coupling structure 4 is a periodic grating structure and is used for performing two-color coupling on any central wavelength I and central wavelength II in incident two-waveband light;
the first bragg grating reflector 3 is equal in thickness to the first transmission waveguide 2 (for transmitting a center wavelength one in two-band light); the second bragg grating reflector 5 and the second transmission waveguide 6 (for transmitting the central wavelength two in the two-band light) are equal in thickness; the reflection wavelengths of the first bragg grating reflector 3 and the second bragg grating reflector 5 are wavelengths causing crosstalk in the propagation direction of the light corresponding to the central wavelength.
The grating coupling structure 4 in this embodiment is used to achieve coupling of light from space into the waveguide; the first Bragg grating reflector 3 and the second Bragg grating reflector 5 form an asymmetric DBR crosstalk suppression structure for realizing crosstalk wavelength suppression and simultaneously improving coupling efficiency; the first transmission waveguide 2 and the second transmission waveguide 6 form an asymmetric waveguide transmission structure, and the thicknesses are set according to the optimized transmission condition of the target transmission wavelength respectively and are used for improving the coupling efficiency.
In the specific implementation process, the two-color grating coupler with the crosstalk inhibition function is applied to the two-color optical coupling of 3-5 microns and 8-12 microns in the middle infrared band. Wherein the transmission wavelength lambda of the wave band of 8-12 mu m 1 Corresponding to the transmission wavelength lambda of the wave band with the central wavelength of 8.5 mu m and the wavelength of 3-5 mu m 2 Corresponding to a central wavelength of 5 μm.
In this embodiment, the first transmission waveguide 2, the first bragg grating reflector 3, the grating coupling structure 4, the second bragg grating reflector 5, and the second transmission waveguide 6 all use waveguide materials for dual-band optical transmission, and the substrate 1 uses one or more of an SOI substrate, silicon, germanium, glass, sapphire, gallium arsenide, indium phosphide, quartz, calcium fluoride, magnesium fluoride, barium fluoride, zinc selenide, zinc sulfide, potassium chloride, and potassium bromide. The substrate material is suitable for the bicolor grating couplers with different wave bands and different incidence modes (namely, upper incidence and back incidence).
Specifically, the substrate 1 in this embodiment is an SOI substrate, a Ge waveguide layer is disposed on the substrate 1, and the first transmission waveguide 2, the first bragg grating reflector 3, the grating coupling structure 4, the second bragg grating reflector 5, and the second transmission waveguide 6 are all located in the Ge waveguide layer.
The grating coupling structure 4 in this embodiment is a periodic grating structure, and the parameter setting thereof satisfies λ 1 And λ 2 Specifically, the coupling grating period Λ is set to 2.71 μm, the duty ratio DC = w/Λ is set to 0.51, the period number is set to 9, and the etching depth is set to 1.2 μm.
Further, the first bragg grating reflector 3 implements reflection filtering for 5 μm band crosstalk, and meanwhile, it is ensured that 8.5 μm center wavelength light can normally transmit therethrough, and the coupling efficiency is not affected, and the grid distance d of the first bragg grating reflector 3 in this embodiment is not affected 1 Set to 0.2 μm, grid width d 2 Set to 0.56 μm, thickness h 1 And was 1.74 μm.
Similarly, the second bragg grating reflector 5 implements reflection filtering on the 8.5 μm waveband crosstalk, and meanwhile, it is ensured that the 5 μm central wavelength light can normally transmit and pass through, and the coupling efficiency is not affected, in this embodiment, the grid distance d of the second bragg grating reflector 5 is the same as that of the first bragg grating reflector 5 3 Set to 0.28 μm, grid width d 4 Set to 1 μm, thickness h 2 And was 1.2 μm.
The first transmission waveguide 2 in this embodiment is more efficient for transmitting light of a central wavelength of 8.5 μm and has a thickness h 1 Set to 1.74 μm; the second transmission waveguide 6 is more efficient for transmitting light of a central wavelength of 5 μm and is thickDegree h 2 Set to 1.2 μm.
The medium infrared optical fiber is used as an input optical fiber, the input wavelength of the medium infrared optical fiber covers two wave bands of 3-5 mu m and 8-12 mu m, the input optical fiber enables double-wave band light to enter the surface of the grating coupling structure 4 at an incidence angle of-5 degrees (forming an angle of 5 degrees along the direction which is vertical to the surface of the grating in a counterclockwise mode), the incident light is coupled to the grating coupling structure 4 from the space to the waveguide, and the transmission wavelength lambda of the later 8-12 mu m wave band is transmitted 1 Along the first transmission waveguide 2, the transmission wavelength λ of 3-5 μm band is transmitted to the left via the first Bragg grating reflector 3 2 Along the second transmission waveguide 6, to the right via the second bragg-grating reflector 4.
In the case of using a symmetric transmission waveguide and a structure without crosstalk suppression, the two-tone coupling efficiency is as shown in fig. 3, the coupling efficiency of the left port corresponding to the center wavelength of 8.5 μm is 38.1%, the coupling efficiency of the right port corresponding to the center wavelength of 5 μm is 51.4%, and the two-tone crosstalk exceeds 20%. By adopting a symmetrical transmission waveguide and an asymmetrical DBR crosstalk suppression structure, the bilateral coupling efficiency is shown in figure 4, the 8.5-micron coupling efficiency of the left port is 40.86%, the 5-micron coupling efficiency of the right port is 54.89%, the bilateral crosstalk is suppressed to about 10%, and the bilateral expected coupling efficiency is improved to a certain extent.
The coupling efficiency of the two-tone grating coupler composed of the asymmetric transmission waveguide and the asymmetric DBR crosstalk suppression structure of this embodiment is as shown in fig. 5, and while the crosstalk suppression effect is maintained, the two-tone coupling efficiency is further improved, where the coupling efficiency of the left port 8.5 μm is 44.38%, and the coupling efficiency of the right port 5 μm is 60.08%.
Therefore, the double-color grating coupler with crosstalk suppression function of the embodiment adopts the asymmetric transmission waveguide and the asymmetric DBR crosstalk suppression structure, realizes medium-infrared band double-color optical coupling through the grating coupling structure 4, realizes separate transmission, can realize effective suppression on crosstalk by constructing the asymmetric DBR crosstalk suppression structure aiming at different central wavelengths, and realizes promotion of expected double-color coupling efficiency in a certain range; further, by optimizing the thickness of the transmission waveguide aiming at different wavelengths, an asymmetric transmission waveguide structure is constructed, and the double-color coupling efficiency can be greatly improved while the crosstalk inhibition function is kept.
Example 2
This example proposes a preparation method for preparing the dichroic grating coupler proposed in example 1. Fig. 6 is a flowchart of a method for manufacturing a two-tone grating coupler according to this embodiment.
In the method for manufacturing a two-tone grating coupler provided in this embodiment, the method includes the following steps:
s1: preparing a waveguide layer on the surface of a substrate 1;
s2: photoetching is carried out on the waveguide layer to obtain photoresist patterns of the first transmission waveguide 2, the first Bragg grating reflector 3, the grating coupling structure 4, the second Bragg grating reflector 5 and the second transmission waveguide 6 on the waveguide layer respectively;
s3: and etching the waveguide layer according to the etching depths respectively set by the first transmission waveguide 2, the first Bragg grating reflector 3, the grating coupling structure 4, the second Bragg grating reflector 5 and the second transmission waveguide 6 to obtain the double-color grating coupler.
In this embodiment, the techniques for preparing the waveguide layer on the surface of the substrate 1 include:
1. the magnetron sputtering preparation method comprises the following steps: the voltage loaded on the target material is controlled to excite glow discharge, the target material is bombarded by generated ions, and sputtered atoms are obtained and then deposited on the surface of the substrate 1 to form a waveguide layer material;
2. an epitaxial preparation method comprises the following steps: a technique for growing a single crystal thin film on a single crystal substrate 1, a new single crystal thin layer grown by crystal phase extension of the substrate, that is, an epitaxial layer, includes Chemical Vapor Deposition (CVD), molecular Beam Epitaxy (MBE), and the like;
3. the preparation method comprises the following steps: the evaporation material is directly heated by high-energy electron beams under the vacuum condition, so that the evaporation material is gasified and transported to the substrate 1, and the waveguide layer material is condensed on the substrate 1.
Techniques employed for performing photolithography on the waveguide layer include:
1. the maskless super-diffraction nano-photoetching technology based on the degenerate/non-degenerate two-photon absorption polymerization effect of the main principle mainly comprises the following steps: a femtosecond laser direct writing-based super-diffraction nano-lithography technology; a maskless super-diffraction nano-lithography technology based on femtosecond laser projection;
2. electron beam lithography;
3. conventional mask based nanolithography, and the like.
Techniques employed for etching the waveguide layer include: inductively coupled plasma etching (ICP) and/or Reactive Ion Etching (RIE) techniques.
The same or similar reference numerals correspond to the same or similar parts;
the terms describing positional relationships in the drawings are for illustrative purposes only and are not to be construed as limiting the patent;
it should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A double-color grating coupler with crosstalk suppression function is characterized by comprising a substrate (1) and a grating coupling structure (4) positioned on the upper surface of the substrate, wherein a first transmission waveguide (2) and a second transmission waveguide (6) are respectively arranged on two sides of the grating coupling structure (4), and a first Bragg grating reflector (3) and a second Bragg grating reflector (5) are respectively arranged in the first transmission waveguide (2) and the second transmission waveguide (6); the grating coupling structure (4) is a periodic grating structure and is used for carrying out two-color coupling on any central wavelength I and central wavelength II in incident two-waveband light; the first transmission waveguide (2) is used for transmitting a first central wavelength, and the second transmission waveguide (6) is used for transmitting a second central wavelength; the first Bragg grating reflector (3) allows the first central wavelength in the two-band light to pass through and performs reflective filtering on the second central wavelength, and the second Bragg grating reflector (5) allows the second central wavelength in the two-band light to pass through and performs reflective filtering on the first central wavelength.
2. The dichromatic grating coupler according to claim 1, characterized in that the parameters of the grating coupling structure (4) are set according to the bragg diffraction conditions at a center wavelength one and a center wavelength two.
3. The dichromatic grating coupler according to claim 1, characterized in that the reflection wavelengths of the first and second bragg-grating reflectors (3, 5) are the wavelengths causing crosstalk in the propagation direction of the corresponding center-wavelength light, respectively.
4. The dichromatic grating coupler according to claim 1, characterized in that the etching depth of the first bragg-grating reflector (3) is equal to the thickness of the first transmission waveguide (2); the etching depth of the second Bragg grating reflector (5) is equal to the thickness of the second transmission waveguide (6).
5. The dichromatic grating coupler according to claim 1, characterized in that the first transmission waveguide (2), the first bragg-grating reflector (3), the grating coupling structure (4), the second bragg-grating reflector (5) and the second transmission waveguide (6) all employ waveguide materials for dual-band optical transmission.
6. The dichromatic grating coupler of any one of claims 1 to 5, wherein the substrate (1) comprises one or more of a silicon-on-insulator (SOI) substrate, silicon, germanium, glass, sapphire, gallium arsenide, indium phosphide, quartz, calcium fluoride, magnesium fluoride, barium fluoride, zinc selenide, zinc sulfide, potassium chloride, potassium bromide.
7. A production method for producing the dichroic grating coupler having a crosstalk suppression function according to any one of claims 1 to 6, comprising the steps of:
s1: preparing a waveguide layer on the surface of a substrate (1);
s2: photoetching is carried out on the waveguide layer to obtain photoresist patterns of a first transmission waveguide (2), a first Bragg grating reflector (3), a grating coupling structure (4), a second Bragg grating reflector (5) and a second transmission waveguide (6) on the waveguide layer respectively;
s3: and etching the waveguide layer according to the etching depths respectively set by the first transmission waveguide (2), the first Bragg grating reflector (3), the grating coupling structure (4), the second Bragg grating reflector (5) and the second transmission waveguide (6) to obtain the bicolor grating coupler.
8. A method according to claim 7, wherein the waveguide layer is formed on the surface of the substrate (1) by one or more of magnetron sputtering, epitaxial, and electron beam evaporation.
9. A method for preparing a layer according to claim 7, wherein the photolithography applied to the waveguide layer comprises one or more of a super-diffractive nanolithography technique based on femtosecond laser direct writing, a maskless super-diffractive nanolithography technique based on femtosecond laser projection, an electron beam lithography technique, and a nanolithography technique based on conventional masks.
10. A method as claimed in claim 7, characterized in that the etching of the waveguide layer is carried out by a technique comprising inductively coupled plasma etching or reactive ion etching.
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| WO1996011417A1 (en) * | 1994-10-11 | 1996-04-18 | Alcatel N.V. | Wavelength-selective optical coupler |
| CN106873076A (en) * | 2017-02-16 | 2017-06-20 | 中山大学 | A kind of grating coupler and preparation method thereof |
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| US10948657B2 (en) * | 2019-08-02 | 2021-03-16 | Honeywell International Inc. | Bichromatic chip to free-space grating coupler |
| CN110890691B (en) * | 2019-11-29 | 2021-02-09 | 中国科学院长春光学精密机械与物理研究所 | Semiconductor laser and preparation method thereof |
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| CN106873076A (en) * | 2017-02-16 | 2017-06-20 | 中山大学 | A kind of grating coupler and preparation method thereof |
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