CN113597664A - 确定不良原因的方法、电子设备、存储介质及系统 - Google Patents

确定不良原因的方法、电子设备、存储介质及系统 Download PDF

Info

Publication number
CN113597664A
CN113597664A CN202080000026.XA CN202080000026A CN113597664A CN 113597664 A CN113597664 A CN 113597664A CN 202080000026 A CN202080000026 A CN 202080000026A CN 113597664 A CN113597664 A CN 113597664A
Authority
CN
China
Prior art keywords
substrate
defective
production equipment
data
parameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202080000026.XA
Other languages
English (en)
Other versions
CN113597664B (zh
Inventor
王海金
薛静
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Beijing BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Publication of CN113597664A publication Critical patent/CN113597664A/zh
Application granted granted Critical
Publication of CN113597664B publication Critical patent/CN113597664B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Factory Administration (AREA)

Abstract

一种确定导致基板不良的原因的方法,包括:获取基板的生产过程数据(S201),所述生产过程数据包括基板的生产履历数据以及至少两个生产设备参数的参数数据;根据所述基板的类型,获取与所述基板的类型对应的所述至少两个生产设备参数的参数数据参考范围(S202);基于所获取的至少两个生产设备参数的参数数据、以及所述至少两个生产设备参数的参数数据参考范围,确定所述至少两个生产设备参数中偏离其参数数据参考范围的不良生产设备参数(S203)。通过该方法,能够快速方便地进行导致基板不良的原因的定位。

Description

PCT国内申请,说明书已公开。

Claims (15)

  1. PCT国内申请,权利要求书已公开。
CN202080000026.XA 2020-01-14 2020-01-14 确定不良原因的方法、电子设备、存储介质及系统 Active CN113597664B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2020/072033 WO2021142622A1 (zh) 2020-01-14 2020-01-14 确定不良原因的方法、电子设备、存储介质及系统

Publications (2)

Publication Number Publication Date
CN113597664A true CN113597664A (zh) 2021-11-02
CN113597664B CN113597664B (zh) 2024-08-20

Family

ID=76863364

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080000026.XA Active CN113597664B (zh) 2020-01-14 2020-01-14 确定不良原因的方法、电子设备、存储介质及系统

Country Status (2)

Country Link
CN (1) CN113597664B (zh)
WO (1) WO2021142622A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114418011A (zh) * 2022-01-21 2022-04-29 京东方科技集团股份有限公司 一种产品不良成因分析的方法、设备及系统、存储介质
CN118335012A (zh) * 2024-06-12 2024-07-12 深圳市起立科技有限公司 Oled的信号传输方法、装置、设备及存储介质

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023050275A1 (zh) * 2021-09-30 2023-04-06 京东方科技集团股份有限公司 数据处理方法、系统和计算机可读存储介质
CN113836826A (zh) * 2021-11-25 2021-12-24 深圳市裕展精密科技有限公司 关键参数确定方法、装置、电子装置及存储介质
TWI843591B (zh) * 2023-06-01 2024-05-21 聯策科技股份有限公司 影像瑕疵檢測模型的建立方法、瑕疵影像的檢測方法及電子裝置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07114601A (ja) * 1993-10-19 1995-05-02 Hitachi Ltd 製造不良解析システム、方法およびこれに関連したデータベースの生成方法
JP2006216589A (ja) * 2005-02-01 2006-08-17 Omron Corp プリント基板の品質管理システム
JP2007108117A (ja) * 2005-10-17 2007-04-26 Sharp Corp 不良原因工程特定システムおよび方法、並びにその方法を実行するためのプログラムを記録したコンピュータ読み取り可能な記録媒体
CN105807742A (zh) * 2016-03-10 2016-07-27 京东方科技集团股份有限公司 生产设备监控方法及系统
CN108319052A (zh) * 2018-01-31 2018-07-24 京东方科技集团股份有限公司 一种显示面板制作与检测方法
CN109711659A (zh) * 2018-11-09 2019-05-03 成都数之联科技有限公司 一种工业生产的良率提升管理系统和方法
CN110276410A (zh) * 2019-06-27 2019-09-24 京东方科技集团股份有限公司 确定不良原因的方法、装置、电子设备及存储介质

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100412853C (zh) * 2005-05-06 2008-08-20 鸿富锦精密工业(深圳)有限公司 生产设备监控系统及方法
JP5460662B2 (ja) * 2011-09-07 2014-04-02 株式会社日立ハイテクノロジーズ 領域決定装置、観察装置または検査装置、領域決定方法および領域決定方法を用いた観察方法または検査方法
US10312161B2 (en) * 2015-03-23 2019-06-04 Applied Materials Israel Ltd. Process window analysis
CN110108717A (zh) * 2019-05-15 2019-08-09 广东工业大学 一种显示模组生产设备状态评估方法,装置及系统

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07114601A (ja) * 1993-10-19 1995-05-02 Hitachi Ltd 製造不良解析システム、方法およびこれに関連したデータベースの生成方法
JP2006216589A (ja) * 2005-02-01 2006-08-17 Omron Corp プリント基板の品質管理システム
JP2007108117A (ja) * 2005-10-17 2007-04-26 Sharp Corp 不良原因工程特定システムおよび方法、並びにその方法を実行するためのプログラムを記録したコンピュータ読み取り可能な記録媒体
CN105807742A (zh) * 2016-03-10 2016-07-27 京东方科技集团股份有限公司 生产设备监控方法及系统
CN108319052A (zh) * 2018-01-31 2018-07-24 京东方科技集团股份有限公司 一种显示面板制作与检测方法
CN109711659A (zh) * 2018-11-09 2019-05-03 成都数之联科技有限公司 一种工业生产的良率提升管理系统和方法
CN110276410A (zh) * 2019-06-27 2019-09-24 京东方科技集团股份有限公司 确定不良原因的方法、装置、电子设备及存储介质

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114418011A (zh) * 2022-01-21 2022-04-29 京东方科技集团股份有限公司 一种产品不良成因分析的方法、设备及系统、存储介质
CN118335012A (zh) * 2024-06-12 2024-07-12 深圳市起立科技有限公司 Oled的信号传输方法、装置、设备及存储介质
CN118335012B (zh) * 2024-06-12 2024-08-20 深圳市起立科技有限公司 Oled的信号传输方法、装置、设备及存储介质

Also Published As

Publication number Publication date
WO2021142622A1 (zh) 2021-07-22
CN113597664B (zh) 2024-08-20

Similar Documents

Publication Publication Date Title
CN113597664B (zh) 确定不良原因的方法、电子设备、存储介质及系统
WO2021146996A1 (zh) 设备指标优良性等级预测模型训练方法、监控系统和方法
CN110825644B (zh) 一种跨项目软件缺陷预测方法及其系统
WO2020052292A1 (zh) 基于工业互联网的集成电路测试信息化管理系统
US20220405909A1 (en) Computer-implemented method for defect analysis, apparatus for defect analysis, computer-program product, and intelligent defect analysis system
CN114868092B (zh) 数据管理平台、缺陷分析系统、缺陷分析方法、计算机存储介质和用于缺陷分析的方法
US11410112B2 (en) Industrial data service, data modeling, and data application platform
US20210364999A1 (en) System and method for analyzing cause of product defect, computer readable medium
CN110806730A (zh) 大数据运维平台、服务器及存储介质
US20220179873A1 (en) Data management platform, intelligent defect analysis system, intelligent defect analysis method, computer-program product, and method for defect analysis
CN117270482A (zh) 基于数字孪生的汽车工厂控制系统
US20220405280A1 (en) Interactive Structured Analytic Systems
WO2017084460A1 (zh) 一种原因追溯方法
US12032364B2 (en) Computer-implemented method for defect analysis, computer-implemented method of evaluating likelihood of defect occurrence, apparatus for defect analysis, computer-program product, and intelligent defect analysis system
DE112019006218T5 (de) Prozesssteuerungsinstrument zur Verarbeitung großer und umfangreicher Daten
US20240004375A1 (en) Data processing method, and electronic device and storage medium
CN104764455B (zh) 一种导航电子地图数据处理方法及装置
US8805809B2 (en) Autotransform system
CN112508433A (zh) 一种运维系统的数据稽查方法及装置
CN113495831A (zh) 基于关键字生成测试用例的方法、系统、设备及介质
Zürcher et al. Data-driven approach toward long-term equipment condition assessment in sterile drug product manufacturing
Ren et al. Research on flexibility of production system based on personnel collaboration
US20240296163A1 (en) Data processing methods, devices and non-transitory storage mediums
WO2024027224A1 (zh) 基于缝纫计件的智能生产系统、方法、介质及计算机设备
US11036212B1 (en) Route based manufacturing system analysis, apparatuses, systems, and methods

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant