CN113568162A - Self-compensating micro-mirror driving device and compensation method of working voltage thereof - Google Patents
Self-compensating micro-mirror driving device and compensation method of working voltage thereof Download PDFInfo
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- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
Abstract
The invention provides a self-compensating micro-mirror driving device and a compensation method of working voltage thereof. The deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage are obtained, and the working voltage of the micro mirror surface is compensated according to the deflection state of the micro mirror surface under the condition of no working voltage in the working process of the device, so that the error of the micro mirror surface under the condition of no working voltage, which is generated due to micro torsion, is corrected. Namely, the micro-mirror driving device can realize the self-compensation function, improve the accurate control of the torsion angle of the micro-mirror and effectively improve the performance of the device.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a self-compensating micro-mirror driving device and a compensation method of working voltage thereof.
Background
Micro mirror driving devices (e.g., MEMS micro mirror driving devices) can be widely used in optical fiber communication, and dynamic control of optical signals is achieved by moving micro mirrors in the micro mirror driving devices. The micro-mirror driving device can be applied to photoelectric devices such as an optical switch, an optical attenuator and a wavelength selection switch, and has a wide application prospect in the fields of optical scanning, optical display, laser deflection and the like.
The prior micro-mirror driving device controls an optical signal based on the torsion of the micro-mirror, so that the torsion precision of the micro-mirror directly influences the control precision of the optical signal.
Disclosure of Invention
The invention aims to provide a self-compensating micro-mirror driving device and a compensation method of working voltage thereof, so as to improve the torsion precision of a micro-mirror surface of the micro-mirror driving device in the working process.
Therefore, the invention provides a compensation method of the working voltage of a micro-mirror driving device, which comprises the following steps: and detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage, and compensating the working voltage of the device according to the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage. The method for detecting the deflection direction and the deflection angle of the micro-mirror surface under the condition of no working voltage comprises the following steps: the deflection direction and the deflection angle of the micro mirror surface are detected by utilizing at least two piezoresistors arranged on two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when the micro mirror surface generates different deflection angles, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface.
Optionally, at least two piezoresistors are respectively disposed on two opposite sides of the micromirror surface, and the at least two piezoresistors located on the same side are arranged in a manner of following the deflection direction of the micromirror surface.
Optionally, the at least two piezoresistors are combined to form at least one wheatstone bridge.
Optionally, two piezoresistors are respectively disposed on two opposite sides of the micro mirror surface, the two piezoresistors located on the same side are both arranged in compliance with the deflection direction of the micro mirror surface, and the four piezoresistors on two sides of the micro mirror surface are combined to form a wheatstone bridge.
Optionally, the two opposite sides of the micromirror surface are both provided with torsion beams, and the piezoresistors are arranged on the torsion beams.
Optionally, the micromirror is formed on a substrate, P-type doped regions are formed in the substrate on two opposite sides of the micromirror, N-type doped regions are formed in the P-type doped regions, and the N-type doped regions constitute the piezoresistor.
Optionally, a long axis direction of the N-type doped region extends in compliance with a deflection direction of the micromirror plate.
Optionally, the substrate includes an upper structure layer, the micro mirror surface is formed on the upper structure layer and located in the micro mirror surface twisting area of the upper structure layer, and a lower portion of the micro mirror surface twisting area of the upper structure layer is suspended.
It is still another object of the present invention to provide a self-compensating micromirror driving device, which includes a sensing structure and a compensation circuit. The detection structure is used for detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage, the detection structure comprises at least two piezoresistors arranged on two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when different deflection angles occur on the micro mirror surface, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface. The compensation circuit is used for obtaining compensation voltage according to the detected deflection direction and deflection angle of the micro-mirror surface under the condition of no working voltage, and the compensation voltage is used for compensating the working voltage of the micro-mirror surface driving device.
Optionally, at least two piezoresistors are respectively disposed on two opposite sides of the micromirror surface, and the at least two piezoresistors located on the same side are arranged in a manner of following the deflection direction of the micromirror surface.
Optionally, the at least two piezoresistors are combined to form at least one wheatstone bridge.
Optionally, two piezoresistors are respectively disposed on two opposite sides of the micro mirror surface, the two piezoresistors located on the same side are both arranged in compliance with the deflection direction of the micro mirror surface, and the four piezoresistors on two sides of the micro mirror surface are combined to form a wheatstone bridge.
Optionally, the micromirror is formed on a substrate, P-type doped regions are formed in the substrate on two opposite sides of the micromirror, N-type doped regions are formed in the P-type doped regions, and the N-type doped regions constitute the piezoresistor.
In addition, the present invention also provides a driving method of the self-compensating micro mirror driving device, comprising: the method for detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage by using the detection structure comprises the following steps: detecting the deflection direction and the deflection angle of the micro mirror surface by utilizing at least two piezoresistors arranged at two opposite sides of the micro mirror surface, wherein the piezoresistors are used for changing different resistance values when different deflection angles occur on the micro mirror surface, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface; the compensation circuit obtains compensation voltage according to the detected deflection direction and deflection angle of the micro mirror surface under the condition of no working voltage; and applying the compensated operating voltage to the micromirror driving device based on the operating voltage of the compensation voltage compensation device.
The method for compensating the working voltage of the micro mirror driving device obtains the deflection state of the micro mirror under the condition of no working voltage by obtaining the deflection direction and the deflection angle of the micro mirror under the condition of no working voltage, so that the working voltage of the micro mirror can be compensated according to the deflection state of the micro mirror under the condition of no working voltage in the working process of the device, and the adverse effect of the micro mirror on the deflection precision of the micro mirror in the actual working process due to micro torsion of the micro mirror under the condition of no working voltage is avoided. Namely, the micro mirror driving device provided by the invention can realize a self-compensation function, improve the accurate control of the torsion angle of the micro mirror surface and effectively improve the performance of the device.
Drawings
Fig. 1 is a schematic structural diagram of a self-compensating micromirror driving device according to an embodiment of the invention.
Fig. 2 is a schematic circuit diagram of a wheatstone bridge formed by a plurality of voltage dependent resistors of the self-compensating micromirror driving device according to an embodiment of the invention.
FIG. 3 is a cross-sectional view of the self-compensating micro-mirror device of FIG. 1 in a direction parallel to the torsion axis according to one embodiment of the present invention.
Wherein the reference numbers are as follows:
100-micro mirror surface;
200-a torsion beam;
300-a substrate;
310-upper structural layer;
320-lower structural layer;
320 a-cavity;
311-P type doped region;
312-N type doped region;
r1 — first varistor;
r2 — second piezo-resistor;
r3-third varistor;
r4-fourth piezo-resistor.
Detailed Description
The micro mirror driving device generally applies a working voltage to drive the driving component to drive the micro mirror to twist by a predetermined angle in the working process, so that the control of the micro mirror driving device on the twist angle of the micro mirror directly reflects the performance of the device in the working process.
The inventor of the present invention has found that an important factor influencing the torsion accuracy of the micro mirror surface is that the micro mirror surface still has slight torsion under the condition of no working voltage, so that the torsion angle of the micro mirror surface has deviation under the preset working voltage.
Therefore, the invention provides a compensation method of the working voltage of the micro-mirror driving device, which comprises the following steps: and detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage, and compensating the working voltage of the device according to the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage. That is, the compensation method provided by the invention can compensate the working voltage of the device to offset the deflection of the micro mirror surface generated under the condition of no working voltage, and correct the error of the micro mirror surface generated due to micro torsion under the condition of no working voltage, so that the micro mirror surface driving device can more accurately control the deflection angle of the micro mirror surface in the working process of the micro mirror surface driving device. That is, applying the compensated operating voltage to the micromirror driving device can control the micromirror to approach or even reach the desired deflection angle.
The self-compensation micro-mirror driving device and the compensation method of the working voltage thereof according to the present invention will be described in further detail with reference to the accompanying drawings and embodiments. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention. It will be understood that relative terms, such as "above," "below," "top," "bottom," "above," and "below," may be used in relation to various elements shown in the figures. These relative terms are intended to encompass different orientations of the elements in addition to the orientation depicted in the figures. For example, if the device were inverted relative to the view in the drawings, an element described as "above" another element, for example, would now be below that element.
FIG. 1 is a schematic diagram of a self-compensating micro-mirror driver according to an embodiment of the present invention. As shown in fig. 1, the micromirror driving device has a micromirror 100, and the micromirror 100 can be rotated by a driving assembly (not shown).
For the micro mirror driving device, the driving method of the micro mirror may include an electrostatic driving method, a piezoelectric driving method, and the like. The micro-mirror driving device based on electrostatic driving can specifically adopt a comb driving structure, and the micro-mirror can obtain a larger torsion angle under a smaller driving voltage in the comb driving structure.
Specifically, the operation process of the micromirror driving device is, for example, applying a predetermined operating voltage to the driving component to drive the micromirror to rotate by a desired angle. In this embodiment, the working voltage of the micromirror driving device is compensated to offset the deflection of the micromirror surface generated under the condition of no working voltage, so that the deflection angle of the micromirror surface under the compensated working voltage can be more accurately controlled by the device.
With continued reference to fig. 1, the method for detecting the deflection direction and the deflection angle of the micromirror without the operating voltage comprises: the deflection direction and the deflection angle of the micro mirror surface are detected by using at least two piezoresistors arranged at two opposite sides of the micro mirror surface 100, the piezoresistors are used for changing different resistance values when the micro mirror surface 100 generates different deflection angles, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface 100. For example, in fig. 1, the micromirror 100 is deflected in the + D direction or the-D direction based on the torsion axis Z, and the first varistor R1 and the second varistor R2 are respectively disposed on both sides of the torsion axis Z, and the third varistor R3 and the fourth varistor R4 are also disposed on both sides of the torsion axis Z. For the sake of understanding, it can be considered that the first varistor R1 and the third varistor R3 shown in fig. 1 are arranged on the side of the torsion axis Z corresponding to the + D direction, and the second varistor R2 and the fourth varistor R4 shown in fig. 1 are arranged on the side of the torsion axis Z corresponding to the-D direction.
Specifically, when the micromirror 100 deflects, the piezoresistors on the sides of the micromirror are driven to rotate correspondingly, so that the resistance of the piezoresistors changes correspondingly with the deflection angle. When the deflection angle of the piezoresistor is larger, the resistance value variation of the piezoresistor is larger; conversely, when the deflection angle of the piezoresistor is smaller, the resistance value variation of the piezoresistor is smaller.
And, the two opposite sides of the micro mirror 100 have at least two piezoresistors arranged to conform to the deflection direction of the micro mirror 100, so that the polarization direction of the micro mirror 100 can be determined by using the at least two piezoresistors arranged along the deflection direction of the micro mirror 100. Specifically, when the micromirror 100 deflects, the resistance of the piezoresistor corresponding to the deflection side decreases (or increases), whereas the resistance of the piezoresistor corresponding to the deflection backside increases (or decreases), so that the polarization direction of the micromirror 100 can be determined according to the resistance change of the piezoresistors on different sides. For example, referring to FIG. 1, when the micromirror 100 is deflected in the + D direction, the resistance of the piezoresistor corresponding to the + D direction may be decreased (or increased) and the resistance of the piezoresistor corresponding to the-D direction may be increased (or decreased).
With continued reference to fig. 1, two piezoresistors are disposed on two opposite sides of the micromirror 100, and the two piezoresistors on the same side are both arranged in compliance with the deflection direction of the micromirror 100. In this embodiment, the first varistor R1 and the second varistor R2 are disposed on one side, and the first varistor R1 and the second varistor R2 are arranged in compliance with the deflection direction of the micromirror 100; and the other side of the micro mirror surface 100 is provided with a third piezoresistor R3 and a fourth piezoresistor R4, and the third piezoresistor R3 and the fourth piezoresistor R4 are arranged in compliance with the deflection direction of the micro mirror surface 100.
In a further aspect, at least two piezoresistors on two sides of the micromirror 100 can be used to form at least one Wheatstone bridge, so as to sense the deflection condition of the micromirror 100 more sensitively. In this embodiment, a wheatstone bridge is formed by the first piezo-resistor R1, the second piezo-resistor R2, the third piezo-resistor R3 and the fourth piezo-resistor R4 distributed on two sides of the micro-mirror.
Referring to fig. 2, a schematic circuit diagram of the wheatstone bridge may be shown, where the first varistor R1, the second varistor R2, the third varistor R3, and the fourth varistor R4 are connected as shown in fig. 2, two varistors located on the same side of the micromirror 100 are connected in series (i.e., the first varistor R1 and the second varistor R2 are connected in series, and the third varistor R3 and the fourth varistor R4 are connected in series), and two varistors disposed on one side and two varistors disposed on the other side are connected in parallel. Also, the end portions of the two piezoresistors arranged at the same position along the deflection direction of the micromirror are both connected to the same node, that is, the end portions of the two piezoresistors arranged on the same side of the torsion axis Z are both connected to the same node. For example, in the present embodiment, the ends of the first varistor R1 and the third varistor R3 arranged on the side of the torsion axis Z corresponding to the + D direction are both connected to the same power supply terminal, and the ends of the second varistor R2 and the fourth varistor R4 arranged on the side of the torsion axis Z corresponding to the-D direction are both connected to the same power supply terminal.
The principle of detecting the deflection direction and the deflection angle of the micromirror 100 using a Wheatstone bridge is as follows, as shown in FIG. 1 and FIG. 2: when the micromirror 100 is not deflected, the first piezo-resistor R1, the second piezo-resistor R2, the third piezo-resistor R3 and the fourth piezo-resistor R4 are all in a horizontal state and have the same resistance, at this time, the wheatstone bridge is in a balanced state, and the detection voltage Vg is zero. When the micro mirror 100 deflects, the first varistor R1 and the third varistor R3 change (for example, both increase) in the same trend, and the second varistor R2 and the fourth varistor R4 change (for example, both decrease) in the same trend, so that the polarization direction and the deflection angle of the micro mirror can be obtained according to the obtained detection voltage value Vg.
In this embodiment, four piezoresistors on two sides of the micromirror 100 are combined together to form a wheatstone bridge. However, in other embodiments, a Wheatstone bridge can be disposed on each side of the micromirror 100.
Further, the two opposite sides of the micromirror 100 are provided with torsion beams 200, and the torsion beams 200 are used for driving the micromirror 100 to rotate. Therefore, the deflection angle of the torsion beam 200 also corresponds to the deflection angle of the micromirror 100, and thus the piezoresistor can be provided in the torsion beam 200. For example, a P-type doped region is formed in the torsion beam 200, and an N-type doped region is formed in the P-type doped region, and the N-type doped region constitutes the varistor.
In this embodiment, the micromirror driving device is formed based on a semiconductor process.
Specifically, refer to fig. 3, wherein fig. 3 is a schematic cross-sectional view of the micromirror driver in fig. 1 in parallel to the torsion axis direction according to an embodiment of the invention. Referring to fig. 1 and 3, the micromirror 100 of the micromirror driving device is formed on a substrate 300, and P-type doped regions 311 are formed in the substrate on two opposite sides of the micromirror 100, N-type doped regions 312 are formed in the P-type doped regions 311, and the N-type doped regions 312 constitute the piezoresistors. The P-type doped region 311 ensures that the N-type doped region 312 therein can be isolated from other regions of the substrate.
Further, a driving assembly (not shown) for driving the micro mirror 100 to twist is formed in the substrate 300. Taking the driving assembly as a comb driving structure as an example, the comb driving structure has a fixed comb structure and a movable comb structure, the movable comb structure is located above the fixed comb structure, and the movable comb structure is connected to the micromirror 100 to drive the micromirror 100 to twist.
In this embodiment, the substrate 300 includes an upper structural layer 310 and a lower structural layer 320. Wherein the movable comb tooth structure is formed in an upper structural layer 310 of the substrate 300, and the fixed comb tooth structure is formed in a lower structural layer 320 of the substrate 300. And, the micro mirror 100 is formed on the upper structure layer 310. The upper structure layer 310 has a cavity 320a below the mirror surface torsion area, so that the lower part of the mirror surface torsion area of the upper structure layer 310 is suspended and can deflect, thereby driving the mirror surface 100 to twist. That is, the micromirror 100 is formed on the upper structure layer 310 and located in the micromirror torsion region.
Continuing with fig. 3, the piezoresistors are formed in the suspended portions of the upper structure layer 310 located at the two sides of the micromirror 100, and it can be considered that the suspended portions of the upper structure layer 310 located at the two sides of the micromirror 100 form the torsion beam 200, the P-type doped regions 311 are formed in the torsion beam 200 at the two sides, the N-type doped regions 312 are formed in the P-type doped regions 311, and the N-type doped regions 312 are used for forming the piezoresistors.
Furthermore, the long axis direction of the N-type doped region 312 follows the deflection direction of the micromirror 100 to extend, so that when the micromirror is twisted, the N-type doped region 312 can be subjected to larger stress variation, and thus larger resistance value variation is generated, which is beneficial to improving the detection precision and the detection sensitivity of the deflection angle of the micromirror 100.
In this embodiment, the N-type doped region 312 is rectangular, and the long side of the N-type doped region is extended along the twisting direction of the micro mirror. And, the two N-type doped regions 312 on the same side are arranged along the long side direction.
The embodiment also provides a self-compensating micro-mirror driving device, and the micro-mirror driving device can compensate the working voltage thereof based on the compensation method so as to improve the performance of the device.
With particular reference to fig. 1 and 3, the self-compensating micromirror driving device comprises: the detection structure is used for detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage; and the compensation circuit is used for obtaining compensation voltage according to the detected deflection direction and deflection angle of the micro-mirror surface under the condition of no working voltage, and the obtained compensation voltage can be used for compensating the working voltage of the micro-mirror surface driving device.
Specifically, the detection structure comprises at least two piezoresistors arranged on two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when different deflection angles occur on the micro mirror surface, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface.
It should be understood that, the method for detecting the deflection direction and the deflection angle of the micro mirror surface by using the plurality of piezoresistors in the detection structure can refer to the above embodiments, and will not be described herein again. And the arrangement mode, the connection mode and the like of the piezoresistors in the detection structure can also be referred to the above embodiments. In addition, the structure of each varistor can be configured as described above with reference to the above embodiment, that is, the varistor can be formed by using the N-type doped region 312 formed in the substrate 300, and the N-type doped region 312 for forming the varistor is further located in a P-type doped region 311, so that the N-type doped region 312 for forming the varistor can be spaced apart from other regions of the substrate.
The driving method of the self-compensating micro-mirror driving device provided by the present embodiment may include the following steps, for example.
The method comprises the following steps of firstly, detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage by using a detection structure.
The method for detecting the deflection direction and the deflection angle by the detection structure comprises the following steps: the deflection direction and the deflection angle of the micro mirror surface are detected by utilizing at least two piezoresistors arranged on two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when the micro mirror surface generates different deflection angles, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface.
And step two, the compensation circuit obtains compensation voltage according to the detected deflection direction and deflection angle of the micro mirror surface under no working voltage.
It can be considered that the compensation voltage is equivalent to the voltage at which the micromirror is twisted to an equilibrium state (i.e., zero deflection position). That is, if the compensation voltage is applied to the micromirror drive device, the micromirror is reversely deflected until an equilibrium state (i.e., a zero deflection position is reached).
And step three, based on the working voltage of the compensation voltage compensation device, applying the compensated working voltage to the micro mirror driving device.
The compensated working voltage comprises the compensation voltage corresponding to the torsion error of the micro mirror surface under the condition of no working voltage, so that the micro mirror surface torsion can be more accurately controlled by applying the compensated working voltage to the micro mirror surface driving device, and the working performance of the device is effectively improved.
In summary, the self-compensating micromirror driving device and the compensating method and driving method of the operating voltage thereof provided in the above embodiments can obtain the state of the micromirror without the operating voltage by obtaining the deflection direction and the deflection angle of the micromirror without the operating voltage. Therefore, in the working process of the micro mirror driving device, the compensation working voltage can be correspondingly realized according to the state of the micro mirror under the condition of no working voltage, the self-compensation function is realized, and the deflection precision of the micro mirror in the actual working process due to the micro torsion under the condition of no working voltage is improved.
It should be noted that, although the present invention has been described with reference to the preferred embodiments, the present invention is not limited to the embodiments. It will be apparent to those skilled in the art from this disclosure that many changes and modifications can be made, or equivalents modified, in the embodiments of the invention without departing from the scope of the invention. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention are still within the protection scope of the technical solution of the present invention, unless the content of the technical solution of the present invention is departed from.
It should be further understood that the terms "first," "second," "third," and the like in the description are used for distinguishing between various components, elements, steps, and the like, and are not intended to imply a logical or sequential relationship between various components, elements, steps, or the like, unless otherwise indicated or indicated.
It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only, and is not intended to limit the scope of the present invention. It must be noted that, as used herein and in the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. For example, reference to "a step" or "an apparatus" means a reference to one or more steps or apparatuses and may include sub-steps as well as sub-apparatuses. All conjunctions used should be understood in the broadest sense. And, the word "or" should be understood to have the definition of a logical "or" rather than the definition of a logical "exclusive or" unless the context clearly dictates otherwise.
Claims (14)
1. A method for compensating an operating voltage of a micromirror driving device, comprising: detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage, and compensating the working voltage of the device according to the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage;
the method for detecting the deflection direction and the deflection angle of the micro-mirror surface under the condition of no working voltage comprises the following steps: the deflection direction and the deflection angle of the micro mirror surface are detected by utilizing at least two piezoresistors arranged on two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when the micro mirror surface generates different deflection angles, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface.
2. The method for compensating an operating voltage of a micromirror drive device according to claim 1, wherein at least two piezoresistors are disposed on opposite sides of the micromirror, respectively, and at least two piezoresistors located on the same side are arranged in compliance with the deflection direction of the micromirror.
3. The method for compensating for an operating voltage of a micro-mirror driving device as claimed in claim 1, wherein said at least two piezoresistors are combined to form at least one wheatstone bridge.
4. The method for compensating an operating voltage of a micromirror device as claimed in claim 3, wherein two piezoresistors are disposed on two opposite sides of the micromirror, the two piezoresistors on the same side are both arranged in compliance with the deflection direction of the micromirror, and the four piezoresistors on two sides of the micromirror are combined to form a wheatstone bridge.
5. The method of claim 1, wherein said micro mirror surface has torsion beams disposed on opposite sides thereof, and said piezoresistors are disposed on said torsion beams.
6. The method as claimed in claim 1, wherein the micromirror is formed on a substrate, P-type doped regions are formed in the substrate at opposite sides of the micromirror, N-type doped regions are formed in the P-type doped regions, and the N-type doped regions constitute the piezoresistors.
7. The method for compensating an operating voltage of a micromirror device according to claim 6, wherein the long axis direction of the N-type doped region is extended following the deflection direction of the micromirror plate.
8. The method as claimed in claim 6, wherein the substrate comprises an upper structural layer, the micro mirror is formed on the upper structural layer and located in the micro mirror torsion region of the upper structural layer, and the micro mirror torsion region of the upper structural layer is suspended below the micro mirror torsion region.
9. A self-compensating micro-mirror driving device, comprising:
the detection structure is used for detecting the deflection direction and the deflection angle of the micro mirror surface under no working voltage, the detection structure comprises at least two piezoresistors arranged at two opposite sides of the micro mirror surface, the piezoresistors are used for changing different resistance values when different deflection angles occur on the micro mirror surface, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface;
and the compensation circuit is used for obtaining compensation voltage according to the detected deflection direction and deflection angle of the micro-mirror surface under the condition of no working voltage, and the compensation voltage is used for compensating the working voltage of the micro-mirror surface driving device.
10. The self-compensating micro-mirror driving device as claimed in claim 9, wherein at least two piezoresistors are disposed on opposite sides of the micro-mirror, and wherein the at least two piezoresistors on the same side are arranged in compliance with a deflection direction of the micro-mirror.
11. The self-compensating micro-mirror driving device as claimed in claim 9, wherein the at least two piezoresistors are combined to form at least one wheatstone bridge.
12. The self-compensating micro-mirror driving device as claimed in claim 11, wherein two piezoresistors are disposed on opposite sides of the micro-mirror, the two piezoresistors on the same side are arranged in compliance with the deflection direction of the micro-mirror, and the four piezoresistors on both sides of the micro-mirror are combined to form a wheatstone bridge.
13. The self-compensating micro-mirror driving device as claimed in claim 9, wherein the micro-mirror is formed on a substrate, and P-type doped regions are formed in the substrate on opposite sides of the micro-mirror, and N-type doped regions are formed in the P-type doped regions, and the N-type doped regions constitute the piezoresistors.
14. A driving method of the self-compensable micromirror driving device according to any of claims 9-13, comprising:
the method for detecting the deflection direction and the deflection angle of the micro mirror surface under the condition of no working voltage by using the detection structure comprises the following steps: detecting the deflection direction and the deflection angle of the micro mirror surface by utilizing at least two piezoresistors arranged at two opposite sides of the micro mirror surface, wherein the piezoresistors are used for changing different resistance values when different deflection angles occur on the micro mirror surface, and the at least two piezoresistors are arranged along the deflection direction of the micro mirror surface;
the compensation circuit obtains compensation voltage according to the detected deflection direction and deflection angle of the micro mirror surface under the condition of no working voltage; and the number of the first and second groups,
and based on the working voltage of the compensation voltage compensation device, applying the compensated working voltage to the micro mirror driving device.
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Application publication date: 20211029 |