CN113528253B - Composition for cleaning LiF material on surfaces of OLED mask and crucible - Google Patents
Composition for cleaning LiF material on surfaces of OLED mask and crucible Download PDFInfo
- Publication number
- CN113528253B CN113528253B CN202110771869.6A CN202110771869A CN113528253B CN 113528253 B CN113528253 B CN 113528253B CN 202110771869 A CN202110771869 A CN 202110771869A CN 113528253 B CN113528253 B CN 113528253B
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- China
- Prior art keywords
- cleaning
- composition
- ether
- ethylene glycol
- crucible
- Prior art date
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- 238000004140 cleaning Methods 0.000 title claims abstract description 44
- 239000000203 mixture Substances 0.000 title claims abstract description 29
- 239000000463 material Substances 0.000 title claims abstract description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims abstract description 63
- 239000002888 zwitterionic surfactant Substances 0.000 claims abstract description 24
- 239000004094 surface-active agent Substances 0.000 claims abstract description 14
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 12
- 239000002738 chelating agent Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 12
- 239000012498 ultrapure water Substances 0.000 claims abstract description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 36
- 238000006243 chemical reaction Methods 0.000 claims description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 15
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 7
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 6
- 229920001223 polyethylene glycol Polymers 0.000 claims description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000000706 filtrate Substances 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 4
- 239000012265 solid product Substances 0.000 claims description 4
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 claims description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 3
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 claims description 3
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 3
- KFDNQUWMBLVQNB-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;sodium Chemical compound [Na].[Na].[Na].[Na].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KFDNQUWMBLVQNB-UHFFFAOYSA-N 0.000 claims description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 3
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 claims description 3
- 229910001863 barium hydroxide Inorganic materials 0.000 claims description 3
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 claims description 3
- 239000000920 calcium hydroxide Substances 0.000 claims description 3
- 229910001861 calcium hydroxide Inorganic materials 0.000 claims description 3
- 235000015165 citric acid Nutrition 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims description 3
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 239000008103 glucose Substances 0.000 claims description 3
- 235000001727 glucose Nutrition 0.000 claims description 3
- 239000005457 ice water Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 claims description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 claims description 3
- 239000011736 potassium bicarbonate Substances 0.000 claims description 3
- 235000015497 potassium bicarbonate Nutrition 0.000 claims description 3
- 229910000028 potassium bicarbonate Inorganic materials 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 3
- 235000011181 potassium carbonates Nutrition 0.000 claims description 3
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 claims description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 235000017550 sodium carbonate Nutrition 0.000 claims description 3
- 239000001509 sodium citrate Substances 0.000 claims description 3
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 3
- 235000011083 sodium citrates Nutrition 0.000 claims description 3
- 239000000176 sodium gluconate Substances 0.000 claims description 3
- 235000012207 sodium gluconate Nutrition 0.000 claims description 3
- 229940005574 sodium gluconate Drugs 0.000 claims description 3
- 235000019832 sodium triphosphate Nutrition 0.000 claims description 3
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 claims description 3
- 229910001866 strontium hydroxide Inorganic materials 0.000 claims description 3
- 238000010791 quenching Methods 0.000 claims description 2
- 230000000171 quenching effect Effects 0.000 claims description 2
- 235000019441 ethanol Nutrition 0.000 claims 2
- WSNZLQGGHKYFAZ-UHFFFAOYSA-M [Na+].[O-]S(Cl)(=O)=O Chemical compound [Na+].[O-]S(Cl)(=O)=O WSNZLQGGHKYFAZ-UHFFFAOYSA-M 0.000 claims 1
- 238000001953 recrystallisation Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 18
- 239000007772 electrode material Substances 0.000 abstract description 14
- 230000008569 process Effects 0.000 abstract description 14
- 238000001704 evaporation Methods 0.000 abstract description 13
- 230000008020 evaporation Effects 0.000 abstract description 13
- 229910003002 lithium salt Inorganic materials 0.000 abstract description 9
- 159000000002 lithium salts Chemical class 0.000 abstract description 9
- 238000001556 precipitation Methods 0.000 abstract description 7
- 230000003670 easy-to-clean Effects 0.000 abstract description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 53
- 230000000694 effects Effects 0.000 description 20
- 239000012459 cleaning agent Substances 0.000 description 11
- 238000001179 sorption measurement Methods 0.000 description 9
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 6
- 125000003827 glycol group Chemical group 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 230000003381 solubilizing effect Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical group 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- XTLNYNMNUCLWEZ-UHFFFAOYSA-N ethanol;propan-2-one Chemical compound CCO.CC(C)=O XTLNYNMNUCLWEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- NLUXPGQXKOUJLD-UHFFFAOYSA-M sodium chloro sulfate Chemical compound [Na+].[O-]S(=O)(=O)OCl NLUXPGQXKOUJLD-UHFFFAOYSA-M 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000693 micelle Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/06—Phosphates, including polyphosphates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2041—Dihydric alcohols
- C11D3/2044—Dihydric alcohols linear
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2086—Hydroxy carboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2096—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/22—Carbohydrates or derivatives thereof
- C11D3/221—Mono, di- or trisaccharides or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/33—Amino carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
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- C11D2111/14—
-
- C11D2111/22—
Abstract
The invention belongs to the technical field of surfactants, and particularly relates to a composition for cleaning LiF materials on the surfaces of OLED masks and crucibles, which comprises, by mass percent, 100%, 0.1-5% of a specific ethylene glycol Gemini type zwitterionic surfactant, 5-20% of an inorganic strong alkaline substance, 0.5-20% of an organic auxiliary agent, 0.1-5% of a chelating agent, and the balance of high-purity water. According to the invention, the specific ethylene glycol Gemini type zwitterionic surfactant is mixed with the inorganic strong base, so that the LiF electrode material attached to a mask plate in an evaporation process and a crucible of evaporation equipment can be quickly and effectively removed, the solubility of lithium salt is greatly improved, the problem of precipitation of products on the market is solved, and the lithium salt is easy to clean and has no residue.
Description
Technical Field
The invention belongs to the technical field of surfactants, and particularly relates to a chemical preparation used in the field of OLED (organic light emitting diode), which is used for cleaning LiF materials on the surfaces of an OLED mask and a crucible.
Background
The OLED evaporation technology is well established in OLED display manufacturing processes. The evaporation technique requires a precise evaporation apparatus, and a Fine Metal Mask (FMM) for evaporation. The FMM determines the height and size of the pixels of the OLED display screen, which are typically patterned from a 30-50 micron thick invar alloy and bound to a metal reticle frame. The crucible has the advantages of high purity, good heating consistency, excellent thermal conductivity, thermal shock resistance and the like, and has strong chemical inertia, and chemical reaction is not easy to occur at high temperature, so the crucible is widely applied to OLED evaporation equipment. In the repeated evaporation process, the cathode material lithium fluoride can be deposited on the FMM and the crucible, so that blockage and pollution are caused, and the subsequent evaporation effect is seriously influenced. Both the crucible and the FMM need to be cleaned periodically during production to ensure their subsequent performance.
The traditional crucible and FMM electrode material are mainly cleaned by acid washing, so that the traditional crucible and FMM electrode material not only has strong corrosivity, but also generates waste acid which is difficult to treat, pollutes the environment and causes the increase of the preparation cost of the OLED display. Patent application publication No. CN 112718692A discloses a method for cleaning LiF crystal of an OLED crucible part, wherein electronic-grade concentrated nitric acid and electronic-grade concentrated hydrochloric acid are mixed according to the volume ratio of 1-3. Patent CN 11501085A discloses a method for cleaning Mask in vacuum evaporation equipment, which uses nitric acid solution as electrolyte, uses Mask to be cleaned as anode, and makes metal film on the Mask surface dissolve in nitric acid electrolyte by connecting with power supply cathode to achieve cleaning effect. The acid washing mode is adopted, the corrosion to equipment is strong, the generated waste acid pollutes the environment, and the waste liquid treatment cost is high. At present, an alkali washing mode is adopted in the market, and patent application publication No. CN 112676243A discloses a method for cleaning an Open Mask surface LiF material of an OLED Mask, wherein electronic-grade ammonia water, electronic-grade hydrogen peroxide and pure water above 10M omega are mixed according to a volume ratio of 1-3. At present, the problems of low cleaning efficiency, poor cleaning effect, low solubility to lithium salt, large amount of precipitate generated in the cleaning process, low service life and the like exist in the alkaline cleaning mode on the market. According to the invention, a specific ethylene glycol Gemini type amphoteric surfactant is added into the cleaning agent, so that the critical micelle concentration is low, the dosage of the surfactant is reduced, the solubility of the cleaning agent on lithium salt is greatly improved, and the problem of precipitation generated in the cleaning process is solved.
Disclosure of Invention
The invention mainly solves the technical problem of providing the composition for cleaning the LiF material on the surfaces of the OLED mask and the crucible, and the specific ethylene glycol Gemini type zwitterionic surfactant is added, so that the LiF electrode material attached to the mask and the crucible of evaporation equipment in the evaporation process can be quickly and effectively removed, the solubility of a cleaning agent to lithium salt is greatly improved, the problem of precipitation in the cleaning process is solved, and the cleaning efficiency can be effectively improved.
In order to solve the above problems, the present invention is implemented by the following technical solutions.
The composition for cleaning the LiF material on the surfaces of the OLED mask and the crucible comprises the following components in percentage by mass, wherein the total mass percentage of the components is 100%: 0.1-5% of specific glycol group Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water.
The specific glycol-based Gemini type zwitterionic surfactant is selected from the following structures:
at least one of surfactants, wherein n is an integer between 2 and 16, R is one of C1-C5 straight-chain saturated alkane groups, methyl, ethyl, n-propyl, n-butyl and n-pentyl.
The preparation method of the specific glycol-based Gemini type zwitterionic surfactant comprises the following steps:
1) Adding polyethylene glycol 1, epichlorohydrin 2 and sodium hydroxide into a three-necked bottle according to a molar ratio of 1.2; wherein the polyethylene glycolThe structural formula of (A) is as follows:
the structure of the obtained product, glycidyl ether 3, is: />
N is an integer between 2 and 16;
2) Adding glycidyl ether 3 and N, N-dimethylethylenediamine 4 into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:
n is an integer between 2 and 16;
3) The intermediate 5 prepared above, sodium chlorosulfate and sodium hydroxide were added to a reaction flask in a molar ratio of 1. The reaction was carried out at 45 ℃ for 4h. And then the temperature is increased to the reflux temperature, and the reaction is continued for 60 hours (the pH of the reaction system needs to be continuously adjusted by saturated sodium carbonate solution =8-9 in the reaction process). After the reaction, the solvent was distilled off under reduced pressure, and the residue was dissolved in hot absolute ethanol and filtered while hot to remove solid impurities. Concentrating the filtrate to half volume, placing in ice water bath for cooling, separating out solids, filtering, recrystallizing (acetone-ethanol mixed solvent), and drying to obtain a white solid product 6, wherein the structural formula is as follows:
and n is an integer between 2 and 16.
According to the specific ethylene glycol Gemini type zwitterionic surfactant, the ethylene glycol groups can form multi-point adsorption with electrode materials on the surface, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges and repel each other, can effectively prevent the aggregation of particles in the cleaning process, solve the problem of precipitation in the cleaning process and have good dispersibility; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension and enhance permeability; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity.
The inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate.
The organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether.
The chelating agent is any one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.
The high-purity water is deionized water, and the resistivity of the high-purity water at 25 ℃ is not lower than 18M omega cm.
The preparation method of the composition comprises the following steps: adding an inorganic strong alkaline substance, an organic auxiliary agent and a specific glycol group Gemini type amphoteric ion surfactant into high-purity water, forming a uniform system at a stirring speed of 200rpm, and adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.
The invention has the following remarkable advantages:
by adding the specific ethylene glycol Gemini type zwitterionic surfactant, the ethylene glycol can form multi-point adsorption with electrode materials on the surface, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges, and repel each other, so that the aggregation of particles in the cleaning process can be effectively prevented, and the problem of precipitation in the cleaning process is solved; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension, enhances permeability and improves cleaning efficiency; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity. The components in the composition are matched with each other, so that the LiF electrode material attached to a mask plate and a crucible of evaporation equipment in an evaporation process can be quickly and effectively removed, the solubility of lithium salt is greatly improved, the problem of precipitation of products on the market is solved, the composition is easy to clean and has no residue, and the cleaning efficiency of the mask plate and the crucible can be effectively improved. Meanwhile, the composition is non-toxic and non-corrosive, has little smell, does not pollute the environment, and has the characteristics of low foam, easy rinsing and the like.
Drawings
FIG. 1 is a comparative diagram of a mask before (a) and after (b) cleaning;
FIG. 2 is a comparative view of the crucible before (a) and after (b) cleaning.
Detailed Description
A composition for cleaning LiF materials on surfaces of OLED masks and crucibles comprises the following components in percentage by mass, wherein the sum of the mass percentages is 100%: 0.1-5% of specific glycol group Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water.
The specific glycol-based Gemini type zwitterionic surfactant is selected from the following structures:
at least one surfactant, wherein n is an integer between 2 and 16, R is one of C1-C5 linear saturated alkane groups, methyl, ethyl, n-propyl, n-butyl and n-pentyl.
The preparation method of the specific glycol-based Gemini type zwitterionic surfactant comprises the following steps:
(1) Adding polyethylene glycol 1, epichlorohydrin 2 and sodium hydroxide into a three-necked bottle according to a molar ratio of 1.2, adding 50mL of ethanol as a solvent, reacting at 40 ℃ for 10h, after the reaction is finished, quenching the system with water, extracting with ethyl acetate, spin-drying the solvent, and recrystallizing with n-hexane to obtain white solid glycidyl ether 3, wherein the reaction equation is as follows:
(2) Adding glycidyl ether 3 and N, N-dimethylethylenediamine 4 into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:
(3) The intermediate 5 prepared above, sodium chlorosulfate and sodium hydroxide were added to a reaction flask according to a molar ratio of 1. The reaction was carried out at 45 ℃ for 4h. And then heating to reflux temperature, and continuing to react for 60 hours (the pH of the reaction system needs to be continuously adjusted by saturated sodium carbonate solution =8-9 in the reaction process). After the reaction, the solvent was distilled off under reduced pressure, and the residue was dissolved in hot absolute ethanol and filtered while hot to remove solid impurities. Concentrating the filtrate to half volume, placing the filtrate in an ice water bath for cooling, separating out solids, filtering, recrystallizing (acetone-ethanol mixed solvent) and drying to obtain a white solid product 6, wherein the reaction equation is as follows:
for the particular ethylene glycol based Gemini type zwitterionic surfactant used when n =2, the characterization data for compound 6 is as follows:
1 H NMR(300MHz，DMSO-d6), δ: 3.30 (s, 6H, CH3), 3.46 (q, 4H, CH2), 3.54 (t, 4H, CH2), 3.25-3.50 (m, 4H, CH2), 3.52 (t, 4H, CH2), 3.38-3.63 (m, 4H, CH2), 3.68 (t, 4H, CH2), 3.80 (t, 4H, CH2), 3.85 (t, 4H,CH2), 4.42 (t, 2H, CH), 5.37 (s, 2H, OH), 5.4 (s, 2H, OH).
13 C NMR(125MHz，DMSO-d6), δ: 45, 50.1, 57.2, 58, 63.4, 65.3, 66.6, 67.3, 70.1, 70.7.
HRMS Calculations C22H44O12N2Cl2Na2S2 (M + H) + 710.63, found 710.45.
Characterization data for compound 6 when n =4 is as follows:
1 H NMR(300MHz，DMSO-d6), δ: 3.30 (s, 6H, CH3), 3.25-3.50 (s, 4H, CH2), 3.38-3.63 (m, 4H, CH2), 3.47 (m, 4H, CH2), 3.52 (m, 20H, CH2), 3.54 (m, 8H, CH2), 3.68 (m, 8H, CH2), 3.70 (m, 4H, CH2), 4.42 (t,2H,CH), 5.37 (s, 2H, OH), 5.4 (s, 2H, OH).
13 C NMR(125MHz，DMSO-d6), δ: 45.8, 50.1, 56.6, 56.9, 57.2,61.3, 63.4, 65, 67.3, 70.3, 70.4.
HRMS Calculation C30H64O18N2Cl2Na2S2 (M + H) + 922.84, found 922.36.
According to the specific glycol group Gemini type zwitterionic surfactant, the glycol group and electrode materials on the surface form multi-point adsorption, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges and are mutually exclusive, so that the aggregation of particles in the cleaning process can be effectively prevented, the problem of precipitation generated in the cleaning process is solved, and the zwitterionic surfactant has good dispersibility; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension and enhance permeability; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity.
The inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate.
The organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether.
The chelating agent is one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.
The high-purity water is deionized water, and the resistivity of the high-purity water at 25 ℃ is not lower than 18M omega cm.
The preparation method of the composition comprises the following steps: firstly adding inorganic strong alkaline substances into water, adding an organic auxiliary agent, then adding a specific glycol-based Gemini type amphoteric ion surfactant, forming a uniform system at a stirring speed of 200rpm, and then adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.
In order to make the content of the present invention more comprehensible, the technical solutions of the present invention are further described below with reference to specific embodiments, but the present invention is not limited thereto.
Detergent compositions of different compositions were formulated according to the formulations in table 1.
TABLE 1 Components and their amounts in different cleaning agent compositions
A mask plate and a crucible with a vapor deposition electrode material of lithium fluoride are respectively soaked in the cleaning agent composition prepared in the examples 1 to 5 and the comparative examples 1 to 4, the operation time is set at the set operation temperature, the mask plate and the crucible are taken out and cleaned by deionized water, and the mask plate and the crucible are blown dry by nitrogen. Observation was performed with an optical microscope and an electron microscope to confirm the cleaning effect. The operating conditions and the results are shown in tables 2 and 3, respectively.
TABLE 2 cleaning Effect of different cleaning agent compositions on the mask
TABLE 3 crucible cleaning effect of different cleaning agent compositions
Remarking: since the lithium fluoride layer on the crucible is thick, a long cleaning time is required.
As can be seen by combining the tables 1-3, the cleaning agent combination can effectively remove the evaporated electrode material lithium fluoride on the mask and the crucible within the set temperature and time, the system does not generate precipitates, the solution with uniform dissolution is obtained, the rinsing is easy, no residue is generated, the mask and the crucible are not corroded, and the cleaning agent combination can be repeatedly used.
After the mask plate and the crucible are soaked and cleaned by the medicinal composition, rinsing, wherein the rinsing process comprises the following steps: and after the liquid medicine soaking is finished, placing the cleaning device in deionized water, spraying and rinsing for 10 minutes at normal temperature, and air-drying.
Compared with the example 1, the comparative example 1 does not contain the organic auxiliary agent, can completely strip and dissolve the lithium fluoride at the operation temperature, but cannot be rinsed cleanly, and has no corrosion to materials.
Compared with the example 1, the comparative example 2 does not contain a chelating agent, can completely strip and dissolve the lithium fluoride at the operation temperature, but is extremely easy to adsorb particles on the surfaces of the mask and the crucible, can not be rinsed cleanly, and does not corrode a material substrate.
Compared with the example 1, the SDS is used for replacing the ethylene glycol Gemini type zwitterionic surfactant in the comparative example 3, the system is uniform and stable at the operation temperature, the lithium fluoride can be completely stripped, but the stripped lithium fluoride is difficult to completely dissolve, precipitates exist, and the material is not corroded.
Compared with the example 1, the comparative example 4 does not contain the ethylene glycol based Gemini type zwitterionic surfactant, the system is uniform and stable at the operation temperature, the lithium fluoride can be completely stripped, but the stripped lithium fluoride is difficult to completely dissolve, the system has precipitates, and the system has no corrosion to materials.
As can be shown in the above example 1 and comparative examples 1 to 4, the organic auxiliary agent helps to rinse, the chelating agent has the effects of resisting static electricity and preventing dirt from being adhered back, the ethylene glycol based Gemini type zwitterionic surfactant improves the surface activity of the system, greatly increases the solubility of lithium fluoride serving as an electrode material, and can effectively prevent the generation of precipitate aggregation, and each component is absent.
FIG. 1 is a graph showing the effects before and after cleaning of MASK substrates with the cleaning agent composition of example 1, wherein a is before cleaning of MASK substrates and b is after cleaning of MASK substrates.
FIG. 2 is a graph showing the effects of the cleaning agent composition of example 1 before and after cleaning of a crucible, wherein a represents before cleaning of the crucible and b represents after cleaning of the crucible. It can be seen that the cleaning effect meets the requirements, no precipitate is generated, and no LiF residue is left.
The above embodiments describe the present invention in detail, but they are only examples and do not limit the scope of the invention. All equivalent modifications and substitutions made by the present invention in the specification are also within the scope of the present invention and are included in the scope of the present invention.
Claims (4)
1. A composition for cleaning LiF materials on the surfaces of OLED masks and crucibles is characterized in that: the composition comprises the following components in percentage by mass, wherein the sum of the mass percentages is 100%: 0.1-5% of glycol-based Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water;
the ethylene glycol Gemini type zwitterionic surfactant is selected from the following structures:
at least one surfactant, wherein n is an integer between 2 and 10, and R is one of methyl, ethyl, n-propyl, n-butyl and n-pentyl;
the inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate;
the organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether;
the chelating agent is one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.
2. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the preparation method of the glycol-based Gemini type zwitterionic surfactant comprises the following steps:
1) Adding polyethylene glycol, epichlorohydrin and sodium hydroxide into a three-mouth bottle according to a molar ratio of 1.2Adding 50mL of ethanol as a solvent, reacting at 40 ℃ for 10h, after the reaction is finished, quenching the system with water, extracting with ethyl acetate, spin-drying the solvent, and recrystallizing with n-hexane to obtain white solid glycidyl ether, wherein the structure of the white solid glycidyl ether is as follows:
n is an integer between 2 and 10;
2) Adding glycidyl ether and N, N-dimethylethylenediamine into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:
n is an integer between 2 and 10;
3) Adding the prepared intermediate, sodium chlorosulfonate and sodium hydroxide into a reaction bottle according to a molar ratio of 1; after the reaction is finished, distilling under reduced pressure to remove the solvent, dissolving the residue in hot absolute ethyl alcohol, filtering while the solution is hot to remove solid impurities, concentrating the volume of the filtrate to a half, placing the filtrate in an ice water bath for cooling, separating out the solid, and finally obtaining a white solid product through filtering, recrystallization and drying treatment, wherein the structural formula of the white solid product is as follows:
and n is an integer between 2 and 10.
3. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the high-purity water is deionized water, and the resistivity of the high-purity water at 25 ℃ is not lower than 18M omega cm.
4. The composition for cleaning LiF material on the surface of OLED mask and crucible as claimed in claim 1, wherein: the preparation method of the composition comprises the following steps: adding an inorganic strong alkaline substance, an organic auxiliary agent and an ethylene glycol Gemini type zwitterionic surfactant into high-purity water, forming a uniform system at a stirring speed of 200rpm, and adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.
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| WO1991011505A1 (en) * | 1990-01-29 | 1991-08-08 | The Procter & Gamble Company | Liquid hard surface detergent compositions containing zwitterionic detergent surfactant and monoethanolamine and/or beta-aminoalkanol |
| CN105218410A (en) * | 2015-09-11 | 2016-01-06 | 江苏振宇环保科技有限公司 | A kind of preparation method of novel sulfobetaine type Gemini surface active agent |
| CN113004980A (en) * | 2021-03-10 | 2021-06-22 | 福建省佑达环保材料有限公司 | Composition for cleaning OLED mask and crucible |
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| WO1991011505A1 (en) * | 1990-01-29 | 1991-08-08 | The Procter & Gamble Company | Liquid hard surface detergent compositions containing zwitterionic detergent surfactant and monoethanolamine and/or beta-aminoalkanol |
| CN105218410A (en) * | 2015-09-11 | 2016-01-06 | 江苏振宇环保科技有限公司 | A kind of preparation method of novel sulfobetaine type Gemini surface active agent |
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