CN113493231B - Ultraviolet radiation fluid treatment system with front porous guide plate - Google Patents

Ultraviolet radiation fluid treatment system with front porous guide plate Download PDF

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Publication number
CN113493231B
CN113493231B CN202010259084.6A CN202010259084A CN113493231B CN 113493231 B CN113493231 B CN 113493231B CN 202010259084 A CN202010259084 A CN 202010259084A CN 113493231 B CN113493231 B CN 113493231B
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fluid
fluid treatment
ultraviolet radiation
axis
treatment area
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CN113493231A (en
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何唯平
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Guangdong Oceanpower Technology Co ltd
Shenzhen Winning Bid South Low Carbon Economy Standardization Research Institute Co ltd Dongguan Branch
Shenzhen Oceanpower Industrial Co Ltd
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Guangdong Oceanpower Technology Co ltd
Shenzhen Winning Bid South Low Carbon Economy Standardization Research Institute Co ltd Dongguan Branch
Shenzhen Oceanpower Industrial Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices

Abstract

The invention relates to an ultraviolet radiation fluid treatment system with a preposed porous guide plate, which comprises a fluid treatment chamber, an ultraviolet radiation source assembly, a preposed guide hole plate positioned at the upstream of the ultraviolet radiation source assembly, a guide plate positioned in a fluid treatment area and the like. The fluid processing chamber is a plane four-way tubular structure, wherein two openings on the same axis are respectively a fluid inlet and a fluid outlet, and the other two openings on the same axis are closed by baffles which are parallel to each other, so that a fluid processing area with the axis which is basically vertical to the axis of the fluid inlet and the fluid outlet is formed. A source assembly of ultraviolet radiation is disposed in the fluid treatment zone and includes an elongated ultraviolet radiation source and a protective sleeve.

Description

Ultraviolet radiation fluid treatment system with front porous guide plate
[ technical field ] A method for producing a semiconductor device
The invention relates to sewage treatment equipment, in particular to an ultraviolet radiation fluid treatment system with a front porous guide plate
[ background of the invention ]
In ultraviolet radiation fluid treatment systems, the response of microorganisms in the fluid being treated to ultraviolet radiation is dependent upon the dose of ultraviolet radiation they receive during the flow of the fluid through the fluid treatment system. The dose of ultraviolet radiation is defined as the product of the intensity of the ultraviolet radiation and the time of exposure to the radiation. If the ultraviolet radiation intensity and the fluid flow rate are uniformly distributed within the fluid treatment zone, all microorganisms in the fluid receive the same radiation dose as the fluid flows through the fluid treatment system. The objective of optimally designing an ultraviolet radiation fluid treatment system is to achieve as uniform a distribution of the ultraviolet radiation dose as possible, so that all of the fluid being treated is exposed to as close as possible to the ultraviolet radiation dose required to inactivate any microorganisms present in the fluid during its passage through the fluid treatment system. However, because both the fluid flow characteristics and the ultraviolet radiation intensity vary in the three-dimensional space of the fluid treatment region, this results in an uneven distribution of ultraviolet radiation dose for a continuously operating ultraviolet radiation fluid treatment system and an inefficient use of the ultraviolet radiation energy generated by the ultraviolet radiation fluid treatment system.
The existing ultraviolet radiation fluid treatment technology and device adopt two modes of optimizing the arrangement position of the ultraviolet radiation source and arranging a guide plate in a fluid treatment area according to the arrangement position of the radiation source and the combination of the two modes to strive for realizing the ideal uniform distribution of ultraviolet radiation dose in the fluid treatment area. The arrangement mode of the ultraviolet radiation sources in the existing ultraviolet radiation fluid treatment system can be divided into three modes of single-row arrangement in a plane vertical to the flow direction or mutual staggered arrangement in a plurality of single rows positioned in different planes, and circumferential arrangement, namely that the ultraviolet radiation sources are arranged in a roughly circular shape with the circle center on the axis of a fluid treatment area and are symmetrically arranged in a V shape according to the fluid flow direction. The essence of all these arrangements of the ultraviolet radiation sources is to distribute the projection of the ultraviolet radiation sources evenly in a plane perpendicular to the direction of flow in the fluid treatment zone so that the fluid is subjected to a substantially uniform dose of radiation during passage through the fluid treatment zone with an even distribution of flow velocity. However, since the common fluid treatment regions are mostly cylindrical three-dimensional spaces with axes perpendicular to the flow direction, the flow cross-sectional area is a series of rectangles with equal length and width changing continuously along the way. Thus, the flow velocity distribution in the fluid treatment zone is not uniform, and the radiation dose to which the fluid is subjected through the fluid treatment zone is difficult to substantially uniform. Another method of subjecting a flowing fluid to a dose of uv radiation is to provide baffles in the fluid treatment zone having open edges parallel to the uv radiation source depending on the arrangement of the sources. Baffles are positioned between the ultraviolet radiation sources to direct fluid flow in a direction relatively close to one or more of the ultraviolet radiation sources. This approach, in addition to increasing the flow resistance loss through the reactor, also results in dead zones with little flow behind the baffles, resulting in a large increase in the uv dose in these areas, thus making the uv dose more non-uniform throughout the fluid treatment area.
In summary, since the intensity of the UV radiation decreases rapidly with increasing distance from the radiation source, the time that the fluid is exposed to the radiation is related to the flow velocity distribution in the fluid treatment region, resulting in a fluid flow velocity that may be highest in the region of lowest radiation intensity. In this case, some of the microorganisms are exposed to the low ultraviolet radiation intensity for a relatively short period of time, causing them to leave the fluid treatment area only after receiving a relatively low dose of ultraviolet radiation. This is a potential process limitation of the ultraviolet radiation fluid treatment system. Therefore, there is a need to further explore and find a simple, economical and structurally optimized design of an ultraviolet radiation fluid treatment system in combination with the fluid dynamics and ultraviolet radiation intensity distribution of the fluid treatment zone.
[ summary of the invention ]
In order to solve the technical problems, the invention provides ultraviolet disinfection equipment, which not only can be used for conveniently replacing a lamp tube and avoiding the problem of water inflow, but also can be used for uniformly radiating, avoiding disinfection dead angles and effectively improving the overall disinfection effect of the ultraviolet disinfection equipment.
The specific technical scheme of the invention is as follows: providing an ultraviolet radiation fluid treatment system with a preposed porous guide plate, which comprises a fluid treatment chamber, a preposed porous guide plate, an ultraviolet radiation source component and the like; the fluid treatment chamber is of a plane four-way tubular structure, wherein two openings on the same axis are respectively a fluid inlet and a fluid outlet, and the other two openings on the same axis are closed by baffles which are parallel to each other and are provided with ultraviolet radiation source component mounting holes, so that a fluid treatment area with the axis which is basically vertical to the axis of the fluid inlet and outlet ends is formed; an ultraviolet radiation source assembly disposed in said fluid treatment zone comprising at least two elongate ultraviolet radiation sources and a protective sleeve; the radiation source assemblies are parallel to each other and substantially perpendicular to the direction of fluid flow.
Preferably, the preposed porous flow guide plate is provided with at least two holes, is arranged at the upstream of a fluid treatment area in the fluid treatment chamber, is connected with the inner wall of the fluid treatment chamber, is symmetrically arranged at two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, forms an included angle of 25-85 degrees with the plane determined by the axes of the fluid inlet and the fluid outlet and inclines towards the fluid inlet side.
Preferably, a flow guide plate is arranged in the fluid treatment area, one side of the flow guide plate is connected with the inner wall surface of the fluid treatment area at the intersection line of a plane which passes through the axis of the fluid treatment area and is perpendicular to a plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area and the inner wall surface of the fluid treatment area, extends obliquely from the inner wall surface of the fluid treatment area to the fluid outlet side, and forms an included angle of 25-90 degrees with the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area; the guide plates are symmetrically arranged on two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, and two ends of the guide plates are respectively connected with the baffle plate for installing and fixing the ultraviolet radiation source component.
Preferably wherein the ultraviolet radiation source comprises a medium pressure ultraviolet lamp, a low pressure high output ultraviolet lamp, a pulsed ultraviolet lamp, an ultraviolet light emitting diode, and combinations thereof.
The beneficial technical effects of the invention are as follows: in contrast to the state of the art, the present invention provides an ultraviolet radiation fluid treatment system with a pre-perforated baffle that includes a pre-perforated baffle that uses a plurality of jets to enhance turbulent mixing of the fluid in the fluid treatment zone to reduce or even out the range of variation of the ultraviolet radiation dose in the fluid treatment zone and a baffle design, arrangement and embodiment that both improves the ultraviolet radiation dose distribution by allowing the fluid to flow near the ultraviolet radiation source and significantly enhances the overall structural strength and stability of the fluid treatment chamber by fully utilizing the material of the baffle without increasing the amount or strength of the material in the fluid treatment chamber, having the advantages of compact structure and relatively low cost. Designs and embodiments of ultraviolet radiation reactors for treating fluids such as drinking water.
[ description of the drawings ]
FIG. 1 shows a cross-sectional view of the present invention in the direction of fluid flow;
FIG. 2 is an isometric view of the present invention; and
fig. 3 is an end view of the present invention in the direction of fluid flow.
[ detailed description ] embodiments
The mounting seat for fixing the radiation source socket and the base seat for fixing the bottom end of the radiation source assembly of the present invention are further illustrated and described in detail below by taking the ultraviolet disinfection device as an example and combining the drawings of the specification.
Referring to fig. 1, the present invention provides an ultraviolet radiation fluid treatment system with a front porous baffle plate, which comprises a fluid treatment chamber, a front porous baffle plate, an ultraviolet radiation source assembly, etc.; the fluid treatment chamber is of a plane four-way tubular structure, wherein two openings on the same axis are respectively a fluid inlet and a fluid outlet, and the other two openings on the same axis are closed by baffles which are parallel to each other and are provided with ultraviolet radiation source component mounting holes, so that a fluid treatment area with the axis which is basically vertical to the axis of the fluid inlet and outlet ends is formed; a source assembly of ultraviolet radiation disposed in said fluid treatment zone comprising at least two elongate sources of ultraviolet radiation and a protective sleeve; the radiation source assemblies are parallel to each other and substantially perpendicular to the direction of fluid flow.
Preferably, the preposed porous flow guide plate is provided with at least two holes, is arranged at the upstream of a fluid treatment area in the fluid treatment chamber, is connected with the inner wall of the fluid treatment chamber, is symmetrically arranged at two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, forms an included angle of 25-85 degrees with the plane determined by the axes of the fluid inlet and the fluid outlet and inclines towards the fluid inlet side.
Preferably, a flow guide plate is arranged in the fluid treatment area, one side of the flow guide plate is connected with the inner wall surface of the fluid treatment area at the intersection line of a plane which passes through the axis of the fluid treatment area and is perpendicular to a plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area and the inner wall surface of the fluid treatment area, extends obliquely from the inner wall surface of the fluid treatment area to the fluid outlet side, and forms an included angle of 25-90 degrees with the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area; the guide plates are symmetrically arranged on two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, and two ends of the guide plates are respectively connected with the baffle plate for installing and fixing the ultraviolet radiation source component.
Preferably wherein the ultraviolet radiation source comprises a medium pressure ultraviolet lamp, a low pressure high output ultraviolet lamp, a pulsed ultraviolet lamp, an ultraviolet light emitting diode, and combinations thereof.
As shown in fig. 1 to 3, the fluid-tight chamber of the present invention includes a fluid inlet 10, a region 11 for treating a fluid, and a fluid outlet 12, and the treated fluid flows out through the fluid outlet 12. In the fluid treatment zone 11, there is arranged an ultraviolet radiation source assembly comprising 3 radiation sources, 21 and 28-a,28-b, parallel to each other and perpendicular to the direction of fluid flow,
to enhance turbulent fluid mixing in the fluid treatment zone, pre-perforated baffles 16-a and 16-b are provided upstream of the assembly of UV radiation sources as described in the examples. The preposed porous guide plates are connected with the inner wall of the fluid processing chamber, respectively form an included angle of 25-85 degrees with a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid processing area, incline towards the fluid inlet side, and are symmetrically arranged at two sides of the plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid processing area. The flow guide holes 18 are arranged on the preposed porous flow guide plates, a plurality of jet flows 29 passing through the flow guide holes 18 form an included angle with the main flow direction entering the fluid treatment area from the opening edges of the two preposed porous flow guide plates, the violent mixing of a plurality of streams of fluids in different flow directions is beneficial to enhancing the turbulent motion degree of the fluid in the fluid treatment area, and the quiescent flow area widely existing in the fluid treatment area of the existing ultraviolet radiation fluid treatment device is reduced or eliminated, so that the distribution of the ultraviolet radiation dose in the fluid treatment area is changed.
The position of the pre-porous baffle is related to the diameter D of the fluid treatment zone. Proper selection of the mounting angle of the pre-perforated baffles and the distance between the open edge of the pre-perforated baffles and the plane 15 through the axis of the fluid treatment zone and perpendicular to the plane defined by the axis of the fluid inlet and outlet and the axis of the fluid treatment zone controls the mixing zone in the proper location in the fluid treatment zone. Preferably, the distance between the opening edge of the preposed porous flow guide plate and a plane 15 which passes through the axis of the fluid treatment area and is vertical to the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area is between 3D/8 and 3D/4, the diameter of the flow guide hole is between 8 millimeters and 32 millimeters, the distance between the holes is not less than 15 millimeters, and the number of the holes is determined according to the arc-shaped area of the preposed porous flow guide plate.
Since the intensity of the ultraviolet radiation in the fluid treatment zone decreases rapidly with increasing distance from the radiation source, it is necessary to provide baffles 19-a and 19-b in the fluid treatment zone 11 as described in the embodiment of fig. 1 to avoid areas below the required ultraviolet radiation dose due to higher velocity flow in the lower radiation intensity areas. The baffle acts to direct fluid from a low radiation intensity region near the sidewall of the fluid treatment zone to a high radiation intensity region near the ultraviolet radiation source. The uv dose distribution is thus made uniform, i.e. neither significant low dose areas nor areas significantly exceeding the required dose are present in the fluid treatment zone 11. However, baffles also have the disadvantage of increasing the flow resistance of the fluid treatment system. Therefore, the number of uv radiation sources, the mounting angles of the baffles and the open areas between the baffles should be carefully selected in the fluid treatment system design to meet the drag loss characteristics of the fluid treatment process.
In the embodiment shown in fig. 1, the baffles 19-a and 19-b are symmetrically disposed on opposite sides of a plane defined by the fluid inlet and outlet axes and the fluid treatment zone axis in the fluid treatment zone 11 as described in the embodiment, one side of each baffle is connected to the inner wall surface of the fluid treatment zone at an intersection of a plane 15 passing through the fluid treatment zone axis and perpendicular to the plane defined by the fluid inlet and outlet axes and the fluid treatment zone axis and the inner wall surface of the fluid treatment zone, the two sides are connected to baffles to which the uv radiation source assemblies are mounted and which form an included angle of 25 to 90 degrees with the plane defined by the fluid inlet and outlet axes and the fluid treatment zone axis, respectively, the baffles extend obliquely from the inner wall of the fluid treatment zone to the fluid outlet side, the distance between the open sides of the baffles is related to the fluid treatment zone diameter D, and the corresponding flow characteristics and allowable flow resistance losses are determined by the distance between the two uv radiation sources 28-a and 28-b closest to the baffles. Preferably, the distance between the open edges of the baffle is between 5D/8 and 7D/8.
From the structural stress analysis, it can be seen that the maximum stress generated by the wall surface of the constant-diameter four-way fluid processing chamber shown in fig. 2 under the action of the internal fluid pressure is located around the intersection of four constant-diameter pipe sections on a plane 15 passing through the axis of the fluid processing region and perpendicular to a plane defined by the axis of the fluid inlet/outlet and the axis of the fluid processing region. The connection of the guide plate with the inner wall surface of the fluid treatment cavity on the plane passing through the point can obviously increase the structural strength of the four-way fluid treatment cavity and reduce the maximum stress. It can be seen that the baffle design and location and configuration presented by the present invention, in addition to meeting the flow conditions required for uniform distribution of uv radiation dose within the fluid treatment zone, also has the advantage of significantly increasing the structural strength of the fluid treatment four-way chamber without increasing the thickness or material strength of the fluid treatment chamber side walls.
The present invention differs from the prior art with respect to baffles located in the fluid treatment zone in that: the flow guide plates 19-a and 19-b always extend obliquely from the intersection line of a plane 15 which passes through the axis of the fluid treatment area and is vertical to the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area and the wall surface of the fluid treatment cavity to the outlet side of the fluid, namely the initial positions of the flow guide plates 19-a and 19-b are irrelevant to the position of the ultraviolet radiation source, and the position of the ultraviolet radiation source close to the flow guide plates is determined by the position of the opening edge of the flow guide plates; however, in the prior art, the position of the baffle is determined by the position of the ultraviolet radiation source closest to the baffle, so that the starting edge of the baffle cannot be ensured to be positioned at the intersection line of the plane 15 passing through the axis of the fluid treatment area and perpendicular to the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area and the wall surface of the fluid treatment cavity, and the material of the baffle cannot be fully utilized to increase the connection strength of the equal-diameter four-way fluid treatment cavity.
In the fluid treatment device, the ultraviolet radiation source may be a medium-pressure ultraviolet lamp, a low-pressure high-output ultraviolet lamp, a pulsed ultraviolet lamp, an ultraviolet light emitting diode, a combination thereof, or other light sources capable of generating ultraviolet light.
The essence of the invention lies in that a plurality of jet flows which are generated by the preposed porous guide plate and have different flowing directions with the main flow are utilized to enhance the turbulent mixing of the fluid treatment area, the ultraviolet radiation dose distribution of the fluid treatment area is homogenized, and the guide plate positioned in the fluid treatment area is arranged at the maximum stress position of the fluid treatment cavity, so that the structural strength of the fluid treatment cavity is enhanced by fully utilizing the material of the guide plate. Although only an embodiment comprising 3 uv radiation sources is shown in the drawings and the invention has been described in detail with this embodiment, it will be apparent to a person skilled in the art that any changes and modifications can be made without departing from the spirit of the invention, e.g. using other numbers of uv radiation sources, etc., without departing from the spirit of the invention and without exceeding the scope of protection of the patent of the invention.

Claims (2)

1. An ultraviolet radiation fluid treatment system with a leading porous baffle, comprising: a fluid treatment chamber, a front porous baffle and an ultraviolet radiation source assembly; the fluid treatment chamber is of a plane four-way tubular structure, wherein two openings on the same axis are respectively a fluid inlet and a fluid outlet, and the other two openings on the same axis are closed by baffles which are parallel to each other and are provided with ultraviolet radiation source component mounting holes, so that a fluid treatment area with the axis which is basically vertical to the axis of the fluid inlet and outlet ends is formed; a source assembly of ultraviolet radiation disposed in said fluid treatment zone comprising at least two elongate sources of ultraviolet radiation and a protective sleeve; the radiation source assemblies are parallel to each other and substantially perpendicular to the direction of fluid flow;
the prepositive porous guide plate is provided with at least two holes, is arranged at the upstream of a fluid treatment area in the fluid treatment chamber, is connected with the inner wall of the fluid treatment chamber, is symmetrically arranged at two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, forms an included angle of 25-85 degrees with the plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, and inclines towards the fluid inlet side;
the fluid treatment area is provided with a flow guide plate, one side of the flow guide plate is connected with the inner wall surface of the fluid treatment area at the intersection line of a plane which passes through the axis of the fluid treatment area and is vertical to the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area and the inner wall surface of the fluid treatment area, extends from the inner wall surface of the fluid treatment area to the outlet side of the fluid in an inclined way, and forms an included angle of 25-90 degrees with the plane determined by the axis of the fluid inlet and outlet and the axis of the fluid treatment area; the guide plates are symmetrically arranged on two sides of a plane determined by the axes of the fluid inlet and the fluid outlet and the axis of the fluid treatment area, and two ends of the guide plates are respectively connected with the baffle plate for installing and fixing the ultraviolet radiation source component.
2. The ultraviolet radiation fluid treatment system with pre-perforated baffles of claim 1, wherein the ultraviolet radiation source comprises a medium pressure ultraviolet lamp, a low pressure high output ultraviolet lamp, a pulsed ultraviolet lamp, an ultraviolet light emitting diode, and combinations thereof.
CN202010259084.6A 2020-04-03 2020-04-03 Ultraviolet radiation fluid treatment system with front porous guide plate Active CN113493231B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2743327Y (en) * 2004-11-26 2005-11-30 深圳市海川实业股份有限公司 Flow deflection structure used in ultraviolet ray sterilization system
CN102372387A (en) * 2011-09-30 2012-03-14 重庆市财信环保投资股份有限公司 Advanced treatment process of municipal wastewater
CN204981193U (en) * 2015-07-14 2016-01-20 无锡中科智远科技有限公司 Guiding device
CN108059208A (en) * 2017-12-29 2018-05-22 安力斯(天津)环保设备制造有限公司 A kind of integral type large size disinfection by ultraviolet light cavity
CN108622977A (en) * 2018-04-11 2018-10-09 青岛杰生电气有限公司 Dynamic Water sterilizing unit
CN110002535A (en) * 2019-05-07 2019-07-12 深圳中标南方低碳经济标准化研究院有限公司东莞分公司 A kind of ultraviolet radiation fluid processor with on-line auto-cleaning function

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6781137B2 (en) * 1999-03-15 2004-08-24 Malcolm Robert Snowball Fluid treatment apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2743327Y (en) * 2004-11-26 2005-11-30 深圳市海川实业股份有限公司 Flow deflection structure used in ultraviolet ray sterilization system
CN102372387A (en) * 2011-09-30 2012-03-14 重庆市财信环保投资股份有限公司 Advanced treatment process of municipal wastewater
CN204981193U (en) * 2015-07-14 2016-01-20 无锡中科智远科技有限公司 Guiding device
CN108059208A (en) * 2017-12-29 2018-05-22 安力斯(天津)环保设备制造有限公司 A kind of integral type large size disinfection by ultraviolet light cavity
CN108622977A (en) * 2018-04-11 2018-10-09 青岛杰生电气有限公司 Dynamic Water sterilizing unit
CN110002535A (en) * 2019-05-07 2019-07-12 深圳中标南方低碳经济标准化研究院有限公司东莞分公司 A kind of ultraviolet radiation fluid processor with on-line auto-cleaning function

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