CN113487926A - Semiconductor etching technology education training and assessment method based on virtual reality - Google Patents
Semiconductor etching technology education training and assessment method based on virtual reality Download PDFInfo
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
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Abstract
The utility model provides a semiconductor etching technology education training and examination method based on virtual reality, solve factors such as present etching process training cost height and place and equipment are restricted, provide immersive study, training and aassessment environment for the student, not only show the complete demonstration of sculpture preparation technology for the student, more through the mode of immersive experience, make the student master the semiconductor and receive processing technology a little in the short time, the restriction of time space and actual conditions has been broken through, simultaneously the cost is practiced thrift again, unnecessary trouble and danger have been avoided, can also be close to reality to the utmost, make the student experience receive the charm of sculpture a little processing a little personally on the scene.
Description
Technical Field
The invention belongs to the technical field of semiconductor processing education, and particularly relates to a semiconductor etching technology education training and assessment method based on virtual reality.
Background
Etching technology (etching technology) is a technology for selectively etching or stripping a surface of a semiconductor substrate or a surface coating film according to a mask pattern or design requirements in a semiconductor process. Etching techniques are not only basic manufacturing processes for semiconductor devices and integrated circuits, but also applied to the processing of thin film circuits, printed circuits, and other fine patterns. Etching can also be divided into wet etching and dry etching. At present, China seriously depends on chips imported from abroad, although the domestic semiconductor industry is gradually breaking the blockade of foreign technologies, the international advanced level still has a small gap, talents and technical reserves are lacked in the aspect of etching technology, and related production equipment and education resources are also lacked.
In the current etching training, teaching contents such as basic principles and equipment information related to etching, basic flows and operation steps of an etching process, corresponding cautions and the like are generally learned through characters, animation or videos in a classroom, then the teaching contents enter an actual ultra-clean room to watch the full-flow operation of an operator and listen to detailed explanation of a teacher, and finally the teaching contents follow the operator to participate in actual operation step by step.
The etching process training is limited by aspects such as sites, equipment, teaching staff levels and the like. Most of the current etching training only stays at a theoretical training stage, and students usually only stay at a theoretical knowledge level for understanding the etching technology, so that the effect is not ideal; various devices used for micro-nano processing at present are basically in a full load carrying state in order to meet the actual production requirement, and can be used for etching devices for practice training, teaching personnel and even time to difficultly meet the actual teaching requirement; the cost of etching operation is very high, and in the training and process practice processes, due to incomplete knowledge storage of trainees and inexperienced operation, illegal use of dangerous chemical reagents or misoperation of equipment frequently occurs, so that property loss and even personal safety are damaged; the existing examination and verification system has low degree of freedom for the operation of the trainee, limits the operation of the trainee on standard operation, provides limited exploration and improvement space for the trainee, and is difficult to deal with dangerous conditions caused by various misoperation in actual operation. These objective reasons have all placed considerable limitations on the level of training, cost reduction and scale-up of semiconductor process personnel.
Disclosure of Invention
The purpose of the invention is as follows: aiming at the problems and the defects in the prior art, the invention aims to provide a semiconductor etching technology education training and assessment method based on virtual reality, which solves the problems of high training cost, limited field and equipment and the like of the existing etching technology and provides an immersive learning, training and assessment environment for students.
The technical scheme is as follows: the invention provides a semiconductor etching technology education training and assessment method based on virtual reality, which comprises the following steps:
step 1: starting a host system, connecting a server side of the host system with a client side, wherein the client side is responsible for displaying and interacting virtual scenes, and trainees log in the host system through own accounts and passwords;
step 2: the client side leads in corresponding etching process virtual training courseware from the server side according to the authority of the trainee, displays an etching process principle training item, an etching process operation skill training item and an examination item on a display interface of a host system, the trainee selects the current required training item according to the self authority, if the trainee is the etching process principle training item, the step 3 is carried out, if the trainee is the etching process operation training item, the step 6 is carried out, and if the trainee is the examination item, the step 9 is carried out;
and step 3: an etching process principle training unit is generated on a display interface, trainees select etching process principle training contents and inform a host system, and the host system completes connection between hardware and software and scheduling of resources;
and 4, step 4: the host system calls out virtual teaching aids in a virtual scene, deeply and delicately explains the currently learned technological principle of the trainee in a mode of combining characters, voice and animation, sets corresponding problems in the explanation process, examines the learning condition of the trainee in a selection and judgment mode, transmits corresponding data to a server, judges whether the trainee masters the learned knowledge or not, and enters the learning of the next knowledge point if the answer is correct; otherwise, entering step 5; if all the knowledge points of a process principle are completely learned, returning to the step 3; if the trained personnel finish learning all the process principles in the plan, returning to the step 2 to enter the learning of the next project;
and 5: the system prompts that the answer is wrong, the virtual assistant teaching is combined with characters, voice or animation to explain the mistake and the serious consequence to the trainee in detail, the corresponding knowledge point is reviewed, and then the learning of the next knowledge point is continued;
step 6: the display interface displays specific etching process operation training items such as an IBE process, an RIE process, an ICP process, a deep silicon etching process, a soaking process, a spraying process and the like, trainees select the operation training items required to be carried out currently, a host system is informed, and the host system completes various preparation works;
and 7: the host system generates a process selected by the trainee in a virtual scene to demonstrate animation, guides the trainee to finish each step of operation, and explains key operation actions in detail when the trainee operates by virtual teaching aids;
and 8: transmitting interactive action data generated by the trainee to a server, judging whether the trainee takes correct operation, if so, entering the next step, otherwise, entering step 9; if all the steps of operating the training project are finished, returning to the step 6; if all the operation training projects are finished, returning to the step 2 to enter the learning of the next project;
and step 9: the system prompts an operation error, simulates and demonstrates correct virtual actions corresponding to the non-standard behaviors to the trainee again, guides the trainee to finish the operation correctly, and enters the learning of the next operation;
step 10: generating an examination content list on a display interface, selecting examination content by trainees, and generating a corresponding virtual scene by a host system according to the selection of the trainees;
step 11: the trainees act in the virtual scene according to the examination requirements and transmit the acquired interactive data to the server side in real time; judging whether the trained personnel adopt correct operation in real time according to the interactive data, if not, entering step 12, otherwise, entering step 13;
step 12: the host system prompts a behavior error, finishes the examination and enters a step 13;
step 13: recording the examination progress of the trained personnel, storing all operation records, and pushing the examination result to related departments.
Further, in the semiconductor etching technology education training and assessment method based on virtual reality, in the step 3, the hardware is a VR server, a client and a teaching field video unit, and the client comprises at least one of a CAVE system containing VR technology, a VR head display or AR glasses; the software comprises an internet data unit, a login unit, an image and audio processing unit, an intelligent explanation unit and an assessment and evaluation unit.
Further, in the method for education training and examination of semiconductor etching technology based on virtual reality, the IBE process in the step 6 is ion beam etching, Ar gas is filled into an ion source discharge chamber and ionized to form plasma, then ions are led out in a beam shape by a grid and accelerated, the ion beam with certain energy enters a working chamber and is emitted to the surface of a solid to impact atoms on the surface of the solid, so that the atoms of the material are sputtered, and the aim of etching is fulfilled. Used for etching substances and metals which are difficult to etch.
Further, in the above teaching training and checking method based on virtual reality for semiconductor etching technology, the RIE process is reactive ion etching, fluorine-based reactive gas is decomposed under the action of a radio frequency source to generate active reactive components, and the active reactive components and the etched material generate physical and chemical actions under the action of a self-bias electric field to finally generate gas volatile matters, thereby achieving the purpose of etching.
Further, in the above teaching and assessment method based on virtual reality for semiconductor etching technology, the ICP process in step 6 is inductively coupled plasma etching, and reaction gas is introduced to decompose the inductively coupled plasma by glow discharge, and the generated plasma with strong chemical activity moves to the surface of the sample under the acceleration action of the electric field, and performs chemical reaction on the surface of the sample to generate volatile gas, and has a certain physical etching action.
Further, in the above teaching training and assessment method based on virtual reality for semiconductor etching technology, in step 6, the deep silicon etching is deep reactive ion etching, a microelectronic dry etching process, and etching is performed by chemical action and physical action based on fluorine-based gas high aspect ratio silicon etching technology.
Further, in the above semiconductor etching technology education training and assessment method based on virtual reality, the judgment criteria of the operation in step 8 are as follows:
(1): whether the trained personnel operate according to the operation flow which is already standardized in the whole flow or not;
(2): whether the relevant operation meets the correct operation method set by the system or not, and if not, corresponding serious results are caused.
Further, in the semiconductor etching technology education training and assessment method based on the virtual reality, in the step 10, the assessment content list comprises theoretical knowledge assessment and operation skill assessment, the theoretical knowledge assessment can be performed only after the theoretical knowledge assessment is passed, the theoretical knowledge assessment comprises various etching process teaching and corresponding various etching equipment teaching, and the operation skill assessment content comprises randomly extracting materials and automatically selecting etching equipment in a virtual space for operation or directly operating the given etching equipment.
Further, in the above semiconductor etching technology education training and assessment method based on virtual reality, the interactive data in step 11 judges the operation standard in real time:
(1): judging the front and back sequence of the trainee in the virtual space operation through the interactive data;
(2): recording related data input by the trainee through interactive data;
(3): and (4) comparing the standard flow with the standard flow in the built-in assessment resources of the courseware according to the principle in the step (3).
The technical scheme shows that the invention has the following beneficial effects: the semiconductor etching technology education training and assessment method based on virtual reality not only displays the etching preparation process to students completely, but also enables the students to master the semiconductor micro-nano processing process in a short time in an immersion type experience mode, breaks through the limitation of time space and actual conditions, saves cost, avoids unnecessary troubles and dangers, can be close to reality to the greatest extent, enables the students to experience the charm of micro-nano processing etching personally, and has high popularization value.
Drawings
FIG. 1 is a frame diagram of the semiconductor etching technology education training and assessment method based on virtual reality.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
Examples
The semiconductor etching technology education training and assessment method based on the virtual reality as shown in figure 1 comprises the following steps:
step 1: starting a host system, connecting a server side of the host system with a client side, wherein the client side is responsible for displaying and interacting virtual scenes, and trainees log in the host system through own accounts and passwords;
step 2: the client side leads in corresponding etching process virtual training courseware from the server side according to the authority of the trainee, displays an etching process principle training item, an etching process operation skill training item and an examination item on a display interface of a host system, the trainee selects the current required training item according to the self authority, if the trainee is the etching process principle training item, the step 3 is carried out, if the trainee is the etching process operation training item, the step 6 is carried out, and if the trainee is the examination item, the step 9 is carried out;
and step 3: an etching process principle training unit is generated on a display interface, trainees select etching process principle training contents and inform a host system, and the host system completes connection between hardware and software and scheduling of resources;
and 4, step 4: the host system calls out virtual teaching aids in a virtual scene, deeply and delicately explains the currently learned technological principle of the trainee in a mode of combining characters, voice and animation, sets corresponding problems in the explanation process, examines the learning condition of the trainee in a selection and judgment mode, transmits corresponding data to a server, judges whether the trainee masters the learned knowledge or not, and enters the learning of the next knowledge point if the answer is correct; otherwise, entering step 5; if all the knowledge points of a process principle are completely learned, returning to the step 3; if the trained personnel finish learning all the process principles in the plan, returning to the step 2 to enter the learning of the next project;
and 5: the system prompts that the answer is wrong, the virtual assistant teaching is combined with characters, voice or animation to explain the mistake and the serious consequence to the trainee in detail, the corresponding knowledge point is reviewed, and then the learning of the next knowledge point is continued;
step 6: the display interface displays specific etching process operation training items such as an IBE process, an RIE process, an ICP process, a deep silicon etching process, a soaking process, a spraying process and the like, trainees select the operation training items required to be carried out currently, a host system is informed, and the host system completes various preparation works;
and 7: the host system generates a process selected by the trainee in a virtual scene to demonstrate animation, guides the trainee to finish each step of operation, and explains key operation actions in detail when the trainee operates by virtual teaching aids;
and 8: transmitting interactive action data generated by the trainee to a server, judging whether the trainee takes correct operation, if so, entering the next step, otherwise, entering step 9; if all the steps of operating the training project are finished, returning to the step 6; if all the operation training projects are finished, returning to the step 2 to enter the learning of the next project;
and step 9: the system prompts an operation error, simulates and demonstrates correct virtual actions corresponding to the non-standard behaviors to the trainee again, guides the trainee to finish the operation correctly, and enters the learning of the next operation;
step 10: generating an examination content list on a display interface, selecting examination content by trainees, and generating a corresponding virtual scene by a host system according to the selection of the trainees;
step 11: the trainees act in the virtual scene according to the examination requirements and transmit the acquired interactive data to the server side in real time; judging whether the trained personnel adopt correct operation in real time according to the interactive data, if not, entering step 12, otherwise, entering step 13;
step 12: the host system prompts a behavior error, finishes the examination and enters a step 13;
step 13: recording the examination progress of the trained personnel, storing all operation records, and pushing the examination result to related departments.
The hardware in the step 3 is a VR server, a client and a teaching field video unit, and the client comprises at least any one of a CAVE system containing VR technology, a VR head display or AR glasses; the software comprises an internet data unit, a login unit, an image and audio processing unit, an intelligent explanation unit and an assessment and evaluation unit.
The IBE process in the step 6 is ion beam etching, Ar gas is filled into an ion source discharge chamber and ionized to form plasma, then ions are led out in a beam shape by a grid and accelerated, the ion beam with certain energy enters a working chamber and is emitted to the surface of a solid to impact atoms on the surface of the solid, so that the atoms of the material are sputtered, and the aim of etching is fulfilled. Used for etching substances and metals which are difficult to etch.
And 6, the RIE process is reactive ion etching, fluorine-based reaction gas is decomposed under the action of a radio frequency source to generate active reaction components, and the active reaction components and the etched material generate physical and chemical actions under the action of a self-bias electric field to finally generate gas volatile matters, so that the aim of etching is fulfilled.
The ICP process in the step 6 is inductively coupled plasma etching, reaction gas is introduced and decomposed by using inductively coupled plasma glow discharge, the generated plasma with strong chemical activity moves to the surface of a sample under the acceleration action of an electric field, the chemical reaction is carried out on the surface of the sample to generate volatile gas, and the volatile gas has a certain physical etching action.
The deep silicon etching in the step 6 is deep reactive ion etching, a micro-electronic dry etching process, a high aspect ratio silicon etching technology based on fluorine-based gas, the same principle as the reactive ion etching technology, and etching is carried out through chemical action and physical action. The difference lies in that: two radio frequency sources: the generation of plasma is separated from the generation of self-bias voltage, so that the contradiction between radio frequency power and plasma density in RIE etching is effectively avoided; bosch process with alternating etching and passivation: the protection of the side wall is realized, the controllable lateral etching can be realized, and the side wall with a steep or other inclined angles can be manufactured.
The judgment criteria of the operation in the step 8 are as follows:
(1): whether the trained personnel operate according to the operation flow which is already standardized in the whole flow or not;
(2): whether the relevant operation meets the correct operation method set by the system or not, and if not, corresponding serious results are caused. For example: whether the wafer is placed to be aligned with the corresponding position of the clamp or not is judged, and if not, no calibration is caused; whether the selection of the bin position is correct in the deep silicon etching.
The examination content list in the step 10 comprises theoretical knowledge examination and operation skill examination, the operation skill examination can be performed after the theoretical knowledge examination and the operation skill examination are qualified, the theoretical knowledge examination comprises various etching process teaching and corresponding various etching equipment teaching, and the operation skill examination content comprises randomly extracting materials and automatically selecting etching equipment in a virtual space for operation or directly operating the given etching equipment.
The interactive data real-time judgment operation standard in the step 11 is as follows:
(1): judging the front and back sequence of the trainee in the virtual space operation through the interactive data;
(2): recording related data input by the trainee through interactive data;
(3): and (4) comparing the standard flow with the standard flow in the built-in assessment resources of the courseware according to the principle in the step (3).
The foregoing is only a preferred embodiment of the present invention, and it should be noted that modifications can be made by those skilled in the art without departing from the principle of the present invention, and these modifications should also be construed as the protection scope of the present invention.
Claims (9)
1. A semiconductor etching technology education training and assessment method based on virtual reality is characterized in that: the method comprises the following steps:
step 1: starting a host system, connecting a server side of the host system with a client side, wherein the client side is responsible for displaying and interacting virtual scenes, and trainees log in the host system through own accounts and passwords;
step 2: the client side leads in corresponding etching process virtual training courseware from the server side according to the authority of the trainee, displays an etching process principle training item, an etching process operation skill training item and an examination item on a display interface of a host system, the trainee selects the current required training item according to the self authority, if the trainee is the etching process principle training item, the step 3 is carried out, if the trainee is the etching process operation training item, the step 6 is carried out, and if the trainee is the examination item, the step 9 is carried out;
and step 3: an etching process principle training unit is generated on a display interface, trainees select etching process principle training contents and inform a host system, and the host system completes connection between hardware and software and scheduling of resources;
and 4, step 4: the host system calls out virtual teaching aids in a virtual scene, deeply and delicately explains the currently learned technological principle of the trainee in a mode of combining characters, voice and animation, sets corresponding problems in the explanation process, examines the learning condition of the trainee in a selection and judgment mode, transmits corresponding data to a server, judges whether the trainee masters the learned knowledge or not, and enters the learning of the next knowledge point if the answer is correct; otherwise, entering step 5; if all the knowledge points of a process principle are completely learned, returning to the step 3; if the trained personnel finish learning all the process principles in the plan, returning to the step 2 to enter the learning of the next project;
and 5: the system prompts that the answer is wrong, the virtual assistant teaching is combined with characters, voice or animation to explain the mistake and the serious consequence to the trainee in detail, the corresponding knowledge point is reviewed, and then the learning of the next knowledge point is continued;
step 6: the display interface displays specific etching process operation training items such as an IBE process, an RIE process, an ICP process, a deep silicon etching process, a soaking process, a spraying process and the like, trainees select the operation training items required to be carried out currently, a host system is informed, and the host system completes various preparation works;
and 7: the host system generates a process selected by the trainee in a virtual scene to demonstrate animation, guides the trainee to finish each step of operation, and explains key operation actions in detail when the trainee operates by virtual teaching aids;
and 8: transmitting interactive action data generated by the trainee to a server, judging whether the trainee takes correct operation, if so, entering the next step, otherwise, entering step 9; if all the steps of operating the training project are finished, returning to the step 6; if all the operation training projects are finished, returning to the step 2 to enter the learning of the next project;
and step 9: the system prompts an operation error, simulates and demonstrates correct virtual actions corresponding to the non-standard behaviors to the trainee again, guides the trainee to finish the operation correctly, and enters the learning of the next operation;
step 10: generating an examination content list on a display interface, selecting examination content by trainees, and generating a corresponding virtual scene by a host system according to the selection of the trainees;
step 11: the trainees act in the virtual scene according to the examination requirements and transmit the acquired interactive data to the server side in real time; judging whether the trained personnel adopt correct operation in real time according to the interactive data, if not, entering step 12, otherwise, entering step 13;
step 12: the host system prompts a behavior error, finishes the examination and enters a step 13;
step 13: recording the examination progress of the trained personnel, storing all operation records, and pushing the examination result to related departments.
2. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: in the step 3, the hardware is a VR server, a client and a teaching field video unit, and the client comprises at least any one of a CAVE system containing VR technology, a VR head display or AR glasses; the software comprises an internet data unit, a login unit, an image and audio processing unit, an intelligent explanation unit and an assessment and evaluation unit.
3. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the IBE process in the step 6 is ion beam etching, Ar gas is filled into an ion source discharge chamber and ionized to form plasma, then ions are led out in a beam shape and accelerated by a grid electrode, the ion beam with certain energy enters a working chamber and is emitted to the surface of a solid to impact atoms on the surface of the solid, so that material atoms are sputtered, the purpose of etching is achieved, and the IBE process belongs to a pure physical process and is used for etching substances and metals which are difficult to etch.
4. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: and 6, the RIE process is reactive ion etching, fluorine-based reaction gas is decomposed under the action of a radio frequency source to generate active reaction components, and the active reaction components and the etched material generate physical and chemical actions under the action of a self-bias electric field to finally generate gas volatile matters, so that the aim of etching is fulfilled.
5. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the ICP process in the step 6 is inductively coupled plasma etching, reaction gas is introduced and decomposed by using inductively coupled plasma glow discharge, the generated plasma with strong chemical activity moves to the surface of a sample under the acceleration action of an electric field, the chemical reaction is carried out on the surface of the sample to generate volatile gas, and the volatile gas has a certain physical etching action.
6. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the deep silicon etching in the step 6 is deep reactive ion etching, a microelectronic dry etching process, and etching is carried out through chemical action and physical action based on a fluorine-based gas high aspect ratio silicon etching technology.
7. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the judgment criteria of the operation in the step 8 are as follows:
(1): whether the trained personnel operate according to the operation flow which is already standardized in the whole flow or not;
(2): whether the relevant operation meets the correct operation method set by the system or not, and if not, corresponding serious results are caused.
8. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the examination content list in the step 10 comprises theoretical knowledge examination and operation skill examination, the operation skill examination can be performed after the theoretical knowledge examination and the operation skill examination are qualified, the theoretical knowledge examination comprises various etching process teaching and corresponding various etching equipment teaching, and the operation skill examination content comprises randomly extracting materials and automatically selecting etching equipment in a virtual space for operation or directly operating the given etching equipment.
9. The virtual reality-based semiconductor etching technology education training and assessment method according to claim 1, wherein: the interactive data real-time judgment operation standard in the step 11 is as follows:
(1): judging the front and back sequence of the trainee in the virtual space operation through the interactive data;
(2): recording related data input by the trainee through interactive data;
(3): and (4) comparing the standard flow with the standard flow in the built-in assessment resources of the courseware according to the principle in the step (3).
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