CN113473687A - High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster - Google Patents

High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster Download PDF

Info

Publication number
CN113473687A
CN113473687A CN202110484157.6A CN202110484157A CN113473687A CN 113473687 A CN113473687 A CN 113473687A CN 202110484157 A CN202110484157 A CN 202110484157A CN 113473687 A CN113473687 A CN 113473687A
Authority
CN
China
Prior art keywords
anode
magnetic field
plasma thruster
field plasma
multistage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202110484157.6A
Other languages
Chinese (zh)
Other versions
CN113473687B (en
Inventor
毛威
胡鹏
扈延林
吴楠
吴朋安
胡大为
杨健
秦宇
韩道满
任伟
山世华
李胜军
臧娟伟
姚兆普
刘旭辉
高俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Institute of Control Engineering
Original Assignee
Beijing Institute of Control Engineering
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Institute of Control Engineering filed Critical Beijing Institute of Control Engineering
Priority to CN202110484157.6A priority Critical patent/CN113473687B/en
Publication of CN113473687A publication Critical patent/CN113473687A/en
Application granted granted Critical
Publication of CN113473687B publication Critical patent/CN113473687B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03HPRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00Using plasma to produce a reactive propulsive thrust
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/28Cooling arrangements
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors

Abstract

A high-temperature resistant anode structure of a multistage cusped magnetic field plasma thruster comprises a graphite receiving electrode (2), an anode interlayer (3) and an anode bottom (4) which are connected in sequence; wherein, an input pipeline for the working medium gas to enter is arranged on the anode bottom (4), an axial jet hole is arranged on the anode interlayer (3), and a directional jet hole is arranged on the front end surface of the graphite receiving electrode (2). Axial direction of directional injection hole and C1‑C2Are in the same direction of the connecting line, C1And C2The multistage permanent magnet (40) of the multistage cusped magnetic field plasma thruster is closest to the center of an electron high-density area formed by two magnetic tips at the inlet side of a discharge channel (10). The anode structure of the invention collects electrons by using the graphite plate, has good ablation resistance and can endure extremely high working temperature; while utilizing the circumferential direction of the graphite plate at a specific positionThe small holes in the specific direction are uniformly distributed to spray atoms, so that the ionization leakage loss of the atoms near the central axis of the channel and the wall surface of the channel is effectively reduced, and the ionization efficiency of the atoms is improved.

Description

High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster
Technical Field
The invention relates to a high-temperature-resistant anode structure of a multistage cusped magnetic field plasma thruster, and belongs to the technical field of plasma thrusters.
Background
The multi-stage cusped magnetic field plasma thruster is a typical electric thruster in the world at present and is an electric thruster different from a traditional Hall thruster and an ion thruster. Fig. 1 is an axial sectional view schematically showing a multistage cusped magnetic field plasma thruster. Propellant xenon enters the discharge channel from the inlet duct of the anode 20 located upstream of the discharge channel 10; electrons are ejected from the cathode 30 near the outside of the downstream outlet of the discharge channel 10. A part of electrons ejected from the cathode 30 are conducted into the discharge channel 10 from the outlet of the discharge channel 10 under the guiding action of the magnetic field generated by the multi-stage permanent magnet 40, the electrons and propellant atoms are collided and ionized to generate ions, the ions are accelerated by the axial electric field to be ejected to generate thrust, and the electrons reach the anode 20 through various conduction mechanisms. Another part of electrons ejected from the cathode 30 enter the plume region and are neutralized by the ions ejected at high speed, so that the electric neutrality of the plume is maintained. The main components of the multistage cusped magnetic field plasma thruster comprise a discharge channel 10, an anode 20, a cathode 30 and a multistage permanent magnet 40, wherein the multistage permanent magnet 40 generally comprises a 1-stage permanent magnet, a 2-stage permanent magnet, a 3-stage permanent magnet, a 4-stage permanent magnet and the like.
The anode 20 functions to supply power and gas to the multi-stage cusped magnetic field plasma thruster, thereby generating a gas discharge between the anode 20 and the cathode 30, generating plasma, and generating an acceleration effect on the plasma using a high voltage supplied from the anode 20, thereby generating thrust. When gas discharge occurs between the anode 20 and the cathode 30, ions are positively charged, and are accelerated to be ejected to a low potential region at the outlet of the discharge channel 10 by the high voltage anode 20, electrons are negatively charged, and are attracted by the high voltage anode 20 and deposited on the surface of the anode 20, the kinetic energy of the electrons is converted into heat energy, and the anode 20 is heated to a high temperature.
In addition, the magnetic field in the discharge channel 10 of the multistage cusped magnetic field thruster is in a multistage cusped magnetic field configuration, the magnetic field distribution is shown in fig. 1, the magnetic lines of the central axis of the discharge channel 10 are approximately parallel to the axis and the magnetic field is weak, electrons emitted from the cathode 30 are difficult to cross the magnetic lines of the magnetic field near the outlet of the discharge channel 10 to reach the center of the discharge channel 10, which results in low electron density on the central axis of the discharge channel 10, once some high-energy electrons reach the channel axis region due to some conduction mechanism, the electrons are hardly restricted by the magnetic field, and easily reach the anode 20, so as to perform power settlement on the anode 20, and the anode 20 is generally made of stainless steel material and is easily melted by overheating.
Magnetic lines of force at the wall surface of the discharge channel 10 are parallel to the wall surface of the channel, a strong magnetic mirror effect is generated at a magnetic interface generated between adjacent stages of permanent magnets, low-energy electrons are difficult to reach the vicinity of the wall surface, only a small part of high-energy electrons can overcome the magnetic mirror and enter the vicinity of the wall surface, and the electron density near the wall surface of the discharge channel 10 is low. The ionization rate of the propellant of the multi-stage cusped magnetic field plasma thruster directly limits the efficiency of the thruster, the ionization rate mainly depends on parameters such as electron density and electron temperature, and propellant atoms can effectively collide and ionize only when the electron density and the electron temperature are large enough. Therefore, due to the low electron density in the vicinity of the axis of the discharge channel 10 and the channel wall surface of the multi-stage cusped magnetic field thruster, neutral gas atoms supplied by the anode 20 are difficult to be effectively ionized by the low-density electrons in the region, and the atoms are easy to flow out of the discharge channel without time for ionization, so that ionization leakage loss of the propellant is caused.
Disclosure of Invention
The technical problem solved by the invention is as follows: the high-temperature resistant anode structure of the cusped magnetic field plasma thruster can effectively solve the heat resistance problem of the anode, effectively expands the power operation upper limit of the thruster, effectively controls the jet flow area and direction of xenon atoms by the newly-provided anode propellant (xenon) atom supply structure, eliminates the ionization leakage problem that atoms directly flow out of a channel without ionization due to low electron density near the wall surface of the channel and the axis of the channel, and improves the ionization efficiency of the atoms.
The technical solution of the invention is as follows:
a high temperature resistant anode structure of a multistage cusped magnetic field plasma thruster comprises: the graphite receiving electrode, the anode interlayer and the anode bottom are connected in sequence; wherein, an input pipeline for the working medium gas to enter is arranged on the anode bottom, an axial jet hole is arranged on the anode interlayer, and a directional jet hole is arranged on the front end surface of the graphite receiving electrode; the axial direction of the directional jet hole and C1-C2Are in the same direction, wherein C1And C2Is the center of an electron high-density area formed by two magnetic tips of a multi-stage permanent magnet of the multi-stage cusped magnetic field plasma thruster, which are closest to the inlet side of a discharge channel.
The distance from the front end surface of the graphite receiving electrode to the bottom surface of the discharge channel is Z1,Z1So that the tangent line D of the magnetic force line passing through the jet hole on the front end surface of the graphite receiving electrode1-D2Direction and C1-C2The included angle delta of the connecting line does not exceed +/-5 degrees.
The anode bottom comprises a section of slender thin-wall pipe at an inlet for working medium to enter, a section of long pipe with external threads and a section of circular plate with three step holes which are sequentially enlarged and have a larger wall thickness at the middle part, and a large diameter at the outlet part.
The anode interlayer is a cylindrical flat plate with one end being a plane and the other end being a cylindrical counter bore, axial jet holes are uniformly distributed on the cylindrical flat plate in a circular manner, and the diameter of a distribution circle where the axial jet holes are located is larger than that of a long pipe in the middle of the anode bottom and smaller than that of a step hole with the smallest diameter at the outlet of the anode bottom.
The number of the axial jet holes is 6-10, and the diameter is
Figure BDA0003050179170000031
The graphite receiver is of a cylindrical plate structure with one end being a plane and the other end being a thin boss, directional injection holes are uniformly distributed on the cylindrical plate in a circular shape, and the diameter of a circle where the directional injection holes are distributed is smaller than that of the cylindrical counter bore of the anode interlayer.
The number of the directional jet holes is 12-20, and the diameter is
Figure BDA0003050179170000032
The anode front end cover is a hollow cylinder with a small hole at one end and a large hole at the other end and openings at two ends.
The anode interlayer is matched with a section of the second-diameter stepped hole at the anode bottom outlet and is matched with the stepped hole with the smallest diameter to form a first-stage gas homogenizing cavity.
The graphite receiving electrode is matched with a section of step hole with the largest diameter at the outlet at the bottom of the anode, and the graphite receiving electrode is matched with the cylindrical counter bore of the anode interlayer to form a secondary gas homogenizing cavity.
Compared with the prior art, the invention has the advantages that:
(1) aiming at the characteristic of low electron density near the wall surface and near the axis of a discharge channel of the multi-stage cusped magnetic field plasma thruster, the invention avoids the atoms from jetting near the central axis of the discharge channel and near the wall surface of the channel as much as possible by elaborately designing the jetting position and angle of the working medium gas atoms, thereby greatly relieving the atom ionization loss of the center of the discharge channel and the wall surface of the channel of the multi-stage cusped magnetic field thruster, improving the ionization rate and improving the efficiency of the thruster;
(2) the invention adopts two-stage micropore throttling and small-gap homogenizing cavity, improves the gas pressure of gas homogenizing cavities, strengthens the heat convection effect of working medium gas atoms to the anode, can carry away more heat and improves the cooling of the anode. Meanwhile, the graphite receiving electrode with the small injection hole at the specific angle is adopted, the characteristics of large heat conductivity coefficient, large radiance and extremely high melting point of a graphite material are fully utilized, high heat flow of electron deposition can be quickly conducted and radiated, and the high-temperature environment in the working process of the multistage cusped magnetic field plasma thruster can be resisted. The graphite receiving electrode of the anode adopts an installation mode of excircle positioning and end face pressing, the graphite receiving electrode does not relate to welding, the anode has a simple structure and good manufacturability, and is easy and convenient to produce and manufacture.
Drawings
FIG. 1 is a schematic diagram of a multi-stage cusped magnetic field plasma thruster in accordance with the present invention;
FIG. 2 is a schematic view of a high temperature resistant anode according to the present invention;
FIG. 3 is a schematic view of the bottom structure of the anode of the present invention;
FIG. 4 is a schematic view of an anode sandwich structure according to the present invention;
FIG. 5 is a schematic view of a graphite receiver electrode according to the present invention;
FIG. 6 is a schematic view of the structure of the anode front end cap according to the present invention;
FIG. 7 shows the measurement results of the distribution of the anode current density according to the present invention.
Detailed Description
The invention is described in further detail below with reference to the figures and the detailed description.
The magnet of the multistage cusped magnetic field plasma thruster (see fig. 1) is formed by splicing four permanent magnet rings with opposite north and south poles (N, S poles), a hollow cylindrical discharge channel 10 is positioned on the axes of the four permanent magnet rings, the four permanent magnet rings generate multistage cusped magnetic fields in the discharge channel 10, 4 magnetic tips are formed in total, and the magnetic field between every two magnetic tips is almost parallel to the wall surface of the discharge channel.
The electron current density deposited by the anode 20 of the multi-stage cusped magnetic field plasma thruster has strong nonuniformity, and as shown in fig. 7, the peak value of the electron current density within the range of 5mm in diameter by taking the center point of the anode 20 as the center is about 9A/cm2(ii) a The peak value of the electron current density within the range of 25mm in diameter with the center point of the anode 20 as the center is about 2.2A/cm2(ii) a The peak value of the electron current density within the range of 45mm in diameter with the center point of the anode 20 as the center is about 0.2A/cm2. It can be seen that the end face of the anode 20 facing the outlet direction of the discharge channel 10 is subjected to a very uneven heat flux density, and the heat flux density in the central region of the anode 20 is very high.
The internal magnetic field of the multi-stage cusped magnetic field plasma thruster is a 4-stage cusped magnetic field, the magnetic field in the central axis region of the discharge channel 10 is weak, the motion constraint of electrons to the anode 20 is weak, a channel for the electrons to rapidly move from the cathode 30 to the anode 20 exists in the central axis region, the channel is generally called the leakage of the electrons to the anode 20, the electron number density in the axial line region of the channel is low, and the impact ionization effect of the electrons on atoms is weak; the magnetic field near the wall surface of the discharge channel 10 is shaped into 3 magnetic tips and a magnetic field parallel to the wall surface of the channel between the 3 magnetic tips, electrons hardly overcome the magnetic mirror effect of the magnetic tips and transversely cross the parallel magnetic field to reach the vicinity of the wall surface of the channel, so that the number density of electrons near the wall surface of the discharge channel 10 is low, and the impact ionization effect of the electrons on atoms is weak.
The anode structure adopts the integrated design with the gas distributor, the working medium gas firstly enters the first-stage gas homogenizing cavity A through the central gas supply pipe, and then the gas passes through a circle of 6-10 diameters axially sprayed on the anode interlayer 3
Figure BDA0003050179170000051
The small holes uniformly enter a second-stage gas homogenizing cavity B, and finally the gas is directionally sprayed through a circle of 12-20 diameters distributed on the graphite receiving electrode 2
Figure BDA0003050179170000052
And (4) jetting out by using small-hole jet flow. The radius of a distribution circle where the jet flow small holes on the front end surface of the graphite receiving electrode 2 are positioned is R1Axial direction of jet orifice and C1-C2Are in the same direction of the connecting line, C1Is the center of the electron high density region formed by the magnetic tip between the class 1 permanent magnet and the class 2 permanent magnet, C2Is the center of the electron high density region formed by the magnetic tips between the 2-grade permanent magnet and the 3-grade permanent magnet; the front end face of the graphite receiving electrode 2 is spaced from the bottom surface Z of the discharge channel 101,Z1The following conditions should be satisfied: a tangent line D of the magnetic force line passing through the jet orifice at the front end face of the graphite receiving electrode 21-D2Direction and C1-C2The included angle delta of the connecting line does not exceed +/-5 degrees.
The gas supply mode enables the working medium gas to be along the axial position Z1Radial position R1The directional injection is carried out towards the core of the first ionization region and the second ionization region on the circumference, thereby relieving the accumulation of working medium gas near the axis of the discharge channel 10 and near the wall surface of the channel.
Example 1
As shown in fig. 2 to 6, the anode structure of the present invention comprises an anode bottom 4, an anode interlayer 3, a graphite receiving electrode 2, an anode front end cap 1, and the like. Firstly, working medium gas flows from an elongated pipe (length-diameter ratio is 5) with the wall thickness of 0.5mm and the inner diameter of 2mm at the inlet of an anode bottom 4 to a pipe with the wall thickness of 2mm and external threads M6mm and enters the pipeA primary gas homogenization cavity A; then, the working medium gas flows through a circle of throttling pores (with the aperture being equal to that of the orifice) uniformly distributed on the anode interlayer 3 from the primary gas homogenizing cavity A
Figure BDA0003050179170000061
) Entering a secondary gas homogenizing cavity B; finally, the working medium gas flows from the secondary gas homogenizing cavity B through a circle of throttling pores uniformly distributed on the graphite receiving electrode 2 (the radius of a circumferentially distributed reference circle is R)1Pore diameter of
Figure BDA0003050179170000062
) And is sprayed out to enter a discharge channel 10 of the multi-stage cusped magnetic field plasma thruster.
The radius of a distribution circle where the jet flow small holes on the front end surface of the graphite receiving electrode 2 are positioned is R1Axial direction of jet orifice and C1-C2Are in the same direction of the connecting line, C1Is the center of the electron high density region formed by the magnetic tip between the class 1 permanent magnet and the class 2 permanent magnet, C2Is the center of the electron high density region formed by the magnetic tips between the class 1 permanent magnet and the class 2 permanent magnet; the front end surface of the graphite receiving electrode 2 is far from the bottom surface Z of the discharge channel1The tangent line D of the magnetic line passing through the jet orifice at the front end face of the graphite receiving electrode 21-D2Direction and C1-C2The included angle delta of the connecting line does not exceed +/-5 degrees.
The anode bottom 4 is a section of slender thin-wall tube (length is 10mm, wall thickness is 0.5mm, tube inner diameter is
Figure BDA0003050179170000063
) A middle section of long pipe with thread and a slightly larger wall thickness (the length is 30mm, and the inner diameter of the pipe)
Figure BDA0003050179170000064
Diameter of pipe external thread M6mm) and a section of large-diameter circular plate with three step holes which become larger in sequence (diameter of circular plate) at outlet
Figure BDA0003050179170000065
The thickness of the circular plate is 8mm), and the first step hole is
Figure BDA0003050179170000066
The second step hole is
Figure BDA0003050179170000067
The third step hole is
Figure BDA0003050179170000068
The anode bottom 4 is made of tantalum.
The anode interlayer 3 is a cylindrical flat plate (diameter) with one end being a plane and the other end being a cylindrical counter bore
Figure BDA0003050179170000069
2mm thick) and the diameter of the cylindrical counter bore is
Figure BDA00030501791700000610
The depth of the hole is 1mm, a circle of penetrating small holes are uniformly distributed on the cylindrical flat plate, and the diameter of each small hole
Figure BDA00030501791700000611
The distribution interval of the small holes is 60 degrees, the diameter of a distribution circle where the circle of 6 small holes is positioned is larger than the diameter of the pipe at the middle section of the anode bottom 4 and is slightly smaller than the diameter of the first step hole at the outlet section of the anode bottom 4, and the diameter is taken as
Figure BDA00030501791700000612
The anode interlayer 3 is made of tantalum.
The graphite receiving electrode 2 is a cylindrical flat plate structure with one end being a plane and the other end being a thin boss, a circle of penetrating small holes are uniformly distributed on the cylindrical flat plate, and the diameter of each small hole
Figure BDA0003050179170000071
The distribution interval of the small holes is 30 degrees, the diameter of a distribution circle where the 12 small holes are positioned in the circle is smaller than that of the cylindrical counter bore of the anode interlayer 3 and is equal to 2R1. The graphite receiving electrode 2 is made of graphite material, preferably high-purity graphite or pyrolytic graphite.
The anode front end cover 1 is a hollow cylinder with a small hole at one end and a large hole at the other end and two openings at two ends, and is made of tantalum.
The anode interlayer 3 is arranged in a second step hole of the anode bottom 4 and is placed rightly, the graphite receiving electrode 2 is arranged in a third step hole of the anode bottom 4 and is placed rightly, the anode front end cover 1 is sleeved on the anode bottom 4 from the direction of spraying working medium gas of the anode bottom 4, the anode front end cover 1 axially compresses the end faces of the graphite receiving electrode 2 and the anode bottom 4, the inner wall face of a large hole of the anode front end cover 1 and the outer wall face of an outlet section of the anode bottom 4 are in clearance fit (fit clearance is 0.01-0.03 mm), and the anode front end cover 1 and the anode bottom 4 are connected by adopting end face electron beam welding or laser welding. And a stress release groove with the width of 0.5mm and the depth of 0.5mm is arranged at the position, close to the electron beam welding seam, of the anode bottom 4 for releasing stress, so that the bottom surface of the outlet section of the anode bottom 4 is prevented from deforming during end face welding.
Example 2:
set up the external screw thread on the excircle of anode bottom 4 and the cooperation of anode front end housing 1, set up the internal thread on the hole of anode front end housing 1 and the cooperation of anode bottom 4, utilize threaded connection between the anode bottom 4 and the anode front end housing 1. The rest is the same as example 1.
Those skilled in the art will appreciate that those matters not described in detail in the present specification are well known in the art.

Claims (10)

1. A high temperature resistant anode structure of a multistage cusped magnetic field plasma thruster is characterized by comprising: the graphite receiving electrode (2), the anode interlayer (3) and the anode bottom (4) are connected in sequence; wherein an input pipeline for the working medium gas to enter is arranged on the anode bottom (4), an axial jet hole is arranged on the anode interlayer (3), and a directional jet hole is arranged on the front end surface of the graphite receiving electrode (2); the axial direction of the directional jet hole and C1-C2Are in the same direction, wherein C1And C2The multistage permanent magnet (40) of the multistage cusped magnetic field plasma thruster is closest to the center of an electron high-density area formed by two magnetic tips at the inlet side of a discharge channel (10).
2. According to claimThe high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster, which is characterized in that: the distance from the front end surface of the graphite receiving electrode (2) to the bottom surface of the discharge channel (10) is Z1,Z1So that the tangent line D of the magnetic force line passing through the jet hole on the front end surface of the graphite receiving electrode (2)1-D2Direction and C1-C2The included angle delta of the connecting line does not exceed +/-5 degrees.
3. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 1 or 2, wherein: the anode bottom (4) comprises a section of slender thin-wall pipe at an inlet for working medium to enter, a section of long pipe with external threads and a section of circular plate with three step holes which are sequentially enlarged and have a larger wall thickness in the middle, and a large diameter at an outlet.
4. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 3, wherein: the anode interlayer (3) is a cylindrical flat plate with one end being a plane and the other end being a cylindrical counter bore, axial jet holes are uniformly distributed on the cylindrical flat plate in a circular manner, and the diameter of a distribution circle where the axial jet holes are located is larger than that of a long pipe in the middle of the anode bottom (4) and smaller than that of a step hole with the smallest diameter at the outlet of the anode bottom (4).
5. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 4, wherein: the number of the axial jet holes is 6-10, and the diameter is
Figure FDA0003050179160000011
6. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 4, wherein: the graphite receiving electrode (2) is of a cylindrical plate structure with one end being a plane and the other end being a thin boss, directional jet holes are uniformly distributed on the cylindrical plate in a circular shape, and the diameter of a circle where the directional jet holes are distributed is smaller than that of a cylindrical counter bore of the anode interlayer (3).
7. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 6, wherein: the number of the directional jet holes is 12-20, and the diameter is
Figure FDA0003050179160000021
8. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 6, wherein: the anode front end cover (1) is a hollow cylinder with a small hole at one end and a large hole at one end and openings at two ends.
9. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 6, wherein: the anode interlayer (3) is matched with a second-diameter step hole at the outlet of the anode bottom (4) and is matched with a step hole with the smallest diameter to form a first-stage gas homogenizing cavity (A).
10. The high-temperature resistant anode structure of the multistage cusped magnetic field plasma thruster of claim 6, wherein: the graphite receiving electrode (2) is matched with a section of step hole with the largest diameter at the outlet of the anode bottom (4), and the graphite receiving electrode (2) is matched with the cylindrical counter bore of the anode interlayer (3) to form a secondary gas homogenizing cavity (B).
CN202110484157.6A 2021-04-30 2021-04-30 High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster Active CN113473687B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110484157.6A CN113473687B (en) 2021-04-30 2021-04-30 High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110484157.6A CN113473687B (en) 2021-04-30 2021-04-30 High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster

Publications (2)

Publication Number Publication Date
CN113473687A true CN113473687A (en) 2021-10-01
CN113473687B CN113473687B (en) 2023-07-14

Family

ID=77870687

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110484157.6A Active CN113473687B (en) 2021-04-30 2021-04-30 High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster

Country Status (1)

Country Link
CN (1) CN113473687B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114658624A (en) * 2022-03-24 2022-06-24 哈尔滨工业大学 Hall thruster magnetic circuit structure suitable for high power and high specific impulse and design method

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11120928A (en) * 1997-08-13 1999-04-30 Kobe Steel Ltd Ion beam generating device
US20070034501A1 (en) * 2005-08-09 2007-02-15 Efim Bender Cathode-arc source of metal/carbon plasma with filtration
JP2009189948A (en) * 2008-02-14 2009-08-27 Gyoseiin Genshino Iinkai Kakuno Kenkyusho Plasma reactor for bimodal operation
CN103397991A (en) * 2013-08-21 2013-11-20 哈尔滨工业大学 Plasma thruster based on multilevel tip cusped magnetic field
CN103953518A (en) * 2014-05-13 2014-07-30 哈尔滨工业大学 Anode of multi-stage cusped magnetic field plasma thruster
US20150128560A1 (en) * 2013-10-04 2015-05-14 The Regents Of The University Of California Magnetically shielded miniature hall thruster
CN104675650A (en) * 2015-01-23 2015-06-03 哈尔滨工业大学 Hollow anode for plasma thruster of cusped magnetic field
US20180247785A1 (en) * 2015-02-24 2018-08-30 Estion Technologies Gmbh X-ray source for ionizing of gases
US20180266403A1 (en) * 2017-03-20 2018-09-20 Airbus Defence and Space GmbH Cusped-field thruster
CN110067712A (en) * 2019-06-05 2019-07-30 中国人民解放军国防科技大学 Magnetic plasma thruster for inducing axial magnetic field
CN111257304A (en) * 2020-03-23 2020-06-09 四川大学 Point discharge micro-plasma atomic emission spectrum analysis device in argon-hydrogen flame
CN111561431A (en) * 2020-04-20 2020-08-21 哈尔滨工业大学 Heat radiation anode structure for removing condensation product of iodine working medium electric thruster

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11120928A (en) * 1997-08-13 1999-04-30 Kobe Steel Ltd Ion beam generating device
US20070034501A1 (en) * 2005-08-09 2007-02-15 Efim Bender Cathode-arc source of metal/carbon plasma with filtration
JP2009189948A (en) * 2008-02-14 2009-08-27 Gyoseiin Genshino Iinkai Kakuno Kenkyusho Plasma reactor for bimodal operation
CN103397991A (en) * 2013-08-21 2013-11-20 哈尔滨工业大学 Plasma thruster based on multilevel tip cusped magnetic field
US20150128560A1 (en) * 2013-10-04 2015-05-14 The Regents Of The University Of California Magnetically shielded miniature hall thruster
CN103953518A (en) * 2014-05-13 2014-07-30 哈尔滨工业大学 Anode of multi-stage cusped magnetic field plasma thruster
CN104675650A (en) * 2015-01-23 2015-06-03 哈尔滨工业大学 Hollow anode for plasma thruster of cusped magnetic field
US20180247785A1 (en) * 2015-02-24 2018-08-30 Estion Technologies Gmbh X-ray source for ionizing of gases
US20180266403A1 (en) * 2017-03-20 2018-09-20 Airbus Defence and Space GmbH Cusped-field thruster
CN110067712A (en) * 2019-06-05 2019-07-30 中国人民解放军国防科技大学 Magnetic plasma thruster for inducing axial magnetic field
CN111257304A (en) * 2020-03-23 2020-06-09 四川大学 Point discharge micro-plasma atomic emission spectrum analysis device in argon-hydrogen flame
CN111561431A (en) * 2020-04-20 2020-08-21 哈尔滨工业大学 Heat radiation anode structure for removing condensation product of iodine working medium electric thruster

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
胡鹏;吴朋安;毛威;扈延林;耿金越;周磊;沈岩;: "多级会切磁场等离子体推力器研究进展", 推进技术, no. 01 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114658624A (en) * 2022-03-24 2022-06-24 哈尔滨工业大学 Hall thruster magnetic circuit structure suitable for high power and high specific impulse and design method

Also Published As

Publication number Publication date
CN113473687B (en) 2023-07-14

Similar Documents

Publication Publication Date Title
EP2864633B1 (en) Ion accelerators
CN102630277B (en) Hall-effect plasma thruster
EP0800197B1 (en) A hall effect plasma accelerator
CN105822516B (en) Gas flow control method for improving ionization efficiency of Hall thruster
US9897079B2 (en) External discharge hall thruster
CN113473687B (en) High-temperature-resistant anode structure of multistage cusped magnetic field plasma thruster
WO2014201285A1 (en) Linear duoplasmatron
CN104675650A (en) Hollow anode for plasma thruster of cusped magnetic field
EP3379080B1 (en) Cusped-field thruster
JP2018127917A (en) Hall thruster
CN110302909B (en) High-power hot cathode supersonic plasma spraying gun
CN114658623A (en) Integrated magnetic screen anode structure for low-power Hall thruster
WO2019116371A1 (en) Narrow channel hall thruster
CN107045970B (en) Secondary-emission multipbcation cathode electron gun
JP2004169606A (en) Hollow cathode
CN210474360U (en) High-power hot cathode supersonic speed plasma spraying gun
CN115898802B (en) Hall thruster, space device comprising same and use method thereof
CN115681052B (en) Hall thruster, equipment with same and use method of Hall thruster
US11346330B1 (en) Additively manufactured components for electric propulsion thrusters
CN112523984B (en) Microwave ionization type cathode for micro cusp field thruster
JP2004530256A (en) Magnetic field for small closed drift thrusters
CN114753981A (en) Micro propeller based on annular bombardment cathode
CN111306024B (en) Microwave ion propulsion unit based on lateral wall cusped magnetic field
Nürmberger et al. Design and experimental investigation of a low-power Hall effect thruster and a low-current hollow cathode
CN109659212B (en) Array hole hollow cathode discharge ion source

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant