CN113472319B - Tuning method of radio frequency power supply - Google Patents
Tuning method of radio frequency power supply Download PDFInfo
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- CN113472319B CN113472319B CN202111020439.7A CN202111020439A CN113472319B CN 113472319 B CN113472319 B CN 113472319B CN 202111020439 A CN202111020439 A CN 202111020439A CN 113472319 B CN113472319 B CN 113472319B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03J—TUNING RESONANT CIRCUITS; SELECTING RESONANT CIRCUITS
- H03J7/00—Automatic frequency control; Automatic scanning over a band of frequencies
- H03J7/02—Automatic frequency control
- H03J7/04—Automatic frequency control where the frequency control is accomplished by varying the electrical characteristics of a non-mechanically adjustable element or where the nature of the frequency controlling element is not significant
- H03J7/045—Modification of automatic frequency control sensitivity or linearising automatic frequency control operation; Modification of the working range
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Abstract
The invention discloses a tuning method of a radio frequency power supply, wherein the radio frequency power supply comprises a frequency control module and a closed-loop controller, and corresponding curves are established in a plurality of planes by changing the frequency of the radio frequency power supply; taking any point in the complex plane as a starting point, taking an original point of the complex plane or a point near the original point as an end point, and taking the starting point and the end point as reference vectors; judging whether the curve is a target curve or not, and if not, obtaining a correction curve through curve transformation; the reference vector divides the target curve or the correction curve into a left area and a right area; and adjusting the frequency of the radio frequency power supply according to the positions of the complex values on the target curve or the correction curve in the left and right areas. The radio frequency power supply tuning method provided by the invention is simple and efficient in calculation mode, can overcome the defect that the prior art cannot adjust the frequency of a non-target curve, and has stronger adaptability.
Description
Technical Field
The invention relates to the technical field of radio frequency power supply tuning, in particular to a tuning method of a radio frequency power supply.
Background
The radio frequency power supply can be widely applied to the fields of film coating, semiconductor preparation and the like, for example, semiconductor plasma etching. However, during plasma etching, the rf power output, gas composition, gas flow rate, etc. are typically varied due to variations in process requirements. As these parameters change, the load impedance will also change dynamically, requiring the rf power supply to achieve a fast response and maximize power transfer throughout the process.
In general, frequency tuning is usually performed by a gradient method. The absolute value of the reflection power or the reflection coefficient is used as a reference value, the frequency tuning direction is uncertain due to the scalar, the modulation is usually targeted to the minimum reflection power or the minimum reflection coefficient, and the time for frequency tuning is measured in milliseconds, so that the requirement of rapid frequency tuning control cannot be met.
There is a prior art that is directed to finding a method and apparatus capable of fast tuning, such as chinese patent No. 2017800311002, which discloses generating an impedance curve and a reference vector in a complex reflection coefficient plane, and scaling the measurement by a predetermined multiple according to a measurement angle between the reference vector and an actually measured impedance valueAnd measuring the angle to calculate a frequency adjustment step size, and adjusting the frequency of the exciter according to the frequency step size. In addition, the method only considers the frequency adjustment of an ideal impedance trajectory curve (target curve), as shown in fig. 1, if an actually formed impedance curve is a closed curve in a non-target curve, at this time, the same measurement angle may correspond to two impedance points n1 and n2 on the curve, and the occurrence of the two impedance points will cause the problem of frequency tuning direction disorder, and according to the adjustment method described in the application, both the frequency point n1 and the frequency point n2 will move in the direction of decreasing frequency; at this time, the frequency point n2 will move to the minimum frequency point in the adjusting process
And cannot be tuned to the frequency tuning optimum.
Disclosure of Invention
The invention aims to solve the problem that the frequency adjustment of an ideal impedance track curve is only considered in the prior art, and when the impedance curve is a non-target curve, the same measurement angle corresponds to two impedance points, so that the optimal point of the frequency cannot be adjusted.
In order to achieve the above purpose, the invention provides the following technical scheme:
a tuning method of a radio frequency power supply, wherein the radio frequency power supply comprises a frequency control module and a closed-loop controller, and comprises the following steps:
changing the frequency of the radio frequency power supply, and establishing a corresponding curve in a complex plane;
taking any point in the complex plane as a starting point, taking an original point of the complex plane or a point near the original point as an end point, and taking the starting point and the end point as reference vectors;
judging whether the curve is a target curve or not, and if not, obtaining a correction curve through curve transformation;
the reference vector divides the target curve or the correction curve into a left area and a right area;
and adjusting the frequency of the radio frequency power supply according to the positions of the complex values on the target curve or the correction curve in the left and right areas.
The curve is a target curve, and otherwise, the curve is a non-target curve.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the curve transformation includes: dividing the non-target curve into two sections based on the reference vector, and respectively converting the two sections of curves to the left and the right through function conversion to obtain correction curves positioned at two sides of the reference vector; or a section of curve is transformed to the left or the right through functional transformation to obtain correction curves positioned at two sides of the reference vector.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, when the complex value on the target curve or the correction curve is in the left area of the reference vector, the frequency of the radio frequency power supply is increased or decreased, and when the complex value on the target curve or the correction curve is in the right area of the reference vector, the adjustment is opposite to that in the left area.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the starting point is located on an end-to-end connection line of the target curve or the correction curve, or on an extension line of the end-to-end connection line, or on one side of the end-to-end connection line or the extension line thereof.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the point near the origin is a point in an area where a reflection coefficient mode value is less than or equal to 0.5 or a transmission efficiency of the radio frequency power supply is greater than or equal to 75%.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the function transformation adopts a matrix or a transposed matrix, the impedance is Z, and the correction curve is
The transpose matrix is
Said
Wherein, in the step (A),
to change the angle.
The size of the transformation angle can determine the distance between the correction curve and the reference vector, and the larger the angle is, the larger the opening is, and the size can be set according to the size of the opening of the non-target curve to be transformed.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the target curve or the correction curve takes any number of points
，
Reference vector
Comprises the following steps:
use of
And
constructing a determinant:
wherein the content of the first and second substances,
is a plurality of points
The abscissa of the (c) axis of the (c),
a plurality of dots
The ordinate of (a);
as reference vectors
The abscissa of the (c) axis of the (c),
as reference vectors
The ordinate of (a);
when T is larger than 0, increasing the frequency of the radio frequency power supply through the frequency control module; and when T is less than 0, reducing the frequency of the radio frequency power supply through the frequency control module.
According to a specific implementation manner, in the tuning method of the radio frequency power supply, the frequency of the radio frequency power supply is tracked and adjusted by using the closed-loop controller and the frequency control module.
According to a specific embodiment, in the tuning method of the radio frequency power supply, the curve includes an impedance curve or an admittance curve, or a reflection coefficient curve.
Compared with the prior art, the invention has the beneficial effects that:
the radio frequency power supply tuning method provided by the invention comprises the steps of establishing a curve responding to the frequency of a radio frequency power supply in a plurality of planes, judging whether the obtained curve is a target curve or not, and carrying out curve transformation on a non-target curve to obtain a corrected curve; and meanwhile, reference vectors which can be used for dividing the target curve or the correction curve into a left area and a right area are determined, and finally, the frequency adjusting mode can be determined only by positioning the actually measured complex values in the left area and the right area which are divided by the reference vectors, the calculating mode is simple and efficient, and the tracking adjustment of the radio frequency power supply can be performed. The method can overcome the defect that the prior art cannot adjust the frequency of the non-target curve, is suitable for adjusting the frequency of the target curve and the non-target curve, and has stronger adaptability.
Description of the drawings:
FIG. 1 is a non-target curve 1 of an exemplary embodiment of the present invention;
FIG. 2 is a block diagram of an exemplary embodiment of a RF power system;
FIG. 3 is a target curve for an exemplary embodiment of the present invention;
FIG. 4 is a schematic diagram of a non-target curve 2 and its transformation according to an exemplary embodiment of the present invention;
fig. 5 is a graph transformation diagram of the non-target curve 1 according to the exemplary embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to test examples and specific embodiments. It should be understood that the scope of the above-described subject matter is not limited to the following examples, and any techniques implemented based on the disclosure of the present invention are within the scope of the present invention.
Example 1
Fig. 2 shows a radio frequency power supply system of an exemplary embodiment of the present invention, including: radio frequency power supply, coaxial line, matcher, load cavity. The radio frequency power supply output interface is connected with the matcher input interface through a coaxial line, and the matcher output interface is connected with the load cavity. The radio frequency power supply is internally provided with a sensor for detecting an output radio frequency signal, a frequency control module capable of performing frequency tuning, and the frequency control module is also provided with a closed-loop controller (not shown in figure 2). Further, the radio frequency power supply performs frequency tracking adjustment by the following tuning method, including:
A. establishing a corresponding curve in a complex plane by changing the frequency of the radio frequency power supply, wherein the curve comprises: the whole impedance curve or admittance curve or complex reflection coefficient curve seen from the output port of the radio frequency power supply. And the complex points corresponding to the minimum frequency and the maximum frequency on the curve form the head and the tail of the curve.
B. Regarding the acquired curve (the whole impedance curve or the admittance curve or the complex reflection coefficient curve), taking any point in the complex plane as a starting point, taking an original point of the complex plane or a point near the original point as an end point, and taking the starting point and the end point as reference vectors; the reference vector is used to divide the curve that has been acquired into two regions.
Specifically, the starting point is located on a head-to-tail connection line of the target curve or the correction curve (as shown in a point a in fig. 5), or on an extension line of the head-to-tail connection line (as shown in a point a in fig. 4), or on one side of the head-to-tail connection line or the extension line thereof (as shown in a point a in fig. 3); and a point near the origin is: a point in the region where the mode value of the reflection coefficient is 0.5 or less or the transmission efficiency of the rf power source is 75% or more (the dotted line region shown in fig. 3).
C. Judging whether the curve is a target curve or not, and if not, obtaining a correction curve through curve transformation; the reference vector divides the target curve or the correction curve into a left region and a right region (wherein the left region and the right region are determined based on the space left-right relation of points on the curve and the reference vector); and adjusting the frequency of the radio frequency power supply according to the positions of the complex values on the target curve or the correction curve in the left and right areas.
Specifically, when adjusting the frequency, the frequency adjustment direction is determined according to the left-right position relationship between the impedance measured value and the reference vector by receiving the impedance measured value of the sensor (the measured value is a plurality of points located on the curve), wherein the frequency adjustment modes on the left side and the right side are opposite, one is increased, and the other is decreased, thereby realizing the fast tracking adjustment of the radio frequency power supply frequency. In establishing the corresponding curve, the curve formed in response to the frequency of the rf power source may be a target curve or a non-target curve. Fig. 3 shows target curves obtained by an exemplary embodiment of the present invention, and fig. 1 and 4 respectively show two non-target curves formed in response to the frequency of the rf power supply. For a non-target curve, a point on the curve may be located on an extension line of the reference vector (as shown in fig. 1), and a collinear position relationship exists between the point on the curve and the reference vector, so that a left-right position relationship between a complex point on the curve and the reference vector cannot be determined, and therefore, a curve transformation needs to be performed on the target curve to obtain a modified curve.
Further, the curve transformation includes: dividing the non-target curve into two sections based on the end point of the reference vector, and respectively converting the two sections of curves to the left and the right through function conversion to obtain correction curves positioned at the two sides of the reference vector; or a section of curve is transformed to the left or the right through functional transformation to obtain correction curves positioned at two sides of the reference vector. Wherein the functional transformation comprises: and constructing a transformation matrix, and transforming the two curves (shown in figure 5) or one curve (shown in figure 4) to the left or right through the transformation matrix to obtain the correction curves positioned at the two sides of the reference vector.
Fig. 5 shows a graph transformation diagram of a non-target curve 1 based on a matrix transformation according to an exemplary embodiment of the present invention. Specifically, in this embodiment, it is preferable that the midpoint a of the line connecting the beginning and the end of the curve (point B and point C) is a starting point, the origin O is an end point, and the reference vector is obtained
(ii) a Wherein, the plural points B are plural points corresponding to the minimum frequency on the integral impedance curve or the admittance curve or the plural reflection coefficient curve; the plurality of points C are the plurality of points corresponding to the maximum frequency on the overall impedance curve or the admittance curve or the complex reflection coefficient curve. Suppose complex point B is equal to
Plural points C equal to
Then, the reference point a can be calculated by the following equation (1):
will be referred toTwo parts BO and CO divided by the amount are affine transformed respectively, and after processing, BO is transformed as shown by a dotted line in FIG. 4
CO conversion to
。
The transform matrix is derived from an affine transform:
（2）
wherein Z is the input impedance (Z can also be derived by replacing admittance or input reflection coefficient);
a transposed matrix that is Z;
the impedance curve is obtained after affine transformation. When θ is negative, the BO curve is entirely shifted to the left to become
(ii) a When θ is positive, the CO curve shifts to the right as a whole to
Thereby converting the non-target curve BOC into an ideal correction curve
。
In a further embodiment of the present invention, which region of the left and right regions of the reference vector the complex value on the target curve or the correction curve is located in is calculated by means of spatial cross multiplication, after the vector cross multiplication, the relative position relationship between the complex point and the reference vector can be determined by a right-hand rule, and the relative position relationship is located in a left region or a right region of the reference vector, which specifically includes:
when the obtained curve BOC is the targetDuring the curve: let the actual measured impedance point be
，VmIs an arbitrary complex point on the whole impedance curve or admittance curve or complex reflection coefficient curve, namely an arbitrary complex point on the BOC curve, a reference vector
Equal to:
，
can be calculated by the formula (1).
Use of
And
and constructing a determinant to obtain a cross multiplication mathematical result T:
when the curve BOC is a non-target curve, the actually measured impedance value is still a plurality of points V on the original target curvemHowever, there is a corresponding matrix-mapped point on the correction curve
，
As an arbitrary complex point on an affine transformed bulk impedance (admittance) curve or complex reflection coefficient curve (i.e. as a function of the measured impedance
CurveAny plurality of points) of the first and second image frames, at this time, by using
And
the determinant of the formula (3) can also be determined
Relative position relationship with reference vector.
When T >0, the frequency control module increases the frequency; when T <0, the frequency control module decreases the frequency; and meanwhile, configuring a closed-loop controller in the frequency control module to track and adjust the frequency according to the rule, preferably adopting a PID (proportion integration differentiation) controller in the existing closed-loop controller, and controlling the frequency to change rapidly according to the control principle so as to adjust the frequency of the radio frequency power supply to a frequency point corresponding to T = 0. The error input of the closed-loop controller is T, and the output of the closed-loop controller is frequency adjustment quantity, so that the rapid tracking adjustment of the frequency of the radio frequency power supply is realized.
Similarly, for the non-target curve 2 shown in fig. 4, the extended line point a of the connection line between the head and the tail of the curve (point B and point C) is used as the starting point, the origin O is used as the end point, and the reference vector is used as the reference vector
. Since the BO curve is located at the reference vector
On the left side of the curve, only affine transformation is needed to be carried out on the CO curve, so that the corrected curve
Located in a reference vector
And finally, the frequency of the radio frequency power supply is quickly tracked and adjusted.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. A tuning method of a radio frequency power supply, wherein the radio frequency power supply comprises a frequency control module and a closed-loop controller,
changing the frequency of the radio frequency power supply, and establishing a corresponding curve in a complex plane;
taking any point in the complex plane as a starting point, taking an original point of the complex plane or a point near the original point as an end point, and taking the starting point and the end point as reference vectors;
judging whether the curve is a target curve or not, and if not, obtaining a correction curve through curve transformation;
the reference vector divides the target curve or the correction curve into a left area and a right area;
adjusting the frequency of the radio frequency power supply according to the positions of the complex values on the target curve or the correction curve in the left and right areas;
the curve transformation divides the non-target curve into two sections based on the reference vector, and the two sections of curves are respectively transformed leftwards and rightwards through function transformation to obtain correction curves positioned at two sides of the reference vector; or a section of curve is transformed to the left or the right through functional transformation to obtain correction curves positioned at two sides of the reference vector.
2. The method of claim 1, wherein the increasing or decreasing the frequency of the rf power source when the complex value on the target curve or the modified curve is in the left region of the reference vector is opposite to the adjusting when the complex value on the target curve or the modified curve is in the right region of the reference vector.
3. The method of claim 1, wherein the starting point is located on an end-to-end line of the target curve or the correction curve, or on an extension of the end-to-end line, or on one side of the end-to-end line or the extension thereof.
4. The method of claim 1, wherein the point near the origin is a point in a region where a reflection coefficient mode value is 0.5 or less or a transmission efficiency of the rf power source is 75% or more.
5. The method of claim 2, wherein the functional transformation is a matrix or a transposed matrix, Z is an impedance, and the correction curve is
The transpose matrix is
Said
(ii) a Wherein the content of the first and second substances,
。
6. the method of claim 5, wherein the target curve or the correction curve is any of a plurality of points Vm：
Reference vector
Comprises the following steps:
use of
And
constructing a determinant:
wherein the content of the first and second substances,
is a plurality of points
The abscissa of the (c) axis of the (c),
a plurality of dots
The ordinate of (a);
as reference vectors
The abscissa of the (c) axis of the (c),
as reference vectors
The ordinate of (a);
when T is larger than 0, increasing the frequency of the radio frequency power supply through the frequency control module; and when T is less than 0, reducing the frequency of the radio frequency power supply through the frequency control module.
7. The method as claimed in claim 6, wherein the frequency of the rf power supply is adjusted by using a closed-loop controller and a frequency control module.
8. A method of tuning a radio frequency power supply as claimed in claim 1, wherein said curve comprises an impedance curve or an admittance curve, or a reflection coefficient curve.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111020439.7A CN113472319B (en) | 2021-09-01 | 2021-09-01 | Tuning method of radio frequency power supply |
| PCT/CN2022/074097 WO2023029371A1 (en) | 2021-09-01 | 2022-01-26 | Tuning method for radio-frequency power source |
| KR1020227011491A KR20230035211A (en) | 2021-09-01 | 2022-01-26 | How to tune RF power |
| JP2022520849A JP7393535B2 (en) | 2021-09-01 | 2022-01-26 | How to tune RF power supply |
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| CN202111020439.7A CN113472319B (en) | 2021-09-01 | 2021-09-01 | Tuning method of radio frequency power supply |
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| CN113472319B true CN113472319B (en) | 2021-11-23 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109156075A (en) * | 2016-04-20 | 2019-01-04 | 先进能源工业公司 | Device for the frequency tuning in RF generator |
| CN110495148A (en) * | 2017-03-30 | 2019-11-22 | 英特尔Ip公司 | Interpolating method for the polar coordinates signal in radio frequency (RF) transmitter |
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| JP6586424B2 (en) | 2014-03-24 | 2019-10-02 | エーイーエス グローバル ホールディングス， プライベート リミテッド | System and method for high frequency generator source impedance control |
| US10224184B2 (en) * | 2014-03-24 | 2019-03-05 | Aes Global Holdings, Pte. Ltd | System and method for control of high efficiency generator source impedance |
| CN104991124B (en) * | 2015-07-06 | 2018-03-02 | 上海斐讯数据通信技术有限公司 | A kind of characteristic impedance calibration system and method for testing |
| JP6778639B2 (en) * | 2017-03-08 | 2020-11-04 | 東京エレクトロン株式会社 | High frequency generator and plasma processing equipment |
| CN113472319B (en) * | 2021-09-01 | 2021-11-23 | 四川英杰电气股份有限公司 | Tuning method of radio frequency power supply |
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2021
- 2021-09-01 CN CN202111020439.7A patent/CN113472319B/en active Active
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- 2022-01-26 KR KR1020227011491A patent/KR20230035211A/en unknown
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109156075A (en) * | 2016-04-20 | 2019-01-04 | 先进能源工业公司 | Device for the frequency tuning in RF generator |
| CN110495148A (en) * | 2017-03-30 | 2019-11-22 | 英特尔Ip公司 | Interpolating method for the polar coordinates signal in radio frequency (RF) transmitter |
Non-Patent Citations (2)
| Title |
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| "Design of a fixed-frequency impedance matching network and measurement of plasma impedance in an inductively coupled plasma for atomic emission spectroscopy";Charly D.Allemand等;《Spectrochimica Acta Part B: Atomic Spectroscopy》;20011220;第33卷(第8期);513-534 * |
| "大功率射频负氢离子源射频系统研究";岳海昆;《中国博士学位论文全文数据库 工程科技Ⅱ辑》;20170815;C040-5 * |
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| JP2023544464A (en) | 2023-10-24 |
| WO2023029371A1 (en) | 2023-03-09 |
| KR20230035211A (en) | 2023-03-13 |
| CN113472319A (en) | 2021-10-01 |
| JP7393535B2 (en) | 2023-12-06 |
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