CN113466130A - Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer - Google Patents
Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer Download PDFInfo
- Publication number
- CN113466130A CN113466130A CN202110738886.XA CN202110738886A CN113466130A CN 113466130 A CN113466130 A CN 113466130A CN 202110738886 A CN202110738886 A CN 202110738886A CN 113466130 A CN113466130 A CN 113466130A
- Authority
- CN
- China
- Prior art keywords
- gas
- spectrum
- model
- target machine
- peak
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 68
- 238000012546 transfer Methods 0.000 title claims description 31
- 238000001228 spectrum Methods 0.000 claims abstract description 188
- 238000013507 mapping Methods 0.000 claims abstract description 58
- 238000004364 calculation method Methods 0.000 claims abstract description 52
- 230000008030 elimination Effects 0.000 claims abstract description 18
- 238000003379 elimination reaction Methods 0.000 claims abstract description 18
- 238000005259 measurement Methods 0.000 claims abstract description 12
- 230000003595 spectral effect Effects 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 13
- 238000007781 pre-processing Methods 0.000 claims description 9
- 238000004590 computer program Methods 0.000 claims description 7
- 238000005094 computer simulation Methods 0.000 claims description 6
- 239000013307 optical fiber Substances 0.000 claims description 3
- 238000010187 selection method Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 165
- 230000005540 biological transmission Effects 0.000 abstract description 23
- 230000004044 response Effects 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000010183 spectrum analysis Methods 0.000 abstract description 4
- 238000010923 batch production Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 8
- 229910052724 xenon Inorganic materials 0.000 description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 6
- 238000012937 correction Methods 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000002716 delivery method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004868 gas analysis Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000002211 ultraviolet spectrum Methods 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention relates to a method and a system for transmitting a model of an ultraviolet gas analyzer, wherein the method comprises the following steps: and a wavelength calibration step, namely calculating the pixel mapping relation of the source machine standard sample spectrum and the target machine standard sample spectrum through fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the actual measurement spectrum interpolation of the target machine. Model application, namely substituting the target machine spectrum into a source machine calculation model and obtaining a concentration value of the gas; and a model calibration step, wherein corresponding calibration gas of the gas is introduced, and model calibration parameters are calculated, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients. The invention solves the wavelength calibration in the spectral analysis model transmission by the direct mapping of the pixels among the spectrometers, solves the residual cross interference among gases caused by the non-linearity of the intensity response in the model transmission by adding the step of cross interference elimination, is convenient for batch production and saves the production cost.
Description
Technical Field
The application relates to the technical field of ultraviolet spectrum gas analysis, in particular to a model transfer method and system of an ultraviolet gas analyzer and the ultraviolet gas analyzer.
Background
In the process of ultraviolet spectrum gas analysis application, when a calculation model and parameters established on one spectrometer need to be transplanted and applied to another spectrometer, due to certain difference of measured spectra of different instruments, the model cannot give a correct prediction result, and spectrum data needs to be collected again to calibrate model parameters, so that each instrument needs to be calibrated independently, and a large amount of standard gas and data acquisition time is consumed.
The common methods are as follows: spectral difference correction algorithms (SSC), Shenk's algorithms, direct correction algorithms (DS), piecewise direct correction algorithms (PDS), Slope deviation correction methods (Slope/bias, SBC), etc. The DS, PDS and Shenk' S algorithms correct the slave spectrum Ss by using the standard sample set S, so that the corrected slave spectrum Ss and the master spectrum Sm reach the maximum similarity, and then the master model is used for predicting the property value of the slave spectrum Ss.
However, when the algorithms are applied to an ultraviolet differential spectrum gas analyzer, the alignment on the spectrum wavelength is solved, but when the spectrum response difference between different instruments is large, the adaptability is poor, the requirement of batch transmission cannot be met, and the cross interference between gases cannot be well solved.
At present, an effective solution is not provided aiming at the problems of poor adaptability and incapability of batch transmission when spectral response difference among different instruments is large in the related technology.
Disclosure of Invention
The embodiment of the application provides an ultraviolet gas analyzer model transfer method and system and an ultraviolet gas analyzer, and aims to at least solve the problems that the adaptability is poor and batch transfer cannot be realized in the related technology.
In a first aspect, an embodiment of the present application provides an ultraviolet gas analyzer model transfer method, including the following steps:
and a wavelength calibration step, namely calculating the pixel mapping relation of the source machine standard sample spectrum and the target machine standard sample spectrum through fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the actual measurement spectrum interpolation of the target machine.
Model application, namely substituting the target machine spectrum into a source machine calculation model and obtaining a concentration value of the gas;
and a model calibration step, wherein corresponding calibration gas of the gas is introduced, and model calibration parameters are calculated, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
Through the steps, the source machine pixel points are directly mapped to the target machine pixel points, the spectral wavelength alignment in the model transmission process is realized, and meanwhile, a method for solving the cross interference occurring in the model transmission is provided.
In some embodiments, the wavelength calibration step further includes a mapping calculation step, specifically including:
obtaining a pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through polynomial fitting, wherein the pixel mapping relation is expressed as follows:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2，...，x1pi}，x1p1，x1p2，...，x1piRespectively are pixel points of corresponding peak values in the standard sample spectrum of the target machine,
x0＝{x0p1，x0p2，...，x0pi}，x0p1，x0p2，...，x0pirespectively are pixel points of corresponding peak values in the spectrum of the standard sample of the source machine,
the peak value is selected according to one or a combination of the light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
In some embodiments, the method for selecting the peak specifically includes the following steps;
a step of obtaining the peak position of the source machine, namely traversing each pixel point x0 of the spectrum of the standard sample of the source machinepiJudging whether the spectral amplitude of the pixel point is larger than the values of the left and right N points, if so, recording the position of the pixel point (x0)pm1，x0pm2，...，x0pmm) Meanwhile, recording the global peak position x0 of the whole source machine standard sample spectrumpm0；
A step of obtaining the peak position of the target machine, namely traversing and searching the position (x1) of a pixel point in the standard sample spectrum of the target machine according to the step of obtaining the peak position of the source machineps1，x1ps2，...，x1psn) And the global peak position x0 of the target machine sample spectrumps0；
A step of obtaining peak point pairs, namely obtaining the position x0 of each local peak value according to the sequence of the local peak valuespmmAt x1psnSearching for the corresponding peak point in such a way that
|(x0pmi-x1psj-e′)|≤M
Wherein M is a natural number smaller than N, e' is a peak parameter,
if no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmi，x1psi)。
In some embodiments, the peak parameter e' is calculated as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein, k is the kth peak point searched;
when the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)
In some of these embodiments, the model calibration step comprises the steps of:
substituting the target machine spectrum into the source machine calculation model to obtain a concentration value C of the gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine calculation model of gas a were:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of gas A, CB0Is the calibration gas concentration of gas B, Cba＝{Cba1，Cba2，...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、CbRespectively recording concentration indicating values of the gas A and the gas B at a series of different moments in the process of introducing the gas B.
In some of these embodiments, the model application step includes preprocessing, calculating eigenvalues and inverted concentration values,
the model calibration step is performed after calculating the eigenvalue and the inverted concentration value or the inverted concentration value.
In a second aspect, an embodiment of the present application provides an ultraviolet gas analyzer model transfer system, to which the ultraviolet gas analyzer model transfer method of the first aspect is applied, including:
and the wavelength calibration module is used for calculating the pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the actual measurement spectrum interpolation of the target machine.
The model application module substitutes the target machine spectrum into the source machine calculation model and obtains the concentration value of the gas;
and the model calibration module is used for introducing corresponding calibration gas of the gas and calculating model calibration parameters, and the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
In some embodiments, the wavelength calibration module includes a mapping relation calculation unit, and the mapping relation calculation unit obtains a pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum by polynomial fitting, and the pixel mapping relation is expressed as:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2，...，x1pi}，x1p1，x1p2，...，x1piRespectively are pixel points of corresponding peak values in the standard sample spectrum of the target machine,
x0＝{x0p1，x0p2，...，x0pi}，x0p1，x0p2，...，x0pirespectively are pixel points of corresponding peak values in the spectrum of the standard sample of the source machine,
the peak value is selected according to one or a combination of the light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
In some embodiments, the mapping relation calculating unit further includes:
the source machine peak position acquisition subunit traverses each pixel point x0 of the source machine standard sample spectrumpiJudging whether the spectral amplitude of the pixel point is larger than the values of the left and right N points, if so, recording the position of the pixel point (x0)pm1，x0pm2，...，x0pmm) Meanwhile, recording the global peak position x0 of the whole source machine standard sample spectrumpm0；
The target machine peak position obtaining subunit is used for traversing and searching the positions of pixel points in the target machine standard sample spectrum (x1) according to the source machine peak position obtaining stepps1，x1ps2，...，x1psn) And the global peak position x0 of the target machine sample spectrumps0；
The peak point pair obtaining subunit obtains the position x0 of each local peak according to the sequence of the local peakspmmAt x1psnSearching for the corresponding peak point in such a way that
|(x0pmi-x1psj-e′)|≤M
Wherein M is a natural number smaller than N, and the calculation process of e' is as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein, k is the kth peak point searched;
when the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)
If no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmi，x1psi)。
In some embodiments, the model calibration module substitutes the target machine spectrum into the source machine calculation model to obtain a concentration value C of the gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine calculation model of gas a were:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of gas A, CB0Is the calibration gas concentration of gas B, Cba＝{Cba1，Cba2，...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、CbRespectively recording concentration indicating values of the gas A and the gas B at a series of different moments in the process of introducing the gas B.
In some embodiments, the source computer model obtains the gas concentration by preprocessing, calculating the eigenvalues and inverting the concentration values,
the calibration module acts on the pre-processing and after calculating the eigenvalues and inversion concentration values.
In a third aspect, an embodiment of the present application provides an ultraviolet gas analyzer, including a light source, a gas chamber, a spectrometer, and a control and processor; the light source and the spectrometer are connected with the air chamber cavity through optical fibers or directly coupled with the air chamber cavity; the spectrometer is electrically connected with the control and processor; a light source for providing ultraviolet-visible light; the spectrometer is used for measuring the gas to be measured and outputting a corresponding spectrum; the control and processor when executing the computer program implements the ultraviolet gas analyzer model transfer method of the first aspect.
Compared with the related art, the ultraviolet gas analyzer model transmission method and system provided by the embodiment of the application solve the wavelength calibration in the spectral analysis model transmission through the direct mapping of the pixels among the spectrometers, solve the residual cross interference among gases caused by the non-linearity of the intensity response in the model transmission through adding the cross interference elimination step, only need a small amount of standard gas to transmit the source machine application model to the target machine for use, do not need to recalibrate the target machine from the beginning, are convenient for batch production, and save the production cost.
The details of one or more embodiments of the application are set forth in the accompanying drawings and the description below to provide a more thorough understanding of the application.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:
FIG. 1 is a flow chart of an ultraviolet gas analyzer model transfer method according to an embodiment of the present application;
FIG. 2 is a flow chart of a peak selection method according to an embodiment of the present application;
FIG. 3 is a flow chart of another method of transferring a model of an ultraviolet gas analyzer in accordance with an embodiment of the present application;
FIG. 4 is a flow chart of a UV gas analyzer model transfer method according to a preferred embodiment of the present application;
FIG. 5 is a pixel mapping relationship from a source machine to a target machine;
FIG. 6 shows xenon lamp spectra before and after calibration using the method of the embodiments of the present application;
FIG. 7 is a spectrum of SO2 absorbance before and after calibration using a method of an embodiment of the present application;
FIG. 8 is a schematic diagram of the effect of model application and model transfer calibration;
FIG. 9 is a block diagram of an ultraviolet gas analyzer model delivery system according to an embodiment of the present application;
fig. 10 is a hardware configuration diagram of an ultraviolet gas analyzer according to an embodiment of the present application.
Description of the drawings:
a mapping relation calculation module 1; a target machine spectrum obtaining module 2;
a calibration module 3; a source machine peak position acquisition unit 11;
a target machine peak position acquisition unit 12; peak point acquisition unit 13
A light source 101; a plenum chamber 102; a spectrometer 103; a control and processor 104;
a memory 105.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application will be described and illustrated below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments provided in the present application without any inventive step are within the scope of protection of the present application.
It is obvious that the drawings in the following description are only examples or embodiments of the present application, and that it is also possible for a person skilled in the art to apply the present application to other similar contexts on the basis of these drawings without inventive effort. Moreover, it should be appreciated that in the development of any such actual implementation, as in any engineering or design project, numerous implementation-specific decisions must be made to achieve the developers' specific goals, such as compliance with system-related and business-related constraints, which may vary from one implementation to another.
Reference in the specification to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the specification. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of ordinary skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments without conflict.
Unless defined otherwise, technical or scientific terms referred to herein shall have the ordinary meaning as understood by those of ordinary skill in the art to which this application belongs. Reference to "a," "an," "the," and similar words throughout this application are not to be construed as limiting in number, and may refer to the singular or the plural. The present application is directed to the use of the terms "including," "comprising," "having," and any variations thereof, which are intended to cover non-exclusive inclusions; for example, a process, method, system, article, or apparatus that comprises a list of steps or modules (elements) is not limited to the listed steps or elements, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus. Reference to "connected," "coupled," and the like in this application is not intended to be limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The term "plurality" as referred to herein means two or more. "and/or" describes an association relationship of associated objects, meaning that three relationships may exist, for example, "A and/or B" may mean: a exists alone, A and B exist simultaneously, and B exists alone. The character "/" generally indicates that the former and latter associated objects are in an "or" relationship. Reference herein to the terms "first," "second," "third," and the like, are merely to distinguish similar objects and do not denote a particular ordering for the objects.
The embodiment provides a model transfer method of an ultraviolet gas analyzer. Fig. 1 is a flowchart of a uv gas analyzer model transfer method according to an embodiment of the present application, as shown in fig. 1, the flowchart includes the steps of:
and a wavelength calibration step S1, calculating the pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum by fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the actual measurement spectrum interpolation of the target machine.
A model application step S2, substituting the target machine spectrum into the source machine calculation model and obtaining the concentration value of the gas;
and a model calibration step S3, introducing calibration gas corresponding to the gas and calculating model calibration parameters, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
Through the steps, wavelength calibration alignment in spectral analysis model transmission is realized by adopting a method of directly mapping source machine pixel points to target machine pixel points, an automatic calculation method is provided, meanwhile, the existing model transmission method does not mention the solution of cross interference caused by spectral intensity response nonlinearity in the model transmission process, and the method effectively solves the cross interference solution in the model transmission process by setting cross interference elimination parameters through the calibration step.
It should be noted that the standard sample spectrum in the mapping relation calculation step is a spectrum measured in a zero gas calibration state, and the source machine spectrum in the source machine calculation model is an absorbance spectrum calculated from a zero gas spectrum measured in the zero gas calibration state and a sample gas spectrum measured in the measurement state. The target machine measured spectrum is each spectrum measured by the target machine and comprises a zero gas spectrum measured in a zero calibration state and a sample gas spectrum measured in a measurement state.
In some of these embodiments, the wavelength calibration step S1 further includes a mapping calculation step S11 including:
obtaining a pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through polynomial fitting, wherein the pixel mapping relation is expressed as follows:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2，...，x1pi}，x1p1，x1p2，...，x1piRespectively are pixel points of corresponding peak values in the standard sample spectrum of the target machine,
x0＝{x0p1，x0p2，...，x0pi}，x0p1，x0p2，...，x0pirespectively are pixel points of corresponding peak values in the spectrum of the standard sample of the source machine,
the peak value is selected according to one or a combination of the light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
In practical application, a fifth-order polynomial fitting is generally adopted, peak searching can be manually selected through a characteristic peak of a light source spectrum, and pixel points of a source machine standard sample spectrum and a target machine standard sample spectrum can be acquired by adopting a method of automatically searching peak points.
In some embodiments, fig. 2 is a flowchart of a peak value selecting method according to an embodiment of the present application, and as shown in fig. 2, the peak value selecting method specifically includes the following steps;
a source machine peak position obtaining step S111 of traversing the sourceEach pixel point x0 of machine standard sample spectrumpiJudging whether the spectral amplitude of the pixel point is larger than the values of the left and right N points, if so, recording the position of the pixel point (x0)pm1，x0pm2，...，x0pmm) Meanwhile, recording the global peak position x0 of the whole source machine standard sample spectrumpm0；
A target machine peak position obtaining step S112, wherein the positions of the pixel points in the target machine standard sample spectrum are searched in a traversing manner according to the source machine peak position obtaining step (x1)ps1，x1ps2，...，x1psn) And the global peak position x0 of the target machine sample spectrumps0；
A peak point pair obtaining step S113, obtaining the position x0 of each local peak according to the appearance sequence of the local peakspmmAt x1psnSearching for the corresponding peak point in such a way that
|(x0pmi-x1psj-e′)|≤M
Wherein M is a natural number smaller than N, e' is a peak parameter,
if no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmi，x1psi)。
It should be noted that if one is larger than the left and right sides in the sequence, it is called a local peak.
In some of these embodiments, the peak parameter e' is calculated as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein, k is the kth peak point searched;
when the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)
In some of these embodiments, the model calibration step S3 includes the steps of:
substituting the target machine spectrum into the source machine calculation model to obtain a concentration value C of the gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine calculation model of gas a were:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of gas A, CB0Is the calibration gas concentration of gas B, Cba＝{Cba1，Cba2，...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、CbRespectively recording concentration indicating values of the gas A and the gas B at a series of different moments in the process of introducing the gas B.
In some embodiments, the model application step S2 includes preprocessing, calculating eigenvalues and inverted concentration values, resulting in a gas concentration,
the model calibration step S3 is performed between the pre-processing and the inversion concentration values or after the inversion concentration values.
The embodiment also provides a model transfer method of the ultraviolet gas analyzer. Fig. 3 is a flow chart of another uv gas analyzer model transfer method according to an embodiment of the present application, as shown in fig. 3, the flow chart includes the following steps:
s301, wavelength calibration;
firstly, calculating a pixel mapping relation between a source machine standard sample spectrum and a target machine standard sample spectrum;
taking a purple heterodyne spectral analyzer with a light source as a pulse xenon lamp as an example, suppose that the positions of peak pixel points in a standard sample spectrum of a source machine are respectively x0p1，x0p2，...，x0piThe positions of corresponding peak pixel points in the standard sample spectrum of the target machine are x1 respectivelyp1，x1p2，...，x1piAnd obtaining a pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through polynomial fitting, namely: x1 ═ f (x 0). Generally, a polynomial fit of the fifth order may be employed. The peak value searching can be manually selected through the characteristic peak of the xenon lamp light source spectrum, and can also be obtained by adopting a method for automatically searching a peak value point.
S302, applying a model;
mapping the spectral pixels of the source machine in the source machine calculation model to the spectral pixels of the target machine according to the pixel mapping relation obtained by calculation, and interpolating the actually measured spectrum of the target machine to obtain a new spectrum of the target machine, which is suitable for the source machine calculation model;
suppose the calculated pixel range of gas a in the source machine calculation model is: (x0)s，x0e) The pixel range mapped to the target machine is: (x1)s，x1e) And then:
x1s＝f(x0s)
x1e＝f(x0e)
(x1s，x1e) The corresponding target machine spectrum S1' is obtained by interpolation of the target machine measured spectrum S1.
S303, calibrating the model;
substituting the obtained new spectrum S1' of the target machine into a source machine calculation model, and introducing calibration gas to calculate model calibration parameters, including cross interference elimination parameters and concentration calibration coefficients;
specifically, S1' is substituted into a source machine calculation model to obtain a gas A concentration value CA1, and calibration parameters of the model are calibrated by introducing calibration gas into a laboratory. Assume that the calibration gas concentration of gas A is CA0Assuming that the calibration gas concentration of gas B is CB0And the gas B is an interference gas of the gas A, and a series of concentration indicating values C of the gas A at different moments are recorded in the process of introducing the gas Bba1，Cba2，...，CbaiAnd an indication C of the concentration of gas Bb1，Cb2，...，CbiPair of (C)ba1，Cba2，...，Cbai) And (C)b1，Cb2，...，Cbi) Obtaining an interference formula of the gas B to the gas A by adopting polynomial fitting:
Cba＝fd(Cb)
the concentration calibration coefficients of the computational model of the source gas a are:
Ka＝CA0/(CA1-Cba)
through the steps, the method for directly mapping the source machine pixel points to the target machine pixel points is adopted to achieve spectral wavelength alignment in model transmission and provide an automatic calculation method, meanwhile, the existing model transmission method does not solve the problem of cross interference caused by spectral intensity response nonlinearity in the model transmission process, and the solution for the cross interference occurring in the model transmission is provided.
The embodiments of the present application are described and illustrated below by means of preferred embodiments.
Fig. 4 is a flowchart of an ultraviolet gas analyzer model transfer method according to a preferred embodiment of the present application.
S401, automatically searching a peak value and obtaining a pixel mapping relation, wherein an actual measurement spectrum measured by the source machine is assumed to be S0, an actual measurement spectrum measured by the target is assumed to be S1, and an application model of the source machine for calculating the gas concentration is as follows:
Cgas_i＝M(S0)，
due to the difference of hardware of the source machine and the target machine, the spectrum of the same object is measured differently, which mainly includes the difference of corresponding wavelength of the spectral pixel points and the difference of spectral intensity response.
For the deviation of the spectral wavelength, a relationship is established through peak points on a measured spectrum (such as a pulse xenon lamp spectrum or an absorbance spectrum), for example, if the positions of corresponding pixels of the peak points of a source machine standard sample spectrum measured by a source machine are x0p1, x0p2,.., x0pi, and the positions of corresponding peak pixel points in a target machine standard sample spectrum are x1p1, x1p2,.., x1pi, a pixel mapping relationship between the source machine standard sample spectrum and the target machine standard sample spectrum is obtained through a five-order polynomial fitting, that is: x1 ═ f (x 0).
The peak value searching can be manually selected through the characteristic peak of the xenon lamp light source spectrum, and can also be obtained by adopting a method for automatically searching a peak value point.
The method for automatically searching the peak point comprises the following steps:
①x0pijudging whether the spectral amplitude of the pixel point is larger than the values of the left point and the right point, if so, recording the position of the pixel point (x0)pm1，x0pm2，...，x0pmm) At the same time, the global peak position x0 of the whole spectrum is recordedpm0；
Secondly, traversing and searching the pixel point position (x1) of the target machine standard sample spectrum meeting the requirement according to the method of the first stepps1，x1ps2，...，x1psn) And global peak position of the whole standard sample spectrum x0ps0；
③ according to the sequence of local peak value, for each local peak value position x0pmmAt x1psnSearch point of (x0)pmi-x1psj-e′)|≤M，
M is a natural number smaller than N, and e' is calculated as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein k is the kth peak point；
When the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)
If no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmi，x1psi)。
S402, obtaining the target machine spectrum, and assuming that the calculation waveband of the gas to be measured is (x0)s，x0e) And obtaining the pixel range (x1) of the target machine according to the mapping relation between the standard sample spectrum of the source machine and the standard sample spectrum of the target machines，x1e) Wherein:
x1s＝f(x0s)
x1e＝f(x0e)
the (x1) is obtained by interpolation of the target machine actual measurement spectrum S1(x0)s，x1e) Corresponding target machine spectrum S1 '(x 1), i.e., S1' (f (x0))
Fig. 5 is a pixel mapping relationship from a source machine to a target machine, fig. 6 is a xenon lamp spectrum before and after calibration by applying the method of the embodiment of the present application, fig. 7 is an SO2 absorbance spectrum before and after calibration by applying the method of the embodiment of the present application, and fig. 6 and 7 respectively include a source machine spectrum, a target machine measured spectrum, and a target machine calibrated spectrum.
And S403, carrying out calibration, and substituting S1' into the source computer calculation model. Typical computational models include: preprocessing M1, calculating a characteristic value (including cross interference elimination) M2, inverting a concentration value M3 and the like. As shown in fig. 8, the cross interference cancellation in the calibration step may be performed between M2 and M3 to calibrate the calculated characteristic value, or may be performed after M3 to calibrate the final concentration value, and the calculation methods of the two are substantially the same, and only the concentration value and the corresponding characteristic value need to be replaced.
The steps for calibrating the final concentration values are as follows: assume that the calibration gas concentration of gas A is CA0Substituting the obtained value into a source machine calculation model to obtain a gas A concentration value CA1Assuming that the calibration gas concentration of gas B is CB0And the gas B is an interference gas of the gas A, and a series of concentration indicating values C of the gas A at different moments are recorded in the process of introducing the gas Bba1，Cba2，...，CbaiAnd an indication C of the concentration of gas Bb1，Cb2，...，CbiPair of (C)ba1，Cba2，...，Cbai) And (C)b1，Cb2，...，Cbi) Obtaining an interference formula of the gas B to the gas A by adopting polynomial fitting:
Cba＝fd(Cb)
the concentration calibration coefficient Ka of the calculation model of the source gas a is:
Ka＝CA0/(CA1-Cba)
it should be noted that the steps illustrated in the above-described flow diagrams or in the flow diagrams of the figures may be performed in a computer system, such as a set of computer-executable instructions, and that, although a logical order is illustrated in the flow diagrams, in some cases, the steps illustrated or described may be performed in an order different than here.
The present embodiment further provides an ultraviolet gas analyzer model transmission system, which is used to implement the foregoing embodiments and preferred embodiments, and the description of the system is omitted here. As used hereinafter, the terms "module," "unit," "subunit," and the like may implement a combination of software and/or hardware for a predetermined function. While the system described in the embodiments below is preferably implemented in software, implementations in hardware, or a combination of software and hardware are also possible and contemplated.
Fig. 9 is a block diagram of a structure of an ultraviolet gas analyzer model delivery system according to an embodiment of the present application, as shown in fig. 9, the system including:
the wavelength calibration module 1 is used for calculating the pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the target machine actual measurement spectrum interpolation.
The model application module 2 substitutes the target machine spectrum into the source machine calculation model and obtains the concentration value of the gas;
and the model calibration module 3 is used for introducing corresponding calibration gas of the gas and calculating model calibration parameters, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
The system adopts a method of directly mapping source machine pixel points to target machine pixel points to realize spectral wavelength alignment in model transmission, provides an automatic calculation method, and provides a solution to cross interference occurring in model transmission.
The wavelength calibration in the spectral analysis model transmission is solved through the direct pixel mapping between the spectrometers, the residual cross interference between gases caused by the non-linearity of the intensity response in the model transmission is solved through adding the step of eliminating the cross interference, the source machine application model can be transmitted to the target machine for use only by a small amount of standard gas, the target machine does not need to be calibrated again from the beginning, the mass production is convenient, and the production cost is saved.
In some embodiments, the wavelength calibration module 1 includes a mapping relation calculation unit 11, and the mapping relation calculation unit 11 obtains a pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum by polynomial fitting, which is expressed as:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2，...，x1pi}，x1p1，x1p2，...，x1piRespectively are pixel points of corresponding peak values in the standard sample spectrum of the target machine,
x0＝{x0p1，x0p2，...，x0pi}，x0p1，x0p2，...，x0pirespectively are pixel points of corresponding peak values in the spectrum of the standard sample of the source machine,
the peak value is selected according to one or a combination of the light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
In practical application, a fifth-order polynomial fitting is generally adopted, peak searching can be manually selected through a characteristic peak of a light source spectrum, and pixel points of a source machine standard sample spectrum and a target machine standard sample spectrum can be acquired by adopting a method of automatically searching peak points.
In some embodiments, the mapping relation calculating unit 11 further includes:
the source machine peak position obtaining subunit 111 traverses each pixel point x0 of the source machine standard sample spectrumpiJudging whether the spectral amplitude of the pixel point is larger than the values of the left and right N points, if so, recording the position (x0) of the pixel pointpm1，x0pm2，...，x0pmm) Simultaneously, recording the global peak position x0 of the whole source machine standard sample spectrumpm0；
The target machine peak position obtaining subunit 112, according to the source machine peak position obtaining step, traverses and searches the positions (x1) of the pixel points in the target machine standard sample spectrumps1，x1ps2，...，x1psn) And the global peak position x0 of the target machine standard sample spectrumps0；
The peak point pair obtaining subunit 113, according to the appearance sequence of the local peak values, obtains the position x0 of each local peak valuepmmAt x1psnSearching for the peak point
|(x0pmi-x1psj-e′)|≤M
Wherein M is a natural number smaller than N, and the calculation process of e' is as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein, k is the kth peak point searched;
when the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)
If no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmi，x1psi)。
In some embodiments, the model calibration module 3 substitutes the target machine spectrum into the source machine calculation model to obtain a concentration value C of the gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine calculation model of gas a were:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of gas A, CB0Is the calibration gas concentration of gas B, Cba＝{Cba1，Cba2，...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、CbRespectively recording concentration indicating values of the gas A and the gas B at a series of different moments in the process of introducing the gas B.
In some embodiments, the source computer model obtains the gas concentration by preprocessing, calculating the eigenvalues and inverting the concentration values,
the model calibration module acts between or after the pre-processing and inversion concentration values.
The above modules may be functional modules or program modules, and may be implemented by software or hardware. For a module implemented by hardware, the modules may be located in the same processor; or the modules can be respectively positioned in different processors in any combination.
In addition, the ultraviolet gas analyzer model transfer method of the embodiment of the present application described in conjunction with fig. 1 is implemented by an ultraviolet gas analyzer. Fig. 10 is a hardware configuration diagram of an ultraviolet gas analyzer according to an embodiment of the present application.
Comprises a light source 101, a gas chamber body 102, a spectrometer 103 and a control and processor 104; the light source 1O1 and the spectrometer 103 are connected with the air chamber cavity through optical fibers or directly coupled; the spectrometer 103 is electrically connected with the control and processor 104; the light source 101 is used for providing ultraviolet and visible light rays and is electrically connected with the control and processor 104; the spectrometer 103 is used for measuring the gas to be measured and outputting a corresponding spectrum; the control and processor 104 is used for implementing the above-mentioned uv gas analyzer model transfer method when executing the computer program, and also for controlling the light source and the processor to work synchronously and cooperatively.
In particular, the control and processor 104 may include a Central Processing Unit (CPU), or A Specific Integrated Circuit (ASIC), or may be configured to implement one or more Integrated circuits of the embodiments of the present Application.
The ultraviolet gas analyzer may also include a memory 105, and the memory 105 may include a mass storage for data or instructions. By way of example, and not limitation, memory 105 may include a Hard Disk Drive (Hard Disk Drive, abbreviated HDD), a floppy Disk Drive, a Solid State Drive (SSD), flash memory, an optical Disk, a magneto-optical Disk, tape, or a Universal Serial Bus (USB) Drive or a combination of two or more of these. Memory 105 may include removable or non-removable (or fixed) media, where appropriate. The memory 105 may be internal or external to the data processing apparatus, where appropriate. In a particular embodiment, the memory 105 is a Non-Volatile (Non-Volatile) memory. In particular embodiments, Memory 105 includes Read-Only Memory (ROM) and Random Access Memory (RAM). The ROM may be mask-programmed ROM, Programmable ROM (PROM), Erasable PROM (EPROM), Electrically Erasable PROM (EEPROM), Electrically rewritable ROM (earrom), or FLASH Memory (FLASH), or a combination of two or more of these, where appropriate. The RAM may be a Static Random-Access Memory (SRAM) or a Dynamic Random-Access Memory (DRAM), where the DRAM may be a Fast Page Mode Dynamic Random-Access Memory (FPMDRAM), an Extended data output Dynamic Random-Access Memory (EDODRAM), a Synchronous Dynamic Random-Access Memory (SDRAM), and the like.
The memory 105 may be used to store or cache various data files that need to be processed and/or used for communication, as well as control and possibly computer program instructions executed by the processor 104.
The control and processor 104 reads and executes computer program instructions stored in the memory 105 to implement any one of the uv gas analyzer model delivery methods in the above embodiments.
The ultraviolet gas analyzer can execute the ultraviolet gas analyzer model transfer method in the embodiment of the application based on the acquired spectral pixels, so that the ultraviolet gas analyzer model transfer method described in conjunction with fig. 1 is realized.
In addition, in combination with the ultraviolet gas analyzer model transmission method in the foregoing embodiments, the embodiments of the present application may be implemented by providing a computer-readable storage medium. The computer readable storage medium having stored thereon computer program instructions; the computer program instructions, when executed by the processor, implement any of the ultraviolet gas analyzer model delivery methods in the above embodiments.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A method for transferring a model of an ultraviolet gas analyzer is characterized by comprising the following steps:
and a wavelength calibration step, namely calculating the pixel mapping relation of the standard sample spectrum of the source machine and the standard sample spectrum of the target machine through fitting, mapping the spectrum pixels of the source machine in the calculation model of the source machine to the spectrum pixels of the target machine according to the pixel mapping relation, and obtaining the spectrum of the target machine corresponding to the spectrum pixels of the target machine through the actual measurement spectrum interpolation of the target machine.
A model application step, substituting the target machine spectrum into the source machine calculation model and obtaining a concentration value of gas;
and a model calibration step, wherein corresponding calibration gas of the gas is introduced, and model calibration parameters are calculated, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
2. The uv gas analyzer model transfer method of claim 1, wherein the wavelength calibration step further comprises a mapping calculation step, specifically comprising:
obtaining the pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through polynomial fitting, wherein the pixel mapping relation is expressed as:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2，...，x1pi}，x1p1，x1p2,...，x1piRespectively are pixel points of corresponding peak values in the target machine standard sample spectrum,
x0＝{x0p1，x0p2，...，x0pi}，x0p1，x0p2，...，x0pirespectively are pixel points of corresponding peak values in the source machine standard sample spectrum,
the peak value is selected according to one or a combination of a light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
3. The uv gas analyzer model transfer method of claim 2, wherein the peak value selection method specifically comprises the steps of;
a source machine peak position obtaining step, namely traversing each pixel point x0 of the source machine standard sample spectrumpiJudging whether the spectral amplitude of the pixel point is larger than the values of the left and right N points, if so, recording the position (x0) of the pixel pointpm1，x0pm2，...，x0pmm) Simultaneously, recording the global peak position x0 of the whole source machine standard sample spectrumpm0；
A step of obtaining the peak position of the target machine, namely traversing and searching the position (x1) of a pixel point in the standard sample spectrum of the target machine according to the step of obtaining the peak position of the source machineps1，x1ps2，...，x1pSn) And the global peak position x0 of the target machine standard sample spectrumps0；
A step of obtaining peak point pairs, namely obtaining the position x0 of each local peak value according to the sequence of the local peak valuespmmAt x1psnSearching for the peak point
|(x0pmi-x1psj-e′)|≤M
Wherein M is a natural number smaller than N, e' is a peak parameter,
if no matching peak point satisfying the condition is searched, the current x0 is deletedpmmContinuing to search and match the next peak point to finally obtain i pairs of peak point pairs (x0)pm0，x1ps0)，...(x0pmix0pmi，x1psi)。
4. The uv gas analyzer model transfer method of claim 3, wherein the peak parameter e' is calculated as follows:
e0＝x0pm0-x1ps0，i∈[1，m]，j∈[1，n]
e1＝x0pm1-x1ps1，i∈[1，m]，j∈[1，n]，
when the searching is continued to obtain the peak point x1 meeting the requirementpsjThen, the following are obtained:
ek＝x0pmi-x1psjwherein, k is the kth peak point searched;
when the search matches the 0 th and 1 st peak points, that is:
when k is 0, 1, e' is ek；
When the search matches the kth peak point, the peak point of the source machine (x0) matched with the peak point of the target machine is searchedpm0，x0pm1，...，x0pmk-1) And (e)0，e1，...，ek-1) Fitting to obtain:
e’＝fn(x0pmi)，
namely:
when k > 1, e' ═ fn (x0)pmk)。
5. The ultraviolet gas analyzer model transfer method of claim 1, wherein the model calibration step comprises the steps of:
substituting the target machine spectrum into the source machine calculation model to obtain a concentration value C of the gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining the cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine computational model of gas a are:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of the gas a,
Cba＝{Cba1，Cba2,...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、Cband recording the concentration indicating values of the gas A and the gas B at a series of different moments respectively in the process of introducing the gas B.
6. The UV gas analyzer model transfer method of claim 1, wherein the model application step includes preprocessing, calculating eigenvalues and inverted concentration values,
the model calibration step is performed between the calculated eigenvalues and the inverted concentration values or after the inverted concentration values.
7. An ultraviolet gas analyzer model transfer system to which the ultraviolet gas analyzer model transfer method of any one of claims 1 to 6 is applied, comprising:
and the wavelength calibration module is used for calculating the pixel mapping relation between the source machine standard sample spectrum and the target machine standard sample spectrum through fitting, mapping the source machine spectrum pixels in the source machine calculation model to the target machine spectrum pixels according to the pixel mapping relation, and obtaining the target machine spectrum corresponding to the target machine spectrum pixels through the target machine actual measurement spectrum interpolation.
The model application module substitutes the target machine spectrum into the source machine calculation model and obtains a concentration value of gas;
and the model calibration module is used for introducing corresponding calibration gas of the gas and calculating model calibration parameters, wherein the model calibration parameters comprise cross interference elimination parameters and concentration calibration coefficients.
8. The uv gas analyzer model transfer system of claim 7, wherein the wavelength calibration module includes a mapping calculation unit that obtains the pixel mapping of the source machine standard sample spectrum and the target machine standard sample spectrum by polynomial fitting, expressed as:
x1＝f(x0)
wherein x1 ═ { x1 ═ xp1，x1p2,...，x1pi}，x1p1，x1p2,...，x1piRespectively are pixel points of corresponding peak values in the target machine standard sample spectrum,
x0＝{x0p1，x0p2,...，x0pi}，x0p1，x0p2,...，x0pirespectively are pixel points of corresponding peak values in the source machine standard sample spectrum,
the peak value is selected according to one or a combination of the light source spectrum, the source machine standard sample spectrum and the target machine standard sample spectrum.
9. The UV gas analyzer model transfer system of claim 6, wherein the model calibration module substitutes the target machine spectrum into the source machine calculation model to obtain a concentration value C of gas AA1And introducing interference gas B of the gas A, recording concentration indicating values of the gas A and the gas B at different moments, and obtaining the cross interference elimination parameters of the gas B to the gas A by adopting polynomial fitting on the concentration indicating values:
Cba＝fd(Cb)
the concentration calibration coefficients for the source machine computational model of gas a are:
Ka＝CA0/(CA1-Cba)
wherein, CA0Is the calibration gas concentration of the gas a,
Cba＝{Cba1，Cba2,...，Cbai}，Cb＝{Cb1，Cb2，...，Cbi}，Cba、Cband recording the concentration indicating values of the gas A and the gas B at a series of different moments respectively in the process of introducing the gas B.
10. An ultraviolet gas analyzer comprises a light source, a gas chamber cavity, a spectrometer and a control and processor; the light source, the spectrometer and the air chamber cavity are connected or directly coupled through optical fibers; the spectrometer is electrically connected with the control and processor; the light source is used for providing ultraviolet and visible rays; the spectrometer is used for measuring the gas to be measured and outputting a corresponding spectrum; the control and processor when executing the computer program implements the ultraviolet gas analyzer model transfer method of any of claims 1 to 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110738886.XA CN113466130A (en) | 2021-06-30 | 2021-06-30 | Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110738886.XA CN113466130A (en) | 2021-06-30 | 2021-06-30 | Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113466130A true CN113466130A (en) | 2021-10-01 |
Family
ID=77876641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110738886.XA Pending CN113466130A (en) | 2021-06-30 | 2021-06-30 | Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113466130A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5347475A (en) * | 1991-09-20 | 1994-09-13 | Amoco Corporation | Method for transferring spectral information among spectrometers |
| CN109883962A (en) * | 2019-01-29 | 2019-06-14 | 北京雪迪龙科技股份有限公司 | A kind of method and its system of the drift of amendment spectrometer wavelength |
| CN111198165A (en) * | 2020-01-14 | 2020-05-26 | 重庆理工大学 | Method for measuring water quality parameters based on spectral data standardization |
-
2021
- 2021-06-30 CN CN202110738886.XA patent/CN113466130A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5347475A (en) * | 1991-09-20 | 1994-09-13 | Amoco Corporation | Method for transferring spectral information among spectrometers |
| CN109883962A (en) * | 2019-01-29 | 2019-06-14 | 北京雪迪龙科技股份有限公司 | A kind of method and its system of the drift of amendment spectrometer wavelength |
| CN111198165A (en) * | 2020-01-14 | 2020-05-26 | 重庆理工大学 | Method for measuring water quality parameters based on spectral data standardization |
Non-Patent Citations (1)
| Title |
|---|
| 张珅 等: "基于 NDIR开放光路CO2浓度测量的标定方法研究", 仪表技术与传感器, no. 3, pages 101 - 102 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105628645A (en) | Infrared analysis model transfer method | |
| Poerio et al. | Dual-domain calibration transfer using orthogonal projection | |
| CN107440684A (en) | Method and apparatus for the concentration of forecast analysis thing | |
| CN111595462B (en) | Infrared imaging temperature measurement system calibration method and device, computing equipment and storage medium | |
| CN107807366B (en) | Atmospheric visibility calculation method, device, radar and system | |
| US20100318833A1 (en) | Method for the secondary error correction of a multi-port network analyzer | |
| CN110514392B (en) | Temperature deformation measurement system and method based on wide-angle lens and image distortion correction | |
| CN110954809A (en) | Vector calibration quick correction method for large signal test | |
| WO2012105127A1 (en) | Measurement error correction method and electronic component characteristic measurement device | |
| WO2020092537A1 (en) | System and method for spectral interpolation using multiple illumination sources | |
| CN113466130A (en) | Ultraviolet gas analyzer model transfer method and system and ultraviolet gas analyzer | |
| Parrott et al. | Calibration model transfer in mid-infrared process analysis with in situ attenuated total reflectance immersion probes | |
| JP2021067611A5 (en) | ||
| US20210235570A1 (en) | Filament current control method and apparatus | |
| CN108107392B (en) | Multi-line TRL calibration method and terminal equipment | |
| CN109655415B (en) | Wavelength offset correction method and device and computer equipment | |
| CN111307292A (en) | Calibration method and device of dual-band radiometric system | |
| CN116735811A (en) | Method and system for measuring total acid and total ester content of wine | |
| CN115266583B (en) | Ambient light filtering method, system, computer equipment and computer readable storage medium | |
| Huang et al. | Model maintenance of RC-PLSR for moisture content measurement of dried scallop | |
| CN108956554B (en) | Wavelength calibration method of atomic fluorescence spectrometer based on digital micromirror array | |
| CN111751006B (en) | Data calibration method, target radiation characteristic analysis method and device | |
| CN115639410A (en) | Capacitance detection method and capacitance detection device | |
| CN110031416A (en) | Gas concentration detection apparatus and method | |
| CN107941758A (en) | A kind of coal quality measurement of caloric value method based on Pretreated spectra |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |