CN113463051B - Film material and preparation method and application thereof - Google Patents
Film material and preparation method and application thereof Download PDFInfo
- Publication number
- CN113463051B CN113463051B CN202110747162.1A CN202110747162A CN113463051B CN 113463051 B CN113463051 B CN 113463051B CN 202110747162 A CN202110747162 A CN 202110747162A CN 113463051 B CN113463051 B CN 113463051B
- Authority
- CN
- China
- Prior art keywords
- content
- target
- noble metal
- mosi
- film material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
Abstract
The invention provides a film material, a preparation method and application thereof, and belongs to the technical field of protective materials. The invention provides a film material which comprises molybdenum element, silicon element and noble metal element, wherein the noble metal element is gold or silver, the content of the molybdenum element is 28-35 at%, the content of the silicon element is 60-70 at%, the content of the noble metal element is 0.5-1.5 at%, and the noble metal element exists in a single atom form. In the invention, the introduction of noble metal Au or Ag single atoms can regulate and control MoSi 2 Is limited by the microstructure of MoSi 2 Grain size of MoSi is improved 2 The compactness of the film improves the intrinsic brittleness and the toughness of the film, thereby improving the hardness and the fracture toughness of the film material. And the introduction of Au monoatoms or Ag monoatoms can greatly reduce MoSi 2 The friction coefficient of the film has important significance for the engine transmission mechanism.
Description
Technical Field
The invention relates to the technical field of protective materials, in particular to a film material and a preparation method and application thereof.
Background
With the rapid development of aerospace industry, whether a transmission mechanism of an aeroengine such as a gear and a spline can bear a severe working environment is a precondition for whether the aeroengine can stably run. This not only requires the transmission of the engine to have high hardness and toughness as well as wear resistance, but also its service life is critical. On the other hand, the transmission mechanism needs to bear friction among different parts, the transmission efficiency among the transmission mechanisms can be reduced due to the larger friction coefficient, and the abrasion of the transmission mechanism can be reduced due to the low friction coefficient, and the transmission efficiency can be improved. Meanwhile, on the premise of ensuring the stable operation of the engine transmission mechanism, the influence of the engine transmission mechanism on the air environment is reduced. The development of film technology has obvious effects of improving the hardness and toughness of the surface of the material and reducing the friction coefficient of the surface.
In recent years, it has been found that a transition metal silicide has high hardness, high wear resistance and oxidation resistance, and has a remarkable effect in improving material properties as a hard protective film. Molybdenum disilicide is used as a transition metal silicide, has dual performances of metal and ceramic, and has higher wear resistance, corrosion resistance and oxidation resistance. At the same time MoSi 2 Is also a renewable, non-toxic, environmentally friendly material, which makes it the primary choice for protective films. However, moSi 2 The inherent brittleness limits further improvements in mechanical properties.
Disclosure of Invention
In view of the above, the present invention aims to provide a thin film material, and a preparation method and application thereof. The film material provided by the invention has high hardness and good fracture toughness.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a film material which comprises molybdenum element, silicon element and noble metal element, wherein the noble metal element is gold or silver, the content of the molybdenum element is 28-35 at%, the content of the silicon element is 60-70 at%, the content of the noble metal element is 0.5-1.5 at%, and the noble metal element exists in a single atom form.
Preferably, the content of the noble metal element is 0.8 to 1.0at.%.
Preferably, the content of the molybdenum element is 30.6at.%, the content of the silicon element is 68.9at.%, and the content of the gold is 0.5at.%.
Preferably, the content of the molybdenum element is 31.7at.%, the content of the silicon element is 67.5at.%, and the content of the gold is 0.8at.%.
Preferably, the content of the molybdenum element is 32.4at.%, the content of the silicon element is 66.1at.%, and the content of the gold is 1.5at.%.
Preferably, the content of the molybdenum element is 32.3at.%, the content of the silicon element is 66.7at.%, and the content of the silver is 1.0at.%.
The invention also provides a preparation method of the film material, which comprises the following steps:
by MoSi 2 And performing magnetron sputtering deposition on the surface of the substrate to obtain the thin film material, wherein the noble metal target is an Au target or an Ag target.
Preferably, the MoSi is sputtered during the magnetron sputtering deposition 2 The direct current constant current of the target is 0.5A, the power of sputtering the noble metal target is 0-50W, and the power of sputtering the noble metal target is not 0.
Preferably, the working pressure of the magnetron sputtering deposition is 0.6-0.8 Pa.
The invention also provides application of the film material disclosed by the technical scheme or the film material prepared by the preparation method disclosed by the technical scheme in an aeroengine transmission mechanism.
The invention provides a film material which comprises molybdenum element, silicon element and noble metal element, wherein the noble metal element is gold or silver, the content of the molybdenum element is 28-35 at%, the content of the silicon element is 60-70 at%, the content of the noble metal element is 0.5-1.5 at%, and the noble metal element exists in a single atom form. In the invention, the introduction of noble metal Au or Ag single atoms can regulate and control MoSi 2 Is limited by the microstructure of MoSi 2 Grain size of MoSi is improved 2 The compactness of the film improves the intrinsic brittleness and the toughness of the film, thereby improving the hardness and the fracture toughness of the film material. And a small amount of Au monoatoms or Ag monoatoms are doped to ensure MoSi 2 The wear-resistant performance of the alloy is improved, and meanwhile, the toughness of the alloy is improved, and the friction coefficient of the alloy under the oil lubrication condition is reduced. The invention proves the application potential of the transition metal silicide in the engine transmission mechanism, and plays a certain role in the lightweight design of the engine transmission mechanism. Therefore, the film material prepared by the method has good development and application prospects in transmission mechanisms of aeroengines, and has important significance for engine transmission mechanisms.
The invention also provides a preparation method of the film material, which adopts the magnetron sputtering deposition technology to prepare the film material, and the method is simple, quick and short in flow.
Further, the invention can control the content of noble metal monoatoms by changing the power of the noble metal target; the thickness of the thin film material can be controlled by controlling the time of magnetron sputtering deposition.
Drawings
FIG. 1 is an XRD pattern of the different thin film materials prepared in examples 1-3;
FIG. 2 is a high resolution view of the thin film material prepared in example 2;
FIG. 3 is a corresponding selected area electron diffraction pattern of the thin film material prepared in example 2;
FIG. 4 is a high resolution view of the thin film material prepared in comparative example 2;
FIG. 5 is a corresponding selected area electron diffraction pattern of the thin film material prepared in comparative example 2;
FIG. 6 is a graph showing the friction coefficient of the films prepared in examples 1 to 3 and comparative examples 1 to 2.
Detailed Description
The invention provides a film material which comprises molybdenum element, silicon element and noble metal element, wherein the noble metal element is gold or silver, the content of the molybdenum element is 28-35 at%, the content of the silicon element is 60-70 at%, the content of the noble metal element is 0.5-1.5 at%, and the noble metal element exists in a single atom form.
In the present invention, the thickness of the film material is preferably 1 to 1.5 μm.
In the present invention, the content of the noble metal element is preferably 0.8 to 1.0at.%. In the present invention, the noble metal element is substituted for MoSi 2 Si atoms in (a).
In the present invention, the molybdenum element and the silicon element are expressed as MoSi 2 In the form of (A) said MoSi 2 Corresponds to the C40 hexagonal structure and is preferentially oriented toward the (111) plane.
In a specific embodiment of the present invention, the content of the molybdenum element is 30.6 at%, the content of the silicon element is 68.9 at%, and the content of the gold is 0.5 at% or less
The content of the molybdenum element is 31.7 at%, the content of the silicon element is 67.5 at%, and the content of the gold is 0.8 at% or more
The content of the molybdenum element is 32.4 at%, the content of the silicon element is 66.1 at%, and the content of the gold is 1.5 at% or more
The content of the molybdenum element was 32.3at.%, the content of the silicon element was 66.7at.%, and the content of the silver was 1.0at.%.
The invention also provides a preparation method of the film material, which comprises the following steps:
by MoSi 2 And performing magnetron sputtering deposition on the surface of the substrate to obtain the thin film material, wherein the noble metal target is an Au target or an Ag target.
In the present invention, the MoSi is sputtered during the magnetron sputtering deposition 2 The direct-current constant current of the target is preferably 0.5A, the power for sputtering the noble metal target is preferably 0-50W, and the power for sputtering the noble metal target is preferably not 0.
In the invention, the working pressure of the magnetron sputtering deposition is preferably 0.6-0.8 Pa.
In the present invention, the distance between the target and the substrate is independently preferably 10 to 15cm during the magnetron sputtering deposition.
In the invention, the vacuum degree of the coating chamber is preferably pumped to 1 multiplied by 10 by a turbomolecular pump before the magnetron sputtering deposition -4 Pa, and 80sccm Ar was introduced as a sputtering gas. In the present invention, the purity of Ar is preferably 99.99%.
In the present invention, the substrate is preferably a Si sheet. In the present invention, the substrate is preferably not subjected to temperature and bias voltage during the magnetron sputtering deposition.
In the present invention, the Si sheet is preferably subjected to pretreatment before use, preferably ultrasonic cleaning with ethanol, acetone and deionized water in this order, and then drying. In the present invention, the time for each of the ultrasonic cleaning is preferably 15 minutes. The specific mode of the drying is not particularly limited, and deionized water can be completely removed.
In the present invention, the MoSi 2 The purity of both the target and the noble metal target is preferably 99.95wt%.
The invention also provides application of the film material disclosed by the technical scheme or the film material prepared by the preparation method disclosed by the technical scheme in an aeroengine transmission mechanism.
The present invention is not particularly limited to the application described, but may be applied in a manner well known to those skilled in the art.
For further explanation of the present invention, the film materials provided in the present invention, and the preparation method and application thereof are described in detail below with reference to examples, but they should not be construed as limiting the scope of the present invention.
Example 1
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 A target (99.95%) and an Au target (99.95%) are fixed at the position of the sputtering target material, 12cm away from the substrate, wherein MoSi 2 The current of the direct current power supply of the target is 0.5A, the power of the radio frequency power supply of the Au target is 10W, the pressure of magnetron sputtering is controlled to be 0.8Pa, the temperature and bias voltage are not applied to the substrate, ar ions bombard the surface of the target in the film preparation process, and meanwhile the argon flow is controlled to be 80sccm. And (3) carrying out mechanical and oil friction and wear tests on the sample, measuring the friction coefficient of the prepared film in the lubricating oil base oil PAO4 by a friction experiment machine, and collecting the rubbed abrasive dust and the sample.
Experimental results:
by XRD (see FIG. 1) and HRTEM (see FIG. 2), FIG. 3 is a corresponding selected area electron diffraction pattern of the thin film material prepared in example 2, demonstrating that the resulting Mo-Si-Au thin film structure is of a C40 hexagonal structure, and that no diffraction peak of Au is observed in XRD, the Au being present in the form of a single atom in MoSi 2 In the crystal lattice. The content of Mo atoms in the prepared film was determined by XPS to be 30.6at.%, si atoms to be 68.9at.%, and Au atoms to be 0.5at.%. The hardness is 13.4GPa, and the fracture toughness is 2.36 MPa.m 1/2 The friction coefficient was measured under oil lubrication conditions by a friction tester to be 0.11 (see fig. 6).
Example 2
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 A target (99.95%) and an Au target (99.95%) are fixed at the position of the sputtering target material, 12cm away from the substrate, wherein MoSi 2 The current of the direct current power supply of the target is 0.5A, the power of the radio frequency power supply of the Au target is 15W, the pressure of magnetron sputtering is controlled to be 0.8Pa, the temperature and bias voltage are not applied to the substrate, ar ions bombard the surface of the target in the film preparation process, and meanwhile the argon flow is controlled to be 80sccm. And (3) carrying out mechanical and oil friction and wear tests on the sample, measuring the friction coefficient of the prepared film in the lubricating oil base oil PAO4 by a friction experiment machine, and collecting the rubbed abrasive dust and the sample.
Experimental results:
the resulting Mo-Si-Au thin film was confirmed to have a C40 hexagonal structure by XRD (see FIG. 1), and no diffraction peak of Au was observed in XRD, with Au being present in the form of a single atom in MoSi 2 In the crystal lattice. The content of Mo atoms in the prepared film was determined by XPS to be 31.7at.%, si atoms to be 67.5at.%, and Au atoms to be 0.8at.%. The hardness is 15.4GPa, and the fracture toughness is 2.55 MPa.m 1/2 The coefficient of friction was measured by a friction tester under oil lubrication conditions to be 0.09 (fig. 6).
Example 3
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 A target (99.95%) and an Au target (99.95%) are fixed at the position of the sputtering target material, 12cm away from the substrate, wherein MoSi 2 The current of the direct current power supply of the target is 0.5A, the power of the radio frequency power supply of the Au target is 20W, the pressure of magnetron sputtering is controlled to be 0.8Pa, the temperature and bias voltage are not applied to the substrate, ar ions bombard the surface of the target in the film preparation process, and meanwhile the argon flow is controlled to be 80sccm. And (3) carrying out mechanical and oil friction and wear tests on the sample, measuring the friction coefficient of the prepared film in the lubricating oil base oil PAO4 by a friction experiment machine, and collecting the rubbed abrasive dust and the sample.
Experimental results:
the result was confirmed by XRD (see FIG. 1)The Mo-Si-Au thin film structure is C40 hexagonal structure, no diffraction peak of Au is observed in XRD, and the Au exists in the form of single atom in MoSi 2 In the crystal lattice. The content of Mo atoms in the prepared film was 32.4at.%, si atoms was 66.1at.%, and Au atoms were 1.5at.% as determined by XPS. The hardness is 13.5GPa, and the fracture toughness is 2.47 MPa.m 1/2 The coefficient of friction was measured by a friction tester under oil lubrication conditions to be 0.11 (fig. 6).
Example 4
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 The target (99.95%) and Ag target (99.95%) are fixed at the position of sputtering target material, 12cm away from the substrate, wherein MoSi 2 The current of the direct current power supply of the target is 0.5A, the power of the radio frequency power supply of the Ag target is 15W, the pressure of magnetron sputtering is controlled to be 0.8Pa, the temperature and bias voltage are not applied to the substrate, ar ions bombard the surface of the target in the film preparation process, and the argon flow is controlled to be 80sccm. And (3) carrying out mechanical and oil friction and wear tests on the sample, measuring the friction coefficient of the prepared film in the lubricating oil base oil PAO4 by a friction experiment machine, and collecting the rubbed abrasive dust and the sample.
Experimental results:
the resulting Mo-Si-Ag thin film structure was confirmed to be a C40 hexagonal structure by XRD and HRTEM, and diffraction peaks of Ag were not observed in XRD, the Ag being present in the form of single atom in MoSi 2 In the crystal lattice. The content of Mo atoms in the prepared film was 32.3at.%, si atoms was 66.7at.% and Ag atoms was 1.0at.% as determined by XPS. The hardness is 15.2GPa, and the fracture toughness is 2.49 MPa.m 1/2 The coefficient of friction was measured by a friction tester under oil lubrication conditions to be 0.09.
Comparative example 1
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 The target (99.95%) and the Au target (99.95%) are fixed at the position of the sputtering target material, and are 12cm away from the substrate, moSi 2 The current of the target direct current power supply is 0.5A, the power of the radio frequency power supply of the Au target is 0W, the sputtering pressure is controlled to be 0.8Pa, and the substrate does not apply temperatureAnd biasing, wherein Ar ions bombard the surface of the target in the film preparation process, and meanwhile, the flow rate of the Ar is controlled to be 80sccm. And (3) carrying out mechanical and oil friction and wear tests on the sample, measuring the friction coefficient of the prepared film in the lubricating oil base oil PAO4 by a friction experiment machine, and collecting the rubbed abrasive dust and the sample.
Experimental results:
the MoSi obtained was confirmed by XRD and HRTEM 2 The film structure is a C40 hexagonal structure. The content of Mo atoms in the prepared film was 33.3at.% and Si atoms was 66.7at.% as determined by XPS. The hardness is 10.9GPa, and the fracture toughness is 2.10 MPa.m 1/2 The coefficient of friction was measured by a friction tester under oil lubrication conditions to be 0.17 (fig. 6).
Comparative example 2
Preparation:
adopts magnetron sputtering deposition technology to deposit MoSi 2 A target (99.95%) and an Au target (99.95%) are fixed at the position of the sputtering target material, 12cm away from the substrate, wherein MoSi 2 The current of the direct current power supply of the target is 0.5A, the power of the radio frequency power supply of the Au target is 50W, the pressure of magnetron sputtering is controlled to be 0.8Pa, the temperature and bias voltage are not applied to the substrate, ar ions bombard the surface of the target in the film preparation process, and meanwhile the argon flow is controlled to be 80sccm.
Experimental results:
FIG. 5 is a corresponding selective electron diffraction pattern of the thin film material prepared in comparative example 2 by XRD and HRTEM (FIG. 4), demonstrating that the resulting Mo-Si-Au thin film structure is a C40 hexagonal structure, and that the diffraction rings of Au (111) are observed in the corresponding high resolution of selective electron diffraction to illustrate that the Au atomic portion forms clusters from MoSi 2 And precipitating in the crystal lattice. XPS analysis gave a Mo atom content of 34.6at.%, si atom of 63.0at.% and Au atom of 2.4at.%. The hardness is 9.9GPa, and the fracture toughness is 2.04 MPa.m 1/2 The coefficient of friction measured by a friction tester under oil lubrication conditions was 0.14 (fig. 6).
The foregoing is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. It should be noted that modifications and adaptations to the present invention may occur to one skilled in the art without departing from the principles of the present invention and are intended to be comprehended within the scope of the present invention.
Claims (5)
1. A thin film material, characterized by comprising molybdenum element, silicon element and noble metal element, wherein the noble metal element is gold or silver, the noble metal element exists in a single atom form, the content of the molybdenum element is 30.6at percent, the content of the silicon element is 68.9at percent, and the content of the gold is 0.5at percent;
or the content of the molybdenum element is 31.7at percent, the content of the silicon element is 67.5at percent, and the content of the gold is 0.8at percent;
or the content of the molybdenum element is 32.4at percent, the content of the silicon element is 66.1at percent, and the content of the gold is 1.5at percent;
or the content of the molybdenum element is 32.3at percent, the content of the silicon element is 66.7at percent, and the content of the silver is 1.0at percent;
the preparation method of the film material comprises the following steps:
by MoSi 2 And performing magnetron sputtering deposition on the surface of the substrate to obtain the thin film material, wherein the noble metal target is an Au target or an Ag target.
2. The method for preparing the film material as claimed in claim 1, comprising the steps of:
by MoSi 2 And performing magnetron sputtering deposition on the surface of the substrate to obtain the thin film material, wherein the noble metal target is an Au target or an Ag target.
3. The method according to claim 2, wherein the MoSi is sputtered during the magnetron sputtering deposition 2 The direct-current constant current of the target is 0.5-A, the power of sputtering the noble metal target is 0-50W, and the power of sputtering the noble metal target is not 0.
4. The method according to claim 2, wherein the working pressure of the magnetron sputtering deposition is 0.6 to 0.8Pa.
5. Use of the film material of claim 1 or the film material prepared by the preparation method of any one of claims 2 to 4 in an aeroengine transmission mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110747162.1A CN113463051B (en) | 2021-07-02 | 2021-07-02 | Film material and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110747162.1A CN113463051B (en) | 2021-07-02 | 2021-07-02 | Film material and preparation method and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113463051A CN113463051A (en) | 2021-10-01 |
| CN113463051B true CN113463051B (en) | 2023-09-29 |
Family
ID=77877394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110747162.1A Active CN113463051B (en) | 2021-07-02 | 2021-07-02 | Film material and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113463051B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114086138B (en) * | 2021-11-19 | 2024-03-15 | 烟台大学 | alpha-CN x Preparation method of Fe nano composite coating |
| CN114561621B (en) * | 2021-12-10 | 2022-12-02 | 吉林大学 | High-entropy metal glass film and preparation method and application thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003055761A (en) * | 2001-08-13 | 2003-02-26 | Toshiba Corp | Sputtering target, production method therefor and electronic parts |
| CN108342687A (en) * | 2018-01-30 | 2018-07-31 | 吉林大学 | A kind of Hf of the monatomic doping of noble metal3N4Film and preparation method thereof |
-
2021
- 2021-07-02 CN CN202110747162.1A patent/CN113463051B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003055761A (en) * | 2001-08-13 | 2003-02-26 | Toshiba Corp | Sputtering target, production method therefor and electronic parts |
| CN108342687A (en) * | 2018-01-30 | 2018-07-31 | 吉林大学 | A kind of Hf of the monatomic doping of noble metal3N4Film and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| "Al合金化对MoSi2性能的影响：第一性原理计算与实验研究";赖道辉;《中国优秀硕士学位论文全文数据库（电子期刊）工程科技Ⅰ辑》;20130415;第31页第1段-第34页第1段以及第49页倒数第1段 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113463051A (en) | 2021-10-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN113463051B (en) | Film material and preparation method and application thereof | |
| CN107130222B (en) | High-power impulse magnetron sputtering CrAlSiN nano-composite coating and preparation method thereof | |
| CN108048810B (en) | Superhard low-friction wear-resistant protective coating and preparation method thereof | |
| CN106987816B (en) | A kind of super fine and close Al-Cr-Si-N preparation technology of coating of high aluminium content | |
| CN104928638A (en) | AlCrSiN-based multilayer nanometer composite cutter coating layer and preparation method thereof | |
| CN107815645B (en) | A kind of low-friction coefficient MoS2Base Metal composite solid lubricant film | |
| CN107841717B (en) | A kind of low-friction coefficient MoS2Base Metal-oxide composite solid lubrication film preparation method | |
| CN110453190B (en) | Composite magnetron sputtering preparation method of AlCrSiN/Mo self-lubricating film | |
| CN103898467A (en) | Nanometer composite TiCrBN coating and preparation method thereof | |
| CN101531074B (en) | Ultrahard TiB2/Si3N4 nano-multilayer film and preparation method thereof | |
| CN102021513B (en) | High-tenacity oxidation-resistant anti-friction coating on substrate surface and preparation method thereof | |
| CN112410728B (en) | CrB with high Cr content 2 Preparation process of-Cr coating | |
| CN108977775A (en) | A kind of TiAlSiN coated cutting tool preparation process | |
| CN112410727B (en) | Novel WCrSiN gradient coating and preparation method thereof | |
| CN109023243B (en) | Carbon-based cutter coating with super toughness and low friction and preparation method thereof | |
| Dejun et al. | Analysis of structure and bonding strength of AlTiN coatings by cathodic ion plating | |
| Kong et al. | Friction and wear properties of AlCrN coating by cathodic arc ion plating | |
| CN110578115B (en) | Doped sulfide composite film, preparation method thereof and workpiece containing doped sulfide composite film | |
| CN111778485B (en) | Coating and preparation method thereof | |
| Yau et al. | Tungsten doped chromium nitride coatings | |
| CN111455318A (en) | Molybdenum nitride/molybdenum disulfide/silver ternary composite high-temperature solid lubricating film and preparation method thereof | |
| CN112501553A (en) | Mo-doped AlCrSiN/Mo self-lubricating film and preparation method thereof | |
| CN108441825B (en) | Preparation method of doped metal diamond-like coating and product thereof | |
| CN111647859B (en) | Preparation process of Zr-Ti-B-N nano composite coating in reducing atmosphere | |
| CN109338312B (en) | Silver-containing chromium nitride-based hard nano-structure composite film and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |